CN111668691A - High-power high-repetition-frequency hundred picosecond laser - Google Patents
High-power high-repetition-frequency hundred picosecond laser Download PDFInfo
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
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- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
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- H01S3/1086—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering using scattering effects, e.g. Raman or Brillouin effect
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
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Abstract
The invention discloses a high-power high-repetition-frequency hundred picosecond laser, which comprises: the seed laser emits first-frequency seed light, the first-frequency seed light enters a double-pass amplifier through a first optical isolator to be amplified, and the first-frequency seed light enters an SBS pulse compressor to be compressed to second-frequency laser after sequentially passing through a first reflector, a first beam shaper, a first single-pass amplifier, a second reflector, a third reflector, a second beam shaper and a second optical isolator; the second frequency laser is amplified through a fourth reflector, a third beam shaper, a plurality of second single-pass amplifiers, a fifth reflector, a sixth reflector, a fourth beam shaper and a plurality of four-way slab amplifiers in sequence; and the amplified laser passes through a seventh reflector, a fifth beam shaper and a frequency multiplier to generate third frequency laser, and is finally output through the spectroscope. The invention overcomes the problems of small size of solid SBS medium, damage of high power laser to SBS material, low power of output narrow pulse width laser, etc.
Description
Technical Field
The invention relates to the field of lasers, in particular to a high-power high-repetition-frequency hundred picosecond laser.
Background
As people go deep into space exploration, the activities of people entering space are increasing, but similar activities generate more and more space debris, which has great influence on satellite launching and space exploration, and the debris in space orbit needs to be detected. The conventional space target measurement is realized by radar, but the surface of the space debris has no angular reflector, the signal sent by the radar cannot be received and reflected, and the measurement by the radar is not feasible, so that the detection of the space debris by using laser becomes a great research hotspot in recent years.
The laser source used for space debris detection needs to be transmitted far enough, so that the laser source is required to have high energy, and to realize high-precision space measurement, the laser source is also required to have the characteristics of good beam quality, narrow pulse width and high repetition frequency, so that the acquisition of the laser source with narrow line width, high power and high repetition frequency is a key step for optimizing space detection.
The traditional space debris detection method adopts a nanosecond laser and combines a Main Oscillation Power Amplification (MOPA) method, but the pulse width of the traditional space debris detection method cannot meet the requirement of people on the distance measurement precision, so people are exploring the realization method of a high-energy picosecond laser.
At present, the technical means for obtaining picosecond pulse laser output mainly adopts a saturable absorber (SESAM) passive mode locking mode. However, the damage threshold of the saturable absorber is low, so that the output power of the passively mode-locked picosecond pulse laser is limited, and the passively mode-locked picosecond pulse laser is often amplified by combining a complex structure such as a regenerative amplifier, and the like, so that the cost is high, and the stability is difficult to control. Therefore, the large-energy nanosecond pulse compression is utilized to obtain large-energy output of hundreds of picoseconds and amplify the large-energy output, the difficult problem that the SESAM mode-locked laser is difficult to amplify efficiently can be effectively solved, the method is an important means for effectively obtaining a high-power picosecond laser source, the distance measurement precision is expected to be improved by 1-2 orders of magnitude, the cost of the laser is effectively controlled, and the stability is higher.
Disclosure of Invention
The invention provides a high-power high-repetition-frequency hundred picosecond laser, which overcomes the problems of small size of a solid SBS medium, damage of high-power laser to an SBS material, low power of output narrow-pulse-width laser and the like by combining a plurality of structures such as multi-stage amplification, series connection of a plurality of Stimulated Brillouin Scattering (SBS) solid media, compression and amplification, and the like, and is described in detail as follows:
a high power high repetition rate hundred picosecond laser, said laser comprising:
the seed laser emits first-frequency seed light, the first-frequency seed light passes through the first optical isolator, enters a double-pass amplifier for amplification, sequentially passes through the first reflector, the first beam shaper, the first single-pass amplifier, the second reflector, the third reflector, the second beam shaper and the second optical isolator, and enters the SBS pulse compressor to compress the first-frequency seed light to second-frequency laser;
the second frequency laser sequentially passes through a fourth reflector, a third beam shaper, a plurality of second single-pass amplifiers, a fifth reflector, a sixth reflector, a fourth beam shaper and a plurality of four-way slab amplifiers to be amplified;
and the amplified laser passes through a seventh reflector, a fifth beam shaper and a frequency multiplier to generate third frequency laser, and finally is output through the spectroscope.
