CN111916328B - Flow path interlocking structure, air inlet device and semiconductor processing equipment - Google Patents

Flow path interlocking structure, air inlet device and semiconductor processing equipment Download PDF

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Publication number
CN111916328B
CN111916328B CN201910391563.0A CN201910391563A CN111916328B CN 111916328 B CN111916328 B CN 111916328B CN 201910391563 A CN201910391563 A CN 201910391563A CN 111916328 B CN111916328 B CN 111916328B
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normally
flow path
path
switch
closed switch
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CN111916328A (en
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宋智燕
陈景春
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Beijing Naura Microelectronics Equipment Co Ltd
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Beijing Naura Microelectronics Equipment Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3244Gas supply means
    • H01J37/32449Gas control, e.g. control of the gas flow
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32Processing objects by plasma generation
    • H01J2237/33Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334Etching

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Fluid-Pressure Circuits (AREA)

Abstract

The invention provides a flow path interlocking structure, an air inlet device and semiconductor processing equipment, wherein the flow path interlocking structure comprises a normally closed switch, a normally open switch and an interlocking device, wherein at least one normally closed switch and at least one normally open switch are arranged on each of at least two flow paths; the interlocking device is used for enabling at least one normally-closed switch on a specified flow path to synchronously act with at least one normally-open switch on at least one flow path in other flow paths; at the same time, at least one normally open switch on a given flow path is synchronized with at least one normally closed switch on at least one of the other flow paths. The flow path interlocking structure provided by the invention can be added with a hardware interlock on the basis of software interlock, so that the reliability of the interlock can be improved.

Description

Flow path interlocking structure, air inlet device and semiconductor processing equipment
Technical Field
The invention relates to the field of semiconductor manufacturing, in particular to a flow path interlocking structure, an air inlet device and semiconductor processing equipment.
Background
In plasma etching equipment, the use of process gases is indispensable. From the chemical point of view of the gas, part of the gas is of a flammable and explosive gas, e.g. H 2 This gas, when used, cannot be mixed with O 2 、Cl 2 And mixing the gases, otherwise, the explosion phenomenon can occur, and safety accidents are caused. For safety reasons, the interlocking between gas paths is a technique that must be used when multiple gases that cannot be mixed need to be delivered.
Interlocks are generally classified into two types, hardware interlocks and software interlocks. Hardware interlocks are generally reliable, but this adds much effort to the operator because there is no support for the control system in actual use. Along with the development of science and technology, the application of the software interlocking is widely applied to various fields, but the safety of the software interlocking is completely dependent on the stability of a control system, and once the control system fails or an operator operates by mistake, the interlocking is possibly invalid, so that hidden danger is brought to the safety.
Disclosure of Invention
The invention aims to at least solve one of the technical problems in the prior art, and provides a flow path interlocking structure, an air inlet device and semiconductor processing equipment, which can add a hardware interlock on the basis of software interlock, thereby improving the reliability of the interlock.
In order to achieve the purpose of the invention, a flow path interlocking structure is provided, the number of flow paths is at least two, the flow path interlocking structure comprises a normally closed switch, a normally open switch and an interlocking device, wherein,
at least one normally closed switch and at least one normally open switch are arranged on each of the at least two flow paths;
the interlocking device is used for enabling at least one normally-closed switch on a specified flow path to synchronously act with at least one normally-open switch on at least one flow path in other flow paths; at the same time, at least one normally open switch on the designated flow path and at least one normally closed switch on at least one of the other flow paths are operated synchronously.
Optionally, the number of the two flow paths is two, namely a first flow path and a second flow path, wherein a first normally closed switch and a first normally open switch are arranged on the first flow path; a second normally closed switch and a second normally open switch are arranged on the second flow path;
the interlocking device comprises a compressed air source, an air channel distribution part, a first branch, a second branch, a first control air channel and a second control air channel, wherein,
one end of the first control air channel is connected with the air channel distribution piece;
one end of the first branch is connected with the other end of the first control gas circuit, and the other end of the first branch is connected with the first normally-closed switch and the second normally-open switch;
one end of the second control air channel is connected with the air channel distribution piece;
one end of the second branch is connected with the other end of the second control gas circuit, and the other end of the second branch is connected with the first normally-open switch and the second normally-closed switch;
the compressed air source respectively provides compressed air capable of controlling on-off of the switch for the first control air channel and the second control air channel through the air channel distribution part.
