CN111682045A - Ultrasonic fingerprint identification sensor, method for making the same, and display module - Google Patents

Ultrasonic fingerprint identification sensor, method for making the same, and display module Download PDF

Info

Publication number
CN111682045A
CN111682045A CN202010582074.6A CN202010582074A CN111682045A CN 111682045 A CN111682045 A CN 111682045A CN 202010582074 A CN202010582074 A CN 202010582074A CN 111682045 A CN111682045 A CN 111682045A
Authority
CN
China
Prior art keywords
layer
pad
fingerprint identification
forming
ultrasonic fingerprint
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN202010582074.6A
Other languages
Chinese (zh)
Other versions
CN111682045B (en
Inventor
刘文渠
姚琪
张锋
崔钊
岳阳
宋晓欣
黄海涛
王利波
董立文
吕志军
孟德天
侯东飞
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOE Technology Group Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to CN202010582074.6A priority Critical patent/CN111682045B/en
Publication of CN111682045A publication Critical patent/CN111682045A/en
Priority to PCT/CN2021/101507 priority patent/WO2021259248A1/en
Application granted granted Critical
Publication of CN111682045B publication Critical patent/CN111682045B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N39/00Integrated devices, or assemblies of multiple devices, comprising at least one piezoelectric, electrostrictive or magnetostrictive element covered by groups H10N30/00 – H10N35/00
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06VIMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V40/00Recognition of biometric, human-related or animal-related patterns in image or video data
    • G06V40/10Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
    • G06V40/12Fingerprints or palmprints
    • G06V40/13Sensors therefor
    • G06V40/1306Sensors therefor non-optical, e.g. ultrasonic or capacitive sensing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49811Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/01Manufacture or treatment
    • H10D30/021Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/027Manufacture or treatment of FETs having insulated gates [IGFET] of lateral single-gate IGFETs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/01Manufacture or treatment
    • H10N30/07Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Multimedia (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Image Input (AREA)
  • Measurement Of The Respiration, Hearing Ability, Form, And Blood Characteristics Of Living Organisms (AREA)
  • Thin Film Transistor (AREA)

Abstract

The invention relates to an ultrasonic fingerprint identification sensor which comprises a hard substrate, a flexible substrate arranged on the hard substrate, a receiving electrode layer, a piezoelectric film layer and a transmitting electrode layer which are sequentially arranged on the flexible substrate, and a first bonding pad arranged between the hard substrate and the flexible substrate, wherein the first bonding pad is used for binding and connecting the receiving electrode layer and an external circuit board to obtain a fingerprint image. The invention also relates to a manufacturing method of the display module and the ultrasonic fingerprint identification sensor.

Description

超声波指纹识别传感器及其制作方法、显示模组Ultrasonic fingerprint identification sensor, method for making the same, and display module

技术领域technical field

本发明涉及显示产品制作技术领域,尤其涉及一种超声波指纹识别传感器及其制作方法、显示模组。The invention relates to the technical field of display product manufacturing, in particular to an ultrasonic fingerprint identification sensor, a manufacturing method thereof, and a display module.

背景技术Background technique

压电材料(如聚偏氟乙烯,PVDF,压电陶瓷,驻极体等),例如PVDF是一种优良的压电材料,经过晶化和电场极化后具有压电效应,分为正压电效应和逆压电效应两种,利用这一原理,对发射电极(Tx)施加AC电压,压电膜层在逆压电作用下产生超声波,电→声;然后超声波遇到手指指纹发生反射,再次对压电膜层产生作用,将超声波转换为电信号,声→电,由于脊谷反射信号的不同,接收电极(Rx),接收的电荷不同,实现指纹识别。Piezoelectric materials (such as polyvinylidene fluoride, PVDF, piezoelectric ceramics, electrets, etc.), for example, PVDF is an excellent piezoelectric material, which has piezoelectric effect after crystallization and electric field polarization, and is divided into positive pressure There are two types of electrical effect and inverse piezoelectric effect. Using this principle, AC voltage is applied to the transmitting electrode (Tx), and the piezoelectric film layer generates ultrasonic waves under the action of inverse piezoelectricity, and electricity → sound; then the ultrasonic waves are reflected when they meet the fingerprint of the finger. , once again acts on the piezoelectric film layer, converts ultrasonic waves into electrical signals, sound → electricity, due to the difference in reflected signals from the ridges and valleys, the receiving electrodes (Rx) receive different charges to achieve fingerprint recognition.

压电膜层必须经过电极化处理才能产生良好的压电效应,极化目的是让压电膜层中杂乱取向的分子偶极电矩沿着特定方向(极化电场方向)一致取向,改善和提高压电膜层的压电性。电极化利用一个非均匀电场引起空气局部击穿的电晕放电产生离子束轰击电介质,并使离子电荷沉积于电介质内,从而达到较好的极化效果。The piezoelectric film layer must be electrically polarized to produce a good piezoelectric effect. The purpose of polarization is to make the molecular dipole electric moments in the piezoelectric film layer with random orientations oriented in a specific direction (polarization electric field direction) uniformly, improving and Improve the piezoelectricity of the piezoelectric film. Electropolarization utilizes a non-uniform electric field to cause a corona discharge in which the air is partially broken down to generate an ion beam to bombard the dielectric, and to deposit ion charges in the dielectric, so as to achieve a better polarization effect.

超声波指纹识别传感器包括绑定焊盘,所述接收电极接收的电信号经过TFT电路进行处理(例如放大)后,通过所述绑定焊盘传输至外部电路板以识别指纹图像,极化时,如果极化电场和绑定焊盘直接接触,电子云(Plasma)将会沿着绑定焊盘流走,甚至击穿TFT电路。目前通过设置遮挡层以避免绑定焊盘与极化电场接触,但是遮挡层采用非金属材料制成,容易形变,无法实现大尺寸化,且遮挡层上需要设置镂空区域以露出显示面板的有效显示区,该镂空区的设置一般采用机械加工的方式实现,容易出现对位偏差。The ultrasonic fingerprint identification sensor includes a binding pad, and the electrical signal received by the receiving electrode is processed (eg amplified) by a TFT circuit, and then transmitted to an external circuit board through the binding pad to identify the fingerprint image. If the polarizing electric field is in direct contact with the bonding pad, the electron cloud (Plasma) will flow away along the bonding pad and even break down the TFT circuit. At present, a shielding layer is provided to avoid contact between the bonding pad and the polarized electric field. However, the shielding layer is made of non-metallic materials, which is easy to deform and cannot be large-scaled, and a hollow area needs to be set on the shielding layer to expose the effective display panel. In the display area, the setting of the hollow area is generally realized by mechanical processing, which is prone to misalignment.