The first optical isolator and the second optical isolator are composed of a first polarizer, a Faraday rotator and a first quarter wave plate, so that incident seed light passes through the first optical isolator in a single direction, and the reversely transmitted light is deflected and emitted out when passing through the first polarizer due to the change of the polarization state.
Furthermore, the double-pass amplifier consists of a second polarizer, a first side pump module, a first quarter wave plate and a zero-degree full mirror;
the first quarter-wave plate is used for changing the polarization state of the seed light; the zero-degree total-reflection mirror is plated with a total-reflection film for the seed light of the first frequency, and forms an included angle of 90 degrees with the incident direction of the seed light of the first frequency, so that total reflection is realized.
The first single-pass amplifier is composed of a second side pump module, a first 90-degree quartz rotor and a third side pump module.
Further, the SBS pulse compressor consists of a third polarizer, a second quarter-wave plate, a first focusing lens and a plurality of Brillouin media;
the second quarter-wave plate is used for changing the polarization state of the laser after pulse compression; the first focusing lens focuses the incident seed light into the Brillouin medium; the first frequency seed light is in a horizontal polarization state, is transmitted into the third polarizer, is changed into elliptical polarized light through the second quarter wave plate, is focused into a Brillouin medium through the first focusing lens to generate second frequency laser, is changed into a vertical polarization state through the first focusing lens and the second quarter wave plate after being subjected to backscattering and pulse compression, and is finally reflected out of the SBS pulse compressor through the third polarizer.
In specific implementation, the second single-pass amplifier is composed of a fourth side pump module, a second 90-degree quartz rotor, a second focusing lens, a first vacuum tube, a third focusing lens, a fifth side pump module, a second half wave plate and a fourth polarizer, wherein a first small-hole diaphragm is arranged in the first vacuum tube;
the second focusing lens, the first vacuum tube, the first small-hole diaphragm and the third focusing lens jointly form a spatial filter for eliminating a spontaneous radiation amplification effect generated in an amplification process; the second half-wave plate and the fourth polarizer are combined to control the laser output energy without changing the polarization state of the laser.
The four-way slab amplifier consists of a fifth polarizer, a slab gain medium, an eighth reflector, a sixth beam shaper, a ninth reflector, a tenth reflector, a seventh beam shaper, a third quarter wave plate, an eleventh reflector, a fourth focusing lens, a second vacuum tube, a fifth focusing lens and a third half wave plate, wherein a second aperture diaphragm is arranged in the second vacuum tube;
the sixth beam shaper and the seventh beam shaper are composed of a single optical lens or an optical lens group and are used for shaping the amplified seed beam to reduce the negative influence of the reduction of the amplification efficiency caused by beam divergence; the third quarter-wave plate is used for changing the polarization state of the laser in the amplification process; the eleventh reflector is plated with a total reflection film for the second frequency laser, and forms an included angle of 90 degrees with the incident direction of the second laser, so that the total reflection of the second frequency laser is realized.
The technical scheme provided by the invention has the beneficial effects that:
1. the laser adopts a mode of connecting a plurality of solid SBS media in series to increase the action distance of SBS pulse compression, can effectively carry out pulse compression on high repetition frequency laser, improves the pulse compression efficiency, and makes up the defect of small size of a single solid SBS medium;
2. the laser firstly performs pulse compression through SBS and then amplifies the laser power, so that the problem that the SBS material is damaged by high-power laser is solved;
3. the laser adopts a multistage amplification mode of a double-pass amplifier and a single-pass amplifier to amplify seed laser, and simultaneously adopts a mode of amplifying seed light after pulse compression by using a four-way slab amplifier, so that the effective amplification of hundred picosecond-order pulse laser can be realized, and the energy utilization rate and the amplification efficiency can be improved.
