CN111976070A - A kind of invisible anti-counterfeiting seal and preparation method thereof - Google Patents

A kind of invisible anti-counterfeiting seal and preparation method thereof Download PDF

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CN111976070A
CN111976070A CN202010668204.8A CN202010668204A CN111976070A CN 111976070 A CN111976070 A CN 111976070A CN 202010668204 A CN202010668204 A CN 202010668204A CN 111976070 A CN111976070 A CN 111976070A
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seal
counterfeiting
invisible anti
preparation
patch
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王东升
毛礼俊
熊超越
古良鸿
郑永豪
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University of Electronic Science and Technology of China
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C39/00Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
    • B29C39/02Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor for making articles of definite length, i.e. discrete articles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C39/00Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
    • B29C39/22Component parts, details or accessories; Auxiliary operations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C71/00After-treatment of articles without altering their shape; Apparatus therefor
    • B29C71/0009After-treatment of articles without altering their shape; Apparatus therefor using liquids, e.g. solvents, swelling agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12Chemical modification
    • C08J7/123Treatment by wave energy or particle radiation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2383/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
    • C08J2383/04Polysiloxanes

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)

Abstract

The invention discloses an invisible anti-counterfeiting seal and a preparation method thereof, wherein the preparation method comprises the following steps: uniformly mixing polydimethylsiloxane and a curing agent, defoaming, taking out and flatly laying on a glass plate after bubbles completely disappear, defoaming for the second time, and pouring into a mold for curing and molding to obtain a patch; cleaning and drying the patch, carrying out oxygen plasma treatment, soaking, washing and drying; printing a mask on the surface of the polydimethylsiloxane, performing laser etching, placing in a nitrogen atmosphere, introducing mixed gas, heating, cooling, taking out the seal, and cleaning to obtain the invisible anti-counterfeiting seal. The invention also comprises the invisible anti-counterfeiting seal manufactured by the method. The seal of the invention mainly realizes transfer printing through hydrophilic/hydrophobic intervals on the surface, and the surface of the seal is a whole smooth and uniform plane, so that the seal cannot be imitated through photos, thereby achieving the anti-counterfeiting effect.

Description

一种隐形防伪印章及其制备方法A kind of invisible anti-counterfeiting seal and preparation method thereof

技术领域technical field

本发明涉及印章制备技术领域,具体涉及一种隐形防伪印章及其制备方法。The invention relates to the technical field of seal preparation, in particular to an invisible anti-counterfeiting seal and a preparation method thereof.

背景技术Background technique

在我国,印章是人们的工作与生活中经常用到的工具,包括政府或者企业的工作开展、运营或经营当中都涉及到印章的使用。印章具有法律效力,对于个人、企业或是政府来说是很重要的凭证,因此常有不法分子为了牟利制作假印章,这也造成了非常严重的社会影响与经济损失。于是,实现印章的防伪是非常重要的事情。In my country, the seal is a tool often used in people's work and life, including the use of the seal in the work, operation or operation of the government or enterprise. Seals have legal effect and are very important certificates for individuals, enterprises or governments. Therefore, criminals often make fake seals for profit, which also causes very serious social impact and economic losses. Therefore, it is very important to realize the anti-counterfeiting of the seal.

目前来说,印章的防伪策略主要包括三个方面:(1)防伪数字,即防伪码,这个数字前几位是由印章管理单位的统一编号,后几位是印章刻制公司的流水编号,具有唯一性与可查询性;(2)防伪字体,印章的字体是专业的防伪字体,难以被仿制;(3)印章的防伪线,即在印章边缘或者字体上,图形上具有一些不规制的白色缺口,从而对防伪造成了一定的难度。At present, the anti-counterfeiting strategy of seals mainly includes three aspects: (1) The anti-counterfeiting number, namely the anti-counterfeiting code, the first few digits of this number are the unified number of the seal management unit, and the last few digits are the serial number of the seal engraving company. Uniqueness and queryability; (2) Anti-counterfeiting font, the font of the seal is a professional anti-counterfeiting font, which is difficult to be imitated; (3) The anti-counterfeiting line of the seal, that is, there are some irregular graphics on the edge of the seal or on the font. The white notch makes it difficult to prevent counterfeiting.

然而,以上传统的防伪方法,都仅能实现一定程度上的印章防伪。在得以获得印章表面的高清照片的情况下,印章仍然有很大概率可以被伪造。于是,目前也出现了将芯片植入印章当中的防伪方法,然而即使是芯片也是有可能复制的,或者与印章产生分离。为了解决该问题,需要发明一种“看不见”的印章,即隐形防伪印章。However, the above traditional anti-counterfeiting methods can only achieve a certain degree of seal anti-counterfeiting. In the case of obtaining high-resolution photos of the surface of the seal, there is still a high probability that the seal can be forged. As a result, anti-counterfeiting methods of implanting chips into seals have also emerged. However, even the chips may be copied or separated from the seal. In order to solve this problem, it is necessary to invent an "invisible" seal, that is, an invisible anti-counterfeiting seal.

