CN111474381B - Air flow velocity sensing device containing bionic cross beam sensor and preparation method thereof - Google Patents
Air flow velocity sensing device containing bionic cross beam sensor and preparation method thereof Download PDFInfo
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- CN111474381B CN111474381B CN202010342957.XA CN202010342957A CN111474381B CN 111474381 B CN111474381 B CN 111474381B CN 202010342957 A CN202010342957 A CN 202010342957A CN 111474381 B CN111474381 B CN 111474381B
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P5/00—Measuring speed of fluids, e.g. of air stream; Measuring speed of bodies relative to fluids, e.g. of ship, of aircraft
- G01P5/08—Measuring speed of fluids, e.g. of air stream; Measuring speed of bodies relative to fluids, e.g. of ship, of aircraft by measuring variation of an electric variable directly affected by the flow, e.g. by using dynamo-electric effect
Abstract
The invention discloses an air flow velocity sensing device containing a bionic cross beam sensor and a preparation method thereof, wherein the bionic cross beam sensor comprises: the device comprises a substrate, wherein a through hole, a first piezoresistor, a third piezoresistor, a connection welding point V1, a connection welding point V2, a connection welding point GND and a connection welding point VCC are arranged on the substrate and positioned at the edge of the through hole; the flexible cross beam is arranged in the through hole, and a first bionic comb tooth seam structure, a second piezoresistor and a fourth piezoresistor are arranged on the cross beam. The flow rate of the air can be obtained by detecting the voltage of the wheatstone bridge. Due to the stress concentration effect, stress is concentrated in the peripheral area of the bionic comb slit structure, so that the stress of the peripheral area of the bionic comb slit structure is larger, the change of a piezoresistor at the edge of the bionic comb slit structure is larger, and the cross beam sensor containing the bionic comb slit structure has higher sensitivity.
Description
Technical Field
The invention relates to the field of sensors, in particular to an air flow velocity sensing device with a bionic cross beam sensor and a preparation method thereof.
Background
At present, the flow velocity sensing device has wide application in the aspects of meteorological monitoring, aerospace, robot perception, national defense weaponry and the like. Traditional velocity of flow sensing device adopts the mode of heat dissipation, through producing the heat to resistance circular telegram, the heat dissipates in the fluid, detects the temperature through thermistor, and then deduces the velocity of flow, and this kind of detection mode has the shortcoming that sensitivity is poor.
Accordingly, the prior art is yet to be improved and developed.
Disclosure of Invention
The invention aims to solve the technical problem that the air flow velocity sensing device containing the bionic cross beam sensor and the preparation method thereof are provided aiming at overcoming the defects in the prior art, and the problem that the air flow velocity sensing device in the prior art is poor in sensitivity is solved.
The technical scheme adopted by the invention for solving the technical problem is as follows:
a biomimetic cross beam sensor, comprising: the device comprises a substrate, wherein a through hole, a first piezoresistor, a third piezoresistor, a connection welding point V1, a connection welding point V2, a connection welding point GND and a connection welding point VCC are arranged on the substrate and positioned at the edge of the through hole; be provided with deformable cross roof beam in the through-hole, be provided with first bionical broach seam structure and the bionical broach seam structure of second on the cross roof beam, first bionical broach seam structure includes: first bionical seam structure and first broach structure, first broach structure sets up cross beam one side first bionical seam structure corresponds on the position, the cross beam deviates from one side of first broach structure is provided with second piezo-resistor, the bionical broach seam structure of second includes: the cross beam is provided with a first bionic slit structure and a first comb tooth structure, the first comb tooth structure is arranged at a position corresponding to the first bionic slit structure on one side of the cross beam, and a first piezoresistor is arranged on one side of the cross beam, which is far away from the first comb tooth structure; the second end of first piezo-resistor with the first end of second piezo-resistor all with connection pad V1 connects, the second end of second piezo-resistor with the first end of third piezo-resistor all with connection pad GND connects, the second end of third piezo-resistor with the first end of fourth piezo-resistor all with connection pad V2 connects, the second end of fourth piezo-resistor with the first end of first piezo-resistor all with connect the welding point VCC and connect.
The bionic cross beam sensor is characterized in that the first bionic slit structure and the second bionic slit structure both adopt a slit group penetrating through the cross beam, and the penetrating direction of the slit group is consistent with the direction of the central axis of the through hole; the first comb tooth structure and the second comb tooth structure are both comb tooth groups, comb teeth in the comb tooth groups are arranged in one-to-one correspondence with holes in the hole seam groups, and extension holes communicated with the holes are formed in the comb teeth.
The bionic cross beam sensor is characterized in that the length-width ratio of the apertures in the aperture group is 1-20: 1; the tip of each hole in the hole group is a variable-curvature arc tip.
The bionic cross beam sensor is characterized in that the distance and the length-width ratio of each hole in the hole group are determined according to the stress of the cross beam where each hole is located.
The bionic cross beam sensor is characterized in that a groove is formed between two adjacent comb teeth of the comb tooth group, and the depth and the length-width ratio of the groove are determined according to the stress of the cross beam where the comb teeth are located.
The bionic cross beam sensor is characterized in that an air blocking plate is arranged in the center of the cross beam.
An air flow velocity sensing device who contains bionical cross beam sensor, wherein includes: the sensing device comprises a sensing device body, a sensing device body and a control device, wherein a main air duct and a U-shaped air duct are formed on the sensing device body; the inlet and the outlet of the U-shaped vent pipe are both positioned in the main vent pipe and respectively face to two ends of the main vent pipe; the bionic cross beam sensor is arranged in the U-shaped ventilation pipeline.