Drawings
FIG. 1 is a schematic diagram of a high power high repetition rate hundred picosecond laser;
FIG. 2 is a schematic diagram of a first optical isolator;
FIG. 3 is a schematic diagram of a two-pass amplifier;
FIG. 4 is a schematic diagram of a first one-way amplifier;
FIG. 5 is a schematic diagram of an SBS pulse compressor;
FIG. 6 is a schematic diagram of a second one-way amplifier;
FIG. 7 is a schematic diagram of a four-way slab amplifier;
fig. 8 is a schematic diagram of a structure of a series of multi-stage four-way slab amplifiers.
In the drawings, the components represented by the respective reference numerals are listed below:
1: a seed laser; 2: a first optical isolator;
3: a two-pass amplifier; 4: a first reflector;
5: a first beam shaper; 6: a first single pass amplifier;
7: a second reflector; 8: a third reflector;
9: a second beam shaper; 10: a second optical isolator;
11: an SBS pulse compressor; 12: a fourth mirror;
13: a third beam shaper; 14: a second single pass amplifier;
15: a fifth mirror; 16: a sixth mirror;
17: a fourth beam shaper; 18: a four-way slab amplifier;
19: a seventh mirror; 20: a fifth beam shaper;
21: a frequency multiplier; 22: a beam splitter.
Wherein
2-1: a first polarizer; 2-2: a Faraday rotator;
2-3: a first quarter wave plate;
3-1: a second polarizer; 3-2: a first side pump module;
3-3: a first quarter wave plate; 3-4: a zero degree total reflection mirror;
6-1: a second side pump module; 6-2: a first 90 ° quartz rotor;
6-3: a third side pump module;
11-1: a third polarizer; 11-2: a second quarter wave plate;
11-3: a first focusing lens; 11-4: a brillouin medium;
14-1: a fourth side pump module; 14-2: a second 90 ° quartz rotor;
14-3: a second focusing lens; 14-4: a first vacuum tube;
14-5: a first aperture diaphragm; 14-6: a third focusing lens;
14-7: a fifth side pump module; 14-8: a second half wave plate;
14-9: a fourth polarizer;
18-1: a fifth polarizer; 18-2: a slab gain medium;
18-3: an eighth mirror; 18-4: a sixth beam shaper;
18-5: a ninth mirror; 18-6: a tenth mirror;
18-7: a seventh beam shaper; 18-8: a third quarter wave plate;
18-9: an eleventh mirror; 18-10: a fourth focusing lens;
18-11: a second vacuum tube; 18-12: a second aperture diaphragm;
18-13: a fifth focusing lens; 18-14: a third half wave plate.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, embodiments of the present invention are described in further detail below.
The defects existing in the traditional space target detection technology are known, and the laser can be used for quickly and accurately detecting the space target, particularly measuring space debris in a near-earth orbit, which has important significance for satellite emission and further space exploration. To realize long-distance space target detection by laser, the adopted laser source is required to have higher energy, and to realize high-precision space measurement, the laser source is also required to have the characteristics of good beam quality, narrow pulse width and high repetition frequency, so that the acquisition of the laser source with narrow line width, high power and high repetition frequency is a key step for optimizing space detection. The narrow linewidth laser output of picosecond magnitude can be obtained by adopting an SESAM passive mode locking mode, but the damage threshold of a saturable absorber is low, and the output power of pulse laser is greatly limited.
In summary, the present invention provides a high-power, narrow-linewidth, high repetition frequency laser source for space debris detection by using the injected seed light through the combination of multi-stage oscillation power amplification and SBS pulse compression.
In order to solve the problem that the traditional space target measurement technology is not suitable for space debris detection, the embodiment of the invention provides a high-power high-repetition-frequency hundred picosecond laser, and referring to fig. 1, the high-power high-repetition-frequency hundred picosecond laser comprises: the optical isolator comprises a seed laser 1, a first optical isolator 2, a double-pass amplifier 3, a first reflecting mirror 4, a first beam shaper 5, a first single-pass amplifier 6, a second reflecting mirror 7, a third reflecting mirror 8, a second beam shaper 9, a second optical isolator 10, an SBS pulse compressor 11, a fourth reflecting mirror 12, a third beam shaper 13, a second single-pass amplifier 14, a fifth reflecting mirror 15, a sixth reflecting mirror 16, a fourth beam shaper 17, a four-way slab amplifier 18, a seventh reflecting mirror 19, a fifth beam shaper 20, a frequency multiplier 21 and a beam splitter 22.