发明内容SUMMARY OF THE INVENTION

为了解决上述技术问题,本发明提供一种超声波指纹识别传感器及其制作方法、显示模组,解决设置用于避免绑定焊盘与极化电场接触遮挡层,而造成的无法大尺寸化以及容易产生对位偏差的问题。In order to solve the above-mentioned technical problems, the present invention provides an ultrasonic fingerprint identification sensor, a manufacturing method thereof, and a display module, so as to solve the problem that the shielding layer is arranged to avoid contact between the bonding pad and the polarized electric field, which cannot be large-scaled and easily The problem of misalignment occurs.

为了达到上述目的,本发明实施例采用的技术方案是:一种超声波指纹识别传感器,包括硬质基板,设置于所述硬质基板上的柔性衬底,以及依次设置于柔性衬底上的接收电极层、压电膜层和发射电极层,还包括设置于所述硬质基板与所述柔性衬底之间的第一焊盘,所述第一焊盘用于将所述接收电极层与外部电路板绑定连接、以获得指纹图像。In order to achieve the above purpose, the technical solution adopted in the embodiment of the present invention is: an ultrasonic fingerprint identification sensor, comprising a rigid substrate, a flexible substrate disposed on the rigid substrate, and receiving sensors sequentially disposed on the flexible substrate The electrode layer, the piezoelectric film layer and the emitter electrode layer also include a first pad disposed between the hard substrate and the flexible substrate, and the first pad is used for connecting the receiving electrode layer with the External circuit board binding connection to obtain fingerprint image.

可选的,所述第一焊盘与所述硬质基板之间设置有采用有机材料制成的隔离层。Optionally, an isolation layer made of organic material is disposed between the first pad and the hard substrate.

可选的,所述接收电极层包括设置于所述柔性衬底上的薄膜晶体管和与该薄膜晶体管连接的接收电极。Optionally, the receiving electrode layer includes a thin film transistor disposed on the flexible substrate and a receiving electrode connected to the thin film transistor.

可选的,所述薄膜晶体管包括依次设置于所述柔性衬底上的有源层、栅绝缘层、栅极层、层间绝缘层、源漏极层,平坦层,还包括与源漏极层同层设置的第一金属连接线,所述第一金属连接线用于将所述第一焊盘与所述源漏极层连接。Optionally, the thin film transistor includes an active layer, a gate insulating layer, a gate layer, an interlayer insulating layer, a source and drain layer, and a flat layer that are sequentially arranged on the flexible substrate, and also includes a source and drain layer. and a first metal connection line arranged on the same layer, and the first metal connection line is used to connect the first pad with the source and drain layers.

可选的,所述柔性衬底和所述接收电极层之间沿着远离所述柔性衬底的方向设置有第一绝缘层和缓冲层。Optionally, a first insulating layer and a buffer layer are disposed between the flexible substrate and the receiving electrode layer along a direction away from the flexible substrate.

可选的,所述第一绝缘层上设置有第二金属连接线,所述第二金属连接线通过过孔与所述第一焊盘连接,所述第一金属连接线通过所述第二金属连接线与所述第一焊盘连接。Optionally, a second metal connection line is provided on the first insulating layer, the second metal connection line is connected to the first pad through a via hole, and the first metal connection line passes through the second A metal connection line is connected to the first pad.

可选的,还包括与源漏极层同层设置的第二焊盘,用于将发射电极层与外部电路板连接,以对所述发射电极层提供电压。Optionally, it also includes a second pad disposed on the same layer as the source and drain layers, for connecting the emitter electrode layer with an external circuit board, so as to provide a voltage to the emitter electrode layer.

可选的,还包括与所述源漏极层同层设置的极化线,使得所述接收电极接地,以处于零电位。Optionally, it also includes a polarization line disposed on the same layer as the source and drain layers, so that the receiving electrode is grounded to be at zero potential.

本发明实施例还提供一种显示模组,包括显示面板,以及设置于所述显示面板的背光侧的上述的超声波指纹识别传感器。An embodiment of the present invention further provides a display module, including a display panel, and the above-mentioned ultrasonic fingerprint identification sensor disposed on the backlight side of the display panel.

本发明实施例还提供一种超声波指纹识别模组的制作方法,包括以下步骤:An embodiment of the present invention also provides a method for making an ultrasonic fingerprint identification module, comprising the following steps:

在硬质基板上形成隔离层;forming an isolation layer on a rigid substrate;

在隔离层上形成第一焊盘;forming a first pad on the isolation layer;

形成柔性衬底;forming a flexible substrate;

在所述柔性衬底上依次形成薄膜晶体管和接收电极,所述接收电极和所述第一焊盘分别与所述薄膜晶体管连接;forming a thin film transistor and a receiving electrode in sequence on the flexible substrate, and the receiving electrode and the first pad are respectively connected to the thin film transistor;

形成压电膜层;forming a piezoelectric film layer;

形成发射电极层。An emitter electrode layer is formed.

可选的,在所述柔性衬底上依次形成薄膜晶体管和接收电极,具体包括以下步骤:Optionally, forming a thin film transistor and a receiving electrode in sequence on the flexible substrate specifically includes the following steps:

形成多晶硅有源层;forming a polysilicon active layer;

形成栅绝缘层;forming a gate insulating layer;

形成栅极层;forming a gate layer;

形成层间绝缘层;forming an interlayer insulating layer;

形成源漏极层、第一金属连接线,所述源漏极层通过过孔与所述有源层连接,所述第一金属连接线通过过孔与所述第一焊盘连接;forming a source-drain layer and a first metal connection line, the source-drain layer is connected to the active layer through a via hole, and the first metal connection line is connected to the first pad through a via hole;

形成平坦层;forming a flat layer;

形成接收电极,接收电极通过过孔与所述源漏极层连接;forming a receiving electrode, which is connected to the source and drain layers through a via hole;

可选的,还包括以下步骤:Optionally, it also includes the following steps:

形成第一绝缘层;forming a first insulating layer;

形成第二金属连接线,所述第二金属连接线将所述第一金属连接线和所述第一焊盘进行连接。A second metal connection line is formed, and the second metal connection line connects the first metal connection line and the first pad.