发明内容SUMMARY OF THE INVENTION

针对现有技术中的上述不足,本发明提供了一种隐形防伪印章及其制备方法,隐形防伪印章主要通过表面的亲水/疏水间隔来实现转印,而在印章表面将会是一整块光滑均匀的平面,无法通过照片实现对印章的仿制,从而达到防伪的效果,且印章的制备方法流程简单,所需时间较短,有效解决了印章易被伪造等问题。In view of the above deficiencies in the prior art, the present invention provides an invisible anti-counterfeiting seal and a preparation method thereof. The invisible anti-counterfeiting seal mainly realizes transfer printing through the hydrophilic/hydrophobic interval on the surface, and the surface of the seal will be a whole piece The smooth and uniform plane can not be imitated by photos, so as to achieve the effect of anti-counterfeiting, and the preparation method of the seal has a simple process and a short time required, which effectively solves the problems of easy forgery of the seal.

为实现上述目的,本发明解决其技术问题所采用的技术方案是:提供一种隐形防伪印章的制备方法,依次包括以下步骤:In order to achieve the above purpose, the technical solution adopted by the present invention to solve the technical problem is: a preparation method of an invisible anti-counterfeiting seal is provided, which comprises the following steps in turn:

(1)贴片制备:将聚二甲基硅氧烷和固化剂按质量比2~10:1混匀,然后放入真空干燥箱内脱泡1~2h,待气泡完全消失后取出并平铺在玻璃板上,二次脱泡20~40min,再倒入模具中,在60~75℃温度下固化成型2~4h,得贴片;(1) Patch preparation: Mix the polydimethylsiloxane and curing agent in a mass ratio of 2 to 10:1, then put them into a vacuum drying oven for deaeration for 1 to 2 hours. After the bubbles disappear completely, take them out and flatten them. Spread it on a glass plate, defoaming the second time for 20-40 minutes, then pour it into a mold, and cure it at a temperature of 60-75 °C for 2-4 hours to obtain a patch;

(2)氧等离子体处理:将步骤(1)所得贴片清洗并吹干,然后氧等离子体处理30~60s,再放入0.4~0.6wt%十二烷基硫酸钠溶液中浸泡20~40s,最后依次经冲洗、吹干,得聚二甲基硅氧烷表面;其中,氧等离子体处理时射频功率为120~140W,氧气流量为150~160sccm;(2) Oxygen plasma treatment: the patch obtained in step (1) is cleaned and blown dry, then treated with oxygen plasma for 30-60s, and then placed in 0.4-0.6wt% sodium dodecyl sulfate solution to soak for 20-40s , and finally washed and dried in sequence to obtain the surface of polydimethylsiloxane; wherein, the radio frequency power during the oxygen plasma treatment is 120-140W, and the oxygen flow rate is 150-160sccm;

(3)接枝疏水分子:采用水溶性聚合物在步骤(2)所得聚二甲基硅氧烷表面3D打印掩膜,然后置于氮气氛围中,通入混合气体,在60~80℃下加热60~120min,降温至室温后取出印章,最后用去离子水清洗2~4次,得隐形防伪印章;其中,混合气体通过以下方法制备得到:将疏水分子加热至气态,然后与氮气按体积比1:1混合,得混合气体。(3) Grafting hydrophobic molecules: 3D printing a mask on the surface of the polydimethylsiloxane obtained in step (2) by using a water-soluble polymer, and then placing it in a nitrogen atmosphere, introducing a mixed gas, at 60-80 °C Heating for 60-120min, cooling to room temperature, taking out the seal, and finally washing it with deionized water for 2-4 times to obtain an invisible anti-counterfeiting seal; wherein, the mixed gas is prepared by the following method: heating the hydrophobic molecules to a gaseous state, and then mixing with nitrogen gas by volume Mix at a ratio of 1:1 to get a mixed gas.

进一步,聚二甲基硅氧烷粘度为10~2000mPa.s。Further, the viscosity of the polydimethylsiloxane is 10 to 2000 mPa.s.

进一步,固化剂为道康宁184固化剂、正硅酸乙酯或二月二丁基肉桂酸锡。Further, the curing agent is Dow Corning 184 curing agent, ethyl orthosilicate or tin dibutyl cinnamate.

进一步,步骤(2)中,贴片依次经去离子水、丙酮和无水乙醇超声清洗1~2次,压缩空气吹干。Further, in step (2), the patch is ultrasonically cleaned for 1-2 times with deionized water, acetone and anhydrous ethanol in sequence, and dried with compressed air.

