CN111420779A - Crystal material crushing and cleaning pretreatment device and cleaning pretreatment method - Google Patents

Crystal material crushing and cleaning pretreatment device and cleaning pretreatment method Download PDF

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Publication number
CN111420779A
CN111420779A CN202010210868.XA CN202010210868A CN111420779A CN 111420779 A CN111420779 A CN 111420779A CN 202010210868 A CN202010210868 A CN 202010210868A CN 111420779 A CN111420779 A CN 111420779A
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replacement
stepping
crushing
heating
chamber
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CN111420779B (en
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杜茂松
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Zigong Jiayuan Furnace Co ltd
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Zigong Jiayuan Furnace Co ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B02CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
    • B02CCRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
    • B02C19/00Other disintegrating devices or methods
    • B02C19/18Use of auxiliary physical effects, e.g. ultrasonics, irradiation, for disintegrating
    • B02C19/186Use of cold or heat for disintegrating

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  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Food Science & Technology (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

The invention provides a clean pretreatment device and a clean pretreatment method for crystal material crushing, which belong to the field of crystal material crushing and are used for heating and water-cooling treatment of materials under a high-cleanness condition, wherein the device comprises an atmosphere replacement part, a heating part and a cold explosion part; the atmosphere replacement part is arranged at the inlet end of the heating part material; the heating part comprises an inlet end and an outlet end; the atmosphere replacement part is arranged at the inlet end of the heating part and used for sucking and removing air adsorbed on the surface of the material and air entering from the channel during feeding and replacing the air with inert gas. The heating part is isolated from the communication with the atmosphere, and air is prevented from entering the heating part. And adjusting the atmosphere of the heating part; the cold explosion part is arranged at the outlet end of the heating part, and the heated crystal material is cooled by water under a controllable atmosphere. The device is used for adjusting the atmosphere in a high-temperature area to be in a less oxygen-free state. The crystal material is isolated from the air at high temperature and is placed under the protection of controllable atmosphere, so as to realize continuous heating process and large-scale industrial production.

Description

Crystal material crushing and cleaning pretreatment device and cleaning pretreatment method
Technical Field
The invention relates to the field of crystal material cold explosion crushing pretreatment, in particular to a crystal material crushing clean pretreatment device and a crystal material clean pretreatment method.
Background
In the photovoltaic and electronic industries, a large amount of silicon crystal materials are used. Such as monocrystalline silicon or polycrystalline silicon, are mostly massive blocks or cylindrical bodies with large volumes due to the production process. The large-size crystal material needs to be crushed into blocks with certain volume in the subsequent processing, and the finished product can be further processed after sorting. Monocrystalline silicon or polycrystalline silicon of photovoltaic production enterprises are mainly processed by adopting a traditional hammering mode in lump material crushing. In the process of using metal hammering crushing equipment and hammering, hammer body materials are easily mixed into silicon materials, so that the silicon materials are polluted. Meanwhile, the randomness of the action points on the silicon material is larger during hammering, so that the particle size distribution of the crushed silicon material is large, more fine materials are available, and the loss is large. In recent years, a 'cold explosion cracking' method is provided, wherein a silicon material is heated in a natural atmosphere furnace and then is put into water for quenching, namely, the material generates stress through rapid heating and then rapid water cooling, a large number of spontaneous cracks are formed in the silicon material, and a small external force is applied to achieve the purpose of natural cracking. However, in the high-temperature heating process, elemental ions released by a hearth, a carrier and a moving machine in the furnace at high temperature pollute the silicon material, and meanwhile, a series of problems such as high-temperature oxidation and continuous production operation of the silicon material troubles the water explosion treatment mode, so that the cold explosion fragmentation mode cannot realize industrialization.
Disclosure of Invention
The invention provides a crystal material crushing and cleaning pretreatment device and a crystal material cleaning pretreatment method, and aims to solve the problems of the crystal material crushing device and the crystal material cleaning pretreatment method in the prior art.
The invention is realized by the following steps:
a crystal material crushing and cleaning pretreatment device is used for crystal material heating, quenching and crushing pretreatment and comprises an atmosphere replacement part, a heating part and a cold explosion part;
the atmosphere replacement part is provided with a feed inlet for material to enter;
the heating part comprises an inlet end and an outlet end; the atmosphere replacement part is arranged at the inlet end of the heating part and used for sucking and removing air adsorbed on the surface of the material and air entering from the channel during feeding and replacing the air with inert gas. The heating part is isolated from the communication with the atmosphere, and air is prevented from entering the heating part.
In one embodiment of the invention, the atmosphere replacement section comprises an isolatable replacement chamber and a front chamber;
the feed inlet is arranged on the front side surface of the replacement chamber, one port of the front chamber is communicated with the replacement chamber, and the other port of the front chamber is communicated with the heating part;
the feeding door can be opened and closed and is arranged at the feeding port;
the replacement chamber is connected with the vacuum system and the replacement gas supply pipeline.
In an embodiment of the present invention, the front chamber is disposed above the replacement chamber, and a lifting material table is disposed at the bottom of the replacement chamber, and the lifting material table has a low position state at the same height as the feeding gate and a high position state at the same height as the heating part.
In one embodiment of the invention, a furnace feeding mechanism for pushing the material into the heating part is further arranged in the front chamber;
the furnace feeding mechanism pushes materials towards the lifting material platform in the high position state.
