CN111450670A - Dichlorosilane tail gas treatment system and treatment method thereof - Google Patents
Dichlorosilane tail gas treatment system and treatment method thereof Download PDFInfo
- Publication number
- CN111450670A CN111450670A CN202010297833.4A CN202010297833A CN111450670A CN 111450670 A CN111450670 A CN 111450670A CN 202010297833 A CN202010297833 A CN 202010297833A CN 111450670 A CN111450670 A CN 111450670A
- Authority
- CN
- China
- Prior art keywords
- tail gas
- reaction
- gas
- control valve
- outlet channel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/346—Controlling the process
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
- Environmental & Geological Engineering (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Treating Waste Gases (AREA)
Abstract
The invention discloses a dichlorosilane tail gas treatment system and a treatment method thereof, aiming at providing a tail gas treatment system with good reaction effect, simple structure and strong practicability, and the technical proposal is that the tail gas treatment part comprises a frame, a reaction chamber arranged on the frame, an air inlet channel communicated with the reaction chamber and a tail gas treatment mechanism arranged in the reaction chamber, in order to improve the treatment effect of the tail gas, the tail gas treatment mechanism is arranged to comprise a first channel, a second channel and an air outlet channel arranged in the reaction chamber, the first channel is internally communicated with a first reaction gas, the second channel is internally communicated with a second reaction gas, the air outlet channel is internally provided with a monitoring mechanism for the residual quantity of the tail gas, the tail gas is monitored by the tail gas monitoring mechanism, the tail gas treatment device has the advantages of ensuring the healthy emission of the tail gas, along with strong practicability and simple structure, and is suitable for the technical field of dichlorosilane production equipment.
Description
Technical Field
The invention relates to the technical field of dichlorosilane production equipment, in particular to a dichlorosilane tail gas treatment system and a dichlorosilane tail gas treatment method.
Background
The tail gas treatment system of dichlorosilane is used for treating tail gas generated after the reaction of producing dichlorosilane.
Currently, dichlorosilane tail gas treatment systems on the market comprise a reaction part and a tail gas treatment part connected with the reaction part. In a conventional dichlorosilane tail gas treatment system, when tail gas is treated, a centralized treatment mode is usually adopted, and the implementation treatment of the tail gas cannot be guaranteed, so that the problem of how to perform the treatment of the tail gas in the reaction process is also the existing problem under the condition of implementing the treatment.
Disclosure of Invention
Aiming at the defects in the prior art, the invention aims to provide the tail gas treatment system which is good in reaction effect, simple in structure and strong in practicability.
In order to achieve the purpose, the invention provides the following technical scheme: the utility model provides a dichlorosilane's tail gas processing system, includes reaction part and the tail gas treatment part of being connected with reaction part, the tail gas treatment part includes the frame, set up the reacting chamber in the frame, the inlet channel who is linked together with the reacting chamber and set up the tail gas processing mechanism in the reacting chamber, this tail gas processing mechanism is including setting up in the reacting chamber and with the first passageway of inlet channel intercommunication, the second passageway and set up the outlet channel in the reacting chamber, it has first reactant gas to lead to in the first passageway, it has second reactant gas to lead to in the second passageway, and be equipped with the monitoring mechanism who is used for the tail gas residual amount in the outlet channel.
Through adopting above-mentioned technical scheme, the tail gas treatment part includes the frame, set up the reacting chamber in the frame, inlet channel that is linked together with the reacting chamber and set up the tail gas processing mechanism in the reacting chamber, in order to improve the treatment effect to tail gas, tail gas processing mechanism through setting up, and set up this tail gas processing mechanism to including setting up in the reacting chamber and the first passageway that communicates with inlet channel, second passageway and set up the outlet channel in the reacting chamber, it has first reactant gas to lead to in the first passageway, it has second reactant gas to lead to in the second passageway, and be equipped with the monitoring mechanism who is used for the tail gas residual quantity in the outlet channel, monitor tail gas through tail gas monitoring mechanism, in order to guarantee the healthy emission of tail gas, therefore, the clothes hanger is strong in practicability, and is simple in.
