CN111732247A - Semiconductor ultrapure water treatment system and process - Google Patents
Semiconductor ultrapure water treatment system and process Download PDFInfo
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- CN111732247A CN111732247A CN202010646459.4A CN202010646459A CN111732247A CN 111732247 A CN111732247 A CN 111732247A CN 202010646459 A CN202010646459 A CN 202010646459A CN 111732247 A CN111732247 A CN 111732247A
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- 239000012498 ultrapure water Substances 0.000 title claims abstract description 65
- 229910021642 ultra pure water Inorganic materials 0.000 title claims abstract description 63
- 238000000034 method Methods 0.000 title claims abstract description 22
- 239000004065 semiconductor Substances 0.000 title claims abstract description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 126
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 43
- 238000004140 cleaning Methods 0.000 claims abstract description 22
- 239000012528 membrane Substances 0.000 claims abstract description 20
- 238000005498 polishing Methods 0.000 claims abstract description 14
- 239000002455 scale inhibitor Substances 0.000 claims abstract description 10
- 238000001914 filtration Methods 0.000 claims description 30
- 238000002347 injection Methods 0.000 claims description 10
- 239000007924 injection Substances 0.000 claims description 10
- 238000011084 recovery Methods 0.000 claims description 10
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 239000003795 chemical substances by application Substances 0.000 claims description 6
- 239000003657 drainage water Substances 0.000 claims description 5
- 238000005086 pumping Methods 0.000 claims description 3
- 238000001223 reverse osmosis Methods 0.000 abstract description 8
- 230000008929 regeneration Effects 0.000 abstract description 6
- 238000011069 regeneration method Methods 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 4
- 238000013497 data interchange Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 description 8
- 239000002245 particle Substances 0.000 description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 239000011148 porous material Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 241001089723 Metaphycus omega Species 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000003958 fumigation Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/28—Treatment of water, waste water, or sewage by sorption
- C02F1/283—Treatment of water, waste water, or sewage by sorption using coal, charred products, or inorganic mixtures containing them
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/441—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by reverse osmosis
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/444—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by ultrafiltration or microfiltration
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/469—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis
- C02F1/4693—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis electrodialysis
- C02F1/4695—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis electrodialysis electrodeionisation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/30—Organic compounds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
- C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F5/00—Softening water; Preventing scale; Adding scale preventatives or scale removers to water, e.g. adding sequestering agents
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- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Water Treatment By Sorption (AREA)
Abstract
The invention relates to a semiconductor ultrapure water treatment system and a process, which structurally comprises a raw water tank, a multi-media filter, a self-cleaning activated carbon filter, a filter water tank, a security filter, a first RO (reverse osmosis) device, a second RO device, an EDI (electronic data interchange) device, an ultrapure water tank, a UV (ultraviolet) sterilizer, a polishing mixed bed, a UF (ultraviolet) membrane and an ultrapure water using point which are sequentially connected, wherein the multi-media filter, the self-cleaning activated carbon filter and the first RO are respectively connected with a discharge pipe, a pipeline between the filter water tank and the security filter is connected with a scale inhibitor tank, a pipeline between the EDI device and the ultrapure water tank is connected with two ports of a three-way valve, the second RO device, the EDI device and the third port of the three. The invention has the advantages that: the structure and the process flow are reasonable in design, and no regeneration operation is performed, so that water collection interruption is avoided, continuous pure water collection can be realized, and the use effect is improved.
Description
Technical Field
The invention relates to a semiconductor ultrapure water treatment system and a semiconductor ultrapure water treatment process, and belongs to the technical field of water treatment equipment.
Background
In a semiconductor manufacturing process, more than 80% of the processes are subjected to chemical treatment, and ultrapure water cannot be separated from each chemical treatment. In the treatment process of the silicon wafer, more than half of the processes are directly subjected to high-temperature treatment after being cleaned by ultrapure water, and impurities in water can enter the silicon wafer, so that the performance of a device is reduced, and the yield is low. The resistivity of ultrapure water proposed by the electronic industry is not less than 18 M.OMEGA.cm (25 ℃), which is extremely close to the theoretical pure water quality of 18.3 M.OMEGA.cm (25 ℃).
