CN111514637A - Wafer wire-electrode cutting mud filter equipment and clean control system thereof - Google Patents
Wafer wire-electrode cutting mud filter equipment and clean control system thereof Download PDFInfo
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- CN111514637A CN111514637A CN202010449909.0A CN202010449909A CN111514637A CN 111514637 A CN111514637 A CN 111514637A CN 202010449909 A CN202010449909 A CN 202010449909A CN 111514637 A CN111514637 A CN 111514637A
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- 238000005520 cutting process Methods 0.000 title claims abstract description 36
- 239000002002 slurry Substances 0.000 claims abstract description 120
- 238000001914 filtration Methods 0.000 claims abstract description 80
- 238000004140 cleaning Methods 0.000 claims abstract description 40
- 230000008021 deposition Effects 0.000 claims abstract description 37
- 239000002893 slag Substances 0.000 claims abstract description 18
- 238000004062 sedimentation Methods 0.000 claims description 37
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 18
- 230000000903 blocking effect Effects 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims description 5
- 238000005406 washing Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 18
- 230000000694 effects Effects 0.000 abstract description 17
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 238000005299 abrasion Methods 0.000 abstract description 5
- 235000012431 wafers Nutrition 0.000 description 21
- 238000012423 maintenance Methods 0.000 description 12
- 239000012634 fragment Substances 0.000 description 8
- 239000002245 particle Substances 0.000 description 7
- 230000001276 controlling effect Effects 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 229910002804 graphite Inorganic materials 0.000 description 5
- 239000010439 graphite Substances 0.000 description 5
- 230000005484 gravity Effects 0.000 description 5
- 230000002035 prolonged effect Effects 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- 230000009191 jumping Effects 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000010865 sewage Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 208000011092 Hand injury Diseases 0.000 description 1
- GQWNECFJGBQMBO-UHFFFAOYSA-N Molindone hydrochloride Chemical compound Cl.O=C1C=2C(CC)=C(C)NC=2CCC1CN1CCOCC1 GQWNECFJGBQMBO-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000005574 cross-species transmission Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F11/00—Treatment of sludge; Devices therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
- B01D29/11—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with bag, cage, hose, tube, sleeve or like filtering elements
- B01D29/31—Self-supporting filtering elements
- B01D29/35—Self-supporting filtering elements arranged for outward flow filtration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
- B01D29/60—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor integrally combined with devices for controlling the filtration
- B01D29/603—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor integrally combined with devices for controlling the filtration by flow measuring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
- B01D29/62—Regenerating the filter material in the filter
- B01D29/70—Regenerating the filter material in the filter by forces created by movement of the filter element
- B01D29/72—Regenerating the filter material in the filter by forces created by movement of the filter element involving vibrations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D36/00—Filter circuits or combinations of filters with other separating devices
- B01D36/04—Combinations of filters with settling tanks
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Organic Chemistry (AREA)
- Filtration Of Liquid (AREA)
Abstract
The invention relates to the technical field of wafer linear cutting, in particular to a wafer linear cutting mud filtering device and a cleaning control system thereof, which comprise a deposition cylinder, a mud filter and a cleaning control system, wherein the deposition cylinder is used for settling mud and crushed slag and is provided with a mud outlet; the filter assembly is arranged in the deposition cylinder, the deposition cylinder is isolated by the filter assembly to form an inner cavity and an outer cavity, the slurry outlet, the outer cavity and the inner cavity are sequentially communicated, the filter assembly comprises at least one layer of filter screen, and the screen surface of the filter screen is obliquely arranged with the vertical direction; and the jet flow pipe is provided with jet flow holes, and the jet flow holes are accommodated in the inner cavity and used for injecting slurry into the inner cavity. The invention is helpful to reduce the stress, abrasion and debris filtering amount of the filter screen, prolong the service life of the filter screen, realize the effective filtering of slurry, improve the efficiency of slurry filtering and ensure that the filter screen has self-cleaning effect in the filtering process; in addition, the automatic inclination of the filtering device is realized, the labor is reduced, and the production efficiency is improved.
Description
Technical Field
The invention relates to the technical field of wafer linear cutting, in particular to a wafer linear cutting mud filtering device and a cleaning control system thereof.
Background
The existing wafer linear cutting equipment can go through at least two filtering processes in the linear cutting process, wherein one filtering process is a slurry filtering screen of a linear cutting wheel axle box; the second is a slurry filter, most of large-particle impurities are filtered by the two filtering devices, the filtered slurry is re-pumped by a slurry filtering pump of the wire cutting machine to be subjected to wire cutting on a steel wire and the surface of a wafer, and a slurry mixture subjected to wire cutting is subjected to the two filtering processes again to complete the wire cutting of the wafer repeatedly.