The air flow rate sensing device is characterized in that the number of the bionic cross beam sensors is two, and the two bionic cross beam sensors are respectively positioned in two linear pipes of the U-shaped ventilation pipeline.
The air flow rate sensing device, wherein, the sensing device body includes: the sensor comprises a base, a sensor placing plate, a middle plate and a cover plate which are arranged in sequence; the base is provided with a U-shaped part, a sensor placing plate is provided with a placing hole for placing a sensor at a position corresponding to the U-shaped part, the middle plate is provided with an opening part, and the U-shaped part, the placing hole and the opening part form the U-shaped ventilation pipeline; the section of the cover plate is n-shaped, and the cover plate is connected with the middle plate to form the main air duct.
A preparation method of the bionic cross beam sensor comprises the following steps:
providing a substrate, and manufacturing a first mask on the surface of the substrate;
performing photo-etching on corresponding positions of the first piezoresistor, the second piezoresistor, the third piezoresistor and the fourth piezoresistor on the substrate to remove a first mask on the corresponding positions, and then performing ion implantation to respectively form the first piezoresistor, the second piezoresistor, the third piezoresistor and the fourth piezoresistor to obtain a substrate containing piezoresistors;
manufacturing a second mask on the substrate base plate containing the piezoresistors and photoetching, and then manufacturing a connecting welding point V1, a connecting welding point V2, a connecting welding point GND, a connecting welding point VCC, and connecting lines of each connecting welding point and each piezoresistor to obtain the substrate base plate containing the connecting welding points;
and performing front side photoetching on the substrate base plate containing the connecting welding spots, wherein the through hole, the first bionic seam structure and the second bionic seam structure are etched, and after the first comb tooth structure and the second comb tooth structure are etched on the back side, the back side is etched by a certain depth to form a cross beam, so that the bionic cross beam sensor is obtained.
Has the advantages that: the first piezoresistor, the second piezoresistor, the third piezoresistor and the fourth piezoresistor are connected to form a Wheatstone bridge. When air passes through the through hole, the cross beam is deformable, the resistance value of the second piezoresistor and the resistance value of the fourth piezoresistor are changed, and the flow speed of the air can be obtained by detecting the voltage of the Wheatstone bridge. Because of the stress concentration effect, the stress is concentrated in the peripheral area of the bionic comb slit structure, so that under the same wind speed, the stress of the peripheral area of the bionic comb slit structure is larger, the change of the piezoresistor at the edge of the bionic comb slit structure is larger, and the cross beam sensor containing the bionic comb slit structure has higher sensitivity.
Drawings
Fig. 1 is a schematic diagram of a first structure of a bionic cross beam sensor in the invention.
FIG. 2 is a schematic diagram of a first bionic comb slit structure of the bionic cross beam sensor in the invention.
Fig. 3 is a schematic diagram of a second structure of the bionic cross beam sensor in the invention.
Fig. 4 is a schematic diagram of a wheatstone bridge of the present invention.
Fig. 5 is a cross-sectional view of an air flow velocity sensing device including a bionic cross beam sensor according to the present invention.
Fig. 6 is a schematic view of the structure of the sensor placement board in the present invention.
Fig. 7 is a schematic view showing a configuration in a state where the sensor placement board is drawn out in the present invention.
Fig. 8 is a schematic view showing a structure of a state where the sensor placement board is inserted in the present invention.
Fig. 9 is an exploded view of an air flow velocity sensing device including a bionic cross beam sensor according to the present invention.
FIG. 10 is a schematic view showing a state before deformation in which the comb-tooth structure restricts deformation in the present invention.
FIG. 11 is a diagram showing a deformed state in which the comb-tooth structure is deformed in a limited manner.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention clearer and clearer, the present invention is further described in detail below with reference to the accompanying drawings and examples. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
Referring to fig. 1-4, the present disclosure provides embodiments of a bionic cross beam sensor.
As shown in fig. 1 to 3, a bionic cross beam sensor of the present invention includes: the chip comprises a substrate 10, wherein a through hole 101, a first piezoresistor 121, a third piezoresistor 123, a connection welding point V1, a connection welding point V2, a connection welding point GND and a connection welding point VCC are arranged on the substrate 10 and are positioned at the edge of the through hole 101; be provided with cross 11 in the through-hole 101, be provided with first bionical broach seam structure 131 and the bionical broach seam structure 132 of second on the cross 11, first bionical broach seam structure 131 includes: first bionical seam structure and first broach structure, first broach structure sets up 11 one side of crosspiece 11 first bionical seam structure corresponds on the position, crosspiece 11 deviates from one side of first broach structure is provided with second piezo-resistor 122, and second piezo-resistor 122 is located first bionical seam structure edge, the bionical broach structure 132 of second includes: the cross beam structure comprises a second bionic slit structure and a second comb tooth structure, the second comb tooth structure is arranged at a position corresponding to the second bionic slit structure on one side of the cross beam 11, and a fourth piezoresistor 124 is arranged on one side of the cross beam 11, which is far away from the second comb tooth structure; the second end of the first piezo-resistor 121 with the first end of the second piezo-resistor 122 all with the connection pad V1 is connected, the second end of the second piezo-resistor 122 with the first end of the third piezo-resistor 123 all with the connection pad GND is connected, the second end of the third piezo-resistor 123 with the first end of the fourth piezo-resistor 124 all with the connection pad V2 is connected, the second end of the fourth piezo-resistor 124 with the first end of the first piezo-resistor 121 all with the connection pad VCC is connected.
