CN111479375B - Surface coupling induced ionization technology and corresponding plasma and plasma device - Google Patents

Surface coupling induced ionization technology and corresponding plasma and plasma device Download PDF

Info

Publication number
CN111479375B
CN111479375B CN202010383599.7A CN202010383599A CN111479375B CN 111479375 B CN111479375 B CN 111479375B CN 202010383599 A CN202010383599 A CN 202010383599A CN 111479375 B CN111479375 B CN 111479375B
Authority
CN
China
Prior art keywords
modulation
distribution
electromagnetic waves
plasma
target molecules
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202010383599.7A
Other languages
Chinese (zh)
Other versions
CN111479375A (en
Inventor
张麟德
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
High Dimensional Plasma Source Technology Xiaogan Co ltd
Original Assignee
High Dimensional Plasma Source Technology Xiaogan Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by High Dimensional Plasma Source Technology Xiaogan Co ltd filed Critical High Dimensional Plasma Source Technology Xiaogan Co ltd
Priority to CN202010383599.7A priority Critical patent/CN111479375B/en
Publication of CN111479375A publication Critical patent/CN111479375A/en
Application granted granted Critical
Publication of CN111479375B publication Critical patent/CN111479375B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

Abstract

The invention discloses a surface coupling induced ionization technology, which comprises any one of the following steps: (1) Feeding a first beam of electromagnetic waves through free space or a waveguide onto the material, exciting a surface plasmon wave; target molecules to be ionized are introduced to the surface of the material, and electrons of the target molecules are coupled with surface plasmon polaritons on the material through control interaction to induce the target molecules to be ionized; (2) Synchronously passing through a free space or a waveguide, and feeding a second beam and subsequent electromagnetic waves into an ionization region of target molecules on the surface of the material, so that the ionized target molecules are absorbed, and the ionization degree of the target molecules is improved; (3) Target molecules are released in the form of bulk plasma, and surface coupling induced ionization is realized. The invention also discloses a plasma device.