In one embodiment of the present invention, the heating part includes a stepping assembly for horizontally conveying the material;
the stepping assembly comprises a stepping frame, a stepping lifting mechanism and a horizontal displacement mechanism;
the stepping lifting mechanism is arranged at the lower part of the stepping frame;
the horizontal displacement mechanism is connected with the stepping frame and drives the stepping frame to reciprocate in the heating part in each stepping cycle.
In an embodiment of the present invention, a first horizontal sliding part is disposed on one surface of the stepping frame close to the stepping lifting mechanism, and a second horizontal sliding part engaged with the first horizontal sliding part is disposed on the stepping lifting mechanism;
the first horizontal sliding piece is matched with the second horizontal sliding piece to guide the stepping frame to perform reciprocating displacement along a connecting line of the inlet end and the outlet end.
In one embodiment of the invention, the horizontal displacement mechanism comprises a horizontal telescopic member and a hinged rod;
the horizontal extensible member has the end that can the level is flexible, the end with the articulated setting of one end of articulated arm, the other end of articulated arm with one side of step-by-step frame is articulated.
In one embodiment of the invention, the cold explosion part comprises a dumping mechanism and a cold explosion liquid tank;
the dumping mechanism comprises a pushing head and a rotatable dumping platform;
the outlet end of the heating part is provided with a discharge hole;
the dumping mechanism is arranged at one end of the discharge port, which is far away from the heating part, and the pushing head and the dumping platform are respectively arranged at two sides of the discharge port; the pushing head is arranged towards the dumping table;
the cold explosion liquid tank is arranged below the pouring table.
In an embodiment of the present invention, the pushing head is fixedly connected to a rear door, and the rear door is used for shielding and sealing the discharge hole.
In an embodiment of the invention, the heating part includes a heating furnace body, the stepping assembly is arranged inside the heating furnace body, a working opening for the stepping frame to enter is further arranged below the heating furnace body, and a water sealing mechanism is arranged at the working opening.
In an embodiment of the invention, a lifting machine is further arranged in the cold explosion liquid tank, one end of the lifting machine extends into the bottom of the cold explosion liquid tank, and the other end of the lifting machine extends out of the cold explosion liquid tank.
In one embodiment of the invention, the device further comprises a tray for carrying materials;
for surface structured materials, the tray can be eliminated.
A material tray recovery assembly for material tray circulation is further arranged between the cold explosion part and the feeding hole of the atmosphere replacement part, and the material tray recovery assembly comprises a material tray returning device and a material tray water sealing device for sealing the material tray outlet;
the material tray returning device conveys the material tray from the cold explosion part to the feeding hole of the atmosphere replacement part;
the charging tray water sealing device is arranged on one side of the charging tray returning device, which is close to the atmosphere replacement part.
In one embodiment of the invention, the tray water sealing device comprises a water tank body and a lifting conveyor belt,
the water tank body is arranged at one end of the material tray returning device, which is far away from the cold explosion part;
the feeding port is provided with a turnover table, one end of the lifting conveyor belt is arranged at the bottom of the water tank body, and the other end of the lifting conveyor belt is arranged on the turnover table.
In one embodiment of the invention, the tray is provided with a stop side surface and an inclined bottom surface;
an acute material positioning angle is formed between the stop side surface and the inclined bottom surface.
A crystal material clean pretreatment method is characterized in that the crystal material crushing clean pretreatment device comprises the following steps:
when the lifting material platform is in a low position state, the material is conveyed into the replacement bin from the feed inlet, and the feed inlet is closed;
isolating the replacement chamber and the front chamber;
vacuumizing the replacement bin to a preset vacuum degree through the vacuum system;
introducing replacement gas into the replacement chamber through the replacement gas pipeline until the gas pressure of the replacement chamber is balanced with that of the front chamber;
the lifting material platform enters a high-position state, the replacement bin and the front bin are communicated, and materials are conveyed into the front bin from the replacement bin;
pushing the material from the front chamber into the heating part for heating;
and the material is pushed out from the heating part and is water-cooled in the cold explosion part. .
And discharging the materials from the cold explosion liquid tank by a lifter to enter a crushing process.
And the material tray returns from the cold explosion part to enter the next working cycle.
The invention has the beneficial effects that: according to the crystal material cold explosion crushing clean pretreatment device and the crystal material clean pretreatment method, air entering in the feeding process is extracted through the atmosphere replacement part and replaced by inert gas, so that the crystal material is isolated from the air at a high temperature and is placed under a controllable atmosphere, and oxidation is avoided. And the continuous heating process can be realized through the stepping assembly arranged in the heating furnace body, and large-scale industrial production can be carried out. The stepping mode ensures that no metal transmission component is arranged in the high-temperature area of the system, avoids the pollution of metal ions released by the metal component at high temperature in the traditional conveying mode on the heating crystal material, and realizes the clean heating of PPM-level crystal material by configuring high-purity non-metal furnace lining material. The cold explosion part is butted with the heating furnace mouth, and the cold explosion liquid tank has water sealing function, so that the air tightness is ensured, the heated crystal material is not contacted with air before entering water, and the non-oxidation quick water cooling is realized. The material tray automatically returns to enter the next working period, the automation degree of the whole process is high, and the material tray can automatically and circularly run. And the crystal material after the pretreatment in the cold explosion liquid tank is directly lifted to the next station by the lifter for crushing, thereby realizing the clean crushing pretreatment of the crystal material. For the material with regular surface, the device does not need to use a material tray, and the crystal material is directly fed from the feed inlet, so that the heating and quenching pretreatment is realized.