Optionally, three flow paths are respectively from a first flow path to a third flow path, wherein a first normally closed switch and a first normally open switch are arranged on the first flow path; a second normally closed switch and a second normally open switch are arranged on the second flow path; a third normally closed switch and a third normally open switch are arranged on the third flow path;
the interlocking device is used for realizing the interlocking between the first flow path and the second flow path and the third flow path, and comprises a compressed air source, a gas path distributing part, a first branch, a second branch, a third branch, a first one-way valve, a second one-way valve, a first control gas path, a second control gas path and a third control gas path,
one end of the first control air channel is connected with the air channel distribution piece;
one end of the first branch is connected with the other end of the first control gas circuit, and the other end of the first branch is connected with the first normally-closed switch, the second normally-open switch and the third normally-open switch;
one end of the second control air channel is connected with the air channel distribution piece;
one end of the second branch is connected with the other end of the second control gas circuit, and the other end of the second branch is connected with the first normally-open switch and the second normally-closed switch;
the first one-way valve is arranged on the second branch;
one end of the third control air channel is connected with the air channel distributing piece;
one end of the third branch is connected with the other end of the third control gas circuit, and the other end of the third branch is connected with the first normally-open switch and the third normally-closed switch;
the second one-way valve is arranged on the third branch path;
the compressed air source respectively provides compressed air capable of controlling on-off of the switch for the first control air channel, the second control air channel and the third control air channel through the air channel distribution part.
Optionally, the normally closed switch and the normally open switch are pneumatic diaphragm valves.
Optionally, the normally closed switch on each flow path is one or two.
As another technical scheme, the invention also provides an air inlet device, which comprises at least two flow paths for conveying process gases to a reaction chamber, and the flow path interlocking structure provided by the invention, which is used for interlocking a designated flow path with at least one flow path in other flow paths.
Optionally, the device also comprises a purging air source, a purging air path and an exhaust air path, wherein,
one end of the purging gas path is connected with the purging gas source, and the other end of the purging gas path is provided with at least two purging branches, and the purging branches are connected with the flow path in a one-to-one correspondence manner and are used for conveying purging gas provided by the purging gas source into the flow path; a purging normally closed switch is arranged on each purging branch;
one end of the exhaust gas path is connected with each flow path, and the other end of the exhaust gas path is connected with the air extractor and is used for exhausting the purge gas in each flow path; and an exhaust normally closed switch is arranged on the exhaust gas path.
Optionally, the device further comprises a purging exhaust gas path, wherein two ends of the purging exhaust gas path are respectively connected with the purging gas path and the exhaust gas path, and a purging exhaust normally-closed switch is arranged on the purging exhaust gas path.
Optionally, a flow control valve is arranged on each flow path;
the normally closed switch and the normally open switch are both one and are respectively positioned at the upstream and downstream of the flow control valve; or,
the number of the normally-closed switches is two, the number of the normally-open switches is one, one normally-closed switch is located at the upstream of the flow control valve, and the other normally-closed switch and the normally-open switch are located at the downstream of the flow control valve.
As another technical scheme, the invention also provides a semiconductor processing device, which comprises a reaction chamber and an air inlet device for conveying process gas to the reaction chamber, wherein the air inlet device adopts the air inlet device provided by the invention.
The invention has the following beneficial effects:
in the technical scheme of the flow path interlocking structure, the air inlet device and the semiconductor processing equipment, the flow path interlocking structure is provided with at least one normally closed switch and at least one normally open switch on each flow path, the interlocking device is utilized to enable the at least one normally closed switch on a specified flow path to synchronously act with the at least one normally open switch on at least one flow path in other flow paths, and meanwhile the at least one normally open switch on the specified flow path and the at least one normally closed switch on at least one flow path in other flow paths are enabled to synchronously act, namely, hardware is utilized to enable the normally open switch and the normally closed switch on at least two flow paths needing to be interlocked to synchronously act. Therefore, a hardware interlock is added on the basis of software interlock, and even if a control system fails or an operator operates by mistake, at least two flow paths of the interlock can still be ensured not to be communicated all the time under the action of the interlock device, so that the reliability of the interlock can be improved.