Wherein the seed laser 1 emits a first frequency (ω)p) The single longitudinal mode kHz nanosecond seed light enters a double-pass amplifier 3 for amplification after passing through a first optical isolator 2, and then sequentially passes through a first reflector 4, a first beam shaper 5, a first single-pass amplifier 6 and a second reflectionAfter the mirror 7, the third mirror 8, the second beam shaper 9 and the second optical isolator 10 enter the SBS pulse compressor 11 to compress the nanosecond seed light of the first frequency to a second frequency (ω)s) Laser, unit is hundred picoseconds;
the compressed laser is amplified through a fourth reflector 12, a third beam shaper 13, a plurality of second single-pass amplifiers 14, a fifth reflector 15, a sixth reflector 16, a fourth beam shaper 17 and a plurality of four-way slab amplifiers 18 in sequence;
the amplified laser beam passes through a seventh mirror 19, a fifth beam shaper 20 and a frequency multiplier 21 to generate a third frequency (omega)H) Finally, the laser light is output through the beam splitter 22.
The first beam shaper 5, the second beam shaper 9, the third beam shaper 13, the fourth beam shaper 17 and the fifth beam shaper 20 are used for adjusting the divergence angle and the aperture of a light beam, and are composed of a single optical lens or an optical lens group.
In specific implementation, the first reflector 4, the second reflector 7, the third reflector 8, the fourth reflector 12, the fifth reflector 15, the sixth reflector 16, and the seventh reflector 19 are all plane reflectors, and are highly reflective to seed light of the first frequency. The beam splitter 22 is coated with a coating for the second frequency (ω)s) Antireflection film for laser and third frequency (ω)H) A total reflection film of laser light.
Referring to fig. 2, the first optical isolator 2 and the second optical isolator 10 are each composed of a first polarizer 2-1, a faraday rotator 2-2, and a first quarter wave plate 2-3; make the seed light of incident one-wayly pass through first opto-isolator 2 and second opto-isolator 10, the light of reverse transmission deflects the outgoing when passing through first polarizer 2-1 because of the change of polarization state, consequently can't pass through first opto-isolator 2 and second opto-isolator 10, and then plays the effect of protection seed laser 1.
Referring to FIG. 3, the double-pass amplifier 3 is composed of a second polarizer 3-1, a first side pump module 3-2, a first quarter-wave plate 3-3 and a zero-degree total reflection mirror 3-4; the first quarter-wave plate 3-3 is used for changing the polarization state of the seed light; the zero-degree total-reflection mirror 3-4 is plated with a total-reflection film for the seed light of the first frequency, and forms an included angle of 90 degrees with the incident direction of the laser, so that the total reflection of the seed light of the first frequency is realized; the first frequency seed light which enters the double-pass amplifier 3 is in a horizontal polarization state, is transmitted into the second polarizer 3-1, is amplified through the first side pump module 3-2, is changed into elliptical polarized light through the first quarter-wave plate 3-3, is totally reflected at the zero-degree total reflection mirror 3-4, is changed into a vertical polarization state through the first quarter-wave plate 3-3 after being totally reflected, is amplified again through the first side pump module 3-2 for the second time, and is finally reflected out of the double-pass amplifier 3 through the second polarizer 3-1 after being amplified twice and changed into the vertical polarization state, so that the whole double-pass amplification process is completed.
Referring to fig. 4, the first one-way amplifier 6 is composed of a second side pump module 6-1, a first 90 ° quartz rotor 6-2, and a third side pump module 6-3; the first 90 ° quartz rotor 6-2 is used to rotate the polarization direction of the seed light by 90 ° (other values may be used in the specific implementation, and the embodiment of the present invention is not limited thereto) to compensate some negative thermal effects generated in the amplification process.