The semiconductor ultrapure water treatment system and the semiconductor ultrapure water treatment process in the prior art have design defects, so that the use requirements cannot be effectively met. For example, semiconductor ultrapure water treatment systems and processes in the prior art generally include regeneration operations, water collection interruption occurs during regeneration, continuous and continuous pure water collection cannot be guaranteed, and the use effect is poor.
Disclosure of Invention
The invention provides a semiconductor ultrapure water treatment system and a semiconductor ultrapure water treatment process, which aim to overcome the defects in the prior art, do not comprise regeneration operation and realize continuous pure water collection.
The technical solution of the invention is as follows: the utility model provides an ultrapure water treatment system of semiconductor, its structure includes the former water tank that connects gradually through the pipeline, the multimedium filter, self-cleaning active carbon filter, filter the water tank, the safety filter ware, first RO, second RO, the EDI device, the ultrapure water case, the UV sterilizer, the polishing mixes the bed, UF membrane and ultrapure water point of use, former water tank connects the former water inlet tube, the multimedium filter ware, self-cleaning active carbon filter and first RO are respectively through the pipe connection delivery pipe, the pipeline passes through pipe connection antisludging agent case between filter the water tank and the safety filter ware, two mouths of pipe connection three-way valve between EDI device and the ultrapure water case, second RO, the EDI device with the third mouth of three-way valve is respectively through pipe connection filter the water tank water inlet, the ultrapure water point of use passes through return water pipe connection ultrapure.
Preferably, a raw water pump is arranged in a pipeline between the raw water tank and the multimedia filter, an RO supply pump is arranged in a pipeline between the filter water tank and the security filter, a first RO pump is arranged in a pipeline between the security filter and the first RO, a second RO pump is arranged in a pipeline between the first RO and the second RO, an ultrapure water supply pump is arranged in a pipeline between the ultrapure water tank and the UV sterilizer, and a scale inhibitor injection pump is arranged in a pipeline between the filter water tank and the security filter and the scale inhibitor tank.
A treatment process of a semiconductor ultrapure water treatment system comprises the following process steps:
1)17.8m3inputting the raw water of/h into a raw water tank;
2) pumping raw water in the raw water tank into a multi-media filter for filtering, wherein the filtering is 17.8m3/h；
3) Multi-media filter 17.2m3The effluent enters a self-cleaning activated carbon filter for filtering and then enters a filtering water tank;
4) the outlet water of the filtering water tank is pumped into a security filter for filtering, and the water pump is 21m3The pipeline between the filtering water tank and the security filter is filled with 5mg/L of scale inhibitor and 38mL/min 50m of injection pump through the injection pump;
5) the effluent of the cartridge filter is pumped into a first RO for treatment, 20.6m3H, first RO recovery 65%,;
6) the first RO effluent pump is pumped into a second RO for treatment, 13.4m3H, the second RO recovery rate is 85%;
7) the second RO effluent enters an EDI device for treatment, and the diameter is 11.4m3The recovery rate of the EDI device is 88 percent;
8) the effluent of the EDI device enters a super pure water tank with the volume of 10m3/h；
9) The effluent of the ultra-pure water tank is pumped into a UV sterilizer for treatment, and the volume is 13.0m3/h；
10) The water discharged from the UV sterilizer enters a polishing mixed bed for treatment;
11) treating the effluent of the polishing mixed bed in a UF membrane;
12) UF membrane effluent 13.0m3The point of use of ultrapure water is supplied,/h, the point of use of ultrapure water is 10.0m3/h；
13) The return water of the ultrapure water use point returns to the ultrapure water tank, the circulation rate is 0.30, and the return water is 3.0m3/h。
Preferably, the multi-media filter self-cleaning drainage water is 0.4m3Per h, self-cleaning activated carbon filter self-cleaning drainage water is 0.2m3H, first RO discharge Water 7.2m3/h。
Preferably, said second RO out2.0m water3The water returns to the filtering water tank at hour, and the water outlet of the EDI device is 1.4m3And/h returns to the filtering water tank.
The invention has the advantages that: the structure and the process flow are reasonable in design, and the activated carbon filter removes residual chlorine protection resin and a reverse osmosis membrane; removing fine particles remained by the activated carbon pretreatment equipment from suspended particles in raw water by using a cartridge filter, and protecting an RO membrane; removing salt, particles, organic matters and the like in water by two-stage RO; the EDI device removes ions from the water, thereby producing water of higher purity; the UV sterilizer and the polishing mixed bed provide guarantee for continuously providing high-purity water. Because no regeneration operation is carried out, the water collection interruption is avoided, the continuous pure water collection can be realized, and the use effect is improved.