The invention is further configured to: the tail gas treatment mechanism also comprises a control mechanism for controlling the input amount of the reaction gas, and the control mechanism comprises a first control valve which is arranged on the first channel and is used for controlling the inflow amount of the first reaction gas and a second control valve which is arranged on the second channel and is used for controlling the inflow amount of the second reaction gas.
Through adopting above-mentioned technical scheme, tail gas treatment mechanism is still including the control mechanism who is used for controlling reaction gas inflow, this control mechanism is including setting up on first passageway and being used for controlling the first control valve of first reaction gas inflow and setting up on the second passageway and being used for controlling the second control valve of second reaction gas inflow, through the setting of above-mentioned structure, then guaranteed to control the circulation of first reaction gas and second reaction gas, then guaranteed good control effect, moreover, the steam generator is simple in structure, therefore, the clothes hanger is strong in practicability.
The invention is further configured to: the tail gas processing mechanism further comprises an inductor and a controller, wherein the inductor is arranged in the air inlet channel and used for inducing whether tail gas enters or not, the controller is used for controlling the opening or closing or flow adjusting of the first control valve and the second control valve, the monitoring mechanism comprises a detector and a third control valve, the detector is arranged in the air outlet channel and used for monitoring the content of tail gas components, the third control valve is arranged in the air outlet channel, the detector is electrically connected with the controller, the inductor is electrically connected with the controller, and the third control valve is electrically connected with the controller.
By adopting the technical scheme, the tail gas treatment mechanism also comprises an inductor which is arranged in the gas inlet channel and is used for inducing whether the tail gas enters or not and a controller which is used for controlling the opening or closing or flow adjustment of the first and second control valves, the monitoring mechanism is further arranged to comprise a detector which is arranged in the gas outlet channel and is used for monitoring the content of the tail gas and a third control valve which is arranged in the gas outlet channel through the arranged inductor and controlling the first and second control valves so as to control the flow of the reaction gas of the first and second channels, thereby ensuring good control effect, the structure is simple, the practicability is strong, the monitoring mechanism is further arranged to comprise a detector which is arranged in the gas outlet channel and is used for monitoring the content of the tail gas and a third control valve which is arranged in the gas outlet channel, the detector is electrically connected with the controller, the inductor is electrically connected with the controller, the third control valve is electrically connected with the controller, the detector is used for detecting harmful components in the gas, so that a good practical effect is ensured, the stability is high, and the structure is simple.
The invention is further configured to: the first control valve, the second control valve and the third control valve are all electromagnetic valves.
Through adopting above-mentioned technical scheme, first control valve, second control valve, third control valve are the solenoid valve, adopt above-mentioned structure setting, adopt the solenoid valve structure setting, the subsequent control of being convenient for, the structure is simple, and the practicality is strong.
The invention is further configured to: and a reaction cavity is also arranged in the reaction chamber, and the depth of the reaction cavity is 3 times of the inner diameter of the air inlet channel.
Through adopting above-mentioned technical scheme, still be equipped with the reaction chamber in the reaction chamber, the degree of depth of this reaction chamber is 3 times of inlet channel internal diameter, adopts the above-mentioned structure setting, through the reaction chamber that sets up to the reaction chamber sets up to the triple of inlet channel internal diameter, has ensured the abundant reaction of tail gas, and guarantees to have the effect of storing after reaction production liquid, and the practicality is strong, simple structure.
A treatment method suitable for the exhaust gas treatment system of dichlorosilane comprises the following steps of S1, outputting the value with the lowest harmful components in the exhaust gas, and setting the value as HRated valueAfter the raw materials of the reaction part are reacted within T1 time, an inductor in the air inlet channel induces tail gas to enter the air inlet channel, the controller receives signals of the reactor and opens the electromagnetic valves of the first channel and the second channel;
s2, after the tail gas reacts in the reaction chamber for T2 time, the content of harmful ingredients in the tail gas is detected by a detector in the gas outlet channel, the output of the reaction gas is controlled by adjusting a first control valve and a second control valve by a controller until the detector detects the content H of the harmful ingredients in the tail gas1If H is1≤HRated valueThen the air outlet is openedA third control valve of the way;
s3, detecting the content of harmful components in the tail gas of the gas outlet channel as H by a detector after T3 time2If H is2＞HRated valueClosing the third control valve of the gas outlet channel, adjusting the output quantity of the first control valve and the second control valve to the reaction gas through the controller, and reacting for a period of time;
s4, detecting the content of harmful components in the tail gas of the gas outlet channel as H by a detector after T4 time3If H is3＞HRated valueAdjusting the output of the first and second control valves to the reaction gas, if H3≤HRated valueIf so, opening a third control valve of the air outlet channel;
and S5, circulating the operations until the tail gas reaction is finished.
