CN111482842A

CN111482842A - Cleaning system and high-precision machining center

Info

Publication number: CN111482842A
Application number: CN202010339889.1A
Authority: CN
Inventors: 李芳�; 杨再文; 邓群力; 蒋更平
Original assignee: Li Ke Electromechanical Equipment Shenzhen Co ltd
Current assignee: Li Ke Electromechanical Equipment Shenzhen Co ltd
Priority date: 2020-04-26
Filing date: 2020-04-26
Publication date: 2020-08-04
Anticipated expiration: 2040-04-26
Also published as: CN111482842B

Abstract

The utility model relates to a cleaning system and high-accuracy machining center, cleaning system includes the base, establish the holding tank on the base, establish the baffle in the holding tank, the through-hole of equipartition on the baffle, the filtering part that input and first part are connected, the water pump that input and filtering part's output are connected and the spray pipe that the output of input and water pump is connected, the baffle divide into two mutually independent first parts and the second part that is located the first part below with the holding tank, the output of spray pipe is used for spraying the washing liquid, wash adnexed metal piece and get off. The high-precision machining center comprises the cleaning system. This application adopts the mode that liquid erodeed to clear up the metal piece, and the clearance is more thorough.

Description

Cleaning system and high-precision machining center

Technical Field

The application relates to the technical field of machining equipment, in particular to a cleaning system and a high-precision machining center.

Background

The high-precision machining center is developed from a numerical control milling machine, and the greatest difference from the numerical control milling machine is that the machining center has the capabilities of automatically exchanging machining tools and multi-axis linkage, and can automatically replace the tools and adjust the posture of a workpiece in one-time machining to finish machining the workpiece.

During the processing, the generated metal scraps can be attached to equipment, and most of the existing treatment methods adopt a pneumatic purging method for treatment. However, the machining process of the high-precision machining center involves a large amount of precision machining, the generated metal scraps are small in size and large in amount, and the purging mode cannot be used for thoroughly removing the metal scraps.

Disclosure of Invention

To overcome the disadvantages of the prior art, a first object of the present application is to provide a cleaning system that can thoroughly clean metal chips in a high-precision machining center.

A second object of the present application is to provide a high precision machining center comprising the above cleaning system.

The first purpose of the application is realized by the following technical scheme:

in a first aspect, the present application provides a cleaning system comprising:

a base;

the accommodating tank is arranged on the base;

the partition plate is arranged in the accommodating groove and divides the accommodating groove into two mutually independent first parts and a second part positioned below the first parts;

the through holes are uniformly distributed on the partition plate;

a filter portion having an input end connected to the first portion;

the input end of the water pump is connected with the output end of the filtering part; and

and the input end of the water spray pipe is connected with the output end of the water pump, and the output end of the water spray pipe is used for spraying cleaning liquid.

Through adopting above-mentioned technical scheme, the washing liquid that uses in the cleaning process can circulate and flow between holding tank, filtering part and spray pipe, and the metal piece that can adhere to on high-accuracy machining center from spray pipe spun washing liquid washes down, and these metal piece that wash down flow back to the holding tank along with the washing liquid, and in the space of baffle below was mostly depositd, another part was filtered by filtering part. Compared with the air pressure purging mode, the liquid flushing mode has the advantages that the impact force is obviously larger, and the cleaning is more thorough.

In a preferred example of the first aspect: a guide pipe is arranged on one side of the partition board facing the bottom of the accommodating groove;

in the direction away from the partition, the cross-sectional area of the duct tends to decrease;

each conduit is in communication with the through-hole.

By adopting the technical scheme, the probability that the metal scraps below the partition plate return to the space above the partition plate again can be reduced.

In a preferred example of the first aspect: an electromagnet is arranged in the base and located below the bottom surface of the accommodating groove.

Through adopting above-mentioned technical scheme, the electro-magnet can be with iron fillings absorption on the bottom surface of holding tank, further reduces metal fillings's in the washing liquid content.

