CN111785684A - Preparation method of integrated thin film structure suitable for Micro OLED display - Google Patents

Preparation method of integrated thin film structure suitable for Micro OLED display Download PDF

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CN111785684A
CN111785684A CN202010568101.4A CN202010568101A CN111785684A CN 111785684 A CN111785684 A CN 111785684A CN 202010568101 A CN202010568101 A CN 202010568101A CN 111785684 A CN111785684 A CN 111785684A
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inorganic
preparation
organic
oled display
ultraviolet light
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李雪原
王登峰
任清江
晋芳铭
刘胜芳
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Semiconductor Integrated Display Technology Co Ltd
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Semiconductor Integrated Display Technology Co Ltd
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • H10K50/844Encapsulations
    • H10K50/8445Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/1201Manufacture or treatment

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  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

The invention discloses a preparation method of an integrated thin film structure suitable for a Micro OLED display, which is characterized in that an inorganic-organic hybrid precursor capable of realizing separation and film formation under the irradiation of ultraviolet light is printed on an OLED light-emitting device and the surface of a substrate which is not covered by the OLED light-emitting device through an ink-jet printing process; after the material is induced by ultraviolet light, the structure of the hybrid material is destroyed, the inorganic material is released to the bottom layer and is automatically assembled into an inorganic film, and the organic matter is cured by the ultraviolet light to form an organic layer. Therefore, the preparation of the inorganic layer and the organic layer is realized simultaneously through one-step process, and the process flow is simplified; according to the verification of the Micro OLED display prepared by the method, no new blackening point exists when the Micro OLED display is stored for 240 hours at 85 ℃ in a high-temperature and high-humidity environment of 85 percent, the reliability is good, and the Micro OLED display can effectively prevent the corrosion of water vapor or oxygen.