进一步,步骤(2)中,最后用去离子水冲洗20~40s,氮气吹干。Further, in step (2), finally rinse with deionized water for 20-40s, and blow dry with nitrogen.

进一步,混合气体气流量为0.1~0.2L/min。Further, the gas flow rate of the mixed gas is 0.1 to 0.2 L/min.

进一步,疏水分子为三甲氧基(1H,1H,2H,2H-十七氟癸基)硅烷、三甲氧基(1H,1H,2H,2H-九氟己基)硅烷或三甲氧基(1H,1H,2H,2H-十三氟正辛基)硅烷。Further, the hydrophobic molecule is trimethoxy (1H, 1H, 2H, 2H-heptadecafluorodecyl) silane, trimethoxy (1H, 1H, 2H, 2H-nonafluorohexyl) silane or trimethoxy (1H, 1H , 2H, 2H-tridecafluoro-n-octyl) silane.

进一步,水溶性聚合物为聚乙烯亚胺、聚丙烯酰胺或甲氧基封端的聚乙二醇。Further, the water-soluble polymer is polyethyleneimine, polyacrylamide or methoxy-terminated polyethylene glycol.

采用上述的隐形防伪印章的制备方法制得的隐形防伪印章。The invisible anti-counterfeiting seal obtained by the above-mentioned preparation method of the invisible anti-counterfeiting seal.

综上所述,本发明具有以下优点:To sum up, the present invention has the following advantages:

1、本发明的隐形防伪印章主要通过表面的亲水/疏水间隔来实现转印,而在印章表面将会是一整块光滑均匀的平面,无法通过照片实现对印章的仿制,从而达到防伪的效果,制备方法流程简单,所需时间较短,有效解决了印章易被伪造等问题。1. The invisible anti-counterfeiting seal of the present invention mainly realizes the transfer through the hydrophilic/hydrophobic interval on the surface, and the surface of the seal will be a whole smooth and uniform plane, and the imitation of the seal cannot be realized by photos, so as to achieve anti-counterfeiting. The preparation method has the advantages of simple process and short required time, and effectively solves the problems of easy forgery of seals and the like.

2、在制备时以聚二甲基硅氧烷为原材料,通过与固化剂交联成型,制备得印章表面贴片,不同的聚二甲基硅氧烷和固化剂的质量比,所得贴片硬度也不同,可以制得不同手感的印章;随后对贴片进行氧等离子体处理,使整个贴片变为超亲水,且表面含有大量-OH,使得聚二甲基硅氧烷表面达到良好的亲水性且不出现裂纹。在进行印章制备时,不采用传统雕刻工艺。首先将与印章贴片表面契合的掩模贴在印章表面,随后通过激光刻蚀的方式将掩模刻掉多余部分,完成刻字;然后将贴有掩模的印章贴片置于反应腔体中,通过化学气相沉积的方法(CVD),将疏水分子(如三甲氧基(1H,1H,2H,2H-十七氟癸基)硅烷等)接枝于印章贴片表面,随后将掩模取掉即可完成印章制备。该制备工艺流程简单易控制,能够快速制得隐形防伪印章,提高印章的制备效率。2. In preparation, polydimethylsiloxane is used as the raw material, and the seal surface patch is prepared by cross-linking with the curing agent. The hardness is also different, and stamps with different feel can be made; then the patch is treated with oxygen plasma to make the whole patch become super-hydrophilic, and the surface contains a lot of -OH, so that the polydimethylsiloxane surface reaches a good hydrophilic and without cracks. In the preparation of the seal, no traditional engraving process is used. First, stick the mask that fits the surface of the stamp patch on the stamp surface, and then cut off the excess part of the mask by laser etching to complete the lettering; then place the stamp patch with the mask in the reaction chamber , by chemical vapor deposition (CVD), hydrophobic molecules (such as trimethoxy (1H, 1H, 2H, 2H-heptadecafluorodecyl) silane, etc.) are grafted on the surface of the stamp patch, and then the mask is removed. Drop to complete the stamp preparation. The preparation process is simple and easy to control, can quickly prepare an invisible anti-counterfeiting seal, and improve the preparation efficiency of the seal.

3、在打印掩膜时选用水溶性聚合物目的有二,一是在氧等离子体处理后,材料表面为亲水性,利用水溶性聚合物与表面相容性更好,粘附性更强;二是在最后一步去除掩模的过程中,可以直接通过水洗的操作进行去除,便于去除。本发明利用材料的亲水和疏水作用,实现了表面的光滑隐形,材料在接触墨水或印油后,可以完成特定的图案的转印,实现印章的隐形防伪,难以仿制伪造。3. There are two purposes of choosing water-soluble polymers when printing masks. First, after oxygen plasma treatment, the surface of the material is hydrophilic, and the use of water-soluble polymers has better compatibility with the surface and stronger adhesion. ; Second, in the process of removing the mask in the last step, it can be removed directly by the operation of water washing, which is convenient for removal. The invention utilizes the hydrophilic and hydrophobic effects of the material to achieve smooth and invisible surface. After the material contacts the ink or printing oil, the transfer of a specific pattern can be completed, and the invisible anti-counterfeiting of the seal is realized, which is difficult to imitate and forge.

