CN111623714A - Method for determining film thickness - Google Patents

Method for determining film thickness Download PDF

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Publication number
CN111623714A
CN111623714A CN201910147257.2A CN201910147257A CN111623714A CN 111623714 A CN111623714 A CN 111623714A CN 201910147257 A CN201910147257 A CN 201910147257A CN 111623714 A CN111623714 A CN 111623714A
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thickness
film
coating layer
piece
coating
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CN201910147257.2A
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朱伟
张继凯
程晓龙
赵阳
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Hanwa Technology Co ltd
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Hanergy Mobile Energy Holdings Group Co Ltd
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating

Abstract

The invention relates to the technical field of optical coating, in particular to a method for determining the thickness of a film layer, which comprises the steps of providing at least one plane standard part; the planar standard part comprises at least one coating layer, and each coating layer and the coating layer corresponding to the part to be tested are formed by adopting the same coating process; and determining the thickness of each coating layer of the test piece according to the parameters of the plane standard piece, wherein the parameters comprise one of the coating layer thickness and optical parameters. The planar standard part is used as the determination reference of the thickness of each coating layer of the piece to be tested, the planar standard part and the coating layer corresponding to the piece to be tested adopt the same coating process, and the coating layer thickness or optical parameters of the planar standard part can be determined, so that the thickness of each coating layer of the piece to be tested can be determined through the coating layer thickness or optical parameters of the planar standard part. The film thickness of the piece to be tested is reversely deduced by using the film thickness of the planar standard piece, so that the aims of quality control and quality management are fulfilled.

Description

Method for determining film thickness
Technical Field
The invention relates to the technical field of optical coating, in particular to a method for determining the thickness of a film layer.
Background
With the increasing exhaustion of energy sources such as coal, petroleum, natural gas and the like and the increasing aggravation of environmental pollution, people are urgently required to find clean renewable new energy sources. The application of solar energy, which is an unlimited and renewable pollution-free energy source of the earth, has attracted people's attention increasingly, and the development of solar cells for converting solar energy into electric energy has been rapidly developed. For example, a CIGS thin film solar cell (i.e., a CIGS thin film solar cell) based on a sputtering method is increasingly used in mobile energy products, such as consumer electronics products and building material products, due to its characteristics of light weight, flexibility, thinness, weak photovoltaic property, and the like.
Under the premise, the solar power generation tile with the building decoration and power generation functions is produced at the same time. The vast width of our country, the tiles on the sloping roof tend to have different colors due to the historical tradition or the customs and other reasons in various regions, and the solar power generation tiles are required to have different colors for customers to select.
The film coating film layer of the color solar power generation tile is often composed of film layers with different numbers, and the target material and the film layer thickness of each layer are different. For example, a brick red coating film layer needs to be 6 to 12, a gold coating film layer needs to be 6, a blue coating film layer needs to be 12, and the like.
After the coating is finished, the thickness of the coating film layer needs to be determined so as to ensure the repeatability of process parameters in the subsequent coating process. In the prior art, the thickness of a coating film is generally determined by adopting magnetic induction separation, an eddy current principle and the like; specifically, the overall thickness of all the coating film layers is determined as a whole. However, as described above, due to the requirement of different colors, the number of layers of the coating film, the thickness of the coating film, and the material of each target are different, and even if the overall thickness of the coating film is the same, there is a combination of different thicknesses between the coating films. Therefore, the conventional method for determining the thickness of the film layer cannot determine the thickness of the single-layer film layer.
Disclosure of Invention
In view of this, embodiments of the present invention provide a method for determining a film thickness, so as to solve a problem that the existing method for determining a film thickness cannot determine a thickness of a single film.
According to a first aspect, an embodiment of the present invention provides a method for determining a film thickness, including:
providing at least one planar standard; the planar standard part comprises at least one coating layer, and the coating layers corresponding to the parts to be tested are formed by adopting the same coating process;
and determining the thickness of each coating layer of the test piece according to the parameters of the plane standard piece, wherein the parameters comprise one of the coating layer thickness and optical parameters.
