CN111945112A - Method for manufacturing vacuum tin plate - Google Patents
Method for manufacturing vacuum tin plate Download PDFInfo
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- CN111945112A CN111945112A CN201910397647.5A CN201910397647A CN111945112A CN 111945112 A CN111945112 A CN 111945112A CN 201910397647 A CN201910397647 A CN 201910397647A CN 111945112 A CN111945112 A CN 111945112A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
Abstract
The invention discloses a manufacturing method of a vacuum tin plate, which comprises the following steps: s1, cleaning the secondary cold-rolled strip steel; s2, pre-plating the cleaned secondary cold-rolled strip steel; s3, after the surface of the pre-plated secondary cold-rolled strip steel is plated with tin or tin alloy, performing reflow treatment to obtain a tin plate; and S4, passivating and degreasing the tin plate. The invention has the following beneficial effects: the acid washing process is omitted; the problems of high pollution, more restriction links and the like in the electroplating process are avoided; avoiding the oxidation of the tin layer in the reflow process. The technology is an environment-friendly tin plate manufacturing method with strong adaptability, high production efficiency and excellent plating layer performance.
Description
Technical Field
The invention belongs to the technical field of metal material manufacturing, and relates to a manufacturing method of a vacuum tin plate.
Background
The tin plate is a cold-rolled low-carbon steel sheet or strip plated with pure tin on both sides, and can combine the strength and formability of the steel with the corrosion resistance, the tin weldability and the aesthetic property of tin. Currently, tin-plated sheets are manufactured by mainly electroplating tin on a steel substrate by a continuous electroplating process. The tin electroplating method comprises the following process flows (shown in figure 1): chemical degreasing, electrolytic degreasing, acid washing, electroplating, reflow, passivation and oiling.
The acid cleaning before the strip steel enters the electrotinning tank is a weak acid cleaning for removing a thin oxide film which is invisible to naked eyes, and generally sulfuric acid or hydrochloric acid is used as an acid cleaning solution. The use of sulfuric acid pickling has the following problems: the sulfuric acid pickling solution has poor dissolving capacity for metal oxides at room temperature, the dissolving capacity cannot be obviously increased even if the concentration of sulfuric acid is increased, and the problems of over-pickling and hydrogen embrittlement are easily caused if the pickling speed is increased by increasing the temperature. The use of hydrochloric acid pickling has the following problems: the concentration of the needed hydrochloric acid is high, the consumption is large, the cost is high, the volatility of the hydrochloric acid is large, and the equipment and the environment are easy to corrode.
In the electroplating process, pure tin or tin alloy is converted into an ionic state under the action of potential through electrolysis by adopting an electrolytic deposition principle and enters into electrolyte, and then the ionic state is deposited on a metal plate through the action of potential to form a tin-plated layer. The plating solution contains various substances which pollute the environment, such as organic additives, reducing agents, brightening agents and the like with specific components, the environmental pollution is very serious, and the treatment of the tin plating solution is always a difficult problem in the production of the tin plate. The conditions of the tin electroplating process are very harsh, the operation difficulty is high, and the product quality stability is another problem in the tin plating industry. In addition, the tin electroplating process has low production efficiency and large equipment investment, and the process adaptability is limited due to an ion conversion process.
The next step after electroplating is reflow, in which the tin coating is instantaneously melted, a bright finish is formed on the surface of the tin plate, and a very thin iron-tin alloy layer is formed at the interface of the tin coating-steel substrate, which improves the solderability and corrosion resistance of the tin plate. In the process, an oxide layer is formed on the surface of the tin plate, the oxide film is very sensitive to the reflow temperature, and when the oxide film is seriously developed, the tin plate is easy to turn yellow, so that high requirements on passivation and oiling are provided, and the product quality is seriously influenced by the oxide film.
Disclosure of Invention
The invention aims to overcome the defects of the existing pickling process, electroplating process and reflow process and provides a method for manufacturing a vacuum tin plate.
The invention is realized by the following technical scheme:
the invention provides a manufacturing method of a vacuum tin plate, which comprises the following steps:
s1, cleaning the secondary cold-rolled strip steel;
s2, pre-plating the cleaned secondary cold-rolled strip steel;
s3, after the surface of the pre-plated secondary cold-rolled strip steel is plated with tin or tin alloy, performing reflow treatment to obtain a tin plate;
and S4, passivating and degreasing the tin plate.
The pre-plating process can cover the oxide layer on the surface of the strip steel, and eliminate the influence of the oxide layer on the adhesion strength of the plating layer, which is also the reason for eliminating the pickling section.
As a preferred scheme, the step of cleaning specifically comprises the following operations:
and (3) sequentially carrying out chemical degreasing and electrolytic degreasing on the secondary cold-rolled strip steel, and rinsing with pure water, wherein the temperature of the chemical degreasing is 70-85 ℃.
