CN111722512A - Method for manufacturing hologram film and terminal - Google Patents

Method for manufacturing hologram film and terminal Download PDF

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Publication number
CN111722512A
CN111722512A CN201910212629.5A CN201910212629A CN111722512A CN 111722512 A CN111722512 A CN 111722512A CN 201910212629 A CN201910212629 A CN 201910212629A CN 111722512 A CN111722512 A CN 111722512A
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CN
China
Prior art keywords
hologram
plate
film
pattern
photosensitive
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Pending
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CN201910212629.5A
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Chinese (zh)
Inventor
唐根初
周文泣
邹威
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Anhui Jingzhuo Optical Display Technology Co Ltd
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Nanchang OFilm Tech Co Ltd
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Priority to CN201910212629.5A priority Critical patent/CN111722512A/en
Publication of CN111722512A publication Critical patent/CN111722512A/en
Pending legal-status Critical Current

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/024Hologram nature or properties
    • G03H1/0244Surface relief holograms
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/0276Replicating a master hologram without interference recording
    • G03H1/028Replicating a master hologram without interference recording by embossing

Abstract

The invention provides a method for manufacturing a holographic pattern film and a terminal, wherein the method comprises the following steps: making a hologram on the light-sensing plate; developing the hologram to form a hologram pattern on the plate; evaporating a photosensitive plate to enable the surface of the holographic pattern to be covered with metal and to be conductive; electroforming a photosensitive plate to form a mold, wherein the surface of the mold is provided with holographic patterns; and (3) stamping the base film by using a mould, so that the holographic pattern is transferred to the base film to form the holographic pattern film. Making a hologram on a photosensitive plate, developing the photosensitive plate to obtain a hologram pattern, evaporating the photosensitive plate to make the photosensitive plate conductive, and electroforming the photosensitive plate to form a mold; the processing difficulty of the die is low, and the process is simple.

Description

Method for manufacturing hologram film and terminal
Technical Field
The invention belongs to the technical field of holographic pattern manufacturing, and particularly relates to a manufacturing method of a holographic pattern film and a terminal.
Background
The hologram pattern is a hologram that exhibits a 3D effect in the form of a relief structure using an interference effect of light. From the macroscopic view, the holographic pattern is embodied as various holographic patterns, and from the micro-light view, the holographic pattern is an interference fringe groove with a certain depth.
Holographic fringe films are typically made by a stamping process, i.e., a master having grooves is used to imprint a microscopic groove structure into the film in a stamping press.
The prior art has the problems of large processing difficulty of a mother board and complex process.
Disclosure of Invention
The invention aims to provide a method for manufacturing a holographic pattern film and a terminal, which can reduce the processing difficulty and have simple process.
In order to realize the purpose of the invention, the invention provides the following technical scheme:
in a first aspect, the present invention provides a method of making a holographic film comprising
Making a hologram on the light-sensing plate;
developing the hologram to form a hologram pattern on the plate;
evaporating the photosensitive plate to enable the surface of the holographic pattern to be covered with metal and to be conductive;
electroforming the photosensitive plate to form a mold, wherein the holographic pattern is formed on the surface of the mold;
and stamping a base film by using the mold, so that the holographic pattern is transferred to the base film to form a holographic pattern film.
Making a hologram on a photosensitive plate, developing the photosensitive plate to obtain a hologram pattern, evaporating the photosensitive plate to make the photosensitive plate conductive, and electroforming the photosensitive plate to form a mold; the processing difficulty of the die is low, and the process is simple.
Wherein the hologram is fabricated on the light-sensing plate, including
Providing a vector diagram;
converting the vector image into the hologram;
and directly writing the hologram on the light-sensing plate through a photoetching machine, so that the part of the light-sensing plate corresponding to the hologram is exposed.
The vector diagram is converted into the hologram, and the hologram is directly written on the light-sensitive plate by using the photoetching machine, so that the part of the light-sensitive plate corresponding to the hologram is exposed, and the hologram is manufactured on the light-sensitive plate.
Wherein converting said vector image into said hologram comprises
Transforming the vector image into the hologram by fourier transform; wherein the vector image comprises a two-dimensional structural feature and the hologram comprises a three-dimensional structural feature.
