CN111863576A - Ion beam energy control device - Google Patents
Ion beam energy control device Download PDFInfo
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- CN111863576A CN111863576A CN201910340903.7A CN201910340903A CN111863576A CN 111863576 A CN111863576 A CN 111863576A CN 201910340903 A CN201910340903 A CN 201910340903A CN 111863576 A CN111863576 A CN 111863576A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
Abstract
The invention discloses an ion beam energy control device. It includes: the ion source comprises an inlet end and an outlet end, wherein the inlet end is used for injecting ion beams, and the outlet end is used for injecting the ion beams; each electrode pair comprises a first electrode and a second electrode which are oppositely arranged, the first electrode and the second electrode are both rod-shaped, and a space between the first electrode and the second electrode is used for ion beams to pass through; at least one electrode pair in the plurality of electrode pairs forms a first electrode group, and the voltage applied to the first electrode group deflects the ion beam to a first direction; at least one electrode pair of the plurality of electrode pairs forms a second electrode group, and the voltage applied to the second electrode group deflects the ion beam in a second direction, which is opposite to the first direction. The ion beam energy control device has more advantages in the aspects of electrode shape, electrode layout, beam regulation and the like.
Description
Technical Field
The invention belongs to the field of semiconductor equipment, and particularly relates to an ion beam energy control device.
Background
In a low-energy large-beam ion implanter, an ion beam with extremely low final energy and high beam intensity needs to be realized. Because the extraction intensity and the transmission efficiency of the ion beam are obviously reduced along with the reduction of the energy, the ion beam needs to be extracted and transmitted by higher energy, and then is decelerated by one or a plurality of deceleration devices, so that low-energy large beam current is realized. During deceleration, loss of ion beam intensity needs to be avoided. Further, ions of intermediate energy inevitably generated during the deceleration process, and these ions having energy different from the final energy adversely affect the manufactured semiconductor device, and are called energy contamination, and are also required to be minimized. Therefore, how to effectively decelerate the light beam and reduce the energy pollution is the main direction of research and development. In the existing device, various electrodes are usually arranged, and the direction and the speed of the beam are changed by the electric field of the electrodes when the beam passes through. Currently, the following drawbacks exist in the devices available on the market:
The shape of the electrode is different, which is not beneficial to the manufacturing and processing of the electrode;
the surface area of the electrode is large, and the electrode is easy to hit by beam;
the beam channel is narrow, and the restriction on the beam is large;
the beam height is not enough;
the influence of the cavity wall on an electric field is shielded by adopting a large-area planar electrode, so that the edge angle of a beam cannot be effectively changed;
the intensity of the passing beam is limited, and the vertical uniformity can hardly be adjusted.
Disclosure of Invention
The invention aims to overcome the defects of limited beam current and insufficient beam current height of the conventional device and provides an ion beam energy control device.
The invention solves the technical problems through the following technical scheme:
an ion beam energy control apparatus comprising:
the ion source comprises an inlet end and an outlet end, wherein the inlet end is used for injecting ion beams, and the outlet end is used for injecting the ion beams;
a plurality of electrode pairs are arranged between the inlet end and the outlet end, each electrode pair respectively comprises a first electrode and a second electrode which are oppositely arranged, the first electrode and the second electrode are both rod-shaped, and a space between the first electrode and the second electrode is used for ion beams to pass through;
at least one electrode pair in the plurality of electrode pairs forms a first electrode group, and the voltage applied to the first electrode group enables the ion beam to deflect towards a first direction when passing through a beam channel formed by the first electrode group;
At least one electrode pair in the plurality of electrode pairs forms a second electrode group, and the voltage applied to the second electrode group enables the ion beam to deflect towards a second direction when passing through a beam channel formed by the second electrode group, wherein the second direction is opposite to the first direction.
Preferably, the ion beam has a central trajectory that is S-shaped curved when passing through the beam path formed by the plurality of electrode pairs.