Slurry generated after wafer online cutting in the prior art is mixed with broken wafers or graphite strip scraps, is easy to leak into a slurry cylinder through a slurry filter, and is pumped into linear cutting equipment in a circulating cutting process, so that the broken wafers or graphite strip scraps enter a steel wire and a wire groove, and the abnormity of wire jumping and wire breakage is caused; in order to prevent the broken wafers or graphite strip fragments from leaking through the filtering holes of the filter, the broken wafers or graphite strip fragments are pumped into the wire cutting equipment through the slurry pipe again, and silk stockings are generally additionally arranged at the pipe opening of the slurry pipe to filter the broken wafers or graphite strip fragments.
However, the stockings need to be replaced frequently, mud is dirty and has peculiar smell, and the stockings after mud filtration have the risk of hand injury due to slag, so that workers have a relaxed psychology of replacing the stockings, the workers often ignore replacement of the stockings, wafer fragments are repeatedly turned over along with the flowing direction of the mud to break the stockings, and the abnormal improvement effect of jumping and breaking of the equipment is poor; in addition, mud is dirty, workers have poor enthusiasm for changing and washing the filter, the filter is easy to block, the mud flowing efficiency is easily impressed, the production efficiency is reduced, and the service life of a filter screen of the filter is influenced
Disclosure of Invention
The invention aims to provide a wafer linear cutting slurry filtering device and a cleaning and filtering system thereof, which are beneficial to improving the slurry filtering effect, preventing the debris pump from returning to a linear cutting device to cause wire jumping, effectively reducing the frequency of replacing and maintaining the filtering device by workers and improving the production efficiency.
In order to achieve the above object, the present invention provides a wafer wire-cutting slurry filtering apparatus, comprising:
the sedimentation cylinder is used for settling slurry and slag, and is provided with a slurry outlet;
the filter assembly is arranged in the deposition cylinder, the deposition cylinder is isolated by the filter assembly to form an inner cavity and an outer cavity, the slurry outlet, the outer cavity and the inner cavity are sequentially communicated, the filter assembly comprises at least one layer of filter screen, and the screen surface of the filter screen is obliquely arranged with the vertical direction;
and the jet pipe is provided with jet holes, and the jet holes are accommodated in the inner cavity so as to inject slurry into the inner cavity.
Optionally, the sedimentation cylinder includes lid and cylinder body, cylinder body upper end opening, the lid edge is to inside bending type formation upper end open-ended annular groove, the annular groove cover is located the cylinder body lateral surface, the mud export set up in lid one side and in proper order with annular groove and cylinder body intercommunication.
Optionally, the deposition cylinder includes a filtering portion, the filtering portion is provided with a guide slope, the guide slope inclines from top to bottom to the inner side, and the lower end of the filter screen abuts against the guide slope.
Optionally, the deposition jar includes the deposit portion, the deposit portion is equipped with the direction inclined wall, the direction inclined wall is inside to the slope from bottom to top, the upper end of direction inclined wall with the lower extreme of leading the inclined plane is connected.
Optionally, a plurality of the jet holes are formed in the circumferential side of the upper portion of the jet pipe, and the plurality of the jet holes are arranged along the circumferential direction and the axial direction of the jet pipe.
Optionally, the jet flow pipe further comprises an adjusting sleeve for blocking the jet flow hole, and the adjusting sleeve is sleeved outside the jet flow pipe and can move along the axial direction of the jet flow pipe.
Optionally, the filter assembly includes at least two layers of filter screens arranged in a stacked manner, wherein the mesh aperture of the filter screen stacked on the outer side is smaller than the mesh aperture of the filter screen stacked on the inner side.
Optionally, the filter screen is the taper structure, the filter screen inboard is formed with the filter chamber that is used for holding mud, the orifice hold in the filter chamber.
In addition, in order to achieve the above object, the present invention provides a cleaning control system for a wafer wire-cutting slurry filter apparatus, comprising:
the mud flow meter is used for detecting the flow of the mud filtered by the sedimentation cylinder;
the vibrator is used for driving the filter screen to vibrate;
the processor comprises a control module and a judgment module;
the control module is electrically connected with the vibrator and used for controlling the on-off of the vibrator, the judging module is connected with the mud flow meter and used for judging whether the flow of the mud filtered by the sedimentation cylinder is smaller than a preset flow threshold value or not, and when the flow measured by the mud flow meter is smaller than the preset flow threshold value, the control module controls the vibrator to start.