The high-value high-quality material (with the grain diameter of 6-50mm) obtained from the silicon crystal material after the pretreatment and the crushing accounts for more than 97 percent, the secondary raw material with the grain diameter less than or equal to 3mm accounts for only 1 percent, the proportion of the high-quality material is improved by more than 10 percent compared with the traditional direct hammering mode, and the method has very obvious economic benefit. And the total metal intake on the surface of the processed silicon crystal material is less than or equal to 5PPbw, the impurity requirements of GB/T12963-2014 electronic grade polysilicon on 8 metals (Fe, Cr, Ni, Cu, Zn, Al, K and Na) are completely met, and the method is lower than the traditional direct hammering mode.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are required to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.
FIG. 1 is a schematic diagram of an internal structure of a first view angle of a crystal material crushing and cleaning pretreatment device provided by an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a second view angle of a crystal material crushing and cleaning pretreatment device according to an embodiment of the present invention;
FIG. 3 is a schematic structural diagram of a tray provided by an embodiment of the invention;
FIG. 4 is a schematic diagram of the internal structure of an embodiment of the invention providing a third perspective of a heated portion;
FIG. 5 is a schematic structural diagram of a third view of a cold blast portion according to an embodiment of the present invention;
fig. 6 is a schematic structural diagram of a third view angle of the tray recovery assembly according to the embodiment of the invention.
Icon: 010-atmosphere replacement section; 030-a heating portion; 050-cold explosion part; 070-material tray; 071-stop side; 073-inclined bottom surface; 100-a displacement chamber; 200-a front chamber; 031-inlet end; 033-outlet end; 110-a vacuum system; 130-replacement gas supply pipe; 150-lifting the material platform; 170-a feeding mechanism; 210-a furnace feeding mechanism; 310-heating furnace body; 330-inner lining; 350-an electric heating element; 400-a stepping assembly; 410-a stepping frame; 430-step lifting mechanism; 450-horizontal displacement mechanism; 370-water seal mechanism; 371-water seal circulating pipe; 411-a first horizontal slide; 431-a second horizontal slide; 451-horizontal telescoping piece; 453-a hinged lever; 413-frame body; 415-a walking beam; 417-a pad; 500-a dumping mechanism; 600-cold explosion liquid tank; 510-a push head; 530-a dumping table; 810-rear door; 610-a steam processor; 630-circulating water pipe; 650-hoisting machine; 730-tray water seal tank; 711-tray return push rod; 713-return channel; 731-water trough body; 733 — lifting the conveyor; 7311-a circulating feed line; 800-rear chamber; 900-turnover table; 035-correction mechanism.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions of the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings of the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all embodiments of the present invention. All other embodiments, which can be obtained by a person skilled in the art without any inventive step based on the embodiments of the present invention, are within the scope of the present invention. Thus, the following detailed description of the embodiments of the present invention, presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be obtained by a person skilled in the art without any inventive step based on the embodiments of the present invention, are within the scope of the present invention.
In the description of the present invention, it is to be understood that the terms indicating an orientation or positional relationship are based on the orientation or positional relationship shown in the drawings only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, the first feature may be present on or under the second feature in direct contact with the first and second feature, or may be present in the first and second feature not in direct contact but in contact with another feature between them. Also, the first feature being above, on or above the second feature includes the first feature being directly above and obliquely above the second feature, or merely means that the first feature is at a higher level than the second feature. A first feature that underlies, and underlies a second feature includes a first feature that is directly under and obliquely under a second feature, or simply means that the first feature is at a lesser level than the second feature.
Example one
The present embodiment provides a crystal material crushing and cleaning pretreatment device, please refer to fig. 1 and fig. 2, which is used for the crushing pretreatment of crystal materials, especially for the crushing pretreatment of existing silicon crystal materials, and includes an atmosphere replacement part 010, a heating part 030, a cold explosion part 050, and a material tray 070 for carrying materials (the material provided by the present embodiment is carried by the material tray 070, in other embodiments, the material tray 070 may not be used for carrying, but the regular material itself is directly used for the crushing and cleaning pretreatment).
Referring to fig. 3, the tray 070 has a stop side 071 and an inclined bottom 073; an acute material positioning angle is formed between the stop side surface 071 and the inclined bottom surface 073, and materials are loaded in the material tray 070 and are limited at the material positioning angle through the action of gravity to carry out a transmission heating process.
The atmosphere replacement portion 010 is provided with a feed inlet for material to enter, the heating portion 030 includes an inlet end 031 and an outlet end 033, and the atmosphere replacement portion 010 is provided at the inlet end 031 for discharging air brought in when the material enters from the feed inlet and replacing the air with inert gas, so as to ensure that no oxidizing atmosphere exists in the heating portion 030.
The cold explosion part 050 is disposed at an outlet end 033 of the heating part 030 to water-cool the heated material.
Referring to fig. 1 and 2, in the present embodiment, the atmosphere replacement portion 010 has a replacement chamber 100 and a front chamber 200 which can be separated; the feed inlet is arranged on the front side surface of the replacement chamber 100, one port of the front chamber 200 is communicated with the replacement chamber 100, and the other port is communicated with the heating part 030; the feeding door is arranged at the feeding port in an openable and closable manner; the displacement chamber 100 is connected to a vacuum system 110 and a displacement gas supply line 130.