The vector diagram is converted into the hologram through Fourier transformation, so that the two-dimensional structural feature is converted into the three-dimensional structural feature, the hologram comprises depth information of the groove, the subsequent manufacturing requirements can be met, and the groove generating the interference effect can be obtained.
Wherein developing the hologram and forming the hologram pattern comprises
And contacting a developing solution with the photosensitive plate, wherein the exposed part of the photosensitive plate reacts with the developing solution, so that the exposed part on the photosensitive plate is corroded, and the unexposed part is remained, thereby forming the holographic pattern.
The developing solution is contacted with the photosensitive plate, and the developing solution corrodes the photosensitive plate to form a groove, so that the holographic pattern is formed, and the process is simple.
Wherein the holographic pattern formed comprises a plurality of microstructures comprising a plurality of protrusions and/or grooves;
wherein a plurality of said projections and/or recesses comprise
Spherical protrusions, spherical recesses, polygonal protrusions, polygonal recesses in the region of the surface of the light-sensing plate, and/or any one or combination of columnar protrusions, columnar recesses extending along the surface of the light-sensing plate to the edge.
The holographic pattern is obtained by arranging a plurality of bulges and/or grooves on the surface of the photosensitive plate, so that an interference effect is generated among the plurality of bulges and/or grooves.
Wherein, the size of the projection or the groove is 0.05-5um, and the height or the depth is 0.05-2 um.
Through setting the size, height or depth value of the bulge or groove, the bulge or groove can meet the condition of forming interference effect, and the 3D effect of the holographic pattern is obtained.
Wherein electroforming the photosensitive plate comprises
In the presence of Ni+The photosensitive plate is electroformed in the electroforming tank so that metallic nickel is formed on the surface of the photosensitive plate, thereby forming the mold.
By containing Ni+The electroforming bath of (2) electroforming the photosensitive plate to form a mold, the surface of the photosensitive plate being formed with metallic nickel having sufficient strength and rigidity to enable imprinting.
The metal nickel is uniformly arranged on the surface of the light-sensing plate, and the thickness of each position is equal.
The uniform distribution of the metal nickel is equal in thickness, so that the structure of the holographic pattern on the photosensitive plate is kept unchanged after the photosensitive plate forms a die.
Wherein the base film is imprinted using the mold, including
Firstly, coating an adhesive layer on the base film, and then, impressing the holographic pattern on the base film through the mold.
Through with holographic pattern impression on the viscose layer, compare in impression on the base film, the viscose layer is impressed the texture of holographic pattern more easily, and the holographic pattern that the impression obtained is effectual.
Wherein after the holographic pattern film is formed, the method further comprises
And plating a color film on the surface of the hologram pattern film.
The color film can have gorgeous colors, so that when the holographic pattern film generates an interference effect, a 3D effect is formed, the color film also has rich colors, and the user satisfaction is improved.
In a second aspect, an embodiment of the present invention further provides a terminal, including a housing and a hologram film, where the hologram film is fixedly connected to the housing, and the hologram film is manufactured by using the method for manufacturing the hologram film according to any one of the various embodiments of the first aspect.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.
FIG. 1 is a flow chart of a method of making a holographic film of an embodiment;
FIG. 2 is a detailed flow chart of a method of making the holographic film of FIG. 1;
FIG. 3 is a schematic diagram of a plate according to an embodiment;
FIG. 4 is a schematic side view of a holographic film according to an embodiment;
FIG. 5 is a schematic plan view of a hologram film according to an embodiment;
fig. 6a is a schematic view of a structure of a partial region of the light-sensing plate of fig. 3;
FIG. 6b is a schematic diagram of a holographic film of an embodiment;
FIG. 7a is a schematic diagram of an enlarged plan view of an embodiment at A in FIG. 5;
FIGS. 7 b-7 f are schematic side sectional views of FIG. 7 a;
FIG. 8a is a schematic diagram of an enlarged plan view of an embodiment at A in FIG. 5;
fig. 8 b-8 i are schematic side sectional views of fig. 8 a.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is apparent that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be obtained by a person skilled in the art without any inventive step based on the embodiments of the present invention, are within the scope of the present invention.
