CN111440074A - Hofmann rearrangement method for preparing m-phenylenediamine - Google Patents
Hofmann rearrangement method for preparing m-phenylenediamine Download PDFInfo
- Publication number
- CN111440074A CN111440074A CN202010217040.7A CN202010217040A CN111440074A CN 111440074 A CN111440074 A CN 111440074A CN 202010217040 A CN202010217040 A CN 202010217040A CN 111440074 A CN111440074 A CN 111440074A
- Authority
- CN
- China
- Prior art keywords
- metal
- additive
- hydroxide
- phenylenediamine
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 title claims abstract description 35
- 229940018564 m-phenylenediamine Drugs 0.000 title claims abstract description 34
- 238000000034 method Methods 0.000 title claims abstract description 33
- 238000007167 Hofmann rearrangement reaction Methods 0.000 title claims abstract description 12
- QZUPTXGVPYNUIT-UHFFFAOYSA-N isophthalamide Chemical compound NC(=O)C1=CC=CC(C(N)=O)=C1 QZUPTXGVPYNUIT-UHFFFAOYSA-N 0.000 claims abstract description 23
- -1 medical Substances 0.000 claims abstract description 17
- 150000001875 compounds Chemical class 0.000 claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 claims abstract description 10
- 230000008569 process Effects 0.000 claims abstract description 10
- 238000006243 chemical reaction Methods 0.000 claims description 30
- 239000000654 additive Substances 0.000 claims description 28
- 239000002184 metal Substances 0.000 claims description 24
- 230000000996 additive effect Effects 0.000 claims description 23
- 229910052751 metal Inorganic materials 0.000 claims description 23
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 21
- 239000002585 base Substances 0.000 claims description 18
- 239000002994 raw material Substances 0.000 claims description 17
- 150000001412 amines Chemical class 0.000 claims description 15
- 239000002904 solvent Substances 0.000 claims description 15
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 12
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 12
- 229910052783 alkali metal Inorganic materials 0.000 claims description 12
- 150000001340 alkali metals Chemical class 0.000 claims description 12
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 10
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 10
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 9
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 9
- 239000005708 Sodium hypochlorite Substances 0.000 claims description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 9
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 claims description 9
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 8
- 150000004703 alkoxides Chemical class 0.000 claims description 8
- 239000000460 chlorine Substances 0.000 claims description 8
- 229910052801 chlorine Inorganic materials 0.000 claims description 8
- 229910052736 halogen Inorganic materials 0.000 claims description 8
- 150000002367 halogens Chemical group 0.000 claims description 8
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 7
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 7
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 7
- 229910052794 bromium Inorganic materials 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 7
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 claims description 6
- KVNYFPKFSJIPBJ-UHFFFAOYSA-N 1,2-diethylbenzene Chemical compound CCC1=CC=CC=C1CC KVNYFPKFSJIPBJ-UHFFFAOYSA-N 0.000 claims description 6
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 6
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 claims description 6
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 6
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 claims description 6
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 claims description 6
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 claims description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 239000000908 ammonium hydroxide Substances 0.000 claims description 6
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 claims description 6
- 150000007942 carboxylates Chemical class 0.000 claims description 6
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 6
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 claims description 6
- UOHMMEJUHBCKEE-UHFFFAOYSA-N prehnitene Chemical compound CC1=CC=C(C)C(C)=C1C UOHMMEJUHBCKEE-UHFFFAOYSA-N 0.000 claims description 6
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 claims description 6
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 claims description 6
- 229910052723 transition metal Inorganic materials 0.000 claims description 6
- 150000003624 transition metals Chemical class 0.000 claims description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 5
- 229910021529 ammonia Inorganic materials 0.000 claims description 5
- 239000002608 ionic liquid Substances 0.000 claims description 5
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 claims description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 4
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims description 4
- 150000002148 esters Chemical class 0.000 claims description 4
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims description 4
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical compound Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 claims description 4
- 150000002825 nitriles Chemical class 0.000 claims description 4
- 239000011574 phosphorus Substances 0.000 claims description 4
- 229910052698 phosphorus Inorganic materials 0.000 claims description 4
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 claims description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 3
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 claims description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 claims description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 3
- ZKQDCIXGCQPQNV-UHFFFAOYSA-N Calcium hypochlorite Chemical compound [Ca+2].Cl[O-].Cl[O-] ZKQDCIXGCQPQNV-UHFFFAOYSA-N 0.000 claims description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 3
- 239000002841 Lewis acid Substances 0.000 claims description 3
- 239000002879 Lewis base Substances 0.000 claims description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 229910021536 Zeolite Inorganic materials 0.000 claims description 3
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 claims description 3
- 239000003513 alkali Substances 0.000 claims description 3
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 claims description 3
- 150000001408 amides Chemical class 0.000 claims description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 3
- HTMQZWFSTJVJEQ-UHFFFAOYSA-N benzylsulfinylmethylbenzene Chemical compound C=1C=CC=CC=1CS(=O)CC1=CC=CC=C1 HTMQZWFSTJVJEQ-UHFFFAOYSA-N 0.000 claims description 3
- AWHNUHMUCGRKRA-UHFFFAOYSA-N benzylsulfonylmethylbenzene Chemical compound C=1C=CC=CC=1CS(=O)(=O)CC1=CC=CC=C1 AWHNUHMUCGRKRA-UHFFFAOYSA-N 0.000 claims description 3
- 229910052796 boron Inorganic materials 0.000 claims description 3
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 claims description 3
- 239000000920 calcium hydroxide Substances 0.000 claims description 3