Preferably, the ion beam energy control device further comprises, arranged in sequence from the entrance end to the electrode pair closest to the entrance end:
an inlet electrode pair, which comprises two inlet electrodes arranged oppositely and has the same potential with the inlet end;
a suppression electrode pair comprising two suppression electrodes disposed opposite each other, the suppression electrodes having a more negative potential than the entrance electrode;
the ion beam energy control apparatus further comprises, disposed from the exit end to a pair of electrodes closest to the exit end:
and the outlet electrode pair comprises two outlet electrodes which are oppositely arranged, and the voltage of the outlet electrodes is equal to the ground voltage.
Preferably, the ion beam energy control apparatus further comprises:
the first longitudinal end electrode pair comprises two first longitudinal end electrodes which are arranged between the first electrode groups and are oppositely arranged;
the second longitudinal end electrode pair is arranged between the second electrode groups and is provided with two second longitudinal end electrodes oppositely;
the first longitudinal end electrode pair has a potential more positive than a potential of a center of a longitudinal connecting line of the first longitudinal end electrode pair;
the second longitudinal end electrode pair has a potential more positive than a potential of a center of a longitudinal link of the second longitudinal end electrode pair.
Preferably, the first electrode and the second electrode are arranged oppositely up and down;
the first direction is upward, and the second direction is downward; or, the first direction is downward and the second direction is upward.
Preferably, in the first electrode group and the second electrode group:
the voltage applied to the electrode group makes the ion beam deflect upwards, and the voltage of the electrode arranged at the upper part is lower than the voltage of the electrode arranged at the lower part;
the applied voltage causes the ion beam to deflect downwards, and the voltage of the electrode arranged at the upper part is higher than that of the electrode arranged at the lower part.
Preferably, in the first electrode group and the second electrode group:
along the advancing direction of the beam, when the electrode group which deflects the ion beam upwards by the applied voltage is arranged in front of the electrode group which deflects the ion beam downwards by the applied voltage, the position of the rear first electrode is not lower than that of the front first electrode, and the position of the rear second electrode is not lower than that of the front second electrode;
or, along the beam advancing direction, when the electrode group which deflects the ion beam upwards by the applied voltage is arranged behind the electrode group which deflects the ion beam downwards by the applied voltage, the position of the rear first electrode is not higher than that of the front first electrode, and the position of the rear second electrode is not higher than that of the front second electrode.
Preferably, the voltage of the first electrode and the voltage of the second electrode are both non-positive.
Preferably, the heights of the first electrode and the second electrode are both greater than the beam height.
Preferably, the minimum height of the first electrode and the second electrode is between 500 mm and 600 mm.
Preferably, the ion beam energy control apparatus further comprises: the cavity, the both ends of cavity form respectively the entry end with the exit end, the minimum value of cavity height is between 700 ~ 1000 mm.
Preferably, the first electrode and the second electrode have rectangular or square vertical cross sections, and a chamfer is formed at a right angle.
On the basis of the common knowledge in the field, the above preferred conditions can be combined randomly to obtain the preferred embodiments of the invention.
The positive progress effects of the invention are as follows:
the ion beam energy control device of the invention has the following advantages in the aspect of electrode shape: the electrodes are rod-shaped, the shape is simple, the manufacture and the processing are convenient, and because the shapes of the electrodes are uniform, other electrodes can be adopted for mutual replacement even if the damaged or unusable electrodes exist; the surface area of the motor is small, and the probability of beam hitting is reduced.
The ion beam energy control device has the following advantages in the aspect of electrode layout: the electrodes are distributed normatively and are not interfered with each other; the gap between the adjacent electrodes is larger, so that the probability of hitting the electrodes by beam current is reduced; the beam channel is wide and has little restriction on the beam path.