Preferably, the pre-plating step specifically comprises the following operations:
heating the cleaned secondary cold-rolled strip steel to 150-300 ℃, and then carrying out plasma sputtering cleaning under the vacuum degree of 0.01-10 Pa;
and depositing a pre-coating on the surface of the secondary cold-rolled strip steel subjected to plasma cleaning by adopting a PVD method at a continuous movement speed of 30-400 m/min.
Preferably, the PVD method includes one of multi-arc ion plating, magnetron sputtering plating, induction evaporation plating, resistance evaporation plating, induction evaporation spray deposition plating, and resistance evaporation spray deposition plating.
Preferably, when the PVD method is multi-arc ion plating and magnetron sputtering plating, the distance between the target and the steel plate is 50-100 mm; when the PVD method is induction evaporation coating, resistance evaporation coating, induction evaporation spray deposition coating and resistance evaporation spray deposition coating, the distance between an evaporation source and a steel plate is 10-100 mm; when the PVD method is induction evaporation spray deposition coating and resistance evaporation spray deposition coating, the distance between an evaporation source and a steel plate is 10-100 mm; the PVD method comprises the steps of induction evaporation spray deposition coating and resistance evaporation spray deposition coating, wherein the spraying speed is 200-500 m/min.
Preferably, the material of the pre-plating layer is at least one of tin, titanium, chromium, zinc, iron, magnesium, aluminum, nickel, silicon, copper, molybdenum and tungsten.
Preferably, step S3 specifically includes the following steps:
plating a tin layer or a tin alloy layer on the surface of the preplating layer by a PVD method at the temperature of 150-300 ℃ and under the condition of a vacuum degree of 0.0001-100 Pa.
Preferably, the continuous movement speed of the secondary cold-rolled strip steel is 30-400 m/min.
Preferably, the PVD method includes one of multi-arc ion plating, magnetron sputtering plating, induction evaporation plating, resistance evaporation plating, induction evaporation spray deposition plating, and resistance evaporation spray deposition plating.
Preferably, when the PVD method is multi-arc ion plating and magnetron sputtering plating, the distance between the target and the steel plate is 50-100 mm; when the PVD method is induction evaporation coating, resistance evaporation coating, induction evaporation spray deposition coating and resistance evaporation spray deposition coating, the distance between an evaporation source and a steel plate is 10-100 mm; when the PVD method is induction evaporation spray deposition coating and resistance evaporation spray deposition coating, the distance between an evaporation source and a steel plate is 10-100 mm; the PVD method comprises the steps of induction evaporation spray deposition coating and resistance evaporation spray deposition coating, wherein the spraying speed is 200-500 m/min.
Preferably, the reflow treatment method is resistance reflow and/or induction reflow, and the temperature of the reflow treatment is 245-300 ℃.
Compared with the prior art, the invention has the following beneficial effects:
1. the acid washing process is omitted; the problems of high pollution, more restriction links and the like in the electroplating process are avoided; oxidation in the reflow process of the tin layer is avoided;
2. the tin plate with single component, composite component and gradient transition can be prepared;
3. has the advantages of no heat influence on the base material, no substrate pickling process section, no surface oxidation during softening, high production efficiency, no pollution, flexible process, high surface quality and the like.
4. The method for manufacturing the tin plate is environment-friendly, strong in adaptability, high in production efficiency and excellent in plating layer performance.
Drawings
Other features, objects and advantages of the invention will become more apparent upon reading of the detailed description of non-limiting embodiments with reference to the following drawings:
FIG. 1 is a flow chart of a conventional tin plate electroplating process;
FIG. 2 is a process flow of the method for manufacturing a vacuum tin plate according to the present invention.
Detailed Description
The present invention will be described in detail with reference to specific examples. The following examples will assist those skilled in the art in further understanding the invention, but are not intended to limit the invention in any way. It should be noted that variations and modifications can be made by persons skilled in the art without departing from the spirit of the invention. All falling within the scope of the present invention.
Example 1:
this example selects DC06 steel as the substrate, chromium as the pre-coat material, and tin as the top coat. A corrosion-resistant coating (shown in fig. 2) was prepared as follows:
carrying out chemical degreasing, electrolytic degreasing, rinsing and drying on the strip steel to remove pollutants such as grease and solid particles on the surface;
secondly, the strip steel enters a vacuumized vacuum chamber through an inlet vacuum lock, the surface of the strip steel is preheated to 250 ℃, then argon is introduced, and the surface of the strip steel is subjected to plasma cleaning for 5 min;
③ keeping the vacuum degree of the vacuum chamber at 4X 10-3Pa, depositing a chromium pre-plating layer on the surface of the steel plate by a magnetron sputtering coating process, wherein the thickness of the pre-plating layer is 10 nm;
maintaining vacuum degree of vacuum chamber at 4X 10-3Pa, depositing a tin layer on the surface of the pre-plating layer by adopting an induction evaporation jet deposition coating process, wherein the thickness of the tin layer is 0.3 mu m;
and fifthly, the tin plate adopts induction reflow, the tin layer is reflowed at 270 ℃, and an iron-tin alloy layer is formed at the interface. And cooling treatment is carried out by adopting a cooling roller.