In a preferred example of the first aspect, the filtering portion includes:

a filter box;

the first partition plate and the second partition plate are arranged in the filter box, the filter box is divided into an inflow part, an outflow part and a sedimentation part which are mutually independent, and the inflow part is positioned between the outflow part and the sedimentation part;

the centrifugal separator is arranged in the filter box, the input end of the centrifugal separator is communicated with the inflow part, the liquid output end is communicated with the outflow part, and the solid outflow end is communicated with the sedimentation part;

the outflow part is also connected with the input end of the water pump.

Through adopting above-mentioned technical scheme, the metal piece in the washing liquid can separate in centrifugal separator, and the metal piece of separation falls in the sediment part, and the washing liquid through the separation is followed the outflow, can further reduce the content of metal piece in the washing liquid like this.

In a preferred example of the first aspect: the centrifugal separators are distributed in the filter box uniformly, and the number of the centrifugal separators is multiple.

By adopting the technical scheme, the method has the advantages that,

the multiple centrifugal separators simultaneously carry out solid-liquid separation on the cleaning liquid, so that the treatment efficiency can be improved, and the separation effect can be improved.

In a preferred example of the first aspect: the outflow part is provided with a secondary filtering area, and a plurality of electromagnet plates are arranged in the secondary filtering area at intervals;

the electromagnet plate is parallel to the flow direction of the liquid in the outflow part, and the liquid in the outflow part flows into the water pump after flowing through the electromagnet plate.

Through adopting above-mentioned technical scheme, the metal piece that the electro-magnet board can be in the washing liquid adsorbs on its surface, can play the effect that reduces metal piece content in the washing liquid.

In a preferred example of the first aspect: a conical guide pipe is arranged on the bottom surface of the secondary filtering area, and a drain valve is arranged on the conical guide pipe;

the cross-sectional area of the tapered conduit tends to decrease in a direction away from the secondary filtration zone.

Through adopting above-mentioned technical scheme, can clear up out the metal piece that adsorbs on the electromagnetism iron sheet among the cleaning process through the blowoff valve.

The second purpose of the present application is achieved by the following technical solutions:

in a second aspect, the present application provides a high precision machining center comprising any one of the cleaning systems as described in the first aspect.

Through adopting above-mentioned technical scheme, the metal piece that produces in the course of working can wash through the washing liquid, and the in-process that washes, the washing liquid can be at holding tank, filtering part and spray pipe between the circulation flow, can wash down the metal piece that adheres to on high-accuracy machining center from spray pipe spun washing liquid, and these metal pieces that wash down flow to the holding tank along with the washing liquid in back, in the space of baffle below is mostly deposited, another part is filtered by filtering part. Compared with the air pressure purging mode, the liquid flushing mode has the advantages that the impact force is obviously larger, and the cleaning is more thorough.

To sum up, the beneficial technical effect of this application does:

1. the cleaning liquid used in the cleaning process can flow circularly among the holding tank, the filtering part and the water spray pipe, the cleaning liquid sprayed out from the water spray pipe can wash off metal debris attached to the high-precision machining center, after the metal debris washed off flows into the holding tank along with the cleaning liquid, most of the metal debris is deposited in a space below the partition plate, and the other part of the metal debris is filtered by the filtering part. Compared with the air pressure purging mode, the liquid flushing mode has the advantages that the impact force is obviously larger, and the cleaning is more thorough.

2. The metal debris in the cleaning liquid can be separated in the centrifugal separator, the separated metal debris falls into the settling part, and the separated cleaning liquid flows out from the outflow part, so that the content of the metal debris in the cleaning liquid can be further reduced.

3. The electromagnet plate can adsorb metal fragments in the cleaning liquid on the surface of the electromagnet plate, and can play a role in reducing the content of the metal fragments in the cleaning liquid.

Drawings

Fig. 1 is a schematic perspective view of a high-precision machining center provided in an embodiment of the present application.

Fig. 2 is a schematic perspective view of a cleaning system according to an embodiment of the present disclosure.

Fig. 3 is a schematic cross-sectional view of a base according to an embodiment of the present application.