The ion beam energy control device has the following advantages in the aspect of beam adjustment; the beam current with the height of about 300mm can be transmitted; the number of electrodes which can be independently controlled is extremely large, the control is more precise, and the beam current requirements of various conditions can be met; the electric field of the cavity wall does not need to be shielded, the edge angle of the beam current can be more finely adjusted, and the uniformity and the angle uniformity of the vertical beam current are ensured.
Drawings
Fig. 1 is a schematic diagram of a process of passing an ion beam through an ion beam energy control apparatus.
Fig. 2 is an internal schematic view of an ion beam energy control apparatus according to an embodiment of the present invention.
Fig. 3 is a side view of fig. 2.
Fig. 4 is an internal schematic view of another ion beam energy control apparatus according to another embodiment of the present invention.
Fig. 5 is a beam divergence curve of an ion beam energy control apparatus according to an embodiment of the present invention.
Fig. 6 is a 1D beam current curve of an ion beam energy control apparatus according to an embodiment of the present invention.
Fig. 7 is a 2D beam current curve of an ion beam energy control apparatus according to an embodiment of the present invention.
Detailed Description
The invention is further illustrated by the following examples, which are not intended to limit the scope of the invention.
Examples
The present embodiment provides an ion beam energy control apparatus. Fig. 1 simply shows the process of the ion beam passing through the ion beam energy control apparatus 100, and the energy of the outgoing ion beam and the incoming ion beam may be the same or different. Fig. 2-3 illustrate the internal structure of the ion beam energy control apparatus 100. The ion beam energy control apparatus includes an entrance end 101 and an exit end 102. The entrance end 101 is used for the ion beam 200 to enter, and the exit end 102 is used for the ion beam 200 to exit.
The ion beam energy control apparatus further comprises a plurality of electrode pairs 103. The plurality of electrode pairs 103 is disposed between the inlet end 101 and the outlet end 102. Each electrode pair 103 includes a first electrode 1031 and a second electrode 1032, respectively, which are oppositely disposed. The first electrode 1031 and the second electrode 1032 are each rod-shaped. A space between the first electrode 1031 and the second electrode 1032 is passed by the ion beam 200. Wherein the shapes of the first electrode 1031 and the second electrode 1032 may be the same or different. The spaces between the first electrodes 1031 and the second electrodes 1032 of all the electrode pairs 103 are connected to each other to form a beam channel that is emitted from the inlet 101 to the outlet 102, that is, the first electrodes 1031 and the second electrodes 1032 are respectively disposed on two sides of the beam channel.
At least one electrode pair 103 of the plurality of electrode pairs 103 forms a first electrode group 131, and a voltage applied to the first electrode group 131 deflects the ion beam 200 toward a first direction when passing through a beam path formed by the first electrode group 131. In this embodiment, the electrode pairs 103 forming the first electrode group 131 are preferably adjacent electrode pairs 103 among the plurality of electrode pairs 103. The voltage applied to the first electrode group 131 indicates that a voltage is applied to each electrode pair 103 in the first electrode group 131, but it is not limited that the voltage applied to each electrode pair 103 is the same, that is, the voltage applied to each electrode pair 103 in the first electrode group 131 may be independently set, and may be the same or different, but it is necessary to ensure that the ion beam 200 is deflected in the first direction when passing through the space between the electrode pairs 103. Since the voltages applied to each electrode pair 103 in the first electrode group 131 can be set independently and there is a determinable correspondence between the voltage difference of the electrode pair 103 and the deflection angle, the deflection angle of the ion beam 200 passing through the space between each electrode pair 103 in the first electrode group 131 can also be set independently and can be the same or different.
