CN111628114A - Display panel and preparation method thereof - Google Patents

Display panel and preparation method thereof Download PDF

Info

Publication number
CN111628114A
CN111628114A CN202010428411.6A CN202010428411A CN111628114A CN 111628114 A CN111628114 A CN 111628114A CN 202010428411 A CN202010428411 A CN 202010428411A CN 111628114 A CN111628114 A CN 111628114A
Authority
CN
China
Prior art keywords
electrode layer
layer
display panel
ink
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202010428411.6A
Other languages
Chinese (zh)
Inventor
毕研亮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
Original Assignee
Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
Priority to CN202010428411.6A priority Critical patent/CN111628114A/en
Publication of CN111628114A publication Critical patent/CN111628114A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/0011—Pre-treatment or treatment during printing of the recording material, e.g. heating, irradiating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/0041—Digital printing on surfaces other than ordinary paper
    • B41M5/0047—Digital printing on surfaces other than ordinary paper by ink-jet printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/81—Anodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

The disclosure provides a display panel and a preparation method thereof, when the display panel is prepared, the surface of a pixel electrode is irradiated, so that the affinity and hydrophobicity of the pixel electrode to ink are changed, and the hydrophobicity of the pixel electrode to the ink in different areas is different. After the ink is sprayed, the ink forms a film layer with uniform thickness and good performance in each area on the surface of the pixel electrode, and the display effect and the display quality of the display panel are higher.