Referring to fig. 5, the SBS pulse compressor 11 consists of a third polarizer 11-1, a second quarter-wave plate 11-2, a first focusing lens 11-3, and a plurality of brillouin media 11-4; the second quarter-wave plate 11-2 is used for changing the polarization state of the laser after pulse compression; the first focusing lens 11-3 focuses the incident seed light into the brillouin medium 11-4; the first frequency seed light incident to the SBS pulse compressor 11 is in a horizontal polarization state, is transmitted into the third polarizer 11-1, is changed into elliptical polarized light through the second quarter-wave plate 11-2, is focused into the Brillouin medium 11-4 through the first focusing lens 11-3 to generate second frequency laser, the second frequency laser generates backscattering and pulse compression, then passes through the first focusing lens 11-3 again, then passes through the second quarter-wave plate 11-2 to be in a vertical polarization state, and finally the pulse compressed second frequency laser is reflected out of the SBS pulse compressor 11 through the third polarizer 11-1.
Referring to fig. 6, the second single-pass amplifier 14 is composed of a fourth side pump module 14-1, a second 90 ° quartz rotor 14-2, a second focusing lens 14-3, a first vacuum tube 14-4 (a first aperture stop 14-5 is disposed in the first vacuum tube 14-4), a third focusing lens 14-6, a fifth side pump module 14-7, a second half wave plate 14-8, and a fourth polarizer 14-9; the second focusing lens 14-3, the first vacuum tube 14-4, the first aperture diaphragm 14-5 and the third focusing lens 14-6 jointly form a spatial filter for eliminating the spontaneous emission Amplification (ASE) effect generated in the amplification process; the second half wave plate 14-8 and the fourth polarizer 14-9 combine to control the laser output energy without changing the polarization state of the laser.
Referring to FIG. 7, the four-way slab amplifier 18 is composed of a fifth polarizer 18-1, a slab gain medium 18-2, an eighth mirror 18-3, a sixth beam shaper 18-4, a ninth mirror 18-5, a tenth mirror 18-6, a seventh beam shaper 18-7, a third quarter wave plate 18-8, an eleventh mirror 18-9, a fourth focusing lens 18-10, a second vacuum tube 18-11, a second aperture stop 18-12, a fifth focusing lens 18-13, and a third half wave plate 18-14; the sixth beam shaper 18-4 and the seventh beam shaper 18-7 are composed of a single optical lens or an optical lens group and are used for shaping the amplified seed beam to reduce negative effects such as amplification efficiency reduction caused by beam divergence; the third quarter-wave plate 18-8 is used for changing the polarization state of the laser in the amplification process; the eleventh reflector 18-9 is plated with a total reflection film for the laser with the second frequency, and forms an included angle of 90 degrees with the incident direction of the laser, so as to realize the total reflection for the laser with the second frequency; the second frequency laser light incident to the four-way slab amplifier 18 is in a horizontal polarization state, is transmitted into the fifth polarizer 18-1, passes through the slab gain medium 18-2 for the first time (is amplified for the first time), passes through the eighth mirror 18-3, the sixth beam shaper 18-4 and the ninth mirror 18-5, passes through the slab gain medium 18-2 for the second time (is amplified for the second time), passes through the tenth mirror 18-6 and the seventh beam shaper 18-7, passes through the third quarter wave plate 18-8 to become elliptically polarized light, is totally reflected at the eleventh mirror 18-9, is changed into a vertical polarization state by the third quarter wave plate 18-8, passes through the seventh beam shaper 18-7 and the tenth mirror 18-6 again, the third laser beam passes through the slab gain medium 18-2 for the third time (third amplification), passes through a ninth mirror 18-5, a sixth beam shaper 18-4 and an eighth mirror 18-3 in sequence, is amplified by the slab gain medium 18-2 for the fourth time (fourth amplification), and is reflected by a fifth polarizer 18-1 after being amplified for the fourth time and changed into a vertical polarization state; the fourth focusing lens 18-10, the second vacuum tube 18-11 (wherein the second vacuum tube 18-11 is internally provided with a second small aperture diaphragm 18-12), the second small aperture diaphragm 18-12 and the fifth focusing lens 18-13 jointly form a spatial filter for eliminating an ASE effect generated in the amplification process and improving the beam quality; the third half-wave plate 18-14 is used for controlling the polarization state of the laser, so that on one hand, the multi-stage coupling four-way amplification is facilitated, and on the other hand, the deflection emission of the amplified laser is controlled.
