CN111410607A - Process for producing hexahydrofurofuranol derivative, intermediate therefor, and process for producing the intermediate - Google Patents
Process for producing hexahydrofurofuranol derivative, intermediate therefor, and process for producing the intermediate Download PDFInfo
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- CN111410607A CN111410607A CN202010282019.5A CN202010282019A CN111410607A CN 111410607 A CN111410607 A CN 111410607A CN 202010282019 A CN202010282019 A CN 202010282019A CN 111410607 A CN111410607 A CN 111410607A
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- 238000000034 method Methods 0.000 title claims description 25
- GQSAIMYKDAPIDJ-UHFFFAOYSA-N 2,3,3a,5,6,6a-hexahydrofuro[3,2-b]furan-5-ol Chemical class O1CCC2OC(O)CC21 GQSAIMYKDAPIDJ-UHFFFAOYSA-N 0.000 title abstract description 6
- 150000001875 compounds Chemical class 0.000 claims abstract description 105
- 238000002360 preparation method Methods 0.000 claims abstract description 33
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 19
- -1 triethylsilyl Chemical group 0.000 claims description 28
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 27
- 238000006243 chemical reaction Methods 0.000 claims description 22
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 12
- 238000006460 hydrolysis reaction Methods 0.000 claims description 12
- 229910052739 hydrogen Inorganic materials 0.000 claims description 11
- 239000001257 hydrogen Substances 0.000 claims description 11
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 11
- 238000010511 deprotection reaction Methods 0.000 claims description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 9
- 238000007363 ring formation reaction Methods 0.000 claims description 9
- 230000007062 hydrolysis Effects 0.000 claims description 8
- 125000006239 protecting group Chemical group 0.000 claims description 8
- 125000000242 4-chlorobenzoyl group Chemical group ClC1=CC=C(C(=O)*)C=C1 0.000 claims description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical group [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 claims description 7
- 229910052744 lithium Inorganic materials 0.000 claims description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 6
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 5
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims description 4
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims description 4
- 125000004429 atom Chemical group 0.000 claims description 4
- 150000002431 hydrogen Chemical class 0.000 claims description 4
- 230000003301 hydrolyzing effect Effects 0.000 claims description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 125000004971 nitroalkyl group Chemical group 0.000 claims description 4
- 238000005580 one pot reaction Methods 0.000 claims description 4
- 125000001981 tert-butyldimethylsilyl group Chemical group [H]C([H])([H])[Si]([H])(C([H])([H])[H])[*]C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 4
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical group [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 3
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 3
- ZZVUWRFHKOJYTH-UHFFFAOYSA-N diphenhydramine Chemical group C=1C=CC=CC=1C(OCCN(C)C)C1=CC=CC=C1 ZZVUWRFHKOJYTH-UHFFFAOYSA-N 0.000 claims description 3
- 125000002541 furyl group Chemical group 0.000 claims description 3
- 125000001041 indolyl group Chemical group 0.000 claims description 3
- 229910052740 iodine Inorganic materials 0.000 claims description 3
- 229910052700 potassium Inorganic materials 0.000 claims description 3
- 239000011591 potassium Substances 0.000 claims description 3
- 229910052708 sodium Inorganic materials 0.000 claims description 3
- 239000011734 sodium Substances 0.000 claims description 3
- 125000001544 thienyl group Chemical group 0.000 claims description 3
- 125000002306 tributylsilyl group Chemical group C(CCC)[Si](CCCC)(CCCC)* 0.000 claims description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 125000000636 p-nitrophenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)[N+]([O-])=O 0.000 claims description 2
- 238000006467 substitution reaction Methods 0.000 claims description 2
- 239000011630 iodine Substances 0.000 claims 1
- 125000005948 methanesulfonyloxy group Chemical group 0.000 claims 1
- 125000005951 trifluoromethanesulfonyloxy group Chemical group 0.000 claims 1
- CJBJHOAVZSMMDJ-HEXNFIEUSA-N darunavir Chemical compound C([C@@H]([C@H](O)CN(CC(C)C)S(=O)(=O)C=1C=CC(N)=CC=1)NC(=O)O[C@@H]1[C@@H]2CCO[C@@H]2OC1)C1=CC=CC=C1 CJBJHOAVZSMMDJ-HEXNFIEUSA-N 0.000 abstract description 9
- 229960005107 darunavir Drugs 0.000 abstract description 9
- 239000007858 starting material Substances 0.000 abstract description 9
- 239000003814 drug Substances 0.000 abstract description 4
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 238000003786 synthesis reaction Methods 0.000 abstract description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 21
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 20
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 18
- 238000003756 stirring Methods 0.000 description 15
- 238000001816 cooling Methods 0.000 description 14
- 239000000543 intermediate Substances 0.000 description 13
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 11
- 239000003638 chemical reducing agent Substances 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000002585 base Substances 0.000 description 9
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 9
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 8
- ZCSHNCUQKCANBX-UHFFFAOYSA-N lithium diisopropylamide Chemical group [Li+].CC(C)[N-]C(C)C ZCSHNCUQKCANBX-UHFFFAOYSA-N 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 7
