CN111649693A - Sample morphology measuring device and method - Google Patents
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- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
- G01B11/2531—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object using several gratings, projected with variable angle of incidence on the object, and one detection device
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Abstract
The disclosure provides a sample morphology measuring device and a method. The device comprises: the light source module (101), illumination component (102), projection grating component (103), diaphragm component (104), projection optical component (105) that set up in order, detection optical component (107), detection grating component (108), data acquisition component (109) that set up in order to and set up motion platform (110) on the light path between projection optical component (105) and detection optical component (107), the sample (106) that awaits measuring is placed on motion platform (110). The diaphragm assembly is utilized to screen out the low diffraction order signal to measure the height of the sample, the measuring range is ensured, the high diffraction order signal is selected according to the measuring result to measure the height of the sample again, and the measuring precision is improved.
Description
Technical Field
The present disclosure relates to a reflective sample topography measurement apparatus and method.
Background
In the fields of optical processing, optical inspection, electron beam imaging, and photolithography, it is often necessary to precisely control Z-direction (height direction) positional information of a sample. In order to ensure that the sample is always in an ideal position, the surface topography of the sample needs to be accurately measured. When the high-precision surface morphology of a sample is measured, although a scanning electron microscope and an atomic force microscope have high measurement resolution, the measurement speed is slow, the requirement on the measurement environment is strict, and the method is not suitable for online measurement. The optical non-contact measurement mode becomes the main mode of on-line measurement due to the characteristics of high measurement speed and high resolution.
In the related art, in the optical measurement method of the surface topography of the sample, the moire fringes are formed mainly through the imaging of the projection grating and the imaging grating to obtain the topography information of the sample. In the technology, the measurement precision is improved by adopting the grating mark with a small period, but the measurement range is small, and the period of the grating mark cannot be too small in order to cover the thickness tolerance range of a sample to be measured. In addition, due to the fact that only low diffraction orders are adopted, the nonlinear influence of a measuring signal is large, and particularly under the condition that the influence of a projection grating error and imaging optical system aberration is serious, the nonlinear influence is large. How to reduce the nonlinearity of the measurement signal and improve the measurement accuracy under the condition of ensuring the measurement range is a problem concerned by researchers at present.
Disclosure of Invention
Technical problem to be solved
In view of the above problems, the present disclosure provides a sample morphology measurement apparatus and method, which utilize a diaphragm to select and measure a signal of a required diffraction order, and improve measurement accuracy on the basis of ensuring a measurement range.
(II) technical scheme
The present disclosure provides in one aspect a sample topography measurement apparatus, the apparatus comprising: the device comprises a light source assembly 101, an illumination assembly 102, a projection grating assembly 103, a diaphragm assembly 104, a projection optical assembly 105, a detection optical assembly 107, a detection grating assembly 108, a data acquisition assembly 109 and a motion platform 110, wherein the light source assembly 101, the illumination assembly 102, the projection grating assembly 103, the diaphragm assembly 104 and the projection optical assembly 105 are sequentially arranged, the motion platform 110 is arranged on a light path between the projection optical assembly 105 and the detection optical assembly 107, and a sample 106 to be detected is placed on the motion platform 110; wherein the illumination assembly 102 illuminates the projection grating assembly 103 with measurement light generated by the light source assembly 101 to generate a multi-diffraction order signal; the diaphragm assembly 104 filters out zero-order signals in the multi-diffraction-order signals and filters out first diffraction-order signals, the first diffraction-order signals comprise + m diffraction-order signals and-m diffraction-order signals, and m is an integer greater than 0; the projection optical assembly 105 images the image of the projection grating assembly 103 under the first diffraction order signal to the surface of a sample 106 to be measured; the detection optical component 107 images the image of the projection grating component 103 carrying the first height information of the sample 106 to be detected onto the detection grating component 108, and the first height information of the sample 106 to be detected is obtained through the data acquisition component 109; the diaphragm assembly 104 is further configured to screen out a second diffraction order signal according to the first height information, where the second diffraction order signal includes a + n diffraction order signal and a-n diffraction order signal, and n is greater than m; the projection optical assembly 105 is further used for imaging the image of the projection grating assembly 103 under the second diffraction order signal onto the surface of the sample 106 to be measured; the detection optical assembly 107 images the image of the projection grating assembly 103 carrying the second height information of the sample 106 to be detected onto the detection grating assembly 108, and the second height information of the sample 106 to be detected is obtained through the data acquisition assembly 109.
