CN111976040B - Water tank on monocrystalline silicon wafer chamfering machine - Google Patents
Water tank on monocrystalline silicon wafer chamfering machine Download PDFInfo
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- CN111976040B CN111976040B CN202010902809.9A CN202010902809A CN111976040B CN 111976040 B CN111976040 B CN 111976040B CN 202010902809 A CN202010902809 A CN 202010902809A CN 111976040 B CN111976040 B CN 111976040B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0076—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work
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- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
The invention discloses a water tank on a monocrystalline silicon wafer chamfering machine, which comprises a rectangular water tank, wherein a semicircular bottom shell is formed at the lower end of the water tank, a circular arc-shaped water outlet is formed in the outer wall of the front end of the bottom shell, and an inclined guide plate is formed by bending the side edge of the bottom shell at the lower side of the water outlet; the water outlet is connected with the bottom shell through a water inlet pipe, the bottom shell is internally inserted with an arc-shaped cover plate for covering the water outlet, the upper side and the lower side of the cover plate respectively abut against the arc-shaped inner wall of the bottom shell, circular end plates are formed at two ends of the cover plate, the end plates abut against the inner walls at two sides of the bottom shell and are formed with support shafts, and the support shafts are inserted into the bottom shell; one end of the support shaft extends out of the insertion sleeve of the bottom shell and is fixedly provided with a driving plate, an arc-shaped guide groove is formed in the driving plate, an internal thread column sleeve is inserted in the guide groove and is welded and fixed on the outer wall of the bottom shell, a fastening bolt is screwed in the internal thread column sleeve, and the head of the fastening bolt is pressed against the driving plate.
Description
Technical Field
The invention relates to the technical field of semiconductor chamfering machines, in particular to a water tank on a monocrystalline silicon wafer chamfering machine.
Background
At present, a semiconductor is generally referred to as a silicon wafer, and a finished product after the silicon wafer is processed and produced is generally referred to as a round wafer. The silicon wafer is from quartz sand, and the production process of the monocrystalline silicon wafer comprises single crystal pulling, outer ring grinding, slicing, annealing, chamfering, grinding or lapping and CMP. Chamfering is needed to be carried out on the monocrystalline silicon wafer: and polishing the annealed silicon wafer into an arc shape to prevent the edge of the silicon wafer from cracking and the generation of lattice defects and increase the flatness of the epitaxial layer and the photoresist layer. In the chamfering process, emulsion is sprayed on the outer ring of the silicon wafer cut by the cutter, so that the temperature can be reduced and the silicon wafer can be lubricated, and residues can be washed away;
however, the silicon wafer after chamfering still has residues, some chamfering machines drive the movable water tanks by using the chain belt which can vertically lift and circulate to complete the chamfering and put the silicon wafer into the water tank at the upper end of the chain belt, then moving to the lower end of the chain belt, taking out the silicon chip in the water tank, realizing the cleaning of the surface of the silicon chip, meanwhile, when the water tank moves to the other side of the chain belt, the water tank can turn over to pour the water with the residues into a water tank arranged at the lower side, and then the residue will gradually accumulate at the bottom of the water pool, the water pool on the existing chamfering machine is a rectangular groove body, the groove body is fixed on the chamfering machine, and meanwhile, the groove body is provided with a water filtering and circulating structure, that is, the tank body needs to supply water for the accompanying water tank on the chain belt, when the residue is accumulated too much, the tank body needs to be cleaned, otherwise, the water quality in the accompanying water tank is influenced, but the residue cleaning work in the existing tank body is troublesome.
Disclosure of Invention
The invention aims to overcome the defects in the prior art and provides a water tank on a monocrystalline silicon wafer chamfering machine, which is designed to facilitate drainage and cleaning of cutting residues accumulated at the bottom of the water tank.
In order to achieve the purpose, the technical scheme adopted by the invention is as follows:
a water tank on a monocrystalline silicon wafer chamfering machine comprises a rectangular water tank, wherein a semicircular bottom shell is formed at the lower end of the water tank, an arc-shaped water outlet is formed in the outer wall of the front end of the bottom shell, and an inclined guide plate is formed by bending the side edge of the bottom shell at the lower side of the water outlet; the water outlet is connected with the bottom shell through a water inlet pipe, the bottom shell is internally inserted with an arc-shaped cover plate for covering the water outlet, the upper side and the lower side of the cover plate respectively abut against the arc-shaped inner wall of the bottom shell, circular end plates are formed at two ends of the cover plate, the end plates abut against the inner walls at two sides of the bottom shell and are formed with support shafts, and the support shafts are inserted into the bottom shell; one end of the support shaft extends out of the insertion sleeve of the bottom shell and is fixedly provided with a driving plate, an arc-shaped guide groove is formed in the driving plate, an internal thread column sleeve is inserted in the guide groove and is welded and fixed on the outer wall of the bottom shell, a fastening bolt is screwed in the internal thread column sleeve, and the head of the fastening bolt is pressed against the driving plate.