- 229910001861 calcium hydroxide Inorganic materials 0.000 claims description 3
- XVDWMONETMNKBK-UHFFFAOYSA-N calcium;dihypobromite Chemical compound [Ca+2].Br[O-].Br[O-] XVDWMONETMNKBK-UHFFFAOYSA-N 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 239000001569 carbon dioxide Substances 0.000 claims description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 3
- 239000003054 catalyst Substances 0.000 claims description 3
- 150000001768 cations Chemical class 0.000 claims description 3
- 239000003638 chemical reducing agent Substances 0.000 claims description 3
- 229940117389 dichlorobenzene Drugs 0.000 claims description 3
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 claims description 3
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 239000011737 fluorine Substances 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 239000011964 heteropoly acid Substances 0.000 claims description 3
- QAOWNCQODCNURD-UHFFFAOYSA-M hydrogensulfate Chemical compound OS([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-M 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- 239000011630 iodine Substances 0.000 claims description 3
- 229910052740 iodine Inorganic materials 0.000 claims description 3
- 150000002576 ketones Chemical class 0.000 claims description 3
- 150000007517 lewis acids Chemical class 0.000 claims description 3
- 150000007527 lewis bases Chemical class 0.000 claims description 3
- 239000003446 ligand Substances 0.000 claims description 3
- LWXVCCOAQYNXNX-UHFFFAOYSA-N lithium hypochlorite Chemical compound [Li+].Cl[O-] LWXVCCOAQYNXNX-UHFFFAOYSA-N 0.000 claims description 3
- JOUZTPYNXDURHJ-UHFFFAOYSA-N lithium;hypobromite Chemical compound [Li+].Br[O-] JOUZTPYNXDURHJ-UHFFFAOYSA-N 0.000 claims description 3
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 claims description 3
- VIVMUYLVKOXORD-UHFFFAOYSA-N magnesium dihypobromite Chemical compound [Mg+2].Br[O-].Br[O-] VIVMUYLVKOXORD-UHFFFAOYSA-N 0.000 claims description 3
- 239000000347 magnesium hydroxide Substances 0.000 claims description 3
- 229910001862 magnesium hydroxide Inorganic materials 0.000 claims description 3
- YZQBYALVHAANGI-UHFFFAOYSA-N magnesium;dihypochlorite Chemical compound [Mg+2].Cl[O-].Cl[O-] YZQBYALVHAANGI-UHFFFAOYSA-N 0.000 claims description 3
- 229910001507 metal halide Inorganic materials 0.000 claims description 3
- 150000005309 metal halides Chemical class 0.000 claims description 3
- 229910044991 metal oxide Inorganic materials 0.000 claims description 3
- 150000004706 metal oxides Chemical class 0.000 claims description 3
- 229910052976 metal sulfide Inorganic materials 0.000 claims description 3
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 239000002808 molecular sieve Substances 0.000 claims description 3
- LCEDQNDDFOCWGG-UHFFFAOYSA-N morpholine-4-carbaldehyde Chemical compound O=CN1CCOCC1 LCEDQNDDFOCWGG-UHFFFAOYSA-N 0.000 claims description 3
- VMOWKUTXPNPTEN-UHFFFAOYSA-N n,n-dimethylpropan-2-amine Chemical compound CC(C)N(C)C VMOWKUTXPNPTEN-UHFFFAOYSA-N 0.000 claims description 3
- 229910000069 nitrogen hydride Inorganic materials 0.000 claims description 3
- 239000007800 oxidant agent Substances 0.000 claims description 3
- 230000001590 oxidative effect Effects 0.000 claims description 3
- 239000003208 petroleum Substances 0.000 claims description 3
- SATVIFGJTRRDQU-UHFFFAOYSA-N potassium hypochlorite Chemical compound [K+].Cl[O-] SATVIFGJTRRDQU-UHFFFAOYSA-N 0.000 claims description 3
- ORQYPOUSZINNCB-UHFFFAOYSA-N potassium;hypobromite Chemical compound [K+].Br[O-] ORQYPOUSZINNCB-UHFFFAOYSA-N 0.000 claims description 3
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 3
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 claims description 3
- CRWJEUDFKNYSBX-UHFFFAOYSA-N sodium;hypobromite Chemical compound [Na+].Br[O-] CRWJEUDFKNYSBX-UHFFFAOYSA-N 0.000 claims description 3
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 claims description 3
- 150000003462 sulfoxides Chemical class 0.000 claims description 3
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 claims description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 3
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 claims description 3
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims description 3
- 239000005052 trichlorosilane Substances 0.000 claims description 3
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 claims description 3
- 239000008096 xylene Substances 0.000 claims description 3
- 239000010457 zeolite Substances 0.000 claims description 3
- 239000005995 Aluminium silicate Substances 0.000 claims description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 claims description 2
- 235000012211 aluminium silicate Nutrition 0.000 claims description 2
- 229910052728 basic metal Inorganic materials 0.000 claims description 2
- 150000003818 basic metals Chemical class 0.000 claims description 2
- 150000001735 carboxylic acids Chemical class 0.000 claims description 2
- 230000003197 catalytic effect Effects 0.000 claims description 2
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 claims description 2
- 150000002170 ethers Chemical class 0.000 claims description 2
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052901 montmorillonite Inorganic materials 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 claims description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 claims description 2
- 229910000299 transition metal carbonate Inorganic materials 0.000 claims description 2
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 claims 1
- 150000003973 alkyl amines Chemical class 0.000 claims 1
- 150000001491 aromatic compounds Chemical class 0.000 claims 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 claims 1
- 238000005516 engineering process Methods 0.000 abstract description 8
- 239000000126 substance Substances 0.000 abstract description 7
- 239000000463 material Substances 0.000 abstract description 5
- 239000000975 dye Substances 0.000 abstract description 3
- 239000012847 fine chemical Substances 0.000 abstract description 3
- 239000000575 pesticide Substances 0.000 abstract description 3
- 239000000049 pigment Substances 0.000 abstract description 3
- 239000002243 precursor Substances 0.000 abstract description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- 235000011114 ammonium hydroxide Nutrition 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 238000006731 degradation reaction Methods 0.000 description 4
- 239000005457 ice water Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 239000012043 crude product Substances 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 239000005909 Kieselgur Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000004679 hydroxides Chemical class 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 238000004809 thin layer chromatography Methods 0.000 description 2
- 238000002604 ultrasonography Methods 0.000 description 2
- 238000009423 ventilation Methods 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N 1H-pyrrole Natural products C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 1