Through adopting above-mentioned technical scheme, reactant flow through controlling first, two passageways guarantees the abundant reaction to control to tail gas, and through setting up the monitoring mechanism in the passageway of giving vent to anger, can carry out the monitoring of stage nature to the tail gas, and simultaneously, the reaction part also can have the change of the speed of reaction, or the phenomenon that the reactant reduces, consequently to the stage nature detection of tail gas, guarantee first, the reactant flow of two passageways, guarantee the rational utilization of resource, thereby further improvement good practical function, and stability is strong.
Drawings
FIG. 1 is a schematic structural diagram of an embodiment of a dichlorosilane tail gas treatment system and a treatment method thereof according to the present invention.
Reference number in the figure, 1, reaction part; 2. a tail gas treatment part; 20. a frame; 21. a reaction chamber; 22. an air intake passage; 220. a first channel; 221. a second channel; 23. an air outlet channel; 222. a first control valve; 223. a second control valve; 224. an inductor; 230. a detector; 231. a third control valve; 210. a reaction chamber.
Detailed Description
Referring to fig. 1, embodiments of a dichlorosilane tail gas treatment system and a treatment method thereof according to the present invention are further described.
For ease of description, spatially relative terms, such as "upper," "lower," "left," "right," and the like, may be used in the embodiments to describe one element or feature's relationship to another element or feature as illustrated in the figures. It will be understood that the spatial terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements described as "below" other elements or features would then be oriented "above" the other elements or features. Thus, the exemplary term "lower" can encompass both an upper and a lower orientation. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.
Moreover, relational terms such as "first" and "second," and the like, may be used solely to distinguish one element from another element having the same name, without necessarily requiring or implying any actual such relationship or order between such elements.
A tail gas treatment system of dichlorosilane comprises a reaction part 1 and a tail gas treatment part 2 connected with the reaction part 1, wherein the tail gas treatment part 2 comprises a rack 20, a reaction chamber 21 arranged on the rack 20, an air inlet channel 22 communicated with the reaction chamber 21 and a tail gas treatment mechanism arranged in the reaction chamber 21, in order to improve the treatment effect on tail gas, the tail gas treatment mechanism is arranged and comprises a first channel 220, a second channel 221 and an air outlet channel 23, the first channel 220 is communicated with first reaction gas, the second channel 221 is communicated with second reaction gas, the air outlet channel 23 is internally provided with a monitoring mechanism for the residual quantity of the tail gas, the tail gas is monitored by the tail gas monitoring mechanism, with the healthy emission of guaranteeing tail gas, the practicality is strong, simple structure to the binary channels structure sets up, is convenient for to the accurate regulation of reactant, ensures good practical function.
The invention is further arranged that the tail gas treatment mechanism further comprises a control mechanism for controlling the input amount of the reaction gas, the control mechanism comprises a first control valve 222 arranged on the first channel 220 and used for controlling the input amount of the first reaction gas and a second control valve 223 arranged on the second channel 221 and used for controlling the input amount of the second reaction gas, through the structure arrangement, the control on the input amount of the first reaction gas and the second reaction gas is ensured, and the good control effect is ensured.
The invention further provides that the tail gas treatment mechanism further comprises a sensor 224 which is arranged in the air inlet channel 22 and used for sensing whether the tail gas enters and a controller which is used for controlling the opening or closing or adjusting the flow of the first and second control valves, the sensor 224 is arranged, the first and second control valves are controlled by the controller to control the flow of the reaction gas of the first and second channels, thereby ensuring good control effect, the structure is simple, the practicability is strong, the monitoring mechanism is further arranged to comprise a detector 230 which is arranged in the air outlet channel 23 and used for monitoring the content of the tail gas components and a third control valve 231 which is arranged in the air outlet channel 23, the detector 230 is electrically connected with the controller, the sensor 224 is electrically connected with the controller, the third control valve 231 is electrically connected with the controller, and the third control valve 231 is arranged, in order to ensure that the exhaust gas is harmless after being discharged, the detector 230 is used for detecting harmful components in the gas, thereby ensuring good practical effect, strong stability and simple structure.