Preferably, a water replenishing pipe is arranged right above the driving plate and is fixedly inserted on the side wall of the upper end of the water tank.
Preferably, water baffles are fixed on two sides of the guide plate, arc-shaped upper side edges are formed on the water baffles, and the upper side edges of the water baffles abut against two side edges of the water outlet.
Preferably, the water tank is fixed with a plurality of rectangular fixed sleeves through an insert sleeve, a plurality of vertical tubular supports are fixed on the rear end face of each fixed sleeve, a plurality of hanging holes are formed in each tubular support, and each hanging hole consists of an upper strip-shaped groove and a lower round hole.
Preferably, the circular arc radius of the outer wall of the cover plate is equal to the circular arc radius of the inner wall of the bottom shell, the central axis of the circular arc of the cover plate, the central axis of the cover plate and the central axis of the fulcrum are on the same straight line, and the circular arc center of the guide groove in the drive plate is located on the central axis of the fulcrum.
Preferably, the upper side and the lower side of the cover plate are formed with triangular scraping strips, and the scraping strips are abutted against the inner wall of the circular arc of the bottom shell.
Preferably, the shaping has the increase plate on the end plate of apron one side, and the shaping has heavy groove on the outer wall of increase plate upper end, support on the inside wall of increase plate to have the baffle, the both sides limit of baffle is fixed on the basin inner wall, and the lower extreme shaping of baffle has a plurality ofly and sinks the filtration pore that the groove is linked together, and the baffle encloses with the inner wall of basin and establishes the shaping and has the basin of getting, and the water intaking groove distributes directly over the increase plate.
Preferably, the lower end surface of the partition board is horizontal, and the central axis of the end board is positioned in the lower end surface of the partition board.
The invention has the beneficial effects that: the water tank is designed, so that water can be drained conveniently, and cutting residues accumulated at the bottom of the water tank can be cleaned.
Drawings
FIG. 1 is a schematic perspective view of the present invention;
FIG. 2 is a front view of the present invention;
FIG. 3 is a schematic top view of the present invention;
FIG. 4 is a schematic view of a half section of the present invention;
in the figure: 1. a water tank; 11. a bottom case; 12. a water outlet; 13. a baffle; 2. a cover plate; 21. an end plate; 22. a fulcrum; 23. increasing the thickness of the plate; 24. sinking a groove; 3. a water baffle; 4. a dial; 41. a guide groove; 5. fastening a bolt; 6. a partition plate; 61. a filtration pore; 7. a water replenishing pipe; 8. fixing a sleeve; 9. a tubular stent; 91. and (7) hanging holes.
Detailed Description
Example (b): as shown in fig. 1 to 4, the water tank on the monocrystalline silicon wafer chamfering machine comprises a rectangular water tank 1, wherein a semicircular bottom shell 11 is formed at the lower end of the water tank 1, an arc-shaped water outlet 12 is formed on the outer wall of the front end of the bottom shell 11, and an inclined guide plate 13 is formed by bending the side edge of the bottom shell 11 at the lower side of the water outlet 12; the water drainage device is characterized in that a circular arc-shaped cover plate 2 covering the water drainage port 12 is inserted in the bottom shell 11, the upper side edge and the lower side edge of the cover plate 2 are respectively abutted against the arc-shaped inner wall of the bottom shell 11, circular end plates 21 are formed at two ends of the cover plate 2, the end plates 21 are abutted against the inner walls at two sides of the bottom shell 11 and are formed with support shafts 22, and the support shafts 22 are inserted on the bottom shell 11; one end of the fulcrum shaft 22 extends out of the bottom shell 11 and is fixedly inserted with a dial 4, a circular arc-shaped guide groove 41 is formed on the dial 4, an internal thread column sleeve is inserted in the guide groove 41 and is welded and fixed on the outer wall of the bottom shell 11, a fastening bolt 5 is screwed in the internal thread column sleeve, and the head of the fastening bolt 5 is pressed on the dial 4.