Drawings
FIG. 1 is a schematic view showing the construction of a semiconductor ultrapure water treatment system of the present invention.
In the figure, 1 is a raw water tank, 2 is a multimedia filter, 3 is a self-cleaning activated carbon filter, 4 is a filter water tank, 5 is a scale inhibitor tank, 6 is a cartridge filter, 7 is a first RO, 8 is a second RO, 9 is an EDI device, 10 is a ultrapure water tank, 11 is a UV sterilizer, 12 is a polishing mixed bed, 13 is a UF membrane, and 14 is an ultrapure water use point.
Detailed Description
The present invention will be described in further detail with reference to examples and specific embodiments.
As shown in figure 1, the semiconductor ultrapure water treatment system structurally comprises a raw water tank, a multi-media filter, a self-cleaning activated carbon filter, a filter water tank, a cartridge filter, a first RO, a second RO, an EDI device, an ultrapure water tank, a UV sterilizer, a polishing mixed bed, a UF membrane and an ultrapure water using point which are sequentially connected through pipelines, wherein the raw water tank is connected with a raw water inlet pipe, the multi-media filter, the self-cleaning activated carbon filter and the first RO are respectively connected with a discharge pipe through pipelines, a pipeline between the filter water tank and the cartridge filter is connected with a scale inhibitor tank through a pipeline, two ports of a three-way valve are connected between the EDI device and the ultrapure water tank through a pipeline, the second RO, the EDI device and a third port of the three-way valve are respectively connected with a water inlet of the filter water tank through a pipeline.
The pipeline between the raw water tank and the multi-media filter is provided with a raw water pump, the pipeline between the filter water tank and the security filter is provided with an RO supply pump, the pipeline between the security filter and the first RO is provided with a first RO pump, the pipeline between the first RO and the second RO is provided with a second RO pump, the pipeline between the ultrapure water tank and the UV sterilizer is provided with an ultrapure water supply pump, and the pipeline between the filter water tank and the security filter and the pipeline between the antisludging agent tank are provided with an antisludging agent injection pump.
A semiconductor ultrapure water treatment process comprises the following process steps:
1)17.8 (max 25.4) m3Inputting the raw water of/h into a raw water tank;
2) pumping raw water in a raw water tank into a multi-medium filter for filtering, wherein the filtering is also 17.8 (maximum 25.4) m3/h；
3) Multi-media filter 17.2m3The effluent enters a self-cleaning activated carbon filter for filtering and then enters a filtering water tank;
4) the outlet water of the filtering water tank is pumped into a security filter for filtering, and the water pump is 21m3The pipeline between the filtering water tank and the security filter is filled with 5mg/L of scale inhibitor and 38mL/min 50m of injection pump through the injection pump;
5) the effluent of the cartridge filter is pumped into a first RO for treatment, 20.6m3H, first RO recovery 65%,;
6) the first RO effluent pump is pumped into a second RO for treatment, 13.4m3H, the second RO recovery rate is 85%;
7) the second RO effluent enters an EDI device for treatment, and the diameter is 11.4m3The recovery rate of the EDI device is 88 percent;
8) the effluent of the EDI device enters a super pure water tank with the volume of 10m3/h；
9) The effluent of the ultra-pure water tank is pumped into a UV sterilizer for treatment, and the volume is 13.0m3/h；
10) The water discharged from the UV sterilizer enters a polishing mixed bed for treatment;
11) treating the effluent of the polishing mixed bed in a UF membrane;
12) UF membrane effluent 13.0m3The point of use of ultrapure water is supplied,/h, the point of use of ultrapure water is 10.0m3/h；
13) The return water of the ultrapure water use point returns to the ultrapure water tank, the circulation rate is 0.30, and the return water is 3.0m3/h。
The multi-media filter self-cleaning drainage water is 0.4m3Per h, self-cleaning activated carbon filter self-cleaning drainage water is 0.2m3H, first RO discharge Water 7.2m3/h。
The second RO water outlet is 2.0m3The water returns to the filtering water tank at hour, and the water outlet of the EDI device is 1.4m3And/h returns to the filtering water tank.