附图说明Description of drawings

图1为隐形防伪印章的制备流程示意图。Figure 1 is a schematic diagram of the preparation process of the invisible anti-counterfeiting seal.

具体实施方式Detailed ways

实施例1Example 1

一种隐形防伪印章,其制备方法,依次包括以下步骤:An invisible anti-counterfeiting seal, the preparation method of which comprises the following steps in turn:

(1)贴片制备:将聚二甲基硅氧烷和道康宁184固化剂按质量比2:1混匀,然后放入真空干燥箱内脱泡1h,待气泡完全消失后取出并平铺在玻璃板上,二次脱泡20min,再倒入模具中,在60℃温度下固化成型2h,得贴片;(1) Patch preparation: Mix the polydimethylsiloxane and Dow Corning 184 curing agent in a mass ratio of 2:1, then put it into a vacuum drying oven for deaeration for 1 hour, take it out after the bubbles completely disappear, and spread it on the On the glass plate, defoamed for 20 minutes for a second time, then poured into the mold, and cured at 60 °C for 2 hours to obtain a patch;

(2)氧等离子体处理:将步骤(1)所得贴片依次经去离子水、丙酮和无水乙醇超声清洗2次,压缩空气吹干,然后氧等离子体处理30s,再放入0.5wt%十二烷基硫酸钠溶液中浸泡20s,最后用去离子水冲洗20s,氮气吹干,得聚二甲基硅氧烷表面;其中,氧等离子体处理时射频功率为120W,氧气流量为150sccm;(2) Oxygen plasma treatment: the patch obtained in step (1) was ultrasonically cleaned twice in sequence with deionized water, acetone and anhydrous ethanol, dried with compressed air, and then treated with oxygen plasma for 30s, and then put into 0.5wt% Soak in sodium dodecyl sulfate solution for 20s, finally rinse with deionized water for 20s, and blow dry with nitrogen to obtain the surface of polydimethylsiloxane; wherein, the radio frequency power during oxygen plasma treatment is 120W, and the oxygen flow rate is 150sccm;

(3)接枝疏水分子:采用聚乙烯亚胺在步骤(2)所得聚二甲基硅氧烷表面3D打印掩膜,然后置于氮气氛围中,通入混合气体,在60℃下加热120min,降温至室温后取出印章,最后用去离子水清洗3次,得隐形防伪印章;其中,混合气体通过以下方法制备得到:将三甲氧基(1H,1H,2H,2H-十七氟癸基)硅烷加热至气态,然后与氮气按体积比1:1混合,得混合气体;混合气体气流量为0.1L/min。(3) Grafting hydrophobic molecules: Polyethyleneimine was used to 3D print the mask on the surface of the polydimethylsiloxane obtained in step (2), then placed in a nitrogen atmosphere, a mixed gas was introduced, and heated at 60°C for 120min , after cooling to room temperature, take out the seal, and finally wash it with deionized water 3 times to obtain an invisible anti-counterfeiting seal; wherein, the mixed gas is prepared by the following method: trimethoxy (1H, 1H, 2H, 2H-heptadecafluorodecyl) ) silane is heated to a gaseous state, and then mixed with nitrogen in a volume ratio of 1:1 to obtain a mixed gas; the flow rate of the mixed gas is 0.1 L/min.

实施例2Example 2

一种隐形防伪印章,其制备方法,依次包括以下步骤:An invisible anti-counterfeiting seal, the preparation method of which comprises the following steps in turn:

(1)贴片制备:将聚二甲基硅氧烷和道康宁184固化剂按质量比4:1混匀,然后放入真空干燥箱内脱泡2h,待气泡完全消失后取出并平铺在玻璃板上,二次脱泡20~40min,再倒入模具中,在70℃温度下固化成型3h,得贴片;(1) Patch preparation: Mix the polydimethylsiloxane and Dow Corning 184 curing agent in a mass ratio of 4:1, and then put it into a vacuum drying oven for deaeration for 2 hours. After the bubbles completely disappear, take it out and spread it on a flat surface. On the glass plate, the second defoaming is performed for 20-40 minutes, then poured into the mold, and cured for 3 hours at a temperature of 70 °C to obtain a patch;