Fig. 4 is a schematic perspective view of a partition provided in an embodiment of the present application.

Fig. 5 is a schematic structural view of the bottom surface of the base shown in fig. 3.

Fig. 6 is a schematic view of an internal structure of a filtering portion according to an embodiment of the present disclosure.

Fig. 7 is a schematic view of the internal structure of the filtering portion based on fig. 6, in which the viewing angle is adjusted.

Fig. 8 is a perspective view of a centrifugal separator according to an embodiment of the present disclosure.

In the figure, 11, a base, 12, a containing groove, 13, a partition plate, 14, a through hole, 16, a water pump, 17, a water spray pipe, 111, an electromagnet, 121, a first part, 122, a second part, 131, a conduit, 2, a filtering part, 21, a filtering box, 22, a first partition plate, 23, a second partition plate, 24, a centrifugal separator, 211, an inflow part, 212, an outflow part, 213, a settling part, 214, a secondary filtering area, 215, an electromagnet plate, 216, a conical conduit, 217, a drain valve, 241, an input end, 242, a liquid output end, 243, a solid outflow end, 601, a machine body, 602, a closed door, 603, a workbench, 604 and a processing part.

Detailed Description

Embodiments of the present application will be described in further detail below with reference to the accompanying drawings.

Referring to fig. 2 and 3, a cleaning system is disclosed in an embodiment of the present application, which is integrated in a high-precision machining center for cleaning metal chips in the high-precision machining center after a workpiece is machined, after the workpiece is finished, or according to a use specification. For convenience of description, a surface adjacent to or bonded to the reference surface is a bottom surface, a surface opposite to the bottom surface is a top surface, and the remaining surfaces are side surfaces, based on a state in use.

The cleaning system mainly comprises a base 11, a partition plate 13, a water pump 16, a water spraying pipe 17 and the like, wherein a containing groove 12 is formed in the top surface of the base 11 and used for containing part of cleaning liquid and metal debris. A partition plate 13 is installed in the accommodating groove 12, the partition plate 13 is parallel to the bottom surface of the accommodating groove 12, the edge of the partition plate 13 is fixedly connected with the side wall of the adjacent accommodating groove 12, the accommodating groove 12 is divided into two mutually independent parts, namely a first part 121 and a second part 122, wherein the first part 121 is positioned above the second part 122.

The partition 13 is provided with through holes 14, so that the metal debris in the cleaning liquid flowing into the first portion 121 can fall into the second portion 122 through the through holes 14 under the action of gravity.

The function of the filter part 2 is to remove the metal debris in the cleaning liquid for the second time, and it should be understood that the cleaning liquid is recycled in the cleaning process, and the precipitation mode can remove the metal debris with large volume, but the metal debris with small volume still flows along with the cleaning liquid circulation, so the secondary removal is needed.

The power of the cleaning liquid circulating flow is provided by a water pump 16, the input end of the water pump 16 is connected with the filtering part 2, the output end is connected with a spray pipe 17, and the cleaning liquid in the filtering part 2 is pumped out in the working process and then is injected into the spray pipe 17 after being pressurized. The water spray pipe 17 is positioned in the high-precision machining center, and when the cleaning machine is used, the cleaning liquid is sprayed out from the water spray pipe 17 to wash metal chips attached to the high-precision machining center.

When cleaning the machining center with high precision, a sufficient amount of cleaning liquid is poured into the housing tank 12, and the cleaning liquid flows into the filter portion 2 by gravity to fill the filter portion 2. The water pump 16 is first started to pump out the cleaning liquid in the filtering part 2, and the cleaning liquid is injected into the water spray pipe 17 after being pressurized, and the cleaning liquid in the water spray pipe 17 is sprayed from the water spray pipe 17 to the high-precision machining center to wash the metal chips adhered to the surface thereof.