And sixthly, after the tin plate is locked out of the vacuum chamber through the outlet in vacuum, carrying out passivation and oil coating post-treatment.
Seventhly, the performance detection is carried out on the tin plate, and the method comprises the following steps: mechanical property detection, forming property detection, metallographic phase detection, tinning quantity measurement, oxide film and passivation film measurement, soldering performance test and the like.
Example 2:
this example selects DC06 steel as the substrate, chromium as the pre-coat material, and tin as the top coat. The corrosion-resistant coating is prepared according to the following steps:
carrying out chemical degreasing, electrolytic degreasing, rinsing and drying on the strip steel to remove pollutants such as grease and solid particles on the surface;
secondly, the strip steel enters a vacuumized vacuum chamber through an inlet vacuum lock, the surface of the strip steel is preheated to 200 ℃, then argon is introduced, and the surface of the strip steel is subjected to plasma cleaning for 10 min;
③ keeping the vacuum degree of the vacuum chamber at 2X 10-2Pa, depositing a chromium pre-plating layer on the surface of the steel plate by a magnetron sputtering coating process, wherein the thickness of the pre-plating layer is 20 nm;
maintaining vacuum degree of vacuum chamber at 4X 10-2Pa, depositing a tin layer on the surface of the pre-plating layer by adopting an induction evaporation jet deposition coating process, wherein the thickness of the tin layer is 0.4 mu m;
and fifthly, the tin plate adopts induction reflow, and the tin layer is reflowed at 280 ℃ to form an iron-tin alloy layer at the interface. And cooling treatment is carried out by adopting a cooling roller.
And sixthly, after the tin plate is locked out of the vacuum chamber through the outlet in vacuum, carrying out passivation and oil coating post-treatment.
Seventhly, the performance detection is carried out on the tin plate, and the method comprises the following steps: mechanical property detection, forming property detection, metallographic phase detection, tinning quantity measurement, oxide film and passivation film measurement, soldering performance test and the like.
Example 3:
this example selects DC06 steel as the substrate, chromium as the pre-coat material, and tin as the top coat. The corrosion-resistant coating is prepared according to the following steps:
carrying out chemical degreasing, electrolytic degreasing, rinsing and drying on the strip steel to remove pollutants such as grease and solid particles on the surface;
secondly, the strip steel enters a vacuumized vacuum chamber through an inlet vacuum lock, the surface of the strip steel is preheated to 200 ℃, then argon is introduced, and the surface of the strip steel is subjected to plasma cleaning for 10 min;
③ keeping the vacuum degree of the vacuum chamber at 2X 10-2Pa, depositing a chromium pre-plating layer on the surface of the steel plate by selecting a multi-arc ion plating process, wherein the thickness of the pre-plating layer is 20 nm;
maintaining vacuum degree of vacuum chamber at 4X 10-2Pa, depositing a tin layer on the surface of the pre-plating layer by adopting a resistance evaporation, spraying, deposition and coating process, wherein the thickness of the tin layer is 0.4 mu m;
and fifthly, the tin plate adopts induction reflow, and the tin layer is reflowed at 290 ℃ to form an iron-tin alloy layer at the interface. And cooling treatment is carried out by adopting a cooling roller.
And sixthly, after the tin plate is locked out of the vacuum chamber through the outlet in vacuum, carrying out passivation and oil coating post-treatment.
Seventhly, the performance detection is carried out on the tin plate, and the method comprises the following steps: mechanical property detection, forming property detection, metallographic phase detection, tinning quantity measurement, oxide film and passivation film measurement, soldering performance test and the like.
The invention applies the vacuum coating process to the production of the tin plate, cancels the pickling process section, replaces the electroplating section and adjusts the reflow section, and has the advantages of improving the product quality, saving energy, protecting environment, flexible process, high production efficiency and the like. Has wide development prospect as a substitute technology of electrotinning.
In summary, the present invention is only a preferred embodiment, and not intended to limit the scope of the invention, and all equivalent changes and modifications in the shape, structure, characteristics and spirit of the present invention described in the claims should be included in the scope of the present invention.