Drawings
FIG. 1 is a block diagram of a flow path employed in a first embodiment of the present invention;
FIG. 2 is a block diagram of a flow path interlocking structure provided by a first embodiment of the present invention;
FIG. 3 is a block diagram of a flow path employed in a second embodiment of the present invention;
FIG. 4 is a block diagram of a flow path interlocking structure provided by a second embodiment of the present invention;
FIG. 5 is a block diagram of a flow path employed in a third embodiment of the present invention;
FIG. 6 is a block diagram of a flow path interlocking structure provided by a third embodiment of the present invention; and
Fig. 7 is a block diagram of a flow path employed in a fourth embodiment of the present invention.
Detailed Description
In order to enable those skilled in the art to better understand the technical scheme of the present invention, the flow path interlocking structure, the air inlet device and the semiconductor processing equipment provided by the present invention are described in detail below with reference to the accompanying drawings.
First embodiment
Referring to fig. 1, in the present embodiment, an air inlet device for introducing process gas into a chamber includes two flow paths, a first flow path 101 and a second flow path 102. The first flow path 101 and the second flow path 102 are provided with manual switches (1, 7), filters (2, 8), and flow path control valves (4, 10), respectively. The mixing channel of the first channel 101 and the second channel 102 is also provided with a normally closed switch 6.
The first flow path 101 and the second flow path 102 are interlocked by a flow path interlocking structure. The flow path interlocking structure comprises a normally closed switch, a normally open switch and an interlocking device. Specifically, the first flow path 101 is provided with a first normally closed switch 3 and a first normally open switch 5; a second normally closed switch 9 and a second normally open switch 11 are provided in the second flow path. The interlocking device is used for enabling the first normally-closed switch 3 on the first flow path 101 to synchronously act with the second normally-open switch 11 on the second flow path 102, and simultaneously enabling the first normally-open switch 5 on the first flow path 101 to synchronously act with the second normally-closed switch 9 on the second flow path 102, so that the first flow path 101 and the second flow path 102 are not communicated all the time, and further interlocking between the first flow path 101 and the second flow path 102 is achieved.
Because the flow path interlocking structure belongs to hardware interlocking, namely, one hardware interlocking is added on the basis of software interlocking, even if a control system fails or an operator operates by mistake, the two flow paths which are interlocked can still be ensured not to be communicated all the time under the action of the interlocking device, so that the interlocking reliability can be improved.
In this embodiment, referring to fig. 2, the interlocking device includes a compressed air source 21, an air path distributing member 22, two first branches (231, 232), two second branches (241, 242), a first control air path 23 and a second control air path 24, wherein one end of the first control air path 23 is connected with the air path distributing member 22; one end of each first branch (231, 232) is connected with the other end of the first control air path 23, and the other end is connected with the first normally-closed switch 3 and the second normally-open switch 11; one end of the second control air path 24 is connected with the air path distributing part 22; one end of the two second branches (241, 242) is connected with the other end of the second control air path 24, and the other end is connected with the first normally open switch 5 and the second normally closed switch 9; the compressed air source 21 supplies compressed air capable of controlling on-off of the switch to the first control air path 23 and the second control air path 24 through the air path distributing member 22. Here, the initial state of the normally open switch is an on state, and the initial state of the normally closed switch is an off state. When the compressed air source 21 is on, the normally open switch is closed and the normally closed switch is opened.
When the compressed air source 21 is started, compressed air is provided for each control air channel through the air channel distribution part 22, and as the two first branches (231, 232) of the first control air channel 23 are simultaneously communicated with the first normally closed switch 3 and the second normally open switch 11, the synchronous action of the first normally closed switch 3 and the second normally open switch 11 can be realized; also, since the two second branches (241, 242) of the second control air path 24 are simultaneously communicated with the first normally open switch 5 and the second normally closed switch 9, the synchronous action of the first normally open switch 5 and the second normally closed switch 9 can be realized.