Optionally, the motion stage 110 is configured to move in a plane perpendicular to the height direction of the sample 106 to be measured, so that the data acquisition assembly 109 obtains the topographic information of the sample 106 to be measured.
Optionally, the period of the detection grating assembly 108 is smaller than the period of the projection grating assembly 103.
Optionally, the detection grating assembly 108 separates an image of the projection grating assembly 103 carrying the first height information or the second height information of the sample 106 to be measured into a first image and a second image, and a distance between the first image and the second image is 1/4 of a period of the projection grating assembly 103.
Optionally, the center of the detection grating assembly 108 is offset with respect to the center of the projection grating assembly 103 by 1/8 of the period of the projection grating assembly 103.
Optionally, the projection optical assembly 105 and the detection optical assembly 107 are reflective assemblies or transmissive assemblies, the diaphragm assembly 104 is disposed on an aperture diaphragm surface of the projection optical assembly 105, and the sample topography measuring apparatus is a double telecentric measuring apparatus.
Optionally, the projection grating assembly 103 is an amplitude grating for enhancing the intensity of the first diffraction order signal or the second diffraction order signal.
Optionally, the projection grating assembly 103 is an array composed of a plurality of projection gratings to measure the first height information or the second height information at a plurality of positions of the sample 106 to be measured simultaneously.
Optionally, the angle θ of the measurement light irradiated on the projection grating assembly 103 satisfies:
where d is the period of the projection grating assembly 103 and λ is the minimum wavelength in the measurement light impinging on the projection grating assembly 103.
The present disclosure provides a method for measuring the topography of a sample to be measured by using the above sample topography measuring apparatus, the method comprising:
the data acquisition component 109 calculates first height information of a position of the sample 106 to be measured according to the acquired transmission intensities of the two images separated by the detection grating component 108, and the obtained first height information is:
wherein h is1D is the period of the projection grating assembly 103, m is the diffraction order of the first diffraction order signal screened by the diaphragm assembly 104, and α is the input positionAngle of light of the sample 106 to be measured, I1And I2The transmission intensities of the two images separated by the detection grating assembly 108 when the first diffraction order signal is screened out by the diaphragm assembly 104 respectively;
the diaphragm assembly 104 screens a second diffraction order signal according to the first height information, the data acquisition assembly 109 calculates second height information of a position of the sample 106 to be detected according to the transmission intensities of two images separated by the acquired detection grating assembly 108, and the obtained second height information is as follows:
wherein h is2N is the diffraction order of the second diffraction order signal screened by the diaphragm assembly 104 for the second height information, n is greater than m, I3And I4The transmission intensities of the two images separated by the detection grating assembly 108 when the diaphragm assembly 104 screens out the second diffraction order signals respectively;
the moving table 110 is moved in a plane perpendicular to the height direction of the sample 106 to be measured, and the data acquisition assembly 109 calculates second height information of any position of the sample 106 to be measured according to the acquired transmission intensities of the two images separated by the detection grating assembly 108, so as to obtain the morphology information of the sample 106 to be measured.
(III) advantageous effects
The sample morphology measuring device and the method provided by the embodiment of the disclosure have the following beneficial effects:
(1) the diaphragm assembly is utilized to screen out the low diffraction order signal to measure the height of the sample, the measurement range is ensured, and the high diffraction order signal is selected according to the measurement result to measure the height of the sample again, so that the measurement precision is improved;
(2) the diaphragm assembly filters zero-order signals, so that the fringe spacing of the projection grating image is reduced, the signal contrast is improved, the fringe spacing of the projection grating image is further reduced by selecting high diffraction order signals, and the measurement accuracy is improved;
(3) the period of the detection grating assembly is set to be smaller than that of the projection grating assembly, so that interference of high diffraction order signals is guaranteed.