The embodiment of the invention provides a terminal, which comprises a shell and a holographic pattern film, wherein the holographic pattern film is fixedly connected to the shell, and the holographic pattern film is manufactured by using the manufacturing method of the holographic pattern film provided by the embodiment of the invention.
The terminal can be a mobile terminal, such as a smart phone, a tablet personal computer and the like, and the holographic pattern film can be manufactured on the shell in a bonding or integrated forming mode, for example, the holographic pattern film is used on a rear shell of the smart phone, so that the rear shell of the smart phone has a 3D effect visually.
Referring to fig. 1 and 3, the present invention provides a method for manufacturing a hologram film, including
S100, fabricating a hologram on the light sensing plate 400;
s200, developing the hologram to form a hologram pattern on the photosensitive plate 400;
s300, evaporating the photosensitive plate 400 to enable the surface of the holographic pattern to be covered with metal and to be conductive;
s400, electroforming the photosensitive plate 400 to enable the photosensitive plate 400 to form a mold, wherein the surface of the mold is provided with holographic patterns;
and S500, stamping the base film by using a mold, so that the holographic pattern is transferred to the base film to form the holographic pattern film.
In this embodiment, the mold is formed by forming a hologram on the photosensitive plate 400, developing the photosensitive plate 400 to obtain a hologram pattern, evaporating the photosensitive plate 400 to make it conductive, and electroforming the photosensitive plate 400. The processing difficulty of the die is low, and the process is simple. And then, stamping the base film by using a mold to obtain the holographic pattern film.
Further, referring to fig. 2 and 3, in S100, a hologram is formed on the light-sensing plate 400, including
S110, providing a vector diagram;
s120, converting the vector image into a hologram;
s130, the hologram is directly written onto the light-sensing plate 400 by the photolithography machine such that a portion of the light-sensing plate 400 corresponding to the hologram is exposed.
The vector image is converted into the hologram, and the hologram is directly written on the light-sensing plate 400 by using the lithography machine, so that the part of the light-sensing plate 400 corresponding to the hologram is exposed, and the hologram is manufactured on the light-sensing plate 400.
In S110, the vector diagram may be designed by vector diagram design software such as Photoshop, Coreldraw, and AI. In this embodiment, the patterns of the hologram film are characters, logos, photos of people, simple patterns, and the like, and do not need to represent complicated colors. The vector diagram is independent of the resolution, and compared with a pixel diagram (bitmap), the vector diagram can be arbitrarily enlarged and reduced without changing the definition; and the vector diagram has no complex color, is easy to be converted into a hologram, and reduces the difficulty.
Wherein, in S120, the vector image is converted into a hologram, including
Transforming the vector image into a hologram by Fourier transform; wherein the vector image comprises a two-dimensional structural feature and the hologram comprises a three-dimensional structural feature.
The vector diagram is converted into the hologram through Fourier transformation, so that the two-dimensional structural feature is converted into the three-dimensional structural feature, the hologram comprises depth information of the groove, the subsequent manufacturing requirements can be met, and the groove generating the interference effect can be obtained.
The hologram adds depth information perpendicular to the two-dimensional plane direction on the basis of the two-dimensional plane figure of the vector diagram. The vector diagram can be converted into the hologram by adopting holographic simulation software, the holographic simulation software realizes conversion through Fourier transform, and the Fourier transform can also comprise the processes of encoding and the like. The specific conversion operation can refer to the description of the holographic simulation software, and is not described herein again.
Further, referring to fig. 1, 2, 3 and 6a, in S200, the hologram is developed and a hologram pattern is formed, including
The developing solution is brought into contact with the photosensitive web 400 and the exposed portions of the photosensitive web 400 react with the developing solution such that the exposed portions of the photosensitive web 400 are etched and the unexposed portions remain, thereby forming the holographic pattern.
The developing solution is contacted with the photosensitive plate 400, and the developing solution corrodes the photosensitive plate 400 to form a groove, so that the holographic pattern is formed, and the process is simple.
The contact between the developer and the photosensitive web 400 may be that the photosensitive web 400 is immersed in a tank containing the developer, or the developer is sprayed onto the photosensitive web 400 through a pipe.