Description

Surface coupling induced ionization technology and corresponding plasma and plasma device
Technical Field
The present invention relates to the field of material science and electronic devices, and more particularly to plasma and ionization. Furthermore, the invention relates to a series of plasma devices involving the above plasma.
Background
Plasma (Plasma), i.e. the state of a gaseous molecule formed after further ionization under the action of an external field or heat. There are many common plasmas in life, including an arc formed when high-temperature flame in a combustion environment and high-voltage discharge break down air, and a colorful neon lamp at the street, the street and the tail. The technology of converting gaseous molecules into plasma, namely Ionization technology (Ionization), is widely applied in various fields of three-waste treatment, rubber recovery, material synthesis, material surface modification, detection and analysis and the like.
The ionization conditions of different forms of plasma vary, but most commonly, plasmas are formed under negative pressure or vacuum. One of the typical ionization modes under vacuum or negative pressure is glow discharge. The glow discharge is just to pump a certain negative pressure (generally less than 10 mbar) in the pipelines of various gases, and then discharge to the vacuum tube through two flat electrodes to ionize the gases and form glow plasma. If the high-frequency jet flow is used for replacing direct current, the radio-frequency plasma based on the capacitive coupling between the flat-plate electrodes can be further obtained. Conventional plasmas under negative pressure or vacuum also include corona discharge, arc breakdown discharge, dielectric barrier discharge, and the like. But most require a negative pressure environment to operate.
Vacuum or negative pressure environments often limit the application of plasmas, and therefore a great deal of research is being undertaken to achieve ionization in atmospheric environments. Common atmospheric ionization techniques include electron bombardment ionization, radio frequency ionization, arc ionization, inductively coupled ionization, electrospray ionization, laser-induced ionization, and the like. Among them, the mainstream methods enough to form the atmospheric pressure plasma are mainly two methods, namely arc ionization and inductively coupled ionization. The atmospheric pressure plasma realized by the two methods is widely applied in various fields, including garbage treatment, material smelting, surface coating, instrument analysis and the like, and is fruitful in some specific applications. For example, an arc plasma torch has been used as the most effective tool for complex-component garbage treatment, and an inductively coupled plasma torch (ICP) is combined with an ICP-OES for spectroscopic analysis or an ICP-MS for a subsequent mass spectrometry system, which is the most common key instrument for detecting the content of various elements at present, and the detection limit can reach ppb level or even ppt level. For atmospheric pressure plasma, the application of which is possible depends on the adjustable range of the electron temperature and the ion temperature of the plasma, more directly, the adjustable range of the energy density in the plasma; the value of the application depends on the energy feedback efficiency when the plasma is formed.
For commercial application of atmospheric pressure plasma, the biggest problem is the low energy feeding efficiency. For example, in the case of an arc plasma, once the arc is formed, the voltage across the electrodes drops rapidly, resulting in a subsequent drop in energy density in the plasma. For inductively coupled plasma, spark ignition is always required to form an initial gas ionization part, so that energy can be fed into ionized gas through alternating magnetic field coupling established in an alternating current coil to further form a torch, and the impedance characteristic of the plasma itself becomes an object directly influencing the coupling efficiency.
In summary, there is a need in the art for a new ionization technology that can realize an atmospheric pressure plasma with higher energy feedback efficiency, wider adjustable temperature range of electron temperature and ion temperature, and higher energy density, thereby deepening the exploitation of the existing application field and further widening other applications of the plasma.
Disclosure of Invention
In view of the above, the present invention provides a surface-coupled induced ionization technique with superior performance, and a plasma device corresponding thereto.
In one aspect, the present invention provides a technical method for surface coupling induced ionization, comprising:
feeding a first beam of electromagnetic waves to the material through free space or a waveguide, so that the first beam of electromagnetic waves resonates with surface plasma of the material and excites the surface plasma waves. Meanwhile, target molecules to be ionized are introduced to the surface of the material, and the electrons of the target molecules are coupled with surface plasmon polaritons on the material by controlling the interaction between the surface of the material and the target molecules, so that the target molecules are induced to be ionized. Synchronously, the second beam and the subsequent electromagnetic waves are fed into the ionization region of the target molecules on the surface of the material through the free space or the waveguide, so that the ionized target molecules are absorbed, and the ionization degree of the target molecules is improved. Finally, the target molecules are released in the form of bulk plasma, and surface coupling induced ionization is realized.
Further, the material forms include solids and liquids. Wherein, the solid form comprises one or more of film, particle, powder, aerosol, photonic crystal and gas-solid two-phase flow; the liquid form comprises one or more of liquid drops, dispersion liquid and gas-liquid two-phase flow.
Further, the size of the material is 0.3nm-1000mm.
Further, the material comprises one or more of metal and alloy materials, carbon materials, ceramic materials, organic conductor materials and semiconductor materials.
Further, the metal and alloy material includes one or more of metals or alloys containing lithium, beryllium, boron, carbon, sodium, magnesium, aluminum, silicon, phosphorus, sulfur, scandium, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, gallium, germanium, arsenic, rubidium, strontium, yttrium, zirconium, niobium, molybdenum, technetium, ruthenium, rhodium, palladium, silver, cadmium, indium, tin, antimony, tellurium, cesium, barium, hafnium, tantalum, tungsten, rhenium, osmium, iridium, platinum, gold, mercury, thallium, lead, bismuth, polonium, francium, radium, lanthanides, actinides.
Further, the carbon material includes one or more of graphene, aminated graphene, carboxylated graphene, hydroxylated graphene, sulfhydrylated graphene, oxidized graphene, methylated graphene, trifluoromethylated graphene, octadecylated graphene, fluorinated graphene, iodinated graphene, artificial graphite, natural graphite, graphitized carbon microspheres, graphitized carbon nanotubes, glassy carbon, amorphous carbon, carbon nanohorns, carbon fibers, carbon quantum dots, and carbon molecular sieves.
Further, the ceramic material comprises one or more of oxide ceramic, silicate ceramic, nitride ceramic, borate ceramic, phosphate ceramic, carbide ceramic, aluminate ceramic, germanate ceramic and titanate ceramic.
Further, the organic conductor material comprises one or more of polyacetylene, polyarylacetylene, polypyrrole, polyaniline, polythiophene, polyphenylene sulfide, TTF-TCNQ, PEDOT-PSS, tetrathiafulvalene, polyfluorene, polyparaphenylene, polyaromatic hydrocarbon and the like with a continuous conjugated framework.
Further, the semiconductor material comprises one or more of a III-V group semiconductor, a II-VI group semiconductor, a IV group semiconductor, a quantum dot semiconductor and perovskite semiconductor particles.
Further, the first beam of electromagnetic waves is one or more of gamma rays, hard X-rays, soft X-rays, extreme ultraviolet rays, near ultraviolet rays, visible light, near infrared rays, middle infrared rays, far infrared rays, terahertz rays, very high frequency microwaves, ultrahigh frequency microwaves, very high frequency radio waves, intermediate frequency radio waves, low frequency radio waves, very low frequency radio waves, and very low frequency radio waves.
Furthermore, the wavelength and the distribution of the first beam of electromagnetic waves are 0.01 nm-100 km.
Further, the spatial distribution of the first beam of electromagnetic wave comprises one or more of a gaussian beam, a bessel beam, an elli beam, a laguerre-gaussian beam, a cosine-gaussian beam, a marthese beam, a flat-top beam and a vortex beam.
Further, the polarization degree of the first beam of electromagnetic waves is 0.01% -99%.
Further, the polarization mode of the first beam of electromagnetic waves comprises one or more of natural light, partial polarization, linear polarization, circular polarization, elliptical polarization, azimuthal polarization, and radial polarization.
Further, the polarization of the first beam of electromagnetic waves includes S-wave polarization and P-wave polarization.
Furthermore, the orbital angular momentum and the distribution of the first beam of electromagnetic waves are-10- +10.
Furthermore, the phase and the distribution of the first beam of electromagnetic waves are 0-2 pi.
Further, the second and subsequent electromagnetic waves are one or more of gamma rays, hard X-rays, soft X-rays, extreme ultraviolet rays, near ultraviolet rays, visible light, near infrared rays, middle infrared rays, far infrared rays, terahertz, very high frequency microwaves, ultrahigh frequency microwaves, very high frequency radio waves, intermediate frequency radio waves, low frequency radio waves, very low frequency radio waves, and very low frequency radio waves.
Furthermore, the wavelength and the distribution of the second beam and the subsequent electromagnetic waves are 0.01 nm-100 km.
Further, the spatial distribution of the second beam and the subsequent electromagnetic waves comprises one or more of a gaussian beam, a bessel beam, an elli beam, a laguerre-gaussian beam, a cosine-gaussian beam, a marthese beam, a flat-top beam and a vortex beam.
Furthermore, the polarization degree of the second beam and the subsequent electromagnetic waves is 0.01% -99%.
Further, the polarization mode of the second beam and the subsequent electromagnetic waves comprises one or more of natural light, partial polarization, linear polarization, circular polarization, elliptical polarization, azimuthal polarization, and radial polarization.
Further, the polarization of the second beam and the subsequent electromagnetic waves includes S-wave polarization and P-wave polarization.
Furthermore, the orbital angular momentum and the distribution of the second beam and the subsequent electromagnetic waves are-10- +10.
Furthermore, the phase and the distribution of the second beam and the subsequent electromagnetic waves are 0-2 pi.
Further, the target molecule has a molecular weight of 1.0X 10 0 Da-1.0×10 20 Da。
Further, the feeding the first beam of electromagnetic waves to the material in a free space manner specifically includes the following steps: 1S1, modulating the wavelength and distribution of the first beam of electromagnetic wave, spatial distribution, polarization and orbital angular momentum and distribution thereof, phase and distribution thereof and other factors to obtain a first beam of modulated electromagnetic wave; 1S2a, guiding the first beam of modulated electromagnetic wave to match with the wave vector of the surface plasma frequency of the material to obtain wave vector matching modulated electromagnetic wave; 1S3a, injecting the wave vector matching modulation electromagnetic wave into the surface of the material through a free space, and forming a surface plasma wave on the surface of the material.
Further, the wavelength and distribution modulation method in step 1S1 includes one or more of dispersion device modulation, filter device modulation, refractive device modulation, interferometric modulation, absorption modulation, nonlinear optical modulation, and resonant cavity enhancement modulation.
Further, the spatial distribution modulation method in step 1S1 includes one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, and absorption device modulation.
Further, the method for modulating the polarization and orbital angular momentum and the distribution thereof in step 1S1 includes one or more of single-mode cavity modulation, photoelastic modulation, spatial light modulator modulation, mode converter modulation, birefringent device modulation, and polarizer modulation.
Further, the phase and the distribution thereof in step 1S1 may be modulated by one or more of phase shift modulation, birefringence device modulation, and spatial light modulator modulation.
Further, the wave vector matching method in step 1S2a includes one or more of a grating, a photonic crystal, a total internal reflection by a free light coupling prism, a metamaterial device having a dielectric constant less than 1, a multiple attenuation total internal reflection device, a free light coupling waveguide total internal reflection device, a focusing device, and direct matching.
Further, the feeding of the first beam of electromagnetic waves to the material by means of the waveguide specifically comprises the following steps: 1S1, modulating the wavelength and distribution of the first beam of electromagnetic wave, spatial distribution, polarization and orbital angular momentum and distribution thereof, phase and distribution thereof and other factors to obtain a first beam of modulated electromagnetic wave; 1S2b, feeding the first beam of modulated electromagnetic waves into an isolator through a waveguide to obtain a unidirectional first beam of modulated electromagnetic waves; 1S3b, guiding the unidirectional first beam of modulated electromagnetic waves to be matched with the wave vector of the surface plasma frequency of the material to obtain wave vector matched unidirectional modulated electromagnetic waves; and 1S4b, injecting the wave vector matching unidirectional modulation electromagnetic wave into the surface of the material through waveguide, so that the surface of the material forms a surface plasma wave.
Further, the isolator in step 1S2b includes one or more of a waveguide circulator, an optical fiber isolator, a faraday rotator, a coaxial isolator, a strip line isolator, a broadband isolator, a double-section isolator, a microstrip isolator, an attenuator, and a load.