The invention is further arranged that the first control valve 222, the second control valve 223 and the third control valve 231 are all electromagnetic valves, and the structure arrangement is adopted, and the electromagnetic valve structure arrangement is adopted, so that the subsequent control is convenient, the structure is simple, and the practicability is strong.
The reaction chamber 210 is arranged in the reaction chamber 21, the depth of the reaction chamber 210 is 3 times of the inner diameter of the air inlet channel 22, and by adopting the structure, the full reaction of the tail gas is ensured by arranging the reaction chamber 210 and arranging the reaction chamber 210 to be three times of the inner diameter of the air inlet channel 22, and the effect of storing after liquid is generated in the reaction is ensured.
A treatment method suitable for the exhaust gas treatment system of dichlorosilane comprises the following steps of S1, outputting the value with the lowest harmful components in the exhaust gas, and setting the value as HRated valueAfter the raw materials in the reaction part are reacted within the time T1, the sensor 224 in the air inlet passage 22 senses that the tail gas enters the air inlet passage 22, the controller receives signals of the reactor and opens the electromagnetic valves of the first passage and the second passage;
s2, after the tail gas reacts in the reaction chamber for T2 time, the content of harmful components in the tail gas is detected by the detector 230 in the gas outlet channel 23, the output quantity of the reaction gas is controlled by adjusting the first control valve and the second control valve by the controller until the detector 230 detects the content H of the harmful components in the tail gas1If H is1≤HRated valueThen, the third control valve 231 of the air outlet channel 23 is opened;
s3, after the T3 time, detecting the content of harmful components in the tail gas in the gas outlet channel 23 as H through the detector 2302If H is2＞HRated valueIf yes, the third control valve 231 of the gas outlet channel 23 is closed, and the output of the first and second control valves to the reaction gas is adjusted by the controller, and the reaction is carried out for a period of time;
s4, after the T4 time, detecting the content of harmful components in the tail gas in the gas outlet channel 23 as H through the detector 2303If H is3＞HRated valueAdjusting the output of the first and second control valves to the reaction gas, if H3≤HRated valueThen, the third control valve 231 of the air outlet channel 23 is opened;
and S5, circulating the operations until the tail gas reaction is finished.
The above treatment method is further explained by setting the minimum value of harmful substances in the exhaust gas to HRated valueWhen the reaction part is reacted, the sensor in the air inlet channel senses that the tail gas enters the air inlet channel, the controller receives a signal of the reactor and opens the electromagnetic valves of the first channel and the second channel to ensure the reaction treatment of the tail gas, and the third electromagnetic valve is closed at the moment and passes throughAnd detecting the tail gas components in the gas outlet channel, and judging whether the introduction amount of the reaction gas needs to be adjusted or not so as to ensure that the tail gas components are in a safe range.
Through adopting above-mentioned technical scheme, reactant flow through controlling first, two passageways guarantees the abundant reaction to control to tail gas, and through setting up the monitoring mechanism in the passageway of giving vent to anger, can carry out the monitoring of stage nature to the tail gas, and simultaneously, the reaction part also can have the change of the speed of reaction, or the phenomenon that the reactant reduces, consequently to the stage nature detection of tail gas, guarantee first, the reactant flow of two passageways, guarantee the rational utilization of resource, thereby further improvement good practical function, and stability is strong.
The above description is only a preferred embodiment of the present invention, and is not intended to limit the present invention, and those skilled in the art should be able to make general changes and substitutions within the technical scope of the present invention.