Description

Display panel and preparation method thereof
Technical Field
The disclosure relates to the field of display technologies, and in particular, to a display panel and a manufacturing method of the display panel.
Background
Organic Light-Emitting devices (OLEDs) have the advantages of self-luminescence, fast response, lightness, thinness, etc. compared with liquid crystal display devices, and have become a new technology in the display field.
The structure of each film layer in the OLED display panel has important influence on the performance of the whole display device, especially the thickness and the appearance of an organic functional layer and the appearance of a thin film are very important for the OLED light-emitting characteristic, and in various products formed by the existing processing technology, the quality of the processing technology and the quality of the film forming quality directly influence the performance of the device. In products produced by the existing ink-jet printing technology, all film layers cannot be in good contact with each other, meanwhile, the film surface thickness uniformity of all the formed film layers is poor, the film layers are different in thickness in different areas of the same film layer, and the thickness of the film layer at the edge part is larger than that of the film layer in the middle area, so that when a panel displays, the light-emitting uniformity in different areas of a device screen is unsatisfactory, and the display effect is poor. And, the service life of the product is further affected.
In summary, in the display panel such as the OLED formed by the existing inkjet printing technology, the uniformity of the thickness of each film layer inside the panel is poor, and meanwhile, the contact condition between the film layers is not ideal, which affects the improvement of the display performance of the display panel.
Disclosure of Invention
The present disclosure provides a display panel and a method for manufacturing the display panel, so as to solve the problems of poor uniformity of the thickness of each film layer, poor contact condition between the film layers, and poor display quality of the panel in the existing panel manufacturing method.
To solve the above technical problem, the technical solution provided by the embodiment of the present disclosure is as follows:
according to a first aspect of the embodiments of the present disclosure, there is provided a method for manufacturing a display panel, including the steps of:
s100: providing a thin film transistor array substrate;
s101: forming an electrode layer on the thin film transistor array substrate;
s102: forming a pixel defining layer on the thin film transistor array substrate and the electrode layer, and etching a pixel opening on the pixel defining layer corresponding to the electrode layer;
s103: performing illumination treatment on the electrode layer;
s104: and spraying ink into each pixel opening through ink-jet printing to form an organic layer.
According to an embodiment of the present disclosure, in the step S103, the illumination intensities in different regions of the electrode layer are different, and the illumination intensities gradually increase from the center of the pixel opening to the edge of the pixel opening.
According to an embodiment of the present disclosure, the electrode layer includes a plurality of adjacent regions, each of the adjacent regions is annularly disposed around a center of the electrode layer, and the illumination intensities in the same region are the same.
According to an embodiment of the present disclosure, the illumination intensity in different regions is controlled by a mask processing process.
According to an embodiment of the present disclosure, the step S103 includes a halftone mask processing process.
According to an embodiment of the present disclosure, in the step S104, gel particles are included in the ink, and the gel particles are distributed at edges of the organic layer.
According to a second aspect of the embodiments of the present disclosure, there is also provided a display panel including:
a thin film transistor array substrate;
an electrode layer disposed on the thin film transistor array substrate;
a pixel defining layer disposed on the thin film transistor array substrate, the pixel defining layer forming a pixel opening on the electrode layer;
the organic layer is arranged in the pixel opening and covers the electrode layer, and the film thicknesses of the corresponding organic layers in the pixel opening area are the same; and
and a protective layer disposed on an edge of the organic layer corresponding to the pixel opening region.
According to an embodiment of the present disclosure, the hydrophobicity is different in different areas on the electrode layer.
According to an embodiment of the present disclosure, a material of the electrode layer includes indium tin oxide.
According to an embodiment of the present disclosure, the material of the protective layer includes a hydrophobic material.
In summary, the beneficial effects of the embodiment of the present disclosure are:
when the display panel is prepared, the surface of a pixel electrode is irradiated through mask plates with different structures, the affinity and the hydrophobicity of the pixel electrode to ink are changed, and the hydrophobicity of the pixel electrode to the ink in different areas is different. After the ink is sprayed, the ink forms a film layer with good thickness uniformity in each area on the surface of the pixel electrode, after the ink is dried to form a film, the coffee ring effect cannot occur, and the display effect and the display quality of the panel are good.
Drawings
In order to illustrate the embodiments or the technical solutions in the prior art more clearly, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some of the disclosed embodiments, and that other drawings can be obtained by those skilled in the art without inventive effort.
FIG. 1 is a schematic structural diagram of a conventional display panel;
fig. 2 is a schematic structural diagram of a display panel according to an embodiment of the disclosure;
FIG. 3 is a top view of an electrode layer in an embodiment of the present disclosure;
FIG. 4 is a flow chart of a process for manufacturing a display panel according to an embodiment of the present disclosure;
FIG. 5 is a schematic view of light irradiation according to an embodiment of the present disclosure;
FIG. 6 is a schematic diagram of a halftone mask process according to an embodiment of the disclosure.
Detailed Description
The technical solutions in the embodiments of the present disclosure will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present disclosure. It is to be understood that the described embodiments are merely illustrative of some, but not all embodiments of the disclosure. All other embodiments, which can be derived by a person skilled in the art from the embodiments disclosed herein without making any inventive step, are intended to be within the scope of the present disclosure.