Specifically, when the first flow path 101 is required to be a path and the second flow path 102 is required to be an open path, the first normally closed switch 3 on the first flow path 101 is controlled to be opened, and at this time, the second normally open switch 11 on the second flow path 102 is synchronously closed under the action of the interlocking device, so that the second flow path 102 is locked in the open state. On the contrary, when the second flow path 102 is required to be a path and the first flow path 101 is opened, the second normally closed switch 9 on the second flow path 102 is controlled to be opened, and at this time, the first normally open switch 5 on the first flow path 101 is synchronously closed under the action of the interlocking device, so that the first flow path 101 is locked in the opened state. Thus, the two flow paths can be ensured not to be communicated all the time.
In this embodiment, the interlock device further includes a third control air path 25 for individually controlling the normally closed switch 6 on the mixed flow path of the first flow path 101 and the second flow path 102.
Optionally, the normally closed switch and the normally open switch are pneumatic diaphragm valves.
In the present embodiment, the flow path interlocking structure controls the operation of the pneumatic diaphragm valve by using the solenoid valve and the compressed gas. However, the present invention is not limited thereto, and in practical applications, other hardware interlocking structures may be used to control the synchronous operation of the normally closed switch and the normally open switch.
Second embodiment
The flow path interlocking structure provided in this embodiment is based on the first embodiment, and one normally closed switch is added on each flow path, that is, two normally closed switches are added on each flow path.
Specifically, referring to fig. 3, two first normally closed switches (3, 5) and one first normally open switch 12 are provided on the first flow path 101; two second normally closed switches (9, 11) and a second normally open switch 13 are provided on the second flow path 102.
In this embodiment, referring to fig. 4, the interlocking device is configured to synchronize the first normally-closed switch 5 on the first flow path 101 with the second normally-open switch 13 on the second flow path 102, and simultaneously synchronize the first normally-open switch 12 on the first flow path 101 with the second normally-closed switch 11 on the second flow path 102, so that the first flow path 101 and the second flow path 102 are not mutually communicated all the time, and thus the interlocking between the first flow path 101 and the second flow path 102 is realized.
Specifically, the interlocking device comprises a compressed air source 21, an air channel distribution part 22, two first branches (231, 232), two second branches (241, 242), a first control air channel 23 and a second control air channel 24, wherein one end of the first control air channel 23 is connected with the air channel distribution part 22; one end of each first branch (231, 232) is connected with the other end of the first control air path 23, and the other end is connected with the first normally-closed switch 5 and the second normally-open switch 13; one end of the second control air channel 24 is connected with the air channel distributing part 22, one end of the two second branches (241, 242) is connected with the other end of the second control air channel 24, and the other end is connected with the first normally open switch 12 and the second normally closed switch 11; the compressed air source 21 supplies compressed air capable of controlling on-off of the switch to the first control air path 23 and the second control air path 24 through the air path distributing member 22.
When the compressed air source 21 is started, compressed air is provided for each control air channel through the air channel distribution part 22, and as the two first branches (231, 232) of the first control air channel 23 are simultaneously communicated with the first normally closed switch 5 and the second normally open switch 13, the synchronous action of the first normally closed switch 5 and the second normally open switch 13 can be realized; also, since the two second branches (241, 242) of the second control air path 24 are simultaneously communicated with the first normally open switch 12 and the second normally closed switch 11, the synchronous action of the first normally open switch 12 and the second normally closed switch 11 can be realized.
In this embodiment, the interlocking device further includes a third control air path 25, a fourth control air path 26, and a fifth control air path 27 for individually controlling the first normally closed switch 3, the normally closed switch 6, and the second normally closed switch 9, respectively.
Third embodiment
The flow path interlocking structure provided by the embodiment is used for realizing the interlocking among three flow paths. Referring to fig. 5, the number of the flow paths is three, namely, a first flow path 101, a second flow path 102 and a third flow path 103. The three flow paths are provided with a manual switch (1,7,12), a filter (2,8,13) and a flow path control valve (4,10,15), respectively. The mixing flow paths of the three flow paths are further provided with a normally closed switch 6.
In this embodiment, the flow path interlock structure includes a normally closed switch, a normally open switch, and an interlock. Wherein, a first normally closed switch 3 and a first normally open switch 5 are arranged on the first flow path 101; a second normally closed switch 9 and a second normally open switch 11 are provided on the second flow path 102; a third normally closed switch 14 and a third normally open switch 16 are provided in the third flow path 103.