In addition, in order to achieve the above object, the present invention provides a cleaning control system for a wafer wire-cutting slurry filter apparatus, comprising:
the mud flow meter is used for detecting the flow of the mud filtered by the sedimentation cylinder;
the clean water valve is arranged on a cleaning water inlet formed in the deposition cylinder and used for controlling cleaning liquid to enter from the cleaning water inlet;
the processor comprises a control module and a judgment module;
the control module is electrically connected with the clean water valve and used for controlling the on-off of the vibrator, the judging module is connected with the mud flow meter and used for judging whether the flow of the mud filtered by the deposition cylinder is smaller than a preset flow threshold value or not, and when the flow measured by the mud flow meter is smaller than the preset flow threshold value, the control module controls the clean water valve to open the washing filter screen.
The embodiment of the invention has the following technical effects:
firstly, the sedimentation cylinder is arranged, when the jet pipe injects the slurry into the inner cavity, larger-particle slurry debris is deposited at the bottom of the sedimentation cylinder under the action of gravity, the slurry filtering effect is improved, the filtering stress, the abrasion and the debris filtering amount of the filter screen are reduced, and the service life of the filter screen is prolonged;
secondly, the deposition cylinder is isolated by the filter assembly to form an inner cavity and an outer cavity, and the jet hole of the jet pipe for injecting the slurry is arranged in the inner cavity, so that the pressure of the inner cavity of the deposition cylinder is greater than the pressure of the outer cavity to form a pressure difference in the process of continuously injecting the slurry into the inner cavity by the jet pipe, the slurry in the inner cavity is automatically filtered by the filter screen and flows to the outer cavity, the effective filtration of the slurry is realized, and the efficiency of slurry filtration is improved;
thirdly, in the filtering process, the scraps are easily adsorbed on the net surface of the filter net, when the scraps are accumulated to a certain amount, the filter net is easily blocked, the filtering effect of the filter net is reduced, and the filtering efficiency is influenced.
In addition, the setting judgment module is connected with the mud flow meter and used for judging whether the flow of the mud filtered by the sedimentation cylinder is smaller than a preset flow threshold value or not, when the flow measured by the mud flow meter is smaller than the preset flow threshold value, the control module controls the vibrator to start, the fragments blocking the filter screen are vibrated down, automatic cleaning and maintenance of the filter screen are realized, the maintenance cost is reduced, the times of manually disassembling and cleaning the filter screen are reduced, the passive psychology of frequent cleaning and maintenance of staff is avoided, the maintenance time is shortened, and the production efficiency is improved.
Drawings
FIG. 1 is a cross-sectional view of a preferred embodiment of the present invention;
FIG. 2 is a cross-sectional view of a deposition cylinder in a preferred embodiment of the invention;
FIG. 3 is a cross-sectional view of a deposition cylinder in a preferred embodiment of the invention;
FIG. 4 is a schematic structural view of a jet tube in a preferred embodiment of the invention;
FIG. 5 is a cross-sectional view of an adjustment sleeve in accordance with a preferred embodiment of the present invention;
FIG. 6 is a cross-sectional view of a filter assembly in a preferred embodiment of the invention;
FIG. 7 is a functional block diagram of a cleaning control system in a preferred embodiment of the present invention.
Description of reference numerals:
1. the device comprises a deposition cylinder, 11, a cylinder body, 111, a filtering part, 112, a guide inclined plane, 113, a deposition part, 114, a guide inclined wall, 12, a cover body, 121, an annular groove, 13, a slurry outlet, 14, an annular plate, 15, a cleaning port, 16, a sewage outlet, 17 and a slurry inlet;
2. the device comprises an injection pipe 21, an injection hole 22, a top plate 23, an adjusting sleeve 231, a flow guide inclined plane 24, a support rod 25, an adjusting knob 26 and a mud blocking part;
3. the filter assembly comprises a filter assembly 31, a filter screen 32, a filter cavity 33, a flow gap 34, a cover plate 35 and an annular filter screen;
4. a vibrator;
5. a clean water valve;
6. a mud flow meter;
7. a processor 71, a control module 72 and a judgment module;
8. the slurry and slag are primarily deposited in a cylinder.
Detailed Description
The following detailed description of embodiments of the present invention is provided in connection with the accompanying drawings and examples. The following examples are intended to illustrate the invention but are not intended to limit the scope of the invention.
Referring to fig. 1 to 7, the present embodiment provides a wafer wire-cutting slurry filtering apparatus, including:
the sedimentation cylinder 1 is used for settling slurry and slag, and the sedimentation cylinder 1 is provided with a slurry outlet 13;
the filter assembly 3 is arranged in the deposition cylinder 1, the deposition cylinder 1 is isolated by the filter assembly 3 to form an inner cavity and an outer cavity, the slurry outlet 13, the outer cavity and the inner cavity are sequentially communicated, the filter assembly 3 comprises at least one layer of filter screen 31, and the screen surface of the filter screen 31 is obliquely arranged with the vertical direction;
the jet pipe 2 is provided with jet holes 21, and the jet holes 21 are accommodated in the inner cavity for injecting slurry into the inner cavity.