As shown in fig. 1, fig. 1 is a schematic structural diagram of a conventional display panel. The conventional display panel includes a substrate 100, a thin film transistor array substrate 101, an anode layer 102, and a pixel definition layer 103. The thin film transistor array substrate 101 is disposed on the substrate 100, the plurality of anode layers 102 are disposed on the thin film transistor array substrate 101 and arranged in an array, and the pixel defining layer 103 is disposed on the thin film transistor array substrate 101 and between the anode layers 102. The light-emitting layer 104 is usually formed by an inkjet printing process, and in the process of preparing the light-emitting layer 104, it is necessary to fabricate the pixel defining layer 103 on the substrate 100 to define the region where each sub-pixel is located, and to drop the ink accurately into the designated sub-pixel region, and finally dry the ink to form a film, so as to obtain the light-emitting layer 104. However, when the ink is dried to form a film, the ink near the edge of the pixel defining layer 103 may climb a certain distance upward along the edge of the pixel defining layer 103 due to the coffee ring effect of the liquid, and after the ink is finally dried, the thickness of the film layer in the middle region of the light emitting layer 104 is thinner, and the thickness of the film layer in the edge region 105 is thicker. Because the thickness of the film layer in different areas of the light-emitting layer 104 is different, the uniformity of the film layer is poor, and the display quality of the picture is poor when the panel displays light.
Fig. 2 shows a display panel according to an embodiment of the disclosure, and fig. 2 is a schematic structural diagram of a display panel according to an embodiment of the disclosure. The display panel includes a substrate 200, a thin film transistor array substrate 201, an electrode layer 202, and a pixel defining layer 203. A thin film transistor array substrate 201 is disposed on the substrate 200, an electrode layer 202 is disposed on the thin film transistor array substrate 201, a pixel defining layer 203 is disposed on the thin film transistor array substrate, and the pixel defining layer 203 includes a pixel opening 205, the electrode layer 202 being disposed in the pixel opening 205.
In the embodiment of the present disclosure, the hydrophobicity in different regions of the electrode layer 202 corresponding to the pixel opening 205 region is different. As shown in fig. 3, fig. 3 is a top view of an electrode layer in an embodiment of the disclosure. Meanwhile, in conjunction with the schematic structural diagram of the display panel in fig. 2, the electrode layer 200 includes a central region 300, a first region 301, a second region 302, and a third region 303. The regions are adjacent to each other and the first region 301, the second region 302 and the third region 303 are all arranged around the central region 300, the outermost third region 303 being in contact with the pixel defining layer 203. The hydrophobicity of the electrode layers in the first region 301, the second region 302, and the third region 303 is different from each other.
Specifically, the hydrophobicity of the electrode layer 200 gradually decreases from the center of the electrode layer 200 to the edge thereof. Namely hydrophobicity: central region 300> first region 301> second region 302> third region 303. The hydrophobicity in the same region as the center distance of the electrode layer 200 may be the same, and the size of each formed region is determined according to the actual situation, so as to finally ensure that the thickness of the film layer formed on the electrode layer 200 is uniform after the ink is dried.
The electrode layer 200 may be a transparent conductive film, such as an indium tin oxide film, or other translucent conductive material. And the electrode layer 200 includes a plurality of electrodes arranged in an array, which may be anode layers
Further, the display panel further includes an organic layer 204. The organic layer 204 is disposed on the electrode layer 202 corresponding to the pixel opening 205 and covers the electrode layer 202. The organic layer 204 is prepared by ink jet printing. In the embodiment of the present disclosure, the thickness of the organic layer 204 is the same in different regions within the pixel opening 205. For example, the thickness of the film layer in the center region of the pixel opening 205 is consistent with the thickness of the film layer in the edge region 206, and the uniformity of the film layer in different regions is good.
The organic layer 204 may be a light emitting layer including at least a red light emitting layer, a green light emitting layer, and a blue light emitting layer, and may further include a white light emitting layer according to a specific arrangement of pixels. Meanwhile, the organic layer 204 may further include at least one of a hole injection layer, a hole transport layer, and a light emitting layer to implement a normal light emitting function of the pixel film layer.
Meanwhile, in the edge region 206 corresponding to the pixel opening 205 region, the display panel further includes a protective layer, and the material of the protective layer includes a hydrophobic material. When the ink in the pixel opening 205 is dried, the gelled particles may be added in the edge region 206 of the ink first, and during the drying process, the added gelled particles form a protective layer in the embodiment of the disclosure, which can ensure the drying uniformity of the ink in different regions during drying and prevent the ink at the edge from climbing onto the pixel defining layer 203 to form a coffee ring effect. The height difference between the edge region 206 of the organic layer 204 and the middle of the organic layer 204 is reduced, so that the thickness of the film layer of the organic layer 204 is uniform everywhere, and the display effect of the display panel is improved.
Fig. 4 shows a method for manufacturing a display panel, where fig. 4 is a flowchart of a manufacturing process of the display panel according to the embodiment of the present disclosure. The preparation process comprises the following steps:
s100: providing a thin film transistor array substrate;
s101: forming an electrode layer on the thin film transistor array substrate;
s102: forming a pixel defining layer on the thin film transistor array substrate and the electrode layer, and etching a pixel opening on the pixel defining layer corresponding to the electrode layer;
s103: performing illumination treatment on the electrode layer;
in steps S100, S101 and S102, the process flow of the above-mentioned preparation process of each film layer is the same as the preparation process of the film layer corresponding to the conventional display panel. The preparation process comprises a photoetching process or an etching step corresponding to the photoetching process, and other processes for forming a preset pattern, such as printing, ink jetting and the like. When the preparation of the electrode layer is completed, the electrode layer needs to be further processed. In the disclosed embodiments, the electrode layer is illuminated by different intensities of light.
Specifically, as shown in fig. 5, fig. 5 is a schematic view of light irradiation in the embodiment of the present disclosure. When the electrode layer 501 on the thin film transistor substrate 500 is subjected to light irradiation, light having different high intensities is irradiated to different regions. As shown, in the present embodiment, four different intensities of illuminating light are provided, and the illuminating light includes light 51, light 52, light 53 and light 54. Wherein, the light energy intensity size of above-mentioned light arranges to be in proper order: ray 51> ray 52> ray 53> ray 54. That is, the light near the two side boundaries of the pixel defining layer 502 has higher energy, and the light far from the two side boundaries of the pixel defining layer 502 has lower energy. Due to different light intensities of the light, after the electrode layer 501 is irradiated, the surface of the electrode layer 501 is changed differently.