It should be noted that, as shown in fig. 4, the first voltage dependent resistor 121, the second voltage dependent resistor 122, the third voltage dependent resistor 123 and the fourth voltage dependent resistor 124 are connected to form a wheatstone bridge. When air passes through the through hole 101, since the cross beam 11 is deformable, the pressure applied to the second piezo-resistor 122 and the fourth piezo-resistor 124 on the cross beam 11 under the deformation of the cross beam 11 changes, so that the resistance value of the second piezo-resistor 122 and the resistance value of the fourth piezo-resistor 124 also change, and the larger the air flow rate is, the larger the deformation amount of the cross beam 11 is, the larger the variation amount of the resistance value of the second piezo-resistor 122 and the resistance value of the fourth piezo-resistor 124 is, and the larger the differential pressure of the wheatstone bridge is; the smaller the air flow rate, the smaller the amount of deformation of the cross beam 11, and the smaller the amount of change in the resistance values of the second piezo-resistor 122 and the fourth piezo-resistor 124, the smaller the differential pressure of the wheatstone bridge. The air does not deform the substrate 10 and the resistance of the first varistor 121 and the resistance of the third varistor 123 do not change. Therefore, the first varistor 121 and the third varistor 123 are resistors having fixed resistance values, and the second varistor 122 and the fourth varistor 124 are varistors. The first varistor 121 and the third varistor 123 may be replaced with other resistors having a fixed resistance value.
The flow rate of the air can be obtained by detecting the voltage of the wheatstone bridge. In the Wheatstone bridge, when a constant voltage is applied between bonding pad GND and bonding pad VCC, the voltage difference (V1 and V2) between bonding pad V1 and bonding pad V21-V2，V1And V2Representing the voltage at connection pad V1 and the voltage at connection pad V2, respectively) is a fixed value, typically when R is a constant value1/R2＝R3/R4(R1、R2、R3、R4Respectively, the resistance values of the first piezo-resistor 121, the second piezo-resistor 122, the third piezo-resistor 123, and the fourth piezo-resistor 124), the fixed value is 0, and if the resistance value of the first piezo-resistor 121 and the resistance value of the third piezo-resistor 123 change in the case where the cross beam 11 is deformed by air, a differential pressure (V) occurs (V is the resistance value of the cross beam 11)1-V2) A change will occur.
Specifically, the connection pad GND is connected to ground, the connection pad VCC is connected to a power supply, and the voltage between the connection pad GND and the connection pad VCC is VCC-VGND＝VCC(where the connection pad GND is grounded, then VGNDIs 0). The voltage at connection pad V1 and the voltage at connection pad V2 are:
if R is1/R2＝R3/R4When, V1＝V2I.e. the output voltage of the wheatstone bridge is zero. When the air flow pushes the cross part of the cross beam 11 to move, the connected cross beam 11 part is deformed, and the deformation causes the resistance value manufactured by ion implantation in the cross beam 11 to change. Namely R2、R4Increase or decrease in resistance value of, resulting in V1、V2The pressure difference is generated between the cross beam and the cross beam, the deformation condition of the cross beam 11 is obtained by detecting the change of the voltage, and the change of the flow speed in the environment where the structure is located is further reflected.
Because the second piezoresistor 122 is located at the edge of the first bionic comb-tooth seam structure 131, the fourth piezoresistor 124 is located at the edge of the second bionic comb-tooth seam structure 132, and due to the stress concentration effect, stress is concentrated in the peripheral area of the bionic comb-tooth seam structure, so that under the same wind speed, the stress of the peripheral area of the bionic comb-tooth seam structure is larger, the change of the piezoresistor at the edge of the bionic comb-tooth seam structure is larger, and the cross beam sensor containing the bionic comb-tooth seam structure has higher sensitivity. In addition, bionic comb tooth seam structure can also increase the flexibility of cross 11, provides more spaces for the deformation of cross 11, reduces cross 11 fracture risk.
Aiming at a high flow velocity scene, the bionic comb tooth seam structure is reduced, and the structural strength can be improved; aiming at a small flow velocity scene, the bionic comb slot structure is increased, and the detection precision can be improved.
In a preferred embodiment of the present invention, as shown in fig. 1 to 3, the first bionic slit structure and the second bionic slit structure both use a slit group penetrating through the cross beam 11, and the penetrating direction of the slit group is the same as the central axis direction of the through hole 101.
Specifically, there are several apertures in the aperture group, and the penetrating direction of the apertures is parallel to the central axis direction of the through hole 101. The cross beam 11 comprises a cross beam and a longitudinal beam, the bionic seam structure is positioned on the cross beam and/or the longitudinal beam, and the length direction of the hole seam is perpendicular to the length direction of the cross beam 11, in particular to the length direction of the cross beam or the longitudinal beam where the hole seam is positioned. That is, when the cross beam 11 is deformed by the air flow, the central position of the cross beam 11 (i.e. the connecting position of the cross beam and the longitudinal beam) is concave or convex, and the cross beam bends downwards or upwards along the length direction of the cross beam, so that the width of the hole gap is increased or decreased correspondingly. By adopting the mode of increasing or reducing the width of the hole seam instead of the mode of lengthening or shortening the length of the hole seam, the increase or reduction of the width is more beneficial to increasing the flexibility of the cross beam 11, providing more space for the deformation of the cross beam 11 and reducing the fracture risk of the cross beam 11.