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Natural products C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001263 acyl chlorides Chemical class 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- FDQSRULYDNDXQB-UHFFFAOYSA-N benzene-1,3-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC(C(Cl)=O)=C1 FDQSRULYDNDXQB-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- 230000000711 cancerogenic effect Effects 0.000 description 1
- 231100000315 carcinogenic Toxicity 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- VNGOYPQMJFJDLV-UHFFFAOYSA-N dimethyl benzene-1,3-dicarboxylate Chemical compound COC(=O)C1=CC=CC(C(=O)OC)=C1 VNGOYPQMJFJDLV-UHFFFAOYSA-N 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 150000004694 iodide salts Chemical class 0.000 description 1
- 229910001512 metal fluoride Inorganic materials 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000006396 nitration reaction Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000005580 one pot reaction Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000012074 organic phase Substances 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- AIFMYMZGQVTROK-UHFFFAOYSA-N silicon tetrabromide Chemical compound Br[Si](Br)(Br)Br AIFMYMZGQVTROK-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 150000007944 thiolates Chemical class 0.000 description 1
- 229910021561 transition metal fluoride Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C209/00—Preparation of compounds containing amino groups bound to a carbon skeleton
- C07C209/54—Preparation of compounds containing amino groups bound to a carbon skeleton by rearrangement reactions
- C07C209/56—Preparation of compounds containing amino groups bound to a carbon skeleton by rearrangement reactions from carboxylic acids involving a Hofmann, Curtius, Schmidt, or Lossen-type rearrangement
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C231/00—Preparation of carboxylic acid amides
- C07C231/02—Preparation of carboxylic acid amides from carboxylic acids or from esters, anhydrides, or halides thereof by reaction with ammonia or amines
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C231/00—Preparation of carboxylic acid amides
- C07C231/10—Preparation of carboxylic acid amides from compounds not provided for in groups C07C231/02 - C07C231/08
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/54—Improvements relating to the production of bulk chemicals using solvents, e.g. supercritical solvents or ionic liquids
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
The invention relates to the field of organic functional new material chemicals, and discloses a new process technology for preparing m-phenylenediamine from m-benzenedicarboxamide or a precursor compound thereof by a Hofmann rearrangement method for the first time. M-phenylenediamine is a large amount of key fine chemicals with wide application in related fields such as known dyes, pigments, medical, pesticide and building auxiliary materials and the like, and the innovative technology of the production process is widely concerned.
Description
[ technical field ] A method for producing a semiconductor device
The invention relates to the field of organic functional new material chemicals, and discloses a new process technology for preparing m-phenylenediamine from m-benzenedicarboxamide or a precursor compound thereof by a Hofmann rearrangement method for the first time. M-phenylenediamine is a large amount of key fine chemicals with wide application in related fields such as known dyes, pigments, medical, pesticide and building auxiliary materials and the like, and the innovative technology of the production process is widely concerned.
[ background of the invention ]
M-phenylenediamine, also known as 1, 3-diaminobenzene, is a small molecular compound (CAS 208-45-2) which is a white acicular crystal at normal temperature, and is also a large amount of key fine chemicals with wide application in the related fields of known dyes, pigments, medical and pesticide building auxiliary materials. The traditional manufacturing process of m-phenylenediamine relates to a double nitration reaction in a nitric acid/sulfuric acid strong corrosive medium starting from carcinogenic dangerous chemical benzene as a basic raw material and a subsequent metal catalysis and/or high-pressure hydrogenation double reduction reaction, and the technical route literature has quite abundant detail optimization disclosure, but the current industrial current situation is not fundamentally changed, and the m-phenylenediamine still belongs to disturbing unit reaction engineering with serious environmental pollution and high danger.
The large explosion accidents in shock surprise caused by m-phenylenediamine production enterprises in Chenjia harbor chemical industrial park in Xiangshui county of Jiangsu province in China in 2019, 3 and 21 days are direct reflection of the high risk of the process. Therefore, the preparation process technology and innovation of the composite material are important issues continuously pursued by technical personnel in the industry under the strong drive of the factors of safety, reliability, environmental protection, energy conservation, low cost, economic competitiveness and the like, and no significant breakthrough exists so far.
The latest application of the invention (application No. CN201910744081.9, application date 2019, 8 and 13, publication No. CN110437080A, publication date 2019, 11 and 12) entitled "method for producing m-phenylenediamine" claims that m-phenylenediamine is produced by a hofmann degradation reaction between m-phenylenediamine and sodium hypochlorite. However, the application describes in the claims, the text of the specification, the detailed description and the like that isophthalamide only reacts with sodium hypochlorite solid pure product at the alleged molar ratio, namely, the m-phenylenediamine target product can be obtained without any other core reaction factor (characterized by strong base), which is obviously contrary to the hofmann degradation reaction condition in principle from the chemical reaction technology. Further, if so, in view of the strong oxidizing property of sodium hypochlorite, an oxidation reaction should occur, not the alleged hofmann degradation reaction; secondly, we carefully and multiply arrange the technician to repeat all examples disclosed in the "detailed description" section of this application in parallel, and clearly show that there is no alleged production of m-phenylenediamine, nor even any evidence of significant chemical reactivity.
[ summary of the invention ]
In order to solve at least one of the above technical problems, the present invention provides a novel method for preparing m-phenylenediamine, wherein m-phenylenediamine is subjected to a hofmann rearrangement reaction under reaction conditions to directly produce m-phenylenediamine as shown in the formula (I):
the conditions comprise three elements, a first element being a base, a second element being a halogen and/or a hypohalite of the formula m (clo) n, and a third element being at least one, such as at least one, two, at least three, or all four, of a solvent, temperature, pressure, and additives.