Description

Preparation method of integrated thin film structure suitable for Micro OLED display
Technical Field
The invention belongs to the technical field of Micro OLED displays, and particularly relates to a preparation method of an integrated thin film structure suitable for a Micro OLED display.
Background
Micro OLED (Organic Light Emitting Display) is called black horse of next generation Display technology, and is now widely used in military markets such as helmet-mounted helmets, guns, night vision devices, etc., and with the application of new technologies such as AR/VR and autopilot, Micro OLED microdisplays will grow explosively. Most of the existing terminal products in the market are head-mounted or wearable devices. In the packaging of the screen body, because the size is too small, the TFE structure cannot be patterned, and the whole surface is generally coated with a film and then patterned by dry etching or laser and the like. This can result in the TFE cut-out being exposed to the environment, and moisture or oxygen from the environment can corrode into the OLED device from the side, resulting in failure of the screen and poor reliability. And the film package can avoid the above problems to some extent.
Although the Micro OLED Micro display also includes an inorganic-organic stacked structure, most of the Micro OLED Micro display is obtained by conventional inorganic and organic multi-coating film formation, and the schematic diagram is shown in fig. 5, which is complex in process and high in cost.
Disclosure of Invention
In order to solve the technical problems, the invention provides a preparation method of an integrated thin film structure suitable for a Micro OLED display, which is characterized in that an inorganic-organic hybrid precursor capable of realizing separation and film formation under the irradiation of ultraviolet light is printed on an OLED light-emitting device and the surface of a substrate which is not covered by the OLED light-emitting device through an ink-jet printing process; after the material is induced by ultraviolet light, the structure of the hybrid material is destroyed, the inorganic material is released to the bottom layer and is automatically assembled into an inorganic film, and the organic matter is cured by the ultraviolet light to form an organic layer. Therefore, the preparation of the inorganic layer and the organic layer is realized simultaneously through one-step process, and the process flow is simplified.
The invention also provides a preparation method of the Micro OLED display, the OLED device with the integrated thin film structure package is prepared by the preparation method, and the color film process, the cover plate stripping and attaching, the cutting and the module assembly are sequentially carried out on the OLED device. The Micro OLED display prepared in the way is proved to have no new black spot after being stored for 240 hours in the environment with 85 ℃ and 85% high temperature and high humidity, and has good reliability.
A preparation method of an integrated thin film structure suitable for a Micro OLED display comprises the following steps:
(1) printing an inorganic-organic hybrid precursor which can be separated and formed into a film under the irradiation of ultraviolet light on the OLED light-emitting device and the surface of a substrate which is not covered by the OLED light-emitting device by using an ink-jet printing process;
(2) carrying out first ultraviolet irradiation on the inorganic-organic hybrid precursor to realize inorganic and organic separation, and then leveling;
(3) after leveling, carrying out secondary ultraviolet irradiation to form an inorganic layer and an organic layer;
(4) and (4) repeating the steps (1) to (3) for multiple times to finish the preparation of the thin film packaging layer.
Further, in the step (1), the thickness of the printing is 0.5-2 μm, preferably 1.5 μm.
In the step (2), when the first ultraviolet light is irradiated, the wavelength of the ultraviolet light is 395-400 nm, preferably 395 nm; the ultraviolet energy is 1000-3000 mJ/m2Preferably 1100mJ/m2(ii) a The ultraviolet irradiation time is 40-200 s, preferably 150 s.
In the step (2), the leveling time is 150-400 s, preferably 300 s. The leveling is at N in the inkjet printing apparatus2Standing in the environment.
In the step (3), the wavelength of ultraviolet light is 248-360 nm, preferably 248nm, during the second ultraviolet light irradiation; the ultraviolet energy is 1000-3000 mJ/m2Preferably 2800mJ/m2(ii) a The ultraviolet irradiation time is 40-200 s, preferably 50 s.
In the step (4), the repeated times n are more than or equal to 2, and the inorganic and organic laminated structures can be realized by repeating the process steps.
Further, the inorganic component in the inorganic-organic hybrid precursor is metal oxide nanoparticles; the organic component is an organic oligomer.
The inorganic component in the inorganic-organic hybrid precursor is preferably zinc oxide nanoparticles; the organic component is preferably a polymethacrylate oligomer, more preferably a polymethylmethacrylate oligomer.
Further, the preparation method of the inorganic-organic hybrid precursor comprises the following steps:
A. dissolving zinc oxide nanoparticles in a mixed solvent of oleic acid and 1-octadecylene, reacting for 2-2.5 h at 250 ℃ under the protection of nitrogen, then reducing the temperature to room temperature, centrifuging, washing and drying to obtain oil-soluble ZnO nanoparticles;
B. dissolving oligomeric methyl methacrylate in a mixed solvent of methanol and deionized water, and adjusting the pH value to 12-13 to obtain a mixed solution;
C. dispersing the oil-soluble ZnO nanoparticles prepared in the step A in chloroform, adding the mixed solution obtained in the step B, and stirring for 30-60 min;
D. adding deionized water into the reaction system, continuously stirring, standing, layering the product, and collecting a water phase;
E. adding acetone into the water phase, stirring and mixing uniformly, centrifuging, and removing the centrifugate to obtain the product, namely the inorganic-organic hybrid precursor.
Further, in the step A, the using amount ratio of the zinc oxide nanoparticles, oleic acid and 1-octadecene is (10-15) mg: (0.1-0.2) mL: (2.0-5.0) mL, preferably 12 mg: 0.15 mL: 3.0 mL.
In the step B, the volume ratio of methanol to water is 1: 10; the concentration of the oligomeric methyl methacrylate in the mixed solution is 0.01-0.02 g/mL, preferably 0.018 g/mL.
In the step C, the volume ratio of chloroform to deionized water in the step B is 1: 2.
The volume of the deionized water added in the step D is the same as that in the step B.
In step E, the volume ratio of acetone to aqueous phase is 1: 2.