The number of the slits in the slit group can be set as required, as shown in fig. 2, the number of the slits in the slit group is set to 5, and as shown in fig. 3, the number of the slit group is set to 3, and the second varistor 122 and the fourth varistor 124 can be set to be U-shaped, and the U-shaped varistor surrounds the slit group. Of course, in order to locate the second piezo-resistor 122 and the fourth piezo-resistor 124 at the edge of the aperture group, other arrangements of piezo-resistors and aperture groups are possible, for example, ladder-shaped piezo-resistors with one or more apertures between the cross-beams of two adjacent ladders, the apertures forming the aperture group. For another example, a U-shaped piezoresistor is changed into two strip piezoresistors, the two strip piezoresistors remove the transverse part of the original U-shaped piezoresistor and change the original U-shaped piezoresistor into two strip piezoresistors connected by adopting a metal lead, a hole gap group is arranged between the two strip piezoresistors, and the length direction of a hole gap in the hole gap group is vertical to the strip piezoresistors.
In a preferred embodiment of the invention, the apertures in the set have an aspect ratio of 1-20:1, as shown in FIGS. 2-3. Specifically, the length and the width of the hole gaps are large, and the hole gaps are long and narrow. The apertures in the aperture group are close to each other, and the distance between the apertures is 0.1 to 10 times of the width of the apertures.
In a preferred embodiment of the present invention, as shown in fig. 2-3, the distance and the length-width ratio of each slot in the slot group are determined according to the force applied to the cross beam where each slot is located. Therefore, the apertures in the aperture group are distributed at equal intervals or at unequal intervals, and the aspect ratios of the apertures in the aperture group are the same or different.
Specifically, the distance and the length-width ratio between each hole in the hole group are set according to the stress of the cross beam. The length of the hole seam also needs to be set according to the width of the cross beam 11 middle cross beam or longitudinal beam, and the length of the hole seam is preferably not more than half of the width of the cross beam 11 middle cross beam or longitudinal beam. The position of the hole group on the cross beam 11 middle cross beam or the longitudinal beam is determined according to the stress of the cross beam 11 middle cross beam or the longitudinal beam, when the cross beam 11 is deformed by air flow, the stress of the cross beam 11 middle cross beam or the longitudinal beam central position is larger, the deformation degree is also larger, the hole group and the piezoresistor are arranged at the cross beam 11 middle cross beam or the longitudinal beam central position, the characteristic of large deformation degree can be utilized, under the condition that the air flow rate is fixed, the pressure of the piezoresistor is increased as much as possible, and the sensitivity of the sensor is further improved.
The length-diameter ratio of the hole seam is smaller when the hole seam in the hole seam group is positioned at the position with larger stress on the beam, and the length-diameter ratio of the hole seam is larger when the hole seam is positioned at the position with smaller stress on the beam. For example, if the two ends of the hole seam group are stressed to a greater degree, the length of the hole seams at the two ends of the hole seam group is reduced, and all the hole seams of the whole hole seam group are arranged in sequence to form a shuttle shape (the two ends of the shuttle are small and the middle is large). That is, the aperture aspect ratio is small at both ends of the shuttle, and the longer the aperture aspect ratio is toward the center of the shuttle.
When the hole seam in the hole seam group is positioned at the position with larger stress on the beam, the distance between the hole seam and other hole seams is larger, and when the hole seam is positioned at the position with smaller stress on the beam, the distance between the hole seam and other hole seams is smaller. That is, the distance between the slits is also arranged in a manner similar to the length-diameter ratio, for example, if the two ends of the slit group are stressed to a greater degree, the distance between the slits at the two ends of the slit group is increased, and if the two ends of the shuttle are stressed to a greater degree, the distance between the slits is greater, and the distance is smaller toward the center of the shuttle.
In short, the arrangement mode of the holes in the hole group is changed according to the stress condition of the position of the whole hole group. Meanwhile, the positions of the hole seam groups on the cross beam can be changed according to the situation.
As shown in fig. 2, the first comb tooth structure and the second comb tooth structure both adopt comb tooth groups, comb teeth in the comb tooth groups are arranged in one-to-one correspondence with apertures in the aperture groups, and extension holes communicated with the apertures are arranged on the comb teeth. The number of the comb teeth is consistent with the number of the apertures, and the positions of the comb teeth are opposite to the positions of the apertures, that is, the positions of the comb teeth are not opposite to the positions between the apertures. The extension holes are the extension of the holes in the hole seam group on the comb teeth, the shape and the size of the extension holes and the shape and the size of the hole seams can be set to be uniform or different, for example, when the width of the comb teeth is smaller than that of the hole seams, the width of the extension holes is smaller than that of the hole seams. And arranging a comb tooth group at the position of the bionic pore gap group to form a bionic comb tooth gap structure.
The comb teeth group can be manufactured by etching downwards to form concave teeth at the position of the gap distance, the thickness of the position of the gap can also be reserved, convex teeth (shown in figure 2) are formed at other positions of the thinned cross beam 11, or the gap distance position is etched, and the thickness of the position of the gap is reserved to form convex and concave teeth. A groove is formed between two adjacent comb teeth of the comb tooth group and formed by etching, and the depth and the length-width ratio of the groove are determined according to the stress of the cross beam where the comb teeth are located. That is to say, the sculpture degree of depth of slot, the height of broach can be controlled, and the height can be different between the different broach, and the degree of depth can be different between the different slots, adjusts according to the atress condition of bionical broach seam structure place roof beam.
The bionic comb tooth seam structure has the following effects: firstly, due to the introduction of the bionic slit structure, stress distribution on the cross beam is concentrated at the position of the bionic slit structure, and the transverse width of the beam at the position of each slit is reduced, so that the rotary inertia is reduced, and the position is easier to bend, namely, deformation is concentrated in the area where the long axis of each slit in the bionic slit group is positioned, and the stress limit of the structure is easily reached at the position, so that fracture is generated. Through introducing the broach structure, increase the thickness of bionical seam both sides, improve the average thickness of bionical seam long axis position, increase inertia, avoid stress excessive concentration in the both sides of bionical seam, make the stress of concentrating around bionical broach seam arrange again, avoid stress to follow the introduction violent change of aperture seam at piezo-resistor position.