(2)氧等离子体处理:将步骤(1)所得贴片依次经去离子水、丙酮和无水乙醇超声清洗2次,压缩空气吹干,然后氧等离子体处理40s,再放入0.5wt%十二烷基硫酸钠溶液中浸泡30s,最后用去离子水冲洗30s,氮气吹干,得聚二甲基硅氧烷表面;其中,氧等离子体处理时射频功率为130W,氧气流量为155sccm;(2) Oxygen plasma treatment: the patch obtained in step (1) was ultrasonically cleaned twice in sequence with deionized water, acetone and anhydrous ethanol, dried with compressed air, and then treated with oxygen plasma for 40s, and then put into 0.5wt% Soak in sodium dodecyl sulfate solution for 30s, finally rinse with deionized water for 30s, and blow dry with nitrogen to obtain the surface of polydimethylsiloxane; wherein, the radio frequency power during oxygen plasma treatment is 130W, and the oxygen flow rate is 155sccm;

(3)接枝疏水分子:采用甲氧基封端的聚乙二醇在聚二甲基硅氧烷表面3D打印掩膜,然后置于氮气氛围中,通入混合气体,在70℃下加热100min,降温至室温后取出印章,最后用去离子水清洗3次,得隐形防伪印章;其中,混合气体通过以下方法制备得到:将三甲氧基(1H,1H,2H,2H-九氟己基)硅烷加热至气态,然后与氮气按体积比1:1混合,得混合气体;混合气体气流量为0.2L/min。(3) Grafting hydrophobic molecules: 3D printing a mask on the surface of polydimethylsiloxane using methoxy-terminated polyethylene glycol, then placing it in a nitrogen atmosphere, passing a mixed gas, and heating at 70 °C for 100 min , take out the seal after cooling to room temperature, and finally wash it with deionized water 3 times to obtain an invisible anti-counterfeiting seal; wherein, the mixed gas is prepared by the following method: trimethoxy (1H, 1H, 2H, 2H-nonafluorohexyl) silane It is heated to a gaseous state, and then mixed with nitrogen in a volume ratio of 1:1 to obtain a mixed gas; the flow rate of the mixed gas is 0.2L/min.

实施例3Example 3

一种隐形防伪印章,其制备方法,依次包括以下步骤:An invisible anti-counterfeiting seal, the preparation method of which comprises the following steps in turn:

(1)贴片制备:将聚二甲基硅氧烷和道康宁184固化剂按质量比6:1混匀,然后放入真空干燥箱内脱泡2h,待气泡完全消失后取出并平铺在玻璃板上,二次脱泡30min,再倒入模具中,在70℃温度下固化成型3h,得贴片;(1) Patch preparation: Mix the polydimethylsiloxane and Dow Corning 184 curing agent in a mass ratio of 6:1, then put it into a vacuum drying oven for deaeration for 2 hours, take it out after the bubbles completely disappear, and spread it on the On the glass plate, defoamed for 30 minutes for the second time, poured into the mold, and cured at 70 °C for 3 hours to obtain a patch;

(2)氧等离子体处理:将步骤(1)所得贴片依次经去离子水、丙酮和无水乙醇超声清洗2次,压缩空气吹干,然后氧等离子体处理40s,再放入0.5wt%十二烷基硫酸钠溶液中浸泡30s,最后用去离子水冲洗30s,氮气吹干,得聚二甲基硅氧烷表面;其中,氧等离子体处理时射频功率为130W,氧气流量为155sccm;(2) Oxygen plasma treatment: the patch obtained in step (1) was ultrasonically cleaned twice in sequence with deionized water, acetone and anhydrous ethanol, dried with compressed air, and then treated with oxygen plasma for 40s, and then put into 0.5wt% Soak in sodium dodecyl sulfate solution for 30s, finally rinse with deionized water for 30s, and blow dry with nitrogen to obtain the surface of polydimethylsiloxane; wherein, the radio frequency power during oxygen plasma treatment is 130W, and the oxygen flow rate is 155sccm;

(3)接枝疏水分子:采用聚乙烯亚胺在步骤(2)所得聚二甲基硅氧烷表面3D打印掩膜,然后置于氮气氛围中,通入混合气体,在80℃下加热80min,降温至室温后取出印章,最后用去离子水清洗3次,得隐形防伪印章;其中,混合气体通过以下方法制备得到:将三甲氧基(1H,1H,2H,2H-十三氟正辛基)硅烷加热至气态,然后与氮气按体积比1:1混合,得混合气体;混合气体气流量为0.1L/min。(3) Grafting hydrophobic molecules: Polyethyleneimine was used to 3D print the mask on the surface of the polydimethylsiloxane obtained in step (2), then placed in a nitrogen atmosphere, a mixed gas was introduced, and heated at 80°C for 80min , take out the seal after cooling to room temperature, and finally wash it with deionized water 3 times to obtain an invisible anti-counterfeiting seal; wherein, the mixed gas is prepared by the following method: base) silane is heated to a gaseous state, and then mixed with nitrogen in a volume ratio of 1:1 to obtain a mixed gas; the flow rate of the mixed gas is 0.1 L/min.