Drawings
FIG. 1 schematically shows a schematic structural diagram of a sample topography measurement apparatus provided by an embodiment of the present disclosure;
FIG. 2 schematically shows a schematic structural diagram of a sample topography measurement apparatus provided by another embodiment of the present disclosure;
fig. 3A and 3B schematically show a diagram of the measurement signals corresponding to different diffraction orders, respectively.
Description of reference numerals:
101-a light source assembly; 102-a lighting assembly; 103-a projection grating assembly; 104-a diaphragm assembly; 105-a projection optics assembly; 106-sample to be tested; 107-detection optics; 108-a detection grating assembly; 109-a data acquisition component; 110-motion stage.
Detailed Description
For the purpose of promoting a better understanding of the objects, aspects and advantages of the present disclosure, reference is made to the following detailed description taken in conjunction with the accompanying drawings.
Fig. 1 schematically shows a schematic structural diagram of a sample topography measuring apparatus provided by an embodiment of the present disclosure. Referring to fig. 1, and fig. 2-3B, the sample topography measuring apparatus of the present embodiment will be described in detail.
Referring to fig. 1, the sample topography measuring apparatus includes a light source assembly 101, an illumination assembly 102, a projection grating assembly 103, a diaphragm assembly 104, a projection optical assembly 105, a detection optical assembly 107, a detection grating assembly 108, a data acquisition assembly 109, and a motion stage 110 disposed on an optical path between the projection optical assembly 105 and the detection optical assembly 107, in which the sample 106 to be measured is placed on the motion stage 110.
The light source assembly 101 is used to generate measurement light to provide the device with measurement light. The spot size and numerical aperture of the measurement light generated by the light source assembly 101 should meet the illumination requirements of the illumination assembly 102, and should have high energy stability and uniformity. The Light source unit 101 is, for example, a high-pressure mercury lamp, a white Light Emitting Diode (LED), or the like.
The illumination assembly 102 is used to illuminate the projection grating assembly 103 with the measurement light generated by the light source assembly 101 to generate a multi-diffraction order signal. The multiple diffraction order signal includes optical signals of multiple diffraction orders, including, for example, the 0 th diffraction order signal, the + -1 st diffraction order signal, the + -2 nd diffraction order signal, … …, the + -N th diffraction order signal, and the like.
In the present embodiment, the angle θ of the measurement light irradiated on the projection grating assembly 103 satisfies:
where d is the period of projection grating assembly 103 and λ is the minimum wavelength in the measurement light impinging on projection grating assembly 103. Setting the angle θ of the measuring light within the above range can ensure that the diffraction spots of the respective diffraction order signals at the diaphragm assembly 104 are separated from each other, so that the diaphragm assembly 104 can select therefrom the ± m diffraction order signal or the ± n diffraction order signal for the topography measurement of the sample.
The diaphragm assembly 104 is configured to filter a zero-order signal (i.e., a 0 diffraction order signal) in the multiple diffraction order signals, and filter out a first diffraction order signal or a second diffraction order signal. In this embodiment, the diaphragm assembly 104 is used to filter out zero-order signals, so that the fringe spacing of the projection grating is reduced, the contrast of each diffraction order signal is improved, the fringe spacing of the projection grating is further reduced by diffracting a second diffraction order signal of a high diffraction order, and the measurement accuracy is improved.
The projection optical assembly 105 images the image of the projection grating assembly 103 under the first diffraction order signal or the second diffraction order signal onto the surface of the sample 106 to be measured. The projection optical assembly 105 images an image of the projection grating assembly 103 under the first diffraction order signal or the second diffraction order signal onto the surface of the sample 106 to be detected, and after the image is reflected by the sample 106 to be detected, the image reflects a signal carrying the first height information or the second height information of the sample 106 to be detected to the detection optical assembly 107.
In this embodiment, the projection optical device 105 is a reflective device or a transmissive device. When the projection optics 105 is a transmission type component, the detection optics 107 is also a transmission type component, as shown in fig. 1; when the projection optics 105 is a reflective type, the detection optics 107 is also a reflective type, as shown in FIG. 2. The diaphragm assembly 104 is arranged on the aperture diaphragm surface of the projection optical assembly 105, and the sample morphology measuring device is a double telecentric measuring device.