Further, in S300, the photosensitive plate 400 is evaporated so that the surface of the photosensitive plate 400 is conductive for the next electroforming process. The evaporation may be performed on a PVD coater, and the surface of the photosensitive plate 400 after evaporation has a thin metal layer.
Further, referring to fig. 3 and 6a, in S400, an electroformed photosensitive plate 400 includes
In the presence of Ni+The photosensitive web 400 is electroformed in the electroforming tank so that the metallic nickel 500 is formed on the surface of the photosensitive web 400, thereby forming a mold.
By containing Ni+The photosensitive web 400 is electroformed in the electroforming tank to form a mold for the photosensitive web 400, and the metallic nickel 500 is formed on the surface of the photosensitive web 400, having sufficient strength and rigidity to enable imprinting.
Referring to fig. 6a, the nickel metal 50 is uniformly disposed on the surface of the photosensitive plate 40, and the thickness of each position is equal. The uniform arrangement and equal thickness of the metal nickel 50 enable the structure of the holographic pattern on the light-sensing plate 40 to be kept unchanged after the light-sensing plate 40 forms a die, and the structure of the holographic pattern cannot be changed due to the electroforming of the metal nickel 50.
In one embodiment, referring to fig. 1, 3, 4 and 5, in S500, the base film 100 is embossed using a mold, including
An adhesive layer is coated on the base film 100, and then the hologram pattern is imprinted on the adhesive layer by a mold.
The adhesive layer may be a photosensitive adhesive. The base film 100 may be made of PET (polyethylene terephthalate). Through impressing the holographic pattern on the viscose layer, compare in impressing on base film 100, the viscose layer is impressed the texture of holographic pattern more easily, and the holographic pattern that the impression obtained is effectual.
In another embodiment, the hologram pattern may be directly embossed on the base film 100 through a mold by heating the base film 100. The heating temperature can be selected according to the material of the base film 100, and the heating softens the base film 100, so that the texture of the hologram pattern of the mold is pressed into the base film 100, and the base film 100 is formed with the hologram pattern.
Further, referring to fig. 4, after the hologram film is formed, the method further includes
The surface of the hologram film is plated with a color film 200. The color film 200 may have gorgeous colors so that when the hologram pattern film generates an interference effect, not only a 3D effect is formed, but also the color film has rich colors, thereby improving user satisfaction.
Further, referring to fig. 4, an ink layer 300 may be further formed on the surface of the hologram pattern film opposite to the color film 200, and the ink layer 300 is formed by a screen printing process. The ink layer 300 has a shielding effect, so that when the hologram film is applied to an electronic device, components of the electronic device can be shielded, and only a hologram with a 3D effect is displayed.
In one embodiment, referring to fig. 3 and 6a, the formed hologram pattern includes a plurality of microstructures, and the plurality of microstructures includes a plurality of protrusions and/or grooves;
wherein the plurality of protrusions and/or recesses comprise
Spherical protrusions, spherical recesses, polygonal protrusions, polygonal recesses in the region of the surface of the light-sensing plate 400, and/or any one or combination of columnar protrusions, columnar recesses extending along the surface of the light-sensing plate 400 to the edge.
The hologram pattern is obtained by providing a plurality of protrusions and/or grooves on the surface of the light-sensing plate 400 such that interference effects are generated between the plurality of protrusions and/or grooves.
Referring to fig. 3 and 6a, in one embodiment, a plurality of grooves 41 are formed after a part of the photosensitive plate 40 of the photosensitive plate 400 reacts with the developing solution, the grooves 41 are recessed relative to the part of the photosensitive plate 40 to form grooves, the grooves have a depth relative to the plane of the part of the photosensitive plate 40, and an interference effect can be generated between the grooves 41 to form a hologram pattern. Fig. 6 shows only one embodiment, and the structure of the grooves may be of other types, which will be explained in the following description in conjunction with the structure of the hologram pattern.
In one embodiment, referring to fig. 6a and 6b, the protrusions or grooves have a size of 0.05-5um and a height or depth of 0.05-2 um.
Through setting the size, height or depth value of the bulge or groove, the bulge or groove can meet the condition of forming interference effect, and the 3D effect of the holographic pattern is obtained.