Meanwhile, as shown in fig. 2, 10-11, the comb tooth structure can be used as a limiting device for the deformation of the cross beam. Fig. 2 and 10 are schematic views of the state of the comb tooth structure when the cross beam is not deformed, and fig. 11 is a schematic view of the state of the comb tooth structure when the cross beam is deformed. When the bending degree of cross roof beam is too big, the most advanced of adjacent broach structure produces the contact and avoids the cross roof beam to produce too big bending and produce the fracture, deepens when the sculpture degree of depth, and the length of broach becomes the long promptly, and the bending limit of cross roof beam structure diminishes. The width of the comb teeth is increased, the distance between the comb teeth is reduced, and the bending limit of the cross beam structure can be reduced.
The transition section that links up between the different thickness of broach structure can regard as the cross roof beam avoids the sudden change of cross roof beam structure thickness, leads to stress to concentrate at the juncture of the different thickness of cross roof beam, and the thickness of the cross roof beam in broach seam structure both sides can be different promptly. One form of preferred is, in bionical broach seam structure both sides, the length of aperture is shorter, and the sculpture degree of depth of broach structure is darker (the slot is darker promptly), and the broach length of formation is shorter, and in bionical broach seam structure central authorities, the length of aperture is longer, and the sculpture degree of depth of broach structure is shallower (the slot is shallower promptly), and the broach length of formation is longer. The thickness of the part of the cross beam where the bionic comb-tooth seam structure is located, which is close to the support (namely the substrate 10), is thicker, and the thickness of the part of the cross beam, which is close to the air barrier plate, of the bionic comb-tooth seam structure is thinner.
The comb tooth structure combines the advantage of bringing with seam structure: the comb tooth structure can compensate the defect that the structure brought by the etching bionic seam structure is fragile, and the limiting effect brought by the comb tooth structure can be used for limiting the deformation of the cross beam. The variable parameters of the comb tooth structure and the bionic seam structure enable the stress to be uniformly distributed in the area.
In a preferred embodiment of the present invention, as shown in fig. 1-3, the tips of the apertures in the aperture group are variable curvature arc tips.
In particular, the two ends of the slot adopt a variable curvature arc tip, that is, the radius of curvature at the tip of the slot is not fixed, but varies. In particular, the two ends of the slot form tips, i.e. the radius of curvature decreases towards the two ends, so that the cross beam 11 deforms to a greater extent and the pressure on the piezoresistor increases, further improving the sensitivity of the sensor. Meanwhile, the curvature of the variable-curvature arc-shaped tip of each hole seam is also determined according to the stress of the cross beam where each hole seam is located, for example, the curvature of the variable-curvature arc-shaped tip of the hole seam at the position where the stress of the cross beam is larger, and the curvature of the variable-curvature arc-shaped tip of the hole seam at the position where the stress of the cross beam is smaller, so that the strength of the sensor can be ensured.
In a preferred embodiment of the present invention, as shown in fig. 1, the cross beam 11 is centrally provided with an air blocking plate 111. The air blocking plate 111 can be integrally formed with the cross beam 11 and is located in the center of the cross beam, and the size of the air blocking plate can be adjusted and set as required. For example, a foldable air barrier panel may be provided, which is unfolded when a larger air barrier panel is required; when a smaller air barrier is required, the unfolded air barrier is folded.
Specifically, when the air flows through the through hole 101, the deformation degree of the cross beam 11 is related to the size of the projected area of the cross beam 11 in the air flow direction, specifically, the larger the projected area of the cross beam 11 in the air flow direction, the larger the resistance of the cross beam 11 to the air, the larger the deformation degree of the cross beam 11, and vice versa, and therefore, the air blocking plate 111 may be provided on the cross beam 11, and if the air flow rate is smaller, the larger air blocking plate 111 may be adopted to increase the deformation degree of the cross beam 11. If the air flow velocity is greater, a smaller air blocking plate 111 may be used or the air blocking plate 111 may be eliminated to prevent damage to the spider 11 caused by excessive deformation of the spider 11. The air blocking plate 111 may be arranged in the center of the cross beam 11, but may be arranged at any position of the cross beam or the longitudinal beam of the cross beam 11.
Specifically, a preferred sensor designed by the present invention has the following dimensions: the sensor substrate is 2000 microns 300 microns's silicon sensor, the through-hole is located the substrate center, the size is 1000 microns, contain the cross beam in the through-hole, the width of cross beam is 100 microns, thickness is 50 microns, both sides include piezo-resistor and bionical broach seam structure respectively on a roof beam of cross beam, wherein the piezo-resistor width is 10 microns, length is 100 microns, piezo-resistor is located bionical broach seam structure both sides, the major axis of aperture is to the long axial of perpendicular to place roof beam, contain 5 apertures in a set of bionical broach seam structure, the length ratio is 3 between 5 apertures: 5: 7: 5: 3, the interval between per two apertures is the same, the width of each aperture is the same, aperture tip designs to become the curvature point, aperture tip's curvature radius is less than the radius of the minimum circumscribed circle made at whole aperture group center, aperture tip's curvature is greater than the half of aperture width, aperture tip's curvature radius great position is located the aperture place position atress great position, the slot is carved with downwards in the position of piezo-resistor opposite side aperture interval, form the broach structure, the degree of depth of slot is darker for 30 microns in broach structure both sides, the broach depth is lighter for 20 microns in broach structure central authorities, the length of broach is shorter for 50 microns in broach structure both sides length, be 60 microns in longer central authorities. And an air blocking plate is arranged at the cross position of the cross beam, and the size of the air blocking plate is 300 micrometers by 300 micrometers.