实施例4Example 4

一种隐形防伪印章,其制备方法,依次包括以下步骤:An invisible anti-counterfeiting seal, the preparation method of which comprises the following steps in turn:

(1)贴片制备:将聚二甲基硅氧烷和道康宁184固化剂按质量比8:1混匀,然后放入真空干燥箱内脱泡2h,待气泡完全消失后取出并平铺在玻璃板上,二次脱泡30min,再倒入模具中,在75℃温度下固化成型3h,得贴片;(1) Patch preparation: Mix polydimethylsiloxane and Dow Corning 184 curing agent in a mass ratio of 8:1, then put it into a vacuum drying oven for deaeration for 2 hours, take it out after the bubbles completely disappear, and spread it on the On the glass plate, defoamed for 30 minutes for a second time, poured into the mold, and cured at 75 °C for 3 hours to obtain a patch;

(2)氧等离子体处理:将步骤(1)所得贴片依次经去离子水、丙酮和无水乙醇超声清洗1次,压缩空气吹干,然后氧等离子体处理50s,再放入0.5wt%十二烷基硫酸钠溶液中浸泡30s,最后用去离子水冲洗30s,氮气吹干,得聚二甲基硅氧烷表面;其中,氧等离子体处理时射频功率为130W,氧气流量为158sccm;(2) Oxygen plasma treatment: the patch obtained in step (1) was ultrasonically cleaned once in turn with deionized water, acetone and anhydrous ethanol, dried with compressed air, and then treated with oxygen plasma for 50s, and then put into 0.5wt% Soak in sodium dodecyl sulfate solution for 30s, finally rinse with deionized water for 30s, and blow dry with nitrogen to obtain the surface of polydimethylsiloxane; wherein, the radio frequency power during oxygen plasma treatment is 130W, and the oxygen flow rate is 158sccm;

(3)接枝疏水分子:采用甲氧基封端的聚乙二醇在步骤(2)所得聚二甲基硅氧烷表面3D打印掩膜,然后置于氮气氛围中,通入混合气体,在80℃下加热60min,降温至室温后取出印章,最后用去离子水清洗3次,得隐形防伪印章;其中,混合气体通过以下方法制备得到:将三甲氧基(1H,1H,2H,2H-十七氟癸基)硅烷加热至气态,然后与氮气按体积比1:1混合,得混合气体;混合气体气流量为0.2L/min。(3) Grafting hydrophobic molecules: 3D printing a mask on the surface of the polydimethylsiloxane obtained in step (2) by using methoxy-terminated polyethylene glycol, and then placing it in a nitrogen atmosphere, introducing a mixed gas, and placing it in a nitrogen atmosphere. Heating at 80°C for 60min, cooling to room temperature, take out the seal, and finally wash it with deionized water 3 times to obtain an invisible anti-counterfeiting seal; wherein, the mixed gas is prepared by the following method: trimethoxy (1H, 1H, 2H, 2H- Heptadecafluorodecyl)silane is heated to a gaseous state, and then mixed with nitrogen in a volume ratio of 1:1 to obtain a mixed gas; the flow rate of the mixed gas is 0.2 L/min.

实施例5Example 5

一种隐形防伪印章,其制备方法,依次包括以下步骤:An invisible anti-counterfeiting seal, the preparation method of which comprises the following steps in turn:

(1)贴片制备:将聚二甲基硅氧烷和道康宁184固化剂按质量比10:1混匀,然后放入真空干燥箱内脱泡2h,待气泡完全消失后取出并平铺在玻璃板上,二次脱泡40min,再倒入模具中,在75℃温度下固化成型4h,得贴片;(1) Patch preparation: Mix the polydimethylsiloxane and Dow Corning 184 curing agent in a mass ratio of 10:1, and then put it into a vacuum drying oven for deaeration for 2 hours. After the bubbles completely disappear, take it out and spread it on a flat surface. On the glass plate, defoamed for 40 minutes for a second time, poured into the mold, and cured at 75 °C for 4 hours to obtain a patch;

(2)氧等离子体处理:将步骤(1)所得贴片依次经去离子水、丙酮和无水乙醇超声清洗2次,压缩空气吹干,然后氧等离子体处理60s,再放入0.6wt%十二烷基硫酸钠溶液中浸泡40s,最后用去离子水冲洗40s,氮气吹干,得聚二甲基硅氧烷表面;其中,氧等离子体处理时射频功率为140W,氧气流量为160sccm;(2) Oxygen plasma treatment: the patch obtained in step (1) was ultrasonically cleaned twice in turn with deionized water, acetone and absolute ethanol, dried with compressed air, and then treated with oxygen plasma for 60s, and then put into 0.6wt% Soak in sodium dodecyl sulfate solution for 40s, finally rinse with deionized water for 40s, and blow dry with nitrogen to obtain the surface of polydimethylsiloxane; wherein, the radio frequency power during oxygen plasma treatment is 140W, and the oxygen flow rate is 160sccm;