Referring to fig. 6a and 6b, the protrusions or recesses formed on the base film 10 are reproduced from the grooves 41 in fig. 6a, and the protrusions or recesses on the surface of the base film 10 are complementary to the grooves of the photosensitive web 40. In fig. 6b, the distance between the corresponding edges of two adjacent grooves 11 is the dimension S of the protrusion or groove, the width or diameter of a single groove 11 is W, the distance between the adjacent edges of two adjacent grooves 11 is D, and the depth of the groove 11 is H. From this, S ═ W + D ═ 0.05 to 5um, and H ═ 0.05 to 2 um.
Referring to fig. 5, 6a and 7a, in the partially enlarged structure in the partial region a of the base film 100, the base film 10 is the base film at the partial region a of the base film 100 in fig. 5, and the protrusions or grooves on the base film 10 are protrusions or grooves in a region of the surface of the base film 10. Since the base film 10 is in a complementary relationship with the photosensitive web 40, the photosensitive web 40 also has correspondingly formed protrusions or grooves in its surface.
Fig. 7 b-7 f show some possible embodiments of the projections or grooves on the base film 10, and the photosensitive web 40 in fig. 6a may also have projections or grooves formed corresponding to these possible embodiments.
In particular, fig. 7b shows an example of the spherical groove 11 formed on the base film 10, and the photosensitive web 40 may be provided with a spherical protrusion to complement the spherical groove.
Fig. 7c shows an example of the spherical protrusions 11 formed on the base film 10, and the photosensitive web 40 may be provided with spherical grooves corresponding to the spherical protrusions 11.
Fig. 7d shows an embodiment in which the conical projections 11 are formed on the base film 10, and the photosensitive web 40 may be provided with conical recesses corresponding to the conical projections 11.
Fig. 7e shows an embodiment in which the conical recesses 11 are formed on the base film 10, and the photosensitive web 40 may be correspondingly provided with conical protrusions to complement the conical recesses 11.
Fig. 7f shows an example in which a mixed structure including the spherical recesses 11 and the conical recesses 11 is formed on the base film 10, and the photosensitive web 40 may be provided with a mixed structure of spherical protrusions and conical protrusions to complement the spherical recesses 11 and the conical recesses 11.
Fig. 7 b-7 f only list some embodiments, but many more possible embodiments are possible, which can be adjusted to the specific pattern of the hologram.
The arrangement position relationship among the plurality of protrusions or the plurality of grooves can also be adjusted according to different patterns of the holographic patterns, including but not limited to rectangular array arrangement, annular array arrangement, periodic arrangement and the like, or random discrete point arrangement.
In another embodiment, referring to fig. 5, 6a and 8a, in the partially enlarged structure in the partial region a of the base film 100, the base film 10 is the base film in the partial region a of the base film 100 in fig. 5, and the protrusions or grooves on the base film 10 are columnar protrusions or columnar grooves 11 extending to the edge on the surface of the base film 10. Since the base film 10 and the photosensitive web 40 are in a complementary relationship, a cylindrical protrusion or a cylindrical groove is correspondingly formed on the photosensitive web 40 extending from the surface to the edge.
Fig. 8 b-8 i show some possible embodiments of the projections or grooves on the base film 10, and the light-sensing plate 40 in fig. 6a may also be formed with projections or grooves corresponding to these possible embodiments.
In particular, fig. 8b shows an embodiment in which the spherical cylindrical grooves 11 are formed on the base film 10, and the photosensitive web 40 may be provided with spherical cylindrical protrusions to complement the spherical cylindrical grooves 11.
Fig. 8c shows an example of the spherical columnar projections 11 formed on the base film 10, and the photosensitive web 40 may be provided with spherical columnar recesses corresponding to the spherical columnar projections 11.
Fig. 8d shows an example of the rectangular-plane columnar groove 11 formed on the base film 10, and the photosensitive web 40 may be provided with a rectangular-plane columnar projection corresponding to the rectangular-plane columnar groove 11.
Fig. 8e shows an example of the rectangular-plane columnar projections 11 formed on the base film 10, and the photosensitive web 40 may be provided with rectangular-plane columnar recesses corresponding to the rectangular-plane columnar projections 11.