Firstly, the sedimentation cylinder 1 is arranged, when the jet pipe 2 injects slurry into the inner cavity, larger slurry debris is deposited at the bottom of the sedimentation cylinder 1 under the action of gravity, so that the stress, abrasion and debris filtering quantity of the filter screen 31 are reduced, and the service life of the filter screen 31 is prolonged;
secondly, the deposition cylinder 1 is isolated by the filter component 3 to form an inner cavity and an outer cavity, and the jet hole 21 of the jet pipe 2 for injecting the slurry is arranged in the inner cavity, so that the pressure of the inner cavity of the deposition cylinder 1 is greater than the pressure of the outer cavity to form a pressure difference in the process of continuously injecting the slurry into the inner cavity by the jet pipe 2, the slurry in the inner cavity is automatically filtered by the filter screen 31 and flows to the outer cavity, the effective filtration of the slurry is realized, and the slurry filtration efficiency is improved;
thirdly, in the filtering process, the debris is easily adsorbed on the net surface of the filter screen 31, when the debris accumulates to a certain amount, the filter screen 31 is easily blocked, the filtering effect of the filter screen 31 is reduced, and the filtering efficiency is influenced.
Referring to fig. 1 to 3, in particular, the settling tank 1 includes a cover body 12 and a tank body 11, the upper end of the tank body 11 is open, the edge of the cover body 12 is bent inward to form an annular groove 121 with an open upper end, the annular groove 121 is sleeved on the outer side surface of the tank body 11, a slurry outlet 13 is opened on one side of the cover body 12 and is sequentially communicated with the annular groove 121 and the tank body 11, so that the settling direction of filtered slurry and debris is opposite, the filtered slurry overflows from the upper side of the tank body 11 to enter the annular groove 121 and then is discharged from the slurry outlet 13, the debris is settled towards the lower side of the tank body 11 in the tank body 11, the debris in the slurry is separated from the slurry, and the.
Further, the deposition cylinder 1 comprises a filtering part 111, the filtering part 111 is provided with a guide slope 112, the guide slope 112 inclines inwards from top to bottom, and the lower end of the filter screen 31 abuts against the guide slope 112, on one hand, the filter screen 31 abutting against the guide slope 112 prevents debris from entering the outer cavity from the lower end of the filter screen 31, and meanwhile, the filter screen 31 is supported by the guide slope 112, and the stability of installation of the filter screen 31 is improved; on the other hand, during the filtering process, the debris particles in the slurry filtered by the filter screen 31 are deposited downwards due to self weight, and when the debris particles fall onto the guide slope 112, the debris particles can be guided to pass through the filter screen 31 and return to the inner cavity for deposition through the guide slope 112;
the sedimentation cylinder 1 comprises a sedimentation part 113, the sedimentation part 113 is provided with a guide inclined wall 114, the guide inclined wall 114 inclines from bottom to top to inside, the upper end of the guide inclined wall 114 is connected with the lower end of the guide inclined plane 112, the caliber of the sedimentation part 113 is gradually narrowed by arranging the guide inclined wall 114 which inclines from bottom to top to inside, when mud flows from the sedimentation part 113 to the filtering part 111 due to stirring, the speed and the pressure of the mud flowing out of the sedimentation part 113 are improved, the mud flows to the upper part of the filtering part 111, the flowing distance of the mud in the filtering part 111 is increased, the staying time of the mud in the filtering part 111 is increased, and the filtering effect is improved.
Further, the slurry outlet 13 is close to the bottom of the annular groove 121, so that the slurry flows out of the cylinder body 11 to keep flowing in the process of the next process, and the slurry is prevented from being accumulated at the bottom of the annular groove 121 to form blocks, wherein an opening end cover of the annular groove 121 is provided with an annular filter screen 35, so that the slurry entering the annular groove 121 is further filtered, and the filtering effect is improved.
Further, the outer side wall of the cylinder 11 of the present embodiment is provided with an annular plate 14 extending away from the cylinder 11, and the annular groove 121 abuts against the annular plate 14, so as to improve the reliability of the connection between the cover 12 and the cylinder 11 and provide support for the annular groove 121.
Further, in order to facilitate the discharge of the debris and the crushed slag deposited by the deposition part 113, the deposition part 113 is provided with a drain outlet 16 and a slurry inlet 17, and the drain outlet 16 can be closed in the slurry deposition process and the drain outlet 16 can be opened when the settled crushed slag is discharged by arranging a drain valve on the drain outlet 16, specifically, the drain outlet 16 and the slurry inlet 17 are arranged at the lower end of the deposition part 113, so that the debris and the crushed slag of the deposition part 113 can be conveniently discharged from the drain outlet 16 under the action of self weight, and the sewage discharge efficiency is improved;
in order to prevent the slurry introduced from the slurry inlet 17 from disturbing the debris at the bottom of the settling section 113, the present embodiment penetrates the blast pipe 22 from the slurry inlet 17 to the upper portion of the cylinder 11, thereby allowing the slurry to flow downward from the upper portion of the cylinder 11 and avoiding disturbing the debris settled in the cylinder 11.