Specifically, the front chamber 200 is disposed above the replacement chamber 100, a passage is disposed between the front chamber 200 and the replacement chamber 100, the passage is used for lifting the material platform 150, and the passage is in a closed state when the material platform 150 is lifted at a high position or a low position. When the elevating platform 150 is located at the lower position, the upper cover plate of the passage integrated with the elevating platform 150 is closed, the front chamber 200 is isolated from the passage of the displacement chamber 100, the feeding gate is closed, the displacement chamber 100 is gas-displaced by the vacuum system 110 and the displacement gas supply pipe 130, and the displacement stops after the pressure balance with the front chamber 200. The elevator platform 150 is raised upward and the front chamber 200 is in communication with the displacement chamber 100.
Isolation of the system from the atmosphere may be achieved by isolatable displacement chamber 100 and front chamber 200. When the elevating platform 150 is at a low position, the upper and lower chamber passage ports are in a closed state, and the airflow passages of the replacement chamber 100 and the front chamber 200 are blocked. After the material is fed into the replacement chamber 100 from the feeding port, the feeding port is closed, the replacement chamber 100 is vacuumized to a preset vacuum degree through the vacuum system 110, then replacement gas is introduced into the replacement chamber 100 through the replacement gas supply pipe 130 until the air pressure of the replacement chamber 100 is balanced with that of the front chamber 200, at this time, the lifting material table 150 is lifted upwards, the upper cover plate of the channel integrated with the lifting material table 150 is opened, the airflow channel of the replacement chamber 100 and the front chamber 200 is communicated, and the lifting material table 150 is lifted to a high position. Material is fed from the displacement chamber 100 into the front chamber 200. The material is placed in a predetermined atmosphere before entering the heating portion 030, in this embodiment, the replacement gas is an inert gas, and in the whole treatment process, the material is placed in an oxygen-free or inert gas-protected state from the feed port, heating to discharging and water feeding. High temperature oxidation of the material is avoided.
The atmosphere replacement unit 010 is provided with an elevating table 150, the elevating table 150 has a low position at the same height as the inlet gate and a high position at the same height as the heating unit 030, and a feeding mechanism 170 is further provided in front of the inlet of the atmosphere replacement unit 010. Specifically, when the lifting material platform 150 is at a low position, and at the moment, the passage ports of the upper bin and the lower bin are in a closed state, the replacement bin 100 sucks air, after the pressure is balanced with the atmosphere, the feeding door is opened, the material tray 070 filled with materials is placed at a position in front of the door, and the feeding mechanism 170 sends the material tray 070 into the replacement bin 100 at the position of the lifting material platform 150 in the low position. After the inlet door is closed, the air in the replacement chamber 100 is extracted and replaced by inert gas, and the pressure of the inert gas is balanced with that of the front chamber 200, the lifting material table 150 moves from the low position state to the high position state, and the material tray 070 is transferred from the replacement chamber 100 to the front chamber 200.
A furnace feeding mechanism 210 for pushing the material into the heating portion 030 is further provided in the front bin 200; the furnace-feeding mechanism 210 faces the elevating material table 150 in the high position state.
Specifically, when the elevating platform 150 reaches the high position, the tray 070 is transferred to the front chamber 200, and the material is pushed into the heating portion 030 through the furnace feeding mechanism 210 at the position located at the inlet end 031.
Referring to fig. 1 and 4, in the present embodiment, the heating part 030 includes a heating furnace body 310, an inner liner 330 formed of a high purity non-metallic material, an electric heating element 350, and a stepping assembly 400 for continuously feeding the material;
heating furnace body 310 provides an installation base, and lining 330 and electric heating element 350 are installed in heating furnace body 310, and lining 330 is composite masonry and thermal insulation material for blocking heat dissipation in heating portion 030. The liner 330 forms a heating hearth cavity, the stepping assembly 400 forms a hearth bottom, and the electric heating element 350 is arranged in the hearth and is electrified to realize heating.
The stepping assembly 400 is arranged inside the heating furnace body 310, and the stepping assembly 400 comprises a stepping frame 410, a stepping lifting mechanism 430 and a horizontal displacement mechanism 450; the stepping frame 410 comprises a stepping beam 415 and a pad 417, specifically, the stepping beam 415 and the pad 417 are arranged at the uppermost end of the stepping assembly 400, and the stepping lifting mechanism 430 is arranged at the bottom of the stepping frame 410; the output end of the horizontal displacement mechanism 450 is connected to the stepper frame 410, and controls the stepper frame 410, the stepper beam 415 and the pad 417 to reciprocate.
In order to make the stepping assembly 400 reciprocate in the heating furnace body 310 and ensure the air tightness between the stepping beam 415 and the hearth of the lining 330, a water sealing mechanism 370 for a working channel and a channel seal for the movement of the stepping frame 410 is further arranged below the heating furnace body 310, the water sealing mechanism 370 ensures the dynamic seal between the upper assembly of the stepping assembly 400 and the upper cavity of the heating furnace body 310, and the water sealing mechanism 370 ensures a reliable water supply level through a water sealing circulating pipe 371.
In this embodiment, the stepper frame 410 is a base frame for the stepper beam 415, and the pad 417 is in a high temperature region above the stepper beam 415.