At least one electrode pair 103 of the plurality of electrode pairs 103 forms a second electrode group 132, and the voltage applied to the second electrode group 132 deflects the ion beam 200 in a second direction when passing through a beam path formed by the second electrode group 132. The second direction is opposite the first direction, wherein the opposite direction is not necessarily the exact opposite of the first and second directions (180 degrees apart), and may be substantially opposite (e.g., greater than 90 degrees and less than 180 degrees apart). In this embodiment, the electrode pairs 103 forming the second electrode group 132 are preferably adjacent electrode pairs 103 among the plurality of electrode pairs 103. The voltage applied to the second electrode group 132 indicates that a voltage is applied to each electrode pair 103 in the second electrode group 132, but it is not limited that the applied voltage of each electrode pair 103 is the same, that is, the voltage applied to each electrode pair 103 in the second electrode group 132 can be set independently, and can be the same or different, but it is necessary to ensure that the ion beam 200 is deflected to the second direction when passing through the space between the electrode pairs 103. Since the voltages applied to each electrode pair 103 in the second electrode group 132 can be set independently and there is a determinable correspondence between the voltages and deflection angles, the deflection angles of the ion beam 200 passing through the space between each electrode pair 103 in the second electrode group 132 can also be set independently and can be the same or different.
In this embodiment, the first electrode group 131 may be disposed in front of the second electrode group 132 along the beam advancing direction, and in other embodiments, the first electrode group 131 may also be disposed behind the second electrode group 132.
The ion beam 200 has a central trajectory that is S-shaped curved when passing through the beam path formed by the plurality of electrode pairs 103. In this embodiment, no other electrode pair 103 is provided between the first electrode group 131 and the second electrode group 132. Although the present invention is not limited to this, in other embodiments, another electrode pair 103 may be disposed between the first electrode group 131 and the second electrode group 132, but the voltage of the electrode pair 103 disposed between the first electrode group 131 and the second electrode group 132 preferably does not change the proceeding direction or the approximate proceeding direction of the ion beam 200, so as to ensure that the ion beam center trajectory is S-shaped and curved as a whole.
The arrangement direction and the voltage difference of the first electrode 1031 and the second electrode 1032 are related to the deflection direction of the ion beam 200 passing therethrough. In this embodiment, the first electrode 1031 and the second electrode 1032 are disposed opposite to each other in a vertical direction, specifically, the first electrode 1031 is disposed on the upper portion and the second electrode 1032 is disposed on the lower portion, but the present invention is not limited thereto, and in other embodiments, the first electrode 1031 may be disposed on the lower portion and the second electrode 1032 may be disposed on the upper portion. The ion beam 200 may be deflected upward or downward while passing through the beam path, specifically, the first direction is upward, and the second direction is downward; or, the first direction is downward and the second direction is upward.
In the first electrode group 131 and the second electrode group 132:
in the electrode group in which the applied voltage causes the ion beam 200 to be deflected upward, the voltage of the electrode disposed at the upper portion is lower than the voltage of the electrode disposed at the lower portion;
the applied voltage causes the ion beam 200 to deflect downward within the electrode group, with the voltage of the electrode disposed at the upper portion being higher than the voltage of the electrode disposed at the lower portion.
Specifically, in the present embodiment, the first electrode group 131 realizes upward deflection of the ion beam 200, and the second electrode group 132 realizes downward deflection of the ion beam 200. In the first electrode group 131, the voltage of the first electrode 1031 should be lower than the voltage of the second electrode 1032; in the second electrode group 132, the voltage of the first electrode 1031 should be higher than that of the second electrode 1032.
In the first electrode group 131 and the second electrode group 132 of this embodiment, along the beam advancing direction, the first electrode group 131, which is applied with a voltage to deflect the ion beam 200 upward, is disposed behind the second electrode group 132, which is applied with a voltage to deflect the ion beam 200 downward, that is, the ion beam 200 is deflected upward and then deflected downward when passing through the whole beam passage. At this time, the rear first electrode 1031 is located at a position not higher than the front first electrode 1031, and the rear second electrode 1032 is located at a position not higher than the front second electrode 1032.