The interlocking device can realize the synchronous action of the normally closed switch on a specified flow path and the normally open switch on at least one flow path in other flow paths; and simultaneously, the normally open switch on the specified flow path and the normally closed switch on at least one flow path in other flow paths synchronously act. For example, one flow path is designated to interlock with the other two flow paths; alternatively, one flow path is designated to interlock with any one of the other two flow paths.
The structure of the interlocking device will be described in detail below taking an example in which the interlocking device performs interlocking between the first flow path 101 and the second flow path 102 and the third flow path 103. Specifically, referring to fig. 6, the interlocking device includes a compressed air source 31, an air path distributing member 32, three first branches (331, 332, 333), two second branches (341, 342), two third branches (351, 352), a first check valve 38, a second check valve 37, a first control air path 33, a second control air path 34, and a third control air path 35, wherein one end of the first control air path 33 is connected with the air path distributing member 32, and one ends of the three first branches (331, 332, 333) are connected with the other end of the first control air path 33; the other end is connected with the first normally closed switch 5, the second normally open switch 9 and the third normally open switch 14; one end of the second control air path 34 is connected with the air path distributing part 32, one end of the two second branches (341, 342) is connected with the other end of the second control air path 34, and the other end is connected with the first normally open switch 3 and the second normally closed switch 11; the first check valve 38 is disposed on the second branch 341; one end of the third control air path 35 is connected with the air path distributing part 32; one end of the two third branches (351, 352) is connected with the other end of the third control air circuit 35, and the other ends of the two third branches (351, 352) are respectively connected with the first normally-open switch 3 and the third normally-closed switch 16; the second check valve 37 is disposed on the third leg 351; the compressed air source 31 supplies compressed air capable of controlling on-off of the switch to the first control air path 33, the second control air path 34 and the third control air path 35 through air path distribution parts.
When the compressed air source 31 is turned on, it supplies compressed air to each control air path through the air path distributing member 32, and since the three first branches (331, 332, 333) of the first control air path 33 are simultaneously connected to the first normally closed switch 5, the second normally open switch 9 and the third normally open switch 14, the synchronous action of the three switches can be realized. The two second branches (341, 342) of the second control air circuit 34 are simultaneously communicated with the first normally-open switch 3 and the second normally-closed switch 11, so that synchronous actions of the first normally-open switch 3 and the second normally-closed switch 11 can be realized. The two second branches (351, 352) of the third control air circuit 35 are simultaneously communicated with the first normally-open switch 3 and the third normally-closed switch 16, so that synchronous actions of the first normally-open switch 3 and the third normally-closed switch 16 can be realized. Further, by means of the first check valve 38 and the second check valve 37, the first normally open switch 3 can be kept in the closed state at all times when switching between the second flow path 102 and the third flow path 103, and the first flow path 102 can be kept in the open state at all times.
Specifically, when the first flow path 101 is required to be a path and the second flow path 102 and the third flow path 103 are opened, the first normally closed switch 5 on the first flow path 101 is controlled to be opened, and at this time, the second normally open switch 9 on the second flow path 102 and the third normally open switch 14 on the third flow path 103 are synchronously closed under the action of the interlocking device, so that the second flow path 102 and the third flow path 103 are locked in the opened state. In contrast, when the second flow path 102 and/or the third flow path 103 are/is required to be a path, and the first flow path 101 is/is opened, the second normally closed switch 11 and/or the third normally closed switch 16 on the second flow path 102 and/or the third flow path 103 are controlled to be opened, and at this time, the first normally open switch 3 is synchronously closed under the action of the interlocking device, so that the first flow path 101 is locked in the open state. In addition, if the second flow path 102 or the third flow path 103 needs to be switched to the open state, the second normally closed switch 11 or the third normally closed switch 16 on the second flow path 102 or the third flow path 103 may be controlled to be closed, and at this time, the first normally open switch 3 still maintains the closed state under the action of the first check valve 38 or the second check valve 37. Thereby, it is ensured that the first flow path 101 and the second flow path 102 and the third flow 103 are not communicated with each other at all times.
In this embodiment, the interlock device further comprises a fourth control air path 36 for individually controlling the normally closed switch 6.
