CN111655020A - Light-transmitting electromagnetic shielding film and manufacturing method thereof - Google Patents
Light-transmitting electromagnetic shielding film and manufacturing method thereof Download PDFInfo
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- CN111655020A CN111655020A CN202010539891.3A CN202010539891A CN111655020A CN 111655020 A CN111655020 A CN 111655020A CN 202010539891 A CN202010539891 A CN 202010539891A CN 111655020 A CN111655020 A CN 111655020A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 26
- 239000003999 initiator Substances 0.000 claims abstract description 36
- 238000005507 spraying Methods 0.000 claims abstract description 25
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims abstract description 18
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims abstract description 18
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 claims abstract description 18
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000012874 anionic emulsifier Substances 0.000 claims abstract description 18
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000012875 nonionic emulsifier Substances 0.000 claims abstract description 18
- 239000006172 buffering agent Substances 0.000 claims abstract description 11
- 239000000203 mixture Substances 0.000 claims description 31
- 239000011541 reaction mixture Substances 0.000 claims description 30
- 239000000839 emulsion Substances 0.000 claims description 20
- 238000005336 cracking Methods 0.000 claims description 18
- 239000000178 monomer Substances 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 17
- -1 polyoxyethylene octylphenol Polymers 0.000 claims description 13
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 12
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 claims description 12
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical group [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 claims description 12
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 12
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical group [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 claims description 12
- 239000012935 ammoniumperoxodisulfate Substances 0.000 claims description 12
- 238000000151 deposition Methods 0.000 claims description 12
- 239000003973 paint Substances 0.000 claims description 12
- 229940083575 sodium dodecyl sulfate Drugs 0.000 claims description 12
- 235000019333 sodium laurylsulphate Nutrition 0.000 claims description 12
- 238000003756 stirring Methods 0.000 claims description 12
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 12
- 239000012498 ultrapure water Substances 0.000 claims description 12
- 229910052709 silver Inorganic materials 0.000 claims description 11
- 239000004332 silver Substances 0.000 claims description 11
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 10
- 239000010453 quartz Substances 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 238000009210 therapy by ultrasound Methods 0.000 claims description 8
- 239000000872 buffer Substances 0.000 claims description 7
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical group [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 6
- 238000010894 electron beam technology Methods 0.000 claims description 6
- 239000004744 fabric Substances 0.000 claims description 6
- 238000001914 filtration Methods 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 6
- 238000006386 neutralization reaction Methods 0.000 claims description 6
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical group COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 6
- 238000002791 soaking Methods 0.000 claims description 6
- 229910000030 sodium bicarbonate Inorganic materials 0.000 claims description 6
- 235000017557 sodium bicarbonate Nutrition 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 2
- 230000002101 lytic effect Effects 0.000 claims description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 5
- 238000002834 transmittance Methods 0.000 abstract description 5
- 239000000243 solution Substances 0.000 description 25
- 230000000052 comparative effect Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
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- 239000007921 spray Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000011056 performance test Methods 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
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- 230000000087 stabilizing effect Effects 0.000 description 1
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
- H05K9/0084—Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising a single continuous metallic layer on an electrically insulating supporting structure, e.g. metal foil, film, plating coating, electro-deposition, vapour-deposition
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/06—Coating with compositions not containing macromolecular substances
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
- C08J2333/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C08J2333/10—Homopolymers or copolymers of methacrylic acid esters
- C08J2333/12—Homopolymers or copolymers of methyl methacrylate
Abstract
The invention provides a light-transmitting electromagnetic shielding film and a manufacturing method thereof, wherein the light-transmitting electromagnetic shielding film comprises the following components: the electromagnetic shielding film comprises methyl methacrylate, butyl acrylate, acrylic acid, hydroxypropyl acrylate, an initiator, a non-ionic emulsifier, a buffering agent, a remover, an anionic emulsifier and a neutralizer, and has good processability as a whole due to unique components, and can obtain the electromagnetic shielding film with high light transmittance and high shielding effect; meanwhile, the spraying mode is adopted, so that the cost of the whole production process is lower, and the efficiency is higher.