In some embodiments of the invention, the base is selected from at least one, such as at least one, two, three, four, five, or all of a metal hydroxide, a metal carbonate, a metal (ene) carboxylate, a metal oxide, a metal sulfide, a metal halide, a metal alkoxide, a metal alkylaminate, a metal thiolate, ammonium hydroxide, ammonia, an organic tertiary amine, an organic secondary amine, and an organic primary amine of the base.
In some embodiments of the invention, M is an n-valent metal cation, and n is a positive integer from 1 to 6, i.e., 1, 2, 3, 4, 5, or 6.
In the invention, the isophthalamide is obtained by converting meta-substituted arylate with a structure RM under conditions a, and is shown as a formula (H):
in some embodiments of the invention, X and Y are each independently CO2H、C(O)OR、CHO、CN、C(O)Hal、C(OR)3、C(Hal)3Or C (OC (O) R)3。
In some embodiments of the invention, R is a straight or branched chain alkyl group containing 1 to 24 carbon atoms, or a substituted or unsubstituted aromatic group containing 6 to 24 carbon atoms.
In some embodiments of the invention Hal is the halogen atom fluorine, chlorine, bromine or iodine.
In some embodiments of the invention conditions a comprise two elements, the first element being NH3The second element is the same as said third element of the conditions mentioned above, i.e. at least one of solvent, temperature, pressure and additives, e.g. toOne, two, at least three or all four.
In some embodiments of the invention, the solvent is selected from at least one, such as at least two, three, four, five, six or all, of substituted or unsubstituted aromatic hydrocarbons, straight or branched chain aliphatic hydrocarbons, (sulfoxide), amides, ethers, esters, ketones, nitriles, carboxylic acids, water, amines, ionic liquids, and supercritical carbon dioxide containing 1 to 24 carbons. In some preferred embodiments of the present invention, the solvent is selected from at least one of dimethyl sulfoxide, dimethyl sulfone, benzyl sulfoxide, benzyl sulfone, cyclobutane sulfoxide, sulfolane, trichlorosilane, dichloromethane, dichloroethane, chloroform, carbon tetrachloride, benzene, toluene, xylene, trimethylbenzene, tetramethylbenzene, acetonitrile, ethylbenzene, diethylbenzene, chlorobenzene, dichlorobenzene, anisole, nitrobenzene, heptane, hexane, petroleum ether, dioxane, tetrahydrofuran, methyl tert-butyl ether, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, triethylene glycol dimethyl ether, propylene glycol methyl ether acetate, triethylamine, tributylamine, dimethyl isopropylamine, pyridine, N-tetramethyl ethylene diamine, N-alkyl morpholine, N-alkyl pyrrole, N-dimethyl formamide, formyl morpholine, N-diethyl formamide and N-methyl pyrrolidone, such as at least one, two, three, five, eight, ten, or all.
In the present invention, the reaction can also be carried out by heating and/or grinding the raw material solid phase, and/or by means of ultrasound and/or microwave irradiation, with little or no conventional "solvent" being used.
In some embodiments of the invention, the temperature is from-70 ℃ to 300 ℃. In a preferred embodiment of the invention, the temperature is from-30 ℃ to 250 ℃. In some more preferred embodiments of the invention, the temperature is from-20 ℃ to 200 ℃. In some embodiments of the invention, the temperature is 80 ℃. In other embodiments of the present invention, the temperature is 100 ℃. In yet another embodiment of the present invention, the temperature is 0 ℃.
In some embodiments of the invention, the pressure is from 0.001atm to 200 atm. In some preferred embodiments of the invention, the pressure is from 0.1atm to 100 atm. In some more preferred embodiments of the invention, the pressure is from o.oatm to 20 atm. In some embodiments of the invention, the pressure is 1 atm.
In the present invention, the additive means a reaction promoter, a synergist, a catalyst, an oxidant, a reductant and/or a functional assistant.
In some embodiments of the invention, the additive is a Lewis acid or Lewis base type (L ewisacids/bases) element or compound,
in some embodiments of the invention, the additive is an organic (tertiary) amine, fluoride, chloride, bromide, iodide, oxide, hydroxide, sulfide, or alkoxide of an alkali metal, alkaline earth metal, main group metal, or transition metal.
In some embodiments of the invention, the additive is an alkyl or aryl metal compound.
In some embodiments of the invention, the additive is a carbonate, bicarbonate, sulfite, bisulfate, sulfonate, or carboxylate of an alkali metal, alkaline earth metal, main group metal, or transition metal.
In some embodiments of the invention, the additive is a complex of a mono-or polyvalent organic phosphorus of an alkali metal, alkaline earth metal or transition metal, an organic amine, a hydroxyl group, a ketocarbonyl group, an ester carbonyl group or a carboxylic acid ligand.
In some embodiments of the invention, the additive is a tetraalkylammonium halide, a tetraalkylammonium hydroxide, or an Ionic liquid (Ionic L iquids).
In some embodiments of the invention, the additive is an inorganic protic acid, an organic carboxylic acid, an organic sulfonic acid, a heteropolyacid, a molecular sieve, a zeolite, diatomaceous earth, montmorillonite or kaolin.
In some embodiments of the invention, the additive is a fluoride, chloride, bromide, iodide, oxide, hydroxide, sulfide, or alkoxide of the boron or phosphorus element.
In other embodiments of the present invention, the additive is a mixture of any two or more of the above compounds or a combination thereof.
In some embodiments of the present invention, the additive is used in a catalytic amount equivalent or in an excess amount, based on the molar amount of the starting materials.
In some embodiments of the invention, the RM compound structure is selected from any one of:
in the present invention, the base, or halogen and/or hypochlorite M (ClO)nThe molar ratio of the isophthalamide to the isophthalamide is independently (1-1000)/1. In some preferred embodiments of the present invention, the molar ratios are each independently (1-100)/1.