Based on the bionic cross beam sensor in the embodiment, the invention also provides a preferred embodiment of the air flow velocity sensing device comprising the bionic cross beam sensor, which comprises the following steps:
as shown in fig. 5 to 9, an air flow velocity sensing device including a bionic cross beam sensor according to an embodiment of the present invention includes: a sensing device body 2, wherein a main vent pipeline 2a and a U-shaped vent pipeline 2b are formed on the sensing device body 2; the inlet 2b2 and the outlet 2b3 of the U-shaped ventilation duct 2b are both located inside the main ventilation duct 2a and are respectively directed to both ends of the main ventilation duct 2 a; the bionic cross beam sensor 1 according to any one of the embodiments is arranged in the U-shaped vent pipeline 2 b.
Specifically, the two ends of the main ventilation duct 2a penetrate to form an air circulation channel, and the U-shaped ventilation duct 2b is used for shunting the air in the main ventilation duct 2a and detecting the air through the bionic cross beam sensor 1.
More specifically, in order not to affect the flow of air in the main air duct 2a, the air in the main air duct 2a is introduced from one end of the U-shaped air duct (i.e., the inlet 2b2) by providing the U-shaped air duct 2b and providing the biomimetic cross beam sensor 1 in the U-shaped air duct 2b, and after detecting the air flow rate through the biomimetic cross beam sensor 1 in the U-shaped air duct, the air in the one end of the U-shaped air duct (i.e., the outlet 2b3) is led out to the main air duct 2 a. Of course, the bionic cross beam sensor 1 may be directly disposed in the main ventilation duct 2a without disposing the U-shaped ventilation duct 2b, and a secondary ventilation duct having another shape may be employed instead of the U-shaped ventilation duct 2b, for example, a V-shaped ventilation duct. The bionic cross beam sensor 1 can be placed at the setting position of the bionic cross beam sensor 1 outside the main air duct 2a through the U-shaped through duct or the V-shaped through duct, namely, the bionic cross beam sensor 1 can be taken out and put without entering the main air duct 2a or changing the main air duct 2a, and the bionic cross beam sensor 1 can be conveniently placed in or taken out in the later stage according to needs.
In a preferred embodiment of the present invention, as shown in fig. 5 and 6, the bionic cross beam sensor 1 has two, which are respectively located in the two linear tubes of the U-shaped ventilation duct 2 b.
Specifically, one or more bionic cross beam sensors 1 may be disposed in the U-shaped ventilation duct 2b, and when a plurality of bionic cross beam sensors 1 are disposed, average processing may be performed by using voltages output by the plurality of bionic cross beam sensors 1.
Because parts such as each piezoresistor, connection welding point in the bionic cross beam sensor 1 are all located the unilateral of the bionic cross beam sensor 1, no matter these parts are located windward side or leeward side, can both realize the detection of sensor. When the two bionic cross beam sensors 1 are respectively positioned in the two linear pipes of the U-shaped ventilation pipeline, all parts in the bionic cross beam sensor 1 are positioned on the upper surface of the bionic cross beam sensor 1, and the flowing directions of air in the through holes 101 of the two bionic cross beam sensors 1 are different, so that the voltages output by the two bionic cross beam sensors 1 are subjected to average processing, and the detection accuracy is improved.
In a preferred embodiment of the present invention, as shown in fig. 5 to 9, the sensing device body 2 includes: a base 21, a sensor placement plate 22, an intermediate plate 23, and a cover plate 24, which are arranged in this order; the base 21 is provided with a U-shaped part 2b1, the sensor placing plate 22 is provided with a placing hole corresponding to the U-shaped part 2b1 for placing a sensor, the middle plate 23 is provided with an opening part (comprising an inlet 2b2 and an outlet 2b3), and the U-shaped part 2b1, the placing hole and the opening part form the U-shaped ventilation pipe 2 b; the cover plate 24 is n-shaped in cross section, and the cover plate 24 is connected to the intermediate plate 23 to form the main air duct 2 a.
Specifically, in order to facilitate taking and placing of the bionic cross beam sensor 1, the base 21 and the middle plate 23 can be connected, so that the sensor placing plate 22 can be drawn out from the position between the base 21 and the middle plate 23, the bionic cross beam sensor 1 in a hole can be placed on the sensor placing plate 22 in a replaceable manner, different bionic cross beam sensors 1 have different detection limits and sensitivities, and main ventilation pipelines are realized through different bionic cross beam sensors 1. For example, a flange is provided on each side of the base 21, the sensor placement plate 22 is located between the two flanges, and the base 21 is connected to the intermediate plate 23 via the flange and supports the intermediate plate 23, so that the sensor placement plate 22 can be drawn out from between the base 21 and the intermediate plate 23.
Specifically, the size specification of a preferred air flow velocity sensing device containing the bionic cross beam sensor designed herein is as follows: the sensing device is made of acrylic plastic or metal aluminum, the size of the whole sensing device is 1cm x 1.2cm, the height of the cover plate is 0.6cm, the size of a groove in the cover plate is 0.4cm x 1cm, the thickness of the middle plate is 0.2cm, two air turning ports are arranged on the middle plate, the inner diameter of each air turning port is 0.2cm, the height of the base is 0.4cm, the height of flanges on two sides of the base is 0.1cm as same as that of the sensor placing plate, and the width of the placing plate is 0.4cm as same as that of the distance between the flanges. A channel with the depth of 0.2cm, the length of 0.6cm and the width of 0.2cm is dug in the base, the central distance of the two sensors on the placing plate is 0.4cm, the air rotating port and the through hole of the middle plate form a U-shaped ventilation pipeline together with the channel in the base.