Description
Technical Field
The invention relates to the field of films, in particular to a light-transmitting electromagnetic shielding film and a manufacturing method thereof.
Background
With the advent of the 5G era, the daily electromagnetic environment becomes more and more complex, and the electromagnetic interference affects the signal of the product, such as the display effect of the screen, so the later 5G products all need to use the electronic shielding film, which in turn needs to develop the electromagnetic interference shielding, especially for the components needing light transmission, such as in CRT or PDP, the operator needs to recognize the characters displayed on the screen, so the display is required to have transparency. Therefore, a shielding film is required to have a certain transmittance while shielding electromagnetic interference, and particularly, a PDP emits more electromagnetic waves, and thus, a stronger electromagnetic wave shielding performance is required. The shielding performance of the electromagnetic wave can be expressed simply by a surface resistance value. For example, in the case of a light-transmitting electromagnetic wave shielding material for CRT, the surface resistance value is required to be 300 Ω/sq or less, while in the case of a light-transmitting electromagnetic wave shielding material for PDP, 2.5 Ω/sq or less is required, and in the case of a plasma TV for consumer use using PDP, the conductivity is required to be 1.5 Ω/sq or less, and further, an extremely high conductivity of 0.1 Ω/sq or less is required.
In order to solve the above-mentioned problems, patent document JP2004221564A proposes a method of forming a conductive mesh using conductive metallic silver obtained by developing silver halide, but since the developed silver mesh has high resistance, the film thus obtained may be difficult to be subjected to direct electrolytic plating, which increases the cost at the time of production. Or forming a metal mesh film on a transparent substrate by etching using photolithography as disclosed in patent JP 200323290A; this method has an advantage in that a shielding film having a good shielding effect can be obtained, but it also has a disadvantage in that the manufacturing process is troublesome and complicated.
The invention provides an electromagnetic shielding film which is simple and convenient to manufacture, low in cost, high in light transmittance and good in shielding performance.
Disclosure of Invention
In view of the above, to solve the above problems, there is provided a light-transmissive electromagnetic shielding film and a method for manufacturing the same, wherein the light-transmissive electromagnetic shielding film comprises the following components: methyl methacrylate, butyl acrylate, acrylic acid, hydroxypropyl acrylate, an initiator, a non-ionic emulsifier, a buffering agent, a remover, an anionic emulsifier and a neutralizer;
wherein the initiator is ammonium peroxodisulfate, the nonionic emulsifier is polyoxyethylene octyl phenol ether-10, the buffer is sodium bicarbonate, the remover is propylene glycol methyl ether acetate, the anionic emulsifier is sodium dodecyl sulfate, and the neutralizer is 25% ammonia water solution.
The light-transmitting electromagnetic shielding film consists of methyl methacrylate 25-35 weight portions, butyl acrylate 10-15 weight portions, acrylic acid 1-3 weight portions, hydroxypropyl acrylate 3-5 weight portions, initiator 0.2-0.5 weight portion, non-ionic emulsifier 1-1.2 weight portions, buffering agent 0.5-0.8 weight portion, eliminating agent 0.8-1 weight portion, anionic emulsifier 0.8-1 weight portion and neutralizing agent 1-1.5 weight portions.
The light-transmitting electromagnetic shielding film comprises the following components in parts by weight: 30 parts of methyl methacrylate, 12 parts of butyl acrylate, 2 parts of acrylic acid, 4 parts of hydroxypropyl acrylate, 0.3 part of an initiator, 1.1 parts of a non-ionic emulsifier, 0.6 part of a buffering agent, 0.9 part of a remover, 0.9 part of an anionic emulsifier and 1.2 parts of a neutralizer.