In the washing process, the washing liquid circulates among the holding tank 12, the water pump 16, the filter part 2 and the water spray pipe 17, and the washing liquid has a certain impact force and can wash down the attached metal debris. After the mixture of the cleaning liquid and the metal debris flows into the holding tank 12, a part of the metal debris falls by gravity into the first portion 121 above the partition plate 13 and then falls into the second portion 122 below the partition plate 13 through the through-hole 14. Because the cleaning liquid above the partition plate 13 is flowing continuously, most of the metal debris on the partition plate 13 will fall into the second portion 122 below the partition plate 13 through the through holes 14 under continuous flushing.

The cleaning liquid above the partition plate 13 flows into the filter portion 2 by gravity, is filtered by the filter portion 2, flows into the water pump 16, and is then fed back into the water jet pipe 17.

It will be appreciated that the density of the metal chips is much greater than that of the cleaning liquid, and the metal chips always tend to move in the same direction as the direction of gravity, i.e. have a tendency to settle, under the action of gravity, and a relatively good settling effect can be obtained when the speed of the metal chips in the direction of the flow of the cleaning liquid is relatively slow.

Since the lower the outflow speed of the cleaning liquid from the storage tank 12, the less the amount of the metal debris flowing into the filter portion 2, the water pump 16 is installed at the output end of the filter portion 2, which can reduce the flow rate of the cleaning liquid from the storage tank 12 and thus the amount of the metal debris flowing into the filter portion 2.

In some possible implementations, the sprinkler pipe 17 is a universal sprinkler pipe, and the shape of the sprinkler pipe can be adjusted at will, and the shape cannot be changed automatically after the adjustment. During the use, can wash through the posture of adjusting spray pipe 17, compare with the mode of holding, this kind of washing mode obvious operation is more convenient.

Referring to fig. 4, as an embodiment of the cleaning system provided by the application, a conduit 131 is additionally provided on the partition 13, the conduit 131 is located on one side of the partition 13 close to the bottom surface of the holding tank 12, the cross-sectional area of the conduit 131 tends to decrease in the direction away from the partition 13, that is, the flow area of the conduit 131 gradually decreases in the direction close to the bottom surface of the holding tank 12.

The number of the guide tubes 131 is plural, and each guide tube 131 is communicated with one or more through holes 14. The metal chips above the partition plate 13 sequentially pass through the through-hole 14 and the duct 131 and fall into the second portion 122.

It will be appreciated that during cleaning, the second portion 122 is filled with cleaning fluid and this portion of cleaning fluid is in motion, so that some small volume of metal debris falling into the second portion 122 is still in motion, with some chance of returning to the first portion 121 above the partition 13.

After the conduit 131 is added, the metal debris in the second portion 122 may collide with the outer wall of the conduit 131 during the moving process, that is, the conduit 131 can perform an intercepting function, so as to reduce the probability of the metal debris entering the first portion 121.

In some possible implementations, the minimum flow area of the conduit 131 is smaller than the flow area of the through-hole 14 in communication therewith.

Referring to fig. 3 and 5, as an embodiment of the cleaning system provided by the application, an electromagnet 111 is additionally arranged on the base 11, and the electromagnet 111 is located below the bottom surface of the accommodating tank 12. During the cleaning process, the magnet 111 works and generates a stable magnetic field to attract the metal debris in the second portion 122 to the bottom surface of the accommodating groove 12, thereby further reducing the probability of the metal debris entering the first portion 121.

In some possible implementations, the electromagnet 111 is located on the bottom surface of the base 11.

In other possible implementations, a mounting slot is provided on the bottom surface of the base 11, and the electromagnet 111 is located in the mounting slot.

Referring to fig. 6 and 7, as an embodiment of the cleaning system provided by the application, the filtering portion 2 mainly includes a filtering tank 21, a first partition 22, a second partition 23, a centrifugal separator 24, and the like, wherein the first partition 22 and the second partition 23 are both located in the filtering tank 21, and divide a space in the filtering tank 21 into three mutually independent portions, i.e., an inflow portion 211, an outflow portion 212, and a settling portion 213, and the inflow portion 211 is located between the outflow portion 212 and the settling portion 213.