According to the method for determining the thickness of the film layer, the planar standard component is used as the determination standard of the thickness of each film coating layer of the to-be-tested component, and the film coating layers corresponding to the planar standard component and the to-be-tested component adopt the same film coating process, and the thickness or the optical parameters of the film coating layers of the planar standard component can be determined, so that the thickness of each film coating layer of the to-be-tested component can be determined through the thickness or the optical parameters of the film coating layers of the planar standard component. The film thickness of the piece to be tested is reversely deduced by using the film thickness of the planar standard piece, so that the aims of quality control and quality management are fulfilled.
With reference to the first aspect, in a first embodiment of the first aspect, the determining the thickness of each coated layer of the test piece according to the thickness of the coated layer of the planar standard piece includes:
sequentially measuring the thickness of the coating layer of each planar standard component;
and determining the thickness of each coating layer of the piece to be tested by using the difference value between the thicknesses of the coating layers of the plane standard pieces.
According to the method for determining the thickness of the film layer, provided by the embodiment of the invention, each film coating layer of the planar standard component and the film coating layer corresponding to the component to be tested are formed by adopting the same film coating process, so that the thickness of each film coating layer of the planar standard component is the same as that of the film coating layer corresponding to the component to be tested, the thickness of each film coating layer can be directly obtained by utilizing the difference value between the thicknesses of the film coating layers of the planar standard components, and the obtained thickness of each film coating layer is the thickness of each film coating layer of the component to be tested, so that the determined thickness of each film coating layer of the component to be tested has higher reliability.
With reference to the first aspect, in a first embodiment of the first aspect, the determining a thickness of each coating layer of the test piece according to the optical parameter of the planar standard piece includes:
measuring an optical parameter of the planar standard;
forming a first optical characteristic curve by using the optical parameters of the planar standard;
setting film parameters of the piece to be tested to construct a simulation film system; wherein the film layer parameters comprise the thickness of each film coating layer;
analyzing the simulated film system to obtain a second optical characteristic curve;
adjusting the thickness of the film coating layer of the piece to be tested based on the first optical characteristic curve to correct the second optical characteristic curve so that the second optical characteristic curve is consistent with the first optical characteristic curve; and the thickness of each coating layer corresponding to the matched second optical characteristic curve is the thickness of each coating layer of the test piece.
According to the method for determining the film thickness, provided by the embodiment of the invention, the first optical characteristic curve of the measured plane standard part is used as a reference curve for adjusting the film thickness, the constructed simulated film system is analyzed to obtain a second optical characteristic curve, the second optical characteristic curve is compared with the reference curve, and the thickness of each film coating layer is adjusted, so that the thickness of each film coating layer on the part to be tested can be obtained.
With reference to the second embodiment of the first aspect, in a third embodiment of the first aspect, the optical parameter includes light transmittance.
With reference to the second embodiment of the first aspect, in a fourth embodiment of the first aspect, the determining the optical parameter of the planar standard comprises: the light transmittance of the flat standard was measured using a spectrometer.
According to the method for determining the film thickness, provided by the embodiment of the invention, the spectrometer is adopted to measure the light transmittance of the coated planar standard component, so that the method has higher test precision.
With reference to the third embodiment of the first aspect, in the fifth embodiment of the first aspect, the light transmittance is a light transmittance in a spectral range of 300nm to 1250 nm.
According to the method for determining the film thickness, provided by the embodiment of the invention, the spectral range of 300nm-1250nm contains the spectral range of all visible light, so that the measured light transmittance has higher reliability.
With reference to the first aspect or any one of the first to fifth embodiments of the first aspect, in a sixth embodiment of the first aspect, the planar standard piece and the piece to be tested are coated by an electron beam evaporation coating process.
According to the method for determining the thickness of the film layer, provided by the embodiment of the invention, the defects that the film layer is cracked due to extrusion or stretching of the material curvature of the piece to be tested and the film layer is melted due to high temperature when the piece to be tested is bent and formed in a mould can be avoided through an electron beam evaporation coating process, and the attractiveness of the film layer when the film layer is applied to a solar power generation tile is influenced.