Based on the bionic cross beam sensor described in the above embodiments, the present invention further provides a preferred embodiment of a method for manufacturing a bionic cross beam sensor, the bionic cross beam sensor is manufactured by using an MEMS (micro electro Mechanical Systems) process, which specifically includes the following steps:
the preparation method of the bionic cross beam sensor comprises the following steps:
step S100, providing a substrate, and manufacturing a first mask on the surface of the substrate.
Specifically, a silicon wafer with a thickness of 300 microns and a buried oxide layer is used as a substrate, and a first mask is a silicon dioxide mask. A first mask with a thickness of 0.2 microns was made on both the upper and lower surfaces of the substrate base plate using an oxidation process.
Step S200, performing photolithography on the substrate at the positions corresponding to the first piezoresistor 121, the second piezoresistor 122, the third piezoresistor 123 and the fourth piezoresistor 124, removing the first mask at the positions, exposing the underlying substrate, performing ion implantation, and forming the first piezoresistor 121, the second piezoresistor 122, the third piezoresistor 123 and the fourth piezoresistor 124 at the positions corresponding to the resistors to obtain the substrate containing piezoresistors.
Specifically, photoresist is coated on the whole substrate, the photoresist on the position where the piezoresistor needs to be formed is changed in property through a photoetching machine, the photoresist after the property change is dissolved away by using a specific solution, a first mask on the position corresponding to the piezoresistor is exposed, the first mask is etched away through a solution (such as hydrofluoric acid) or gas capable of reacting with the first mask, the substrate under the first mask is exposed, then specific particles are implanted into the substrate through an ion implantation method, the property of the substrate is changed, and the piezoresistor is formed on the substrate. The first mask and the photoresist are used for preventing ions in the non-piezoresistor area from entering the substrate when ion implantation is carried out, and property change is generated only on the position of the piezoresistor.
And S300, manufacturing a second mask on the substrate base plate containing the piezoresistors and performing photoetching, and then manufacturing a connecting welding point V1, a connecting welding point V2, a connecting welding point GND, a connecting welding point VCC, and connecting lines of all connecting welding points and all piezoresistors to obtain the substrate base plate containing the connecting welding points.
Specifically, the invention adopts a metal evaporation or sputtering mode to manufacture each connecting welding point and each connecting line for connecting the piezoresistor completed in the previous manufacturing step to form a specific circuit, therefore, the second mask adopts photoresist and is used for protecting the non-circuit part of the piezoresistor, the first mask on the corresponding position of the circuit (namely each connecting welding point and each connecting line) and the corresponding position of part of the piezoresistor is removed through photoetching and corrosion, the second mask (namely the photoresist) exposes the piezoresistor and the substrate below, and the piezoresistor below is connected and the connecting lines and the connecting welding points are formed through the metal evaporation or sputtering mode.
And S400, performing photoetching on the through hole, the first bionic slit structure and the second bionic slit structure on the substrate containing the connecting welding spot, etching the first comb tooth structure and the second comb tooth structure on the back surface, etching the cross beam at a certain depth on the back surface, and removing the first mask and the second mask to obtain the bionic cross beam sensor.
Specifically, the through holes are formed by etching the substrate base plate containing the connection pads, it should be noted that the substrate and the cross beam are integrally formed, that is, the substrate in step S100 is a substrate base plate on which the through holes are not formed. Both the substrate and the cross beam are formed by photolithography. When the through hole is formed by etching, since the thickness of the cross beam is smaller than that of the substrate, the etching needs to be performed from the back surface of the substrate base plate to remove the redundant substrate material. The first bionic comb tooth slit structure 131 and the second bionic comb tooth slit structure 132 are formed through etching, and the tip region of the first bionic comb tooth slit structure 131 and the tip region of the second bionic comb tooth slit structure 132 form a variable-curvature arc tip through adjusting the angle of the substrate.
The front side is etched to form a cross beam shape, a first bionic seam structure and a second bionic seam structure, the tip area of the first bionic seam structure and the tip area of the second bionic seam structure form a variable curvature arc tip end through adjusting the angle of the substrate, the back side is etched upwards to form a comb tooth structure, then the back side is etched integrally until the beam structure is released, and finally a bionic cross beam sensor is formed.
In summary, the air flow velocity sensing device including the bionic cross beam sensor provided by the present invention includes: the device comprises a substrate, wherein a through hole, a first piezoresistor, a third piezoresistor, a connection welding point V1, a connection welding point V2, a connection welding point GND and a connection welding point VCC are arranged on the substrate and positioned at the edge of the through hole; be provided with deformable cross roof beam in the through-hole, be provided with first bionical broach seam structure and the bionical broach seam structure of second on the cross roof beam, first bionical broach seam structure includes: first bionical seam structure and first broach structure, first broach structure sets up cross beam one side first bionical seam structure corresponds on the position, the cross beam deviates from one side of first broach structure is provided with second piezo-resistor, the bionical broach seam structure of second includes: the cross beam is provided with a first bionic slit structure and a first comb tooth structure, the first comb tooth structure is arranged at a position corresponding to the first bionic slit structure on one side of the cross beam, and a first piezoresistor is arranged on one side of the cross beam, which is far away from the first comb tooth structure; the second end of first piezo-resistor with the first end of second piezo-resistor all with connection pad V1 connects, the second end of second piezo-resistor with the first end of third piezo-resistor all with connection pad GND connects, the second end of third piezo-resistor with the first end of fourth piezo-resistor all with connection pad V2 connects, the second end of fourth piezo-resistor with the first end of first piezo-resistor all with connect the welding point VCC and connect. The first piezoresistor, the second piezoresistor, the third piezoresistor and the fourth piezoresistor are connected to form a Wheatstone bridge. When air passes through the through hole, the cross beam is deformable, the resistance value of the second piezoresistor and the resistance value of the fourth piezoresistor are changed, and the flow speed of the air can be obtained by detecting the voltage of the Wheatstone bridge. Because of the stress concentration effect, the stress is concentrated in the peripheral area of the bionic comb slit structure, so that under the same wind speed, the stress of the peripheral area of the bionic comb slit structure is larger, the change of the piezoresistor at the edge of the bionic comb slit structure is larger, and the cross beam sensor containing the bionic comb slit structure has higher sensitivity.