Referring to fig. 8, the centrifugal separator 24 is located in the filter box 21 and has an input end 241, a liquid output end 242 and a solids outlet end 243, the input end 241 communicating with the inflow portion 211, the liquid output end 242 communicating with the outflow portion 212, and the solids outlet end 243 communicating with the settling portion 213.

After the cleaning liquid containing the metal debris flows into the centrifugal separator 24, the metal debris and the cleaning liquid are separated by centrifugal force, the metal debris enters the settling portion 213 through the settling portion 213, and the separated cleaning liquid enters the outflow portion 212 through the liquid outlet end.

It will be appreciated that the weight per unit volume of metal debris is greater than the weight per unit volume of cleaning fluid, and that the kinetic energy per unit volume of metal debris is greater for the same speed of movement. After entering the centrifugal separator 24, the movement of the two becomes circular movement, under the action of centrifugal force, the metal debris can move towards the direction close to the inner wall of the centrifugal separator 24, the two contact and generate friction, the kinetic energy of the metal debris is converted into heat energy, and the movement speed is reduced.

The metal chips, after having been slowed down, slide along the inner wall of the centrifugal separator 24 towards the solids outflow end and finally fall into the settling section 213, while the cleaning liquid flows out of the liquid outlet end into the outflow section 212.

Further, the number of the centrifugal separators 24 in the filter tank 21 is plural, and the mixture of the cleaning liquid and the metal debris flowing into the filter tank 21 is separated at the same time.

In some possible implementations, the plurality of centrifugal separators 24 are arranged in a matrix of MxN, where M and N are both natural numbers greater than zero.

Referring to fig. 6 and 7, a secondary filtering area 214 is further added to the outflow portion 212, a plurality of electromagnet plates 215 are installed in the secondary filtering area 214, the electromagnet plates 215 are parallel to each other and spaced apart from each other, and the cleaning solution in the outflow portion 212 flows into the water pump 16 after passing through gaps between the electromagnet plates 215.

It should be understood that even after separation by the centrifugal separator 24, there may be some residual metal debris in the cleaning liquid, since the centrifugal separator 24 does not achieve one hundred percent separation. When the washing liquid flows through the electromagnet plate 215, the remaining metal debris is adsorbed on the electromagnet plate 215.

When the electromagnet plate 215 is energized, the metal debris can adhere to the surface thereof, but when the electromagnet plate 215 is de-energized, the metal debris slides downward under the force of gravity and eventually moves to the bottom surface of the secondary filter area 214. In one embodiment of the cleaning system provided by the application, a tapered conduit 216 is mounted to the bottom surface of the secondary filtration zone 214, and a blow-down valve 217 is mounted to the tapered conduit 216.

Typically, the blow-down valve 217 is closed and when cleaning is required, the blow-down valve 217 is opened and metal debris collected on the bottom surface of the secondary filtration zone 214 can flow out of the blow-down valve 217 by gravity.

The tapered conduit 216 is used because the blow-down valve 217 does not require a large gauge valve and therefore requires a transition using a tapered conduit 216 so that a small gauge blow-down valve 217 can be used.

In some possible implementations, the secondary filter area 214 is not bottom-sided, i.e., the larger flow area end of the tapered conduit 216 is in direct communication with the sidewall of the secondary filter area 214, so that metal debris that flows down the electromagnet plate 215 can directly fall onto the inner wall of the tapered conduit 216 and then continue to flow downward under the influence of gravity.

It will be appreciated that the cleaning liquid in the secondary filter area 214 is in a process flow state during cleaning, and therefore there is a certain chance that metal debris adsorbed on the electromagnet plate 215 will fall off, and when falling into the tapered conduit 216, will fall under the action of gravity to the blow-off valve 217.

It will also be appreciated that the cleaning liquid in the tapered conduit 216 is in a relatively stable condition compared to the secondary filter zone 214 and that metal debris falling into this region will move closer to the blow-off valve 217 rather than entering the pump 16 with the flowing cleaning liquid.