With reference to the sixth implementation manner of the first aspect, in the seventh implementation manner of the first aspect, the method further includes coating the planar standard piece and the to-be-tested piece by combining an ion-assisted coating process.
With reference to the first aspect, in an eighth embodiment of the first aspect, the test object is a planar test object or a curved test object.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.
FIG. 1 is a flow chart of a method of determining a thickness of a film layer according to an embodiment of the invention;
FIG. 2 is a flow chart of a method of determining a thickness of a film layer according to an embodiment of the invention;
fig. 3 is a flowchart of a method for determining a thickness of a film layer according to an embodiment of the invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
An embodiment of the present invention provides a method for determining a film layer thickness, as shown in fig. 1, the method includes:
and S11, providing at least one plane standard component.
The planar standard part comprises at least one coating layer, and each coating layer and the coating layer corresponding to the part to be tested are formed by adopting the same coating process.
Specifically, the test piece to be tested may include a plurality of coating layers, and the thicknesses of the coating layers may not be all the same, so that if a coating product identical to the test piece to be tested is prepared, the thickness of each coating layer needs to be measured, and the prepared coating product can be identical.
The coating layers of the planar standard part and the coating layers corresponding to the parts to be tested are formed by the same coating process, wherein the planar standard part can be formed by coating with the parts to be tested at the same time, or can be formed by coating to obtain the planar standard part when the thickness of the coating needs to be measured, and the like. In this embodiment, the coating time of the planar standard component is not limited, and it is only required to ensure that the planar standard component formed by the same coating process is provided for the coating layer corresponding to the component to be tested when the thickness of the film layer needs to be measured.
For the number of planar standards provided, there may be 1, 2, 3, etc.; for the coating layers of the provided planar standard parts, each planar standard part can only comprise one coating layer, or can comprise the same coating layer as that of the part to be tested. For example, if the part to be tested comprises 3 layers of coatings, then only one planar standard may be provided, the planar standard comprising 3 layers of coatings, or 2 planar standards may be provided, the first planar standard comprising only the first layer of coatings, the second planar standard comprising 3 layers of coatings, and so on. When the planar standard component comprises the first layer of coating film layer, the planar standard component only comprising the first layer of coating film layer can be obtained while the first layer of coating film layer of the piece to be tested is formed, and the planar standard component formed with the first layer of coating film layer is taken out before the second layer of coating film layer of the piece to be tested is formed, so that the planar standard component only comprising the first layer of coating film layer can be obtained.
It should be noted that the test piece to be tested may be a planar test piece to be tested, or may be a curved test piece to be tested, which is not limited herein; in addition, the flat standard piece and the piece to be tested are made of the same material.
And S12, determining the thickness of each coating layer of the test piece according to the parameters of the plane standard piece.
Wherein the parameter comprises one of a coating layer thickness and an optical parameter.
For determining the thickness of each coating layer of the to-be-tested piece according to the coating layer thickness of the planar standard piece, because each coating layer of the planar standard piece and the coating layer corresponding to the to-be-tested piece are formed by adopting the same coating process, the thickness of each coating layer of the planar standard piece is the same as that of the coating layer corresponding to the to-be-tested piece, and therefore, the thickness of each coating layer of the to-be-tested piece can be obtained by utilizing the coating layer thickness of the planar standard piece. The specific determination method will be described in detail hereinafter.
For determining the thickness of each coating layer of the test piece according to the optical parameters of the planar standard piece, different optical parameters such as light transmittance, reflectivity and the like are shown due to the superposition of the film layers with different film numbers and the film layers with different thicknesses; meanwhile, the optical parameters of the plane standard part can be conveniently measured, so that the thickness of each coating layer of the test piece to be tested can be determined by using the optical parameters of the plane standard part on the basis that each coating layer of the plane standard part and the coating layer corresponding to the test piece to be tested are formed by adopting the same coating process. The specific determination method will be described in detail hereinafter.