Meanwhile, when the electrode layer 501 is irradiated, a plan view of the electrode layer in fig. 3 is shown. The irradiation light is irradiated in a ring shape along the center of the electrode layer 501, and thus a plurality of adjacent irradiation regions in fig. 3 are formed. The light intensity in two adjacent areas is different, and the light intensity in the same area can be the same.
After the light with different intensities is irradiated, the hydrophobicity of the surface of the electrode layer 501 is changed. Specifically, after irradiation, the hydrophobicity of the surface of the electrode layer 501 gradually increases from the outside to the inside. That is, the hydrophobicity of the surface of the electrode layer 501 corresponding to the light ray 51 is the smallest, the hydrophobicity of the surface of the electrode layer 501 corresponding to the light ray 52 is the next to the hydrophobicity, and the hydrophobicity of the surface of the electrode layer 501 corresponding to the light ray 54 is the largest. That is, the hydrophobicity of the central region of the electrode layer 501 is the greatest, and after ink is dropped on the surface of the electrode layer 501, the ink is more easily gathered to the region with the large hydrophobicity, so that the edge thickness of the organic layer formed on the electrode layer 501 is not too thick.
According to the ink film forming rule, light rays with different intensities are provided in different areas and are irradiated, so that the surface hydrophobicity of the electrode layer 501 is changed.
In the embodiment of the present disclosure, the light intensity of the light is preferably: the light intensity of ray 51 is 180mj/cm2The light intensity of ray 52 is 150mj/cm2The light intensity of the light ray 53 is 120mj/cm2The light intensity of the light ray 54 is 90mj/cm2. The electrode layer 501 may be divided into different number of annular regions according to actual products, and different intensities of light may be irradiated in different annular regions, so as to change the hydrophobicity of the surface of the electrode layer 501, and finally obtain the purpose of uniformity of the thickness of the organic film formed thereon.
Preferably, the electrode layer 501 may be further processed by a halftone mask process, as shown in fig. 6, where fig. 6 is a schematic view of the halftone mask process in the embodiment of the disclosure. Divide into different regions with electrode layer 501 and mask plate 600 that pixel opening 601 regional correspondence, in this disclosure embodiment, divide into 4 adjacent different regions with mask plate 600: region 1, region 2, region 3, region 4. The electrode layer 501 facing the mask 600 is also divided into similar regions. The region 1 is close to the pixel defining layer 502 and the region 4 is close to the central region of the electrode layer 501. Further, color resists having different light transmittances are provided in the region 1, the region 2, the region 3, and the region 4 of the mask 600. The optical transmittance of the region 1 is the largest, the optical transmittance of the region 2 is the second, and the optical transmittance of the region 4 is the smallest. When light passes through the color resistors with different transmittances, a part of the light is absorbed, and thus, the intensity of light reaching different regions of the surface of the electrode layer 501 changes. That is, when the electrode layer 501 is irradiated, after the light with the same intensity penetrates through the mask plate 600, the intensity of the light reaching the corresponding region of the electrode layer 501 is different, so that the purpose of changing the surface hydrophobicity of the electrode layer 501 is achieved. And finally ensures the effect of film formation on the electrode layer 501. Through the halftone mask plate process, the light can be more finely regulated and controlled according to actual products, and the film forming uniformity of the light is ensured to the greatest extent.
In dividing the surface of the electrode layer 501 into regions, the dividing manner in the embodiment of the present disclosure is merely an example. The membrane forming device can be divided into different numbers of illumination areas and illumination areas according to the membrane forming characteristics of actual products, and can also regulate and control the illumination time in different areas so as to further change the hydrophobicity of the surface of the electrode layer and ensure the final membrane forming effect. The illuminating light is preferably ultraviolet light in the disclosed embodiments.
S104: and spraying ink into each pixel opening through ink-jet printing to form an organic layer.
After the electrode layer is treated, the affinity and the hydrophobicity to ink in different areas of the surface of the electrode layer are different, and when the ink is printed by ink jet, the hydrophobicity is the largest in the central area of the electrode layer due to the different adsorbability to the ink in different areas of the surface of the electrode layer; in the edge region of the electrode layer, the hydrophobicity is the smallest, so that more ink is collected in the central region and relatively less ink is collected in the edge region.
In ink jet printing, in order to further improve the film forming property of the edge region, a hydrophobic material such as gel particles or a hydrophobic material such as polyimide is further added to the ink. In the drying process, gel particles are dispersed and distributed in the edge area of the electrode layer to finally form a protective layer, and the protective layer can prevent ink from climbing along the pixel definition layer, prevent a coffee ring effect from occurring in the liquid drying process and improve the drying uniformity of the film layer in the drying process. The ink is finally dried to completion and an organic layer is formed. The organic layer is mainly a light emitting layer or other organic functional layers, such as one or more of an electron injection layer, a hole injection layer, an electron transport layer and a hole transport layer, each film layer can be used for forming an organic light emitting diode device, and the film layers have better display brightness uniformity and higher display quality.
Finally, the display panel in the embodiment of the present disclosure is obtained, and the display panel may be a full-screen display device, or may be a flexible display device.
The display panel and the method for manufacturing the display panel provided by the embodiment of the disclosure are described in detail above, and the description of the embodiment is only used to help understanding the technical solution and the core idea of the disclosure; those of ordinary skill in the art will understand that: it is to be understood that modifications may be made to the arrangements described in the embodiments above, and such modifications or alterations may be made without departing from the spirit of the respective arrangements of the embodiments of the present disclosure.