A water replenishing pipe 7 is arranged right above the driving plate 4, and the water replenishing pipe 7 is inserted and fixed on the side wall of the upper end of the water tank 1.
The two sides of the guide plate 13 are fixed with the water baffle 3, the water baffle 3 is formed with an arc-shaped upper side edge, and the upper side edge of the water baffle 3 is abutted against the two side edges of the water outlet 12.
The basin 1 on the plug bush be fixed with the fixed cover 8 of a plurality of rectangle, be fixed with a plurality of vertical tubulose support 9 on the rear end face of fixed cover 8, the shaping has a plurality of hanging hole 91 on the tubulose support 9, hanging hole 91 comprises the bar groove on upper portion and the round hole of lower part.
The arc radius of the outer wall of the cover plate 2 is equal to the arc radius of the inner wall of the bottom shell 11, the central axis of the arc of the cover plate 2, the central axis of the cover plate 2 and the central axis of the fulcrum 22 are on the same straight line, and the arc center of the guide groove 41 on the dial plate 4 is located on the central axis of the fulcrum 22.
Triangular scraping strips are formed on the upper side and the lower side of the cover plate 2 and abut against the arc inner wall of the bottom shell 11.
The shaping has bodiness board 23 on the end plate 21 of 2 one sides of apron, and the shaping has heavy groove 24 on the outer wall of bodiness board 23 upper end, support on the inside wall of bodiness board 23 and lean on there being baffle 6, and the both sides limit of baffle 6 is fixed on basin 1 inner wall, and the lower extreme shaping of baffle 6 has a plurality of filtration pores 61 that are linked together with heavy groove 24, and baffle 6 encloses with the inner wall of basin 1 and establishes the shaping and have water intaking groove an, and water intaking groove an distributes directly over bodiness board 23.
The lower end surface of the partition plate 6 is horizontal, and the central axis of the end plate 21 is positioned in the lower end surface of the partition plate 6.
The working principle is as follows: the invention relates to a water tank on a monocrystalline silicon wafer chamfering machine, wherein a semicircular bottom shell 11 is arranged on a water tank 1, a water outlet 12 is formed in the bottom shell 11, the water outlet 12 is covered by a cover plate 2, the cover plate 2 can rotate by rotating a drive plate 4, the cover plate 2 can open the water outlet 12, and meanwhile, residues accumulated on the inner wall of the bottom shell 11 can be scraped; the residue can be discharged together with the water flow; meanwhile, after the cover plate 2 rotates, the inner wall of the cover plate 2 is exposed at the water outlet 12, residues on the inner wall of the cover plate 2 can be scraped from the water outlet 12, and cleaning is achieved;
meanwhile, the end plate 21 on the cover plate 2 is matched with the partition plate 6 to separate the water taking tank after water outlet filtration in the water tank, and water in the water taking tank is filtered to be clean through the filter holes 61 and can supply water for the traveling water tank on the chain belt.
The examples are intended to illustrate the invention, but not to limit it. The described embodiments may be modified by those skilled in the art without departing from the spirit and scope of the present invention, and therefore, the scope of the appended claims should be accorded the full scope of the invention as set forth in the appended claims.
Claims (6)
1. The water tank on the monocrystalline silicon wafer chamfering machine comprises a rectangular water tank (1) and is characterized in that: a semicircular bottom shell (11) is formed at the lower end of the water tank (1), a circular arc-shaped water outlet (12) is formed in the outer wall of the front end of the bottom shell (11), and an inclined guide plate (13) is formed by bending the side edge of the bottom shell (11) at the lower side of the water outlet (12); the water draining device is characterized in that a circular arc-shaped cover plate (2) covering the water draining opening (12) is inserted in the bottom shell (11), the upper side and the lower side of the cover plate (2) are respectively abutted against the arc-shaped inner wall of the bottom shell (11), circular end plates (21) are formed at two ends of the cover plate (2), the end plates (21) are abutted against the inner walls at two sides of the bottom shell (11) and are formed with support shafts (22), and the support shafts (22) are inserted in the bottom shell (11); one end of the fulcrum shaft (22) extends out of the bottom shell (11) and is fixedly provided with a driving plate (4) in an inserting way, a circular arc-shaped guide groove (41) is formed in the driving plate (4), an internal thread column sleeve is inserted in the guide groove (41) and is welded and fixed on the outer wall of the bottom shell (11), a fastening bolt (5) is screwed in the internal thread column sleeve, and the head of the fastening bolt (5) is pressed on the driving plate (4);
the arc radius of the outer wall of the cover plate (2) is equal to the arc radius of the inner wall of the bottom shell (11), the central axis of the arc of the cover plate (2), the central axis of the cover plate (2) and the central axis of the fulcrum shaft (22) are on the same straight line, and the arc circle center of the guide groove (41) on the drive plate (4) is positioned on the central axis of the fulcrum shaft (22);
triangular scraping strips are formed on the upper side and the lower side of the cover plate (2), and the scraping strips are abutted against the inner wall of the circular arc of the bottom shell (11).