本发明的有益效果是:将第一焊盘的设置位置设置于硬质基板和柔性衬底之间,防止第一焊盘与极化电场接触,相比相关的超声波指纹识别传感器省去了遮挡层的设置,从而也就解决了相关的超声波指纹识别传感器由于遮挡层的设置造成的无法大尺寸化等问题。The beneficial effects of the present invention are: the setting position of the first pad is set between the hard substrate and the flexible substrate, so as to prevent the contact of the first pad with the polarized electric field, and compared with the related ultrasonic fingerprint identification sensor, shielding is omitted Therefore, the problem of the related ultrasonic fingerprint identification sensor being unable to be large-scaled due to the setting of the shielding layer is solved.

附图说明Description of drawings

图1表示相关技术中超声波指纹识别传感器结构示意图;FIG. 1 shows a schematic structural diagram of an ultrasonic fingerprint recognition sensor in the related art;

图2表示本发明实施例中超声波指纹识别传感器结构示意图;2 shows a schematic structural diagram of an ultrasonic fingerprint recognition sensor in an embodiment of the present invention;

图3表示本发明实施例中形成所述第一焊盘后的结构示意图;FIG. 3 is a schematic view of the structure after the first pad is formed in an embodiment of the present invention;

图4表示本发明实施例中形成柔性衬底后的结构示意图;FIG. 4 is a schematic view of the structure after forming a flexible substrate in an embodiment of the present invention;

图5表示本发明实施例中形成第二金属连接线的结构示意图;FIG. 5 shows a schematic structural diagram of forming a second metal connection line in an embodiment of the present invention;

图6表示本发明实施例中形成有源层后的结构示意图;FIG. 6 is a schematic view of the structure after forming the active layer in the embodiment of the present invention;

图7表示本发明实施例中形成栅极层后的结构示意图;FIG. 7 is a schematic view of the structure after the gate layer is formed in an embodiment of the present invention;

图8表示本发明实施例中形成源漏极层后的结构示意图;FIG. 8 is a schematic view of the structure after the source and drain layers are formed in an embodiment of the present invention;

图9表示本发明实施例中形成接收电极后的结构示意图;FIG. 9 is a schematic view of the structure after the receiving electrode is formed in the embodiment of the present invention;

图10表示本发明实施例中形成压电膜层后的结构示意图;FIG. 10 is a schematic view of the structure after the piezoelectric film layer is formed in the embodiment of the present invention;

图11表示本发明实施例中形成压电薄膜层后的结构示意图;FIG. 11 is a schematic view of the structure after the piezoelectric thin film layer is formed in the embodiment of the present invention;

图12表示本发明实施例中形成金属硬掩膜层后的结构示意图;FIG. 12 is a schematic view of the structure after forming a metal hard mask layer in an embodiment of the present invention;

图13表示本发明实施例中形成光刻胶后的结构示意图。FIG. 13 is a schematic view of the structure after the photoresist is formed in the embodiment of the present invention.

具体实施方式Detailed ways

为使本发明实施例的目的、技术方案和优点更加清楚,下面将结合本发明实施例的附图,对本发明实施例的技术方案进行清楚、完整地描述。显然,所描述的实施例是本发明的一部分实施例,而不是全部的实施例。基于所描述的本发明的实施例,本领域普通技术人员所获得的所有其他实施例,都属于本发明保护的范围。In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are some, but not all, embodiments of the present invention. Based on the described embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art fall within the protection scope of the present invention.

在本发明的描述中,需要说明的是,术语“中心”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本发明和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本发明的限制。此外,术语“第一”、“第二”、“第三”仅用于描述目的,而不能理解为指示或暗示相对重要性。In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. The indicated orientation or positional relationship is based on the orientation or positional relationship shown in the accompanying drawings, which is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the indicated device or element must have a specific orientation or a specific orientation. construction and operation, and therefore should not be construed as limiting the invention. Furthermore, the terms "first", "second", and "third" are used for descriptive purposes only and should not be construed to indicate or imply relative importance.

超声波指纹识别传感器包括压电膜层1和设置于压电膜层1相对的两侧的发射电极(图中未示)和接收电极3,还包括用于将接收电极3接收的信号传输至外部电路以进行指纹识别的绑定焊盘2,如图1所示,绑定焊盘2是裸露的,容易与极化电场接触,如果极化电场和绑定焊盘2直接接触,电子云(Plasma)将会沿着绑定焊盘流走,甚至击穿TFT电路(与接收电极3直接连接的TFT电路20,TFT电路20包括源漏极4和栅极5)。目前通过设置遮挡层10以避免绑定焊盘2与极化电场接触,但是遮挡层10采用非金属材料制成,容易形变,而遮挡层10的平整度要求比较高,一般小于1mm,在保证良率的前提下就无法实现大尺寸化,且遮挡层10上需要设置镂空区域(所述压电膜层1的正上方的区域)以露出显示面板的有效显示区,该镂空区的设置一般采用机械加工的方式实现,容易出现对位偏差。The ultrasonic fingerprint recognition sensor includes a piezoelectric film layer 1, a transmitting electrode (not shown in the figure) and a receiving electrode 3 disposed on opposite sides of the piezoelectric film layer 1, and also includes a signal used for transmitting the signal received by the receiving electrode 3 to the outside. The circuit uses the bonding pad 2 for fingerprint identification. As shown in Figure 1, the bonding pad 2 is exposed and is easily in contact with the polarized electric field. If the polarized electric field and the bonding pad 2 are in direct contact, the electron cloud ( Plasma) will flow away along the bond pads and even break down the TFT circuit (the TFT circuit 20 directly connected to the receiving electrode 3, the TFT circuit 20 includes the source-drain 4 and the gate 5). At present, the shielding layer 10 is provided to avoid the contact between the bonding pad 2 and the polarized electric field, but the shielding layer 10 is made of non-metallic materials, which is easy to deform. Under the premise of yield, large size cannot be achieved, and a hollow area (the area directly above the piezoelectric film layer 1) needs to be set on the shielding layer 10 to expose the effective display area of the display panel. The setting of the hollow area is generally It is realized by mechanical processing, which is prone to misalignment.

