CN111598413A - Detection method and detection device - Google Patents

Detection method and detection device Download PDF

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Publication number
CN111598413A
CN111598413A CN202010336932.9A CN202010336932A CN111598413A CN 111598413 A CN111598413 A CN 111598413A CN 202010336932 A CN202010336932 A CN 202010336932A CN 111598413 A CN111598413 A CN 111598413A
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characteristic parameter
judging
parameter
equipment state
reasonable range
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熊攀
章星
李�远
万先进
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Yangtze Memory Technologies Co Ltd
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Yangtze Memory Technologies Co Ltd
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    • G06Q10/0639—Performance analysis of employees; Performance analysis of enterprise or organisation operations
    • G06Q10/06395—Quality analysis or management
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
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    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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    • Y02P90/30—Computing systems specially adapted for manufacturing

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Abstract

The application discloses a detection method and a detection device, wherein the detection method comprises the following steps: obtaining a characteristic parameter representing the equipment state, wherein the parameter value of the characteristic parameter changes along with the first variable; setting a reasonable range of the characteristic parameter, wherein the reasonable range is changed along with the first variable; and judging whether the parameter value of the characteristic parameter is in the corresponding reasonable range, if so, judging that the equipment state is normal, and if not, judging that the equipment state is abnormal. The detection method judges whether the equipment is abnormal or not by setting a reasonable range of the characteristic parameter which changes along with the first variable and judging whether the characteristic parameter representing the equipment state falls within the corresponding reasonable range of the change.