(3)接枝疏水分子:采用聚丙烯酰胺在步骤(2)所得聚二甲基硅氧烷表面3D打印掩膜,然后置于氮气氛围中,通入混合气体,在80℃下加热80min,降温至室温后取出印章,最后用去离子水清洗4次,得隐形防伪印章;其中,混合气体通过以下方法制备得到:将三甲氧基(1H,1H,2H,2H-九氟己基)硅烷加热至气态,然后与氮气按体积比1:1混合,得混合气体;混合气体气流量为0.2L/min。(3) Grafting hydrophobic molecules: use polyacrylamide to 3D print the mask on the surface of the polydimethylsiloxane obtained in step (2), then place it in a nitrogen atmosphere, pass in a mixed gas, and heat it at 80 °C for 80 minutes, After cooling to room temperature, take out the seal, and finally wash it with deionized water 4 times to obtain an invisible anti-counterfeiting seal; wherein, the mixed gas is prepared by the following method: heating trimethoxy (1H, 1H, 2H, 2H-nonafluorohexyl) silane to a gaseous state, and then mixed with nitrogen in a volume ratio of 1:1 to obtain a mixed gas; the flow rate of the mixed gas is 0.2L/min.

虽然结合附图对本发明的具体实施方式进行了详细地描述,但不应理解为对本专利的保护范围的限定。在权利要求书所描述的范围内,本领域技术人员不经创造性劳动即可作出的各种修改和变形仍属本专利的保护范围。Although the specific embodiments of the present invention have been described in detail with reference to the accompanying drawings, they should not be construed as limiting the protection scope of this patent. Within the scope described in the claims, various modifications and variations that can be made by those skilled in the art without creative efforts still belong to the protection scope of this patent.

Claims (9)