The method for manufacturing the light-transmitting electro-magnetic shielding film includes the steps of obtaining a monomer mixture by mixing 25-35g of methyl methacrylate, 10.0-15g of butyl acrylate, 1-3g of acrylic acid and 3-5g of hydroxypropyl acrylate in a beaker while dispensing 0.2-0.5 g of ammonium peroxodisulfate in 20-25g of ultrapure water to obtain an initiator solution, then dissolving 0.8-1g of sodium dodecyl sulfate, 1-1.2g of polyoxyethylene octylphenol ether-10, 10 wt% of the monomer mixture and 0.5-0.8g of sodium bicarbonate in 35-40g of ultrapure water at 1000rmp using a mixer to prepare an emulsified mixture, heating the emulsified mixture to 75 ℃, and adding 20 wt% of the initiator solution under continuous stirring to obtain a reaction mixture I, then keeping the reaction mixture I at 80 ℃ for 30 minutes, continuously dropwise adding the rest 90 wt% of monomer mixture and 80 wt% of initiator solution at 80 ℃ for 3 hours under stirring to obtain a reaction mixture II, and keeping the reaction mixture II at 85 ℃ for 2 hours; and after cooling, adding 1-1.5g of ammonia water solution into the reaction mixture II for neutralization, filtering for 3 times by using a filter cloth to obtain a cracking emulsion, depositing the cracking emulsion on clean quartz by using a spraying system, standing for 10-30 minutes, drying for 15-20 hours in an environment with the temperature of 20-26 ℃ and the humidity of 50-60% to obtain a shaped crack template, depositing a conductive silver film with the thickness of 150-250 nanometers on the crack template by using an electron beam evaporator at room temperature, and soaking by ultrasonic treatment for 3-5 minutes to remove the redundant cracking emulsion to obtain the electromagnetic shielding film.
Wherein the lytic emulsion is deposited on clean quartz and left for 20 minutes; the drying temperature is 23 ℃, the humidity is 55%, and the drying time is 18 h; the thickness of the conductive silver film is 200 nanometers; the ultrasonic treatment time is 4 min; the spraying process is completed by the paint spraying room, the temperature in the paint spraying room is kept at 20 ℃, and the relative humidity is 85%.
The invention has the beneficial effects that:
the light-transmitting electromagnetic shielding film manufactured by the invention comprises the following components: the electromagnetic shielding film comprises methyl methacrylate, butyl acrylate, acrylic acid, hydroxypropyl acrylate, an initiator, a non-ionic emulsifier, a buffering agent, a remover, an anionic emulsifier and a neutralizer, and has good processability as a whole due to unique components, and can obtain the electromagnetic shielding film with high light transmittance and high shielding effect; meanwhile, the spraying mode is adopted, so that the cost of the whole production process is lower, and the efficiency is higher.
Drawings
The accompanying drawings, which are included to provide a further understanding of the disclosed subject matter, are incorporated in and constitute a part of this specification. The drawings illustrate the implementations of the disclosed subject matter and, together with the detailed description, serve to explain the principles of implementations of the disclosed subject matter. No attempt is made to show structural details of the disclosed subject matter in more detail than is necessary for a fundamental understanding of the disclosed subject matter and various modes of practicing the same.
FIG. 1 is a method for manufacturing a light-transmissive electromagnetic shielding film;
Detailed Description
The advantages, features and methods of accomplishing the same will become apparent from the drawings and the detailed description that follows.
Example 1: production of light-transmitting electromagnetic shielding film
The raw materials comprise the following components in parts by weight: 25 parts of methyl methacrylate, 10 parts of butyl acrylate, 1 part of acrylic acid, 3 parts of hydroxypropyl acrylate, 0.2 part of an initiator, 1 part of a non-ionic emulsifier, 0.5 part of a buffering agent, 0.8 part of a remover, 0.8 part of an anionic emulsifier and 1 part of a neutralizer;
wherein the initiator is ammonium peroxodisulfate, the nonionic emulsifier is polyoxyethylene octyl phenol ether-10, the buffer is sodium bicarbonate, the remover is propylene glycol methyl ether acetate, the anionic emulsifier is sodium dodecyl sulfate, and the neutralizer is 25% ammonia water solution.