Description

Detection method and detection device
Technical Field
The present invention relates to detection technologies, and in particular, to a detection method and a detection apparatus.
Background
Before the product leaves a factory, the product needs to be sorted into qualified products and unqualified products according to whether the fixed standard is met. In order to improve the qualification rate of the product, the stability of the process during the production of the product should be ensured, which needs to ensure the stability of the equipment for producing the product, wherein the stability of the equipment can be monitored in real time according to a certain characteristic parameter of the equipment.
However, when the characteristic parameter is a variable, a reasonable monitoring limit cannot be set according to a statistical rule, and the abnormality of the characteristic parameter cannot be effectively monitored.
Therefore, it is desirable to further improve the detection method and the detection apparatus, thereby improving the reliability of detection.
Disclosure of Invention
The invention aims to provide an improved detection method and a detection device, which are used for solving the technical problem that variable characteristic parameters cannot be detected in the prior art.
According to an aspect of the present invention, there is provided a detection method including: obtaining a characteristic parameter representing the state of equipment, wherein the parameter value of the characteristic parameter changes along with a first variable; setting a reasonable range of the characteristic parameter, wherein the reasonable range is changed along with the first variable; and judging whether the parameter value of the characteristic parameter is in the corresponding reasonable range, if so, judging that the equipment state is normal, and if not, judging that the equipment state is abnormal.
Preferably, the parameter value of the characteristic parameter changes periodically with the first change amount.
Preferably, the step of setting a reasonable range of the characteristic parameter comprises: and setting an upper limit value and a lower limit value of the reasonable range, wherein the upper limit value and the lower limit value are periodically changed along with the first variable.
Preferably, the step of determining whether the parameter value of the characteristic parameter is within the corresponding reasonable range includes: and judging whether the parameter value of the characteristic parameter is between the upper limit value and the lower limit value corresponding to the corresponding first variation, if so, judging that the equipment state is normal, and if not, judging that the equipment state is abnormal.
Preferably, the step of determining whether the parameter value of the characteristic parameter is within the corresponding reasonable range includes: and judging whether the difference value between the characteristic parameter obtained this time and the characteristic parameter obtained last time is within the corresponding variation range, if so, judging that the equipment state is normal, and if not, judging that the equipment state is abnormal.
Preferably, the step of obtaining the characteristic parameter of this time and the step of obtaining the characteristic parameter of the last time are both located in a time period of producing the same product batch in the same cycle.
Preferably, the first variable comprises a lifetime of a metal target consumed in the physical vapor deposition process, and the characteristic parameter comprises a sputtering voltage or a sputtering current.
According to another aspect of the present invention, there is provided a detection apparatus comprising: the acquisition module is used for acquiring a characteristic parameter representing the equipment state, and the parameter value of the characteristic parameter changes along with a first variable; the storage module is used for storing a reasonable range of the characteristic parameter, and the reasonable range is changed along with the first variable; and the judging module is used for judging whether the parameter value of the characteristic parameter is in the corresponding reasonable range, if so, judging that the equipment state is normal, and if not, judging that the equipment state is abnormal.
According to the detection method and the detection device provided by the embodiment of the invention, whether the equipment is abnormal or not is judged by setting the reasonable range of the characteristic parameter which changes along with the first variable and judging whether the characteristic parameter representing the equipment state falls within the corresponding reasonable range of the change or not.
Furthermore, the characteristic parameters of the judgment change are converted into judgment constants, so that the judgment difficulty is reduced, and the detection precision is improved.
Drawings
The above and other objects, features and advantages of the present invention will become more apparent from the following description of the embodiments of the present invention with reference to the accompanying drawings.
Fig. 1a and 1b show a schematic representation of a detection method.
Fig. 2 shows a flow chart of a detection method of an embodiment of the invention.
Fig. 3 shows a schematic diagram of the detection method of the first embodiment of the present invention.
Fig. 4 and 5 are schematic diagrams illustrating a detection method according to a second embodiment of the present invention.
Fig. 6 shows a schematic structural diagram of a detection apparatus according to an embodiment of the present invention.
Detailed Description
The invention will be described in more detail below with reference to the accompanying drawings. Like elements in the various figures are denoted by like reference numerals. For purposes of clarity, the various features in the drawings are not necessarily drawn to scale. In addition, certain well known components may not be shown. For simplicity, the semiconductor structure obtained after several steps can be described in one figure.
It will be understood that when a layer or region is referred to as being "on" or "over" another layer or region in describing the structure of the device, it can be directly on the other layer or region or intervening layers or regions may also be present. And, if the device is turned over, that layer, region, or regions would be "under" or "beneath" another layer, region, or regions.
If for the purpose of describing the situation directly on another layer, another area, the expression "directly on … …" or "on … … and adjacent thereto" will be used herein.
In the following description, numerous specific details of the invention, such as structure, materials, dimensions, processing techniques and techniques of the devices are described in order to provide a more thorough understanding of the invention. However, as will be understood by those skilled in the art, the present invention may be practiced without these specific details.
The present invention may be embodied in various forms, some examples of which are described below.
Fig. 1a and 1b show a schematic representation of a detection method.
During the production of the product, in order to ensure the stability of the equipment, real-time monitoring can be carried out according to certain characteristic parameters of the equipment. As shown in fig. 1a, when the characteristic parameter b does not theoretically change with the change of the parameter a, reasonable monitoring limits including an upper limit 101 and a lower limit 102 can be set by a statistical rule, if the coordinate point 11 is detected to fall between the upper limit 101 and the lower limit 102, the device status is normal, and if the coordinate point 12 is detected to fall outside the upper limit 101 and the lower limit 102, the device status is abnormal.
As shown in fig. 1B, when the characteristic parameter B changes with the change of the first variable a, if the upper limit 101 and the lower limit 102 are also set by a statistical rule, it may happen that both the normal coordinate point 21 and the abnormal coordinate point 22 fall between the upper limit 101 and the lower limit 102, and thus the device status is determined to be normal, and therefore, the device abnormality cannot be effectively monitored by using this method.
Fig. 2 shows a flow chart of a detection method of an embodiment of the invention.
In step S01, a characteristic parameter characterizing the state of the device is obtained, wherein a parameter value of the characteristic parameter varies with the first variable.
In step S02, a reasonable range of the characteristic parameter is set, the reasonable range varying with the first variable.
In step S03, it is determined whether the parameter value of the characteristic parameter is within the corresponding reasonable range, and if so, the device status is determined to be normal, and if not, the device status is determined to be abnormal.
In the embodiment of the invention, the parameter value of the characteristic parameter changes periodically along with the first change amount.