Referring to fig. 1, 4 and 5, in the present embodiment, a plurality of spouting holes 21 are formed at a circumferential side of an upper portion of the spouting tube 2, the plurality of spouting holes 21 are arranged in a circumferential direction and an axial direction of the spouting tube 2 to uniformly spout the slurry from the upper portion of the spouting tube 2, and further, by providing an adjusting sleeve 23 for blocking the spouting holes 21, the adjusting sleeve 23 is fitted outside the spouting tube 2 and is movable in the axial direction of the spouting tube 2, and when the adjusting sleeve 23 is moved to a position where the spouting holes 21 are formed along the axial direction of the spouting tube 2, the adjusting sleeve 23 blocks the slurry from being spouted from the spouting holes 21 formed at the circumferential side of the spouting tube 2 and changes the number of spouting holes 21 for spouting the slurry according to the axial movement of the adjusting sleeve 23, thereby realizing the regulation of the spouting amount of the spouting tube 2, and simultaneously changing the internal pressure of the spouting tube 2 by regulating the spouting amount of the spouting tube 2, prevent the jet pipe 2 from being damaged by overlarge internal pressure of the jet pipe 2.
Specifically, the adjusting sleeve 23 in this embodiment is screwed to the jet pipe 2, and by rotating the adjusting sleeve 23, the adjusting sleeve 23 is moved in the axial direction of the jet pipe 2, thereby adjusting the number of the jet holes 21 through which the slurry is jetted from the jet pipe 2.
The upper end of the adjusting sleeve 23 in this embodiment is inclined from bottom to top to outside to form a flow guiding inclined plane 231, so that when the spouting holes 21 near the upper end of the adjusting sleeve 23 spout the slurry flow to the flow guiding inclined plane 231, the slurry flow impacts the flow guiding inclined plane 231 and spreads obliquely upward under the action of the flow guiding inclined plane 231, on one hand, the height of the ejected slurry flow is increased, and on the other hand, the slurry flow ejected from the spouting holes 21 is more uniform.
Wherein, the plurality of spray holes 21 in the embodiment are uniformly arranged at the upper part of the spray pipe 2 along the circumferential direction, so that the slurry is uniformly sprayed out from the circumferential direction of the upper part of the spray pipe 2.
Further, the 2 upper ends of the jet flow pipe of this embodiment are equipped with roof 2, and a plurality of spouting holes 21 have been seted up to roof 2, and adjusting sleeve 23 is equipped with fender mud portion 26, and fender mud portion 26 is equipped with towards the fender mud plane of spouting hole 21 on roof 2, through keeping off the mud plane, makes the spouting hole 21 spun mud flow on roof 2 strike fender mud plane back evenly disperse all around, forms the mud flow to evenly spread all around.
In order to make the jet holes 21 on the top plate 2 uniformly jet out the slurry flow, a plurality of jet holes 21 are uniformly arranged on the top plate 2, specifically, the diameters of the jet holes 21 on the upper part of the jet pipe 2 and the top plate 2 are both 2-8 mm.
Referring to fig. 1 and 6, further, the filter assembly 3 in this embodiment includes at least two layers of filter screens 31 stacked one on top of another, and the mesh apertures of the stacked and outer filter screens 31 are smaller than the mesh apertures of the filter screens 31 stacked on the inner side, so that in the process of flowing the slurry from the inner side of the filter screens 31 to the outer side of the filter screens 31, the broken slag in the slurry is gradually filtered from large to small, on one hand, the stacked filter screens 31 increase the filtering area and improve the filtering effect, on the other hand, the particles with different sizes are gradually filtered by the filter screens 31 with different mesh apertures, and the large-particle debris can be filtered by the inner filter screen 31, so that the stress, abrasion and debris filtering amount of the inner filter screen 31 with smaller mesh is greatly reduced, the overall impact resistance and filtering performance of the filter assembly 3 are improved, and the service life of the filter assembly 3 is prolonged, and the precise filtration of the slurry is realized.
In addition, the filter screen 31 in this embodiment is a tapered structure, when the rotation axis of the filter screen 31 is arranged parallel to the vertical direction, the filtered debris is easy to fall off from the filter screen 31 under the action of the self-weight, and the secondary adhesion generated by the contact with the filter screen 31 in the falling process is avoided, so that the filter screen 31 has the self-cleaning effect in the filtering process, the filter chamber 32 for containing the slurry is formed inside the filter screen 31, the spouting hole 21 is contained in the filter chamber 32, so that the spouting pipe 2 is continuously injecting the slurry into the filter chamber 32, the pressure inside the filter screen 31 is greater than the pressure outside to form a pressure difference, the slurry in the filter chamber 32 is automatically filtered by the filter screen 31 and flows to the outside under the action of the pressure difference, the effective filtration of the slurry is realized, and the efficiency of the slurry filtration.