针对上述技术问题,本实施例提供一种超声波指纹识别传感器,参考图2,包括硬质基板1,设置于所述硬质基板1上的柔性衬底2,以及依次设置于柔性衬底2上的接收电极层10、压电膜层12和发射电极层11,还包括设置于所述硬质基板1与所述柔性衬底2之间的第一焊盘15,所述第一焊盘15用于将所述接收电极层10与外部电路板绑定连接、以获得指纹图像。In view of the above technical problems, the present embodiment provides an ultrasonic fingerprint recognition sensor, referring to FIG. 2 , comprising a rigid substrate 1 , a flexible substrate 2 disposed on the rigid substrate 1 , and a flexible substrate 2 disposed on the flexible substrate 2 in sequence The receiving electrode layer 10, the piezoelectric film layer 12 and the emitter electrode layer 11 further include a first pad 15 disposed between the hard substrate 1 and the flexible substrate 2, the first pad 15 It is used to bind and connect the receiving electrode layer 10 with an external circuit board to obtain a fingerprint image.

本实施例中利用超声波指纹识别传感器本身结构的设置,将所述第一焊盘15制作于所述硬质基板1与所述柔性衬底2之间,在将所述超声波指纹识别传感器应用于显示模组等电子设备上时,所述硬质基板1是需要去除的,则相当于将所述第一焊盘15设置于超声波指纹识别传感器的背面,而所述发射电极层11、接收电极层10、压电膜层12位于所述超声波指纹识别传感器的正面,即所述发射电极层11、接收电极层10、压电膜层12位于所述柔性衬底2第一侧,所述第一焊盘15位于所述柔性衬底2上与所述第一侧相对设置的第二侧,这样,避免了所述第一焊盘15的裸露的设置,防止了极化电场(所述发射电极层11和所述接收电极层10之间产生的电场)与所述第一焊盘15的接触,相比图1中所示的相关技术中的超声波指纹识别传感器的结构的设置,省去了遮挡层的设置,这样也就避免了由遮挡层带来的无法大尺寸化等问题。In this embodiment, the first pad 15 is made between the hard substrate 1 and the flexible substrate 2 by using the structure of the ultrasonic fingerprint recognition sensor itself, and the ultrasonic fingerprint recognition sensor is applied to When installed on electronic equipment such as display modules, the hard substrate 1 needs to be removed, which is equivalent to arranging the first pad 15 on the back of the ultrasonic fingerprint recognition sensor, and the transmitting electrode layer 11, the receiving electrode The layer 10 and the piezoelectric film layer 12 are located on the front side of the ultrasonic fingerprint recognition sensor, that is, the transmitting electrode layer 11, the receiving electrode layer 10, and the piezoelectric film layer 12 are located on the first side of the flexible substrate 2, and the first A pad 15 is located on the second side of the flexible substrate 2 opposite to the first side, so that the exposed arrangement of the first pad 15 is avoided and the polarization electric field (the emission of the The contact between the electric field generated between the electrode layer 11 and the receiving electrode layer 10) and the first pad 15, compared with the arrangement of the structure of the ultrasonic fingerprint identification sensor in the related art shown in FIG. The setting of the occlusion layer is also avoided, which avoids the problem of inability to large size caused by the occlusion layer.

本实施例中,所述第一焊盘15与所述硬质基板1之间设置有采用有机材料制成的隔离层16,参考图2和图3。In this embodiment, an isolation layer 16 made of an organic material is disposed between the first pad 15 and the rigid substrate 1 , see FIGS. 2 and 3 .

所述超声波指纹识别传感器在应用时,所述硬质基板1是需要去除的,而所述第一焊盘15与所述硬质基板1之间的粘结性较强,去除所述硬质基板1时,容易将所述第一焊盘15一起剥离,所述隔离层16的设置对所述第一焊盘15起到保护作用,防止了去除所述硬质基板1时对所述第一焊盘15的影响。When the ultrasonic fingerprint recognition sensor is applied, the hard substrate 1 needs to be removed, and the adhesion between the first pad 15 and the hard substrate 1 is strong, and the hard substrate 1 needs to be removed. When the substrate 1 is removed, the first pads 15 are easily peeled off together. The isolation layer 16 protects the first pads 15 and prevents the first pads 15 from being damaged when the hard substrate 1 is removed. The effect of a pad 15.

本实施例中,所述接收电极层10包括设置于所述柔性衬底2上的薄膜晶体管8和与该薄膜晶体管8连接的接收电极9,参考图2、图7-图10。In this embodiment, the receiving electrode layer 10 includes a thin film transistor 8 disposed on the flexible substrate 2 and a receiving electrode 9 connected to the thin film transistor 8 , with reference to FIGS. 2 and 7 to 10 .

被手指指纹反射的超声波经所述压电膜层12后转换为电信号,所述接收电极9接收该电信号,并经所述薄膜晶体管8进行处理(例如放大)后,该电信号经由所述第一焊盘15传输至外部电路板以进行指纹识别。The ultrasonic wave reflected by the fingerprint is converted into an electrical signal by the piezoelectric film layer 12, the receiving electrode 9 receives the electrical signal, and after processing (eg, amplification) by the thin film transistor 8, the electrical signal passes through the electrical signal. The first pad 15 is transmitted to an external circuit board for fingerprint identification.

本实施例中,所述薄膜晶体管8包括依次设置于所述柔性衬底2上的有源层81、栅绝缘层5、栅极层83、层间绝缘层6、源漏极层82,平坦层20,还包括与源漏极层82同层设置的第一金属连接线14,所述第一金属连接线14用于将所述第一焊盘15与所述源漏极层82连接。In this embodiment, the thin film transistor 8 includes an active layer 81 , a gate insulating layer 5 , a gate layer 83 , an interlayer insulating layer 6 , and a source and drain layer 82 , which are sequentially arranged on the flexible substrate 2 , and are flat. The layer 20 further includes a first metal connection line 14 disposed in the same layer as the source and drain layers 82 , and the first metal connection line 14 is used to connect the first pad 15 with the source and drain layers 82 .

所述第一金属连接线14通过过孔与所述第一焊盘15连接,实现所述薄膜晶体管8与所述第一焊盘15之间的信号的传输。The first metal connection line 14 is connected to the first pad 15 through a via hole, so as to realize signal transmission between the thin film transistor 8 and the first pad 15 .