In an embodiment of the present invention, the first variable is, for example, a lifetime of a metal target consumed in the pvd process, and the characteristic parameter is, for example, a sputtering voltage or a sputtering current. However, the embodiments of the present invention are not limited thereto, and those skilled in the art may make other settings for the selection of the first variable and the characteristic parameter as needed.
Fig. 3 shows a schematic diagram of a detection method according to a first embodiment of the present invention, and the steps in fig. 2 will be described in detail with reference to fig. 3.
For example, a relationship comparison table between the first variable a and the characteristic parameter B is established in advance, and a reasonable range of the characteristic parameter B is set according to the relationship comparison table, including an upper limit value 201 and a lower limit value 202, wherein both the upper limit value 201 and the lower limit value 202 vary with the first variable a. In the present embodiment, the upper limit value 201 and the lower limit value 202 both vary periodically with the first variable a. The first variable a and the characteristic parameter B used for establishing the relation comparison table may be collected samples in the process of trying to produce the product, or may be data in the process of producing the product in the past.
When a product is produced, the characteristic parameter B of the device and the corresponding first variable a are acquired in real time, and the coordinate point 21 or 22 is determined.
And judging whether the parameter value (coordinate point 21 or 22) of the characteristic parameter is between an upper limit value 201 and a lower limit value 202 corresponding to the corresponding first variation, if so, judging that the equipment state is normal, and if not, judging that the equipment state is abnormal. In the present embodiment, the coordinate point 21 indicates that the device state is normal, and the coordinate point 22 indicates that the device state is abnormal.
Fig. 4 and 5 are schematic diagrams illustrating a detection method according to a second embodiment of the present invention, and the steps in fig. 2 will be described in detail with reference to fig. 4 and 5.
As shown in fig. 4, the characteristic parameter B varies periodically with the first variation a. For clarity, only the first cycle and the second cycle are shown in fig. 4, and two batches of products, each having 4 product numbers, are respectively produced in each cycle. However, the embodiment of the present invention is not limited thereto, and those skilled in the art may set the cycle number, the production lot, and the product number accordingly according to the actual application scenario.
In this embodiment, it is necessary to set a variation range of the parameter value of the characteristic parameter B, and both the upper limit and the lower limit of the variation range are constant, for example, the upper limit of the variation range is set to 0.5, and the lower limit of the variation range is set to-0.5.
And judging whether the difference value between the characteristic parameter obtained this time and the characteristic parameter obtained last time is within the corresponding variation range, if so, judging that the equipment state is normal, and if not, judging that the equipment state is abnormal. The steps of the characteristic parameters acquired this time and the characteristic parameters acquired last time are all within the time interval of producing the same product batch in the same period.
Specifically, when the first batch of products is produced, the difference value between each acquired characteristic parameter value and the previous characteristic parameter value is y1, y2 and y3, wherein y2 is 0.1 at minimum, and y3 is 0.3 at maximum. And judging that y2 and y3 are both between the upper limit and the lower limit (between 0.5 and-0.5) of the variation range, so that the equipment state is normal when the first batch of products are produced, and further judging that the first batch of products are all qualified products, and the first batch is a qualified batch.
When a second batch of products is produced, the difference value between each acquired characteristic parameter value and the previous characteristic parameter value is h1, h2 and h3, wherein the minimum value of h2 is 0.1, and the maximum value of h3 is 0.18. Judging that h2 and h3 are both between the upper limit and the lower limit of the variation range (between 0.5 and-0.5), so as to judge that the equipment state is normal when the second batch of products are produced, and further judge that the second batch of products are all qualified products, and the second batch is a qualified batch.
When a third batch of products is produced, the difference value between each acquired characteristic parameter value and the previous characteristic parameter value is d1, d2 and d3, wherein the minimum value of d2 is 0.1, and the maximum value of d3 is 0.34. D2 and d3 are both determined to be between the upper limit and the lower limit of the variation range (between 0.5 and-0.5), so that the equipment status is determined to be normal when the third batch of products is produced, and the third batch of products is determined to be qualified products and is determined to be qualified.
When a fourth batch of products is produced, the difference value between each acquired characteristic parameter value and the previous characteristic parameter value is l1, l2 and l3, wherein l2 is 0.28 at minimum, and d3 is 0.62 at maximum. When l3 is determined not to be between the upper limit and the lower limit (between 0.5 and-0.5) of the variation range, the state of the equipment is determined to be abnormal when a fourth batch of products is produced, and then unqualified products are determined in the fourth batch, and the fourth batch is unqualified.
In other embodiments, the setting of the upper and lower limits of the difference value may be unified into an absolute value.
In some other embodiments, the first embodiment and the second embodiment of the present invention may be combined to perform double determination, so as to consider both the detection efficiency and the detection accuracy. For example, when a certain batch of products is produced, the detection method of the second embodiment is first used to determine whether the batch is a qualified batch, and if the batch is an unqualified batch, the detection method of the first embodiment is used to determine which specific product is an unqualified product, so as to remove the unqualified product. If the batch is qualified, the detection method in the first embodiment is not required to be adopted for detection again.
In other embodiments, the detection methods of the first and second embodiments may also be used to judge the product synchronously.
Fig. 6 shows a schematic structural diagram of a detection apparatus according to an embodiment of the present invention.
The detection apparatus 100 of the embodiment of the present invention includes: an obtaining module 120, configured to obtain a characteristic parameter representing a state of the device, where a parameter value of the characteristic parameter changes with a first variable; the storage module 110 is used for storing a reasonable range of the characteristic parameter, wherein the reasonable range changes along with the first variable; and a judging module 130, configured to judge whether a parameter value of the characteristic parameter is within a corresponding reasonable range, if so, determine that the device status is normal, and if not, determine that the device status is abnormal.
According to the detection method and the detection device provided by the embodiment of the invention, whether the equipment is abnormal or not is judged by setting the reasonable range of the characteristic parameter which changes along with the first variable and judging whether the characteristic parameter representing the equipment state falls within the corresponding reasonable range of the change or not.
Furthermore, the characteristic parameters of the judgment change are converted into judgment constants, so that the judgment difficulty is reduced, and the detection precision is improved.
In the above description, the technical details of patterning, etching, and the like of each layer are not described in detail. It will be appreciated by those skilled in the art that layers, regions, etc. of the desired shape may be formed by various technical means. In addition, in order to form the same structure, those skilled in the art can also design a method which is not exactly the same as the method described above. In addition, although the embodiments are described separately above, this does not mean that the measures in the embodiments cannot be used in advantageous combination.
The embodiments of the present invention have been described above. However, these examples are for illustrative purposes only and are not intended to limit the scope of the present invention. The scope of the invention is defined by the appended claims and equivalents thereof. Various alternatives and modifications can be devised by those skilled in the art without departing from the scope of the invention, and these alternatives and modifications are intended to fall within the scope of the invention.