Specifically, filter screen 31 in this embodiment is both ends open-ended loudspeaker form, the less sealed lid of one end of filter screen 31 opening bore is equipped with apron 34, avoid mud to spill over from the upper portion of filter screen 31, in addition, adjusting sleeve 23 upper end in this embodiment is equipped with a plurality of bracing pieces 24 along the circumferencial direction interval, bracing piece 24 through the interval setting, make and be formed with the interval between a plurality of bracing pieces 24, spun mud can be followed the interval and is spouted in the blowout hole 21, in addition, for the axial displacement of rotatory adjusting sleeve 23 along jet-propelled pipe 2, bracing piece 24 upper end is connected with adjust knob 25, the workman can grasp adjust knob 25 rotation and drive adjusting sleeve 23 and rotate, therefore, the through-hole has all been seted up on apron 34 and the lid 12, adjust knob 25 passes the through-hole through the connecting rod and sets up in.
Further, in order to guarantee the filterable effect and the stability of filter screen 31, and because filter screen 31 is both ends open-ended loudspeaker form, this moment, the wire side and the contained angle that vertical direction becomes of filter screen 31 are 3-70, on the one hand, make the medial surface of filter screen 31 keep certain angle of inclination, make the adhesion drop under the effect of gravity at the piece of filter screen 31, and simultaneously, make the inclination of filter screen 31 in suitable range, prevent that the medial surface of filter screen 31 from piling up the piece, influence the filter effect, it is further preferred, the wire side and the contained angle that vertical direction becomes of filter screen 31 in this embodiment are 5-40.
Because in the filtering process, the filtered debris is deposited and gathered downwards, in order to prevent the blocking of the flow gap 33 formed between the filter screens 31, the included angle formed by the screen surface of the filter screen 31 stacked on the outer side and the vertical direction is larger than the included angle formed by the screen surface of the filter screen 31 stacked on the inner side and the vertical direction, so that the gap between two adjacent layers of filter screens 31 is gradually enlarged, the fluidity of slurry is enhanced, and the filtering efficiency is improved.
Specifically, the mesh aperture of the filter screen 31 in this embodiment is 0.6 to 2mm, which realizes the filtering of the debris generated by the wafer wire-cutting slurry.
In this embodiment, at least two layers of filter screens 31 arranged in a stacked manner are coaxially arranged, so that a gap with the same spacing distance is formed between two adjacent layers of filter screens 31 along the circumferential direction, and the filtering stability of the filter screen 31 assembly is improved, specifically, the filter screen 31 includes four layers of filter screens 31 in this embodiment, and the four layers of filter screens 31 are coaxially arranged, wherein, in this embodiment, the aperture of each filter screen 31 is 0.6-0.8mm, 0.8-2.0mm, 2.0-3.5mm, and 3.5-5.5mm in sequence from the outer side to the inner side.
In this embodiment, a slurry and crushed slag primary sedimentation cylinder 8 is provided, an outlet end of the slurry and crushed slag primary sedimentation cylinder 8 is connected with an inlet end of the jet flow pipe 2, slurry enters the slurry and crushed slag primary sedimentation cylinder 8 from the previous process, debris and crushed slag in the slurry are deposited for the first time in the slurry and crushed slag primary sedimentation cylinder 8, and the deposited slurry enters the sedimentation cylinder 1 from the jet flow pipe 2, the vertical height of the slurry and crushed slag primary sedimentation cylinder 8 in this embodiment is higher than the vertical height of the jet flow hole 21, so that the slurry overflows from the slurry and crushed slag primary sedimentation cylinder 8 to the jet flow hole 21 of the jet flow pipe 2 through gravity and is sprayed out, and it can be understood that a person skilled in the art can also adopt a slurry pump to pump the slurry from the slurry and crushed slag primary sedimentation cylinder 8 to the jet flow pipe 2 to spray out.