Further, the wave vector matching method in step 1S3b includes one or more methods of direct matching through one or more of a grating, a photonic crystal waveguide, a waveguide coupling prism total internal reflection, a metamaterial waveguide with a dielectric constant less than 1, a multiple attenuation total internal reflection device, a waveguide total internal reflection device, a near field waveguide probe irradiation less than a wavelength.
Further, the step of introducing the target molecules to be ionized to the surface of the material specifically comprises the following steps: 2S1, introducing target molecules into a gas phase environment to obtain target molecules in a gas phase; and 2S2, transferring the target molecules in the gas phase to the surface of the material.
Further, the target molecule in step 2S1 is introduced into a gas phase environment by one or more methods selected from ultrasonic atomization, heating evaporation, vacuum evaporation, direct evaporation, and gas flow entrainment.
Further, the moving to the surface of the material in the step 2S2 includes one or more of optical tweezers displacement, ultrasonic tweezers displacement, mechanical force displacement, air flow loading, vacuum suction displacement, probe pulling displacement, and magnetic force displacement.
Further, the method for controlling the interaction between the surface of the material and the target molecules specifically comprises the following steps: 3S1, controlling the distribution of the material microstructure and the surface electromagnetic field to obtain an adjusted material; 3S2, controlling the state of the target molecule to obtain the adjusted target molecule; and 3S3, combining the modulated material with the regulated target molecule, realizing the interaction control between the surface of the material and the target molecule, and causing the ionization of the target molecule.
Further, the controlling of the material microstructure and the surface electromagnetic field distribution in step 3S1 includes one or more of a method of forming a nanoscale periodic microstructure on a material surface, forming a nanoscale aperiodic microstructure on a material surface, forming a microscale periodic microstructure on a material surface, forming a microscale aperiodic microstructure on a material surface, modulating a material surface functional group structure, modulating a material surface defect state density structure, modulating a material surface doping structure, modulating a material crystal domain size, modulating a material superlattice structure, modulating a material surface voltage, modulating a material surface electric field distribution, modulating a material magnetic domain structure, and modulating a material magnetic field.
Further, the step 3S2 is to control the state of the target molecule, and includes one or more of selecting different excited states by exciting the target molecule with electromagnetic waves, controlling the chemical potential of the target molecule on the material through concentration difference, charging the target molecule through electrostatic introduction, and magnetizing the target molecule through magnetic field introduction.
Further, the feeding of the second beam and the subsequent electromagnetic waves into the ionization region of the target molecule on the surface of the material through the free space comprises the following steps: and 4S1, modulating the wavelength and the distribution thereof, the spatial distribution, the polarization and orbital angular momentum and the distribution thereof, the phase and the distribution thereof and other factors of the second beam and the subsequent electromagnetic waves to obtain a second beam and the subsequent modulated electromagnetic waves. 4S2, guiding the second beam and the subsequent modulated electromagnetic wave to be matched with the plasma frequency of the ionized target molecules to obtain frequency-matched modulated electromagnetic waves; 4S3a, emitting the frequency-matched modulated electromagnetic wave into an ionization region of target molecules on the surface of the material through a free space, so that the ionized target molecules are absorbed, and the ionization degree of the target molecules is improved.
Further, the wavelength and distribution modulation method in step 4S1 includes one or more of dispersion device modulation, filter device modulation, refractive device modulation, interferometric modulation, absorption modulation, nonlinear optical modulation, and resonant cavity enhancement modulation.
Further, the spatial distribution modulation method in step 4S1 includes one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, and absorption device modulation.
Further, the method for modulating the polarization and orbital angular momentum and the distribution thereof in step 4S1 includes one or more of single-mode cavity modulation, photoelastic modulation, spatial light modulator modulation, mode converter modulation, birefringent device modulation, and polarizer modulation.
Further, the phase and the distribution thereof in step 4S1 may be modulated by one or more of phase shift modulation, birefringence device modulation, and spatial light modulator modulation.
Further, the frequency matching method in step 4S2 includes one or more of a dispersion device modulation matching, a filter device modulation matching, a refraction device modulation matching, an interference modulation matching, an absorption modulation matching, a nonlinear optical modulation matching, and a direct incidence.
Further, the method for injecting the ionization region in step 4S3a includes one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, absorption device modulation, and direct injection.
Further, the feeding of the second beam and the subsequent electromagnetic waves into the ionization region of the target molecule on the surface of the material through the waveguide specifically comprises the steps of: 4S1, modulating the wavelength and distribution thereof, spatial distribution, polarization and distribution thereof, orbital angular momentum and distribution thereof, phase and distribution thereof and other factors of the second beam and the subsequent electromagnetic waves to obtain a second beam and subsequent modulated electromagnetic waves; 4S2, guiding the second beam and the subsequent modulated electromagnetic wave to be matched with the plasma frequency of the ionized target molecules to obtain frequency-matched modulated electromagnetic waves; 4S3b, feeding the frequency-matched modulated electromagnetic wave into an isolator through a waveguide to obtain a unidirectional frequency-matched modulated electromagnetic wave; 4S4b, injecting the unidirectional frequency matching modulation electromagnetic wave into an ionization region of the target molecules on the surface of the material through the waveguide, so that the ionized target molecules are absorbed, and the ionization degree of the target molecules is improved.
Further, the isolator in step 4S3b includes one or more of a waveguide circulator, a fiber optical isolator, a faraday rotator, a coaxial isolator, a strip line isolator, a broadband isolator, a double-section isolator, a microstrip isolator, an attenuator, and a load.
Further, the method for injecting the ionization region in step 4S4b includes one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, absorption device modulation, photonic crystal modulation, waveguide modulation injection, and direct injection.
Further, the target molecules are released in the form of bulk plasma, and the method specifically comprises the following steps: 5S1, leading the plasma of the target molecule out of a material surface area to obtain a delocalized plasma; and 5S2, restraining the delocalized plasma in a specific space to obtain higher energy density.
Further, the step 5S1 of extracting the material surface area includes one or more of vacuum suction, air flow delivery, negative pressure extraction, external ground suction, external electromagnetic wave source guiding and external current guiding.
Further, the plasma confinement in step 5S2 includes one or more methods of magnetic field self-hoop confinement, air flow confinement and collision confinement formed by the applied magnetic field confinement, the grounding current.
In another aspect, the invention also provides a plasma device, a plasma in the plasma device, comprising a plasma as described in any one or more of the above. The plasma devices involved include, but are not limited to, sensors, plasma sources, reactors, antennas, motors, and the like.
The invention provides a surface coupling induced ionization technology and a corresponding plasma thereof, wherein the induced ionization technology excites the surface plasma wave of a material through an additional electromagnetic wave and enables the bond energy of target molecules to be weakened through the adsorption of the target molecules on the surface of the material, so that the ionization is easy. Furthermore, after the target molecules are ionized, electromagnetic waves are fed in to maintain the ionized molecules and enhance the ionization degree, stable plasma is formed and is led out of the surface of the material, and therefore the normal-pressure plasma source is formed. Different electromagnetic waves, material types and target molecule types are adjusted, various plasmas can be formed, and various requirements are met. The difficulty of the traditional electromagnetic wave for directly ionizing target molecules to form plasma is greatly reduced, and the target molecules can be adsorbed on the material to enable the material to induce the target molecules to be ionized through surface plasma even if the related target molecules do not have the absorption capacity to the electromagnetic wave with specific wavelength. Through the power proportion adjustment between two bundles of electromagnetic waves, can maximize the energy feedback efficiency in the plasma to form the novel plasma that electron temperature and ion temperature range are extremely wide, and energy density is extremely high. The invention also provides a plasma device related to the surface coupling induced ionization technology and corresponding plasma formation.
Compared with the prior art, the invention provides a novel forming mode of the normal-pressure plasma, and the application value of the normal-pressure plasma is very visual. Typical applications include exciting and observing a suitable high-level excited state by a plasma torch, improving the spectral analysis accuracy of the conventional OES, and reaching the ppt or even higher detection limit; or diamond coating under normal pressure or preparation of other nano powder materials is realized; or the method is used for treating the exhaust gas and the tail gas to realize the aim of harmless treatment of the organic exhaust gas; even for forming a high-energy proton beam target, realizing a miniaturized neutron beam source, and the like, there are various application possibilities.
In conclusion, the invention has the advantages of wide ionization molecular range, high energy feedback efficiency, high energy density and wide electron temperature and ion temperature range, and provides a reliable premise for widening the application of the plasma.
Drawings
Figure 1 is an atmospheric nitrogen plasma torch formed in accordance with the present invention.
FIG. 2 is a flow chart of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention. It should be noted that the embodiments and features of the embodiments may be combined with each other without conflict.
The invention provides a technical method for surface coupling induced ionization, a corresponding plasma and a plasma device.
The technical method for surface coupling induction ionization is characterized in that a material is coupled with surface plasmas on the material through surface interaction between the material and target molecules, so that the target molecules are induced to be ionized and form plasmas.
Compared with the prior art, the inventor innovatively couples the surface plasma of the material with the interaction between the target molecules and the material caused by adsorption for the first time, and further enhances the ionization of the target molecules through electromagnetic waves to form stable plasma. The method greatly reduces the difficulty of forming plasma by target molecules, and can induce the target molecules to be ionized by surface plasma through the adsorption of the target molecules on the material even if the related target molecules do not have the absorption capacity to electromagnetic waves with specific wavelengths.
Based on the concept of the invention, the invention selects a series of materials with different forms, sizes and types as the adsorption medium of target molecules and the carrier of surface plasma.
The material forms comprise solid and liquid. Wherein, the solid form comprises but is not limited to one or more of film, particle, powder, aerosol, photonic crystal and gas-solid two-phase flow; the liquid form includes but is not limited to one or more of liquid drops, dispersion liquid and gas-liquid two-phase flow. The materials with different forms are selected to provide different specific surface areas and microstructures mainly through the different forms, and further additional wave vectors on the materials can be controlled through the forms, so that surface plasma waves can be excited more easily.
The size of the material is 0.3nm-1000mm, preferably 1nm-100um. The material with the size is selected, mainly because in the size range, the surface plasmon is confined on the particle boundary from nanometer to submicron scale, so that the uncertainty of wave vector is great, and therefore, the requirement on the angle of incidence of surface plasmon coupling is reduced, and the wave vector matching is easy to realize.
The material comprises one or more of metal and alloy materials, carbon materials, ceramic materials, organic conductor materials and semiconductor materials. Further, the carbon material includes one or more of defect-free graphene, high-defect graphene, aminated graphene, carboxylated graphene, hydroxylated graphene, sulfhydrylated graphene, oxidized graphene, methylated graphene, trifluoromethylated graphene, octadecylated graphene, fluorinated graphene, iodinated graphene, artificial graphite, natural graphite, graphitized carbon microspheres, graphitized carbon nanotubes, glassy carbon, amorphous carbon, carbon nanohorns, carbon fibers, carbon quantum dots, and carbon molecular sieves. Such materials are selected mainly for their various band gaps, allowing excitation under different excitation conditions, and tend to have good surface plasmon quality factors, and the formed surface plasmons can propagate far, which results in a higher ionization probability of the target molecule.
The technical method of the surface coupling induced ionization is that a first beam of electromagnetic waves is fed to a material through free space or a waveguide, so that the first beam of electromagnetic waves and surface plasma of the material generate resonance and excite the surface plasma waves. Meanwhile, target molecules to be ionized are introduced to the surface of the material, and the electrons of the target molecules are coupled with surface plasmon polaritons on the material by controlling the interaction between the surface of the material and the target molecules, so that the target molecules are induced to be ionized. Synchronously, the second beam and the subsequent electromagnetic waves are fed into the ionization region of the target molecules on the surface of the material through the free space or the waveguide, so that the ionized target molecules are absorbed, and the ionization degree of the target molecules is improved. Finally, the target molecules are released in the form of bulk plasma, and surface coupling induced ionization is realized.
Because the isolation of the incident electromagnetic wave is easily realized through the waveguide, and the damage to the electromagnetic wave source in the working process is avoided, the invention preferably adopts the mode that the first beam of electromagnetic wave, the second beam and the subsequent electromagnetic wave are incident through the waveguide.
Specifically, the method comprises the following steps:
1S1, modulating the wavelength and distribution of the first beam of electromagnetic wave, spatial distribution, polarization and orbital angular momentum and distribution thereof, phase and distribution thereof and other factors to obtain a first beam of modulated electromagnetic wave;
1S2b, feeding the first beam of modulated electromagnetic waves into an isolator through a waveguide to obtain a unidirectional first beam of modulated electromagnetic waves;
1S3b, guiding the unidirectional first beam of modulated electromagnetic waves to be matched with the wave vector of the surface plasma frequency of the material to obtain wave vector matched unidirectional modulated electromagnetic waves;
and 1S4b, injecting the wave vector matching unidirectional modulation electromagnetic wave into the surface of the material through waveguide, so that the surface of the material forms a surface plasma wave.
2S1, introducing target molecules into a gas phase environment to obtain target molecules in a gas phase;
2S2, moving the target molecules in the gas phase to the surface of the material;
3S1, controlling the distribution of the material microstructure and the surface electromagnetic field to obtain an adjusted material;
3S2, controlling the state of the target molecule to obtain the adjusted target molecule;
and 3S3, combining the modulated material with the regulated target molecule to realize the interaction control between the material surface and the target molecule and to cause the ionization of the target molecule.
4S1, modulating the wavelength and distribution thereof, spatial distribution, polarization and distribution thereof, orbital angular momentum and distribution thereof, phase and distribution thereof and other factors of the second beam and the subsequent electromagnetic waves to obtain a second beam and subsequent modulated electromagnetic waves;
4S2, guiding the second beam and the subsequent modulated electromagnetic wave to be matched with the plasma frequency of the ionized target molecules to obtain frequency-matched modulated electromagnetic waves;
4S3b, feeding the frequency-matched modulated electromagnetic wave into an isolator through a waveguide to obtain a unidirectional frequency-matched modulated electromagnetic wave;
4S4b, injecting the unidirectional frequency-matched modulated electromagnetic wave into an ionization region of target molecules on the surface of the material through the waveguide, so that the ionized target molecules are absorbed, and the ionization degree of the target molecules is improved.
5S1, leading the plasma of the target molecule out of a material surface area to obtain a delocalized plasma;
and 5S2, restraining the delocalized plasma in a specific space to obtain higher energy density.
For the characteristics of the incident electromagnetic wave source, ideally an input that achieves maximum power without modulation would be desirable, since whatever type of modulation would cause power loss to the incident electromagnetic wave.
Therefore, by analyzing the beam requirements, it can be known that:
the first beam of electromagnetic waves is one or more of gamma rays, hard X rays, soft X rays, extreme ultraviolet rays, near ultraviolet rays, visible light, near infrared rays, middle infrared rays, far infrared rays, terahertz, extremely high frequency microwaves, ultrahigh frequency microwaves, very high frequency radio waves, intermediate frequency radio waves, low frequency radio waves, very low frequency radio waves, ultrahigh frequency radio waves, and extremely low frequency radio waves, and preferably is soft X rays, extreme ultraviolet rays, near ultraviolet rays, visible light, near infrared rays, middle infrared rays, terahertz, ultrahigh frequency microwaves, and ultrahigh frequency microwaves.
The wavelength and the distribution of the first beam of electromagnetic waves are 0.01 nm-100 km, preferably 10 nm-1 m.
The spatial distribution of the first beam of electromagnetic wave comprises one or more of a Gaussian beam, a Bessel beam, an Airy beam, a Laguel-Gaussian beam, a cosine-Gaussian beam, a Mathieu beam, a flat-top beam and a vortex beam, and the first beam of electromagnetic wave is preferably a Gaussian beam, a Bessel beam, a Laguel-Gaussian beam and a flat-top beam.
The first beam of electromagnetic waves has a polarization degree of 0.01% -99%, preferably 90% -99%.
The polarization mode of the first beam of electromagnetic waves comprises one or more of natural light, partial polarization, linear polarization, circular polarization, elliptical polarization, azimuthal polarization and radial polarization, and linear polarization is preferred.
The polarization of the first beam of electromagnetic waves comprises S wave polarization and P wave polarization, and P wave polarization is preferred.
The orbital angular momentum of the first beam of electromagnetic waves and the distribution thereof are-10 to +10. Preferably ± 1.
The phase and the distribution of the first beam of electromagnetic waves are 0-2 pi.
The second and subsequent electromagnetic waves are one or more of gamma rays, hard X rays, soft X rays, extreme ultraviolet rays, near ultraviolet rays, visible light, near infrared rays, middle infrared rays, far infrared rays, terahertz, extremely high frequency microwaves, ultrahigh frequency microwaves, very high frequency radio waves, intermediate frequency radio waves, low frequency radio waves, very low frequency radio waves, and extremely low frequency radio waves, and preferably near infrared rays, middle infrared rays, far infrared rays, terahertz, extremely high frequency microwaves, ultrahigh frequency microwaves, very high frequency radio waves, and intermediate frequency radio waves.
The wavelength and the distribution of the electromagnetic waves of the second beam and the subsequent beams are 0.01 nm-100 Km, preferably 1um-1Km.
The spatial distribution of the second beam and the subsequent electromagnetic waves comprises one or more of a Gaussian beam, a Bessel beam, an Airy beam, a Laguerre-Gaussian beam, a cosine-Gaussian beam, a Mathieu beam, a flat-top beam and a vortex beam, and the second beam and the subsequent electromagnetic waves are preferably Gaussian beams and flat-top beams.
The polarization degree of the second beam and the subsequent electromagnetic waves is 0.01-99%, preferably 0.01-0.1%.
The polarization mode of the second beam and the subsequent electromagnetic waves comprises one or more of natural light, partial polarization, linear polarization, circular polarization, elliptical polarization, azimuth polarization and radial polarization, and preferably, the polarization mode of the second beam and the subsequent electromagnetic waves is natural light and partial polarization.
The polarization of the second beam and subsequent electromagnetic waves includes S-wave polarization and P-wave polarization.
The second and subsequent electromagnetic waves have an orbital angular momentum and a distribution of-10 to +10, preferably 0.
The second and subsequent electromagnetic waves have a phase and a distribution of 0-2 pi.
In addition, the present inventors found that the absorption levels of the target molecule for the electromagnetic waves before and after ionization are greatly different, so that the electromagnetic waves required before and after ionization are separated, and the utilization rate of the fed electromagnetic waves is maximized. The beam used before ionization is characterized by a specific wavelength and mode at a certain power and by a distribution of energy that is as concentrated as possible, while the beam used after ionization is characterized by a power that is as high as possible to ensure that the process of forming the bulk plasma after ionization is completed as quickly as possible and has a higher excited state.
Therefore, by analyzing the beam requirements, it can be known that:
the method for modulating the wavelength and the distribution thereof in step 1S1 includes one or more of dispersion device modulation, filter device modulation, refraction device modulation, interference modulation, absorption modulation, nonlinear optical modulation, and resonant cavity enhancement modulation, preferably interference modulation, absorption modulation, filter device modulation, and resonant cavity enhancement modulation.
The step 1S1 of the spatial distribution modulation method includes one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, and absorption device modulation, preferably transmission antenna modulation, refraction device modulation, and spatial light modulator modulation.
The method for modulating the polarization and orbital angular momentum and the distribution thereof in step 1S1 includes one or more of single-mode cavity modulation, photoelastic modulation, spatial light modulator modulation, mode converter modulation, birefringence device modulation, and polarizer modulation, preferably single-mode cavity modulation, photoelastic modulation, spatial light modulator modulation, and mode converter modulation.
The phase and distribution modulation method in step 1S1 includes one or more of phase shift modulation, birefringence device modulation, and spatial light modulator modulation, preferably spatial light modulator modulation.
The isolator in step 1S2b includes one or more of a waveguide circulator, a fiber optical isolator, a faraday rotator, a coaxial isolator, a strip line isolator, a broadband isolator, a double-section isolator, a microstrip isolator, an attenuator, and a load, preferably a waveguide circulator, a fiber waveguide circulator, and a fiber optical isolator.
The wave vector matching method in step 1S3b includes one or more of direct matching, preferably waveguide-coupled prism total internal reflection, multiple-attenuation total internal reflection device, waveguide total internal reflection device, irradiation of a near-field waveguide probe smaller than the wavelength, direct matching, and grating, photonic crystal waveguide, waveguide-coupled prism total internal reflection, metamaterial waveguide having a dielectric constant smaller than 1, multiple-attenuation total internal reflection device, waveguide total internal reflection device, irradiation of a near-field waveguide probe smaller than the wavelength, and direct matching.
The method for modulating the wavelength and the distribution thereof in step 4S1 includes one or more of dispersion device modulation, filter device modulation, refractive device modulation, interference modulation, absorption modulation, nonlinear optical modulation, and resonant cavity enhancement modulation, preferably dispersion modulation, and filter device modulation.
The spatial distribution modulation method in step 4S1 includes one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, and absorption device modulation, preferably transmission antenna modulation, variable curvature reflection device modulation, and matrix reflection device modulation.
The method for modulating the polarization, the orbital angular momentum and the distribution thereof in step 4S1 includes one or more of single-mode cavity modulation, photoelastic modulation, spatial light modulator modulation, mode converter modulation, birefringence device modulation and polarizer modulation, preferably spatial light modulator modulation and mode converter modulation.
The phase and distribution modulation method in step 4S1 includes one or more of phase shift modulation, birefringence device modulation, and spatial light modulator modulation, preferably phase shift modulation and spatial light modulator modulation.
The frequency matching method in step 4S2 includes one or more of a dispersion device modulation matching, a filter device modulation matching, a refraction device modulation matching, an interference modulation matching, an absorption modulation matching, a nonlinear optical modulation matching, and a direct incidence, and preferably, the nonlinear optical modulation matching or the direct incidence is performed.
Steps 2S1-2S2 are to vaporize the target molecule to introduce it to the surface of the material, ionizing the target molecule. When the target molecule is gas at normal temperature and normal pressure, the ionization efficiency is highest. In addition, for gas molecules, the non-ionized gas itself can also be used as a carrier gas to carry plasma, so the gas molecules are preferably selected as target molecules.
Accordingly, by analyzing the characteristics of the target molecule, it is found that:
the method for introducing the target molecule into the gas phase environment in the step 2S1 includes one or more of ultrasonic atomization, heating evaporation, vacuum gasification, direct gasification and gas flow carrying, and preferably direct gasification or gas flow carrying.
The moving to the surface of the material in the step 2S2 includes one or more methods of optical tweezers displacement, ultrasonic tweezers displacement, mechanical force displacement, airflow loading, vacuum suction displacement, probe pulling displacement, and magnetic force displacement, and is preferably airflow loading or vacuum suction displacement.
Further, the applicant of the present invention has found that steps 3S1 to 3S3 involve controlling the interaction between the target molecule and the material, so that the target molecule is ionized by the surface plasmon on the surface of the material as much as possible. The process has a large influence on the coupling efficiency, and the stronger the interaction, the more easily the surface plasmon on the surface of the material causes ionization of the target molecule. On the other hand, the simpler the requirements on the processing of the material surface and the regulation conditions for the target molecules are, the easier the implementation is.
In summary, for the conditions used in the process of modulating the interaction, the following should be mentioned:
the control of the material microstructure and the surface electromagnetic field distribution in step 3S1 includes one or more of a method of forming a nanoscale periodic microstructure on a material surface, forming a nanoscale aperiodic microstructure on a material surface, forming a microscale periodic microstructure on a material surface, forming a microscale aperiodic microstructure on a material surface, modulating a material surface functional group structure, modulating a material surface defect state density structure, modulating a material surface doped structure, modulating a material crystal domain size, modulating a material superlattice structure, modulating a material surface voltage, modulating a material surface electric field distribution, modulating a material magnetic domain structure, and modulating a material magnetic field.
The step 3S2 is to control the state of the target molecule, and includes one or more of selecting different excited states by exciting the target molecule with electromagnetic waves, controlling the chemical potential of the target molecule on the material with concentration difference, charging the target molecule with electrostatic induction, magnetizing the target molecule with magnetic field induction, preferably controlling the chemical potential of the target molecule on the material with concentration difference, and selecting different excited states by exciting the target molecule with electromagnetic waves.
Finally, in the process of leading out the plasma, when the target molecules are gas or the plasma is led out by using carrier gas, the most natural leading-out mode and constraint mode, namely gas flow conveying and gas flow constraint, can be found easily. In some environments where it is desirable to introduce a plasma into a vacuum chamber, the plasma may also be drawn into the vacuum chamber by means of vacuum attraction. In addition, when a current is formed inside the plasma, a self-hooping magnetic field is generated due to the magnetic effect of the current, so that the plasma is restrained, and the extracted plasma can be guided by an external electromagnetic wave source, so that the extracted plasma is further enhanced.
Therefore, for the plasma to be formed by extraction and confinement, it should be:
the drawing of the material surface region in step 5S1 includes one or more of vacuum suction, air flow conveyance, negative pressure suction, external ground suction, external electromagnetic wave source guidance, and external current guidance, and is preferably vacuum suction, air flow conveyance, external ground suction, and external electromagnetic wave source guidance.
The plasma confinement in step 5S2 includes one or more methods of magnetic field self-hoop confinement, air flow confinement and collision confinement formed by the ground current through external magnetic field confinement, preferably, the magnetic field self-hoop confinement, the air flow confinement and the collision confinement formed by the ground current.
Compared with the conventional plasma formation process in which energy is directly fed to target molecules to be ionized through electromagnetic waves or other methods, the efficiency of feeding energy to ionized target molecules through electromagnetic waves is much higher, mainly because the maximum absorption efficiency can be achieved through resonance when the frequency of ionized target molecules is matched with the frequency of fed electromagnetic waves. On the other hand, in the conventional plasma formation process, the target molecules to be ionized often have no special absorption capacity for the fed electromagnetic wave, but the material concerned can be made to be nearly fully absorbed by the fed electromagnetic wave by controlling the state of the material on the material. This makes the initial formation of the plasma provided by the present invention much easier than the initial formation of conventional plasmas. In summary, the present invention has the advantages of wide molecular range of ionization, high energy feedback efficiency, high energy density, and wide electron temperature and ion temperature range.
Correspondingly, the invention also provides a plasma device, which comprises the plasma. Because the plasma has the advantages, the plasma device provided with the plasma also has the advantages of wide ionized molecular range, high energy feedback efficiency, high energy density and wide electron temperature and ion temperature range,
the scheme of the invention is further described in the following by reference to specific examples.
Example 1
The first beam of electromagnetic wave uses 1550nm near infrared Gaussian beam, the material used is 30nm gold film, and the material is plated on the end of 1550nm optical fiber. The target molecule ionized is carbon monoxide. The second beam of electromagnetic waves uses a 6um mid-infrared gaussian beam.
The 1550nm near infrared laser beam is emitted from the laser as a Gaussian beam with a polarization degree of 98% and a orbital angular momentum of 0. After the light is emitted, the wavelength distribution is controlled through interference modulation, the spatial distribution is modulated through a refraction device, the polarization distribution is modulated through photoelastic modulation, and the phase is modulated through a spatial light modulator. And after modulation is finished, feeding the optical fiber into the optical fiber isolator by using the polarization maintaining optical fiber as a waveguide, and performing total internal reflection on the optical fiber waveguide to form surface plasma on the surface of the gold film at the tail end of the optical fiber.
Carbon monoxide is conveyed through a steel cylinder, carbon monoxide airflow is obtained through direct gasification, nitrogen is used as carrier gas and conveyed to the surface of the gold film, chemical potential is controlled through concentration difference, and crystal domains are modulated to obtain stronger interaction. After completion, carbon monoxide is adsorbed on the surface of the gold thin film and is further induced by surface plasma on the surface of the gold thin film, causing ionization of carbon monoxide.
The 6um middle infrared laser is emitted by the laser and is a Gaussian beam, the polarization degree is 90%, and the orbital angular momentum is 0. After the light is emitted, the wavelength distribution is modulated and controlled through a filter device, the space and phase distribution is modulated and controlled through a spatial light modulator, and the polarization is modulated through a mode converter. After modulation is finished, the high-power optical fiber is used as a waveguide to be fed into the optical fiber optical isolator, and then the high-power optical fiber is injected into a carbon monoxide ionization area through the optical fiber to form carbon monoxide plasma.
And finally, conveying by nitrogen carrier gas flow, and forming stable atmospheric carbon monoxide plasma by gas flow restriction.
Example 2
The first beam of electromagnetic waves uses a 405nm Bessel beam, the material used is a 1um carbon nanotube, and the material is placed below the prism face. The target molecules ionized are iodine molecules. The second beam of electromagnetic waves uses a 32.75cm microwave gaussian beam.
Blue-violet light with 405nm is emitted by the LED and is a Bessel light beam, the polarization degree is 18%, and the orbital angular momentum is 0. After the light is emitted, the wavelength distribution of the light is modulated and controlled by a dispersion device, the spatial distribution of the light is modulated and modulated by a matrix reflection device, the polarization distribution of the light is modulated by a polaroid, and the phase of the light is modulated by a birefringence device. After modulation is finished, the quartz fiber is used as a waveguide and fed into the fiber waveguide circulator, and the quartz fiber is totally internally reflected by the coupling prism at the tail end of the fiber and is injected into the surface of the carbon nano tube to form surface plasma.
Iodine molecules are evaporated through heat, argon is used as carrier gas and sent to the surface of the carbon nano tube, the iodine molecules on the surface of the carbon nano tube are excited through electromagnetic waves, and the surface of the carbon nano tube is doped and modulated to obtain stronger interaction. After completion, iodine molecules are adsorbed on the surface of the carbon nanotube powder and are further induced by surface plasma on the surface of the carbon nanotube powder, causing ionization of iodine.
The 32.75cm microwave is emitted from a 915Mhz microwave source through a waveguide, is a Gaussian beam, has the polarization degree of 0.01 percent and the orbital angular momentum of 0. After the light is emitted, the wavelength distribution is controlled by a resonant cavity enhanced modulation system, the spatial distribution is controlled by a transmission antenna modulation, the phase distribution is modulated by phase shift modulation, and the polarization is modulated by single-mode cavity modulation. After modulation is finished, the mixture is fed into the system through the waveguide and then is directly injected into the iodine molecule ionization region through the waveguide to form iodine plasma.
And finally, carrying gas flow conveying by argon gas, colliding and constraining to form stable atmospheric carbon monoxide plasma.
Example 3
The first electromagnetic wave used a 12.24cm microwave gaussian beam and the material used was 1mm iron particles, which were placed on a flat surface. The target molecule ionized is oxygen. The second beam of electromagnetic waves uses a 12.24cm microwave gaussian beam.
The microwave of 12.24cm is emitted from a microwave source of 2450Mhz through a waveguide, is a Gaussian beam, has the polarization degree of 0.04 percent and the orbital angular momentum of 0. After the light is emitted, the wavelength distribution is controlled through absorption modulation, the spatial distribution is controlled through a variable curvature reflector, the polarization distribution is modulated through a single-mode cavity, and the phase is modulated through phase shifting. After modulation is finished, feeding iron particles on the flat plate in a free space, and injecting the iron particles into the surface of the iron particles to form surface plasma through direct matching.
Oxygen is conveyed through a steel cylinder, directly gasified and conveyed to the surface of iron particles, air is used as carrier gas, chemical potential is controlled through concentration difference, and the surface voltage of the material is modulated to obtain stronger interaction. Upon completion, oxygen is adsorbed on the surface and further induced by surface plasmons on the surface of the iron particles, causing oxygen ionization.
The microwave of 12.24cm is emitted from a microwave source of 2450Mhz through a waveguide to form a Gaussian beam, the polarization degree is 0.04%, and the orbital angular momentum is 0. After the emergent light is emitted, the wavelength distribution is modulated and controlled through a filter device, the spatial distribution is modulated and controlled through a transmission antenna, the phase distribution is modulated and modulated through a refraction device, and the polarization is modulated and modulated through a mode converter. After modulation, the free space is fed into the system and then is injected into the oxygen ionization region through interference modulation matching to form oxygen plasma.
And finally, pumping out and conveying the plasma through negative pressure to collide and restrain, and forming stable normal-pressure oxygen plasma.
Example 4
The first beam of electromagnetic waves uses a 365nm near ultraviolet Gaussian beam, the used material is 0.2um fluorinated graphene, and the material is placed on a plane. The target molecule ionized is nitrogen trifluoride. The second beam of electromagnetic waves uses a 12.24cm microwave flat-top beam.
365nm near ultraviolet laser is emitted by a laser and is a Gaussian beam, the polarization degree is 92%, and the orbital angular momentum is 0. After the light is emitted, the wavelength distribution is controlled through interference modulation, the spatial distribution is controlled through a spatial light modulator, the polarization distribution is modulated through a mode conversion modulator, and the phase is modulated through a birefringence device. And after modulation is finished, feeding the graphene into a plane through a free space, and injecting the graphene into the surface of the fluorinated graphene to form surface plasma.
And conveying nitrogen trifluoride through a steel cylinder, directly gasifying to obtain nitrogen trifluoride gas flow, conveying the nitrogen trifluoride gas flow to the surface of the fluorinated graphene by taking the nitrogen as carrier gas, charging the nitrogen trifluoride gas by electrostatic introduction, and modulating the electric field distribution on the surface of the fluorinated graphene to obtain stronger interaction. Upon completion, the nitrogen trifluoride is adsorbed on the surface and further induced by surface plasmons on the fluorinated graphene surface, causing the nitrogen trifluoride to ionize.
The microwave of 12.24cm is emitted from a microwave source of 2450Mhz through a waveguide to form a flat-topped beam, the polarization degree is 0.1%, and the orbital angular momentum is 0. After the emergent light is emitted, the wavelength distribution is controlled by enhancing modulation of the resonant cavity, the spatial distribution is controlled by modulating the matrix emitting device, the phase distribution is modulated by modulating the refraction device, and the polarization is modulated by modulating the mode converter. After modulation is finished, the nitrogen trifluoride plasma is fed into the system through the waveguide and then directly injected into a nitrogen trifluoride ionization region through the waveguide to form nitrogen trifluoride plasma.
And finally, pumping out and conveying the nitrogen trifluoride gas by negative pressure, and carrying out gas flow restraint to form stable normal-pressure nitrogen trifluoride plasma.
Example 5
The first electromagnetic wave uses a 980nm near infrared gaussian beam and the material used is 10um glassy carbon, which is placed on a grating. The target molecule ionized is ammonia. The second beam of electromagnetic waves uses a near infrared vortex beam of 1.064 um.
The 980nm near infrared light is emitted by the laser and is a Gaussian beam, the polarization degree is 85%, and the orbital angular momentum is 0. After the emergent light is emitted, the wavelength distribution of the emergent light is modulated and controlled through a filter device, the spatial distribution of the emergent light is modulated and controlled through a refraction device, the polarization distribution of the emergent light is modulated through a birefringence device, and the phase of the emergent light is modulated through a spatial light modulator. After modulation, the free space is fed into the grating and is injected into the surface of the glassy carbon to form surface plasma.
The ammonia is evaporated by heating, the ammonia is taken as carrier gas and sent to the surface of the glassy carbon, target molecules are charged by electrostatic introduction, and a micrometer-scale periodic microstructure is formed on the surface of the glassy carbon to obtain stronger interaction. Upon completion, ammonia gas is adsorbed on the surface and is further induced by surface plasmons on the glassy carbon surface, causing the ammonia gas to ionize.
The near-infrared light of 1.064um is emitted by the laser and is a vortex light beam, the polarization degree is 91%, and the orbital angular momentum is +/-1. After the light is emitted, the wavelength distribution of the light is controlled through nonlinear optical modulation, the spatial distribution of the light is controlled through variable curvature reflecting device modulation, the phase distribution of the light is modulated through a birefringent device, and the polarization of the light is modulated through a spatial light modulator. And after modulation is finished, feeding the mixture into a system in a free space, modulating the mixture by a transmission antenna and injecting the mixture into an ammonia ionization area to form ammonia plasma.
And finally, through external grounding attraction and transmission, the grounding current forms magnetic field self-hooping constraint to form stable normal-pressure ammonia plasma.
Example 6
The first beam of electromagnetic waves uses a 265nm near ultraviolet Mathieu beam of 10um beta alumina powder placed on the surface of the micro-scale waveguide. The target molecules ionized are water molecules. The second beam of electromagnetic waves uses a 1.54um near infrared gaussian beam.
265 extreme ultraviolet light is emitted by the LED and is a Maltius beam, the polarization degree is 76%, and the orbital angular momentum is 0.07%. After the light is emitted, the wavelength distribution is controlled through interference modulation, the spatial distribution is controlled through a spatial light modulator, the polarization distribution is modulated through a polaroid, and the phase is modulated through phase shifting. After modulation, the free space is fed into a double-section isolator, and then is injected into the surface of beta-alumina to form surface plasma through a multiple attenuation total internal reflection device.
Water molecules are displaced through the optical tweezers and are sent to the surface of the beta-alumina, target molecules are excited through electromagnetic waves to select different excited states, and the voltage on the surface of the beta-alumina is modulated to obtain stronger interaction. After completion, the water molecules are adsorbed on the surface and further induced by surface plasmons on the beta-alumina surface, causing water molecules to ionize.
The laser of 1.54um is emitted by acetylene frequency stabilized laser, is a Gaussian beam, the polarization degree is 2%, and the orbital angular momentum is +/-1. After the light is emitted, the wavelength distribution of the light is modulated and controlled by a dispersion device, the spatial distribution of the light is controlled by a variable curvature emitting device, the phase distribution of the light is modulated by photoelastic modulation, and the polarization of the light is modulated by a spatial light modulator. After modulation is finished, the high-power optical fiber is used as a waveguide to be fed into a broadband isolator system, and then the high-power optical fiber is adjusted by the optical fiber waveguide to be injected into a water molecule ionization region to form water molecule plasma.
And finally, external current is used for guiding and conveying, and a magnetic field is applied for constraint, so that stable normal-pressure water molecule plasma is formed.
Example 7
The first beam of electromagnetic waves uses a 10nm soft X-ray gaussian beam, the material used is 30nm perovskite quantum dots, which are placed on a micro-scale surface. The target molecule ionized is copper phthalocyanine. The second beam of electromagnetic waves uses a 32.75cm microwave Airy beam.
The 10nm soft X-ray is emitted from the X-ray tube and is a Gaussian beam, the polarization degree is 0.09%, and the orbital angular momentum is 0. After the light is emitted, the wavelength distribution is controlled through absorption modulation, the spatial distribution is controlled through the modulation of an absorption device, the polarization distribution is modulated through a double refraction device, and the phase is modulated through the double refraction device. After modulation is finished, feeding the soft X-ray fiber waveguide into a fiber waveguide circulator, irradiating the soft X-ray fiber waveguide by a near-field waveguide probe with the wavelength less than that of the soft X-ray fiber waveguide, and injecting the soft X-ray fiber waveguide into the surface of the perovskite quantum dot to form surface plasma.
The copper phthalocyanine is dragged to displace by a probe and is sent to the surface of the perovskite quantum dot, different excited states are selected by exciting a target molecule through electromagnetic waves, and the size of a material crystal domain is modulated to obtain stronger interaction. After the completion, copper phthalocyanine is adsorbed on the surface of the perovskite quantum dot and is further induced by surface plasma on the surface of the perovskite, so that the copper phthalocyanine is ionized.
The 32.75cm microwave is emitted by a 915Mhz microwave traveling wave tube and is an Aili light beam, the polarization degree is 0.5%, and the orbital angular momentum is 0. After the emergent light is emitted, the wavelength distribution is controlled by the enhanced modulation of the resonant cavity, the spatial distribution is controlled by the modulation of the transmission antenna, the phase distribution is modulated by the phase shift modulation, and the polarization is modulated by the single-mode cavity. After modulation is finished, the plasma is fed into a system through a waveguide and is modulated by a transmission antenna to be emitted into a copper phthalocyanine ionization area to form copper phthalocyanine plasma.
And finally, the stable normal-pressure copper phthalocyanine plasma is formed by guiding and conveying through an external electromagnetic wave source and externally applying magnetic field constraint.
Example 8
The first beam of electromagnetic waves uses a 0.11mm terahertz Gaussian beam, the used material is a PEDOT-PSS film with the thickness of 1um, and the material is placed inside the cavity. The target molecule ionized is acetaminophen. The second beam of electromagnetic waves uses a microwave Gaussian beam of 5.1 cm.
The 0.11mm terahertz wave is emitted by the 2.7THz terahertz antenna and is a Gaussian beam, the polarization degree is 0.09%, and the orbital angular momentum is 0. After the emergent light is emitted, the wavelength distribution is modulated and controlled through a filter device, the spatial distribution is modulated and controlled through a transmission antenna, the polarization distribution is modulated through a single-mode cavity, and the phase is modulated through phase shifting. And after modulation is finished, feeding the mixed solution into a single-mode cavity through a waveguide, and injecting the mixed solution into the surface of PEDOT-PSS through a metamaterial device with the dielectric constant less than 1 to form surface plasma.
Acetaminophen is ultrasonically atomized, and is transferred to the surface of PEDOT-PSS through ultrasonic acoustic tweezers displacement, target molecules are charged through electrostatic introduction, and the structure of functional groups on the surface of a material is modulated to obtain stronger interaction. After completion, acetaminophen is adsorbed on the PEDOT-PSS surface and further induced by surface plasmons on the PEDOT-PSS surface, causing acetaminophen ionization.
The microwave of 5.1cm is emitted from a microwave magnetron of 5.8GHz and is a Gaussian beam, the polarization degree is 1.1%, and the orbital angular momentum is 0. After the emergent light is emitted, the resonant cavity enhances and modulates to control the wavelength distribution of the light, the transmission antenna modulates to control the spatial distribution of the light, the phase distribution of the light is modulated by phase shift modulation, and the polarization of the light is modulated by the single-mode cavity. After modulation, the mixture is fed into a system through a waveguide circulator and is modulated and emitted into an acetaminophen ionization region through an absorption device to form acetaminophen plasma.
And finally, forming stable normal-pressure acetaminophen plasma through vacuum suction conveying and collision constraint.
Example 9
The first beam of electromagnetic waves uses extreme ultraviolet rays of 13.4nm, the used material is carbon fiber of 20um, and the material is placed inside the cavity. The target molecule ionized is nitrogen. The second beam of electromagnetic waves uses medium frequency radio waves of 100 m.
The extreme ultraviolet ray of 13.4nm is emitted from a plasma light source and is a Gaussian beam, the polarization degree is 0.01%, and the orbital angular momentum is 0. After the light is emitted, the wavelength distribution of the light is controlled through nonlinear optical modulation, the spatial distribution of the light is controlled through variable curvature reflector modulation, the polarization distribution of the light is modulated through a single-mode cavity, and the phase of the light is modulated through phase shifting. After modulation is finished, feeding the free space into the cavity, and directly matching to inject the free space into the surface of the carbon fiber to form surface plasma.
The nitrogen is conveyed through a steel cylinder, is directly gasified to obtain nitrogen airflow, and is carried to the surface of the carbon fiber through airflow, the chemical potential of target molecules on the material is controlled through concentration difference, and a micrometer-scale periodic microstructure is formed on the surface of the material to obtain stronger interaction. After completion, the nitrogen gas is adsorbed on the surface and further subjected to surface plasma induction of the carbon fiber surface, causing nitrogen gas ionization.
The medium frequency radio wave of 100m is emitted from the antenna as a Gaussian beam, the polarization degree is 3.5%, and the orbital angular momentum is 0. After the light is emitted, the wavelength distribution is controlled through interference modulation, the spatial distribution is controlled through transmission antenna modulation, the phase distribution is modulated through phase shifting, and the polarization is modulated through a mode converter. After modulation is finished, the nitrogen gas is fed into the system through the waveguide and is modulated and matched by the filter device to be injected into the nitrogen gas ionization area to form nitrogen gas plasma.
And finally, forming stable normal-pressure nitrogen plasma through vacuum suction conveying and air flow constraint.
Example 10
The first beam of electromagnetic waves was a 12.24cm microwave gaussian beam using 50nm cerium oxide aerogel material placed on a flat plate. The target molecule ionized is nitrogen dioxide. The second beam of electromagnetic waves uses medium frequency radio waves of 100 m.
The microwave of 12.24cm is emitted from a microwave source of 2450Mhz through a waveguide, is a Gaussian beam, has the polarization degree of 0.04 percent and the orbital angular momentum of 0. After the light is emitted, the wavelength distribution is controlled through absorption modulation, the spatial distribution is controlled through a variable curvature reflector, the polarization distribution is modulated through a single-mode cavity, and the phase is modulated through phase shifting. And after modulation is finished, feeding in through a free space, and injecting into the surface of the cerium oxide aerogel through a multiple attenuation total internal reflection device to form surface plasma.
The nitrogen dioxide is conveyed through a steel cylinder, is directly gasified to obtain nitrogen dioxide airflow, is conveyed to the surface of the cerium oxide aerogel through nitrogen carrier gas, controls the chemical potential of target molecules on the material through concentration difference, and forms a nanoscale aperiodic microstructure on the surface of the material to obtain stronger interaction. After completion, nitrogen dioxide is adsorbed on the surface of the cerium oxide aerogel and is further induced by surface plasma on the surface of the cerium oxide aerogel, causing nitrogen dioxide to be ionized.
The medium frequency radio wave of 100m is emitted from the antenna as a Gaussian beam, the polarization degree is 3.5%, and the orbital angular momentum is 0. After the light is emitted, the wavelength distribution is controlled through interference modulation, the spatial distribution is controlled through transmission antenna modulation, the phase distribution is modulated through phase shifting, and the polarization is modulated through a mode converter. After modulation is finished, the nitrogen dioxide plasma is fed in through the free space through the antenna, and is modulated and matched to be emitted into the nitrogen dioxide ionization region through the filter device to form the nitrogen dioxide plasma.
Finally, stable normal-pressure nitrogen dioxide plasma is formed through air flow conveying and air flow restraint
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.

Claims (57)

1. A surface-coupled induced ionization method comprising the steps of:
1S1, modulating the wavelength and the distribution thereof, the spatial distribution, the polarization and orbital angular momentum and the distribution thereof, and the phase and the distribution thereof of a first beam of electromagnetic waves to obtain a first beam of modulated electromagnetic waves;
1S2a, guiding the first beam of modulated electromagnetic waves to be matched with the wave vector of the surface plasma frequency of the material to obtain wave vector matched modulated electromagnetic waves;
1S3a, injecting the wave vector matching modulated electromagnetic wave into the surface of a material through a free space to form a surface plasma wave on the surface of the material;
2S1, introducing target molecules into a gas phase environment to obtain target molecules in a gas phase;
2S2, moving the target molecules in the gas phase to the surface of the material;
3S1, controlling the distribution of the material microstructure and the surface electromagnetic field to obtain an adjusted material;
3S2, controlling the state of the target molecule to obtain the adjusted target molecule;
3S3, combining the regulated material with the regulated target molecules to realize the interaction control between the surface of the material and the target molecules and cause the ionization of the target molecules;
4S1, modulating the wavelengths and the distribution thereof, the spatial distribution, the polarization and orbital angular momentum and the distribution thereof, and the phases and the distribution thereof of the second beam and the subsequent electromagnetic waves to obtain a second beam and subsequent modulated electromagnetic waves;
4S2, guiding the second beam and the subsequent modulated electromagnetic waves to be matched with the plasma frequency of the ionized target molecules to obtain frequency-matched modulated electromagnetic waves;
4S3a, injecting the frequency-matched modulated electromagnetic wave into an ionization region of target molecules on the surface of a material through a free space, so that the ionized target molecules are absorbed, and the ionization degree of the target molecules is improved;
5S1, leading the plasma of the target molecule out of a material surface area to obtain delocalized plasma;
and 5S2, restraining the delocalized plasma in a specific space to obtain higher energy density.
2. A method of surface-coupled induced ionization comprising the steps of:
1S1, modulating the wavelength and distribution thereof, spatial distribution, polarization and orbital angular momentum and distribution thereof, and phase and distribution thereof of a first beam of electromagnetic waves to obtain a first beam of modulated electromagnetic waves;
1S2a, guiding the first beam of modulated electromagnetic wave to match with the wave vector of the surface plasma frequency of the material to obtain wave vector matching modulated electromagnetic wave;
1S3a, injecting the wave vector matching modulated electromagnetic wave into the surface of a material through a free space to form a surface plasma wave on the surface of the material;
2S1, introducing target molecules into a gas phase environment to obtain target molecules in a gas phase;
2S2, moving the target molecules in the gas phase to the surface of the material;
3S1, controlling the distribution of the material microstructure and the surface electromagnetic field to obtain an adjusted material;
3S2, controlling the state of the target molecule to obtain the adjusted target molecule;
3S3, combining the regulated material with the regulated target molecules to realize the interaction control between the surface of the material and the target molecules and cause the ionization of the target molecules;
4S1, modulating the wavelengths and the distribution thereof, the spatial distribution, the polarization and orbital angular momentum and the distribution thereof, and the phases and the distribution thereof of the second beam and the subsequent electromagnetic waves to obtain a second beam and subsequent modulated electromagnetic waves;
4S2, guiding the second beam and the subsequent modulated electromagnetic wave to be matched with the plasma frequency of the ionized target molecules to obtain frequency-matched modulated electromagnetic waves;
4S3b, feeding the frequency-matched modulated electromagnetic wave into an isolator through a waveguide to obtain a unidirectional frequency-matched modulated electromagnetic wave;
4S4b, injecting the unidirectional frequency-matched modulated electromagnetic wave into an ionization region of target molecules on the surface of the material through a waveguide, so that the ionized target molecules are absorbed, and the ionization degree of the target molecules is improved;
5S1, leading the plasma of the target molecule out of a material surface area to obtain a delocalized plasma;
and 5S2, restraining the delocalized plasma in a specific space to obtain higher energy density.
3. A surface-coupled induced ionization method comprising the steps of:
1S1, modulating the wavelength and distribution thereof, spatial distribution, polarization and orbital angular momentum and distribution thereof, and phase and distribution thereof of a first beam of electromagnetic waves to obtain a first beam of modulated electromagnetic waves;
1S2b, feeding the first beam of modulated electromagnetic waves into an isolator through a waveguide to obtain a unidirectional first beam of modulated electromagnetic waves;
1S3b, guiding the unidirectional first beam of modulated electromagnetic waves to be matched with the wave vector of the surface plasma frequency of the material to obtain wave vector matched unidirectional modulated electromagnetic waves;
1S4b, injecting the wave vector matched unidirectional modulation electromagnetic wave into the surface of a material through waveguide, so that the surface of the material forms a surface plasma wave;
2S1, introducing a target molecule into a gas phase environment to obtain the target molecule in the gas phase;
2S2, moving the target molecules in the gas phase to the surface of the material;
3S1, controlling the distribution of the material microstructure and the surface electromagnetic field to obtain an adjusted material;
3S2, controlling the state of the target molecule to obtain the adjusted target molecule;
3S3, combining the regulated material with the regulated target molecules to realize the interaction control between the surface of the material and the target molecules and cause the ionization of the target molecules;
4S1, modulating the wavelengths and the distribution thereof, the spatial distribution, the polarization and orbital angular momentum and the distribution thereof, and the phases and the distribution thereof of the second beam and the subsequent electromagnetic waves to obtain a second beam and subsequent modulated electromagnetic waves;
4S2, guiding the second beam and the subsequent modulated electromagnetic waves to be matched with the plasma frequency of the ionized target molecules to obtain frequency-matched modulated electromagnetic waves;
4S3a, emitting the frequency-matched modulated electromagnetic wave into an ionization region of target molecules on the surface of the material through a free space, so that the ionized target molecules are absorbed, and the ionization degree of the target molecules is improved;
5S1, leading the plasma of the target molecule out of a material surface area to obtain a delocalized plasma;
and 5S2, restraining the delocalized plasma in a specific space to obtain higher energy density.
4. A surface-coupled induced ionization method comprising the steps of:
1S1, modulating the wavelength and distribution thereof, spatial distribution, polarization and orbital angular momentum and distribution thereof, and phase and distribution thereof of a first beam of electromagnetic waves to obtain a first beam of modulated electromagnetic waves;
1S2b, feeding the first beam of modulated electromagnetic waves into an isolator through a waveguide to obtain a unidirectional first beam of modulated electromagnetic waves;
1S3b, guiding the unidirectional first beam of modulated electromagnetic waves to be matched with the wave vector of the surface plasma frequency of the material to obtain wave vector matched unidirectional modulated electromagnetic waves;
1S4b, injecting the wave vector matched unidirectional modulation electromagnetic wave into the surface of a material through waveguide, so that the surface of the material forms a surface plasma wave;
2S1, introducing target molecules into a gas phase environment to obtain target molecules in a gas phase;
2S2, moving the target molecules in the gas phase to the surface of the material;
3S1, controlling the distribution of the material microstructure and the surface electromagnetic field to obtain an adjusted material;
3S2, controlling the state of the target molecule to obtain the adjusted target molecule;
3S3, combining the regulated material with the regulated target molecules to realize the interaction control between the surface of the material and the target molecules and cause the ionization of the target molecules;
4S1, modulating the wavelengths and the distribution thereof, the spatial distribution, the polarization and orbital angular momentum and the distribution thereof, and the phases and the distribution thereof of the second beam and the subsequent electromagnetic waves to obtain a second beam and subsequent modulated electromagnetic waves;
4S2, guiding the second beam and the subsequent modulated electromagnetic wave to be matched with the plasma frequency of the ionized target molecules to obtain frequency-matched modulated electromagnetic waves;
4S3b, feeding the frequency coordination modulation electromagnetic wave into an isolator through a waveguide to obtain a unidirectional frequency coordination modulation electromagnetic wave;
4S4b, injecting the unidirectional frequency-matched modulated electromagnetic wave into an ionization region of target molecules on the surface of the material through a waveguide, so that the ionized target molecules are absorbed, and the ionization degree of the target molecules is improved;
5S1, leading the plasma of the target molecule out of a material surface area to obtain delocalized plasma;
and 5S2, restraining the delocalized plasma in a specific space to obtain higher energy density.
5. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the form of the material comprises a solid or a liquid; wherein the solid form comprises one or more of film, particle, powder, aerosol, photonic crystal and gas-solid two-phase flow; the liquid form comprises one or more of liquid drops, dispersion liquid and gas-liquid two-phase flow.
6. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the size of the material is 0.3nm-1000mm.
7. The method of any one of claims 1-4, wherein: the material comprises one or more of a metal material, a carbon material, a ceramic material, an organic conductor material and a semiconductor material.
8. The surface-coupled induced ionization method of claim 7, wherein: the metallic material contains one or more of lithium, beryllium, boron, carbon, sodium, magnesium, aluminum, silicon, phosphorus, sulfur, scandium, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, gallium, germanium, arsenic, rubidium, strontium, yttrium, zirconium, niobium, molybdenum, technetium, ruthenium, rhodium, palladium, silver, cadmium, indium, tin, antimony, tellurium, cesium, barium, hafnium, tantalum, tungsten, rhenium, osmium, iridium, platinum, gold, mercury, thallium, lead, bismuth, polonium, francium, radium, lanthanides, actinides.
9. The surface-coupled induced ionization method of claim 7, wherein: the ceramic material comprises one or more of oxide ceramic, silicate ceramic, nitride ceramic, borate ceramic, phosphate ceramic, carbide ceramic, aluminate ceramic, germanate ceramic and titanate ceramic.
10. The surface-coupled induced ionization method of claim 7, wherein: the organic conductor material comprises one or more of polyacetylene, polyarylacetylene, polypyrrole, polyaniline, polythiophene, polyphenylene sulfide, TTF-TCNQ, PEDOT-PSS, tetrathiafulvalene, polyfluorene, polyparaphenylene and polyaromatic hydrocarbon.
11. The surface-coupled induced ionization method of claim 7, wherein: the semiconductor material comprises one or more of III-V group semiconductor, II-VI group semiconductor, IV group semiconductor, quantum dot semiconductor and perovskite semiconductor particles.
12. The surface-coupled induced ionization method of claim 7, wherein: the carbon material comprises one or more of graphene, artificial graphite, natural graphite, graphitized carbon microspheres, carbon nanotubes, glassy carbon, amorphous carbon, carbon nanohorns, carbon fibers, carbon quantum dots and carbon molecular sieves.
13. The surface-coupled induced ionization method of claim 7, wherein: the carbon material comprises one or more of aminated graphene, carboxylated graphene, hydroxylated graphene, sulfhydrylated graphene, oxidized graphene, methylated graphene, trifluoromethylated graphene, octadecylated graphene, fluorinated graphene, iodinated graphene, artificial graphite, natural graphite, graphitized carbon microspheres, carbon nanotubes, glassy carbon, amorphous carbon, carbon nanohorns, carbon fibers, carbon quantum dots and carbon molecular sieves.
14. The surface-coupled induced ionization method of claim 7, wherein: the carbon material comprises one or more of aminated graphene, carboxylated graphene, hydroxylated graphene, sulfhydrylated graphene, oxidized graphene, methylated graphene, trifluoromethylated graphene, octadecylated graphene, fluorinated graphene, iodinated graphene, artificial graphite, natural graphite, graphitized carbon microspheres, graphitized carbon nanotubes, glassy carbon, amorphous carbon, carbon nanohorns, carbon fibers, carbon quantum dots and carbon molecular sieves.
15. The method of any one of claims 1-4, wherein: the first beam of electromagnetic waves in step 1S1 includes one or more of gamma rays, hard X-rays, soft X-rays, extreme ultraviolet rays, near ultraviolet rays, visible light, near infrared rays, middle infrared rays, far infrared rays, terahertz, extremely high frequency microwaves, ultra high frequency microwaves, very high frequency radio waves, intermediate frequency radio waves, low frequency radio waves, very low frequency radio waves, ultra low frequency radio waves, and extremely low frequency radio waves.
16. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the wavelength and the distribution of the first beam of electromagnetic waves in the step 1S1 are 0.01 nm-100 km.
17. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the spatial distribution of the first beam of electromagnetic wave in the step 1S1 includes one or more of a gaussian beam, a bessel beam, an elli beam, a laguerre-gaussian beam, a cosine-gaussian beam, a witire beam, a flat-top beam, and a vortex beam.
18. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the polarization degree of the first beam of electromagnetic waves in the step 1S1 is 0.01% -99%.
19. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the polarization mode of the first beam of electromagnetic waves in step 1S1 includes one or more of natural light, partial polarization, linear polarization, circular polarization, elliptical polarization, azimuthal polarization, and radial polarization.
20. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the polarization of the first beam of electromagnetic waves in step 1S1 includes S-wave polarization and P-wave polarization.
21. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the orbital angular momentum and the distribution of the first beam of electromagnetic waves in the step 1S1 are-10 to +10.
22. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the phase and the distribution of the first beam of electromagnetic waves in the step 1S1 are 0-2 pi.
23. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the second and subsequent electromagnetic waves in step 4S1 include one or more of gamma rays, hard X rays, soft X rays, extreme ultraviolet rays, near ultraviolet rays, visible light, near infrared rays, middle infrared rays, far infrared rays, terahertz waves, extremely high frequency microwaves, ultrahigh frequency microwaves, very high frequency radio waves, intermediate frequency radio waves, low frequency radio waves, very low frequency radio waves, extremely low frequency radio waves, and extremely low frequency radio waves.
24. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the wavelength and the distribution of the second beam and the subsequent electromagnetic waves in the step 4S1 are 0.01 nm-100 km.
25. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the spatial distribution of the second beam and the subsequent electromagnetic waves in the step 4S1 includes one or more of a gaussian beam, a bessel beam, an elli beam, a laguer-gaussian beam, a cosine-gaussian beam, a marthese beam, a flat-top beam, and a vortex beam.
26. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the polarization degree of the second beam and the subsequent electromagnetic waves in the step 4S1 is 0.01% -99%.
27. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the polarization mode of the second beam and the subsequent electromagnetic waves in step 4S1 includes one or more of natural light, partial polarization, linear polarization, circular polarization, elliptical polarization, azimuthal polarization, and radial polarization.
28. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the polarization of the second beam and the subsequent electromagnetic waves in step 4S1 includes S-wave polarization and P-wave polarization.
29. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the orbital angular momentum and the distribution thereof of the second beam and the subsequent electromagnetic waves in the step 4S1 are-10 to +10.
30. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the second beam and the subsequent electromagnetic waves in the step 4S1 have phases and distributions of 0-2 pi.
31. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the target molecule in step 2S1 has a molecular weight of 1.0 × 10 0 Da - 1.0×10 20 Da。
32. A surface-coupled induced ionization method according to claim 1 or 2, characterized in that: the method for modulating the wavelength and the distribution thereof in the step 1S1 includes one or more of dispersion device modulation, filter device modulation, refraction device modulation, interference modulation, absorption modulation, nonlinear optical modulation, and resonant cavity enhancement modulation.
33. A surface-coupled induced ionization method according to claim 1 or 2, characterized in that: the spatial distribution modulation method of step 1S1 includes one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, and absorption device modulation.
34. A surface-coupled induced ionization method according to claim 1 or 2, characterized in that: the method for modulating the polarization and orbital angular momentum and the distribution thereof in step 1S1 includes one or more of single-mode cavity modulation, photoelastic modulation, spatial light modulator modulation, mode converter modulation, birefringence device modulation, and polarizer modulation.
35. A surface-coupled induced ionization method according to claim 1 or 2, characterized in that: the phase and distribution modulation method in step 1S1 includes one or more of phase shift modulation, birefringence device modulation, and spatial light modulator modulation.
36. A surface-coupled induced ionization method according to claim 1 or 2, characterized in that: the wave vector matching method in step 1S2a includes one or more methods selected from a grating, a photonic crystal, total internal reflection of a free light coupling prism, a metamaterial device having a dielectric constant less than 1, a multiple-attenuation total internal reflection device, a free light coupling waveguide total internal reflection device, a focusing device, and direct matching.
37. A surface-coupled induced ionization method according to claim 3 or 4, characterized in that: the isolator in the step 1S2b comprises one or more of a square waveguide circulator, an optical fiber isolator, a Faraday rotator, a coaxial isolator, a strip line isolator, a broadband isolator, a double-section isolator, a microstrip isolator, an attenuator and a load.
38. The method of claim 3 or 4, wherein: the wave vector matching method in the step 1S3b comprises one or more methods of grating, photonic crystal waveguide, waveguide coupling prism total internal reflection, metamaterial waveguide with dielectric constant less than 1, multiple attenuation total internal reflection device, waveguide total internal reflection device, near field waveguide probe irradiation with wavelength less than and direct matching.
39. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the method for introducing the target molecules into the gas-phase environment in the step 2S1 comprises one or more of ultrasonic atomization, heating evaporation, vacuum gasification, direct gasification and gas flow carrying.
40. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the moving to the material surface in the step 2S2 comprises one or more methods of optical tweezers displacement, ultrasonic tweezers displacement, mechanical force displacement, airflow loading, vacuum suction displacement, probe traction displacement and magnetic force displacement.
41. The method of any one of claims 1-4, wherein: the control of the material microstructure and the surface electromagnetic field distribution in step 3S1 includes one or more methods of a material surface formation nanoscale periodic microstructure, a material surface formation nanoscale aperiodic microstructure, a material surface formation microscale periodic microstructure, a material surface formation microscale aperiodic microstructure, a material surface functional group structure modulation, a material surface defect state density structure modulation, a material surface doping structure modulation, a material crystal domain size modulation, a material superlattice structure modulation, a material surface voltage modulation, a material surface electric field distribution modulation, a material magnetic domain structure modulation, and a material magnetic field modulation.
42. The method of any one of claims 1-4, wherein: the step 3S2 of controlling the state of the target molecule includes one or more of exciting the target molecule by electromagnetic waves to select different excited states, controlling the chemical potential of the target molecule on the material by concentration difference, charging the target molecule by electrostatic introduction, and magnetizing the target molecule by magnetic field introduction.
43. A surface-coupled induced ionization method according to claim 1 or 3, characterized in that: the wavelength and distribution modulation method in step 4S1 includes one or more of dispersion device modulation, filter device modulation, refraction device modulation, interference modulation, absorption modulation, nonlinear optical modulation, and resonant cavity enhancement modulation.
44. A surface-coupled induced ionization method according to claim 1 or 3, characterized in that: the spatial distribution modulation method in step 4S1 includes one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, and absorption device modulation.
45. A surface-coupled induced ionization method according to claim 1 or 3, characterized in that: the method for modulating the polarization, orbital angular momentum and distribution thereof in the step 4S1 comprises one or more of single-mode cavity modulation, photoelastic modulation, spatial light modulator modulation, mode converter modulation, birefringence device modulation and polarizer modulation.
46. A surface-coupled induced ionization method according to claim 1 or 3, characterized in that: the phase and distribution modulation method in step 4S1 includes one or more of phase shift modulation, birefringence device modulation, and spatial light modulator modulation.
47. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the frequency matching method in the step 4S2 comprises one or more of dispersion device modulation matching, filter device modulation matching, refraction device modulation matching, interference modulation matching, absorption modulation matching, nonlinear optical modulation matching and direct incidence.
48. A surface-coupled induced ionization method according to claim 1 or 3, characterized in that: the method for injecting the ionization region in the step 4S3a includes one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, absorption device modulation, and direct injection.
49. The surface-coupled induced ionization method of claim 2 or 4, wherein: the wavelength and distribution modulation method in step 4S1 includes one or more of dispersion device modulation, filter device modulation, refraction device modulation, interference modulation, absorption modulation, nonlinear optical modulation, and resonant cavity enhancement modulation.
50. The surface-coupled induced ionization method of claim 2 or 4, wherein: the spatial distribution modulation method in step 4S1 includes one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, and absorption device modulation.
51. The method of claim 2 or 4, wherein: the method for modulating the polarization and orbital angular momentum and the distribution thereof in the step 4S1 includes one or more of single-mode cavity modulation, photoelastic modulation, spatial light modulator modulation, mode converter modulation, birefringent device modulation, and polarizer modulation.
52. The method of claim 2 or 4, wherein: the phase and distribution modulation method in step 4S1 includes one or more of phase shift modulation, birefringence device modulation, and spatial light modulator modulation.
53. The surface-coupled induced ionization method of claim 2 or 4, wherein: the isolator in the step 4S3b comprises one or more of a square waveguide circulator, an optical fiber isolator, a Faraday rotator, a coaxial isolator, a strip line isolator, a broadband isolator, a double-section isolator, a microstrip isolator, an attenuator and a load.
54. The surface-coupled induced ionization method of claim 2 or 4, wherein: the method for injecting the ionization region in the step 4S4b includes one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, absorption device modulation, photonic crystal modulation, waveguide modulation injection and direct injection.
55. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the step 5S1 of extracting the material surface area includes one or more methods selected from vacuum suction, air flow delivery, negative pressure extraction, external ground suction, external electromagnetic wave source guidance, and external current guidance.
56. The surface-coupled induced ionization method of any one of claims 1 to 4, wherein: the plasma confinement in the step 5S2 includes one or more methods of forming magnetic field self-hoop confinement, air flow confinement and collision confinement by an external magnetic field confinement and a ground current.
57. A plasma device having a plasma source comprising a plasma generated by the method of any one of claims 1 to 56.
CN202010383599.7A 2020-05-08 2020-05-08 Surface coupling induced ionization technology and corresponding plasma and plasma device Active CN111479375B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010383599.7A CN111479375B (en) 2020-05-08 2020-05-08 Surface coupling induced ionization technology and corresponding plasma and plasma device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010383599.7A CN111479375B (en) 2020-05-08 2020-05-08 Surface coupling induced ionization technology and corresponding plasma and plasma device

Publications (2)

Publication Number Publication Date
CN111479375A CN111479375A (en) 2020-07-31
CN111479375B true CN111479375B (en) 2022-12-02

Family

ID=71762133

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010383599.7A Active CN111479375B (en) 2020-05-08 2020-05-08 Surface coupling induced ionization technology and corresponding plasma and plasma device

Country Status (1)

Country Link
CN (1) CN111479375B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230171870A1 (en) * 2020-05-09 2023-06-01 High-Dimensional Plasma Sources Technology (Xiaogan) Co., Ltd. Surface coupling induced ionization technique and its corresponding plasma and plasma devices
CN112226702A (en) * 2020-08-17 2021-01-15 蓬莱市超硬复合材料有限公司 Tungsten oxide alloy material and preparation method thereof
CN112616233B (en) * 2020-12-16 2023-03-21 中国科学院合肥物质科学研究院 Stable-state high-beam-density long-life lithium ion source suitable for accelerator
CN114899079B (en) * 2021-04-28 2023-04-14 中国科学院江西稀土研究院 Mass spectrum ionization source of surface coupling induction plasma source and corresponding mass spectrometer

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101076221B (en) * 2002-05-08 2011-08-31 Btu国际公司 Multiple radiation sources plasma generating and processing
CN100588305C (en) * 2002-05-08 2010-02-03 Btu国际公司 Method for forming plasma
CL2009000560A1 (en) * 2008-03-11 2010-02-19 Univ Duke A method of hardening a radiation hardenable medium comprising placing a composition within an object to be hardened, applying at least one chosen from x-ray, gamma ray, or electron beam through the object and within the composition.
JP5764796B2 (en) * 2009-09-17 2015-08-19 イマジニアリング株式会社 Plasma generator
CN103592282A (en) * 2013-11-11 2014-02-19 北京航空航天大学 Conduction surface plasmon based Raman scattering base and application method thereof
US9875884B2 (en) * 2015-02-28 2018-01-23 Agilent Technologies, Inc. Ambient desorption, ionization, and excitation for spectrometry
CN110119007B (en) * 2018-02-07 2020-09-08 华为技术有限公司 Optical isolator

Also Published As

Publication number Publication date
CN111479375A (en) 2020-07-31

Similar Documents

Publication Publication Date Title
CN111479375B (en) Surface coupling induced ionization technology and corresponding plasma and plasma device
Lebedev Microwave discharges at low pressures and peculiarities of the processes in strongly non-uniform plasma
US3911318A (en) Method and apparatus for generating electromagnetic radiation
Conrads et al. Plasma generation and plasma sources
Moisan et al. A waveguide-based launcher to sustain long plasma columns through the propagation of an electromagnetic surface wave
US7253426B2 (en) Structures and methods for coupling energy from an electromagnetic wave
US20070170370A1 (en) Structures and methods for coupling energy from an electromagnetic wave
JP2015172246A (en) Low-pressure high-frequency pulse/plasma reactor for manufacturing nanoparticles
Kanareykin Cherenkov radiation and dielectric based accelerating structures: Wakefield generation, power extraction and energy transfer efficiency
EP4149214A1 (en) Surface coupling induced ionization technology, and plasma and plasma device corresponding thereto
EP2707880A2 (en) Renewable energy production process with a device featuring resonant nano-dust plasma, a cavity resonator and an acoustic resonator
Glyavin et al. Terahertz gyrotrons with unique parameters
US6690023B2 (en) Methods and apparatus for providing a broadband tunable source of coherent millimeter, sub-millimeter and infrared radiation utilizing a non-relativistic electron beam
Kuzmin et al. High-density helicon plasma source for linear plasma generators
CN112952532B (en) Terahertz radiation generation method based on interaction of multi-electron beam and plasma
Bilik et al. Atmospheric-pressure glow plasma synthesis of plasmonic and photoluminescent zinc oxide nanocrystals
Yagi et al. Generation of microwave plasma under high pressure and fabrication of ultrafine carbon particles
Shimabukuro et al. Microwave excitation of a low-energy atomic hydrogen
Leprince et al. Microwave excitation technology
Oechsner Theoretical background and some applications of ECWR-plasmas
Duan et al. Spherical quantum dots in Deng–Fan–Eckart potential confining potential: study of nonlinear optical rectification
Kanareykin et al. Progress on Diamond‐Based Cylindrical Dielectric Accelerating Structures
Girka et al. Applications of Surface Wave Propagation
Shuiabov et al. Synthesis of nanostructured transition metal oxides by a nanosecond discharge in air with assistance of the deposition process by plasma UV-radiation
Boukari et al. An optimized and simplified compact ECR ion source for gaseous species

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
EE01 Entry into force of recordation of patent licensing contract

Application publication date: 20200731

Assignee: Lianguang Yuanhe (Shanghai) Enterprise Development Co.,Ltd.

Assignor: High dimensional plasma source technology (Xiaogan) Co.,Ltd.

Contract record no.: X2022980000143

Denomination of invention: A surface coupled induced ionization technology and its corresponding plasma and plasma device

License type: Exclusive License

Record date: 20220106

EE01 Entry into force of recordation of patent licensing contract
GR01 Patent grant
GR01 Patent grant