Referring to fig. 1, an embodiment of the present application further discloses a high-precision machining center, which mainly includes a machine body 601, a closing door 602, a workbench 603, and a machining portion 604, wherein the workbench 603 and the machining portion 604 are both located in a space inside the machine body 601 for machining a workpiece, the closing door 602 is slidably connected to the machine body 601, and the space inside the machine body 601 is closed during a production process, so that the workpiece can be machined in a relatively stable environment.

The high-precision machining center includes the cleaning system described in any of the above embodiments and embodiments.

In some possible implementations, the holding tank 12 is installed in the machine body 601 and located below the workbench 603 and the processing portion 604, one end of the water spraying pipe 17 extends into the machine body 601, and when cleaning, the space in the machine body 601, the workbench 603, the processing portion 604 and the like are washed, of course, the washing needs to be performed according to the use regulations, and for the portion which cannot be washed, the washing should be avoided.

As for other parts of the washing system, it can be integrated directly inside the body 601, or of course, it can be used as an accessory facility, and the parts can be flexibly adjusted according to the requirements of customers, the production capacity, the actual situation of the use place, and the like.

The embodiments of the present invention are preferred embodiments of the present application, and the scope of the present application is not limited by the embodiments of the present application, so: all equivalent changes made according to the structure, shape and principle of the present application shall be covered by the protection scope of the present application.

Claims

1. A cleaning system, comprising:

a base (11);

an accommodating groove (12) provided on the base (11);

a partition plate (13) which is arranged in the accommodating groove (12) and divides the accommodating groove (12) into two mutually independent first parts (121) and a second part (122) which is positioned below the first parts (121);

through holes (14) uniformly distributed on the partition plate (13);

a filter part (2) whose input is connected to the first part (121);

a water pump (16) having an input end connected to an output end of the filtering portion (15); and

and the input end of the water spray pipe (17) is connected with the output end of the water pump (16), and the output end of the water spray pipe is used for spraying cleaning liquid.

2. A cleaning system according to claim 1, wherein: a guide pipe (131) is arranged on one side of the partition plate (13) facing the bottom of the accommodating groove (12);

the cross-sectional area of the duct (131) tends to decrease in a direction away from the partition (13);

each of the conduits (131) communicates with the through-hole (14).

3. A cleaning system according to claim 1, wherein: the base (11) is provided with an electromagnet (111), and the electromagnet (111) is positioned below the bottom surface of the accommodating groove (12).

4. A washing system according to any one of claims 1-3, characterized in that the filter part (2) comprises:

a filter box (21);

the first partition plate (22) and the second partition plate (23) are arranged in the filter box (21) and divide the filter box (21) into an inflow part (211), an outflow part (212) and a sedimentation part (213) which are independent from each other, and the inflow part (211) is positioned between the outflow part (212) and the sedimentation part (213);

a centrifugal separator (24) provided in the filter tank (21), an input end of which communicates with the inflow section (211), a liquid output end of which communicates with the outflow section (212), and a solid outflow end of which communicates with the settling section (213);

the outflow portion (212) is also connected to an input of the water pump (16).

5. A cleaning system according to claim 4, wherein: the centrifugal separators (24) are distributed in the filter box (21) in a plurality of numbers.

6. A cleaning system according to claim 4, wherein: a secondary filtering area (214) is arranged on the outflow part (212), and a plurality of electromagnet plates (215) are arranged in the secondary filtering area (214) at intervals;

the electromagnet plate (215) is parallel to the flow direction of the liquid in the outflow part (212), and the liquid in the outflow part (212) flows into the water pump (16) after flowing through the electromagnet plate (215).

7. A cleaning system according to claim 6, wherein: a conical guide pipe (216) is arranged on the bottom surface of the secondary filtering area (214), and a drain valve (217) is arranged on the conical guide pipe (216);

the cross-sectional area of the tapered conduit (216) tends to decrease in a direction away from the secondary filtration zone (214).

8. A high-precision machining center, characterized by comprising a cleaning system according to any one of claims 1 to 7.