Claims (10)

1. A preparation method of a display panel is characterized by comprising the following steps:
s100: providing a thin film transistor array substrate;
s101: forming an electrode layer on the thin film transistor array substrate;
s102: forming a pixel defining layer on the thin film transistor array substrate and the electrode layer, and etching a pixel opening on the pixel defining layer corresponding to the electrode layer;
s103: performing illumination treatment on the electrode layer;
s104: and spraying ink into each pixel opening through ink-jet printing to form an organic layer.
2. The method for manufacturing a display panel according to claim 1, wherein in step S103, the illumination intensity in different regions of the electrode layer is different, and the illumination intensity gradually increases from the center of the pixel opening to the edge of the pixel opening.
3. The method according to claim 2, wherein the electrode layer comprises a plurality of adjacent regions, each adjacent region is annularly arranged around a center of the electrode layer, and the illumination intensity in the same region is the same.
4. The method of claim 2, wherein the illumination intensity in different regions is controlled by a mask process.
5. The manufacturing method of a display panel according to claim 4, wherein the mask processing process includes a halftone mask processing process.
6. The method of claim 1, wherein in step S104, the ink contains gel particles, and the gel particles are distributed at the edge of the organic layer.
7. A display panel, comprising:
a thin film transistor array substrate;
an electrode layer disposed on the thin film transistor array substrate;
a pixel defining layer disposed on the thin film transistor array substrate, the pixel defining layer forming a pixel opening on the electrode layer;
the organic layer is arranged in the pixel opening and covers the electrode layer, and the film thicknesses of the corresponding organic layers in the pixel opening area are the same; and
and a protective layer disposed on an edge of the organic layer corresponding to the pixel opening region.
8. The display panel of claim 7, wherein the hydrophobicity is different in different regions on the electrode layer.
9. The display panel according to claim 7, wherein a material of the electrode layer comprises indium tin oxide.
10. The display panel according to claim 7, wherein a material of the protective layer comprises a hydrophobic material.
CN202010428411.6A 2020-05-20 2020-05-20 Display panel and preparation method thereof Pending CN111628114A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010428411.6A CN111628114A (en) 2020-05-20 2020-05-20 Display panel and preparation method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010428411.6A CN111628114A (en) 2020-05-20 2020-05-20 Display panel and preparation method thereof

Publications (1)

Publication Number Publication Date
CN111628114A true CN111628114A (en) 2020-09-04

Family

ID=72261257

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010428411.6A Pending CN111628114A (en) 2020-05-20 2020-05-20 Display panel and preparation method thereof

Country Status (1)

Country Link
CN (1) CN111628114A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11800752B2 (en) * 2019-03-25 2023-10-24 Boe Technology Group Co., Ltd. Pixel structure with ring shaped emitting region