In the method for determining the thickness of the film layer provided by this embodiment, the planar standard component is used as a determination reference for the thickness of each film coating layer of the to-be-tested component, and since the planar standard component and the film coating layer corresponding to the to-be-tested component adopt the same film coating process and the film coating layer thickness or the optical parameter of the planar standard component can be determined, the thickness of each film coating layer of the to-be-tested component can be determined according to the film coating layer thickness or the optical parameter of the planar standard component. The film thickness of the piece to be tested is reversely deduced by using the film thickness of the planar standard piece, so that the aims of quality control and quality management are fulfilled.
The present embodiment also provides a method for determining a film thickness, specifically as shown in fig. 2, the method includes:
and S21, providing at least one plane standard component.
The planar standard part comprises at least one coating layer, and each coating layer and the coating layer corresponding to the part to be tested are formed by adopting the same coating process. The plane standard part and the part to be tested can form coating layers by adopting an electron beam evaporation coating process. Optionally, an ion-assisted coating process may be combined with the electron beam evaporation coating.
The defects that the film layer is cracked due to extrusion or stretching of the material curvature of the piece to be tested and the film layer is melted due to high temperature when the piece to be tested is bent and formed in a die can be avoided through the electron beam evaporation coating process, and the attractiveness of the film layer when the film layer is applied to the solar power generation tile is influenced.
The number of the provided plane standard parts can be the same as that of the film coating layers included by the parts to be tested, and each plane standard part sequentially comprises a first layer of film coating layer, a second layer of film coating layer, a first layer of film coating layer, a third layer of film coating layer, … … and the like.
For example, when the test piece to be tested includes 5 coating layers, the number of the provided planar standard pieces is 5, the first planar standard piece includes only the first coating layer, the second planar standard piece includes only the first and second coating layers, the third planar standard piece includes only the first to third coating layers, the fourth planar standard piece includes only the first to fourth coating layers, and the fifth planar standard piece includes only the first to fifth coating layers.
And S22, determining the thickness of each coating layer of the test piece according to the parameters of the plane standard piece.
Wherein the parameter comprises one of the thickness of the coating layer and an optical parameter. In the embodiment, the thickness of each coating layer of the planar standard part is used for determining the thickness of the coating layer of the to-be-tested part, so that the thickness of each coating layer of the to-be-tested part is determined according to the thickness of the coating layer of the planar standard part.
Specifically, the steps include:
and S221, sequentially measuring the thicknesses of the coating layers of the plane standard parts.
For example, the thickness of the coating layer of each flat standard can be measured by a quartz crystal oscillation monitoring method or an optical film thickness monitoring method. Referring to the example described in S21, where the test pieces include 5 coating layers, and 5 planar standard pieces are provided, the coating layer thickness of each planar standard piece is measured in turn as shown in the following table:
Figure BDA0001980414930000071
s222, determining the thickness of each coating layer of the test piece to be tested by using the difference value between the thicknesses of the coating layers of the plane standard pieces.
Combining the above table again, if the first planar standard component only includes the first layer of coating layer, and the corresponding film thickness is D1, the thickness of the first layer of coating layer is D1; the thickness of the coating layer of the second plane standard component is the sum of the thicknesses of the first layer and the second layer, and then the thickness of the second layer of coating layer can be obtained by using D2-D1; … …, respectively; and the same can be done in sequence to obtain the thickness of the first to fifth coating layers.
As an alternative to this embodiment, the above steps S21-S22 may be repeated to ensure the accuracy of the determined film thickness.
As another alternative to this embodiment, a planar standard member with more film layers stacked may be provided. For example, please refer to the above table, since the 3 rd and 4 th planar standard members include a larger number of coating layers, several 3 rd planar standard members and 4 th planar standard members can be additionally provided on the basis of the 5 planar standard members to ensure the accuracy of the determined film thickness.