In the preparation method of the inorganic-organic hybrid precursor provided by the invention, firstly, oil-soluble ZnO nano-particles are prepared, and then the oil-soluble ZnO nano-particles are compounded with oligomeric methyl methacrylate to prepare the ZnO nano-particles-polymethyl methacrylate inorganic-organic hybrid precursor. After the organic ZnO nano-particles are printed on the surface of an OLED device through ink jet, the organic ZnO nano-particles and the organic multi-chain can be dissociated and dispersed into inorganic ZnO nano-particles and organic multi-chain under the irradiation of ultraviolet light of 395-400 nm, and the inorganic ZnO nano-particles and the organic multi-chain can be gradually layered under the action of gravity after time leveling due to the fact that the inorganic ZnO nano-particles and the organic multi-chain have different densities; after layering, forming an upper organic chain object and lower inorganic nano particles, and then under the irradiation of ultraviolet light with the wavelength of 248-360 nm in the second step, carrying out polymerization reaction on the upper organic chain object to gradually connect into an organic layer; similarly, the inorganic nanoparticles also have an ultraviolet induction effect, and are gradually connected under the energy of ultraviolet light to form an inorganic layer, so that an integrated thin film structure is formed.
Compared with the prior art, the preparation method of the integrated thin film structure suitable for the Micro OLED display is simple, the preparation of the inorganic layer and the organic layer can be simultaneously realized with the help of an ink-jet printer with an ultraviolet curing function through one-step process, and the preparation process is convenient and fast. According to the verification of the Micro OLED display prepared by the method, no new blackening point exists when the Micro OLED display is stored for 240 hours at 85 ℃ in a high-temperature and high-humidity environment of 85 percent, the reliability is good, and the Micro OLED display can effectively prevent the corrosion of water vapor or oxygen.
Drawings
FIG. 1 is a partial SEM photograph (A) of a thin film encapsulation layer prepared in example 2, a SEM photograph (B) of a surface without a base layer, and a SEM photograph (C) of a surface of an organic layer;
FIG. 2 is a graph showing the test effect of the Micro OLED display in example 2 under a high temperature and high humidity environment;
FIG. 3 is a schematic diagram of layering after photo-induction after printing an inorganic-organic hybrid precursor; in the figure, 1 is an OLED light-emitting device, 2 is an inorganic-organic hybrid precursor, 3 is an inorganic layer, and 4 is an organic layer;
fig. 4 is a schematic diagram of separation and film formation of an organic-inorganic hybrid precursor under the induction of ultraviolet light, and in the diagram, 5 is ZnO nanoparticles. 6 is oligomeric methyl methacrylate;
fig. 5 is a schematic diagram of a conventional packaging method, in which 0 is a substrate, 1 is an OLED light emitting device, 7 is a first inorganic packaging layer, 8 is an organic packaging layer, and 9 is a second inorganic packaging layer.
Detailed Description
The present invention will be described in detail with reference to examples.
The ink jet printer used in the present invention was Innovejet-200, and the manufacturer was Unijet.
Example 1
A preparation method of an inorganic-organic hybrid precursor comprises the following steps:
A. dissolving 12mg of zinc oxide in a mixed solvent of 0.15mL of oleic acid and 3.0mL of 1-octadecylene, reacting for 2.0h at 250 ℃ under the protection of nitrogen, then cooling to room temperature, centrifuging, washing and drying to obtain oil-soluble ZnO nanoparticles;
B. dissolving 0.2g of oligomeric methyl methacrylate in a mixed solvent of 1.0mL of methanol and 10mL of deionized water, and adjusting the pH value to 12 by using a KOH solution with the mass solubility of 40% to obtain a mixed solution;
C. dispersing the oil-soluble ZnO nano-particles prepared in the step A in 5mL of chloroform, adding the mixed solution obtained in the step B, and stirring for 30 min;
D. adding 10mL of deionized water into the reaction system, continuously stirring for 20min, standing, layering the product, and collecting a water phase;
E. adding acetone into the water phase, stirring and mixing uniformly, centrifuging, and removing the centrifugate to obtain the product, namely the inorganic-organic hybrid precursor.
Example 2
A preparation method of an integrated thin film structure suitable for a Micro OLED display comprises the following steps:
(1) printing the inorganic-organic hybrid precursor prepared in example 1 with a thickness of 1.5 μm on the OLED light emitting device and the surface of the substrate not covered by the OLED light emitting device using an inkjet printer;
(2) ultraviolet irradiation of 395nm for the first time for 150s is carried out on the inorganic-organic hybrid precursor, and the energy of the ultraviolet is 1100mJ/m2(ii) a Then leveling for 300 s;
(3) after leveling, the second 248nm ultraviolet irradiation is carried out for 50s, and the energy of the ultraviolet is 2800mJ/m2
(4) Repeating the steps (1) - (3) for n times, wherein n is more than or equal to 2, so as to finish the preparation of the thin film packaging layer. A partial SEM image is shown in fig. 1A, in which 1 is a part of a CMOS circuit, 2 is an OLED light emitting layer, 3 is a hardened ZnO nanoparticle, i.e., an inorganic layer, and 4 is a polymerized organic chain, i.e., an organic layer, a surface SEM image of the hardened ZnO nanoparticle, i.e., the inorganic layer, is shown in fig. 1B, and a surface SEM image of the polymerized organic chain, i.e., the organic layer, is shown in fig. 1C.
And preparing the OLED device with the integrated thin film structure package by the preparation method, and sequentially carrying out color film process, cover plate stripping and attaching, cutting and module assembly on the OLED device to obtain the Micro OLED display. The storage result at high temperature and high humidity is as follows: the product is stored for 240 hours at 85 ℃ and 85% humidity without new black spots, and the reliability is verified as shown in figure 2.
The above detailed description of a method for fabricating an integral thin film structure suitable for Micro OLED displays, with reference to the embodiments, is illustrative and not restrictive, and several embodiments can be enumerated within the scope of the limitations, so that variations and modifications thereof without departing from the general concept of the present invention are within the scope of the present invention.