In some embodiments of the invention, the base is a hydroxide of an alkali metal and an alkaline earth metal. In some preferred embodiments of the present invention, the base is at least one of sodium hydroxide, potassium hydroxide, calcium hydroxide, magnesium hydroxide, ammonium hydroxide, and aluminum hydroxide.
In some embodiments of the invention, the halogen is chlorine or bromine.
In some embodiments of the invention, the hypohalite is at least one of sodium hypochlorite, sodium hypobromite, calcium hypochlorite, calcium hypobromite, potassium hypochlorite, potassium hypobromite, lithium hypochlorite, lithium hypobromite, magnesium hypochlorite, and magnesium hypobromite.
The invention is detailed as follows:
as shown in the reaction formula (I), isophthalamide directly generates m-phenylenediamine through Hofmann Rearrangement (Hofmann Rearrangement) under proper reaction conditions; the process technology is simple, efficient, mild and environment-friendly, and has low cost and economic competitiveness.
Here the conditions comprise three elements, one being a base and the other being a halogen or of the formula M (ClO)nThe hypohalite of (a) or a combination of both, which is a combination of any one or any two or more of solvent, temperature, pressure, and/or additives; "base" means a basic metal hydroxide, metal carbonate, metal (ene) carboxylate, metal oxide, metal sulfide, metal halide, metal alkoxide, metal alkylaminate, metal mercaptide, ammonium hydroxide, ammonia, tertiary organic amine, secondary organic amine, primary organic amine; m is a metal cation with a valence of n, and n is an integer between 1 and 6.
Preferred bases are hydroxides of alkali metals and alkaline earth metals, more preferred bases are sodium hydroxide, potassium hydroxide, calcium hydroxide, magnesium hydroxide, ammonium hydroxide, aluminum hydroxide; preferred halogens are chlorine or bromine; preferred hypohalites are sodium hypochlorite, sodium hypobromite, calcium hypochlorite, calcium hypobromite, potassium hypochlorite, potassium hypobromite, lithium hypochlorite, lithium hypobromite, magnesium hypochlorite, magnesium hypobromite.
The reaction solvent is selected from substituted or unsubstituted aromatic hydrocarbon containing 1-24 carbon atoms, straight-chain or branched-chain aliphatic hydrocarbon, (sulfoxide), amide, ether, ester, ketone, nitrile, carboxylic acid, water, amine, ionic liquid, supercritical carbon dioxide, or a mixed solvent consisting of any two or more of the above solvents; preferred solvents are dimethyl sulfoxide, dimethyl sulfone, benzyl sulfoxide, benzyl sulfone, cyclobutane sulfoxide, sulfolane, trichlorosilane, dichloromethane, dichloroethane, chloroform, carbon tetrachloride, benzene, toluene, xylene, trimethylbenzene, tetramethylbenzene, acetonitrile, ethylbenzene, diethylbenzene, chlorobenzene, dichlorobenzene, anisole, nitrobenzene, heptane, hexane, petroleum ether, dioxane, tetrahydrofuran, methyl tert-butyl ether, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, triethylene glycol dimethyl ether, propylene glycol methyl ether acetate, triethylamine, tributylamine, dimethyl isopropylamine, pyridine, N, N-tetramethylethylenediamine, N-alkylmorpholine, N-alkylpyrrole, N, N-dimethylformamide, formylmorpholine, N, N-diethylformamide, N-methylpyrrolidone, or a mixture of any two or more of these solvents. The reaction can also be carried out with little or no conventional "solvent" and with solid phase heating and/or grinding of the starting materials and/or with promotion by ultrasound and/or microwave irradiation.
The reaction temperature involved in the process is selected from-70 ℃ to 300 ℃, preferably from-30 ℃ to 250 ℃, and more preferably from-20 ℃ to 200 ℃.
The "pressure" of the reaction involved in the process is selected from between 0.001 and 200atm, preferably from between 0.1 and 100atm, more preferably from between 0.1 and 20 atm.
The reaction "additives" referred to in the present process encompass reaction promoters, synergists, catalysts, oxidants, reductants, and/or functional auxiliaries which are lewis acid or lewis base type (L ewis acids/bases) simple substances or compounds, preferably organic (tertiary) amine, alkali metal, alkaline earth metal, main group metal, or transition metal fluorides, chlorides, bromides, iodides, oxides, hydroxides, sulfides, alkoxides, alkyl or aryl metal compounds, or alkali metal, alkaline earth metal, main group metal, or transition metal carbonates, bicarbonates, sulfites, bisulfates, sulfonates, or carboxylates, or alkali metal, alkaline earth metal, or transition metal mono-or polyvalent organophosphates, organic amines, hydroxyl groups, ketocarbonyl, ester carbonyl, or carboxylic acid ligands complexes, or tetraalkylammonium halides, tetraalkylammonium hydroxides, or liquid (Ionic L ids), or inorganic substances in acid, organic carboxylic acid, organic sulfonic acid, heteropolyacid, molecular sieve, zeolite, diatomaceous earth, bentonite, boron, silicon bromide, silicon, phosphorus, oxide, silicon, alkali metal, alkali.