The manufacturing method of the light-transmitting electromagnetic shielding film comprises the following steps:
a monomer mixture was obtained by mixing 25g of methyl methacrylate, 10g of butyl acrylate, 1g of acrylic acid and 3g of hydroxypropyl acrylate in a beaker, while 0.2g of ammonium peroxodisulfate was dispensed in 20g of ultrapure water to obtain an initiator solution;
subsequently, 0.8g of sodium dodecylsulfate, 1g of polyoxyethylene octylphenol ether-10, 10 wt% of the monomer mixture and 0.5g of sodium bicarbonate were dissolved in 35g of ultrapure water at 1000rmp using a mixer to prepare an emulsified mixture, the emulsified mixture was heated to 75 ℃, and 20 wt% of an initiator solution was added under continuous stirring to obtain a reaction mixture i;
then keeping the reaction mixture I at 80 ℃ for 30 minutes, continuously dropwise adding the rest 90 wt% of monomer mixture and 80 wt% of initiator solution at 80 ℃ for 3 hours under stirring to obtain a reaction mixture II, and keeping the reaction mixture II at 85 ℃ for 2 hours;
after cooling, adding 1g of ammonia water solution into the reaction mixture II for neutralization, filtering for 3 times by using filter cloth to obtain a cracking emulsion, depositing the cracking emulsion on clean quartz by using a spraying system, standing for 10 minutes, drying for 15 hours in an environment with the temperature of 20 ℃ and the humidity of 50% to obtain a shaped crack template, depositing a conductive silver film with the thickness of 150 nanometers on the crack template by using an electron beam evaporator at room temperature, and soaking by ultrasonic treatment for 3 minutes to remove the redundant cracking emulsion to obtain the electromagnetic shielding film;
the spraying process is completed by the paint spraying room, the temperature in the paint spraying room is kept at 20 ℃, and the relative humidity is 85%.
Example 2: production of light-transmitting electromagnetic shielding film
The raw materials comprise the following components in parts by weight: methyl methacrylate 27, butyl acrylate 11, acrylic acid 1.5, hydroxypropyl acrylate 3.5, initiator 0.25, nonionic emulsifier 1.05, buffering agent 0.57, remover 0.85, anionic emulsifier 0.85 and neutralizer 1.1;
wherein the initiator is ammonium peroxodisulfate, the nonionic emulsifier is polyoxyethylene octyl phenol ether-10, the buffer is sodium bicarbonate, the remover is propylene glycol methyl ether acetate, the anionic emulsifier is sodium dodecyl sulfate, and the neutralizer is 25% ammonia water solution.
The manufacturing method of the light-transmitting electromagnetic shielding film comprises the following steps:
a monomer mixture was obtained by mixing 27g of methyl methacrylate, 11g of butyl acrylate, 1.5g of acrylic acid and 3.5g of hydroxypropyl acrylate in a beaker, while 0.25g of ammonium peroxodisulfate was dispensed in 21g of ultrapure water to obtain an initiator solution;
then, using a mixer, 0.85g of sodium dodecylsulfate, 1.05g of polyoxyethylene octylphenol ether-10, 10 wt% of the monomer mixture and 0.57g of sodium bicarbonate were dissolved in 36g of ultrapure water at 1000rmp to prepare an emulsified mixture, the emulsified mixture was heated to 75 ℃, and 20 wt% of an initiator solution was added under continuous stirring to obtain a reaction mixture i;
then keeping the reaction mixture I at 80 ℃ for 30 minutes, continuously dropwise adding the rest 90 wt% of monomer mixture and 80 wt% of initiator solution at 80 ℃ for 3 hours under stirring to obtain a reaction mixture II, and keeping the reaction mixture II at 85 ℃ for 2 hours;
after cooling, adding 1.1g of ammonia water solution into the reaction mixture II for neutralization, filtering for 3 times by using a filter cloth to obtain a cracking emulsion, depositing the cracking emulsion on clean quartz by using a spraying system, standing for 15 minutes, drying for 16.5 hours in an environment with the temperature of 21 ℃ and the humidity of 52.5% to obtain a shaped crack template, depositing a conductive silver film with the thickness of 150 plus 250 nanometers on the crack template by using an electron beam evaporator at room temperature, and soaking by ultrasonic treatment for 3.5 minutes to remove the redundant cracking emulsion to obtain the electromagnetic shielding film;
the spraying process is completed by the paint spraying room, the temperature in the paint spraying room is kept at 20 ℃, and the relative humidity is 85%.