本实施例中,所述柔性衬底2和所述接收电极层10之间沿着远离所述柔性衬底2的方向设置有第一绝缘层3和缓冲层4。In this embodiment, a first insulating layer 3 and a buffer layer 4 are disposed between the flexible substrate 2 and the receiving electrode layer 10 along a direction away from the flexible substrate 2 .

所述第一绝缘层3和所述缓冲层4的设置都起到了保护作用,增设所述缓冲层4进一步的避免水氧侵袭。The arrangement of the first insulating layer 3 and the buffer layer 4 both play a protective role, and the buffer layer 4 is added to further avoid the invasion of water and oxygen.

本实施例中,所述第一绝缘层3上设置有第二金属连接线17,所述第二金属连接线17通过过孔与所述第一焊盘15连接,所述第一金属连接线14通过所述第二金属连接线17与所述第一焊盘15连接。In this embodiment, the first insulating layer 3 is provided with a second metal connection line 17, the second metal connection line 17 is connected to the first pad 15 through a via hole, and the first metal connection line 14 is connected to the first pad 15 through the second metal connection line 17 .

所述第二金属连接线17的设置,使得所述第一金属连接线14的延伸方向可以垂直于所述硬质基板,利于所述第一金属连接线14与所述第一焊盘15之间的连接,降低了工艺难度。The arrangement of the second metal connection line 17 makes the extension direction of the first metal connection line 14 perpendicular to the rigid substrate, which is beneficial to the connection between the first metal connection line 14 and the first pad 15 . The connection between them reduces the difficulty of the process.

本实施例中,所述超声波指纹识别传感器还包括与源漏极层82同层设置的第二焊盘7,用于将发射电极层11与外部电路板连接,以对所述发射电极层11提供电压。In this embodiment, the ultrasonic fingerprint recognition sensor further includes a second pad 7 disposed on the same layer as the source and drain layers 82 for connecting the emitter electrode layer 11 with an external circuit board, so as to connect the emitter electrode layer 11 to the external circuit board. supply voltage.

所述第二焊盘7的设置实现了所述发射电极层11与外部电路板的绑定连接,以对所述发射电极层11施加电压。The setting of the second pad 7 realizes the bonding connection between the emitter electrode layer 11 and the external circuit board, so as to apply a voltage to the emitter electrode layer 11 .

本实施例中,所述超声波指纹识别传感器还包括与所述源漏极层82同层设置的极化线13,使得所述接收电极9接地,以处于零电位。In this embodiment, the ultrasonic fingerprint recognition sensor further includes a polarization line 13 disposed on the same layer as the source and drain layers 82 , so that the receiving electrode 9 is grounded to be at zero potential.

所述发射电极层11被施加交流电压,而所述接收电极9处于一固定电位(例如0电位),从而在所述压电膜层12的表面形成电势差和强电场,所述压电膜层12发生形变会产生超声波,而所述极化线13的设置保证了所述接收电极9处于固定电位,从而保证所述压电膜层12产生超声波。The emitter electrode layer 11 is applied with an alternating voltage, while the receiving electrode 9 is at a fixed potential (eg, 0 potential), so that a potential difference and a strong electric field are formed on the surface of the piezoelectric film layer 12. The piezoelectric film layer The deformation of 12 will generate ultrasonic waves, and the arrangement of the polarization lines 13 ensures that the receiving electrodes 9 are at a fixed potential, thereby ensuring that the piezoelectric film layer 12 generates ultrasonic waves.

在应用时,所述超声波指纹识别传感器包括多个指纹识别单元,以对应多个显示模组的有效显示区,以起到将对应多个有效显示区的多个指纹识别单元中的接收电极9进行并联连接的作用,以统一提供0电位。In application, the ultrasonic fingerprint identification sensor includes a plurality of fingerprint identification units to correspond to the effective display areas of the multiple display modules, so as to serve as the receiving electrodes 9 in the multiple fingerprint identification units corresponding to the multiple effective display areas. Perform the function of parallel connection to provide 0 potential uniformly.

本发明实施例还提供一种显示模组,包括显示面板,以及设置于所述显示面板的背光侧的上述的超声波指纹识别传感器。An embodiment of the present invention further provides a display module, including a display panel, and the above-mentioned ultrasonic fingerprint identification sensor disposed on the backlight side of the display panel.

上述超声波指纹识别传感器的设置,通过将第一焊盘15设置于所述柔性衬底2远离所述压电膜层12的一侧,防止所述第一焊盘15与极化电场接触,且相对于裸露设置第一焊盘15的结构,省却了用于遮挡所述第一焊盘15的遮挡层的设置,避免由于遮挡层的设置而无法实现大尺寸化,且对位不准确的问题。The above-mentioned ultrasonic fingerprint identification sensor is arranged by disposing the first pad 15 on the side of the flexible substrate 2 away from the piezoelectric film layer 12 to prevent the first pad 15 from contacting the polarized electric field, and Compared with the structure in which the first pads 15 are exposed, the setting of a shielding layer for shielding the first pads 15 is omitted, and the problem of inaccurate alignment due to the installation of the shielding layer that cannot be large-scaled can be avoided. .

本发明实施例还提供一种超声波指纹识别模组的制作方法,包括以下步骤:An embodiment of the present invention also provides a method for making an ultrasonic fingerprint identification module, comprising the following steps:

在硬质基板1上形成隔离层16;forming an isolation layer 16 on the rigid substrate 1;

在隔离层16上形成第一焊盘15,参考图3;A first pad 15 is formed on the isolation layer 16, referring to FIG. 3;

形成柔性衬底2,参考图4;Form the flexible substrate 2, refer to FIG. 4;

在所述柔性衬底2上依次形成薄膜晶体管8和接收电极9,所述接收电极9和所述第一焊盘15分别与所述薄膜晶体管8连接,参考图5-图9;A thin film transistor 8 and a receiving electrode 9 are sequentially formed on the flexible substrate 2, and the receiving electrode 9 and the first pad 15 are respectively connected to the thin film transistor 8, referring to FIGS. 5-9;

形成压电膜层12,参考图10;The piezoelectric film layer 12 is formed, referring to FIG. 10 ;

形成发射电极层11,参考图2。The emitter electrode layer 11 is formed, referring to FIG. 2 .