Given that isophthalamide precursors are known to be readily prepared via inexpensive, readily available industrial Raw Materials (Raw Materials) described by structural formula RM in literature methods known to the skilled artisan [ for example: ester as starting material, jpn. kokai Tokkyo Koho, 07330700, 1995; acid is used as a raw material, as disclosed in the patent application 105016940; acyl chloride is used as a raw material, Journal of Applied Polvmer Science, 2012, 124(2), 1707-; nitrile as a raw material, Dalton Transactions, 2016, 45(34), 13590; the invention discloses a novel process technology described by a reaction general formula (II) by using aldehyde as a raw material, RSC Advances, 2013, 3(17), 5889-5894. the invention substantially simultaneously discloses that RM is firstly converted into a isophthalamide intermediate under conditions d, and the isophthalamide is then converted into m-phenylenediamine under conditions b through Hofmann rearrangement. The above steps may be performed in a batch distributed operation on the process flow; it is also possible, preferably, to carry out continuously in a "one-pot" manner:
wherein the substituents at the X and Y positions in the structure RM are each independently of the other CO2H,C(O)OR,CHO,CN,C(O)Hal,C(OR)3,C(Hal)3,C(OC(O)R)3(ii) a Where R is a linear or branched alkyl group having 1 to 24 carbon atoms or a substituted or unsubstituted aromatic group having 6 to 24 carbon atoms, and Ha1 is a halogen atom of fluorine, chlorine, bromine or iodine.
conditions a contain two elements, one of which is NH3And the other is the combined application of any one or any two or more of solvent, temperature, pressure, and/or additive. The definitions of solvent, temperature, pressure, and/or additives herein are the same as before.
conditions b are defined the same as the previous conditions.
In practice, some exemplary, but non-limiting structures of RM compounds are as follows:
in the examples we will further illustrate.
[ detailed description ] embodiments
The first embodiment is as follows: synthesis of m-phenylenediamine
Under the protection of nitrogen, 51.5 g of potassium hydroxide is placed in 350 ml of water and cooled to zero degree in an ice-water bath, 14.2 g of isophthalamide is added, 250 ml of 5.5% sodium hypochlorite solution prepared in advance is added in about 45 minutes under high-efficiency stirring, the reaction system is gradually heated to about 80 ℃ and is continuously heated for 1-2 hours, the thin-layer chromatography T L C method is used for tracking and monitoring the reaction process, the system is cooled to room temperature after the reaction is finished, the pH of the system is adjusted to near neutrality by using dilute hydrochloric acid under a good ventilation state, most of water is removed under reduced pressure, residues are extracted by using ethanol, crude products are concentrated by using ethanol, and the crude products are subjected to high-vacuum reduced-pressure distillation to obtain 7.1 g of m-phenylenediamine pure product.
Example two: synthesis of m-phenylenediamine
The intermediate isophthalamide was prepared from isophthalic acid and ammonia according to literature procedures.
Under the protection of nitrogen, 28 g of sodium hydroxide is placed in 35 ml of water, 20 g of chlorine is slowly introduced to prepare a fresh sodium hypochlorite solution in situ, 200 ml of water is added to adjust the concentration of a system for later use, 50 ml of the sodium hypochlorite reagent solution and 250 ml of water are mixed and then cooled in an ice water bath, 49 g of isophthalamide and 175 ml of 1% sodium hydroxide are added under rapid stirring, the reaction system is heated and reacted in a boiling hot water bath, the reaction process is tracked and monitored by a thin-layer chromatography T L C method, the system is cooled to room temperature after the reaction is finished, the pH of the system is adjusted to be nearly neutral by dilute hydrochloric acid under a good ventilation state, most of water is removed under reduced pressure, residues are extracted by ethanol, and a crude product after organic phase is concentrated is distilled under high vacuum and reduced pressure to obtain 2.4 g of an off-white m-.
Example three: synthesis of m-phenylenediamine
The intermediate isophthalamide was prepared from the reaction of methyl isophthalate and ammonia according to literature procedures. Referring to the example procedure, Hofmann rearrangement was performed from 6.4 g of isophthalamide to give 3 g of m-phenylenediamine.
Example four: synthesis of m-phenylenediamine
Referring to the procedure of example two, a Hofmann degradation reaction was performed at a molar ratio of isophthalamide/sodium hydroxide/chlorine of 1/24/10 to obtain 3.6 g of m-phenylenediamine from 7.8 g of isophthalamide by Hofmann rearrangement.
Example five: synthesis of m-phenylenediamine
Under the protection of nitrogen, 2.2 g of dry ammonia gas is slowly introduced into 19.4 g of m-trichlorotoluene to absorb hydrochloric acid gas discharged by the reaction, and the acid liquid and the reaction liquid are mixed and hydrolyzed to prepare 9.1 g of intermediate isophthalamide. Referring to the example procedure, the intermediate was subjected to Hofmann rearrangement to give 4.1 g of m-phenylenediamine.
Example six: synthesis of m-phenylenediamine
Under the protection of nitrogen, 6.4 g of isophthaloyl dichloride is added into a three-necked bottle provided with a constant-pressure dropping funnel, 13.2 g of ice-cold ammonia water is added dropwise under the cooling of ice water, and a reaction system is efficiently stirred and reacts overnight to obtain 4.8 g of isophthaloyl diamide. And adding 30 g of sodium hydroxide and 300 ml of deionized water into another three-necked flask with a stirrer, cooling to 0 ℃ by using ice water after stirring and dissolving, adding 16.8 g of bromine under stirring, continuing stirring for half an hour after the addition is finished, and adding 4.2 g of isophthalamide in batches for multiple times. After the addition, the temperature is raised, and the reaction is carried out for 3 hours at about 90 ℃. After the reaction is finished, a step-by-step reduced pressure distillation device is changed, and 2.4 g of m-phenylenediamine product is obtained by distillation.
It should be emphasized that the above-described embodiments are merely illustrative and not restrictive, and that any adjustments or variations, such as reaction conditions or parameters, which may be commonly employed by a person skilled in the art based on the disclosure of this application do not depart from the gist of the present invention, and the scope of protection of this patent shall be governed by the terms of the relevant claims.
Claims (15)
1. The preparation method of m-phenylenediamine is characterized in that as shown in a reaction formula (I), m-phenylenediamine is subjected to Hofmann rearrangement reaction under the conditions of reaction conditions to directly generate m-phenylenediamine:
the conditions comprise three elements, wherein the first element is alkali, the second element is halogen and/or the molecular formula is M (ClO)nThe third element is at least one of a solvent, temperature, pressure, and an additive.