Of course, the present invention is not limited thereto, and in other embodiments, as shown in fig. 4, in another ion beam energy control apparatus, the first electrode group 131 may realize downward deflection of the ion beam 200, and the second electrode group 132 may realize upward deflection of the ion beam 200. Accordingly, in the first electrode group 131, the voltage of the first electrode 1031 should be higher than that of the second electrode 1032; in the second electrode group 132, the voltage of the first electrode 1031 should be lower than the voltage of the second electrode 1032. In the first electrode group 131 and the second electrode group 132, in the beam advancing direction, the electrode group, which deflects the ion beam 200 upward by the applied voltage, may also be disposed in front of the electrode group, which deflects the ion beam 200 downward by the applied voltage, that is, the ion beam 200 is deflected downward and then deflected upward when passing through the entire beam passage. At this time, the position of the rear first electrode 1031 is not lower than the position of the front first electrode 1031, and the position of the rear second electrode 1032 is not lower than the position of the front second electrode 1032. The other parts of the ion beam energy control device are the same as the structure of the embodiment.
For convenience of processing, the first electrode 1031 and the second electrode 1032 in this embodiment may have rectangular or square vertical cross-sections, and the right angle is chamfered. The voltages of the first electrode 1031 and the second electrode 1032 are not positive.
The heights of the first electrode 1031 and the second electrode 1032 are both greater than the beam height (the longest direction of the beam is generally referred to as the height in the industry, and the same direction of the electrode and the longest direction of the beam is also referred to as the height for consistency). For a beam with a height of about 300mm, the lowest value of the heights of the first electrode 1031 and the second electrode 1032 is between 500 and 600 mm.
The ion beam energy control apparatus further comprises: a cavity 109, both ends of which form the inlet end 101 and the outlet end 102, respectively. Each electrode pair is disposed in the cavity 109. In order to avoid the influence of the cavity wall potential on the beam current with the height of about 300mm, the lowest value of the height of the cavity 109 is 700-1000 mm.
In this embodiment, the ion beam energy control apparatus further includes, sequentially arranged from the entrance end 101 to the electrode pair 103 closest to the entrance end 101: an entrance electrode pair 104 and a suppression electrode pair 105. The inlet electrode pair 104 includes two inlet electrodes 1041 oppositely disposed, and the inlet electrodes 1041 have the same potential as the inlet end 101. The inlet electrode pair 104 serves as a connection and transition for the entire device to the upstream. The suppression electrode pair 105 includes two suppression electrodes 1051 disposed opposite each other, the suppression electrodes 1051 having a more negative potential than the entrance electrode. In such multi-electrode systems as the ion beam energy control apparatus, there are always some electrodes with more positive potential, and due to the very small mass, electrons are easily accelerated in the electric field to bombard the electrodes, which may cause the voltage of the power supply connected to the electrodes to change or even run away. For a stand-alone multi-electrode system, there is no concern about this problem as long as electrons are not generated inside it. However, in other parts of the ion beam, due to a series of effects such as the ion beam bombardment generating secondary electrons due to the charge exchange effect, a large number of electrons are continuously generated, and these electrons enter the multi-electrode system to cause a problem. The suppression electrode pair 105 functions to prevent these electrons from entering the multi-electrode system, and it is common practice to place an electrode at the junction between the system and the outside, which has a lower potential than the outside, to form a potential barrier to the electrons, thereby blocking them.
The ion beam energy control apparatus also includes an exit electrode pair 106 disposed from the exit end 102 to the electrode pair closest to the exit end 102. The outlet electrode pair 106 includes two outlet electrodes 1061 disposed opposite to each other, and the voltage of the outlet electrodes 1061 is equal to the ground voltage. The ground voltage is equal to the cavity voltage. The outlet electrode pair 106 serves as a connection and transition for the entire device downstream.