A first horizontal sliding member 411 is disposed on one side of the stepping frame 410 close to the stepping elevating mechanism 430, and a second horizontal sliding member 431 engaged with the first horizontal sliding member 411 is disposed on the stepping elevating mechanism 430.
The first horizontal slide 411 and the second horizontal slide 431 cooperate to guide the stepper frame 410 in a reciprocating motion in a direction parallel to a line connecting the inlet end 031 and the outlet end 033. Specifically, the first horizontal sliding member 411 is a sliding block, the second horizontal sliding member 431 is a sliding rail parallel to the connecting line between the inlet end 031 and the outlet end 033, and the sliding block is matched with the sliding rail, so that the stepping frame 410 can only move horizontally according to a fixed track.
It should be noted that, the sliding fit between the sliding block and the sliding rail is adopted to realize the guiding in the embodiment, and in other embodiments, the guiding may be realized in the form of a sliding groove, a cam wheel, a rail, and the like, which are direct deformations of the guiding structure, and are also within the protection scope of the present invention.
The horizontal displacement mechanism 450 provided by the embodiment comprises a horizontal telescopic member 451 and an articulated rod 453, wherein the horizontal telescopic member 451 provides power for horizontal operation of the stepping frame 410 and is arranged at one end, close to the outlet end 033, in the heating furnace body 310, the horizontal telescopic member 451 is provided with a horizontally telescopic end head, the end head is arranged in an articulated manner with one end of the articulated rod 453, and the other end of the articulated rod 453 is articulated with one side of the stepping frame 410. The use of the hinge ensures that the horizontal displacement mechanism 450 provides only a horizontally acting power to the stepper frame 410 without limiting the freedom of up and down movement during the stepping process.
It should be noted that, in this embodiment, the horizontal extension piece 451 is disposed at the end to realize the horizontal displacement of the stepping frame 410, and in other embodiments, a four-bar linkage mechanism may be used to realize the parallel displacement trajectory of the stepping frame 410 and synchronously realize the up-and-down displacement of the stepping frame 410, so as to realize the periodic stepping movement of the stepping beam 415.
In this embodiment, the step frame 410 includes a frame body 413, a step beam 415 and a pad 417, the frame body 413 is directly connected to the step lifting mechanism 430, wherein the slider is also disposed on a surface of the frame body 413 close to the step lifting mechanism 430, the step beam 415 is disposed on a surface of the frame body 413 away from the step lifting mechanism 430, and the step beam 415 is used for supporting the tray 070. The liner 417 is arranged on the side of the walking beam 415 far away from the frame body 413, the liner 417 is used for preventing the heat influence and heat loss of the high temperature in the furnace to the steel structure of the walking beam 415, and the liner 417 is made of high-purity non-metal materials, so that high-cleanness heating is ensured.
And reciprocates within the heating portion 030 by the stepping assembly 400. The charging tray 070 moves from the inlet end 031 to the outlet end 033 step by step in the heating part 030, and the charging tray 070 is gradually heated in the moving process: the tray 070 is sent into the heating part 030 from the inlet end 031 by the furnace feeding mechanism 210, the stepping lifting mechanism 430 ascends after the tray 070 is in place, the stepping frame 410 assembly, the stepping beam 415 and the pad 417 ascend, the horizontal telescopic member 451 of the horizontal displacement mechanism 450 is also in an extending state, the tray 070 is supported by the stepping beam 415, the horizontal telescopic member 451 retracts, the stepping frame 410, the stepping beam 415, the upper pad 417 and the tray 070 move from the inlet end 031 to the outlet end 033, after the horizontal telescopic member 451 retracts in place, the stepping lifting mechanism 430 descends, the stepping frame 410 assembly, namely the stepping beam 415 and the pad 417 descend, and the tray 070 steps by one station. The stepping lifting mechanism 430 and the horizontal displacement mechanism 450 continuously operate, the charging tray 070 is conveyed to the conversion station step by step, the outlet end 033 of the heating part 030 is further provided with a correction mechanism 035, and the correction mechanism 035 corrects the position of the charging tray 070 on the conversion station to eliminate the displacement error of the stepping assembly 400.
Referring to fig. 5, the cold explosion part 050 includes a dumping mechanism 500 and a cold explosion liquid tank 600; the dumping mechanism 500 includes a pusher head 510 and a rotatable dumping table 530; an outlet end 033 of the heating part 030 is connected to the rear bin 800; the dumping mechanism 500 is disposed in the rear compartment 800. The axis of the pusher head 510 and the axis of rotation of the pouring table 530 are perpendicular to the line joining the inlet end 031 and the outlet end 033 of the heated portion 030, respectively. The pusher head 510 is disposed toward the dumping table 530; the cold blast liquid tank 600 is disposed below the dumping table 530. The pushing head 510 is fixedly connected to the rear door 810, and the rear door 810 is used for reducing the influence of the radiant heat transfer of the heat of the heating portion 030 on the rear chamber 800. Since the back door 810 must be opened first, the tray 070 can enter the pushing station, and the pushing head 510 then pushes the tray to the dumping table 530. When the pushing is in place, the rear door 810 is automatically in a closed position, so that the height relationship between the pushing head 510 and the rear door 810 is high, and in this embodiment, the rear door 810 and the pushing head 510 are fixedly connected. When the rear door 810 is opened, the pushing head 510 is at the pushing position, and after the pushing head 510 is pushed in place, the rear door 810 automatically shields the discharge hole of the heating part 030 to block the radiant heat.