In this embodiment, the flow path interlocking structure is used to implement interlocking between three flow paths, but the present invention is not limited to this, and in practical application, the flow interlocking structure may be used to implement interlocking between four or more flow paths as long as the normally open switch and the normally closed switch on at least two flow paths that need to be interlocked are synchronized.
It should be noted that the flow path interlocking structure is not limited to the flow path structure provided in the first to third embodiments, and may be applied to any other flow path that needs to be interlocked in practical applications.
Fourth embodiment
As another aspect, the present embodiment provides an air inlet device including at least two flow paths for delivering process gases to a reaction chamber, and the flow path interlocking structure provided in the first to third embodiments of the present invention is configured to interlock a specified flow path with at least one of other flow paths.
In the plasma etching apparatus, the kinds of process gases may be classified into two kinds of common gases and special gases according to whether there is toxicity. For example Ar, O 2 、He、H 2 、N 2 The nontoxic gas which does not harm human body can be called as common gas; cl 2 、SF 6 Toxic gases such as HBr, which are harmful to the human body, may be referred to as specialty gases. In the present embodiment, the flow path structure of the gas intake device for transporting the normal gas and the flow path structure for transporting the special gas are different.
Specifically, the flow path structure for delivering the normal gas is, for example, the flow path structure shown in fig. 1 or 3, and since the flow path structure is described in detail in the above first and second embodiments, a detailed description thereof will be omitted.
Referring to fig. 7, the flow path structure for delivering the special gas further includes a purge gas source (not shown), a purge gas path 201, and an exhaust gas path 202, in addition to the first flow path 101 and the second flow path 102. When the chamber is opened or stopped, the purge gas source can be utilized to purge each flow path through the purge gas path 201, and during the purging process, the special gas in the flow path is pumped out by the air pumping device 44 through the air exhaust path 202.
In the present embodiment, the structures of the first flow path 101 and the second flow path 102 are similar to those of the first flow path 101 and the second flow path 102 in the first embodiment described above. On the basis, one end of the purging gas path 201 is connected with a purging gas source, the other end is provided with two purging branches (2011, 2012), and the two purging branches (2011, 2012) are connected with the first flow path 101 and the second flow path 102 in a one-to-one correspondence manner and are used for conveying the purging gas provided by the purging gas source into the two flow paths; the two purging branches (2011, 2012) are respectively provided with a purging normally-closed switch (41, 42). Optionally, the connection point of the purge branch to the flow path is located between the normally closed switch and the flow control valve.
One end of the exhaust gas path 202 is connected with each flow path, and the other end is connected with the air extractor 44, and is used for exhausting the purge gas (and the residual special gas) in each flow path; the exhaust gas path 202 is provided with an exhaust normally closed switch 6. Optionally, the exhaust gas path 202 is connected to the outlet end of each flow path at a point.
Optionally, a purge exhaust gas path 2013 is further included, two ends of the purge exhaust gas path 2013 are respectively connected to the purge gas path 201 and the exhaust gas path 202, and a purge exhaust normally-closed switch 43 is disposed on the purge exhaust gas path 2013. When the purge exhaust path 2013 is a passage, the purge gas may directly enter the exhaust path 202 via the purge exhaust path 2013 and be pumped out by the pumping device 44.
In the present embodiment, the first flow path 101 and the second flow path 102 are provided with flow control valves (4, 10), respectively; and the normally closed switch and the normally open switch on each flow path are one and are respectively positioned at the upstream and the downstream of the flow control valve.
Of course, in practical application, the number of normally closed switches may be two, and the number of normally open switches may be one, as shown in fig. 3. One of the normally closed switches is located upstream of the flow control valve, and the other of the normally closed switches and the normally open switch is located downstream of the flow control valve.
According to the air inlet device provided by the embodiment, by adopting the air inlet device provided by the embodiment, a hardware interlock can be added on the basis of software interlock, and even if a control system fails or an operator operates by mistake, the at least two flow paths of the interlock can still be ensured not to be communicated all the time under the action of the interlock device, so that the reliability of the interlock can be improved.
As another technical scheme, the embodiment of the invention also provides a semiconductor processing device, which comprises a reaction chamber and an air inlet device for conveying process gas to the reaction chamber, wherein the air inlet device adopts the air inlet device provided by the embodiment of the invention.