本实施例中,在所述柔性衬底2上依次形成薄膜晶体管8和接收电极9,具体包括以下步骤:In this embodiment, the thin film transistor 8 and the receiving electrode 9 are sequentially formed on the flexible substrate 2, which specifically includes the following steps:

形成多晶硅有源层81,参考图6,所述有源层81的具体结构形式可以有P型、N型、P-N型,P型有源层81包括沿着平行于所述硬质基板1的方向上依次设置的P型掺杂区、多晶硅区和P型掺杂区,N型有源层81包括沿着平行于所述硬质基板1的方向依次设置的N型掺杂区、多晶硅区和N型掺杂区,所述P-N型有源层包括沿着平行于所述硬质基板1的方向依次设置的P型掺杂区、多晶硅区和N型掺杂区。The polysilicon active layer 81 is formed. Referring to FIG. 6 , the specific structural forms of the active layer 81 can include P-type, N-type, and P-N-type. The P-type active layer The P-type doped region, the polysilicon region and the P-type doped region are arranged in sequence in the direction, and the N-type active layer 81 includes an N-type doped region and a polysilicon region arranged in sequence along the direction parallel to the hard substrate 1 and an N-type doped region, the P-N-type active layer includes a P-type doped region, a polysilicon region and an N-type doped region sequentially arranged along a direction parallel to the hard substrate 1 .

形成栅绝缘层5,参考图7;Form the gate insulating layer 5, refer to FIG. 7;

形成栅极层83,参考图7;forming the gate layer 83, referring to FIG. 7;

形成层间绝缘层6,参考图8;Form the interlayer insulating layer 6, refer to FIG. 8;

形成源漏极层82、第一金属连接线14,所述源漏极层82通过过孔与所述有源层81连接,所述第一金属连接线14通过过孔与所述第一焊盘15连接,参考图8;A source-drain layer 82 and a first metal connection line 14 are formed, the source-drain layer 82 is connected to the active layer 81 through a via hole, and the first metal connection line 14 is connected to the first solder connection through a via hole The disk 15 is connected, refer to Figure 8;

形成平坦层20,参考图9;A flat layer 20 is formed, referring to FIG. 9;

形成接收电极9,接收电极9通过过孔与所述源漏极层82连接,擦参考图9;The receiving electrode 9 is formed, and the receiving electrode 9 is connected to the source-drain layer 82 through the via hole. Please refer to FIG. 9 ;

本实施例中,还包括以下步骤:In this embodiment, the following steps are also included:

形成第一绝缘层3,参考图5;Form the first insulating layer 3, refer to FIG. 5;

形成第二金属连接线17,所述第二金属连接线17将所述第一金属连接线14和所述第一焊盘15进行连接,参考图6。A second metal connection line 17 is formed, and the second metal connection line 17 connects the first metal connection line 14 and the first pad 15 , referring to FIG. 6 .

本实施例中,在形成所述第一绝缘层3后,还包括在所述第一绝缘层3上形成缓冲层4,参考图7。In this embodiment, after the first insulating layer 3 is formed, it further includes forming a buffer layer 4 on the first insulating layer 3 , referring to FIG. 7 .

本实施例中,在形成所述压电膜层12之前,还包括在所述平坦层20上形成隔离绝缘层21。In this embodiment, before forming the piezoelectric film layer 12 , the method further includes forming an isolation insulating layer 21 on the flat layer 20 .

本实施例中,所述压电膜层12的形成可通过构图工艺一次成型,也可以包括以下步骤:In this embodiment, the formation of the piezoelectric film layer 12 may be formed at one time through a patterning process, and may also include the following steps:

采用压电材料(例如PVDF)形成压电薄膜层,参考图11,所述压电薄膜层是整面成膜,所述压电薄膜层包括覆盖于所述接收电极层10之上的保留区域,还覆盖于所述第二焊盘7之上的去除区域;A piezoelectric thin film layer is formed by using a piezoelectric material (eg PVDF). Referring to FIG. 11 , the piezoelectric thin film layer is formed on the entire surface, and the piezoelectric thin film layer includes a reserved area covering the receiving electrode layer 10 , also covering the removal area above the second pad 7;

在所述压电薄膜层上形成金属硬掩膜层18,参考图12;A metal hard mask layer 18 is formed on the piezoelectric film layer, referring to FIG. 12 ;

在所述金属硬掩膜层18上形成光刻胶19,所述光刻胶19在所述压电薄膜层上的正投影位于所述压电薄膜层的保留区域,参考图13;A photoresist 19 is formed on the metal hard mask layer 18, and the orthographic projection of the photoresist 19 on the piezoelectric thin film layer is located in the reserved area of the piezoelectric thin film layer, referring to FIG. 13;

通过光刻工艺,去除所述压电薄膜层的去除区域,形成所述压电膜层12,参考图10。Through a photolithography process, the removed area of the piezoelectric thin film layer is removed to form the piezoelectric thin film layer 12 , referring to FIG. 10 .

所述金属硬掩膜层的材料优选为Al系材料,例如:MoAlNdMo,MoAlMo。The material of the metal hard mask layer is preferably an Al-based material, such as MoAlNdMo, MoAlMo.

本实施例中,所述发射电极层11采用金属Ag支制成,但并不以此为限。In this embodiment, the emitter electrode layer 11 is made of metal Ag, but it is not limited to this.

以上所述为本发明较佳实施例,需要说明的是,对于本领域普通技术人员来说,在不脱离本发明所述原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也应视为本发明保护范围。The above are the preferred embodiments of the present invention. It should be noted that, for those of ordinary skill in the art, without departing from the principles of the present invention, several improvements and modifications can be made. These improvements and modifications It should also be regarded as the protection scope of the present invention.