In order to ensure that the rear warehouse 800 has no oxidizing atmosphere, the outlet end 033 of the heating part 030 is connected with the rear warehouse 800 in a seamless manner, and the rear warehouse 800 is a fully-closed space, so that air is isolated, and high-temperature oxidation of materials can be avoided.
Specifically, the pushing head 510 is retracted to the proper position, the rear bin door 810 is opened, the material tray 070 enters the material pushing station, the material on the station is pushed to the dumping table 530 through the pushing head 510, the dumping table 530 rotates and inclines at a certain angle, and the material of the material tray 070 is dumped into the cold blast liquid tank 600 below the dumping table 530. The cold explosion liquid tank 600 is provided with cold explosion liquid for cold explosion, and in the embodiment, the cold explosion liquid is water, and since the material is silicon crystal and does not react with water, water with lower cost can be directly adopted. In other embodiments, other cold blasting liquids may be used if the material reacts with water.
A steam discharge port is further formed above the cold explosion liquid tank 600, the steam discharge port is communicated to the steam processor 610, and condensate treated by the steam processor 610 enters the cold explosion liquid tank 600 again. In order to ensure the temperature of the liquid in the cold explosion liquid tank 600, the cold explosion liquid tank 600 is further connected with a circulating water pipe 630, and the circulating water pipe 630 can realize automatic circulation according to the temperature of the liquid in the current cold explosion liquid tank 600, so as to ensure that the temperature of the cold explosion liquid in the cold explosion liquid tank 600 is in a low-temperature state.
A lifting machine 650 is further arranged inside the cold explosion liquid tank 600, one end of the lifting machine 650 extends into the bottom of the cold explosion liquid tank 600, and the other end extends out of the cold explosion liquid tank 600. The cold exploded material is lifted out of the cold exploded liquid tank 600 by the lifter 650 for subsequent crushing treatment.
Referring to fig. 2, 3 and 6, as mentioned above, the crystal material crushing, cleaning and pre-treating apparatus further includes a material tray 070, and it should be noted that the material blocks with regular shapes do not need to be loaded into the material tray 070 for treatment, but the material blocks are loaded in the material tray 070 in the atmosphere replacing part 010 and the heating part 030, and the material is not poured out from the material tray 070 into the cold explosion liquid tank 600 until the material is poured on the pouring table 530. The empty trays 070 at this point need to be recycled for the next cycle to carry material. Therefore, a recovery assembly for the circulation of the charging tray 070 is arranged between the cold explosion part 050 and the feeding hole, and the charging tray 070 recovery assembly comprises a charging tray return push rod 711, a return channel 713 for the circulation of the charging tray 070 and a charging tray water seal groove 730; the tray loopback device transports the tray 070 from the cold explosion part 050 to the feed port loading area. The tray water seal tank 730 is disposed at one end of the tray returning device close to the atmosphere replacing part 010.
If the material blocks with regular surfaces are treated, the material plates can not be used for carrying, and correspondingly, the material plate 070 recovery assembly does not work.
Specifically, the tray returning device comprises a tray returning push rod 711 and a returning channel 713, the returning channel 713 is a straight channel extending from the dumping table 530 to the tray water-seal tank 730, the tray returning push rod 711 is a push rod arranged at one end of the dumping table 530 far away from the returning channel 713, empty trays 070 discharged from the dumping table 530 are conveyed into the returning channel 713 through the tray returning push rod 711, and the subsequent trays 070 push the previous trays 070 in the continuous working process and are finally pushed into the tray water-seal tank 730.
The charging tray water seal tank 730 comprises a water tank body 731 and a lifting conveyor belt 733, and the water tank body 731 is arranged at one end of the charging tray returning device, which is far away from the cold explosion part 050; one end of the lifting conveyor belt 733 is disposed at the bottom of the water tank 731, and the other end is disposed at the turnover table 900. The water tank body 731 is communicated with a circulation liquid supply pipe 7311, and a sealed water level of the water tank body 731 is ensured by the circulation liquid supply pipe 7311. Empty trays 070 are transported from the trough 731, inside the mold body, onto the turnaround 900 via the lifting conveyor 733, and are transported via the turnaround 900 to the feed inlet for carrying new material into the next cycle.
The crystal material crushing and cleaning pretreatment device provided by the invention can be used for extracting air entering in the feeding process through the atmosphere replacement part 010 and replacing the air with inert gas, automatically adjusting the atmosphere pressure in the bin 800 before and during heating and after the heating process, and avoiding the material from being oxidized at high temperature. The step assembly 400 disposed in the heating furnace body 310 can continuously feed the processing material to continuously heat the processing material. And. No metal component is arranged in a high-temperature area, so that the pollution of metal ions is avoided, and the metal intake on the surface of the treated silicon crystal material is less than or equal to 5 PPbw. The automatic circulation can be achieved by manually loading the process material into the trays 070 at the transfer station 900 for a complete cycle from the material inlet to the tray back to the transfer station 900. And the crystal material quenched in the cold explosion liquid tank 600 is directly lifted to the next station by the lifter 650 for crushing treatment.