According to the semiconductor processing equipment provided by the embodiment, the air inlet device provided by the embodiment is adopted, so that a hardware interlock can be added on the basis of software interlock, and even if a control system fails or an operator operates by mistake, the at least two flow paths of the interlock can still be ensured not to be communicated all the time under the action of the interlock device, so that the reliability of the interlock can be improved.
It is to be understood that the above embodiments are merely illustrative of the application of the principles of the present invention, but not in limitation thereof. Various modifications and improvements may be made by those skilled in the art without departing from the spirit and substance of the invention, and are also considered to be within the scope of the invention.

Claims (8)

1. The flow path interlocking structure is characterized by comprising at least two flow paths, wherein the flow path interlocking structure comprises a normally closed switch, a normally open switch and an interlocking device,
at least one normally closed switch and at least one normally open switch are arranged on each of the at least two flow paths;
the interlocking device is used for enabling at least one normally-closed switch on a specified flow path to synchronously act with at least one normally-open switch on at least one flow path in other flow paths; simultaneously, at least one normally-open switch on the designated flow path and at least one normally-closed switch on at least one flow path in other flow paths are synchronously operated;
the three flow paths are respectively a first flow path to a third flow path, wherein a first normally closed switch and a first normally open switch are arranged on the first flow path; a second normally closed switch and a second normally open switch are arranged on the second flow path; a third normally closed switch and a third normally open switch are arranged on the third flow path;
the interlocking device is used for realizing the interlocking between the first flow path and the second flow path and the third flow path, and comprises a compressed air source, a gas path distributing part, a first branch, a second branch, a third branch, a first one-way valve, a second one-way valve, a first control gas path, a second control gas path and a third control gas path,
one end of the first control air channel is connected with the air channel distribution piece;
one end of the first branch is connected with the other end of the first control gas circuit, and the other end of the first branch is connected with the first normally-closed switch, the second normally-open switch and the third normally-open switch;
one end of the second control air channel is connected with the air channel distribution piece;
one end of the second branch is connected with the other end of the second control gas circuit, and the other end of the second branch is connected with the first normally-open switch and the second normally-closed switch;
the first one-way valve is arranged on the second branch;
one end of the third control air channel is connected with the air channel distributing piece;
one end of the third branch is connected with the other end of the third control gas circuit, and the other end of the third branch is connected with the first normally-open switch and the third normally-closed switch;
the second one-way valve is arranged on the third branch path;
the compressed air source respectively provides compressed air capable of controlling on-off of the switch for the first control air channel, the second control air channel and the third control air channel through the air channel distribution part.
2. The flow path interlock of claim 1 wherein the normally closed switch and the normally open switch are pneumatic diaphragm valves.
3. The flow path interlock of claim 1 wherein the normally closed switch on each flow path is one or two.
4. A gas inlet device comprising at least two flow paths for delivering process gas to a reaction chamber, further comprising the flow path interlocking structure of any one of claims 1-3 for interlocking a given flow path with at least one of the other flow paths.
5. The air intake apparatus of claim 4, further comprising a purge air source, a purge air path, and an exhaust air path, wherein,
one end of the purging gas path is connected with the purging gas source, and the other end of the purging gas path is provided with at least two purging branches, and the purging branches are connected with the flow path in a one-to-one correspondence manner and are used for conveying purging gas provided by the purging gas source into the flow path; a purging normally closed switch is arranged on each purging branch;
one end of the exhaust gas path is connected with each flow path, and the other end of the exhaust gas path is connected with an air extractor and is used for exhausting the purge gas in each flow path; and an exhaust normally closed switch is arranged on the exhaust gas path.
6. The air inlet device according to claim 5, further comprising a purge exhaust passage, wherein both ends of the purge exhaust passage are connected to the purge passage and the exhaust passage, respectively, and a purge exhaust normally-closed switch is provided on the purge exhaust passage.
7. The intake apparatus according to claim 4, wherein a flow control valve is provided on each flow path;
the normally closed switch and the normally open switch are both one and are respectively positioned at the upstream and downstream of the flow control valve; or,
the number of the normally-closed switches is two, the number of the normally-open switches is one, one normally-closed switch is located at the upstream of the flow control valve, and the other normally-closed switch and the normally-open switch are located at the downstream of the flow control valve.