Claims (6)
1. The utility model provides a tail gas processing system of dichlorosilane, includes reaction part (1) and tail gas processing part (2) of being connected with reaction part (1), a serial communication port, tail gas processing part (2) include frame (20), set up reaction chamber (21) on frame (20), inlet channel (22) that are linked together with reaction chamber (21) and set up the tail gas processing mechanism in reaction chamber (21), this tail gas processing mechanism is including setting up in reaction chamber (21) and first passageway (220) that communicate with inlet channel (22), second passageway (221) and set up outlet channel (23) in reaction chamber (21), first passageway (220) intussuseption has first reactant gas, second passageway (221) intussuseption has second reactant gas, and be equipped with the monitoring mechanism that is used for the tail gas residual in outlet channel (23).
2. The exhaust gas treatment system for dichlorosilane according to claim 1, wherein the exhaust gas treatment mechanism further comprises a control mechanism for controlling the introduction amount of the reaction gas, and the control mechanism comprises a first control valve (222) disposed on the first passage (220) for controlling the inflow amount of the first reaction gas and a second control valve (223) disposed on the second passage (221) for controlling the inflow amount of the second reaction gas.
3. The exhaust gas treatment system for dichlorosilane according to claim 2, wherein the exhaust gas treatment mechanism further comprises a sensor (224) disposed in the inlet channel (22) for sensing whether the exhaust gas enters or not and a controller for controlling the opening or closing or flow rate adjustment of the first and second control valves, the monitoring mechanism comprises a detector (230) disposed in the outlet channel (23) for monitoring the content of the components of the exhaust gas and a third control valve (231) disposed in the outlet channel (23), the detector (230) and the controller are electrically connected, the sensor (224) and the controller are electrically connected, and the third control valve (231) and the controller are electrically connected.
4. The dichlorosilane tail gas treatment system according to claim 2, wherein the first control valve (222), the second control valve (223) and the third control valve (231) are all solenoid valves.
5. The exhaust gas treatment system for dichlorosilane according to claim 1, wherein the reaction chamber (21) is further provided with a reaction cavity (210), and the depth of the reaction cavity (210) is 3 times of the inner diameter of the gas inlet channel (22).
6. A method for treating an exhaust gas treatment system for dichlorosilane as defined in any one of claims 1 to 5, comprising the steps of, S1, outputting a value of lowest harmful component in the exhaust gas, setting the value as the H rating, after the raw material of the reaction part (1) is reacted for a time T1, sensing the exhaust gas entering the inlet passage (22) by a sensor (224) in the inlet passage (22), receiving a signal from the reactor by a controller, and opening the solenoid valves of the first and second passages;
s2, after the tail gas reacts in the reaction chamber (21) for T2 time, detecting the content of harmful components in the tail gas through a detector (230) in the gas outlet channel (23), adjusting a first control valve and a second control valve through a controller to control the output quantity of the reaction gas until the detector (230) detects the content of the harmful components in the tail gas, namely H1, and if the H1 is not more than H rated, opening a third control valve (231) of the gas outlet channel (23);
s3, after T3 time, detecting the content of harmful components in the tail gas of the gas outlet channel (23) as H2 through the detector (230), if H2 is larger than H rating, closing the third control valve (231) of the gas outlet channel (23), adjusting the output quantity of the first control valve and the second control valve to the reaction gas through the controller, and reacting for a period of time;
s4, after T4 time, detecting the content of harmful components in the tail gas of the gas outlet channel (23) as H3 through the detector (230), if H3 is larger than the H rating, adjusting the output quantity of the first control valve and the second control valve to the reaction gas, and if H3 is smaller than or equal to the H rating, opening the third control valve (231) of the gas outlet channel (23);
and S5, circulating the operations until the tail gas reaction is finished.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010297833.4A CN111450670A (en) | 2020-04-16 | 2020-04-16 | Dichlorosilane tail gas treatment system and treatment method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010297833.4A CN111450670A (en) | 2020-04-16 | 2020-04-16 | Dichlorosilane tail gas treatment system and treatment method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN111450670A true CN111450670A (en) | 2020-07-28 |