Referring to fig. 8, a plurality of four-way slab amplifiers 18 may be connected in series for a second frequency (ω) depending on power requirementss) The laser light is amplified. In practical applications, the gain media of the two-way amplifier 3, the first single-way amplifier 6 and the second single-way amplifier 14 are the same as the gain media of the four-way slab amplifier 18 (e.g., Nd: YAG), wherein the end faces of the gain media of the two-way amplifier 3 and the first single-way amplifier 6 are coated with a coating for the first frequency (ω)p) The end faces of the gain medium in the seed light anti-reflection dielectric film, the second single-pass amplifier 14 and the four-pass slab amplifier 18 are plated with a dielectric film for increasing the transmission of the seed light, and the gain medium is plated with a second frequency (omega)s) The laser anti-reflection dielectric film can increase or decrease the number of the second single-pass amplifiers 14 according to the power requirement; the SBS pulse compressor 11 adopts a mode of connecting a plurality of solid SBS materials in series, and the SBS medium can be fused quartz or CaF2Or sapphire crystal, the slab gain medium 18-2 has a certain end face cutting angle α (-45 deg.) at its two end faces to improve energy utilization rate, and the frequency multiplier 21 can be potassium titanyl phosphate (KTP) or lithium triborate (LBO) crystal with two ends plated with a second frequency (omega)s) Third frequency (omega) generated after laser and frequency doublingH) And (3) an antireflection film for laser.
Brillouin frequency shift of Brillouin medium 11-4 is omegaΩSecond frequency ωs＝ωp-ωΩIn which the Brillouin frequency shift is omegaΩAre respectively much smaller than the first frequency omegapSecond frequency ωsWherein the third frequency ωH＝2ωs。
The embodiment of the invention does not limit the types of other devices except the types of the devices which are specially explained,
any device capable of performing the above functions may be used.
Those skilled in the art will appreciate that the drawings are only schematic illustrations of preferred embodiments, and the above-described embodiments of the present invention are merely provided for description and do not represent the merits of the embodiments.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.
Claims (7)
1. A high power high repetition rate hundred picosecond laser, said laser comprising:
the seed laser emits first-frequency seed light, the first-frequency seed light passes through the first optical isolator, enters a double-pass amplifier for amplification, sequentially passes through the first reflector, the first beam shaper, the first single-pass amplifier, the second reflector, the third reflector, the second beam shaper and the second optical isolator, and enters the SBS pulse compressor to compress the first-frequency seed light to second-frequency laser;
the second frequency laser sequentially passes through a fourth reflector, a third beam shaper, a plurality of second single-pass amplifiers, a fifth reflector, a sixth reflector, a fourth beam shaper and a plurality of four-way slab amplifiers to be amplified;
and the amplified laser passes through a seventh reflector, a fifth beam shaper and a frequency multiplier to generate third frequency laser, and finally is output through the spectroscope.
2. The high-power high-repetition-frequency hundred picosecond laser device according to claim 1, wherein the first optical isolator and the second optical isolator are each composed of a first polarizer, a Faraday rotator and a first quarter wave plate, so that the incident seed light passes through the first polarizer in a single direction, and the backward transmitted light is deflected and emitted out when passing through the first polarizer due to the change of polarization state.
3. The high-power high-repetition-frequency hundred picosecond laser according to claim 1, wherein the double-pass amplifier is composed of a second polarizer, a first side pump module, a first quarter wave plate and a zero-degree total reflector;
the first quarter-wave plate is used for changing the polarization state of the seed light; the zero-degree total-reflection mirror is plated with a total-reflection film for the seed light of the first frequency, and forms an included angle of 90 degrees with the incident direction of the seed light of the first frequency, so that total reflection is realized.