Referring to fig. 1 and 7, in one embodiment, there is provided a cleaning control system of a wafer wire-cutting slurry filter apparatus, including:
the mud flow meter 6 is used for detecting the flow of the mud filtered by the sedimentation cylinder 1, and particularly, the mud flow meter 6 can be an ultrasonic flow meter and can accurately realize real-time monitoring of the flow under a non-contact condition;
the vibrator 4 is used for driving the filter screen 31 to vibrate;
a processor 7 comprising a control module 71 and a judgment module 72;
the control module 71 is electrically connected with the vibrator 4 and used for controlling the on-off of the vibrator 4, the judging module 72 is connected with the mud flow meter 6 and used for judging whether the flow of the mud filtered by the sedimentation cylinder 1 is smaller than a preset flow threshold value or not, when the flow measured by the mud flow meter 6 is smaller than the preset flow threshold value, the control module 71 controls the vibrator 4 to be started, the scraps blocking the filter screen 31 are vibrated down, the automatic cleaning and maintenance of the filter screen 31 are realized, the maintenance cost is reduced, the times for manually disassembling and cleaning the filter screen 31 are reduced, the passive psychology of frequent cleaning and maintenance of workers is avoided, the maintenance time is reduced, and the production efficiency is improved.
In one embodiment, there is provided a cleaning control system of a wafer wire cutting slurry filtering apparatus, including:
the mud flow meter 6 is used for detecting the flow of the mud filtered by the sedimentation cylinder 1;
the clean water valve 5 is arranged on a cleaning water inlet formed in the deposition cylinder 1 and is used for controlling cleaning liquid to enter from the cleaning water inlet;
a processor 7 comprising a control module 71 and a judgment module 72;
the control module 71 is electrically connected with the clean water valve 5 and used for controlling the on-off of the vibrator 4, the judging module 72 is connected with the mud flow meter 6 and used for judging whether the flow of the mud filtered by the deposition cylinder 1 is smaller than a preset flow threshold value or not, when the flow measured by the mud flow meter 6 is smaller than the preset flow threshold value, the control module 71 controls the clean water valve 5 to be opened, the fragments blocking the filter screen 31 are cleaned by clean water introduced into the deposition cylinder 1, the automatic cleaning and maintenance of the filter screen 31 are realized, the maintenance cost is reduced, the times for manually disassembling and cleaning the filter screen 31 are reduced, the passive psychology of frequent cleaning and maintenance of staff is avoided, the maintenance time is shortened, and the production efficiency is improved.
In order to facilitate the introduction of the cleaning liquid into the cylinder 11 for cleaning, the cleaning opening 15 is disposed on one side of the filtering portion 111, and the cleaning opening 15 is close to the upper end of the guiding inclined surface 112, so that the cleaning liquid introduced from the cleaning opening 15 impacts the filtering assembly 3 disposed on the filtering portion 111, the dropping of the dirt on the surface of the filtering assembly 3 is accelerated, and the cleaning effect is improved.
Specifically, the vibrator 4 and the clean water valve 5 are arranged simultaneously in the embodiment, so that the effect and efficiency of cleaning the filter assembly 3 are further improved.
In conclusion, the sedimentation cylinder 1 is arranged, when the jet pipe 2 injects the slurry into the inner cavity, larger slurry debris is deposited at the bottom of the sedimentation cylinder 1 under the action of gravity, so that the stress, abrasion and debris filtering quantity of the filter screen 31 are reduced, and the service life of the filter screen 31 is prolonged;
the sedimentation cylinder 1 is isolated by the filter component 3 to form an inner cavity and an outer cavity, and the jet hole 21 of the jet pipe 2 for injecting the slurry is arranged in the inner cavity, so that the pressure of the inner cavity of the sedimentation cylinder 1 is greater than the pressure of the outer cavity to form a pressure difference in the process of continuously injecting the slurry into the inner cavity by the jet pipe 2, the slurry in the inner cavity is automatically filtered by the filter screen 31 and flows to the outer cavity, the effective filtration of the slurry is realized, and the slurry filtration efficiency is improved;
in the filtering process, the fragments are easily adsorbed on the net surface of the filter net 31, and when the fragments are accumulated to a certain amount, the filter net 31 is easily blocked, so that the filtering effect of the filter net 31 is reduced, and the filtering efficiency is influenced.
In the description of the present invention, it should be noted that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention.
In addition, the terms "first", "second", and the like are employed in the present invention to describe various information, but the information should not be limited to these terms, which are used only to distinguish the same type of information from each other. For example, "first" information may also be referred to as "second" information, and similarly, "second" information may also be referred to as "first" information, without departing from the scope of the present invention.
The above description is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, various modifications and substitutions can be made without departing from the technical principle of the present invention, and these modifications and substitutions should also be regarded as the protection scope of the present invention.
Claims (10)
1. A wafer wire-electrode cutting mud filter equipment characterized by, includes:
the sedimentation cylinder is used for settling slurry and slag, and is provided with a slurry outlet;
the filter assembly is arranged in the deposition cylinder, the deposition cylinder is isolated by the filter assembly to form an inner cavity and an outer cavity, the slurry outlet, the outer cavity and the inner cavity are sequentially communicated, the filter assembly comprises at least one layer of filter screen, and the screen surface of the filter screen is obliquely arranged with the vertical direction;
and the jet pipe is provided with jet holes, and the jet holes are accommodated in the inner cavity so as to inject slurry into the inner cavity.