In the method for determining the film thickness provided by this embodiment, each film coating layer of the planar standard component and the film coating layer corresponding to the component to be tested are formed by the same film coating process, so that the thickness of each film coating layer of the planar standard component is the same as the thickness of the film coating layer corresponding to the component to be tested, and then the thickness of each film coating layer can be directly obtained by using the difference value between the thicknesses of the film coating layers of the planar standard components, and the obtained thickness of each film coating layer is the thickness of each film coating layer of the component to be tested, so that the determined thickness of each film coating layer of the component to be tested has higher reliability.
The embodiment also provides a method for determining the thickness of the film layer, as shown in fig. 3, the method includes:
and S31, providing at least one plane standard component.
The planar standard part comprises at least one coating layer, and each coating layer and the coating layer corresponding to the part to be tested are formed by adopting the same coating process. The coating process can be referred to as S21 in the embodiment shown in fig. 2, and is not described herein again.
The coating layer of each provided planar standard component can be completely the same as all coating layers of the component to be tested, for example, the component to be tested comprises 5 coating layers, so that the planar standard component also comprises 5 coating layers, and each coating layer is completely the same as the coating layer corresponding to the component to be tested; namely, the planar standard part and the piece to be tested can be obtained by coating films simultaneously.
And S32, determining the thickness of each coating layer of the test piece according to the parameters of the plane standard piece.
Wherein the parameter comprises one of the thickness of the coating layer and an optical parameter. The method provided in the embodiment determines the thickness of each coating layer of the test piece by using the optical parameters of the planar standard piece, and then determines the thickness of each coating layer of the test piece according to the optical parameters of the planar standard piece, and specifically comprises the following steps:
s321, measuring the optical parameters of the plane standard component.
The measured optical parameter of the planar standard may be the transmittance, the reflectance, or other optical parameters of the planar standard. The following description will be made in detail with reference to light transmittance as an example.
The specific measurement method may be to measure the light transmittance of the planar standard component by using a spectrometer, or to measure the light transmittance of the planar standard component by using other measuring components.
S322, a first optical characteristic curve is formed by using the optical parameters of the plane standard component.
The optical characteristic curve is used to represent a relationship between wavelength and an optical parameter (e.g., transmittance, reflectance), and when the optical parameter is transmittance, the first optical characteristic curve is a relationship between wavelength and transmittance. The obtained first optical characteristic curve is used as a reference curve of optical parameters, namely, is used as a basis for subsequently adjusting the thickness of the film layer.
Alternatively, the light transmittance of the planar standard is measured using a spectrometer, and the measured light transmittance is a light transmittance in the spectral range of 300nm to 1250 nm. The spectral range of 300nm-1250nm contains the spectral range of all visible light, so that the measured light transmittance has higher reliability.
S323, setting parameters of a film layer of the piece to be tested to construct a simulation film system.
Wherein the film parameters comprise the thickness of each film coating layer.
The steps S323 to S325 may be performed by an electronic device, and specifically, the film layer parameters of the test piece are set in the electronic device, and the setting of the parameters is used for constructing the simulation film system. The film parameters comprise the thickness of each layer of coating layer and other parameters (such as the number of the coating layers and the target material of each layer of coating layer), wherein the thickness of each layer of coating layer can be randomly set, and the other parameters are the same as the other parameters corresponding to the to-be-tested piece.
S324, the simulation film system is analyzed to obtain a second optical characteristic curve.
The forming of the second optical characteristic curve may be that the electronic device realizes self-learning by using a plurality of data samples, that is, film layer parameters and corresponding optical characteristic curves, to obtain a forming model of the optical characteristic curve. Then, after the film parameters of the test piece are set in the electronic device, the film parameters are input into the obtained model, and a second optical characteristic curve corresponding to the film parameters can be obtained
Alternatively, the simulated membrane system is analyzed using membrane system design software running on the electronic device. Specifically, the membrane system design software is used for designing the membrane system, and the membrane system design is to set membrane layer parameters and analyze the designed membrane system. After a simulation membrane system is constructed in membrane system design software, the optical characteristic curve corresponding to the simulation membrane system can be analyzed by utilizing the membrane system design software, and the simulation membrane system can be constructed by setting membrane layer parameters in the membrane system design software; after the simulated film system is constructed, the film system design software can obtain a corresponding second optical characteristic curve through the analysis of the simulated film system.