8. A semiconductor processing apparatus comprising a reaction chamber and an inlet means for delivering a process gas to the reaction chamber, wherein the inlet means employs an inlet means as claimed in any one of claims 4 to 7.
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Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH057763A (en) * 1991-07-03 1993-01-19 Tel Varian Ltd Supply and discharge gas change-over device
KR960002604A (en) * 1994-06-07 1996-01-26 이노우에 아키라 Treatment apparatus, supply method of treatment gas and cleaning method of treatment apparatus
JPH1116841A (en) * 1997-06-25 1999-01-22 Kokusai Electric Co Ltd Gas supply to semiconductor manufacturing apparatus
JP2002134414A (en) * 2000-10-13 2002-05-10 Applied Materials Inc Method and system of interlock in gas process
KR20050030020A (en) * 2003-09-24 2005-03-29 삼성전자주식회사 Reaction chamber system having gas supply apparatus
KR20080026852A (en) * 2006-09-21 2008-03-26 주식회사 케이씨텍 Gas supply device for manufacturing electronic material
CN101728232A (en) * 2008-10-22 2010-06-09 北京中科信电子装备有限公司 Control method for preventing process gas from mixing from hardware
JP2010258051A (en) * 2009-04-22 2010-11-11 Fujitsu Semiconductor Ltd Vapor growth device, and method for manufacturing semiconductor device
CN104241174A (en) * 2013-06-14 2014-12-24 北京北方微电子基地设备工艺研究中心有限责任公司 Film magazine chamber, plasma processing device and method for purging film magazine chamber
CN204842378U (en) * 2015-07-01 2015-12-09 重庆市富燃科技有限责任公司 Device of sweeping gas or fluid pipeline
CN106029214A (en) * 2015-01-30 2016-10-12 株式会社日立高新技术 Vacuum processing device
CN106229968A (en) * 2016-08-01 2016-12-14 漳州科华技术有限责任公司 A kind of interlock and control method thereof

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6500263B2 (en) * 2001-03-26 2002-12-31 Applied Materials, Inc, Semiconductor substrate processing chamber having interchangeable lids actuating plural gas interlock levels
US7354555B2 (en) * 2002-05-08 2008-04-08 Taiwan Semiconductor Manufacturing Co., Ltd. Gas flow control system with interlock

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH057763A (en) * 1991-07-03 1993-01-19 Tel Varian Ltd Supply and discharge gas change-over device
KR960002604A (en) * 1994-06-07 1996-01-26 이노우에 아키라 Treatment apparatus, supply method of treatment gas and cleaning method of treatment apparatus
JPH1116841A (en) * 1997-06-25 1999-01-22 Kokusai Electric Co Ltd Gas supply to semiconductor manufacturing apparatus
JP2002134414A (en) * 2000-10-13 2002-05-10 Applied Materials Inc Method and system of interlock in gas process
KR20050030020A (en) * 2003-09-24 2005-03-29 삼성전자주식회사 Reaction chamber system having gas supply apparatus
KR20080026852A (en) * 2006-09-21 2008-03-26 주식회사 케이씨텍 Gas supply device for manufacturing electronic material
CN101728232A (en) * 2008-10-22 2010-06-09 北京中科信电子装备有限公司 Control method for preventing process gas from mixing from hardware
JP2010258051A (en) * 2009-04-22 2010-11-11 Fujitsu Semiconductor Ltd Vapor growth device, and method for manufacturing semiconductor device
CN104241174A (en) * 2013-06-14 2014-12-24 北京北方微电子基地设备工艺研究中心有限责任公司 Film magazine chamber, plasma processing device and method for purging film magazine chamber
CN106029214A (en) * 2015-01-30 2016-10-12 株式会社日立高新技术 Vacuum processing device
CN204842378U (en) * 2015-07-01 2015-12-09 重庆市富燃科技有限责任公司 Device of sweeping gas or fluid pipeline
CN106229968A (en) * 2016-08-01 2016-12-14 漳州科华技术有限责任公司 A kind of interlock and control method thereof

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