Example 3: production of light-transmitting electromagnetic shielding film
The raw materials comprise the following components in parts by weight: 30 parts of methyl methacrylate, 12 parts of butyl acrylate, 2 parts of acrylic acid, 4 parts of hydroxypropyl acrylate, 0.3 part of an initiator, 1.1 parts of a non-ionic emulsifier, 0.6 part of a buffering agent, 0.9 part of a remover, 0.9 part of an anionic emulsifier and 1.2 parts of a neutralizer;
wherein the initiator is ammonium peroxodisulfate, the nonionic emulsifier is polyoxyethylene octyl phenol ether-10, the buffer is sodium bicarbonate, the remover is propylene glycol methyl ether acetate, the anionic emulsifier is sodium dodecyl sulfate, and the neutralizer is 25% ammonia water solution.
The manufacturing method of the light-transmitting electromagnetic shielding film comprises the following steps:
a monomer mixture was obtained by mixing 30g of methyl methacrylate, 12g of butyl acrylate, 2g of acrylic acid and 4g of hydroxypropyl acrylate in a beaker, while 0.3g of ammonium peroxodisulfate was dispensed in 22g of ultrapure water to obtain an initiator solution;
then, using a mixer, 0.9g of sodium dodecylsulfate, 1.1g of polyoxyethylene octylphenol ether-10, 10 wt% of the monomer mixture and 0.62g of sodium bicarbonate were dissolved in 37g of ultrapure water at 1000rmp to prepare an emulsified mixture, the emulsified mixture was heated to 75 ℃, and 20 wt% of an initiator solution was added under continuous stirring to obtain a reaction mixture i;
then keeping the reaction mixture I at 80 ℃ for 30 minutes, continuously dropwise adding the rest 90 wt% of monomer mixture and 80 wt% of initiator solution at 80 ℃ for 3 hours under stirring to obtain a reaction mixture II, and keeping the reaction mixture II at 85 ℃ for 2 hours;
after cooling, adding 1.2g of ammonia water solution into the reaction mixture II for neutralization, filtering for 3 times by using filter cloth to obtain a cracking emulsion, depositing the cracking emulsion on clean quartz by using a spraying system, standing for 20 minutes, drying for 18 hours in an environment with the temperature of 23 ℃ and the humidity of 55% to obtain a shaped crack template, depositing a conductive silver film with the thickness of 200 nanometers on the crack template by using an electron beam evaporator at room temperature, and soaking for 4 minutes through ultrasonic treatment to remove the redundant cracking emulsion to obtain electromagnetic shielding;
the spraying process is finished by a paint spraying room, the temperature in the paint spraying room is kept at 20 ℃, and the relative humidity is 85%;
example 4: production of light-transmitting electromagnetic shielding film
The raw materials comprise the following components in parts by weight: 35 parts of methyl methacrylate, 15 parts of butyl acrylate, 3 parts of acrylic acid, 5 parts of hydroxypropyl acrylate, 0.5 part of an initiator, 1.2 parts of a non-ionic emulsifier, 0.8 part of a buffering agent, 1 part of a remover, 1 part of an anionic emulsifier and 1.5 parts of a neutralizer;
wherein the initiator is ammonium peroxodisulfate, the nonionic emulsifier is polyoxyethylene octyl phenol ether-10, the buffer is sodium bicarbonate, the remover is propylene glycol methyl ether acetate, the anionic emulsifier is sodium dodecyl sulfate, and the neutralizer is 25% ammonia water solution.