2. The wafer linear cutting slurry filtering device according to claim 1, wherein the deposition cylinder comprises a cover body and a cylinder body, the upper end of the cylinder body is open, the edge of the cover body is bent inwards to form an annular groove with an open upper end, the annular groove is sleeved on the outer side surface of the cylinder body, and the slurry outlet is arranged on one side of the cover body and is sequentially communicated with the annular groove and the cylinder body.
3. The wafer linear cutting slurry filtering device according to claim 1 or 2, wherein the deposition cylinder comprises a filtering portion, the filtering portion is provided with a guiding inclined surface, the guiding inclined surface is inclined from top to bottom to the inner side, and the lower end of the filter screen abuts against the guiding inclined surface.
4. The wafer wire-cutting slurry filtering device according to claim 3, wherein the deposition cylinder comprises a deposition portion provided with a guide slope wall inclined from bottom to top to inside, an upper end of the guide slope wall being connected to a lower end of the guide slope surface.
5. The wafer linear cutting slurry filtering device according to claim 1, wherein a plurality of the spouting holes are formed at a circumferential side of an upper portion of the spouting tube, and the plurality of the spouting holes are arranged along a circumferential direction and an axial direction of the spouting tube.
6. The wafer linear cutting slurry filtering device according to claim 5, further comprising an adjusting sleeve for blocking the jet hole, wherein the adjusting sleeve is sleeved outside the jet pipe and is movable in the axial direction of the jet pipe.
7. The wafer wire cutting mud filter of claim 1, wherein the filter assembly comprises at least two layers of filter screens arranged in a stack, wherein the mesh aperture of the filter screen stacked on the outside is smaller than the mesh aperture of the filter screen stacked on the inside.
8. The wafer linear cutting slurry filtering device according to claim 1 or 7, wherein the filter screen is in a cone-shaped structure, a filter cavity for containing slurry is formed on the inner side of the filter screen, and the jet hole is contained in the filter cavity.
9. A cleaning control system for a wafer line cutting slurry filtration apparatus as recited in any one of claims 1 to 8, comprising:
the mud flow meter is used for detecting the flow of the mud filtered by the sedimentation cylinder;
the vibrator is used for driving the filter screen to vibrate;
the processor comprises a control module and a judgment module;
the control module is electrically connected with the vibrator and used for controlling the on-off of the vibrator, the judging module is connected with the mud flow meter and used for judging whether the flow of the mud filtered by the sedimentation cylinder is smaller than a preset flow threshold value or not, and when the flow measured by the mud flow meter is smaller than the preset flow threshold value, the control module controls the vibrator to start.
10. A cleaning control system for a wafer line cutting slurry filtration apparatus as recited in any one of claims 1 to 8, comprising:
the mud flow meter is used for detecting the flow of the mud filtered by the sedimentation cylinder;
the clean water valve is arranged on a cleaning water inlet formed in the deposition cylinder and used for controlling cleaning liquid to enter from the cleaning water inlet;
the processor comprises a control module and a judgment module;
the control module is electrically connected with the clean water valve and used for controlling the on-off of the vibrator, the judging module is connected with the mud flow meter and used for judging whether the flow of the mud filtered by the deposition cylinder is smaller than a preset flow threshold value or not, and when the flow measured by the mud flow meter is smaller than the preset flow threshold value, the control module controls the clean water valve to open the washing filter screen.
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| CN202010449909.0A CN111514637B (en) | 2020-05-25 | 2020-05-25 | Wafer wire cutting mud filter equipment and clean control system thereof |
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| CN202010449909.0A CN111514637B (en) | 2020-05-25 | 2020-05-25 | Wafer wire cutting mud filter equipment and clean control system thereof |
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| CN111514637B CN111514637B (en) | 2024-03-26 |
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| CN208742842U (en) * | 2018-06-08 | 2019-04-16 | 郑州市金道市政工程有限公司 | A kind of municipal administration depositing dust spraying device |
| CN212594314U (en) * | 2020-05-25 | 2021-02-26 | 广东先导先进材料股份有限公司 | Wafer wire-electrode cutting mud filter equipment and clean control system thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DD271276A1 (en) * | 1988-04-06 | 1989-08-30 | Rostock Dieselmotoren | RECIPE FILTER FOR LIQUID MEDIA |
| CN201366267Y (en) * | 2008-12-05 | 2009-12-23 | 沈忠东 | Tapered net type secondary filter screen for duplex tube blowdown |
| CN201516315U (en) * | 2009-11-04 | 2010-06-30 | 杭州兴源过滤科技股份有限公司 | Full automatic metal filter |
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| CN111514637B (en) | 2024-03-26 |
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