In this embodiment, the ion beam energy control apparatus further includes: a first pair of longitudinal end electrodes 107 and a second pair of longitudinal end electrodes 108. The first pair of longitudinal end electrodes 107 includes two first longitudinal end electrodes (only one first longitudinal end electrode is shown in the figure because of the angle of the figure, and the other first longitudinal end electrode is shielded by the first longitudinal end electrode) which are oppositely disposed between the first electrode groups 131. The second pair of longitudinal end electrodes 108 is disposed between the second electrode groups 132 and is disposed opposite to each other (only one second longitudinal end electrode is shown in the figure due to the angle problem, and the other second longitudinal end electrode is shielded by the second longitudinal end electrode). The first longitudinal end electrode pair 107 has a potential more positive than the potential at the center of the longitudinal connecting line of the first longitudinal end electrode pair 107. The second pair of longitudinal end electrodes 108 has a potential more positive than the potential at the center of the longitudinal link of the second pair of longitudinal end electrodes 108. The arrangement of the first longitudinal end electrode pair 107 and the second longitudinal end electrode pair 108 can control the angles of both sides of the beam current.
The 9mA P + ion beam with a height of 300mm is decelerated from 10keV to 3keV by the ion beam energy control device shown in fig. 2-3 of the present embodiment, and the simulation results are shown in fig. 5-7:
as shown in fig. 5, emission in the vertical direction at 500mm in the plane (abscissa z represents vertical length (m) and ordinate represents divergence (degrees)): along the vertical direction, the beam is gradually converged within 300mm (see beam in the rectangular region in the figure) and almost zero divergence/convergence within 200mm (see beam in the elliptical region in the figure). The two ends of the beam are compressed by the first longitudinal end electrode pair and the second longitudinal end electrode pair.
As shown in fig. 6, 1D beam current profile in the vertical direction at 500mm in plane (abscissa z represents vertical length (m) and ordinate represents relative intensity (a.u)): within the height of 300mm, the beam bending degree is different by 2.5%, and the curve is in a sharp step shape.
As shown in fig. 7, in a 2D beam profile of 500mm in plane (the abscissa z represents the vertical length (cm), and the ordinate y represents the horizontal length (cm)): along the vertical direction, the beam current is very straight and uniform.
The simulation result shows that the ion beam energy control device of the embodiment can transmit the beam with the height of about 300mm, and along the vertical direction, the beam has good convergence and uniformity and less energy loss.
While specific embodiments of the invention have been described above, it will be appreciated by those skilled in the art that these are by way of example only, and that the scope of the invention is defined by the appended claims. Various changes and modifications to these embodiments may be made by those skilled in the art without departing from the spirit and scope of the invention, and these changes and modifications are within the scope of the invention.
Claims (12)
1. An ion beam energy control apparatus, comprising:
the ion source comprises an inlet end and an outlet end, wherein the inlet end is used for injecting ion beams, and the outlet end is used for injecting the ion beams;
a plurality of electrode pairs are arranged between the inlet end and the outlet end, each electrode pair respectively comprises a first electrode and a second electrode which are oppositely arranged, the first electrode and the second electrode are both rod-shaped, and a space between the first electrode and the second electrode is used for ion beams to pass through;
at least one electrode pair in the plurality of electrode pairs forms a first electrode group, and the voltage applied to the first electrode group enables the ion beam to deflect towards a first direction when passing through a beam channel formed by the first electrode group;
at least one electrode pair in the plurality of electrode pairs forms a second electrode group, and the voltage applied to the second electrode group enables the ion beam to deflect towards a second direction when passing through a beam channel formed by the second electrode group, wherein the second direction is opposite to the first direction.
2. The ion beam energy control apparatus of claim 1, wherein a central trajectory of the ion beam is S-shaped curved when the ion beam passes through a beam path formed by the plurality of electrode pairs.
3. The ion beam energy control apparatus of claim 1 or 2, further comprising, arranged in sequence from the entrance end to a pair of electrodes closest to the entrance end:
an inlet electrode pair, which comprises two inlet electrodes arranged oppositely and has the same potential with the inlet end;
a suppression electrode pair comprising two suppression electrodes disposed opposite each other, the suppression electrodes having a more negative potential than the entrance electrode;
the ion beam energy control apparatus further comprises, disposed from the exit end to a pair of electrodes closest to the exit end:
and the outlet electrode pair comprises two outlet electrodes which are oppositely arranged, and the voltage of the outlet electrodes is equal to the ground voltage.