Example two
The embodiment provides a clean pretreatment method for a crystal material, and the clean pretreatment device for crystal material crushing provided by the embodiment comprises the following steps:
the material is put into an empty tray 070, the empty tray 070 carries the material to be sent into the replacement bin 100 from the feeding hole, and the feeding hole is closed; at this time, the channels of the replacement chamber 100 and the front chamber 200 are automatically closed; vacuumizing the change chamber 100 to a preset vacuum degree through a vacuum system 110; introducing a replacement gas into the replacement chamber 100 through the replacement gas supply pipe 130 until the gas pressure in the replacement chamber 100 is balanced with that in the front chamber 200, raising the elevating platform 150 to communicate the replacement chamber 100 with the front chamber 200, and feeding the material from the replacement chamber 100 into the front chamber 200; the material is pushed from the front chamber 200 into the heating portion 030 to be heated.
The built-in stepping assembly 400 of the heating part 030 enables the material to be continuously conveyed from an inlet end 031 of the heating part 030 to an outlet end 033, and when the material is conveyed to the outlet end 033 and is discharged through a discharge port, the material is conveyed to the pouring table 530 through the pushing head 510, the pouring table 530 pours the material into the cold blast liquid tank 600, and water cooling is achieved in the cold blast liquid tank 600 of the cold blast part 050.
The material is water cooled and then lifted to the next station for subsequent processing by elevator 650. The empty tray 070 is transferred to the tray water-sealed tank 730 close to the feed inlet by the tray back-feeding device, and then the empty tray 070 is transferred to the turnover table 900 by the lifting conveyor 733 and is transported to the feed inlet by the turnover table 900 to be ready for the next circulation.
EXAMPLE III
The embodiment provides a clean processing method of crystal material, which uses the clean pre-processing device for crystal material crushing provided by the embodiment one, and comprises the following steps:
the difference between this example and case two is that no loading tray is required for the treatment material. The material tray returning device does not need to work. The structured material is fed into the displacement chamber 100 from the feed inlet, and the feed inlet is closed; at this time, the channels of the replacement chamber 100 and the front chamber 200 are automatically closed; vacuumizing the change chamber 100 to a preset vacuum degree through a vacuum system 110; introducing a replacement gas into the replacement chamber 100 through the replacement gas supply pipe 130 until the pressure in the replacement chamber 100 is balanced with the front chamber 200; raising the elevating platform 150 to communicate the displacement chamber 100 with the front chamber 200, and feeding the material from the displacement chamber 100 into the front chamber 200; the material is pushed from the front chamber 200 into the heating portion 030 to be heated.
The built-in stepping assembly 400 of the heating part 030 enables the material to be continuously conveyed from an inlet end 031 of the heating part 030 to an outlet end 033, and when the material is conveyed to the outlet end 033 and is discharged through a discharge port, the material is conveyed to the pouring table 530 through the pushing head 510, the pouring table 530 pours the material into the cold blast liquid tank 600, and water cooling is achieved in the cold blast liquid tank 600 of the cold blast part 050.
After water cooling, the material is lifted to the next station by the lifter 650 for subsequent crushing, so that the crushing pretreatment operation is realized.
The crystal material crushing and cleaning pretreatment device provided by the invention can be used for extracting air entering in the feeding process through the atmosphere replacement part 010 and replacing the air with inert gas, automatically adjusting the pressure and flow of the atmosphere in the bin 800 before and during heating and after, and avoiding the material from being oxidized at high temperature. The step assembly 400 disposed in the heating furnace body 310 can continuously feed the processing material to continuously heat the processing material. And no metal component is arranged in a high-temperature region, so that the pollution of metal ions is avoided, the total metal intake on the surface of the processed silicon crystal material is less than or equal to 5PPbw, the impurity requirements of GB/T12963-2014 electronic grade polycrystalline silicon on 8 metals (Fe, Cr, Ni, Cu, Zn, Al, K and Na) are completely met, and the surface of the processed material is not oxidized. The high-value high-quality material (with the grain diameter of 6-50mm) obtained from the silicon crystal material after the pretreatment and the crushing accounts for more than 97 percent, the secondary raw material with the grain diameter less than or equal to 3mm accounts for only 1 percent, the proportion of the high-quality material is improved by more than 10 percent compared with the traditional direct hammering mode, and the method has very obvious economic benefit. The automatic circulation can be achieved by manually loading the process material into the trays 070 at the transfer station 900 for a complete cycle from the material inlet to the tray back to the transfer station 900. And the crystal material quenched in the cold explosion liquid tank 600 is directly lifted to the next station by the lifter 650 for crushing treatment. For structured villages, the material can be directly processed without using the tray 070.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (16)

1. A crystal material crushing and cleaning pretreatment device is used for crushing pretreatment of materials and is characterized by comprising an atmosphere replacement part, a heating part and a cold explosion part;
the atmosphere replacement part is provided with a feed inlet for material to enter;
the heating part comprises an inlet end and an outlet end;
the atmosphere replacement part is arranged at the inlet end of the heating part and is used for sucking and removing air adsorbed on the surface of the material and air entering from the channel during feeding and replacing the air with inert gas;
the cold explosion part is arranged at the outlet end of the heating part and used for water cooling of the heated crystal material.
2. The crystal material crushing, cleaning and pretreating device according to claim 1, wherein the atmosphere replacing part comprises an isolatable replacing chamber and a front chamber;
the feed inlet is arranged in front of the replacement chamber, one end of the front chamber is communicated with the replacement chamber, and the other end of the front chamber is communicated with the heating part;
the feeding door can be opened and closed and is arranged at the feeding port;
the replacement chamber is used for connecting the vacuum system and the replacement gas supply pipeline.