S325, based on the first optical characteristic curve, the thickness of the coating layer of the to-be-tested piece is adjusted to correct the second optical characteristic curve, so that the second optical characteristic curve is matched with the first optical characteristic curve.
And the thickness of each coating layer corresponding to the matched second optical characteristic curve is the thickness of each coating layer of the test piece.
After the second optical characteristic is obtained, the first optical characteristic and the second optical characteristic may be placed in the same coordinate system to facilitate comparison between the two optical characteristics. The first optical characteristic curve is used as a comparison basis of the second optical characteristic curve, and the error between the two optical characteristic curves is obtained by comparing the first optical characteristic curve and the second optical characteristic curve so as to realize the adjustment of the film thickness of each layer.
Specifically, the second optical characteristic curve is obtained by setting film layer parameters (the number of layers of the plated film and the thickness of each layer) in film system design software to construct a simulated film system and analyzing the simulated film system, wherein the number of the layers of the plated film is the same as that of the plated film of the planar standard member after the plating. Therefore, what needs to be adjusted is the film thickness of each layer. After the second optical characteristic curve is compared with the first optical characteristic curve, the error of the second optical characteristic curve relative to the first optical characteristic curve is obtained, so that a basis can be provided for adjusting the thickness of the film layer.
The thickness of each film layer is adjusted in film system design software, so that a second optical characteristic curve measured by the film system design software is matched with the first optical characteristic curve, and the adjusted thickness of each film layer is the thickness of each film layer.
As an optional implementation manner of this embodiment, S325 may include the following steps:
(1) and judging whether the second optical characteristic curve is matched with the first optical characteristic curve.
And placing the first optical characteristic curve and the second optical characteristic curve in the same coordinate system, and performing comparative analysis to judge whether the first optical characteristic curve and the second optical characteristic curve are consistent. Wherein, the two curves can be judged to be matched as long as the maximum deviation of the two curves is within a preset range; and the specific preset range can be specifically set according to the actual measurement precision. When the second optical characteristic curve is not matched with the first optical characteristic curve, executing the step (2); otherwise, executing step (3).
(2) The film thickness of each layer is adjusted.
Specifically, the adjustment of the film thickness of each layer may be performed by manually adjusting the film thickness of each layer in the film system design software based on the deviation between the compared second optical characteristic curve and the first optical characteristic curve; or the film system design software can automatically adjust the thickness of each film based on the deviation, and the like. The method for adjusting the thickness of each layer is not limited, and it is only necessary to ensure that the thickness of each layer can be adjusted after the deviation between the second optical characteristic curve and the first optical characteristic curve is determined.
After adjusting the thickness of each layer of film each time, analyzing the optical characteristics of the simulation after adjusting the film thickness by using the film system design software again; and (4) returning to the step (1), and judging whether the second optical characteristic curve is matched with the first optical characteristic curve again.
(3) And determining the film thickness of each layer corresponding to the matched second optical characteristic curve as the film thickness of each layer of the piece to be tested after film coating.
In the method for determining the film thickness provided in this embodiment, the first optical characteristic curve of the measured planar standard component is used as a reference curve for adjusting the film thickness, the constructed simulated film system is analyzed to obtain a second optical characteristic curve, and the second optical characteristic curve is compared with the reference curve to adjust the thickness of each film layer, so that the thickness of each film layer on the component to be tested can be obtained.
As an optional implementation manner of this embodiment, the film parameters set in the film system design software further include a target material for film coating; the target comprises a material with a first refractive index and a second refractive index, and the first refractive index is larger than the second refractive index. The film layers with the first refractive index and the film layers with the second refractive index are alternately attached to a piece to be tested. The shape of the test piece is a curved surface, and the material of the test piece is not limited herein, and may be glass, transparent plastic (such as acrylic, PC, PVC) or flexible material (such as PET), etc. For example, when the piece to be tested is curved glass, the coating film layer formed on the curved glass is a film layer with high refractive index and low refractive index alternately arranged.