Claims (8)

1. A method of detection, comprising:
obtaining a characteristic parameter representing the state of equipment, wherein the parameter value of the characteristic parameter changes along with a first variable;
setting a reasonable range of the characteristic parameter, wherein the reasonable range is changed along with the first variable; and
and judging whether the parameter value of the characteristic parameter is in the corresponding reasonable range, if so, judging that the equipment state is normal, and if not, judging that the equipment state is abnormal.
2. The detection method according to claim 1, wherein the parameter value of the characteristic parameter changes periodically with the first change amount.
3. The detection method according to claim 2, wherein the step of setting a reasonable range of the characteristic parameter comprises:
and setting an upper limit value and a lower limit value of the reasonable range, wherein the upper limit value and the lower limit value are periodically changed along with the first variable.
4. The detection method according to claim 3, wherein the step of determining whether the parameter values of the characteristic parameters are within the corresponding reasonable ranges comprises:
and judging whether the parameter value of the characteristic parameter is between the upper limit value and the lower limit value corresponding to the corresponding first variation, if so, judging that the equipment state is normal, and if not, judging that the equipment state is abnormal.
5. The detection method according to claim 2, wherein the step of determining whether the parameter values of the characteristic parameters are within the corresponding reasonable ranges comprises:
and judging whether the difference value between the characteristic parameter obtained this time and the characteristic parameter obtained last time is within the corresponding variation range, if so, judging that the equipment state is normal, and if not, judging that the equipment state is abnormal.
6. The detection method according to claim 5, wherein the step of obtaining the characteristic parameter this time and the step of obtaining the characteristic parameter last time are both located in a time period of producing the same product batch in the same cycle.
7. The method of any of claims 1-6, wherein the first variable comprises a lifetime of a metal target consumed in the physical vapor deposition process,
the characteristic parameter comprises a sputtering voltage or a sputtering current.
8. A detection device, comprising:
the acquisition module is used for acquiring a characteristic parameter representing the equipment state, and the parameter value of the characteristic parameter changes along with a first variable;
the storage module is used for storing a reasonable range of the characteristic parameter, and the reasonable range is changed along with the first variable; and
and the judging module is used for judging whether the parameter value of the characteristic parameter is in the corresponding reasonable range, if so, judging that the equipment state is normal, and if not, judging that the equipment state is abnormal.
CN202010336932.9A 2020-04-26 2020-04-26 Detection method and detection device Pending CN111598413A (en)

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102443770A (en) * 2011-09-15 2012-05-09 上海华力微电子有限公司 Method for preventing metal target from breakdown during physical vapor deposition sputtering process
CN109753027A (en) * 2017-11-08 2019-05-14 阿里巴巴集团控股有限公司 It is a kind of industry manufacture in parameter monitoring method and device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102443770A (en) * 2011-09-15 2012-05-09 上海华力微电子有限公司 Method for preventing metal target from breakdown during physical vapor deposition sputtering process
CN109753027A (en) * 2017-11-08 2019-05-14 阿里巴巴集团控股有限公司 It is a kind of industry manufacture in parameter monitoring method and device

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Application publication date: 20200828