Claims (10)

1. A preparation method of an integrated thin film structure suitable for a Micro OLED display is characterized by comprising the following steps:
(1) printing an inorganic-organic hybrid precursor which can be separated and formed into a film under the irradiation of ultraviolet light on the OLED light-emitting device and the surface of a substrate which is not covered by the OLED light-emitting device by using an ink-jet printing process;
(2) carrying out first ultraviolet irradiation on the inorganic-organic hybrid precursor, and then leveling;
(3) after leveling, carrying out secondary ultraviolet irradiation;
(4) and (4) repeating the steps (1) to (3) for multiple times to finish the preparation of the thin film packaging layer.
2. The method according to claim 1, wherein in the step (1), the thickness of the print is 0.5 to 2 μm.
3. The preparation method according to claim 1, wherein in the step (2), the wavelength of the ultraviolet light is 395-400 nm when the ultraviolet light is irradiated for the first time; the ultraviolet energy is 1000-3000 mJ/m2The ultraviolet irradiation time is 40-200 s.
4. The method according to claim 1, wherein in the step (2), the leveling time is 150 to 400 seconds.
5. The preparation method according to claim 1, wherein in the step (3), the wavelength of the ultraviolet light is 248-360 nm during the second irradiation of the ultraviolet light; the ultraviolet energy is 1000-3000 mJ/m2The ultraviolet irradiation time is 40-200 s.
6. The process according to claim 1, wherein the repetition of step (4) is carried out for a number of times n.gtoreq.2.
7. The method of claim 1, wherein: the inorganic component in the inorganic-organic hybrid precursor is metal oxide nano-particles; the organic component is an organic oligomer.
8. The method of claim 7, wherein: the inorganic component in the inorganic-organic hybrid precursor is zinc oxide nano-particles; the organic component is polymethacrylate oligomer.
9. The method of preparing according to claim 1 or 7 or 8, wherein the method of preparing the inorganic-organic hybrid precursor comprises the steps of:
A. dissolving zinc oxide particles in a mixed solvent of oleic acid and 1-octadecylene, reacting for 2-2.5 h at 250 ℃ under the protection of nitrogen, then reducing the temperature to room temperature, centrifuging, washing and drying to obtain oil-soluble ZnO nanoparticles;
B. dissolving oligomeric methyl methacrylate in a mixed solvent of methanol and deionized water, and adjusting the pH value to 12-13 to obtain a mixed solution;
C. dispersing the oil-soluble ZnO nanoparticles prepared in the step A in chloroform, adding the mixed solution obtained in the step B, and stirring for 30-60 min;
D. adding deionized water into the reaction system, continuously stirring, standing, layering the product, and collecting a water phase;
E. adding acetone into the water phase, stirring and mixing uniformly, centrifuging, and removing the centrifugate to obtain the product, namely the inorganic-organic hybrid precursor.
10. A preparation method of a Micro OLED display is characterized by comprising the following steps: the preparation method of claim 1 is used for preparing the OLED device with the integrated thin film structure package, and the color film process, the cover plate peeling and attaching, the cutting and the module assembly are sequentially carried out on the OLED device.
CN202010568101.4A 2020-06-19 2020-06-19 Preparation method of integrated thin film structure suitable for Micro OLED display Pending CN111785684A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022141705A1 (en) * 2021-01-04 2022-07-07 深圳市华星光电半导体显示技术有限公司 Display panel, array substrate and preparation method therefor

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103178215A (en) * 2011-12-23 2013-06-26 财团法人工业技术研究院 Flexible substrate and manufacturing method thereof and manufacturing method of electronic element package
CN108198845A (en) * 2018-01-10 2018-06-22 京东方科技集团股份有限公司 Pixel defining layer and preparation method, display base plate and preparation method, display device
CN111180611A (en) * 2019-02-15 2020-05-19 广东聚华印刷显示技术有限公司 Thin film packaging method and thin film packaging structure prepared by same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103178215A (en) * 2011-12-23 2013-06-26 财团法人工业技术研究院 Flexible substrate and manufacturing method thereof and manufacturing method of electronic element package
CN108198845A (en) * 2018-01-10 2018-06-22 京东方科技集团股份有限公司 Pixel defining layer and preparation method, display base plate and preparation method, display device
CN111180611A (en) * 2019-02-15 2020-05-19 广东聚华印刷显示技术有限公司 Thin film packaging method and thin film packaging structure prepared by same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022141705A1 (en) * 2021-01-04 2022-07-07 深圳市华星光电半导体显示技术有限公司 Display panel, array substrate and preparation method therefor
US11869901B2 (en) 2021-01-04 2024-01-09 Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. Display panel, array substrate, and manufacturing method thereof

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