4. The high power high repetition rate hundred picosecond laser of claim 1, wherein said first single pass amplifier is comprised of a second side pump module, a first 90 ° quartz rotor, and a third side pump module.
5. The high-power high-repetition-frequency hundred picosecond laser according to claim 1, wherein the SBS pulse compressor is composed of a third polarizer, a second quarter wave plate, a first focusing lens and a plurality of Brillouin media;
the second quarter-wave plate is used for changing the polarization state of the laser after pulse compression; the first focusing lens focuses the incident seed light into the Brillouin medium; the first frequency seed light is in a horizontal polarization state, is transmitted into the third polarizer, is changed into elliptical polarized light through the second quarter wave plate, is focused into a Brillouin medium through the first focusing lens to generate second frequency laser, is changed into a vertical polarization state through the first focusing lens and the second quarter wave plate after being subjected to backscattering and pulse compression, and is finally reflected out of the SBS pulse compressor through the third polarizer.
6. The high power high repetition rate hundred picosecond laser of claim 1, wherein said second single pass amplifier is comprised of a fourth side pump module, a second 90 ° quartz rotor, a second focusing lens, a first vacuum tube, a third focusing lens, a fifth side pump module, a second half wave plate, and a fourth polarizer, wherein a first aperture stop is disposed in the first vacuum tube;
the second focusing lens, the first vacuum tube, the first small-hole diaphragm and the third focusing lens jointly form a spatial filter for eliminating a spontaneous radiation amplification effect generated in an amplification process; the second half-wave plate and the fourth polarizer are combined to control the laser output energy without changing the polarization state of the laser.
7. The high power high repetition frequency hundred picosecond laser of claim 1, wherein said four-way slab amplifier is comprised of a fifth polarizer, a slab gain medium, an eighth mirror, a sixth beam shaper, a ninth mirror, a tenth mirror, a seventh beam shaper, a third quarter wave plate, an eleventh mirror, a fourth focusing lens, a second vacuum tube, a fifth focusing lens, a third half wave plate, wherein a second aperture stop is disposed within the second vacuum tube;
the sixth beam shaper and the seventh beam shaper are composed of a single optical lens or an optical lens group and are used for shaping the amplified seed beam to reduce the negative influence of the reduction of the amplification efficiency caused by beam divergence; the third quarter-wave plate is used for changing the polarization state of the laser in the amplification process; the eleventh reflector is plated with a total reflection film for the second frequency laser, and forms an included angle of 90 degrees with the incident direction of the second laser, so that the total reflection of the second frequency laser is realized.
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| CN113809620A (en) * | 2021-09-06 | 2021-12-17 | 山东大学 | Large-energy long-pulse 1-micrometer single-frequency nanosecond laser for laser coherent wind-finding radar |
| CN114498257A (en) * | 2021-12-09 | 2022-05-13 | 中国电子科技集团公司第五十三研究所 | Four-stroke batten laser amplification system |
| CN114552344A (en) * | 2022-02-27 | 2022-05-27 | 北京工业大学 | High-energy high-beam-quality optical fiber solid-mixed picosecond laser amplifier |
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| CN105305221A (en) * | 2015-11-25 | 2016-02-03 | 吕志伟 | Solid laser with adjustable pulse width from hundred picoseconds to nanosecond |
| CN212304188U (en) * | 2020-07-10 | 2021-01-05 | 河北工业大学 | Hundred picoseconds laser |
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| US20020024986A1 (en) * | 2000-07-14 | 2002-02-28 | Takashi Arisawa | Systems for generating short-pulse laser light |
| CN105305221A (en) * | 2015-11-25 | 2016-02-03 | 吕志伟 | Solid laser with adjustable pulse width from hundred picoseconds to nanosecond |
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| CN113809620A (en) * | 2021-09-06 | 2021-12-17 | 山东大学 | Large-energy long-pulse 1-micrometer single-frequency nanosecond laser for laser coherent wind-finding radar |
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| CN114552344A (en) * | 2022-02-27 | 2022-05-27 | 北京工业大学 | High-energy high-beam-quality optical fiber solid-mixed picosecond laser amplifier |
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