Claims (12)

1.一种超声波指纹识别传感器,包括硬质基板,设置于所述硬质基板上的柔性衬底,以及依次设置于柔性衬底上的接收电极层、压电膜层和发射电极层,其特征在于,还包括设置于所述硬质基板与所述柔性衬底之间的第一焊盘,所述第一焊盘用于将所述接收电极层与外部电路板绑定连接、以获得指纹图像。1. An ultrasonic fingerprint identification sensor, comprising a rigid substrate, a flexible substrate arranged on the rigid substrate, and a receiving electrode layer, a piezoelectric film layer and a transmitting electrode layer arranged on the flexible substrate in turn, which It is characterized in that, it further comprises a first pad disposed between the rigid substrate and the flexible substrate, and the first pad is used to bind and connect the receiving electrode layer with an external circuit board to obtain a Fingerprint image. 2.根据权利要求1所述的超声波指纹识别传感器,其特征在于,所述第一焊盘与所述硬质基板之间设置有采用有机材料制成的隔离层。2 . The ultrasonic fingerprint identification sensor according to claim 1 , wherein an isolation layer made of organic material is arranged between the first pad and the hard substrate. 3 . 3.根据权利要求1所述的超声波指纹识别传感器,其特征在于,所述接收电极层包括设置于所述柔性衬底上的薄膜晶体管和与该薄膜晶体管连接的接收电极。3 . The ultrasonic fingerprint identification sensor according to claim 1 , wherein the receiving electrode layer comprises a thin film transistor disposed on the flexible substrate and a receiving electrode connected to the thin film transistor. 4 . 4.根据权利要求3所述的超声波指纹识别传感器,其特征在于,所述薄膜晶体管包括依次设置于所述柔性衬底上的有源层、栅绝缘层、栅极层、层间绝缘层、源漏极层,平坦层,还包括与源漏极层同层设置的第一金属连接线,所述第一金属连接线用于将所述第一焊盘与所述源漏极层连接。4. The ultrasonic fingerprint identification sensor according to claim 3, wherein the thin film transistor comprises an active layer, a gate insulating layer, a gate layer, an interlayer insulating layer, an active layer, a gate insulating layer, a gate insulating layer, an interlayer insulating layer, a The source-drain layer, the flat layer, also includes a first metal connection line arranged in the same layer as the source-drain layer, and the first metal connection line is used for connecting the first pad with the source-drain layer. 5.根据权利要求4所述的超声波指纹识别传感器,其特征在于,所述柔性衬底和所述接收电极层之间沿着远离所述柔性衬底的方向设置有第一绝缘层和缓冲层。5 . The ultrasonic fingerprint identification sensor according to claim 4 , wherein a first insulating layer and a buffer layer are arranged between the flexible substrate and the receiving electrode layer along a direction away from the flexible substrate. 6 . . 6.根据权利要求5所述的超声波指纹识别传感器,其特征在于,所述第一绝缘层上设置有第二金属连接线,所述第二金属连接线通过过孔与所述第一焊盘连接,所述第一金属连接线通过所述第二金属连接线与所述第一焊盘连接。6 . The ultrasonic fingerprint identification sensor according to claim 5 , wherein a second metal connection wire is provided on the first insulating layer, and the second metal connection wire is connected to the first pad through a via hole. 7 . connected, the first metal connection line is connected to the first pad through the second metal connection line. 7.根据权利要求4所述的超声波指纹识别传感器,其特征在于,还包括与源漏极层同层设置的第二焊盘,用于将发射电极层与外部电路板连接,以对所述发射电极层提供电压。7 . The ultrasonic fingerprint identification sensor according to claim 4 , further comprising a second pad disposed on the same layer as the source and drain layers, for connecting the emitter electrode layer with an external circuit board, so as to connect the The emitter electrode layer provides voltage. 8.根据权利要求4所述的超声波指纹识别传感器,其特征在于,还包括与所述源漏极层同层设置的极化线,使得所述接收电极接地,以处于零电位。8 . The ultrasonic fingerprint identification sensor according to claim 4 , further comprising a polarization line arranged in the same layer as the source and drain layers, so that the receiving electrode is grounded to be at zero potential. 9 . 9.一种显示模组,其特征在于,包括显示面板,以及设置于所述显示面板的背光侧的权利要求1-8任一项所述的超声波指纹识别传感器。9 . A display module, comprising a display panel, and the ultrasonic fingerprint identification sensor according to any one of claims 1 to 8 arranged on the backlight side of the display panel. 10 . 10.一种超声波指纹识别传感器的制作方法,其特征在于,包括以下步骤:10. A method for making an ultrasonic fingerprint identification sensor, comprising the following steps: 在硬质基板上形成隔离层;forming an isolation layer on a rigid substrate; 在隔离层上形成第一焊盘;forming a first pad on the isolation layer; 形成柔性衬底;forming a flexible substrate; 在所述柔性衬底上依次形成薄膜晶体管和接收电极,所述接收电极和所述第一焊盘分别与所述薄膜晶体管连接;forming a thin film transistor and a receiving electrode in sequence on the flexible substrate, and the receiving electrode and the first pad are respectively connected to the thin film transistor; 形成压电膜层;forming a piezoelectric film layer; 形成发射电极层。An emitter electrode layer is formed. 11.根据权利要求10所述的超声波指纹识别传感器的制作方法,其特征在于,11. The method for making an ultrasonic fingerprint identification sensor according to claim 10, wherein, 在所述柔性衬底上依次形成薄膜晶体管和接收电极,具体包括以下步骤:Forming a thin film transistor and a receiving electrode in sequence on the flexible substrate specifically includes the following steps: 形成多晶硅有源层;forming a polysilicon active layer; 形成栅绝缘层;forming a gate insulating layer; 形成栅极层;forming a gate layer; 形成层间绝缘层;forming an interlayer insulating layer; 形成源漏极层、第一金属连接线,所述源漏极层通过过孔与所述有源层连接,所述第一金属连接线通过过孔与所述第一焊盘连接;forming a source-drain layer and a first metal connection line, the source-drain layer is connected to the active layer through a via hole, and the first metal connection line is connected to the first pad through a via hole; 形成平坦层;forming a flat layer; 形成接收电极,接收电极通过过孔与所述源漏极层连接。A receiving electrode is formed, and the receiving electrode is connected with the source and drain layers through a via hole. 12.根据权利要求11所述的超声波指纹识别传感器的制作方法,其特征在于,还包括以下步骤:12. The method for making an ultrasonic fingerprint identification sensor according to claim 11 , further comprising the steps of: 形成第一绝缘层;forming a first insulating layer; 形成第二金属连接线,所述第二金属连接线将所述第一金属连接线和所述第一焊盘进行连接。A second metal connection line is formed, and the second metal connection line connects the first metal connection line and the first pad.
CN202010582074.6A 2020-06-23 2020-06-23 Ultrasonic fingerprint identification sensor, manufacturing method thereof and display module Active CN111682045B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN202010582074.6A CN111682045B (en) 2020-06-23 2020-06-23 Ultrasonic fingerprint identification sensor, manufacturing method thereof and display module
PCT/CN2021/101507 WO2021259248A1 (en) 2020-06-23 2021-06-22 Ultrasonic fingerprint recognition sensor and manufacturing method therefor, and display module