3. The clean pretreatment device for crushing crystalline materials according to claim 2, wherein the front chamber is arranged above the replacement chamber, and a lifting material table is arranged at the bottom of the replacement chamber, and has a low position state at the same height as the feeding gate and a high position state at the same height as the heating part.
4. The crystal material crushing, cleaning and pretreating device according to claim 3, wherein a furnace feeding mechanism for pushing the material into the heating part is further arranged in the front chamber;
the furnace feeding mechanism is provided with a material pushing station facing the lifting material platform in the high position state.
5. The clean pretreatment device for crushing crystalline materials according to claim 1, wherein the heating part comprises a stepping assembly for horizontally conveying the materials;
the stepping assembly comprises a stepping frame, a stepping lifting mechanism and a horizontal displacement mechanism;
the stepping lifting mechanism is arranged at the lower part of the stepping frame;
the horizontal displacement mechanism is connected with the stepping frame and is used for driving the stepping frame to move in a reciprocating manner in the heating part in each stepping cycle.
6. The crystal material crushing, cleaning and pretreating device according to claim 5, wherein a first horizontal sliding part is arranged on one surface of the stepping frame close to the stepping lifting mechanism, and a second horizontal sliding part matched with the first horizontal sliding part is arranged on the stepping lifting mechanism;
the first horizontal sliding piece is matched with the second horizontal sliding piece to guide the stepping frame to perform reciprocating displacement along a connecting line of the inlet end and the outlet end.
7. The clean pretreatment device for crushing crystalline materials according to claim 5, wherein the horizontal displacement mechanism comprises a horizontal telescopic piece and a hinged rod;
the horizontal extensible member has the end that can the level is flexible, the end with the articulated setting of one end of articulated arm, the other end of articulated arm with one side of step-by-step frame is articulated.
8. The crystal material crushing, cleaning and pretreating device according to claim 5, wherein the heating part comprises a heating furnace body, the stepping assembly is arranged inside the heating furnace body, a working opening for the stepping frame to enter is further arranged below the heating furnace body,
and a water seal mechanism is arranged at the working port.
9. The clean pretreatment device for crushing the crystal material according to claim 8, wherein the heating furnace body is provided with an inner lining made of a non-metal material; the stepping frame comprises a stepping beam extending into the heating furnace body, and a liner made of a non-metal material is arranged above the stepping beam.
10. The crystal material crushing, cleaning and pretreating device according to claim 1, wherein the cold blasting portion comprises a dumping mechanism and a cold blasting liquid tank;
the dumping mechanism comprises a pushing head and a rotatable dumping platform;
the outlet end of the heating part is provided with a discharge hole;
the dumping mechanism is arranged at one end of the discharge hole, which is far away from the heating part; the pushing head is arranged towards the dumping table;
the cold explosion liquid tank is arranged below the pouring table.
11. The crystal material crushing, cleaning and pretreating device according to claim 10, wherein the pushing head is fixedly connected with a rear bin gate, and the rear bin gate is used for shielding and sealing the discharge port.
12. The crystal material crushing, cleaning and pretreating device according to claim 10, wherein a lifter is further arranged in the cold explosion liquid tank, one end of the lifter extends into the bottom of the cold explosion liquid tank, and the other end of the lifter extends out of the cold explosion liquid tank.
13. The clean pretreatment device for crushing the crystal material according to claim 1, further comprising a tray for carrying the material;
a material tray recovery assembly for material tray circulation is further arranged between the cold explosion part and the feeding hole of the atmosphere replacement part, and the material tray recovery assembly comprises a material tray returning device and a material tray water sealing device for discharging and sealing the material tray;
the material tray returning device conveys the material tray from the cold explosion part to the feeding hole of the atmosphere replacement part;
the charging tray water sealing device is arranged at one end of the charging tray returning device, which is close to the atmosphere replacement part.
14. The crystal material crushing, cleaning and pretreating device according to claim 13, wherein the tray water-sealing device comprises a water tank and a lifting conveyor belt,
the water tank body is arranged at one end of the material tray returning device, which is far away from the cold explosion part;
the feeding port is provided with a turnover table, one end of the lifting conveyor belt is arranged at the bottom of the water tank body, and the other end of the lifting conveyor belt is arranged on the turnover table.
15. The clean pretreatment device for crushing the crystal material according to claim 13, wherein the tray has a stop side surface and an inclined bottom surface;
an acute material positioning angle is formed between the stop side surface and the inclined bottom surface.
16. A clean pretreatment method for crystalline material, characterized in that a clean pretreatment apparatus for crushing crystalline material according to any one of claims 2 to 4 is used, comprising the steps of:
feeding material from the feed inlet into the displacement chamber, closing the feed inlet;
isolating the replacement chamber and the front chamber;
vacuumizing the replacement bin to a preset vacuum degree through the vacuum system;
introducing replacement gas into the replacement chamber through the replacement gas supply pipeline until the gas pressure of the replacement chamber is balanced with that of the front chamber;
communicating the replacement chamber with the front chamber and delivering material from the replacement chamber to the front chamber;
pushing the material from the front chamber into the heating part for heating;
the material is pushed out from the heating section and crushed in the cold explosion section.
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