4. The ion beam energy control apparatus of claim 3, further comprising:
The first longitudinal end electrode pair comprises two first longitudinal end electrodes which are arranged between the first electrode groups and are oppositely arranged;
the second longitudinal end electrode pair is arranged between the second electrode groups and is provided with two second longitudinal end electrodes oppositely;
the first longitudinal end electrode pair has a potential more positive than a potential of a center of a longitudinal connecting line of the first longitudinal end electrode pair;
the second longitudinal end electrode pair has a potential more positive than a potential of a center of a longitudinal link of the second longitudinal end electrode pair.
5. The ion beam energy control apparatus of claim 1, wherein the first electrode and the second electrode are disposed opposite to each other in an up-down direction;
the first direction is upward, and the second direction is downward; or, the first direction is downward and the second direction is upward.
6. The ion beam energy control apparatus of claim 5, wherein in the first electrode group and the second electrode group:
the voltage applied to the electrode group makes the ion beam deflect upwards, and the voltage of the electrode arranged at the upper part is lower than the voltage of the electrode arranged at the lower part;
the applied voltage causes the ion beam to deflect downwards, and the voltage of the electrode arranged at the upper part is higher than that of the electrode arranged at the lower part.
7. The ion beam energy control apparatus of claim 5, wherein in the first electrode group and the second electrode group:
along the advancing direction of the beam, when the electrode group which deflects the ion beam upwards by the applied voltage is arranged in front of the electrode group which deflects the ion beam downwards by the applied voltage, the position of the rear first electrode is not lower than that of the front first electrode, and the position of the rear second electrode is not lower than that of the front second electrode;
or, along the beam advancing direction, when the electrode group which deflects the ion beam upwards by the applied voltage is arranged behind the electrode group which deflects the ion beam downwards by the applied voltage, the position of the rear first electrode is not higher than that of the front first electrode, and the position of the rear second electrode is not higher than that of the front second electrode.
8. The ion beam energy control apparatus of claim 1, wherein the voltage of each of the first electrode and the second electrode is non-positive.
9. The ion beam energy control apparatus of claim 1, wherein the first electrode and the second electrode each have a height greater than a beam height.
10. The ion beam energy control apparatus of claim 9, wherein the minimum height of the first electrode and the second electrode is between 500 mm and 600 mm.
11. The ion beam energy control apparatus of claim 10, further comprising: the cavity, the both ends of cavity form respectively the entry end with the exit end, the minimum value of cavity height is between 700 ~ 1000 mm.
12. The ion beam energy control apparatus of claim 1, wherein the first electrode and the second electrode have a rectangular or square vertical cross-section and are chamfered at right angles.
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| CN117438265A (en) * | 2023-11-27 | 2024-01-23 | 青岛四方思锐智能技术有限公司 | Speed regulation deflection assembly and ion implanter |
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| CN105390356A (en) * | 2014-08-29 | 2016-03-09 | 朗姆研究公司 | Ion injector and lens system for ion beam milling |
| CN106971931A (en) * | 2015-10-14 | 2017-07-21 | 汉辰科技股份有限公司 | System and technique is ion implanted |
| JP2017157403A (en) * | 2016-03-01 | 2017-09-07 | 株式会社東芝 | Electron beam generator |
| TWM546003U (en) * | 2017-04-07 | 2017-07-21 | 有成精密股份有限公司 | Decelerate module |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117438265A (en) * | 2023-11-27 | 2024-01-23 | 青岛四方思锐智能技术有限公司 | Speed regulation deflection assembly and ion implanter |
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| CN111863576B (en) | 2023-10-20 |
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