The detection optical assembly 107 images the image of the projection grating assembly 103 carrying the first height information or the second height information of the sample 106 to be detected onto the detection grating assembly 108. The detection grating assembly 108 separates the image of the projection grating assembly 103 carrying the first height information or the second height information of the sample 106 to be measured into two images, namely a first image and a second image, so that the data acquisition assembly 109 calculates the first height information or the second height information of the sample 106 to be measured according to the acquired first image and second image.
In this embodiment, the distance between the first image and the second image is 1/4 of the period of the projection grating assembly 103, and the center of the detection grating assembly 108 is shifted 1/8 of the period of the projection grating assembly 103 relative to the center of the projection grating assembly 103, so as to reduce the power stability of the light source and the environmental-to-measurement resultAnd makes the algorithms in the data acquisition component 109 simpler. Further, the period d of the grating assembly 108 is detecteddetAnd should also be less than the period d of projection grating assembly 103, i.e., ddetD, so as to ensure that the signals of high diffraction order interfere, thereby ensuring that the signals of first diffraction order and second diffraction order have interference regions.
The moving stage 110 is configured to move in a plane perpendicular to the height direction of the sample 106 to be measured, that is, move in the XY plane shown in fig. 1 and 2, and fix after moving to a position (x, y), wait for the sample topography measuring apparatus to measure the second height information at the position (x, y) until the second height information of all points of the sample to be measured in the XY plane is measured, so as to obtain the topography information of the sample 106 to be measured, where the topography information is the three-dimensional topography of the sample 106 to be measured.
According to an embodiment of the present disclosure, the projection grating assembly 103 may be a single projection grating or an array composed of a plurality of projection gratings. When the projection grating assembly 103 is an array composed of a plurality of projection gratings, the projection optical assembly 105 can image images of the projection gratings under the first diffraction order signal or the second diffraction order signal to different positions on the surface of the sample 106 to be measured, so that the sample morphology measuring apparatus can simultaneously measure the first height information or the second height information of the sample 106 to be measured at a plurality of positions, and the measuring efficiency is improved.
In this embodiment, when the height of the sample 106 to be measured at a certain position is h, the image of the projection grating assembly 103 will generate Δ x shift at the detection grating assembly 108, and the transmission intensities of the two images collected by the data collection assembly 109 are:
wherein, I1And I2Respectively screen out the first diaphragm assembly 104The transmission intensities of the two images separated by the detection grating assembly 108 for the second diffraction order signal, E being the amplitude of the + m diffraction order signal, E2Is the amplitude, k, of the signal in the order of-m diffraction1xIs the component of the wave vector of the + m diffraction order signal in the x direction, k2xIs the component of the m diffraction order signal wavevector in the x-direction, and t (k) is the fourier transform of the detection grating assembly 108. For any sample topography measuring device, after parameters of the projection grating assembly 103, the diaphragm assembly 104, the projection optical assembly 105, the detection optical assembly 107 and the detection grating assembly 108 are determined, E1、E2、k1x、k2xT (k) are all constants, and ideally, E1＝E2、k1x＝k2x、 T(kx-k1x)＝T(kx-k2x) The data acquisition component 109 performs calculation according to the acquired transmission intensities of the two images, and can obtain:
further, according to the basic principle of the optical triangulation, the first height information and the second height information of the position of the sample 106 to be measured can be obtained as follows:
wherein h is1As first height information, h2For the second height information, d is the period of the projection grating assembly 103, α is the angle of the light incident on the sample 106, I3And I4The transmission intensities of the two images separated by the detection grating assembly 108 when the second diffraction order signal is screened out for the diaphragm assembly 104, respectively.
The transmission intensities of the two images collected by the data collection assembly 109 are sine functions when the sample 106 to be measured is highAt higher degrees, the transmission intensity I of the two images1And I2Since the change with height is nonlinear, the measurement accuracy is greatly affected by the aberration of the optical system and the environment, and the like, the linear region in the middle of the sine function is generally selected as the effective signal region, as shown in fig. 3A and 3B. In conjunction with fig. 3A and 3B, it can be seen that the higher the diffraction order of the signal, the higher the accuracy of the measured height information; the lower the diffraction order of the signal, the larger the measurement range of the measured height information and the lower the accuracy.