According to the above procedure, RO is used to remove salts, particles, organic matter, etc. from water; the EDI device takes ion exchange resin as a transmission medium, and removes ions in water by electrification, thereby producing water with higher purity; the UV sterilizer and the polishing mixed bed provide guarantee for continuously providing high-purity water. Because no regeneration operation is carried out, the water collection interruption is avoided, and the continuous pure water collection can be realized.
In particular, the method comprises the following steps of,
1) an activated carbon filter: residual chlorine in raw water is a strong oxidant, and if the residual chlorine is not removed, the resin and the reverse osmosis membrane can be irreversibly damaged. The active carbon not only has strong adsorption capacity, but also has large adsorption capacity, and the main reason is the porous structure of the active carbon, and the specific surface area of the active carbon is as high as 500-2(ii) in terms of/g. The activated carbon has a developed pore structure and a large specific surface area, so that residual chlorine in water can be completely adsorbed, organic matters can be partially adsorbed, and the activated carbon also has a good effect of removing chromaticity and odor.
2) A cartridge filter: the suspended particles in the raw water still remain some fine particles after passing through the activated carbon pretreatment equipment. These foreign particles, if introduced directly into the RO unit with the influent water, can cause clogging of the membrane over time. Therefore, the security filter is arranged to play a role in protecting the RO membrane.
3) And (3) RO: reverse osmosis is a molecular-scale filtration process that removes 99% of soluble minerals, 95-97% of most insoluble organics, and more than 98% of biological and colloidal substances from water. The product water yield is directly proportional to the membrane use pressure. Increasing the operating pressure increases the production of product water without affecting the amount of salt removal. Therefore, the higher the pressure in the allowable range of the use pressure, the better the water quality and the more the water yield. Therefore, the operation cost of the system is reduced by adopting the operation under high recovery rate.
Example 1
1, a raw water tank is set: 1820mm in diameter, 1980mm in height and 5m in volume3Material PE;
1 set of multi-media filter: the aperture is 50 mu m;
1 set of self-cleaning activated carbon filters: the diameter is 450mm, the height is 1650mm, and the material is FRP, 190L/UNIT;
1 set of filter water tank with the size of 800 × 1500 × 1800mm, the material FRP and the volume of 2m3；
1 set of cartridge filter: flow rate of 25m3Material SUS304, pore diameter 5 μm;
1 set of first RO, 3 copies of × (3V-2V) and ultra-low pressure of 440ft2An RO membrane;
1 set of second RO, 3 portions of × (2V-1V) and ultra-low pressure of 440ft2An RO membrane;
2 sets of EDI devices: LX-45 z;
1 set of ultra pure water tank with size of 800 × 1500 × 1800mm, material FRP (fumigation) and volume of 2m3；
1 set of UV sterilizer: 02CDS, 0.276KW, and SUS 316L;
4 sets of polishing mixed bed: the diameter is 350mm, the height is 1650mm, and the material is FRP, 110L/UNIT;
1 set of UF membrane: pore diameter of 0.455 μm, and material SUS 316L;
1 set of scale inhibitor box: the diameter is 450mm, the height is 660mm, the material PE is adopted, and the volume is 100L;
2 sets of raw water pumps: 25m3/h*30m；
1 set of RO supply pumps: 21m3/h*40m；
1 set of first RO pumps: 21m3/h*120m；
1 set of second RO pumps: 14m3/h*120m；
1 set of ultrapure water supply pump: 13m3/h*70m；
1 set of scale inhibitor injection pump: 38mL/min 50 m.
All the above components are prior art, and those skilled in the art can use any model and existing design that can implement their corresponding functions.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, various changes and modifications can be made without departing from the inventive concept of the present invention, and these changes and modifications are all within the scope of the present invention.
Claims (5)
1. The utility model provides a semiconductor ultrapure water processing system, its characterized in that includes the former water tank that connects gradually through the pipeline, the multimedium filter, self-cleaning active carbon filter, filter the water tank, the safety filter ware, first RO, second RO, the EDI device, the ultrapure water case, the UV sterilizer, the bed is mixed in the polishing, UF membrane and ultrapure water point of use, former water tank connects the former water inlet tube, the multimedium filter ware, self-cleaning active carbon filter and first RO are respectively through pipe connection delivery pipe, the pipeline passes through pipe connection antisludging agent case between filter the water tank and the safety filter ware, two mouths of pipe connection three-way valve between EDI device and the ultrapure water case, second RO, EDI device and the third mouth of three-way valve is respectively through pipe connection filter the water tank water inlet, the ultrapure water point of use passes through the ultrapure water connection.