2. The method according to claim 1, wherein the base is selected from at least one of basic metal hydroxides, metal carbonates, metal (ene) carboxylates, metal oxides, metal sulfides, metal halides, metal alkoxides, metal alkylamines, metal mercaptides, ammonium hydroxide, ammonia, tertiary organic amines, secondary organic amines, and primary organic amines; m is an n-valent metal cation, and n is 1 to 6.
3. The method of claim 1, wherein the isophthalamide is obtained by converting a meta-substituted aromatic compound having the structure RM under conditions a, as shown in formula (II):
wherein X and Y are each independently CO2H、C(O)OR、CHO、CN、C(O)Hal、C(OR)3、C(Hal)3Or C (OC (O) R)3(ii) a R is a linear or branched alkyl group having 1 to 24 carbon atoms, or a substituted or unsubstituted aromatic group having 6 to 24 carbon atoms; hal is the halogen atom fluorine, chlorine, bromine or iodine; conditions a comprise two elements, the first element being NH3The second element is the same as the third element of the conditions.
4. The production method according to any one of claims 1 to 3, wherein the solvent is at least one selected from the group consisting of substituted or unsubstituted aromatic hydrocarbons having 1 to 24 carbons, linear or branched aliphatic hydrocarbons, (sulfoxide), amides, ethers, esters, ketones, nitriles, carboxylic acids, water, amines, ionic liquids, and supercritical carbon dioxide.
5. The method according to claim 4, wherein the solvent is selected from the group consisting of dimethyl sulfoxide, dimethyl sulfone, benzyl sulfoxide, benzyl sulfone, cyclobutane sulfoxide, sulfolane, trichlorosilane, dichloromethane, dichloroethane, chloroform, carbon tetrachloride, benzene, toluene, xylene, trimethylbenzene, tetramethylbenzene, acetonitrile, ethylbenzene, diethylbenzene, chlorobenzene, dichlorobenzene, anisole, nitrobenzene, heptane, hexane, petroleum ether, dioxane, tetrahydrofuran, methyl tert-butyl ether, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, triethylene glycol dimethyl ether, propylene glycol methyl ether acetate, triethylamine, tributylamine, dimethyl isopropylamine, pyridine, N-tetramethylethylenediamine, N-alkylmorpholine, N-alkylpyrrole, N-dimethylformamide, formylmorpholine, N-diethylformamide and N-methylpyrrolidone.
6. The method of any one of claims 1 to 3, wherein the temperature is from-70 ℃ to 300 ℃.
7. The production method according to any one of claims 1 to 3, wherein the pressure is from 0.001atm to 200 atm.
8. The method of any one of claims 1-3, wherein the additive is a reaction promoter, a synergist, a catalyst, an oxidant, a reductant and/or a functional promoter, and is an element or compound of Lewis acid or Lewis base type (L ewisacids/bases).
9. The method of claim 8, wherein the additive is a fluoride, chloride, bromide, iodide, oxide, hydroxide, sulfide or alkoxide of an organic (tertiary) amine, an alkali metal, a main group metal or a transition metal;
alternatively, the additive is an alkyl or aryl metal compound;
alternatively, the additive is an alkali, alkaline earth, main group or transition metal carbonate, bicarbonate, sulfite, bisulfate, sulfonate or carboxylate;
or, the additive is a complex of an alkali metal, alkaline earth metal, or transition metal mono-or polyvalent organophosphorus, organic amine, hydroxyl, ketocarbonyl, ester carbonyl, or carboxylic acid ligand;
alternatively, the additive is a tetraalkylammonium halide, a tetraalkylammonium hydroxide, or an Ionic liquid (Ionic L iquids);
or the additive is inorganic protonic acid, organic carboxylic acid, organic sulfonic acid, heteropoly acid, molecular sieve, zeolite, diatomite, montmorillonite or kaolin;
alternatively, the additive is a fluoride, chloride, bromide, iodide, oxide, hydroxide, sulfide or alkoxide of the boron or phosphorus element.
10. The method of claim 9, wherein the additive is a mixture of any two or more of the above compounds or a combination thereof.
11. The method of claim 10, wherein the additive is used in a catalytic equivalent or an excess equivalent based on the molar amount of the reaction raw materials.
13. process according to any one of claims 1 to 3, characterized in that the base, halogen and/or hypochlorite M (ClO)nThe molar ratio of the isophthalamide to the isophthalamide is independently (1-1000)/1, and preferably, the molar ratio is independently (1-100)/1.
14. The production method according to claim 13, characterized in that the base is a hydroxide of an alkali metal and an alkaline earth metal; the halogen is chlorine or bromine; the hypohalite is at least one of sodium hypochlorite, sodium hypobromite, calcium hypochlorite, calcium hypobromite, potassium hypochlorite, potassium hypobromite, lithium hypochlorite, lithium hypobromite, magnesium hypochlorite and magnesium hypobromite.