It is to be understood that the invention is not limited to the examples described above, but that modifications and variations may be effected thereto by those of ordinary skill in the art in light of the foregoing description, and that all such modifications and variations are intended to be within the scope of the invention as defined by the appended claims.
Claims (8)
1. A bionic cross beam sensor is characterized by comprising: the device comprises a substrate, wherein a through hole, a first piezoresistor, a third piezoresistor, a connection welding point V1, a connection welding point V2, a connection welding point GND and a connection welding point VCC are arranged on the substrate and positioned at the edge of the through hole; be provided with deformable cross roof beam in the through-hole, be provided with first bionical broach seam structure and the bionical broach seam structure of second on the cross roof beam, first bionical broach seam structure includes: first bionical seam structure and first broach structure, first broach structure sets up cross beam one side first bionical seam structure corresponds on the position, the cross beam deviates from one side of first broach structure is provided with second piezo-resistor, the bionical broach seam structure of second includes: the cross beam is provided with a first bionic slit structure and a first comb tooth structure, the first comb tooth structure is arranged at a position corresponding to the first bionic slit structure on one side of the cross beam, and a first piezoresistor is arranged on one side of the cross beam, which is far away from the first comb tooth structure; the second end of the first piezoresistor and the first end of the second piezoresistor are both connected with the connection welding point V1, the second end of the second piezoresistor and the first end of the third piezoresistor are both connected with the connection welding point GND, the second end of the third piezoresistor and the first end of the fourth piezoresistor are both connected with the connection welding point V2, and the second end of the fourth piezoresistor and the first end of the first piezoresistor are both connected with the connection welding point VCC; the first bionic seam structure and the second bionic seam structure both adopt a hole seam group penetrating through the cross beam, and the penetrating direction of the hole seam group is consistent with the direction of the central axis of the through hole; the first comb tooth structure and the second comb tooth structure both adopt comb tooth groups, comb teeth in the comb tooth groups are arranged in one-to-one correspondence with apertures in the aperture groups, and extension holes communicated with the apertures are formed in the comb teeth; a groove is formed between two adjacent comb teeth of the comb tooth group, and the depth and the length-width ratio of the groove are determined according to the stress of the cross beam where the comb teeth are located.
2. The biomimetic cross beam sensor of claim 1, wherein the aspect ratio of the apertures in the aperture set is 1-20: 1; the tip of each hole in the hole group is a variable-curvature arc tip.
3. The biomimetic cross beam sensor of claim 1, wherein the spacing and aspect ratio of each aperture in the set of apertures is determined according to the force applied to the cross beam at each aperture.
4. The biomimetic cross beam sensor of claim 1, wherein an air blocking plate is disposed in the center of the cross beam.
5. The utility model provides an air flow velocity sensing device who contains bionical cross beam sensor which characterized in that includes: the sensing device comprises a sensing device body, a sensing device body and a control device, wherein a main air duct and a U-shaped air duct are formed on the sensing device body; the inlet and the outlet of the U-shaped vent pipe are both positioned in the main vent pipe and respectively face to two ends of the main vent pipe; the bionic cross beam sensor as claimed in any one of claims 1-4 is arranged in the U-shaped vent pipeline.
6. An air flow velocity sensing device according to claim 5, wherein there are two said bionic cross beam sensors, respectively located in two linear tubes of said U-shaped ventilation duct.
7. An air flow rate sensing device according to claim 5, wherein said sensing device body includes: the sensor comprises a base, a sensor placing plate, a middle plate and a cover plate which are arranged in sequence; the base is provided with a U-shaped part, a sensor placing plate is provided with a placing hole for placing a sensor at a position corresponding to the U-shaped part, the middle plate is provided with an opening part, and the U-shaped part, the placing hole and the opening part form the U-shaped ventilation pipeline; the section of the cover plate is n-shaped, and the cover plate is connected with the middle plate to form the main air duct.
8. A method for preparing a bionic cross beam sensor according to any one of claims 1-4, characterized by comprising the following steps:
providing a substrate, and manufacturing a first mask on the surface of the substrate;
performing photo-etching on corresponding positions of the first piezoresistor, the second piezoresistor, the third piezoresistor and the fourth piezoresistor on the substrate to remove a first mask on the corresponding positions, and then performing ion implantation to respectively form the first piezoresistor, the second piezoresistor, the third piezoresistor and the fourth piezoresistor to obtain a substrate containing piezoresistors;
manufacturing a second mask on the substrate base plate containing the piezoresistors and photoetching, and then manufacturing a connecting welding point V1, a connecting welding point V2, a connecting welding point GND, a connecting welding point VCC, and connecting lines of each connecting welding point and each piezoresistor to obtain the substrate base plate containing the connecting welding points;
and after the first comb tooth structure and the second comb tooth structure are etched on the back surface, a cross beam is formed by etching the back surface at a certain depth, and the first mask and the second mask are removed to obtain the bionic cross beam sensor.
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