1.一种隐形防伪印章的制备方法,其特征在于,依次包括以下步骤:1. a preparation method of invisible anti-counterfeiting seal, is characterized in that, comprises the following steps successively: (1)贴片制备:将聚二甲基硅氧烷和固化剂按质量比2~10:1混匀,然后放入真空干燥箱内脱泡1~2h,待气泡完全消失后取出并平铺在玻璃板上,二次脱泡20~40min,再倒入模具中,在60~75℃温度下固化成型2~4h,得贴片;(1) Patch preparation: Mix the polydimethylsiloxane and curing agent in a mass ratio of 2 to 10:1, then put them into a vacuum drying oven for deaeration for 1 to 2 hours. After the bubbles disappear completely, take them out and flatten them. Spread it on a glass plate, defoaming the second time for 20-40 minutes, then pour it into a mold, and cure it at a temperature of 60-75 °C for 2-4 hours to obtain a patch; (2)氧等离子体处理:将步骤(1)所得贴片清洗并吹干,然后氧等离子体处理30~60s,再放入0.4~0.6wt%十二烷基硫酸钠溶液中浸泡20~40s,最后依次经冲洗、吹干,得聚二甲基硅氧烷表面;其中,氧等离子体处理时射频功率为120~140W,氧气流量为150~160sccm;(2) Oxygen plasma treatment: the patch obtained in step (1) is cleaned and blown dry, then treated with oxygen plasma for 30-60s, and then placed in 0.4-0.6wt% sodium dodecyl sulfate solution to soak for 20-40s , and finally washed and dried in sequence to obtain the surface of polydimethylsiloxane; wherein, the radio frequency power during the oxygen plasma treatment is 120-140W, and the oxygen flow rate is 150-160sccm; (3)接枝疏水分子:采用水溶性聚合物在步骤(2)所得聚二甲基硅氧烷表面3D打印掩膜,然后置于氮气氛围中,通入混合气体,在60~80℃下加热60~120min,降温至室温后取出印章,最后用去离子水清洗2~4次,得隐形防伪印章;其中,所述混合气体通过以下方法制备得到:将疏水分子加热至气态,然后与氮气按体积比1:1混合,得混合气体。(3) Grafting hydrophobic molecules: 3D printing a mask on the surface of the polydimethylsiloxane obtained in step (2) by using a water-soluble polymer, and then placing it in a nitrogen atmosphere, introducing a mixed gas, at 60-80 °C Heating for 60-120min, cooling to room temperature, taking out the seal, and finally washing with deionized water for 2-4 times to obtain an invisible anti-counterfeiting seal; wherein, the mixed gas is prepared by the following method: heating hydrophobic molecules to a gaseous state, then mixing with nitrogen Mix according to the volume ratio of 1:1 to obtain a mixed gas. 2.如权利要求1所述的隐形防伪印章的制备方法,其特征在于,所述聚二甲基硅氧烷粘度为10~2000mPa.s。2 . The method for preparing an invisible anti-counterfeiting seal according to claim 1 , wherein the viscosity of the polydimethylsiloxane is 10-2000 mPa.s. 3 . 3.如权利要求1所述的隐形防伪印章的制备方法,其特征在于,所述固化剂为道康宁184固化剂、正硅酸乙酯或二月二丁基肉桂酸锡。3. The preparation method of the invisible anti-counterfeiting seal as claimed in claim 1, wherein the curing agent is Dow Corning 184 curing agent, ethyl orthosilicate or dibutyltin cinnamate. 4.如权利要求1所述的隐形防伪印章的制备方法,其特征在于,步骤(2)中,贴片依次经去离子水、丙酮和无水乙醇超声清洗1~2次,压缩空气吹干。4. The preparation method of an invisible anti-counterfeiting seal as claimed in claim 1, wherein in step (2), the patch is ultrasonically cleaned in deionized water, acetone and absolute ethanol for 1 to 2 times successively, and dried with compressed air. . 5.如权利要求1所述的隐形防伪印章的制备方法,其特征在于,步骤(2)中,最后用去离子水冲洗20~40s,氮气吹干。5 . The method for preparing an invisible anti-counterfeiting seal according to claim 1 , wherein in step (2), rinse with deionized water for 20-40 s and dry with nitrogen. 6 . 6.如权利要求1所述的隐形防伪印章的制备方法,其特征在于,所述混合气体气流量为0.1~0.2L/min。6 . The method for preparing an invisible anti-counterfeiting seal according to claim 1 , wherein the gas flow rate of the mixed gas is 0.1-0.2 L/min. 7 . 7.如权利要求1所述的隐形防伪印章的制备方法,其特征在于,所述疏水分子为三甲氧基(1H,1H,2H,2H-十七氟癸基)硅烷、三甲氧基(1H,1H,2H,2H-九氟己基)硅烷或三甲氧基(1H,1H,2H,2H-十三氟正辛基)硅烷。7. The preparation method of invisible anti-counterfeiting seal as claimed in claim 1, wherein the hydrophobic molecule is trimethoxy (1H, 1H, 2H, 2H-heptadecafluorodecyl) silane, trimethoxy (1H ,1H,2H,2H-nonafluorohexyl)silane or trimethoxy(1H,1H,2H,2H-tridecafluoro-n-octyl)silane. 8.如权利要求1所述的隐形防伪印章的制备方法,其特征在于,所述水溶性聚合物为聚乙烯亚胺、聚丙烯酰胺或甲氧基封端的聚乙二醇。8 . The method for preparing an invisible anti-counterfeiting seal according to claim 1 , wherein the water-soluble polymer is polyethyleneimine, polyacrylamide or methoxy-terminated polyethylene glycol. 9 . 9.采用权利要求1~8任一项所述的隐形防伪印章的制备方法制得的隐形防伪印章。9. The invisible anti-counterfeiting seal prepared by the method for preparing the invisible anti-counterfeiting seal according to any one of claims 1 to 8.
CN202010668204.8A 2020-07-13 2020-07-13 A kind of invisible anti-counterfeiting seal and preparation method thereof Pending CN111976070A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114624814A (en) * 2022-05-12 2022-06-14 天津工业大学 Flexible electrocardio demodulation electron skin based on polymer photon integrated chip

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104464505A (en) * 2014-11-28 2015-03-25 中国科学院深圳先进技术研究院 Novel anti-counterfeit mark and manufacturing method thereof
CN107175939A (en) * 2016-03-09 2017-09-19 华邦电子股份有限公司 Stamp for printed circuit manufacturing process, manufacturing method thereof and printed circuit manufacturing process

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104464505A (en) * 2014-11-28 2015-03-25 中国科学院深圳先进技术研究院 Novel anti-counterfeit mark and manufacturing method thereof
CN107175939A (en) * 2016-03-09 2017-09-19 华邦电子股份有限公司 Stamp for printed circuit manufacturing process, manufacturing method thereof and printed circuit manufacturing process

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
徐铜文编著: "《膜化学与技术教程》", 31 December 2003, 中国科学技术大学出版社 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114624814A (en) * 2022-05-12 2022-06-14 天津工业大学 Flexible electrocardio demodulation electron skin based on polymer photon integrated chip
CN114624814B (en) * 2022-05-12 2022-07-29 天津工业大学 A flexible cardiac electromodulatory electronic skin based on a polymer photonic integrated chip

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