As a specific application example of this embodiment, this embodiment provides a method for determining a film thickness, which can determine the film thickness formed by each layer of target, and even determine the film thickness of the same film coating process and the same film system design but slightly changed due to different coating machines and different batches, and specifically includes the following steps:
(1) when the curved glass is coated, a piece of plane glass (for example, 10cm multiplied by 10cm) is put into each furnace as a lining, and the plane glass and the curved glass have the same thickness with the same brand; the coated accompanying lining sheet is called a plane standard part, and the coated curved glass is called a to-be-tested part.
(2) After coating was complete, the light transmittance of the flat standard was measured by a spectrometer in the spectral range from 300 to 1250 nm. The spectrometer cannot measure the light transmittance of a curved test piece, but can measure the light transmittance of a flat standard piece, thereby obtaining a light transmittance curve of the flat standard piece, which is referred to as a target value curve.
(3) And setting the target material, the layer number and the thickness of each layer in film system design software to perform film coating test on the piece to be tested to obtain a light transmittance curve in a spectral range from 300 to 1250 nanometers under the film system, and calling the light transmittance curve as an estimated value curve.
(4) And comparing the evaluation value curve with the target value curve under the same coordinate system.
(5) The film thickness is adjusted in the film system design software to adjust the estimated value curve, so that the estimated value curve is matched with the target value curve, and the thickness of each film layer can be obtained. The thickness of each layer can be within a range of thickness, for example, the thickness of the layer controlled by a crystal oscillator is within ± 5% because the thickness of the layer has a deviation (within a reasonable tolerance range).
Although the embodiments of the present invention have been described in conjunction with the accompanying drawings, those skilled in the art may make various modifications and variations without departing from the spirit and scope of the invention, and such modifications and variations fall within the scope defined by the appended claims.

Claims (9)

1. A method for determining a thickness of a film, comprising:
providing at least one planar standard; the planar standard part comprises at least one coating layer, and the coating layers corresponding to the parts to be tested are formed by adopting the same coating process;
and determining the thickness of each coating layer of the test piece according to the parameters of the plane standard piece, wherein the parameters comprise one of the coating layer thickness and optical parameters.
2. The method of claim 1, wherein said determining the thickness of each coating layer of said test piece based on the thickness of the coating layer of said planar master piece comprises:
sequentially measuring the thickness of the coating layer of each planar standard component;
and determining the thickness of each coating layer of the piece to be tested by using the difference value between the thicknesses of the coating layers of the plane standard pieces.
3. The method of claim 1, wherein said determining the thickness of each coating layer of said test piece based on the optical parameters of said planar standard piece comprises:
measuring an optical parameter of the planar standard;
forming a first optical characteristic curve by using the optical parameters of the planar standard;
setting film parameters of the piece to be tested to construct a simulation film system; wherein the film layer parameters comprise the thickness of each film coating layer;
analyzing the simulated film system to obtain a second optical characteristic curve;
adjusting the thickness of the film coating layer of the piece to be tested based on the first optical characteristic curve to correct the second optical characteristic curve so that the second optical characteristic curve is consistent with the first optical characteristic curve; and the thickness of each coating layer corresponding to the matched second optical characteristic curve is the thickness of each coating layer of the test piece.
4. The method of claim 3, wherein the optical parameter comprises light transmittance.
5. The method of claim 3, wherein said determining an optical parameter of said planar standard comprises: the light transmittance of the flat standard was measured using a spectrometer.
6. The method of claim 4, wherein the light transmittance is a light transmittance in the spectral range of 300nm to 1250 nm.
7. The method according to any one of claims 1 to 6, wherein the flat standard piece and the piece to be tested are coated by an electron beam evaporation coating process.
8. The method of claim 7, further comprising coating the planar master piece and the piece under test in combination with an ion-assisted coating process.
9. The method according to claim 1, wherein the test piece is a flat test piece or a curved test piece.
CN201910147257.2A 2019-02-27 2019-02-27 Method for determining film thickness Pending CN111623714A (en)

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