15. The method of claim 14, wherein the base is at least one of sodium hydroxide, potassium hydroxide, calcium hydroxide, magnesium hydroxide, ammonium hydroxide, and aluminum hydroxide.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010217040.7A CN111440074A (en) | 2020-03-24 | 2020-03-24 | Hofmann rearrangement method for preparing m-phenylenediamine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010217040.7A CN111440074A (en) | 2020-03-24 | 2020-03-24 | Hofmann rearrangement method for preparing m-phenylenediamine |
Publications (1)
Publication Number | Publication Date |
---|---|
CN111440074A true CN111440074A (en) | 2020-07-24 |
Family
ID=71648731
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202010217040.7A Pending CN111440074A (en) | 2020-03-24 | 2020-03-24 | Hofmann rearrangement method for preparing m-phenylenediamine |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN111440074A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112174828A (en) * | 2020-10-29 | 2021-01-05 | 山东兴强化工产业技术研究院有限公司 | Method for preparing m-phenylenediamine |
CN112279773A (en) * | 2020-10-29 | 2021-01-29 | 山东兴强化工产业技术研究院有限公司 | Synthesis method of high-quality m-phenylenediamine |
CN112300009A (en) * | 2020-10-29 | 2021-02-02 | 山东兴强化工产业技术研究院有限公司 | Preparation method of m-phenylenediamine |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1364229A (en) * | 1972-04-01 | 1974-08-21 | Akzo Nv | Process for the preparation of m- and p-phenylenediamine from iso phthalic acid diamide |
JPH07330700A (en) * | 1994-06-08 | 1995-12-19 | Mitsubishi Gas Chem Co Inc | Production of aromatic dicarboxylic acid diamide |
JP2003335743A (en) * | 2002-05-16 | 2003-11-28 | Nippon Shokubai Co Ltd | Amide compound |
CN111100012A (en) * | 2019-12-16 | 2020-05-05 | 上海交通大学 | Method for preparing m-phenylenediamine |
-
2020
- 2020-03-24 CN CN202010217040.7A patent/CN111440074A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1364229A (en) * | 1972-04-01 | 1974-08-21 | Akzo Nv | Process for the preparation of m- and p-phenylenediamine from iso phthalic acid diamide |
JPH07330700A (en) * | 1994-06-08 | 1995-12-19 | Mitsubishi Gas Chem Co Inc | Production of aromatic dicarboxylic acid diamide |
JP2003335743A (en) * | 2002-05-16 | 2003-11-28 | Nippon Shokubai Co Ltd | Amide compound |
CN111100012A (en) * | 2019-12-16 | 2020-05-05 | 上海交通大学 | Method for preparing m-phenylenediamine |
Non-Patent Citations (2)
Title |
---|
MOUSA GHAEMY ET AL.: ""Synthesis of high performance polyamides utilizing copper-catalyzed amidation of a dibromoarene with different diamides"", 《JOURNAL OF APPLIED POLYMER SCIENCE》 * |
TAMARA A.VAGANOVA ET AL.: ""Selective one-pot synthesis of aminopolyhalobenzonitriles from polyhalobenzotrichlorides in anhydrous ammonia"", 《JOURNAL OF FLUORINE CHEMISTRY》 * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112174828A (en) * | 2020-10-29 | 2021-01-05 | 山东兴强化工产业技术研究院有限公司 | Method for preparing m-phenylenediamine |
CN112279773A (en) * | 2020-10-29 | 2021-01-29 | 山东兴强化工产业技术研究院有限公司 | Synthesis method of high-quality m-phenylenediamine |
CN112300009A (en) * | 2020-10-29 | 2021-02-02 | 山东兴强化工产业技术研究院有限公司 | Preparation method of m-phenylenediamine |
CN112174828B (en) * | 2020-10-29 | 2022-01-07 | 山东兴强化工产业技术研究院有限公司 | Method for preparing m-phenylenediamine |
WO2022088303A1 (en) * | 2020-10-29 | 2022-05-05 | 山东兴强化工产业技术研究院有限公司 | Method for preparing m-phenylenediamine |
WO2022088301A1 (en) * | 2020-10-29 | 2022-05-05 | 山东兴强化工产业技术研究院有限公司 | Method for synthesizing m-phenylenediamine |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN111440074A (en) | Hofmann rearrangement method for preparing m-phenylenediamine | |
EP0012201B2 (en) | Coupling of aryl and heteroaryl monochlorides | |
US4326989A (en) | Catalyst of nickel compound and ligand in presence of a reducing metal | |
JPS6191151A (en) | Manufacture of aromatic carbonyl compound | |
JP5259161B2 (en) | Process for the catalytic production of aromatic or heteroaromatic nitriles | |
WO2023035876A1 (en) | Preparation method for perfluoroolefin oligomer and application thereof | |
CN104370685A (en) | Green synthesis method of tetramethyl biphenyl isomer compounds | |
US3255240A (en) | Process for preparing beta-hydroxy-alkane-alpha-sulfonic anhydrides and hydrolysis products thereof | |
US4211721A (en) | Process for the preparation of aromatic nitriles | |
JP2008543960A (en) | Process for producing arylamine, arylether and arylthioether | |
JP2022531671A (en) | Method for Producing PerfluoroCyclobutane-Containing Monomer | |
US6566571B1 (en) | Method of producing biaryls | |
CN113387812A (en) | Process for preparing (hetero) aromatic polyamines | |
CN112851466B (en) | Method for catalyzing hexafluoropropylene oligomerization reaction by fluorine-containing negative ion room temperature ionic liquid | |
JP2004503379A (en) | Compositions and compounds based on acidic salts having a metal and a sulfonyl group bonded to a perhalogenated carbon, and their use as Lewis acids | |
EP3394027B1 (en) | Method for preparing phenolics using a catalyst | |
CN113563199A (en) | Preparation of m-phenylenediamine and p-phenylenediamine by benzoyl hydrazine rearrangement method | |
CN111995502B (en) | Method for synthesizing perfluorobutyl methyl ether | |
CN111717901B (en) | Method for preparing bis (fluorosulfonyl) imide by using anhydride-water system | |
WO2020090989A1 (en) | Production method for fluorinated aromatic secondary or tertiary amine compound | |
CN111943838A (en) | Preparation method of 2,4, 6-trimethylbenzoyl chloride and acyl chloride co-production technology | |
CN111032661A (en) | Novel cycloadduct precursors of dihalodiphenylsulfones and their preparation | |
CN105237334A (en) | Method for combined production of 1,1,2-trifluorotrichloroethane and 1,1,1-trifluorodichloroethane | |
CN110396037B (en) | Method for preparing octafluoro-2-butene | |
Gard et al. | (Pentafluoro-. lambda. 6-sulfanyl) difluoromethanesulfonyl fluoride and derivatives |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20200724 |