The manufacturing method of the light-transmitting electromagnetic shielding film comprises the following steps:
a monomer mixture was obtained by mixing 35g of methyl methacrylate, 15g of butyl acrylate, 3g of acrylic acid and 5g of hydroxypropyl acrylate in a beaker, while 0.5g of ammonium peroxodisulfate was dispensed in 25g of ultrapure water to obtain an initiator solution;
subsequently, using a mixer, 1g of sodium dodecylsulfate, 1.2g of polyoxyethylene octylphenol ether-10, 10 wt% of the monomer mixture and 0.8g of sodium bicarbonate were dissolved in 40g of ultrapure water at 1000rmp to prepare an emulsified mixture, the emulsified mixture was heated to 75 ℃, and 20 wt% of an initiator solution was added under continuous stirring to obtain a reaction mixture i;
then keeping the reaction mixture I at 80 ℃ for 30 minutes, continuously dropwise adding the rest 90 wt% of monomer mixture and 80 wt% of initiator solution at 80 ℃ for 3 hours under stirring to obtain a reaction mixture II, and keeping the reaction mixture II at 85 ℃ for 2 hours;
after cooling, adding 1.5g of ammonia water solution into the reaction mixture II for neutralization, filtering for 3 times by using filter cloth to obtain a cracking emulsion, depositing the cracking emulsion on clean quartz by using a spraying system, standing for 30 minutes, drying for 20 hours in an environment with the temperature of 26 ℃ and the humidity of 60% to obtain a shaped crack template, depositing a conductive silver film with the thickness of 250 nanometers on the crack template by using an electron beam evaporator at room temperature, and soaking for 5 minutes through ultrasonic treatment to remove the redundant cracking emulsion to obtain the electromagnetic shielding film;
the spraying process is completed by the paint spraying room, the temperature in the paint spraying room is kept at 20 ℃, and the relative humidity is 85%.
The above examples 1-4 were all made using a spray system comprising a spray device comprising a uniform air spray module, a biaxial motion module and an indoor temperature/humidity conditioner during the manufacturing process; and the pressure of nitrogen gas for air injection was maintained at 0.03Mpa by a pressure stabilizing valve, and the nozzle was installed about 12cm above the base material and moved in a zigzag manner; the reciprocating motion is carried out at the speed of 100mm/s in the X direction, and the stepping motion speed in the Y direction can be integrally adjusted in a stepping mode.
Comparative example 1
This comparative example was prepared using conventional materials.
The light-transmitting electromagnetic shielding films prepared in examples 1 to 4 of the present invention and comparative example were subjected to performance tests in the following manner, and the results are shown in table 1.
Table 1 table of performance test results
| Light transmittance | Shielding effectiveness (KU frequency band) | |
| Example 1 | 91％ | 26/dB |
| Example 2 | 95％ | 27/dB |
| Example 3 | 98％ | 30/dB |
| Example 4 | 92％ | 26/dB |
| Comparative example 1 | 87％ | 20/dB |
The above table shows that the light-transmitting electromagnetic shielding film prepared by the embodiment of the invention has better comprehensive performance, and due to the unique composition, the whole electromagnetic shielding film has good processability, and the electromagnetic shielding film with high light-transmitting property and high shielding effect can be obtained; meanwhile, the spraying mode is adopted, so that the cost of the whole production process is lower, and the efficiency is higher.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art can easily conceive of the changes or substitutions within the technical scope of the present invention, and the changes or substitutions should be covered within the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the appended claims.
Claims (10)
1. A light-transmissive electromagnetic shielding film comprising the following components: methyl methacrylate, butyl acrylate, acrylic acid, hydroxypropyl acrylate, an initiator, a non-ionic emulsifier, a buffering agent, a remover, an anionic emulsifier and a neutralizer.
2. The light-transmissive electromagnetic shielding film according to claim 1, wherein the initiator is ammonium peroxodisulfate, the non-ionic emulsifier is polyoxyethylene octylphenol ether-10, the buffer is sodium bicarbonate, the remover is propylene glycol methyl ether acetate, the anionic emulsifier is sodium dodecyl sulfate, and the neutralizer is 25% aqueous ammonia solution.
3. The light-transmissive electromagnetic shielding film according to claim 1, which comprises, by weight, 25 to 35 parts of methyl methacrylate, 10 to 15 parts of butyl acrylate, 1 to 3 parts of acrylic acid, 3 to 5 parts of hydroxypropyl acrylate, 0.2 to 0.5 part of an initiator, 1 to 1.2 parts of a non-ionic emulsifier, 0.5 to 0.8 part of a buffer, 0.8 to 1 part of a remover, 0.8 to 1 part of an anionic emulsifier, and 1 to 1.5 parts of a neutralizer.