Claims (11)
1. A manufacturing method of a vacuum tin plate is characterized by comprising the following steps:
s1, cleaning the secondary cold-rolled strip steel;
s2, pre-plating the cleaned secondary cold-rolled strip steel;
s3, after the surface of the pre-plated secondary cold-rolled strip steel is plated with tin or tin alloy, performing reflow treatment to obtain a tin plate;
and S4, passivating and degreasing the tin plate.
2. The method of manufacturing a vacuum tin plate according to claim 1, wherein the step of cleaning specifically includes the operations of:
and (3) sequentially carrying out chemical degreasing and electrolytic degreasing on the secondary cold-rolled strip steel, and rinsing with pure water, wherein the temperature of the chemical degreasing is 70-85 ℃.
3. The method of manufacturing a vacuum tin plate according to claim 1, wherein the step of pre-plating specifically comprises the operations of:
heating the cleaned secondary cold-rolled strip steel to 150-300 ℃, and then carrying out plasma sputtering cleaning under the vacuum degree of 0.01-10 Pa;
and depositing a pre-coating on the surface of the secondary cold-rolled strip steel subjected to plasma cleaning by adopting a PVD method at a continuous movement speed of 30-400 m/min.
4. The method of claim 3, wherein the PVD process comprises one of multi-arc ion plating, magnetron sputter plating, inductive evaporation plating, resistive evaporation plating, inductive evaporation spray deposition plating, resistive evaporation spray deposition plating.
5. The method of manufacturing a vacuum tin plate according to claim 4, wherein when the PVD method is a multi-arc ion plating method or a magnetron sputtering plating method, a distance between the target and the steel plate is 50 to 100 mm; when the PVD method is induction evaporation coating, resistance evaporation coating, induction evaporation spray deposition coating and resistance evaporation spray deposition coating, the distance between an evaporation source and a steel plate is 10-100 mm; when the PVD method is induction evaporation spray deposition coating and resistance evaporation spray deposition coating, the distance between an evaporation source and a steel plate is 10-100 mm; the PVD method comprises the steps of induction evaporation spray deposition coating and resistance evaporation spray deposition coating, wherein the spraying speed is 200-500 m/min.
6. The method of manufacturing a vacuum tin-plated plate according to claim 3, wherein the material of the pre-plating layer is at least one of tin, titanium, chromium, zinc, iron, magnesium, aluminum, nickel, silicon, copper, molybdenum, and tungsten.
7. The method of manufacturing a vacuum tin plate according to claim 1, wherein the step S3 specifically includes the steps of:
plating a tin layer or a tin alloy layer on the surface of the preplating layer by a PVD method at the temperature of 150-300 ℃ and under the condition of a vacuum degree of 0.0001-100 Pa.
8. The method of manufacturing a vacuum tin-plated sheet according to claim 6, wherein the secondary cold-rolled steel strip has a continuous movement speed of 30 to 400 m/min.
9. The method of claim 6, wherein the PVD process comprises one of multi-arc ion plating, magnetron sputter plating, inductive evaporation plating, resistive evaporation plating, inductive evaporation spray deposition plating, resistive evaporation spray deposition plating.
10. The method of manufacturing a vacuum tin plate according to claim 8, wherein when the PVD method is a multi-arc ion plating or a magnetron sputtering plating, a distance between the target and the steel plate is 50 to 100 mm; when the PVD method is induction evaporation coating, resistance evaporation coating, induction evaporation spray deposition coating and resistance evaporation spray deposition coating, the distance between an evaporation source and a steel plate is 10-100 mm; when the PVD method is induction evaporation spray deposition coating and resistance evaporation spray deposition coating, the distance between an evaporation source and a steel plate is 10-100 mm; the PVD method comprises the steps of induction evaporation spray deposition coating and resistance evaporation spray deposition coating, wherein the spraying speed is 200-500 m/min.
11. The method of manufacturing a vacuum tin plate according to claim 1, wherein the reflow process is resistance reflow and/or induction reflow, and the temperature of the reflow process is 245 to 300 ℃.
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| CN201910397647.5A CN111945112A (en) | 2019-05-14 | 2019-05-14 | Method for manufacturing vacuum tin plate |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN115478237A (en) * | 2022-09-14 | 2022-12-16 | 浙江东南新材科技有限公司 | Hot-dip galvanized steel coil and production process thereof |
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|---|---|---|---|---|
| CN115478237A (en) * | 2022-09-14 | 2022-12-16 | 浙江东南新材科技有限公司 | Hot-dip galvanized steel coil and production process thereof |
| CN115478237B (en) * | 2022-09-14 | 2024-02-02 | 浙江东南新材科技有限公司 | Hot dip galvanized steel coil and production process thereof |
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Application publication date: 20201117 |