2. The semiconductor ultrapure water treatment system according to claim 1, wherein a raw water pump is provided in a pipe between the raw water tank and the multimedia filter, an RO feed pump is provided in a pipe between the filtration water tank and the cartridge filter, a first RO pump is provided in a pipe between the cartridge filter and the first RO, a second RO pump is provided in a pipe between the first RO and the second RO, an ultrapure water feed pump is provided in a pipe between the ultrapure water tank and the UV sterilizer, and an antisludging agent injection pump is provided in a pipe between the filtration water tank and the cartridge filter and the antisludging agent tank.
3. The process for treating a semiconductor ultrapure water treatment system as claimed in claim 1 or 2, which comprises the process steps of:
1)17.8m3inputting the raw water of/h into a raw water tank;
2) pumping raw water in the raw water tank into a multi-media filter for filtering, wherein the filtering is 17.8m3/h；
3) Multi-media filter 17.2m3The effluent enters a self-cleaning activated carbon filter for filtering and then enters a filtering water tank;
4) the outlet water of the filtering water tank is pumped into a security filter for filtering, and the water pump is 21m3The pipeline between the filtering water tank and the security filter is filled with 5mg/L of scale inhibitor and 38mL/min 50m of injection pump through the injection pump;
5) the effluent of the cartridge filter is pumped into a first RO for treatment, 20.6m3H, first RO recovery 65%,;
6) the first RO effluent pump is pumped into a second RO for treatment, 13.4m3H, the second RO recovery rate is 85%;
7) the second RO effluent enters an EDI device for treatment, and the diameter is 11.4m3The recovery rate of the EDI device is 88 percent;
8) the effluent of the EDI device enters a super pure water tank with the volume of 10m3/h；
9) The effluent of the ultra-pure water tank is pumped into a UV sterilizer for treatment, and the volume is 13.0m3/h；
10) The water discharged from the UV sterilizer enters a polishing mixed bed for treatment;
11) treating the effluent of the polishing mixed bed in a UF membrane;
12) UF membrane effluent 13.0m3The point of use of ultrapure water is supplied,/h, the point of use of ultrapure water is 10.0m3/h；
13) The return water of the ultrapure water use point returns to the ultrapure water tank, the circulation rate is 0.30, and the return water is 3.0m3/h。
4. The process for treating a semiconductor ultrapure water treatment system according to claim 3, wherein the multi-media filter self-cleaning discharge water is 0.4m3Per h, self-cleaning activated carbon filter self-cleaning drainage water is 0.2m3H, first RO discharge Water 7.2m3/h。
5. The process for treating ultrapure water for semiconductor treatment system as claimed in claim 4, wherein the second RO water is discharged in an amount of 2.0m3H return to the filtration tank, ED1.4m of water is discharged from the device I3And/h returns to the filtering water tank.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
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| CN115465919A (en) * | 2022-10-25 | 2022-12-13 | 江苏源邦环境科技有限公司 | Combined type ion exchange device |
| CN116969625A (en) * | 2023-06-26 | 2023-10-31 | 高频(北京)科技股份有限公司 | Wastewater treatment equipment for recycling semiconductor ultrapure water and wastewater treatment process |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112744947A (en) * | 2020-12-11 | 2021-05-04 | 安徽金禾实业股份有限公司 | Purified DCS (distributed control system) of pure water for hydrogen peroxide process |
| CN115465919A (en) * | 2022-10-25 | 2022-12-13 | 江苏源邦环境科技有限公司 | Combined type ion exchange device |
| CN115465919B (en) * | 2022-10-25 | 2023-09-08 | 江苏源邦环境科技有限公司 | Combined ion exchange device |
| CN116969625A (en) * | 2023-06-26 | 2023-10-31 | 高频(北京)科技股份有限公司 | Wastewater treatment equipment for recycling semiconductor ultrapure water and wastewater treatment process |
| CN116969625B (en) * | 2023-06-26 | 2024-07-19 | 高频(北京)科技股份有限公司 | Waste water treatment equipment for recycling semiconductor ultrapure water |
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Application publication date: 20201002 |