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101393889A (en) * 2007-09-18 2009-03-25 卡西欧计算机株式会社 Manufacturing method of display apparatus
CN104218190A (en) * 2014-08-26 2014-12-17 京东方科技集团股份有限公司 Organic electroluminescence light-emitting device and manufacturing method thereof and display device
US20170279049A1 (en) * 2016-03-23 2017-09-28 Boe Technology Group Co., Ltd. Ink-jet printing method and manufacturing method of oled display device
CN108428719A (en) * 2018-03-16 2018-08-21 京东方科技集团股份有限公司 Production method, display base plate and production method, the display device of pixel defining layer
CN110165055A (en) * 2018-09-20 2019-08-23 合肥鑫晟光电科技有限公司 Production method and organic thin film patterns, the array substrate and display device of organic thin film patterns
CN110299465A (en) * 2019-07-18 2019-10-01 深圳市华星光电半导体显示技术有限公司 Display panel and display panel preparation method
CN110534552A (en) * 2019-09-09 2019-12-03 合肥京东方卓印科技有限公司 A kind of display base plate and preparation method thereof, display panel and mask plate
CN110581232A (en) * 2019-09-25 2019-12-17 合肥京东方卓印科技有限公司 Preparation method of OLED (organic light emitting diode) light emitting device, OLED light emitting device and OLED display device

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101393889A (en) * 2007-09-18 2009-03-25 卡西欧计算机株式会社 Manufacturing method of display apparatus
CN104218190A (en) * 2014-08-26 2014-12-17 京东方科技集团股份有限公司 Organic electroluminescence light-emitting device and manufacturing method thereof and display device
US20170279049A1 (en) * 2016-03-23 2017-09-28 Boe Technology Group Co., Ltd. Ink-jet printing method and manufacturing method of oled display device
CN108428719A (en) * 2018-03-16 2018-08-21 京东方科技集团股份有限公司 Production method, display base plate and production method, the display device of pixel defining layer
CN110165055A (en) * 2018-09-20 2019-08-23 合肥鑫晟光电科技有限公司 Production method and organic thin film patterns, the array substrate and display device of organic thin film patterns
CN110299465A (en) * 2019-07-18 2019-10-01 深圳市华星光电半导体显示技术有限公司 Display panel and display panel preparation method
CN110534552A (en) * 2019-09-09 2019-12-03 合肥京东方卓印科技有限公司 A kind of display base plate and preparation method thereof, display panel and mask plate
CN110581232A (en) * 2019-09-25 2019-12-17 合肥京东方卓印科技有限公司 Preparation method of OLED (organic light emitting diode) light emitting device, OLED light emitting device and OLED display device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11800752B2 (en) * 2019-03-25 2023-10-24 Boe Technology Group Co., Ltd. Pixel structure with ring shaped emitting region

Similar Documents

Publication Publication Date Title
CN107393939B (en) Pixel defining layer and manufacturing method thereof, display panel and manufacturing method thereof, and display device
WO2016145965A1 (en) Pixel bank and manufacturing method thereof, and corresponding light-emitting display
CN108054184B (en) Array substrate, preparation method and display device
WO2019196587A1 (en) Organic electroluminescent display panel, manufacturing method thereof, and display device
US20200303687A1 (en) Manufacturing method of oled display panel
CN103928497A (en) OLED displayer, manufacturing method of OLED displayer and display device
CN109920825B (en) Pixel defining structure, manufacturing method thereof, display panel and display device
US10505138B2 (en) Organic light-emitting diode structure
US20220320183A1 (en) Oled display substrate, method of manufacturing the same and oled display apparatus
CN105448957A (en) Organic electroluminescence display substrate and manufacturing method thereof and display device
CN111640772B (en) Display panel, manufacturing method thereof and display device
CN111081745A (en) Display panel and preparation method thereof
CN111785760B (en) Display substrate, preparation method thereof and display device
CN113471259B (en) Display panel and display device
JP6075021B2 (en) Color filter and flat color display device
KR20210137421A (en) OLED display panel and display device
US11711946B2 (en) Substrate having a printing area, light emitting device, and method for manufacturing the substrate
US10957879B2 (en) OLED substrate, manufacturing method thereof, display device
CN111628114A (en) Display panel and preparation method thereof
WO2021164105A1 (en) Display panel and manufacturing method therefor
CN101960369B (en) Display panel, array substrate, color filter substrate and display panel manufacturing method
CN106773417A (en) Display device
US11489017B2 (en) Display panel, method for preparing display panel, and display device
US11456342B2 (en) Organic light emitting diode back plate and method of manufacturing same
CN111668283A (en) Display panel and manufacturing method thereof

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20200904

RJ01 Rejection of invention patent application after publication