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010582074.6A CN111682045B (en) 2020-06-23 2020-06-23 Ultrasonic fingerprint identification sensor, manufacturing method thereof and display module

Publications (2)

Publication Number Publication Date
CN111682045A true CN111682045A (en) 2020-09-18
CN111682045B CN111682045B (en) 2022-06-21

Family

ID=72456313

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010582074.6A Active CN111682045B (en) 2020-06-23 2020-06-23 Ultrasonic fingerprint identification sensor, manufacturing method thereof and display module

Country Status (2)

Country Link
CN (1) CN111682045B (en)
WO (1) WO2021259248A1 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113642485A (en) * 2021-08-18 2021-11-12 云谷(固安)科技有限公司 Display panels and display devices
WO2021259248A1 (en) * 2020-06-23 2021-12-30 京东方科技集团股份有限公司 Ultrasonic fingerprint recognition sensor and manufacturing method therefor, and display module
US11438703B2 (en) * 2019-06-27 2022-09-06 Qualcomm Incorporated Ultrasonic sensor array
WO2023102954A1 (en) * 2021-12-07 2023-06-15 武汉华星光电半导体显示技术有限公司 Display device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115546851A (en) * 2022-09-30 2022-12-30 深圳市汇顶科技股份有限公司 Ultrasonic fingerprint sensor, preparation method thereof, and electronic device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020092644A (en) * 2001-06-05 2002-12-12 마이크로와이즈(주) method of fabricating ultrasonic wave probe
US9613246B1 (en) * 2014-09-16 2017-04-04 Apple Inc. Multiple scan element array ultrasonic biometric scanner
CN110021234A (en) * 2018-01-08 2019-07-16 上海和辉光电有限公司 A kind of array substrate and preparation method thereof, flexible display panels
CN110276325A (en) * 2019-06-27 2019-09-24 京东方科技集团股份有限公司 Ultrasonic fingerprint recognizer component, ultrasonic fingerprint recognition means and display device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10722918B2 (en) * 2015-09-03 2020-07-28 Qualcomm Incorporated Release hole plus contact via for fine pitch ultrasound transducer integration
US11003884B2 (en) * 2016-06-16 2021-05-11 Qualcomm Incorporated Fingerprint sensor device and methods thereof
CN108363938A (en) * 2017-01-25 2018-08-03 众智光电科技股份有限公司 Ultrasonic biological recognition sensor
CN207397290U (en) * 2017-09-30 2018-05-22 苏州迈瑞微电子有限公司 A kind of fingerprint sensor
CN107798300A (en) * 2017-10-10 2018-03-13 成都安瑞芯科技有限公司 Ultrasonic fingerprint identification module, device and electronic equipment
CN111682045B (en) * 2020-06-23 2022-06-21 京东方科技集团股份有限公司 Ultrasonic fingerprint identification sensor, manufacturing method thereof and display module

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020092644A (en) * 2001-06-05 2002-12-12 마이크로와이즈(주) method of fabricating ultrasonic wave probe
US9613246B1 (en) * 2014-09-16 2017-04-04 Apple Inc. Multiple scan element array ultrasonic biometric scanner
CN110021234A (en) * 2018-01-08 2019-07-16 上海和辉光电有限公司 A kind of array substrate and preparation method thereof, flexible display panels
CN110276325A (en) * 2019-06-27 2019-09-24 京东方科技集团股份有限公司 Ultrasonic fingerprint recognizer component, ultrasonic fingerprint recognition means and display device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11438703B2 (en) * 2019-06-27 2022-09-06 Qualcomm Incorporated Ultrasonic sensor array
WO2021259248A1 (en) * 2020-06-23 2021-12-30 京东方科技集团股份有限公司 Ultrasonic fingerprint recognition sensor and manufacturing method therefor, and display module
CN113642485A (en) * 2021-08-18 2021-11-12 云谷(固安)科技有限公司 Display panels and display devices
WO2023102954A1 (en) * 2021-12-07 2023-06-15 武汉华星光电半导体显示技术有限公司 Display device
US12175788B2 (en) 2021-12-07 2024-12-24 Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. Display device

Also Published As

Publication number Publication date
WO2021259248A1 (en) 2021-12-30
CN111682045B (en) 2022-06-21

Similar Documents

Publication Publication Date Title
CN111682045B (en) Ultrasonic fingerprint identification sensor, manufacturing method thereof and display module
CN106951130B (en) Array substrate, display panel, display device, and array substrate preparation method
US11134334B2 (en) Sounding device, manufacturing method thereof and display device
US11968901B2 (en) Displaying substrate, manufacturing method thereof, and display panel
US20200410197A1 (en) Ultrasonic fingerprint identification assembly, ultrasonic fingerprint identification device, and display apparatus
WO2018090892A1 (en) Piezoelectric sensing device and application
CN106935598B (en) Array substrate and manufacturing method thereof, touch panel and touch device
CN109993156B (en) Ultrasonic fingerprint identification panel and display device
CN110865490A (en) Array substrate, display panel and display device
TW201907179A (en) Ultrasonic Sensing Module, Method for Making Same, and Electronic Device
WO2021258462A1 (en) Display panel and display device
WO2020259297A1 (en) Ultrasonic module, ultrasonic sensor, and display screen
CN102194991A (en) Piezoelectric element, piezoelectric sensor, electronic device, and method for manufacturing piezoelectric element
JP2017085425A (en) Piezoelectric element, piezoelectric module, electronic apparatus, and method of manufacturing piezoelectric element
US20180182949A1 (en) Ultrasonic device and ultrasonic apparatus
CN110764641A (en) Display panel and display device
TW201816576A (en) Fingerprint identification device, manufacturing method thereof and display device
US11301082B2 (en) Fingerprint recognition unit and fabrication method thereof, fingerprint recognition module and display device
CN108493329B (en) Electronic device, polarization system, electronic device module manufacturing method and electronic equipment
CN106886333B (en) Sensing device
CN107144299A (en) A kind of sonac
CN108319085B (en) Array substrate, display panel and preparation method thereof
CN114724459B (en) Display substrate and display panel
WO2021253444A1 (en) Ultrasonic transducer preparation method, ultrasonic transducer and information acquisition element
CN115988949B (en) Electronic equipment, ultrasonic transducer, semiconductor chip of ultrasonic transducer and preparation method of ultrasonic transducer

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant