CN111479375A - Surface coupling induced ionization technology and corresponding plasma and plasma device - Google Patents

Surface coupling induced ionization technology and corresponding plasma and plasma device Download PDF

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CN111479375A
CN111479375A CN202010383599.7A CN202010383599A CN111479375A CN 111479375 A CN111479375 A CN 111479375A CN 202010383599 A CN202010383599 A CN 202010383599A CN 111479375 A CN111479375 A CN 111479375A
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modulation
electromagnetic waves
distribution
polarization
ionization technique
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CN111479375B (en
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张麟德
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High Dimensional Plasma Source Technology Xiaogan Co ltd
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Abstract

The invention discloses a surface coupling induced ionization technology, which comprises any one of the following steps: (1) feeding a first beam of electromagnetic waves through free space or a waveguide onto the material, exciting a surface plasmon wave; target molecules to be ionized are introduced to the surface of the material, and electrons of the target molecules are coupled with surface plasmon polaritons on the material through control interaction to induce the target molecules to be ionized; (2) synchronously passing through a free space or a waveguide, and feeding a second beam and subsequent electromagnetic waves into an ionization region of target molecules on the surface of the material, so that the ionized target molecules are absorbed, and the ionization degree of the target molecules is improved; (3) target molecules are released in the form of bulk plasma, and surface coupling induced ionization is realized. The invention also discloses a plasma device.

Description

Surface coupling induced ionization technology and corresponding plasma and plasma device
Technical Field
The present invention relates to the field of material science and electronic devices, and more particularly to plasma and ionization. Furthermore, the invention relates to a series of plasma devices involving the above plasma.
Background
Plasma (Plasma), i.e. the state of a gaseous molecule formed after further ionization under the action of an external field or heat. There are many common plasmas in life, including high-temperature flame in combustion environment, arc formed when high-voltage discharge breaks down air, and colorful neon lamp at street head, street tail. The technology for converting gaseous molecules into plasma, namely Ionization technology (Ionization), is widely applied to various fields of three-waste treatment, rubber recovery, material synthesis, material surface modification, detection and analysis and the like.
The ionization conditions of different forms of plasma vary, but most commonly are plasmas formed under negative pressure or vacuum. One of the typical ionization modes under vacuum or negative pressure is glow discharge. The glow discharge is just to pump a certain negative pressure (generally less than 10mbar) in the pipelines of various gases, and then discharge to the vacuum tube through two flat electrodes to ionize the gases and form glow plasma. If the high-frequency jet flow is used for replacing direct current, the radio-frequency plasma based on the capacitive coupling between the flat-plate electrodes can be further obtained. Conventional plasmas under negative pressure or vacuum also include corona discharge, arc breakdown discharge, dielectric barrier discharge, and the like. But most require a negative pressure environment to operate.
Vacuum or negative pressure environments often limit the application of plasmas, and therefore a great deal of research has been undertaken to achieve ionization in atmospheric environments. Common atmospheric ionization techniques include electron bombardment ionization, radio frequency ionization, arc ionization, inductively coupled ionization, electrospray ionization, laser-induced ionization, and the like. Among them, the mainstream methods enough to form the atmospheric pressure plasma are mainly two methods, namely arc ionization and inductively coupled ionization. The atmospheric pressure plasma realized by the two methods is widely applied in various fields, including garbage treatment, material smelting, surface coating, instrument analysis and the like, and is fruitful in some specific applications. For example, an arc plasma torch has been used as the most effective tool for complex-component garbage treatment, and an inductively coupled plasma torch (ICP) is combined with an ICP-OES for spectroscopic analysis or an ICP-MS for a subsequent mass spectrometry system, which is the most common key instrument for detecting the content of various elements at present, and the detection limit can reach ppb level or even ppt level. For atmospheric pressure plasma, which of the possibilities is applied depends on the adjustable range of the electron temperature and the ion temperature of the plasma, more directly on the adjustable range of the energy density in the plasma; the value of the application depends on the energy feedback efficiency when the plasma is formed.
For commercial application of atmospheric pressure plasma, the biggest problem is the low energy feeding efficiency. For example, in the case of an arc plasma, once the arc is formed, the voltage across the electrodes drops rapidly, resulting in a subsequent drop in energy density in the plasma. For inductively coupled plasma, spark ignition is always required to form an initial gas ionization part, so that energy can be fed into ionized gas through alternating magnetic field coupling established in an alternating current coil to further form a torch, and the impedance characteristic of the plasma itself becomes an object directly influencing the coupling efficiency.
In summary, there is a need in the art for a new ionization technology that can realize an atmospheric pressure plasma with higher energy feedback efficiency, wider adjustable temperature range of electron temperature and ion temperature, and higher energy density, thereby deepening the exploitation of the existing application field and further widening other applications of the plasma.
Disclosure of Invention
In view of the above, the present invention provides a surface-coupled induced ionization technique with superior performance, and a plasma device corresponding thereto.
In one aspect, the present invention provides a technical method for surface coupling induced ionization, comprising:
feeding a first beam of electromagnetic waves to the material through free space or a waveguide, so that the first beam of electromagnetic waves resonates with surface plasma of the material and excites the surface plasma waves. Meanwhile, target molecules to be ionized are introduced to the surface of the material, and the electrons of the target molecules are coupled with surface plasmon polaritons on the material by controlling the interaction between the surface of the material and the target molecules, so that the target molecules are induced to be ionized. Synchronously, the second beam and the subsequent electromagnetic waves are fed into the ionization region of the target molecules on the surface of the material through the free space or the waveguide, so that the ionized target molecules are absorbed, and the ionization degree of the target molecules is improved. Finally, the target molecules are released in the form of bulk plasma, and surface coupling induced ionization is realized.
Further, the material forms include solids and liquids. Wherein, the solid form comprises one or more of film, particle, powder, aerosol, photonic crystal and gas-solid two-phase flow; the liquid form comprises one or more of liquid drops, dispersion liquid and gas-liquid two-phase flow.
Further, the size of the material is 0.3nm-1000 mm.
Further, the material comprises one or more of metal and alloy materials, carbon materials, ceramic materials, organic conductor materials and semiconductor materials.
Further, the metal and alloy material includes one or more of metals or alloys containing lithium, beryllium, boron, carbon, sodium, magnesium, aluminum, silicon, phosphorus, sulfur, scandium, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, gallium, germanium, arsenic, rubidium, strontium, yttrium, zirconium, niobium, molybdenum, technetium, ruthenium, rhodium, palladium, silver, cadmium, indium, tin, antimony, tellurium, cesium, barium, hafnium, tantalum, tungsten, rhenium, osmium, iridium, platinum, gold, mercury, thallium, lead, bismuth, polonium, francium, radium, lanthanides, actinides.
Further, the carbon material includes one or more of graphene, aminated graphene, carboxylated graphene, hydroxylated graphene, sulfhydrylated graphene, oxidized graphene, methylated graphene, trifluoromethylated graphene, octadecylated graphene, fluorinated graphene, iodinated graphene, artificial graphite, natural graphite, graphitized carbon microspheres, graphitized carbon nanotubes, glassy carbon, amorphous carbon, carbon nanohorns, carbon fibers, carbon quantum dots, and carbon molecular sieves.
Further, the ceramic material comprises one or more of oxide ceramic, silicate ceramic, nitride ceramic, borate ceramic, phosphate ceramic, carbide ceramic, aluminate ceramic, germanate ceramic and titanate ceramic.
Further, the organic conductor material comprises one or more of polyacetylene, polyarylacetylene, polypyrrole, polyaniline, polythiophene, polyphenylene sulfide, TTF-TCNQ, PEDOT-PSS, tetrathiafulvalene, polyfluorene, polyparaphenylene, polyaromatic hydrocarbon and the like with a continuous conjugated framework.
Further, the semiconductor material comprises one or more of a III-V group semiconductor, a II-VI group semiconductor, a IV group semiconductor, a quantum dot semiconductor and perovskite semiconductor particles.
Further, the first beam of electromagnetic waves is one or more of gamma rays, hard X-rays, soft X-rays, extreme ultraviolet rays, near ultraviolet rays, visible light, near infrared rays, middle infrared rays, far infrared rays, terahertz rays, very high frequency microwaves, ultrahigh frequency microwaves, very high frequency radio waves, intermediate frequency radio waves, low frequency radio waves, very low frequency radio waves, and very low frequency radio waves.
Furthermore, the wavelength and the distribution of the first beam of electromagnetic waves are 0.01 nm-100 km.
Further, the spatial distribution of the first beam of electromagnetic wave comprises one or more of a gaussian beam, a bessel beam, an elli beam, a laguerre-gaussian beam, a cosine-gaussian beam, a marthese beam, a flat-top beam and a vortex beam.
Further, the polarization degree of the first beam of electromagnetic waves is 0.01% -99%.
Further, the polarization mode of the first beam of electromagnetic waves includes one or more of natural light, partial polarization, linear polarization, circular polarization, elliptical polarization, azimuthal polarization, and radial polarization.
Further, the polarization of the first beam of electromagnetic waves includes S-wave polarization and P-wave polarization.
Furthermore, the orbital angular momentum and the distribution of the first beam of electromagnetic waves are-10- + 10.
Furthermore, the phase and the distribution of the first beam of electromagnetic waves are 0-2 pi.
Further, the second and subsequent electromagnetic waves are one or more of gamma rays, hard X-rays, soft X-rays, extreme ultraviolet rays, near ultraviolet rays, visible light, near infrared rays, middle infrared rays, far infrared rays, terahertz, very high frequency microwaves, ultrahigh frequency microwaves, very high frequency radio waves, intermediate frequency radio waves, low frequency radio waves, very low frequency radio waves, and very low frequency radio waves.
Furthermore, the wavelength and the distribution of the second beam and the subsequent electromagnetic waves are 0.01 nm-100 km.
Further, the spatial distribution of the second beam and the subsequent electromagnetic waves comprises one or more of a gaussian beam, a bessel beam, an elli beam, a laguerre-gaussian beam, a cosine-gaussian beam, a marthese beam, a flat-top beam and a vortex beam.
Furthermore, the polarization degree of the second beam and the subsequent electromagnetic waves is 0.01% -99%.
Further, the polarization mode of the second beam and the subsequent electromagnetic waves comprises one or more of natural light, partial polarization, linear polarization, circular polarization, elliptical polarization, azimuthal polarization, and radial polarization.
Further, the polarization of the second beam and the subsequent electromagnetic waves includes S-wave polarization and P-wave polarization.
Furthermore, the orbital angular momentum and the distribution of the second beam and the subsequent electromagnetic waves are-10- + 10.
Furthermore, the phase and the distribution of the second beam and the subsequent electromagnetic waves are 0-2 pi.
Further, the molecular weight of the target molecule is from 1.0 × 100Da-1.0×1020Da。
Further, the feeding the first beam of electromagnetic waves to the material in a free space manner specifically includes the following steps: 1S1, modulating the wavelength and the distribution of the first beam of electromagnetic wave, the spatial distribution, the polarization and orbital angular momentum and the distribution thereof, the phase and the distribution thereof and other factors to obtain a first beam of modulated electromagnetic wave; 1S2a, guiding the first beam of modulated electromagnetic wave to match with the wave vector of the surface plasma frequency of the material to obtain wave vector matching modulated electromagnetic wave; 1S3a, the wave vector matching modulation electromagnetic wave is emitted to the surface of the material through free space, and the surface of the material forms a surface plasma wave.
Further, the method for modulating the wavelength and the distribution thereof in step 1S1 includes one or more of dispersive device modulation, filtering device modulation, refractive device modulation, interferometric modulation, absorption modulation, nonlinear optical modulation, and resonant cavity enhancement modulation.
Further, the spatial distribution modulation method in step 1S1 includes one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, and absorption device modulation.
Further, the polarization and orbital angular momentum and the distribution modulation method thereof in step 1S1 include one or more of single-mode cavity modulation, photoelastic modulation, spatial light modulator modulation, mode converter modulation, birefringent device modulation, and polarizer modulation.
Further, the phase and its distribution modulation method in step 1S1 includes one or more of phase shift modulation, birefringence device modulation, and spatial light modulator modulation.
Further, the wave vector matching method in step 1S2a includes one or more methods selected from a group consisting of total internal reflection by a grating, a photonic crystal, a free light coupling prism, a metamaterial device having a dielectric constant less than 1, a multiple frustrated total internal reflection device, a free light coupling waveguide total internal reflection device, a focusing device, and direct matching.
Further, the feeding of the first beam of electromagnetic waves to the material by means of the waveguide specifically comprises the following steps: 1S1, modulating the wavelength and the distribution of the first beam of electromagnetic wave, the spatial distribution, the polarization and orbital angular momentum and the distribution thereof, the phase and the distribution thereof and other factors to obtain a first beam of modulated electromagnetic wave; 1S2b, feeding the first beam of modulated electromagnetic waves into an isolator through a waveguide to obtain a unidirectional first beam of modulated electromagnetic waves; 1S3b, guiding the unidirectional first beam of modulated electromagnetic waves to match with the wave vector of the surface plasma frequency of the material to obtain wave vector matching unidirectional modulated electromagnetic waves; 1S4b, the wave vector matching unidirectional modulation electromagnetic wave is injected into the surface of the material through the waveguide, so that the surface of the material forms a surface plasma wave.
Further, the isolator in step 1S2b includes one or more of a waveguide circulator, a fiber optical isolator, a faraday rotator, a coaxial isolator, a strip line isolator, a broadband isolator, a double-section isolator, a microstrip isolator, an attenuator, and a load.
Further, the wave vector matching method in step 1S3b includes one or more methods selected from a group consisting of grating, photonic crystal waveguide, waveguide coupling prism total internal reflection, metamaterial waveguide with a dielectric constant less than 1, multiple attenuated total internal reflection device, waveguide total internal reflection device, near field waveguide probe illumination with a wavelength less than that of the waveguide probe illumination, and direct matching.
Further, the step of introducing the target molecules to be ionized to the surface of the material specifically comprises the following steps: 2S1, introducing the target molecules into a gas phase environment to obtain target molecules in a gas phase; 2S2, moving the target molecules in the gas phase to the surface of the material.
Further, the target molecule in step 2S1 is introduced into a gas phase environment, which includes one or more of ultrasonic atomization, heating evaporation, vacuum evaporation, direct evaporation, and gas flow entrainment.
Further, the moving to the surface of the material in step 2S2 includes one or more of optical tweezers displacement, ultrasonic tweezers displacement, mechanical force displacement, air flow loading, vacuum suction displacement, probe pulling displacement, and magnetic force displacement.
Further, the method for controlling the interaction between the surface of the material and the target molecules specifically comprises the following steps: 3S1, controlling the distribution of the material microstructure and the surface electromagnetic field to obtain the adjusted material; 3S2, controlling the state of the target molecule to obtain the adjusted target molecule; 3S3, combining the modulated material with the regulated target molecules, realizing the interaction control between the material surface and the target molecules, and causing the ionization of the target molecules.
Further, the controlling of the material microstructure and the surface electromagnetic field distribution in step 3S1 includes one or more of a method of forming a nanoscale periodic microstructure on the material surface, forming a nanoscale aperiodic microstructure on the material surface, forming a microscale periodic microstructure on the material surface, forming a microscale aperiodic microstructure on the material surface, modulating a material surface functional group structure, modulating a material surface defect state density structure, modulating a material surface doping structure, modulating a material crystal domain size, modulating a material superlattice structure, modulating a material surface voltage, modulating a material surface electric field distribution, modulating a material magnetic domain structure, and modulating a material magnetic field.
Further, the step 3S2 includes one or more of controlling the state of the target molecule, selecting different excited states by exciting the target molecule with electromagnetic waves, controlling the chemical potential of the target molecule on the material through concentration difference, charging the target molecule through electrostatic introduction, and magnetizing the target molecule through magnetic field introduction.
Further, the feeding of the second beam and the subsequent electromagnetic waves into the ionization region of the target molecule on the surface of the material through the free space comprises the following steps: and 4S1, modulating the wavelength and the distribution of the second beam and the subsequent electromagnetic waves, the spatial distribution, the polarization and orbital angular momentum and the distribution thereof, the phase and the distribution thereof and the like to obtain the second beam and the subsequent modulated electromagnetic waves. 4S2, guiding the second beam and the subsequent modulated electromagnetic wave to be matched with the plasma frequency of the ionized target molecules to obtain frequency-matched modulated electromagnetic waves; 4S3a, emitting the frequency-matched modulated electromagnetic wave into an ionization region of the target molecules on the surface of the material through a free space, absorbing the ionized target molecules and improving the ionization degree of the target molecules.
Further, the method for modulating the wavelength and the distribution thereof in step 4S1 includes one or more of dispersive device modulation, filtering device modulation, refractive device modulation, interferometric modulation, absorption modulation, nonlinear optical modulation, and resonant cavity enhancement modulation.
Further, the spatial distribution modulation method in step 4S1 includes one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, and absorption device modulation.
Further, the polarization and orbital angular momentum and the distribution modulation method thereof in step 4S1 include one or more of single-mode cavity modulation, photoelastic modulation, spatial light modulator modulation, mode converter modulation, birefringent device modulation, and polarizer modulation.
Further, the phase and the distribution thereof in step 4S1 may be modulated by one or more of phase shift modulation, birefringence device modulation, and spatial light modulator modulation.
Further, the frequency matching method in step 4S2 includes one or more of a dispersion device modulation matching, a filter device modulation matching, a refraction device modulation matching, an interference modulation matching, an absorption modulation matching, a nonlinear optical modulation matching, and a direct incidence.
Further, the method for injecting the ionization region in step 4S3a includes one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, absorption device modulation, and direct injection.
Further, the feeding of the second beam and the subsequent electromagnetic waves into the ionization region of the target molecule on the surface of the material through the waveguide specifically comprises the steps of: 4S1, modulating the wavelength and the distribution thereof, the spatial distribution, the polarization and the distribution thereof, the orbital angular momentum and the distribution thereof, the phase and the distribution thereof and other factors of the second beam and the subsequent electromagnetic waves to obtain a second beam and subsequent modulated electromagnetic waves; 4S2, guiding the second beam and the subsequent modulated electromagnetic wave to be matched with the plasma frequency of the ionized target molecules to obtain frequency-matched modulated electromagnetic waves; 4S3b, feeding the frequency-matched modulated electromagnetic wave into an isolator through a waveguide to obtain a unidirectional frequency-matched modulated electromagnetic wave; 4S4b, injecting the unidirectional frequency-matched modulated electromagnetic wave into an ionization region of target molecules on the surface of the material through a waveguide, so that the ionized target molecules are absorbed, and the ionization degree of the target molecules is improved.
Further, the isolator in step 4S3b includes one or more of a waveguide circulator, a fiber optical isolator, a faraday rotator, a coaxial isolator, a strip line isolator, a broadband isolator, a double-section isolator, a microstrip isolator, an attenuator, and a load.
Further, the method for injecting the ionization region in step 4S4b includes one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, absorption device modulation, photonic crystal modulation, waveguide modulation injection, and direct injection.
Further, the target molecule is released in the form of bulk plasma, and the method specifically comprises the following steps: 5S1, leading the plasma of the target molecules out of the surface area of the material to obtain delocalized plasma; and 5S2, restraining the delocalized plasma in a specific space to obtain higher energy density.
Further, the step 5S1 of drawing out the material surface area includes one or more methods selected from vacuum suction, air flow delivery, negative pressure extraction, external ground suction, external electromagnetic wave source guiding, and external current guiding.
Further, the plasma confinement in step 5S2 includes one or more of magnetic field self-hoop confinement, airflow confinement, and collision confinement formed by applying magnetic field confinement, grounding current.
In another aspect, the invention also provides a plasma device, a plasma in the plasma device, comprising a plasma as described in any one or more of the above. The plasma devices involved include, but are not limited to, sensors, plasma sources, reactors, antennas, motors, and the like.
The invention provides a surface coupling induced ionization technology and a corresponding plasma thereof, wherein the induced ionization technology excites the surface plasma wave of a material through an additional electromagnetic wave and enables the bond energy of target molecules to be weakened through the adsorption of the target molecules on the surface of the material, so that the ionization is easy. Furthermore, after the target molecules are ionized, electromagnetic waves are fed in to maintain the ionized molecules and enhance the ionization degree, stable plasma is formed and is led out of the surface of the material, and therefore the normal-pressure plasma source is formed. Different electromagnetic waves, material types and target molecule types are adjusted, various plasmas can be formed, and various requirements are met. The difficulty of the traditional electromagnetic wave for directly ionizing target molecules to form plasma is greatly reduced, and the target molecules can be adsorbed on the material to enable the material to induce the target molecules to be ionized through surface plasma even if the related target molecules do not have the absorption capacity to the electromagnetic wave with specific wavelength. Through the power proportion adjustment between two bundles of electromagnetic waves, can maximize the energy feedback efficiency in the plasma to form the novel plasma that electron temperature and ion temperature range are extremely wide, and energy density is extremely high. The invention also provides a plasma device related to the surface coupling induced ionization technology and corresponding plasma formation.
Compared with the prior art, the invention provides a novel forming mode of the normal-pressure plasma, and the application value of the normal-pressure plasma is very visual. Typical applications include exciting and observing a suitable high-level excited state by a plasma torch, improving the spectral analysis accuracy of the conventional OES, and reaching the ppt or even higher detection limit; or diamond coating under normal pressure or preparation of other nano powder materials is realized; or the method is used for treating the exhaust gas and the tail gas to realize the aim of harmless treatment of the organic exhaust gas; even neutron beam sources for forming high-energy proton beam targets, realizing miniaturization, and the like, have various application possibilities.
In conclusion, the invention has the advantages of wide ionization molecular range, high energy feedback efficiency, high energy density and wide electron temperature and ion temperature range, and provides a reliable premise for widening the application of the plasma.
Drawings
Figure 1 is an atmospheric nitrogen plasma torch formed in accordance with the present invention.
FIG. 2 is a flow chart of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention. It should be noted that the embodiments and features of the embodiments may be combined with each other without conflict.
The invention provides a technical method for surface coupling induced ionization, a corresponding plasma and a plasma device.
The technical method of surface coupling induced ionization refers to that surface interaction between a material and a target molecule is coupled with surface plasmas on the material, so that the target molecule is induced to be ionized and form plasmas.
Compared with the prior art, the inventor of the application innovatively couples the surface plasma of the material with the interaction between the target molecules and the material caused by adsorption for the first time, and further enhances the ionization of the target molecules through electromagnetic waves to form stable plasma. The method greatly reduces the difficulty of forming plasma by target molecules, and can induce the target molecules to be ionized by surface plasma through the adsorption of the target molecules on the material even if the related target molecules do not have the absorption capacity to electromagnetic waves with specific wavelengths.
Based on the concept of the invention, the invention selects a series of materials with different forms, sizes and types as the adsorption medium of target molecules and the carrier of surface plasma.
The material forms comprise solid and liquid. Wherein, the solid form comprises one or more of film, particle, powder, aerosol, photonic crystal and gas-solid two-phase flow; the liquid form includes but is not limited to one or more of liquid drops, dispersion liquid and gas-liquid two-phase flow. The materials with different forms are selected to provide different specific surface areas and microstructures mainly through the different forms, and further additional wave vectors on the materials can be controlled through the forms, so that surface plasma waves can be excited more easily.
The size of the material is 0.3nm-1000mm, preferably 1 nm-100 um. The material with the size is selected, mainly because in the size range, the surface plasmon is confined on the particle boundary from nanometer to submicron scale, and has great wave vector uncertainty, so that the requirement on the angle of the incident angle of surface plasmon coupling is reduced, and wave vector matching is easy to realize.
The material comprises one or more of metal and alloy materials, carbon materials, ceramic materials, organic conductor materials and semiconductor materials. Further, the carbon material includes one or more of defect-free graphene, high-defect graphene, aminated graphene, carboxylated graphene, hydroxylated graphene, sulfhydrylated graphene, oxidized graphene, methylated graphene, trifluoromethylated graphene, octadecylated graphene, fluorinated graphene, iodinated graphene, artificial graphite, natural graphite, graphitized carbon microspheres, graphitized carbon nanotubes, glassy carbon, amorphous carbon, carbon nanohorns, carbon fibers, carbon quantum dots, and carbon molecular sieves. Such materials are selected mainly for their various band gaps, allowing excitation under different excitation conditions, and tend to have good surface plasmon quality factors, and the formed surface plasmons can propagate far, which results in a higher ionization probability of the target molecule.
The technical method of the surface coupling induced ionization is that a first beam of electromagnetic waves is fed to a material through free space or a waveguide, so that the first beam of electromagnetic waves and surface plasma of the material generate resonance and excite the surface plasma waves. Meanwhile, target molecules to be ionized are introduced to the surface of the material, and the electrons of the target molecules are coupled with surface plasmon polaritons on the material by controlling the interaction between the surface of the material and the target molecules, so that the target molecules are induced to be ionized. Synchronously, the second beam and the subsequent electromagnetic waves are fed into the ionization region of the target molecules on the surface of the material through the free space or the waveguide, so that the ionized target molecules are absorbed, and the ionization degree of the target molecules is improved. Finally, the target molecules are released in the form of bulk plasma, and surface coupling induced ionization is realized.
Because the isolation of the incident electromagnetic wave is easily realized through the waveguide, and the damage to the electromagnetic wave source in the working process is avoided, the invention preferably adopts the mode that the first beam of electromagnetic wave, the second beam and the subsequent electromagnetic wave are incident through the waveguide.
Specifically, the method comprises the following steps:
1S1, modulating the wavelength and the distribution of the first beam of electromagnetic wave, the spatial distribution, the polarization and orbital angular momentum and the distribution thereof, the phase and the distribution thereof and other factors to obtain a first beam of modulated electromagnetic wave;
1S2b, feeding the first beam of modulated electromagnetic waves into an isolator through a waveguide to obtain a unidirectional first beam of modulated electromagnetic waves;
1S3b, guiding the unidirectional first beam of modulated electromagnetic waves to match with the wave vector of the surface plasma frequency of the material to obtain wave vector matching unidirectional modulated electromagnetic waves;
1S4b, the wave vector matching unidirectional modulation electromagnetic wave is injected into the surface of the material through the waveguide, so that the surface of the material forms a surface plasma wave.
2S1, introducing the target molecules into a gas phase environment to obtain target molecules in a gas phase;
2S2, moving the target molecules in the gas phase to the surface of the material;
3S1, controlling the distribution of the material microstructure and the surface electromagnetic field to obtain the adjusted material;
3S2, controlling the state of the target molecule to obtain the adjusted target molecule;
3S3, combining the modulated material with the regulated target molecules, realizing the interaction control between the material surface and the target molecules, and causing the ionization of the target molecules.
4S1, modulating the wavelength and the distribution thereof, the spatial distribution, the polarization and the distribution thereof, the orbital angular momentum and the distribution thereof, the phase and the distribution thereof and other factors of the second beam and the subsequent electromagnetic waves to obtain a second beam and subsequent modulated electromagnetic waves;
4S2, guiding the second beam and the subsequent modulated electromagnetic wave to be matched with the plasma frequency of the ionized target molecules to obtain frequency-matched modulated electromagnetic waves;
4S3b, feeding the frequency-matched modulated electromagnetic wave into an isolator through a waveguide to obtain a unidirectional frequency-matched modulated electromagnetic wave;
4S4b, injecting the unidirectional frequency-matched modulated electromagnetic wave into an ionization region of target molecules on the surface of the material through a waveguide, so that the ionized target molecules are absorbed, and the ionization degree of the target molecules is improved.
5S1, leading the plasma of the target molecules out of the surface area of the material to obtain delocalized plasma;
and 5S2, restraining the delocalized plasma in a specific space to obtain higher energy density.
For the characteristics of the incident electromagnetic wave source, ideally an input that achieves maximum power without modulation would be desirable, since whatever type of modulation would cause power loss to the incident electromagnetic wave.
Therefore, by analyzing the beam requirements, it can be known that:
the first beam of electromagnetic waves is one or more of gamma rays, hard X rays, soft X rays, extreme ultraviolet rays, near ultraviolet rays, visible light, near infrared rays, middle infrared rays, far infrared rays, terahertz, very high frequency microwaves, ultrahigh frequency microwaves, very high frequency radio waves, intermediate frequency radio waves, low frequency radio waves, very low frequency radio waves, ultrahigh frequency radio waves and very low frequency radio waves, and preferably soft X rays, extreme ultraviolet rays, near ultraviolet rays, visible light, near infrared rays, middle infrared rays, terahertz, ultrahigh frequency microwaves and ultrahigh frequency microwaves.
The wavelength and the distribution of the first beam of electromagnetic waves are 0.01 nm-100 km, preferably 10 nm-1 m.
The spatial distribution of the first beam of electromagnetic wave comprises one or more of a Gaussian beam, a Bessel beam, an Airy beam, a Laguel-Gaussian beam, a cosine-Gaussian beam, a Mathieu beam, a flat-top beam and a vortex beam, and the first beam of electromagnetic wave is preferably a Gaussian beam, a Bessel beam, a Laguel-Gaussian beam and a flat-top beam.
The first beam of electromagnetic waves has a polarization degree of 0.01% -99%, preferably 90% -99%.
The polarization mode of the first beam of electromagnetic waves comprises one or more of natural light, partial polarization, linear polarization, circular polarization, elliptical polarization, azimuthal polarization and radial polarization, and linear polarization is preferred.
The polarization of the first beam of electromagnetic waves comprises S wave polarization and P wave polarization, and P wave polarization is preferred.
The orbital angular momentum of the first beam of electromagnetic waves and the distribution thereof are-10 to + 10. Preferably ± 1.
The phase and the distribution of the first beam of electromagnetic waves are 0-2 pi.
The second and subsequent electromagnetic waves are one or more of gamma rays, hard X rays, soft X rays, extreme ultraviolet rays, near ultraviolet rays, visible light, near infrared rays, middle infrared rays, far infrared rays, terahertz, extremely high frequency microwaves, ultrahigh frequency microwaves, very high frequency radio waves, intermediate frequency radio waves, low frequency radio waves, very low frequency radio waves, and extremely low frequency radio waves, and preferably near infrared rays, middle infrared rays, far infrared rays, terahertz, extremely high frequency microwaves, ultrahigh frequency microwaves, very high frequency radio waves, and intermediate frequency radio waves.
The wavelength and the distribution of the electromagnetic waves of the second beam and the subsequent beams are 0.01 nm-100 Km, preferably 1um-1 Km.
The spatial distribution of the second beam and the subsequent electromagnetic waves comprises one or more of a Gaussian beam, a Bessel beam, an Airy beam, a Laguerre-Gaussian beam, a cosine-Gaussian beam, a Mathieu beam, a flat-top beam and a vortex beam, and the second beam and the subsequent electromagnetic waves are preferably Gaussian beams and flat-top beams.
The polarization degree of the second beam and the subsequent electromagnetic waves is 0.01-99%, preferably 0.01-0.1%.
The polarization mode of the second beam and the subsequent electromagnetic waves comprises one or more of natural light, partial polarization, linear polarization, circular polarization, elliptical polarization, azimuth polarization and radial polarization, and preferably, the polarization mode of the second beam and the subsequent electromagnetic waves is natural light and partial polarization.
The polarization of the second beam and subsequent electromagnetic waves includes S-wave polarization and P-wave polarization.
The second beam and the subsequent electromagnetic waves have orbital angular momentum and a distribution of-10 to +10, preferably 0.
The second beam and the subsequent electromagnetic waves have phases and distributions of 0-2 pi.
In addition, the inventors of the present application found that the absorption levels of the target molecule for the electromagnetic waves before and after ionization are greatly different, so that the electromagnetic waves required before and after ionization are separated, and the utilization rate of the fed electromagnetic waves is guaranteed to be maximized. The beam used before ionization is characterized by a specific wavelength and mode at a certain power and by a distribution of energy that is as concentrated as possible, while the beam used after ionization is characterized by a power that is as high as possible to ensure that the process of forming the bulk plasma after ionization is completed as quickly as possible and has a higher excited state.
Therefore, by analyzing the beam requirements, it can be known that:
the method for modulating the wavelength and the distribution thereof in step 1S1 includes one or more of dispersion device modulation, filter device modulation, refraction device modulation, interference modulation, absorption modulation, nonlinear optical modulation, and resonant cavity enhancement modulation, preferably interference modulation, absorption modulation, filter device modulation, and resonant cavity enhancement modulation.
The spatial distribution modulation method in step 1S1 includes one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, and absorption device modulation, and is preferably transmission antenna modulation, refraction device modulation, and spatial light modulator modulation.
The method for modulating the polarization and orbital angular momentum and the distribution thereof in step 1S1 includes one or more of single-mode cavity modulation, photoelastic modulation, spatial light modulator modulation, mode converter modulation, birefringence device modulation, and polarizer modulation, preferably single-mode cavity modulation, photoelastic modulation, spatial light modulator modulation, and mode converter modulation.
The phase and distribution modulation method in step 1S1 includes one or more of phase shift modulation, birefringence modulation, and spatial light modulator modulation, preferably spatial light modulator modulation.
The isolator in step 1S2b includes one or more of a waveguide circulator, a fiber optical isolator, a faraday rotator, a coaxial isolator, a strip line isolator, a broadband isolator, a double-section isolator, a microstrip isolator, an attenuator, and a load, preferably a waveguide circulator, a fiber waveguide circulator, and a fiber optical isolator.
The wave vector matching method in step 1S3b includes one or more of direct matching, preferably waveguide-coupled prism total internal reflection, multiple frustrated total internal reflection device, waveguide total internal reflection device, irradiation of a near-field waveguide probe smaller than a wavelength, direct matching, and direct matching by using a grating, a photonic crystal waveguide, waveguide-coupled prism total internal reflection, a metamaterial waveguide having a dielectric constant smaller than 1, a multiple frustrated total internal reflection device, a waveguide total internal reflection device, a total internal reflection device, irradiation of a near-field waveguide probe smaller than a wavelength.
The method for modulating the wavelength and the distribution thereof in step 4S1 includes one or more of dispersion device modulation, filter device modulation, refractive device modulation, interference modulation, absorption modulation, nonlinear optical modulation, and resonant cavity enhancement modulation, preferably dispersion modulation, and filter device modulation.
The spatial distribution modulation method in step 4S1 includes one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, and absorption device modulation, and preferably includes transmission antenna modulation, variable curvature reflection device modulation, and matrix reflection device modulation.
The method for modulating the polarization and orbital angular momentum and the distribution thereof in step 4S1 includes one or more of single-mode cavity modulation, photoelastic modulation, spatial light modulator modulation, mode converter modulation, birefringence device modulation, and polarizer modulation, preferably spatial light modulator modulation and mode converter modulation.
The phase and its distribution modulation method in step 4S1 includes one or more of phase shift modulation, birefringence modulation, and spatial light modulator modulation, preferably phase shift modulation and spatial light modulator modulation.
The frequency matching method in step 4S2 includes one or more of a dispersion device modulation matching, a filter device modulation matching, a refraction device modulation matching, an interference modulation matching, an absorption modulation matching, a nonlinear optical modulation matching, and a direct incidence, and preferably, the frequency matching method is a nonlinear optical modulation matching or a direct incidence.
Step 2S1-2S2 is to vaporize the target molecule to introduce the target molecule to the surface of the material, ionizing the target molecule. When the target molecule is gas at normal temperature and normal pressure, the ionization efficiency is highest. In addition, for gas molecules, the non-ionized gas itself can also be used as a carrier gas to carry plasma, so the gas molecules are preferably selected as target molecules.
Accordingly, by analyzing the characteristics of the target molecule, it is found that:
the target molecule in step 2S1 is introduced into a gas phase environment by one or more methods selected from ultrasonic atomization, heating evaporation, vacuum evaporation, direct evaporation, and gas flow entrainment, preferably direct evaporation or gas flow entrainment.
The moving to the material surface in step 2S2 includes one or more of optical tweezers displacement, ultrasonic tweezers displacement, mechanical force displacement, airflow loading, vacuum suction displacement, probe pulling displacement, and magnetic force displacement, and is preferably airflow loading or vacuum suction displacement.
Further, the applicant of the present invention found that steps 3S1-3S3 involve controlling the interaction between the target molecule and the material, so that the target molecule is ionized by the surface plasmon on the surface of the material as much as possible. The process has a large influence on the coupling efficiency, and the stronger the interaction, the more easily the surface plasmon on the surface of the material causes ionization of the target molecule. On the other hand, the simpler the requirements on the processing of the material surface and the regulation conditions for the target molecules are, the easier the implementation is.
In summary, for the conditions used in the process of modulating the interaction, the following should be mentioned:
the controlling of the material microstructure and the surface electromagnetic field distribution in step 3S1 includes one or more of a method of forming a nanoscale periodic microstructure on the material surface, forming a nanoscale aperiodic microstructure on the material surface, forming a microscale periodic microstructure on the material surface, forming a microscale aperiodic microstructure on the material surface, modulating a material surface functional group structure, modulating a material surface defect state density structure, modulating a material surface doped structure, modulating a material domain size, modulating a material superlattice structure, modulating a material surface voltage, modulating a material surface electric field distribution, modulating a material magnetic domain structure, and modulating a material magnetic field.
The step 3S2 is to control the state of the target molecule, and includes one or more of selecting different excited states by exciting the target molecule with electromagnetic waves, controlling the chemical potential of the target molecule on the material by concentration difference, charging the target molecule by electrostatic induction, magnetizing the target molecule by magnetic field induction, preferably controlling the chemical potential of the target molecule on the material by concentration difference, and selecting different excited states by exciting the target molecule with electromagnetic waves.
Finally, in the process of leading out the plasma, when the target molecules are gas or the plasma is led out by using carrier gas, the most natural leading-out mode and constraint mode, namely gas flow conveying and gas flow constraint, can be found easily. In some environments where it is desirable to introduce a plasma into a vacuum chamber, the plasma may also be drawn into the vacuum chamber by means of vacuum attraction. In addition, when a current is formed inside the plasma, a self-hooping magnetic field is generated due to the magnetic effect of the current, so that the plasma is restrained, and the extracted plasma can be guided by an external electromagnetic wave source, so that the extracted plasma is further enhanced.
Therefore, for the plasma to be formed by extraction and confinement, it should be:
the drawing of the material surface area in step 5S1 includes one or more of vacuum suction, air flow conveyance, negative pressure suction, external ground suction, external electromagnetic wave source guidance, and external current guidance, and is preferably vacuum suction, air flow conveyance, external ground suction, and external electromagnetic wave source guidance.
The plasma confinement in step 5S2 includes one or more of magnetic field self-hoop confinement by applying magnetic field confinement, air flow confinement and collision confinement by ground current, preferably magnetic field self-hoop confinement by ground current, air flow confinement and collision confinement by ground current.
Compared with the conventional plasma formation process in which energy is directly fed to target molecules to be ionized through electromagnetic waves or other methods, the efficiency of feeding energy to ionized target molecules through electromagnetic waves is much higher, mainly because the maximum absorption efficiency can be achieved through resonance when the frequency of ionized target molecules is matched with the frequency of fed electromagnetic waves. On the other hand, in the conventional plasma forming process, target molecules to be ionized often have no special absorption capacity for the fed electromagnetic wave, but the material concerned can be made to be nearly fully absorbed by the fed electromagnetic wave by controlling the state of the material. This makes the initial formation of the plasma provided by the present invention much easier than the initial formation of conventional plasmas. In summary, the present invention has the advantages of wide molecular range of ionization, high energy feedback efficiency, high energy density, and wide electron temperature and ion temperature range.
Correspondingly, the invention also provides a plasma device, which comprises the plasma. Because the plasma has the advantages, the plasma device provided with the plasma also has the advantages of wide ionized molecular range, high energy feedback efficiency, high energy density and wide electron temperature and ion temperature range,
the scheme of the invention is further described in the following by reference to specific examples.
Example 1
The first beam of electromagnetic wave uses 1550nm near infrared Gaussian beam, the material used is 30nm gold film, and the material is plated on the end of 1550nm optical fiber. The target molecule ionized is carbon monoxide. The second beam of electromagnetic waves uses a 6um mid-infrared gaussian beam.
The 1550nm near infrared laser beam is emitted from the laser as a Gaussian beam with a polarization degree of 98% and a orbital angular momentum of 0. After the light is emitted, the wavelength distribution is controlled through interference modulation, the spatial distribution is modulated through a refraction device, the polarization distribution is modulated through photoelastic modulation, and the phase is modulated through a spatial light modulator. And after modulation is finished, feeding the optical fiber into the optical fiber isolator by using the polarization maintaining optical fiber as a waveguide, and forming surface plasma on the surface of the gold film at the tail end of the optical fiber through total internal reflection of the optical fiber waveguide.
Carbon monoxide is conveyed through a steel cylinder, carbon monoxide airflow is obtained through direct gasification, nitrogen is used as carrier gas and conveyed to the surface of the gold film, chemical potential is controlled through concentration difference, and crystal domains are modulated to obtain stronger interaction. After completion, carbon monoxide is adsorbed on the surface of the gold thin film and is further induced by surface plasma on the surface of the gold thin film, causing ionization of carbon monoxide.
The 6um middle infrared laser is emitted by the laser and is a Gaussian beam, the polarization degree is 90%, and the orbital angular momentum is 0. After the emergent light is emitted, the wavelength distribution of the emergent light is modulated and controlled through a filter device, the space and phase distribution of the emergent light is modulated and controlled through a spatial light modulator, and the polarization of the emergent light is modulated through a mode converter. After modulation is finished, the high-power optical fiber is used as a waveguide to be fed into the optical fiber optical isolator, and then the high-power optical fiber is injected into a carbon monoxide ionization area through the optical fiber to form carbon monoxide plasma.
And finally, conveying the gas flow by nitrogen carrier gas, and restraining the gas flow to form stable atmospheric-pressure carbon monoxide plasma.
Example 2
The first beam of electromagnetic waves uses a 405nm Bessel beam, the material used is a 1um carbon nanotube, and the material is placed below the prism face. The target molecules ionized are iodine molecules. The second beam of electromagnetic waves uses a 32.75cm microwave gaussian beam.
The blue-violet light with the wavelength of 405nm is emitted from L ED, is a Bessel light beam, has the polarization degree of 18 percent and the orbital angular momentum of 0, the wavelength distribution of the blue-violet light is modulated and controlled by a dispersion device after the blue-violet light is emitted, the spatial distribution of the blue-violet light is modulated and modulated by a matrix reflection device, the polarization distribution of the blue-violet light is modulated by a polaroid, the phase of the blue-violet light is modulated by a birefringent device, and after the blue-violet light is modulated, the blue-violet light is fed into an optical fiber waveguide circulator as a waveguide through a quartz optical fiber, and.
Iodine molecules are evaporated by heat, argon is taken as carrier gas and sent to the surface of the carbon nano tube, the iodine molecules on the surface of the carbon nano tube are excited by electromagnetic waves, and the surface of the carbon nano tube is doped and modulated to obtain stronger interaction. After completion, iodine molecules are adsorbed on the surface of the carbon nanotube powder and are further induced by surface plasma on the surface of the carbon nanotube powder, causing ionization of iodine.
The 32.75cm microwave is emitted from a 915Mhz microwave source through a waveguide, is a Gaussian beam, has the polarization degree of 0.01 percent and the orbital angular momentum of 0. After the emergent light is emitted, the wavelength distribution is controlled by a resonant cavity enhanced modulation system, the spatial distribution is controlled by transmission antenna modulation, the phase distribution is modulated by phase shift modulation, and the polarization is modulated by single-mode cavity modulation. After modulation is finished, the mixture is fed into the system through the waveguide and then is directly injected into the iodine molecule ionization region through the waveguide to form iodine plasma.
And finally, carrying gas flow conveying by argon gas carrier, colliding and constraining to form stable atmospheric-pressure carbon monoxide plasma.
Example 3
The first beam of electromagnetic waves used a 12.24cm microwave gaussian beam and the material used was 1mm iron particles, which were placed on a flat surface. The target molecule ionized is oxygen. The second beam of electromagnetic waves uses a 12.24cm microwave gaussian beam.
The microwave of 12.24cm is emitted from a microwave source of 2450Mhz through a waveguide, is a Gaussian beam, has the polarization degree of 0.04 percent and the orbital angular momentum of 0. After the light is emitted, the wavelength distribution is controlled through absorption modulation, the spatial distribution is controlled through a variable curvature reflector, the polarization distribution is modulated through a single-mode cavity, and the phase is modulated through phase shifting. After modulation is finished, feeding iron particles on the flat plate in a free space, and injecting the iron particles into the surface of the iron particles to form surface plasma through direct matching.
Oxygen is conveyed through a steel cylinder, directly gasified and conveyed to the surface of iron particles, air is used as carrier gas, chemical potential is controlled through concentration difference, and the surface voltage of the material is modulated to obtain stronger interaction. Upon completion, oxygen is adsorbed on the surface and is further induced by surface plasmons on the surface of the iron particles, causing oxygen ionization.
The microwave of 12.24cm is emitted from a microwave source of 2450Mhz through a waveguide, is a Gaussian beam, has the polarization degree of 0.04 percent and the orbital angular momentum of 0. After the emergent light is emitted, the wavelength distribution is modulated and controlled through a filter device, the spatial distribution is modulated and controlled through a transmission antenna, the phase distribution is modulated and modulated through a refraction device, and the polarization is modulated and modulated through a mode converter. After modulation, the free space is fed into the system and then is injected into the oxygen ionization region through interference modulation matching to form oxygen plasma.
And finally, pumping out and conveying the plasma through negative pressure to collide and restrain, and forming stable normal-pressure oxygen plasma.
Example 4
The first beam of electromagnetic waves uses a 365nm near ultraviolet Gaussian beam, the used material is 0.2um fluorinated graphene, and the material is placed on a plane. The target molecule ionized is nitrogen trifluoride. The second beam of electromagnetic waves uses a 12.24cm microwave flat-top beam.
365nm near ultraviolet laser is emitted by a laser and is a Gaussian beam, the polarization degree is 92%, and the orbital angular momentum is 0. After the light is emitted, the wavelength distribution is controlled through interference modulation, the spatial distribution is controlled through a spatial light modulator, the polarization distribution is modulated through a mode conversion modulator, and the phase is modulated through a birefringence device. And after modulation is finished, feeding the graphene into a plane through a free space, and injecting the graphene into the surface of the fluorinated graphene to form surface plasma.
And conveying nitrogen trifluoride through a steel cylinder, directly gasifying to obtain nitrogen trifluoride gas flow, conveying the nitrogen trifluoride gas flow to the surface of the fluorinated graphene by taking the nitrogen as carrier gas, charging the nitrogen trifluoride gas by electrostatic introduction, and modulating the electric field distribution on the surface of the fluorinated graphene to obtain stronger interaction. Upon completion, nitrogen trifluoride is adsorbed on the surface and further induced by surface plasmons on the fluorinated graphene surface, causing nitrogen trifluoride to ionize.
The microwave of 12.24cm is emitted from a microwave source of 2450Mhz through a waveguide and is a flat-topped beam, the polarization degree is 0.1%, and the orbital angular momentum is 0. After the emergent light is emitted, the wavelength distribution is controlled by enhancing modulation of the resonant cavity, the spatial distribution is controlled by modulating the matrix emitting device, the phase distribution is modulated by modulating the refraction device, and the polarization is modulated by modulating the mode converter. After modulation is finished, the nitrogen trifluoride plasma is fed into the system through the waveguide and then directly injected into a nitrogen trifluoride ionization region through the waveguide to form nitrogen trifluoride plasma.
And finally, pumping out and conveying the nitrogen trifluoride gas by negative pressure, and carrying out gas flow restraint to form stable normal-pressure nitrogen trifluoride plasma.
Example 5
The first electromagnetic wave uses a 980nm near infrared gaussian beam and the material used is 10um glassy carbon, which is placed on a grating. The target molecule ionized is ammonia. The second beam of electromagnetic waves uses a near infrared vortex beam of 1.064 um.
The 980nm near infrared light is emitted by the laser and is a Gaussian beam, the polarization degree is 85%, and the orbital angular momentum is 0. After the emergent light is emitted, the wavelength distribution of the emergent light is modulated and controlled through a filter device, the spatial distribution of the emergent light is modulated and controlled through a refraction device, the polarization distribution of the emergent light is modulated through a birefringence device, and the phase of the emergent light is modulated through a spatial light modulator. After modulation, the free space is fed into the grating and is injected into the surface of the glassy carbon to form surface plasma.
The ammonia is evaporated by heating, the ammonia is taken as carrier gas and sent to the surface of the glassy carbon, target molecules are charged by electrostatic introduction, and a micrometer-scale periodic microstructure is formed on the surface of the glassy carbon to obtain stronger interaction. Upon completion, ammonia gas is adsorbed on the surface and is further induced by surface plasmons on the glassy carbon surface, causing the ammonia gas to ionize.
The near-infrared light of 1.064um is emitted by the laser and is a vortex light beam, the polarization degree is 91%, and the orbital angular momentum is +/-1. After the light is emitted, the wavelength distribution of the light is controlled through nonlinear optical modulation, the spatial distribution of the light is controlled through variable curvature reflecting device modulation, the phase distribution of the light is modulated through a birefringent device, and the polarization of the light is modulated through a spatial light modulator. And after modulation is finished, feeding the mixture into a system in a free space, modulating the mixture by a transmission antenna and injecting the mixture into an ammonia ionization area to form ammonia plasma.
And finally, carrying out external grounding attraction, wherein the grounding current forms a magnetic field and is restrained by self-hooping, and a stable normal-pressure ammonia plasma is formed.
Example 6
The first beam uses a 265nm near ultraviolet Mathieu beam, the material used is 10um β -alumina powder, the material is placed on the surface of the micro-scale waveguide, the ionized target molecules are water molecules, and the second beam uses a 1.54um near infrared Gaussian beam.
265 extreme ultraviolet light is emitted from L ED and is a Matiuer beam, the polarization degree is 76%, the orbital angular momentum is 0.07%, the wavelength distribution of the light is controlled by interference modulation after the light is emitted, the spatial distribution of the light is controlled by a spatial light modulator, the polarization distribution of the light is modulated by a polaroid, the phase of the light is modulated by phase shifting, and after the modulation is finished, the free space is fed into a double-section isolator and is emitted into β -alumina surface to form surface plasma through a multiple attenuation total internal reflection device.
Water molecules are displaced by optical tweezers and are sent to the surface of β -alumina, target molecules are excited by electromagnetic waves to select different excited states, and β -alumina surface voltage is modulated to obtain stronger interaction, after the interaction is completed, the water molecules are adsorbed on the surface and are further induced by surface plasmas on the surface of β -alumina, so that water molecules are ionized.
The laser of 1.54um is emitted by acetylene frequency stabilized laser, is a Gaussian beam, the polarization degree is 2%, and the orbital angular momentum is +/-1. After the light is emitted, the wavelength distribution of the light is modulated and controlled by a dispersion device, the spatial distribution of the light is controlled by a variable curvature emitting device, the phase distribution of the light is modulated by photoelastic modulation, and the polarization of the light is modulated by a spatial light modulator. After modulation is finished, the high-power optical fiber is used as a waveguide to be fed into a broadband isolator system, and then the high-power optical fiber is adjusted by the optical fiber waveguide to be injected into a water molecule ionization region to form water molecule plasma.
And finally, external current is used for guiding and conveying, and a magnetic field is applied for constraint, so that stable normal-pressure water molecule plasma is formed.
Example 7
The first beam of electromagnetic waves uses a 10nm soft X-ray gaussian beam, the material used is 30nm perovskite quantum dots, which are placed on a micro-scale surface. The target molecule ionized is copper phthalocyanine. The second beam of electromagnetic waves uses a 32.75cm microwave Airy beam.
The 10nm soft X-ray is emitted from the X-ray tube and is a Gaussian beam, the polarization degree is 0.09%, and the orbital angular momentum is 0. After the light is emitted, the wavelength distribution is controlled through absorption modulation, the spatial distribution is controlled through the modulation of an absorption device, the polarization distribution is modulated through a double refraction device, and the phase is modulated through the double refraction device. After modulation is finished, feeding the soft X-ray fiber waveguide into a fiber waveguide circulator, irradiating the soft X-ray fiber waveguide by a near-field waveguide probe with the wavelength less than that of the soft X-ray fiber waveguide, and injecting the soft X-ray fiber waveguide into the surface of the perovskite quantum dot to form surface plasma.
The copper phthalocyanine is dragged to displace by a probe and is sent to the surface of the perovskite quantum dot, different excited states are selected by exciting a target molecule through electromagnetic waves, and the size of a material crystal domain is modulated to obtain stronger interaction. After completion, copper phthalocyanine is adsorbed on the surface of the perovskite quantum dot and is further induced by surface plasmons on the surface of the perovskite, causing copper phthalocyanine to ionize.
The 32.75cm microwave is emitted by a 915Mhz microwave traveling wave tube and is an Aili light beam, the polarization degree is 0.5%, and the orbital angular momentum is 0. After the emergent light is emitted, the wavelength distribution is controlled by the enhanced modulation of the resonant cavity, the spatial distribution is controlled by the modulation of the transmission antenna, the phase distribution is modulated by the phase shift modulation, and the polarization is modulated by the single-mode cavity. After modulation is finished, the plasma is fed into a system through a waveguide and is modulated by a transmission antenna to be emitted into a copper phthalocyanine ionization area to form copper phthalocyanine plasma.
And finally, the stable normal-pressure copper phthalocyanine plasma is formed by guiding and conveying through an external electromagnetic wave source and externally applying magnetic field constraint.
Example 8
For the first beam of electromagnetic waves, a 0.11mm terahertz Bobo Gaussian beam is used, and the used material is a PEDOT-PSS film with the thickness of 1um, and the material is placed inside the cavity. The target molecule ionized is acetaminophen. The second beam of electromagnetic waves uses a microwave Gaussian beam of 5.1 cm.
The 0.11mm terahertz wave is emitted by the 2.7THz terahertz antenna and is a Gaussian beam, the polarization degree is 0.09%, and the orbital angular momentum is 0. After the emergent light is emitted, the wavelength distribution is modulated and controlled through a filter device, the spatial distribution is modulated and controlled through a transmission antenna, the polarization distribution is modulated through a single-mode cavity, and the phase is modulated through phase shifting. And after modulation is finished, feeding the mixed solution into a single-mode cavity through a waveguide, and injecting the mixed solution into the surface of PEDOT-PSS through a metamaterial device with the dielectric constant less than 1 to form surface plasma.
Acetaminophen is ultrasonically atomized, and is transferred to the surface of PEDOT-PSS through ultrasonic acoustic tweezers displacement, target molecules are charged through electrostatic introduction, and the structure of functional groups on the surface of a material is modulated to obtain stronger interaction. After completion, acetaminophen is adsorbed on the PEDOT-PSS surface and further induced by surface plasmons on the PEDOT-PSS surface, causing acetaminophen ionization.
The microwave of 5.1cm is emitted from a microwave magnetron of 5.8GHz and is a Gaussian beam, the polarization degree is 1.1%, and the orbital angular momentum is 0. After the emergent light is emitted, the resonant cavity enhances and modulates to control the wavelength distribution of the light, the transmission antenna modulates to control the spatial distribution of the light, the phase distribution of the light is modulated by phase shift modulation, and the polarization of the light is modulated by the single-mode cavity. After modulation, the mixture is fed into a system through a waveguide circulator and is modulated and injected into an acetaminophen ionization region through an absorption device to form acetaminophen plasma.
And finally, forming stable normal-pressure acetaminophen plasma through vacuum suction conveying and collision constraint.
Example 9
The first beam of electromagnetic waves uses extreme ultraviolet rays of 13.4nm, the used material is carbon fiber of 20um, and the material is placed inside the cavity. The target molecule ionized is nitrogen. The second beam of electromagnetic waves uses medium frequency radio waves of 100 m.
The extreme ultraviolet ray of 13.4nm is emitted from a plasma light source and is a Gaussian beam, the polarization degree is 0.01%, and the orbital angular momentum is 0. After the light is emitted, the wavelength distribution of the light is controlled through nonlinear optical modulation, the spatial distribution of the light is controlled through variable curvature reflector modulation, the polarization distribution of the light is modulated through a single-mode cavity, and the phase of the light is modulated through phase shifting. And after modulation is finished, feeding the free space into the cavity, and directly matching to inject the free space into the surface of the carbon fiber to form surface plasma.
The nitrogen is conveyed through a steel cylinder, is directly gasified to obtain nitrogen airflow, and is carried to the surface of the carbon fiber through airflow, the chemical potential of target molecules on the material is controlled through concentration difference, and a micrometer-scale periodic microstructure is formed on the surface of the material to obtain stronger interaction. After completion, the nitrogen gas is adsorbed on the surface and further subjected to surface plasma induction of the carbon fiber surface, causing nitrogen gas ionization.
The medium frequency radio wave of 100m is emitted from the antenna as a Gaussian beam, the polarization degree is 3.5%, and the orbital angular momentum is 0. After the light is emitted, the wavelength distribution is controlled through interference modulation, the spatial distribution is controlled through transmission antenna modulation, the phase distribution is modulated through phase shifting, and the polarization is modulated through a mode converter. After modulation is finished, the nitrogen gas is fed into the system through the waveguide and is modulated and matched by the filter device to be injected into the nitrogen gas ionization area to form nitrogen gas plasma.
And finally, forming stable normal-pressure nitrogen plasma through vacuum suction conveying and airflow constraint.
Example 10
The first beam of electromagnetic waves was a 12.24cm microwave gaussian beam using 50nm cerium oxide aerogel material placed on a flat plate. The target molecule ionized is nitrogen dioxide. The second beam of electromagnetic waves uses medium frequency radio waves of 100 m.
The microwave of 12.24cm is emitted from a microwave source of 2450Mhz through a waveguide, is a Gaussian beam, has the polarization degree of 0.04 percent and the orbital angular momentum of 0. After the light is emitted, the wavelength distribution is controlled through absorption modulation, the spatial distribution is controlled through a variable curvature reflector, the polarization distribution is modulated through a single-mode cavity, and the phase is modulated through phase shifting. And after modulation is finished, feeding in through a free space, and injecting into the surface of the cerium oxide aerogel through a multiple attenuation total internal reflection device to form surface plasma.
The nitrogen dioxide is conveyed through a steel cylinder, is directly gasified to obtain nitrogen dioxide airflow, is conveyed to the surface of the cerium oxide aerogel through nitrogen carrier gas, controls the chemical potential of target molecules on the material through concentration difference, and forms a nanoscale aperiodic microstructure on the surface of the material to obtain stronger interaction. After completion, nitrogen dioxide is adsorbed on the surface of the cerium oxide aerogel and is further induced by surface plasma on the surface of the cerium oxide aerogel, causing nitrogen dioxide to be ionized.
The medium frequency radio wave of 100m is emitted from the antenna as a Gaussian beam, the polarization degree is 3.5%, and the orbital angular momentum is 0. After the light is emitted, the wavelength distribution is controlled through interference modulation, the spatial distribution is controlled through transmission antenna modulation, the phase distribution is modulated through phase shifting, and the polarization is modulated through a mode converter. After modulation is finished, the nitrogen dioxide plasma is fed in through the free space through the antenna, and is modulated and matched to be emitted into the nitrogen dioxide ionization region through the filter device to form the nitrogen dioxide plasma.
Finally, stable normal-pressure nitrogen dioxide plasma is formed through air flow conveying and air flow restraint
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.

Claims (60)

1. A surface-coupled induced ionization technique comprising any one of the following steps:
(1) feeding a first beam of electromagnetic waves to the material through a free space or a waveguide, enabling the first beam of electromagnetic waves to resonate with surface plasma of the material, and exciting the surface plasma waves; introducing target molecules to be ionized to the surface of the material, and coupling electrons of the target molecules with surface plasmon polaritons on the material by controlling the interaction between the surface of the material and the target molecules to induce the ionization of the target molecules;
(2) synchronously passing through a free space or a waveguide, and feeding a second beam and subsequent electromagnetic waves into an ionization region of target molecules on the surface of the material, so that the ionized target molecules are absorbed, and the ionization degree of the target molecules is improved;
(3) target molecules are released in the form of bulk plasma, and surface coupling induced ionization is realized.
2. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the form of the material in the step 1 comprises solid and liquid; wherein, the solid form comprises one or more of film, particle, powder, aerosol, photonic crystal and gas-solid two-phase flow; the liquid form comprises one or more of liquid drops, dispersion liquid and gas-liquid two-phase flow.
3. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the size of the material in the step 1 is 0.3nm-1000 mm.
4. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the material in the step 1 comprises one or a mixture of more than one of metal and alloy materials, carbon materials, ceramic materials, organic conductor materials and semiconductor materials.
5. A surface-coupled induced ionization technique as claimed in claim 4, wherein: the metal and alloy material in step 1 includes one or more of metals or alloys containing lithium, beryllium, boron, carbon, sodium, magnesium, aluminum, silicon, phosphorus, sulfur, scandium, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, gallium, germanium, arsenic, rubidium, strontium, yttrium, zirconium, niobium, molybdenum, technetium, ruthenium, rhodium, palladium, silver, cadmium, indium, tin, antimony, tellurium, cesium, barium, hafnium, tantalum, tungsten, rhenium, osmium, iridium, platinum, gold, mercury, thallium, lead, bismuth, polonium, francium, radium, lanthanides, actinides.
6. A surface-coupled induced ionization technique as claimed in claim 4, wherein: the ceramic material in the step 1 comprises one or more of oxide ceramic, silicate ceramic, nitride ceramic, borate ceramic, phosphate ceramic, carbide ceramic, aluminate ceramic, germanate ceramic and titanate ceramic.
7. A surface-coupled induced ionization technique as claimed in claim 4, wherein: the organic conductor material in the step 1 comprises one or more of polyacetylene, polyarylacetylene, polypyrrole, polyaniline, polythiophene, polyphenylene sulfide, TTF-TCNQ, PEDOT-PSS, tetrathiafulvalene, polyfluorene, polyparaphenylene, polyaromatic hydrocarbon and other compounds with continuous conjugated frameworks.
8. A surface-coupled induced ionization technique as claimed in claim 4, wherein: the semiconductor material in the step 1 comprises one or more of III-V group semiconductor, II-VI group semiconductor, IV group semiconductor, quantum dot semiconductor and perovskite semiconductor particles.
9. A surface-coupled induced ionization technique as claimed in claim 4, wherein: the carbon material in the step 1 comprises one or a mixture of more than one of graphene, aminated graphene, carboxylated graphene, hydroxylated graphene, sulfhydrylated graphene, oxidized graphene, methylated graphene, trifluoromethylated graphene, octadecylated graphene, fluorinated graphene, iodinated graphene, artificial graphite, natural graphite, graphitized carbon microspheres, graphitized carbon nanotubes, glassy carbon, amorphous carbon, carbon nanohorns, carbon fibers, carbon quantum dots and carbon molecular sieves.
10. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the first beam of electromagnetic waves in step 1 comprises one or more of gamma rays, hard X rays, soft X rays, extreme ultraviolet rays, near ultraviolet rays, visible light, near infrared rays, middle infrared rays, far infrared rays, terahertz rays, extremely high frequency microwaves, ultrahigh frequency microwaves, very high frequency radio waves, intermediate frequency radio waves, low frequency radio waves, very low frequency radio waves and extremely low frequency radio waves.
11. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the wavelength or the distribution of the first beam of electromagnetic waves in the step 1 is 0.01 nm-100 km.
12. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the spatial distribution of the first beam of electromagnetic wave in the step 1 comprises one or more of a Gaussian beam, a Bessel beam, an Airy beam, a Laguerre-Gaussian beam, a cosine-Gaussian beam, a Mathieu beam, a flat-top beam and a vortex beam.
13. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the polarization degree of the first beam of electromagnetic waves in the step 1 is 0.01% -99%.
14. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the polarization mode of the first beam of electromagnetic waves in the step 1 comprises one or more of natural light, partial polarization, linear polarization, circular polarization, elliptical polarization, azimuth polarization and radial polarization.
15. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the polarization of the first beam of electromagnetic waves in the step 1 comprises S wave polarization and P wave polarization.
16. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the orbital angular momentum and the distribution of the first beam of electromagnetic waves in the step 1 are-10- + 10.
17. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the phase position and the distribution of the first beam of electromagnetic waves in the step 1 are 0-2 pi.
18. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the second beam and subsequent electromagnetic waves in step 2 include one or more of gamma rays, hard X rays, soft X rays, extreme ultraviolet rays, near ultraviolet rays, visible light, near infrared rays, middle infrared rays, far infrared rays, terahertz, very high frequency microwaves, ultrahigh frequency microwaves, very high frequency radio waves, intermediate frequency radio waves, low frequency radio waves, very low frequency radio waves, and very low frequency radio waves.
19. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the wavelength or the distribution of the second beam and the subsequent electromagnetic waves in the step 2 is 0.01 nm-100 km.
20. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the spatial distribution of the second beam and the subsequent electromagnetic waves in the step 2 comprises one or more of a Gaussian beam, a Bessel beam, an Airy beam, a Laguerre-Gaussian beam, a cosine-Gaussian beam, a Mathieu beam, a flat-top beam and a vortex beam.
21. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the polarization degree of the second beam and the subsequent electromagnetic waves in the step 2 is 0.01-99%.
22. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the polarization mode of the second beam and the subsequent electromagnetic waves in the step 2 comprises one or more of natural light, partial polarization, linear polarization, circular polarization, elliptical polarization, azimuth polarization and radial polarization.
23. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the polarization of the second beam and the subsequent electromagnetic waves in step 2 includes S wave polarization and P wave polarization.
24. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the orbital angular momentum and the distribution thereof of the second beam and the subsequent electromagnetic waves in the step 2 are-10- + 10.
25. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the phase and the distribution of the second beam and the subsequent electromagnetic waves in the step 2 are 0-2 pi.
26. The surface-coupled induced ionization technique as claimed in claim 1, wherein the molecular weight of any one of the target molecules in steps 1, 2 and 3 is from 1.0 × 100Da-1.0×1020Da。
27. A surface-coupled induced ionization technique as claimed in claim 1, wherein: in the step 1, a first beam of electromagnetic waves is fed to the material in a free space manner, and the method specifically comprises the following steps:
1S1, modulating the wavelength and the distribution of the first beam of electromagnetic wave, the spatial distribution, the polarization and orbital angular momentum and the distribution thereof, the phase and the distribution thereof and other factors to obtain a first beam of modulated electromagnetic wave;
1S2a, guiding the first beam of modulated electromagnetic wave to match with the wave vector of the surface plasma frequency of the material to obtain wave vector matching modulated electromagnetic wave;
1S3a, the wave vector matching modulation electromagnetic wave is emitted to the surface of the material through free space, and the surface of the material forms a surface plasma wave.
28. A surface-coupled induced ionization technique as claimed in claim 27, wherein: the method for modulating the wavelength and the distribution thereof in step 1S1 includes one or more of dispersive device modulation, filter device modulation, refractive device modulation, interferometric modulation, absorption modulation, nonlinear optical modulation, and resonant cavity enhancement modulation.
29. A surface-coupled induced ionization technique as claimed in claim 27, wherein: the spatial distribution modulation method in step 1S1 includes one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, and absorption device modulation.
30. A surface-coupled induced ionization technique as claimed in claim 27, wherein: the method for modulating the polarization and orbital angular momentum and the distribution thereof in step 1S1 includes one or more of single-mode cavity modulation, photoelastic modulation, spatial light modulator modulation, mode converter modulation, birefringent device modulation, and polarizer modulation.
31. A surface-coupled induced ionization technique as claimed in claim 27, wherein: the phase and distribution modulation method in step 1S1 includes one or more of phase shift modulation, birefringence device modulation, and spatial light modulator modulation.
32. A surface-coupled induced ionization technique as claimed in claim 27, wherein: the phase and distribution modulation method of the phase 1S1 in step 1 includes one or more of phase shift modulation, birefringence device modulation, and spatial light modulator modulation.
33. A surface-coupled induced ionization technique as claimed in claim 27, wherein: the wave vector matching method in step 1S2a includes one or more of direct matching through a grating, a photonic crystal, total internal reflection by a free light coupling prism, a metamaterial device having a dielectric constant less than 1, a multiple attenuation total internal reflection device, a free light coupling waveguide total internal reflection device, a focusing device.
34. A surface-coupled induced ionization technique as claimed in claim 1, wherein: in the step 1, a first beam of electromagnetic waves is fed to the material in the waveguide mode, and the method specifically comprises the following steps:
1S1, modulating the wavelength and the distribution of the first beam of electromagnetic wave, the spatial distribution, the polarization and orbital angular momentum and the distribution thereof, the phase and the distribution thereof and other factors to obtain a first beam of modulated electromagnetic wave;
1S2b, feeding the first beam of modulated electromagnetic waves into an isolator through a waveguide to obtain a unidirectional first beam of modulated electromagnetic waves;
1S3b, guiding the unidirectional first beam of modulated electromagnetic waves to match with the wave vector of the surface plasma frequency of the material to obtain wave vector matching unidirectional modulated electromagnetic waves;
1S4b, the wave vector matching unidirectional modulation electromagnetic wave is injected into the surface of the material through the waveguide, so that the surface of the material forms a surface plasma wave.
35. A surface-coupled induced ionization technique as claimed in claim 34, wherein: in the step 1, the isolator in the step 1S2b, which is used for feeding the first beam of electromagnetic waves to the material in the waveguide mode, includes one or more of a square waveguide circulator, a fiber optical isolator, a faraday rotator, a coaxial isolator, a strip line isolator, a broadband isolator, a double-section isolator, a microstrip isolator, an attenuator and a load.
36. A surface-coupled induced ionization technique as claimed in claim 34, wherein: the wave vector matching method in step 1S3b of feeding the first beam of electromagnetic waves into the material by means of the waveguide in step 1 includes one or more of direct matching by means of grating, photonic crystal waveguide, waveguide coupling prism total internal reflection, metamaterial waveguide with dielectric constant less than 1, multiple attenuation total internal reflection device, waveguide total internal reflection device, near field waveguide probe irradiation less than wavelength.
37. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the step 1 of introducing the target molecules to be ionized to the surface of the material specifically comprises the following steps:
2S1, introducing the target molecules into a gas phase environment to obtain target molecules in a gas phase;
2S2, moving the target molecules in the gas phase to the surface of the material.
38. A surface-coupled induced ionization technique as claimed in claim 34, wherein: the target molecules to be ionized in the step 1 are introduced to the surface of the material, and the target molecules in the step 2S1 are introduced to a gas phase environment, including one or more of ultrasonic atomization, heating evaporation, vacuum evaporation, direct evaporation, and gas flow carrying.
39. A surface-coupled induced ionization technique as claimed in claim 34, wherein: the step 2S2 of moving to the surface of the material includes one or more methods of optical tweezers displacement, ultrasonic tweezers displacement, mechanical force displacement, airflow loading, vacuum suction displacement, probe pulling displacement, and magnetic force displacement.
40. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the interaction between the surface of the control material and the target molecule in the step 1 specifically comprises the following steps: 3S1, controlling the distribution of the material microstructure and the surface electromagnetic field to obtain the adjusted material;
3S2, controlling the state of the target molecule to obtain the adjusted target molecule;
3S3, combining the modulated material with the regulated target molecules, realizing the interaction control between the material surface and the target molecules, and causing the ionization of the target molecules.
41. A surface-coupled induced ionization technique as claimed in claim 40, wherein: in the first step, the distribution of the material microstructure and the surface electromagnetic field in step 3S1 is controlled by one or more methods selected from the group consisting of a material surface forming a nanoscale periodic microstructure, a material surface forming a nanoscale aperiodic microstructure, a material surface forming a microscale periodic microstructure, a material surface forming a microscale aperiodic microstructure, a material surface functional group structure modulation, a material surface defect state density structure modulation, a material surface doping structure modulation, a material domain size modulation, a material superlattice structure modulation, a material surface voltage modulation, a material surface electric field distribution modulation, a material magnetic domain structure modulation, and a material magnetic field modulation.
42. A surface-coupled induced ionization technique as claimed in claim 40, wherein: step 3S2 in the first step is to control the state of the target molecule, including one or more of exciting the target molecule by electromagnetic waves to select different excited states, controlling the chemical potential of the target molecule on the material by concentration difference, charging the target molecule by electrostatic introduction, and magnetizing the target molecule by magnetic field introduction.
43. A surface-coupled induced ionization technique as claimed in claim 40, wherein: the feeding of the second beam and the subsequent electromagnetic waves into the ionization region of the target molecule on the surface of the material through the free space in the step 2 specifically includes the following steps:
and 4S1, modulating the wavelength and the distribution of the second beam and the subsequent electromagnetic waves, the spatial distribution, the polarization and orbital angular momentum and the distribution thereof, the phase and the distribution thereof and the like to obtain the second beam and the subsequent modulated electromagnetic waves.
4S2, guiding the second beam and the subsequent modulated electromagnetic wave to be matched with the plasma frequency of the ionized target molecules to obtain frequency-matched modulated electromagnetic waves;
4S3a, emitting the frequency-matched modulated electromagnetic wave into an ionization region of the target molecules on the surface of the material through a free space, absorbing the ionized target molecules and improving the ionization degree of the target molecules.
44. A surface-coupled induced ionization technique as claimed in claim 40, wherein: the feeding of the second beam and the subsequent electromagnetic waves into the ionization region of the target molecule on the surface of the material through the free space in the step 2, and the wavelength and distribution modulation method in the step 4S1 include one or more of dispersion device modulation, filter device modulation, refraction device modulation, interference modulation, absorption modulation, nonlinear optical modulation, and resonant cavity enhancement modulation.
45. A surface-coupled induced ionization technique as claimed in claim 40, wherein: the feeding of the second beam and the subsequent electromagnetic waves to the ionization region of the target molecule on the surface of the material through the free space in the step 2, and the spatial distribution modulation method in the step 4S1 include one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, and absorption device modulation.
46. A surface-coupled induced ionization technique as claimed in claim 40, wherein: the step 2 of feeding a second beam and subsequent electromagnetic waves into the ionization region of the target molecule on the surface of the material through the free space, and the step 4S1 of modulating the polarization and orbital angular momentum and the distribution thereof, include one or more of single-mode cavity modulation, photoelastic modulation, spatial light modulator modulation, mode converter modulation, birefringence device modulation, and polarizer modulation.
47. A surface-coupled induced ionization technique as claimed in claim 40, wherein: the step 2 of feeding a second beam and subsequent electromagnetic waves to the ionization region of the target molecule on the surface of the material through the free space, and the step 4S1 of modulating the phase and the distribution thereof include one or more of phase shift modulation, birefringence device modulation, and spatial light modulator modulation.
48. A surface-coupled induced ionization technique as claimed in claim 40, wherein: the feeding of the second beam and the subsequent electromagnetic waves into the ionization region of the target molecule on the surface of the material through the free space in the step 2, wherein the frequency matching method in the step 4S2 includes one or more of a dispersion device modulation matching, a filter device modulation matching, a refraction device modulation matching, an interference modulation matching, an absorption modulation matching, a nonlinear optical modulation matching, and a direct injection.
49. A surface-coupled induced ionization technique as claimed in claim 40, wherein: the feeding of the second beam and the subsequent electromagnetic waves into the ionization region of the target molecule on the surface of the material through the free space in the step 2, and the injecting into the ionization region in the step 4S3a, include one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, absorption device modulation, and direct injection.
50. A surface-coupled induced ionization technique as claimed in claim 1, wherein: in the step 2, feeding the second beam and the subsequent electromagnetic wave to the ionization region of the target molecule on the surface of the material through the waveguide specifically includes the following steps:
4S1, modulating the wavelength and the distribution thereof, the spatial distribution, the polarization and the distribution thereof, the orbital angular momentum and the distribution thereof, the phase and the distribution thereof and other factors of the second beam and the subsequent electromagnetic waves to obtain a second beam and subsequent modulated electromagnetic waves;
4S2, guiding the second beam and the subsequent modulated electromagnetic wave to be matched with the plasma frequency of the ionized target molecules to obtain frequency-matched modulated electromagnetic waves;
4S3b, feeding the frequency-matched modulated electromagnetic wave into an isolator through a waveguide to obtain a unidirectional frequency-matched modulated electromagnetic wave;
4S4b, injecting the unidirectional frequency-matched modulated electromagnetic wave into an ionization region of target molecules on the surface of the material through a waveguide, so that the ionized target molecules are absorbed, and the ionization degree of the target molecules is improved.
51. A surface-coupled induced ionization technique as claimed in claim 50, wherein: the feeding of the second beam and the subsequent electromagnetic waves into the ionization region of the target molecule on the surface of the material through the free space in the step 2, and the wavelength and distribution modulation method in the step 4S1 include one or more of dispersion device modulation, filter device modulation, refraction device modulation, interference modulation, absorption modulation, nonlinear optical modulation, and resonant cavity enhancement modulation.
52. A surface-coupled induced ionization technique as claimed in claim 50, wherein: the feeding of the second beam and the subsequent electromagnetic waves to the ionization region of the target molecule on the surface of the material through the free space in the step 2, and the spatial distribution modulation method in the step 4S1 include one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, and absorption device modulation.
53. A surface-coupled induced ionization technique as claimed in claim 50, wherein: the step 2 of feeding a second beam and subsequent electromagnetic waves into the ionization region of the target molecule on the surface of the material through the free space, and the step 4S1 of modulating the polarization and orbital angular momentum and the distribution thereof, include one or more of single-mode cavity modulation, photoelastic modulation, spatial light modulator modulation, mode converter modulation, birefringence device modulation, and polarizer modulation.
54. A surface-coupled induced ionization technique as claimed in claim 50, wherein: the step 2 of feeding a second beam and subsequent electromagnetic waves to the ionization region of the target molecule on the surface of the material through the free space, and the step 4S1 of modulating the phase and the distribution thereof include one or more of phase shift modulation, birefringence device modulation, and spatial light modulator modulation.
55. A surface-coupled induced ionization technique as claimed in claim 50, wherein: feeding the second beam and the subsequent electromagnetic wave into the ionization region of the target molecule on the surface of the material through the free space in the step 2, wherein the isolator in the step 4S3b comprises one or more of a square waveguide circulator, a fiber optical isolator, a faraday rotator, a coaxial isolator, a strip line isolator, a broadband isolator, a double-section isolator, a microstrip isolator, an attenuator and a load.
56. A surface-coupled induced ionization technique as claimed in claim 50, wherein: the feeding of the second beam and the subsequent electromagnetic waves into the ionization region of the target molecule on the surface of the material through the free space in the step 2, and the injecting into the ionization region in the step 4S4b, include one or more of refraction device modulation, transmission antenna modulation, matrix reflection device modulation, spatial light modulator modulation, variable curvature reflection device modulation, absorption device modulation, photonic crystal modulation, waveguide modulation injection, and direct injection.
57. A surface-coupled induced ionization technique as claimed in claim 1, wherein: the target molecule is released in the form of bulk plasma in the step 3, and the method specifically comprises the following steps:
5S1, leading the plasma of the target molecules out of the surface area of the material to obtain delocalized plasma;
and 5S2, restraining the delocalized plasma in a specific space to obtain higher energy density.
58. A surface-coupled induced ionization technique as claimed in claim 1, wherein: in the step 3, in the step 5S1, the step of extracting the surface region of the material includes one or more of vacuum suction, air flow delivery, negative pressure extraction, external ground suction, external electromagnetic wave source guiding and external current guiding.
59. A surface-coupled induced ionization technique as claimed in claim 1, wherein: in the step 3, the target molecule is released in the form of bulk plasma, and further, the plasma confinement in the step 5S2 includes one or more methods of magnetic field self-hoop confinement, air flow confinement and collisional confinement formed by an external magnetic field, a ground current.
60. A plasma device comprising a plasma source including a plasma source as described in any one or more of items 1 to 59 above.
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112226702A (en) * 2020-08-17 2021-01-15 蓬莱市超硬复合材料有限公司 Tungsten oxide alloy material and preparation method thereof
CN112616233A (en) * 2020-12-16 2021-04-06 中国科学院合肥物质科学研究院 Stable-state high-beam-density long-life lithium ion source suitable for accelerator
WO2021226741A1 (en) * 2020-05-09 2021-11-18 张麟德 Surface coupling induced ionization technology, and plasma and plasma device corresponding thereto
CN114899079A (en) * 2021-04-28 2022-08-12 中国科学院江西稀土研究院 Mass spectrum ionization source of surface coupling induction plasma source and corresponding mass spectrometer

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1653204A (en) * 2002-05-08 2005-08-10 达纳公司 Plasma-assisted nitrogen surface treatment
CN101076221A (en) * 2002-05-08 2007-11-21 Btu国际公司 Multiple radiation sources plasma generating and processing
CN102026719A (en) * 2008-03-11 2011-04-20 免疫之光有限责任公司 Plasmonic assisted systems and methods for interior energy-activation from an exterior source
EP2478955A1 (en) * 2009-09-17 2012-07-25 Imagineering, Inc. Plasma-generation device
CN103592282A (en) * 2013-11-11 2014-02-19 北京航空航天大学 Conduction surface plasmon based Raman scattering base and application method thereof
CN105931942A (en) * 2015-02-28 2016-09-07 安捷伦科技有限公司 Ambient Desorption, Ionization, And Excitation For Spectrometry
CN110119007A (en) * 2018-02-07 2019-08-13 华为技术有限公司 Optoisolator

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1653204A (en) * 2002-05-08 2005-08-10 达纳公司 Plasma-assisted nitrogen surface treatment
CN1653866A (en) * 2002-05-08 2005-08-10 达纳公司 Plasma generation and processing with multiple radiation sources
CN101076221A (en) * 2002-05-08 2007-11-21 Btu国际公司 Multiple radiation sources plasma generating and processing
CN102026719A (en) * 2008-03-11 2011-04-20 免疫之光有限责任公司 Plasmonic assisted systems and methods for interior energy-activation from an exterior source
EP2478955A1 (en) * 2009-09-17 2012-07-25 Imagineering, Inc. Plasma-generation device
CN103592282A (en) * 2013-11-11 2014-02-19 北京航空航天大学 Conduction surface plasmon based Raman scattering base and application method thereof
CN105931942A (en) * 2015-02-28 2016-09-07 安捷伦科技有限公司 Ambient Desorption, Ionization, And Excitation For Spectrometry
CN110119007A (en) * 2018-02-07 2019-08-13 华为技术有限公司 Optoisolator

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
李志远等: "金属纳米结构表面等离子体共振的调控和利用", 《科学通报》 *
赵静等: "氧化石墨烯增强型表面等离子体共振光纤传感器", 《激光与光电子学进展》 *

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021226741A1 (en) * 2020-05-09 2021-11-18 张麟德 Surface coupling induced ionization technology, and plasma and plasma device corresponding thereto
CN112226702A (en) * 2020-08-17 2021-01-15 蓬莱市超硬复合材料有限公司 Tungsten oxide alloy material and preparation method thereof
CN112616233A (en) * 2020-12-16 2021-04-06 中国科学院合肥物质科学研究院 Stable-state high-beam-density long-life lithium ion source suitable for accelerator
CN112616233B (en) * 2020-12-16 2023-03-21 中国科学院合肥物质科学研究院 Stable-state high-beam-density long-life lithium ion source suitable for accelerator
CN114899079A (en) * 2021-04-28 2022-08-12 中国科学院江西稀土研究院 Mass spectrum ionization source of surface coupling induction plasma source and corresponding mass spectrometer
WO2022227313A1 (en) * 2021-04-28 2022-11-03 中国科学院江西稀土研究院 Mass spectrometer
CN114899079B (en) * 2021-04-28 2023-04-14 中国科学院江西稀土研究院 Mass spectrum ionization source of surface coupling induction plasma source and corresponding mass spectrometer

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