2. The water tank of the monocrystalline silicon wafer chamfering machine according to claim 1, wherein: a water replenishing pipe (7) is arranged right above the driving plate (4), and the water replenishing pipe (7) is spliced and fixed on the side wall of the upper end of the water tank (1).
3. The water tank of the monocrystalline silicon wafer chamfering machine according to claim 1, wherein: the water deflector (3) is fixed on two sides of the guide plate (13), the circular arc-shaped upper side edge is formed on the water deflector (3), and the upper side edge of the water deflector (3) is abutted against two side edges of the water outlet (12).
4. The water tank of the monocrystalline silicon wafer chamfering machine according to claim 1, wherein: basin (1) go up the plug bush and be fixed with fixed cover (8) of a plurality of rectangle, be fixed with a plurality of vertical tubulose support (9) on the rear end face of fixed cover (8), the shaping has a plurality of hanging hole (91) on tubulose support (9), hanging hole (91) comprise bar groove on upper portion and the round hole of lower part.
5. The water tank of the monocrystalline silicon wafer chamfering machine according to claim 1, wherein: the shaping has increased thick plate (23) on end plate (21) of apron (2) one side, and the shaping has heavy groove (24) on the outer wall of increased thick plate (23) upper end, support on the inside wall of increased thick plate (23) and lean on baffle (6), and the both sides limit of baffle (6) is fixed on basin (1) inner wall, and the lower extreme shaping of baffle (6) has a plurality of filtration holes (61) that are linked together with heavy groove (24), and baffle (6) enclose with the inner wall of basin (1) to establish the shaping and have and get basin (a), gets basin (a) and distributes directly over increased thick plate (23).
6. The water tank of the monocrystalline silicon piece chamfering machine according to claim 5, wherein: the lower end surface of the partition plate (6) is horizontal, and the central axis of the end plate (21) is positioned in the lower end surface of the partition plate (6).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010902809.9A CN111976040B (en) | 2020-09-01 | 2020-09-01 | Water tank on monocrystalline silicon wafer chamfering machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010902809.9A CN111976040B (en) | 2020-09-01 | 2020-09-01 | Water tank on monocrystalline silicon wafer chamfering machine |
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| CN111976040A CN111976040A (en) | 2020-11-24 |
| CN111976040B true CN111976040B (en) | 2022-08-02 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN203213216U (en) * | 2012-10-24 | 2013-09-25 | 黄开铖 | Integrated energy-saving multifunctional water tank |
| CN102987955A (en) * | 2012-11-27 | 2013-03-27 | 王琰 | Pot cover frame for kitchen |
| CN104385638B (en) * | 2014-10-08 | 2017-01-18 | 山东钢铁股份有限公司 | Glass fiber reinforced plastic water tank crack repairing technology |
| CN209317114U (en) * | 2018-11-16 | 2019-08-30 | 晁中芳 | A kind of sewage precipitation device |
| CN110953367B (en) * | 2019-12-14 | 2021-12-14 | 台州尚瑞特进出口有限公司 | Water-saving device applied to faucet |
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Effective date of registration: 20220706 Address after: Room 3062, floor 3, building a, Suzhou Intelligent Manufacturing Service Industrial Park, Wangsheng Road, Huangqiao street, Xiangcheng District, Suzhou, Jiangsu 215000 Applicant after: Suzhou dongtinghe Intelligent Technology Development Co.,Ltd. Address before: 341003 Ganzhou yerun automation equipment Co., Ltd. north of Gongyi Road, Hong Kong Industrial Park, Ganzhou Economic Development Zone, Ganzhou City, Jiangxi Province Applicant before: Ganzhou yerun automation equipment Co.,Ltd. |
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