4. The light-transmitting electromagnetic shielding film according to claim 1, which comprises the following components in parts by weight: 30 parts of methyl methacrylate, 12 parts of butyl acrylate, 2 parts of acrylic acid, 4 parts of hydroxypropyl acrylate, 0.3 part of an initiator, 1.1 parts of a non-ionic emulsifier, 0.6 part of a buffering agent, 0.9 part of a remover, 0.9 part of an anionic emulsifier and 1.2 parts of a neutralizer.
5. A method for manufacturing a light-transmissive electromagnetic shielding film according to any one of claims 1 to 4, comprising the steps of obtaining a monomer mixture by mixing 25 to 35g of methyl methacrylate, 10 to 15g of butyl acrylate, 1 to 3g of acrylic acid and 3 to 5g of hydroxypropyl acrylate in a beaker while dispensing 0.2g to 0.5g of ammonium peroxodisulfate in 20 to 25g of ultrapure water to obtain an initiator solution, and subsequently dissolving 0.8 to 1g of sodium dodecylsulfate, 1 to 1.2g of polyoxyethylene octylphenol ether-10, 10 wt% of the monomer mixture and 0.5 to 0.8g of sodium bicarbonate in 35 to 40g of ultrapure water at 1000rmp using a mixer to prepare an emulsified mixture, heating the emulsified mixture to 75 ℃, and adding 20 wt% of the initiator solution under continuous stirring, obtaining a reaction mixture I, then keeping the reaction mixture I at 80 ℃ for 30 minutes, continuously dropwise adding the remaining 90 wt% of the monomer mixture and 80 wt% of the initiator solution at 80 ℃ for 3 hours under stirring to obtain a reaction mixture II, and keeping the reaction mixture II at 85 ℃ for 2 hours; and after cooling, adding 1-1.5g of ammonia water solution into the reaction mixture II for neutralization, filtering for 3 times by using a filter cloth to obtain a cracking emulsion, depositing the cracking emulsion on clean quartz by using a spraying system, standing for 10-30 minutes, drying for 15-20 hours in an environment with the temperature of 20-26 ℃ and the humidity of 50-60% to obtain a shaped crack template, depositing a conductive silver film with the thickness of 150-250 nanometers on the crack template by using an electron beam evaporator at room temperature, and soaking by ultrasonic treatment for 3-5 minutes to remove the redundant cracking emulsion to obtain the electromagnetic shielding film.
6. The method of claim 5, wherein the lytic emulsion is deposited on clean quartz and left for 20 minutes.
7. The method for manufacturing a light-transmissive electromagnetic shielding film according to claim 5, wherein the drying temperature is 23 ℃, the humidity is 55%, and the drying time is 18 hours.
8. The method of claim 5, wherein the thickness of the conductive silver film is 200 nm.
9. The method for manufacturing a light-transmissive electromagnetic shielding film according to claim 5, wherein the ultrasonic treatment is performed for 4 min.
10. The method of manufacturing a light-transmitting electromagnetic shielding film according to claim 5, wherein the spraying process is performed in a paint booth, and the temperature in the paint booth is maintained at 20 ℃ and the relative humidity is 85%.
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| US20080211371A1 (en) * | 2004-06-23 | 2008-09-04 | Fujifilm Corporation | Light-Transmitting Electromagnetic Wave Shielding Film And Process For Producing The Same |
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| CN109575835A (en) * | 2018-11-02 | 2019-04-05 | 襄阳三沃航天薄膜材料有限公司 | A kind of false proof aqueous pressure-sensitive adhesive protective film and preparation method thereof |
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| US20080211371A1 (en) * | 2004-06-23 | 2008-09-04 | Fujifilm Corporation | Light-Transmitting Electromagnetic Wave Shielding Film And Process For Producing The Same |
| CN104822249A (en) * | 2015-05-21 | 2015-08-05 | 哈尔滨工业大学 | Electromagnetic shielding optical window making method |
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