In the sample morphology measuring apparatus in this embodiment, first, the first height information at a position of the sample 106 to be measured is measured by using the first diffraction order signal of the lower diffraction order, so as to ensure the measurement range, where the diffraction order m of the first diffraction order signal is, for example, 1; then, selecting a second diffraction order signal of a corresponding higher diffraction order according to the first height information, wherein the diffraction order n of the second diffraction order signal is 5 for example, and measuring second height information of the position of the sample 106 to be measured by using the second diffraction order signal, wherein the second height information has higher precision relative to the first height information, so that the measurement precision of the device is improved; the motion stage 110 is moved to repeat the above-mentioned measurement process to measure the second height information at each position of the sample 106 to be measured, so as to obtain the profile information of the sample 106 to be measured. Another embodiment of the present disclosure provides a method for measuring the profile of a sample to be measured by using the sample profile measuring apparatus shown in fig. 1-3B, including:
first, the data acquisition component 109 calculates first height information of a position of the sample 106 to be measured according to the acquired transmission intensities of two images separated by the detection grating component 108, and the obtained first height information is:
wherein h is the first height information, d is the period of the projection grating assembly 103, m is the diffraction order of the first diffraction order signal screened by the diaphragm assembly 104, α is the angle of the light ray incident into the sample 106 to be measured, and I1And I2The transmission intensities of the two images separated by the detection grating assembly 108 when the diaphragm assembly 104 screens out the first diffraction order signal, respectively.
Then, the diaphragm assembly 104 screens a second diffraction order signal according to the first height information, the data acquisition assembly 109 calculates second height information of a position of the sample 106 to be detected according to the transmission intensities of the two images separated by the acquired detection grating assembly 108, and the obtained second height information is:
wherein h is2N is the diffraction order of the second diffraction order signal screened by the diaphragm assembly 104, n is more than m, I3And I4The transmission intensities of the two images separated by the detection grating assembly 108 when the second diffraction order signal is screened out for the diaphragm assembly 104, respectively.
Finally, the motion stage 110 is moved in a plane perpendicular to the height direction of the sample 106 to be measured, and the data acquisition assembly 109 calculates second height information of any position of the sample 106 to be measured according to the acquired transmission intensities of the two images separated by the detection grating assembly 108, so as to obtain the morphology information of the sample 106 to be measured.
In this embodiment, the operations performed by the method for measuring the feature of the sample to be measured by the sample feature measuring apparatus are the same as the working process of the sample feature measuring apparatus in the embodiment shown in fig. 1-3B, and are not described herein again. For details of this embodiment, please refer to the description of the sample profile measuring apparatus in the embodiment shown in fig. 1-3B.
The above-mentioned embodiments are intended to illustrate the objects, technical solutions and advantages of the present invention in further detail, and it should be understood that the above-mentioned embodiments are only exemplary embodiments of the present invention, and are not intended to limit the present invention, and any modifications, equivalents, improvements and the like made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. A sample topography measurement apparatus, said apparatus comprising:
the device comprises a light source assembly (101), an illumination assembly (102), a projection grating assembly (103), a diaphragm assembly (104), a projection optical assembly (105), a detection optical assembly (107), a detection grating assembly (108), a data acquisition assembly (109) which are sequentially arranged, and a moving table (110) which is arranged on a light path between the projection optical assembly (105) and the detection optical assembly (107), wherein a sample (106) to be detected is placed on the moving table (110);
wherein the illumination assembly (102) illuminates the projection grating assembly (103) with measurement light produced by the light source assembly (101) to generate a multi-diffraction order signal; the diaphragm assembly (104) filters zero-order signals in the multi-diffraction-order signals and filters first diffraction-order signals, the first diffraction-order signals comprise + m diffraction-order signals and-m diffraction-order signals, and m is an integer greater than 0; the projection optical assembly (105) images an image of the projection grating assembly (103) under the first diffraction order signal to the surface of a sample (106) to be measured; the detection optical assembly (107) images an image of the projection grating assembly (103) carrying first height information of the sample (106) to be detected onto the detection grating assembly (108), and the first height information of the sample (106) to be detected is obtained through the data acquisition assembly (109);
the diaphragm assembly (104) is also used for screening out a second diffraction order signal according to the first height information, the second diffraction order signal comprises a + n diffraction order signal and a-n diffraction order signal, and n is greater than m; the projection optical assembly (105) is also used for imaging an image of the projection grating assembly (103) under the second diffraction order signal to the surface of a sample (106) to be measured; the detection optical assembly (107) images an image of the projection grating assembly (103) carrying second height information of the sample (106) to be detected onto the detection grating assembly (108), and the second height information of the sample (106) to be detected is obtained through the data acquisition assembly (109).