Family
ID=71670994
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010297833.4A Pending CN111450670A (en) | 2020-04-16 | 2020-04-16 | Dichlorosilane tail gas treatment system and treatment method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111450670A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003135925A (en) * | 2001-10-30 | 2003-05-13 | Air Liquide Japan Ltd | Treatment cylinder and detoxification apparatus |
| TW592789B (en) * | 2001-06-21 | 2004-06-21 | United Microelectronics Corp | A gas decomposition apparatus |
| CN101155634A (en) * | 2005-03-22 | 2008-04-02 | 爱德华兹有限公司 | Method of treating a gas stream |
| CN104722203A (en) * | 2015-03-19 | 2015-06-24 | 北京博惠通科技发展有限公司 | SCR denitration control system and SCR denitration control method of heating furnace flue gas |
| CN105727706A (en) * | 2016-04-14 | 2016-07-06 | 佛山市电建电力设备有限公司 | Control system applied to industrial organic waste gas VOCs treatment equipment |
| CN105983314A (en) * | 2015-01-31 | 2016-10-05 | 中国石油化工股份有限公司 | Automatic control device and method for amount of acid added into neutralization tower |
-
2020
- 2020-04-16 CN CN202010297833.4A patent/CN111450670A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW592789B (en) * | 2001-06-21 | 2004-06-21 | United Microelectronics Corp | A gas decomposition apparatus |
| JP2003135925A (en) * | 2001-10-30 | 2003-05-13 | Air Liquide Japan Ltd | Treatment cylinder and detoxification apparatus |
| CN101155634A (en) * | 2005-03-22 | 2008-04-02 | 爱德华兹有限公司 | Method of treating a gas stream |
| CN105983314A (en) * | 2015-01-31 | 2016-10-05 | 中国石油化工股份有限公司 | Automatic control device and method for amount of acid added into neutralization tower |
| CN104722203A (en) * | 2015-03-19 | 2015-06-24 | 北京博惠通科技发展有限公司 | SCR denitration control system and SCR denitration control method of heating furnace flue gas |
| CN105727706A (en) * | 2016-04-14 | 2016-07-06 | 佛山市电建电力设备有限公司 | Control system applied to industrial organic waste gas VOCs treatment equipment |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106020293B (en) | A kind of detecting and controlling system of shower water temperature and flow | |
| CN101334676A (en) | Polychloroethylene production reaction temperature control method for small-sized polymerization kettle DCS | |
| CN112142183B (en) | Non-continuous feeding proportion regulation and control system based on Fenton reagent | |
| CN105727706A (en) | Control system applied to industrial organic waste gas VOCs treatment equipment | |
| CN101362616B (en) | System for accurately controlling dissolved oxygen content in water and use thereof | |
| CN214570954U (en) | Intelligent coagulant adding system | |
| CN111450670A (en) | Dichlorosilane tail gas treatment system and treatment method thereof | |
| CN108404828B (en) | Process control method and reaction tower in ferric trichloride production process | |
| CN105749729A (en) | Ammonification system based on automatic-adjusted pH value | |
| CN109734067B (en) | Process and device for synthesizing iron phosphate | |
| CN205586753U (en) | Control system for industry organic waste gas VOCs treatment facility | |
| CN112973562A (en) | Preparation process of traditional Chinese medicine compound for reducing livestock and poultry vaccine reaction | |
| CN210239874U (en) | System for realizing EGR of diesel single-cylinder engine | |
| CN210127101U (en) | Control device for landfill leachate macroporous resin adsorption treatment process | |
| CN109989806B (en) | Diesel engine high-pressure SCR (selective catalytic reduction) ventilation and pressure stabilization system | |
| CN107098532A (en) | It is a kind of that there are the Waste Water Treatments and method of wastewater treatment for covering crystallizers more | |
| CN205650071U (en) | Automatically regulated adds ammonia system based on pH value | |
| CN109502754B (en) | Optimized operation control method and device for two-stage autotrophic denitrification process | |
| CN206064385U (en) | A kind of temperature automatically controlled reactor for preparing aliphatic water reducing agent | |
| CN112807944A (en) | Ammonia water flow adjusting system and method for tail gas denitration | |
| CN101571713A (en) | Full-flow automatically-optimized energy-saving furfural production technology | |
| CN207061559U (en) | The oxygen system of elevator | |
| CN201884718U (en) | Intelligent gas control valve | |
| CN210237490U (en) | Washing tank control system for isooctane prepared from four carbon sources | |
| CN107289435A (en) | A kind of boiler pressure control system and method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20200728 |
|
| RJ01 | Rejection of invention patent application after publication |