Fig. 8f shows an example of the triangular-shaped pillar-shaped protrusion 11 formed on the base film 10, and the photosensitive web 40 may be provided with a triangular-shaped pillar-shaped recess corresponding to the triangular-shaped pillar-shaped protrusion 11.
Fig. 8g shows an example of the triangular-faced columnar groove 11 formed on the base film 10, and the photosensitive web 40 may be provided with a triangular-faced columnar projection corresponding thereto so as to complement the triangular-faced columnar groove 11.
Fig. 8h shows an example of the trapezoidal-shaped surface pillar-shaped groove 11 formed on the base film 10, and the photosensitive web 40 may be provided with a trapezoidal-shaped surface pillar-shaped protrusion to complement the trapezoidal-shaped surface pillar-shaped groove 11.
Fig. 8i shows an example of the trapezoidal-shaped columnar projections 11 formed on the base film 10, and the photosensitive web 40 may be provided with trapezoidal-shaped columnar recesses corresponding to the trapezoidal-shaped columnar projections 11.
Fig. 8 b-8 i only list some embodiments, but many more possible embodiments are possible, which can be adjusted to the specific pattern of the hologram.
While the invention has been described with reference to a preferred embodiment, it will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.

Claims (10)

1. A method for making a holographic pattern film, comprising
Making a hologram on the light-sensing plate;
developing the hologram to form a hologram pattern on the plate;
evaporating the photosensitive plate to enable the surface of the holographic pattern to be covered with metal and to be conductive;
electroforming the photosensitive plate to form a mold, wherein the holographic pattern is formed on the surface of the mold;
and stamping a base film by using the mold, so that the holographic pattern is transferred to the base film to form a holographic pattern film.
2. The method of claim 1, wherein forming the hologram on the plate comprises
Providing a vector diagram;
converting the vector image into the hologram;
and directly writing the hologram on the light-sensing plate through a photoetching machine, so that the part of the light-sensing plate corresponding to the hologram is exposed.
3. The method of claim 2, wherein converting said vector image into said hologram comprises
Transforming the vector image into the hologram by fourier transform; wherein the vector image comprises a two-dimensional structural feature and the hologram comprises a three-dimensional structural feature.
4. The method of claim 2, wherein developing the hologram and forming the hologram pattern comprises
And contacting a developing solution with the photosensitive plate, wherein the exposed part of the photosensitive plate reacts with the developing solution, so that the exposed part on the photosensitive plate is corroded, and the unexposed part is remained, thereby forming the holographic pattern.
5. The method of claim 4, wherein the hologram pattern formed comprises a plurality of microstructures, the plurality of microstructures comprising a plurality of protrusions and/or grooves;
wherein a plurality of said projections and/or recesses comprise
Spherical protrusions, spherical recesses, polygonal protrusions, polygonal recesses in the region of the surface of the light-sensing plate, and/or any one or combination of columnar protrusions, columnar recesses extending along the surface of the light-sensing plate to the edge.
6. The method of claim 5, wherein the protrusions or grooves have a size of 0.05-5um and a height or depth of 0.05-2 um.
7. The method of claim 1, wherein electroforming the plate comprises
In the presence of Ni+The photosensitive plate is electroformed in the electroforming tank so that metallic nickel is formed on the surface of the photosensitive plate, thereby forming the mold.
8. The method of claim 7, wherein the nickel metal is uniformly disposed on the surface of the photosensitive plate, and the thickness of each position is equal.
9. The method of claim 1, wherein embossing the base film with the mold comprises
Firstly, coating an adhesive layer on the base film, and then, impressing the holographic pattern on the adhesive layer through the mold.
10. A terminal comprising a housing and a hologram film fixed to the housing, wherein the hologram film is manufactured by the method of manufacturing a hologram film according to any one of claims 1 to 9.
CN201910212629.5A 2019-03-20 2019-03-20 Method for manufacturing hologram film and terminal Pending CN111722512A (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112540525A (en) * 2020-12-01 2021-03-23 牟维忠 Manufacturing method of interference fringe three-dimensional mold, mold and copying method thereof
CN112540525B (en) * 2020-12-01 2022-03-22 牟维忠 Manufacturing method of interference fringe three-dimensional mold, mold and copying method thereof

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Application publication date: 20200929