2. The apparatus according to claim 1, wherein the motion stage (110) is configured to move in a plane perpendicular to a height direction of the sample (106) to be measured, so that the data acquisition assembly (109) obtains topographical information of the sample (106) to be measured.
3. The sample topography measurement apparatus as claimed in claim 1, wherein a period of said detection grating assembly (108) is smaller than a period of said projection grating assembly (103).
4. The sample topography measurement apparatus as claimed in claim 1, wherein said detection grating assembly (108) separates an image of the projection grating assembly (103) carrying first or second height information of the sample (106) to be measured into a first and a second image, the distance between said first and second images being 1/4 of the period of said projection grating assembly (103).
5. The sample topography measurement apparatus as claimed in claim 1, wherein the center of said detection grating assembly (108) is offset with respect to the center of said projection grating assembly (103) by 1/8 of the period of said projection grating assembly (103).
6. The sample topography measurement apparatus as claimed in claim 1, characterized in that the projection optics (105) and the detection optics (107) are reflective or transmissive, the diaphragm assembly (104) being arranged on an aperture diaphragm surface of the projection optics (105), the sample topography measurement apparatus being a double telecentric measurement apparatus.
7. The sample topography measurement apparatus as claimed in claim 1, wherein said projection grating assembly (103) is an amplitude grating for enhancing the intensity of said first or second diffraction order signal.
8. The apparatus according to claim 1, wherein the projection grating assembly (103) is an array of a plurality of projection gratings to measure the first height information or the second height information at a plurality of positions of the sample (106) to be measured simultaneously.
9. The sample topography measurement apparatus as claimed in claim 1, wherein an angle θ of the measurement light impinging on the projection grating assembly (103) satisfies:
wherein d is a period of the projection grating assembly (103) and λ is a minimum wavelength of the measurement light impinging on the projection grating assembly (103).
10. A method for measuring the profile of a sample to be measured using the sample profile measuring apparatus according to any one of claims 1 to 10, the method comprising:
the data acquisition assembly (109) calculates first height information of a position of the sample to be detected (106) according to the acquired transmission intensities of the two images separated by the detection grating assembly (108), and the obtained first height information is as follows:
wherein h is1D is the period of the projection grating assembly (103), m is the diffraction order of the first diffraction order signal screened by the diaphragm assembly (104), α is the angle of the light ray entering the sample to be measured (106), I1And I2The transmission intensities of the two images separated by the detection grating component (108) when the diaphragm component (104) screens out the first diffraction order signal respectively;
the diaphragm assembly (104) screens a second diffraction order signal according to the first height information, the data acquisition assembly (109) calculates second height information of a position of the sample to be detected (106) according to the transmission intensities of two images separated by the acquired detection grating assembly (108), and the obtained second height information is as follows:
wherein h is2N is the diffraction order of the second diffraction order signal screened by the diaphragm assembly (104), n is more than m, I3And I4The transmission intensities of the two images separated by the detection grating component (108) when the diaphragm component (104) screens out the second diffraction order signals respectively;
and the moving platform (110) is moved in a plane vertical to the height direction of the sample (106) to be detected, and the data acquisition assembly (109) calculates second height information of any position of the sample (106) to be detected according to the acquired transmission intensities of the two images separated by the detection grating assembly (108) to obtain the appearance information of the sample (106) to be detected.
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| CN114674240A (en) * | 2022-03-25 | 2022-06-28 | 中国科学院微电子研究所 | Deformation measurement method and device, electronic equipment and storage medium |
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