- 239000012044 organic layer Substances 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical group [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 150000007522 mineralic acids Chemical class 0.000 description 6
- 150000007524 organic acids Chemical class 0.000 description 6
- 239000003153 chemical reaction reagent Substances 0.000 description 5
- YNESATAKKCNGOF-UHFFFAOYSA-N lithium bis(trimethylsilyl)amide Chemical compound [Li+].C[Si](C)(C)[N-][Si](C)(C)C YNESATAKKCNGOF-UHFFFAOYSA-N 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 4
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- KZMGYPLQYOPHEL-UHFFFAOYSA-N Boron trifluoride etherate Chemical compound FB(F)F.CCOCC KZMGYPLQYOPHEL-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000005103 alkyl silyl group Chemical group 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 239000007810 chemical reaction solvent Substances 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 238000004949 mass spectrometry Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 238000006722 reduction reaction Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 description 2
- DBMGRFIVRJOFCS-UHFFFAOYSA-N 2-(2-iodoethoxy)-2-methylpropane Chemical compound CC(C)(C)OCCI DBMGRFIVRJOFCS-UHFFFAOYSA-N 0.000 description 2
- JWUJQDFVADABEY-UHFFFAOYSA-N 2-methyltetrahydrofuran Chemical compound CC1CCCO1 JWUJQDFVADABEY-UHFFFAOYSA-N 0.000 description 2
- RKIDDEGICSMIJA-UHFFFAOYSA-N 4-chlorobenzoyl chloride Chemical compound ClC(=O)C1=CC=C(Cl)C=C1 RKIDDEGICSMIJA-UHFFFAOYSA-N 0.000 description 2
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N Dimethyl sulfoxide Chemical compound [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000008346 aqueous phase Substances 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- GUVUOGQBMYCBQP-UHFFFAOYSA-N dmpu Chemical compound CN1CCCN(C)C1=O GUVUOGQBMYCBQP-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 125000001033 ether group Chemical group 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 150000007529 inorganic bases Chemical group 0.000 description 2
- 239000012280 lithium aluminium hydride Substances 0.000 description 2
- XPLJNJGKLNJWNZ-UHFFFAOYSA-N lithium;cyclohexylazanide Chemical compound [Li+].[NH-]C1CCCCC1 XPLJNJGKLNJWNZ-UHFFFAOYSA-N 0.000 description 2
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 2
- 235000019341 magnesium sulphate Nutrition 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 125000006503 p-nitrobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1[N+]([O-])=O)C([H])([H])* 0.000 description 2
- IUBQJLUDMLPAGT-UHFFFAOYSA-N potassium bis(trimethylsilyl)amide Chemical compound C[Si](C)(C)N([K])[Si](C)(C)C IUBQJLUDMLPAGT-UHFFFAOYSA-N 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- WRIKHQLVHPKCJU-UHFFFAOYSA-N sodium bis(trimethylsilyl)amide Chemical compound C[Si](C)(C)N([Na])[Si](C)(C)C WRIKHQLVHPKCJU-UHFFFAOYSA-N 0.000 description 2
- 239000012279 sodium borohydride Substances 0.000 description 2
- 229910000033 sodium borohydride Inorganic materials 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L sodium carbonate Substances [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 1
- 229940124321 AIDS medicine Drugs 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- JVEGCGQXRCOAFN-UHFFFAOYSA-N C(C(C)C)[AlH]CC(C)C.[Li] Chemical compound C(C(C)C)[AlH]CC(C)C.[Li] JVEGCGQXRCOAFN-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 238000005903 acid hydrolysis reaction Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- VKNUORWMCINMRB-UHFFFAOYSA-N diethyl malate Chemical compound CCOC(=O)CC(O)C(=O)OCC VKNUORWMCINMRB-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- UWNADWZGEHDQAB-UHFFFAOYSA-N i-Pr2C2H4i-Pr2 Natural products CC(C)CCC(C)C UWNADWZGEHDQAB-UHFFFAOYSA-N 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229940049920 malate Drugs 0.000 description 1
- UKVIEHSSVKSQBA-UHFFFAOYSA-N methane;palladium Chemical compound C.[Pd] UKVIEHSSVKSQBA-UHFFFAOYSA-N 0.000 description 1
- XONPDZSGENTBNJ-UHFFFAOYSA-N molecular hydrogen;sodium Chemical compound [Na].[H][H] XONPDZSGENTBNJ-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen(.) Chemical compound [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- MSEAXGSPLSIEAU-UHFFFAOYSA-N tert-butyl-(2-iodoethyl)-dimethylsilane Chemical compound CC(C)(C)[Si](C)(C)CCI MSEAXGSPLSIEAU-UHFFFAOYSA-N 0.000 description 1
- LALRXNPLTWZJIJ-UHFFFAOYSA-N triethylborane Chemical group CCB(CC)CC LALRXNPLTWZJIJ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C67/00—Preparation of carboxylic acid esters
- C07C67/30—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group
- C07C67/333—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by isomerisation; by change of size of the carbon skeleton
- C07C67/343—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
- C07C69/67—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of saturated acids
- C07C69/675—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of saturated acids of saturated hydroxy-carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
- C07C69/67—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of saturated acids
- C07C69/708—Ethers
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/04—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
- C07D307/18—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D307/20—Oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/26—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
- C07D307/30—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D307/32—Oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/26—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
- C07D307/30—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D307/32—Oxygen atoms
- C07D307/33—Oxygen atoms in position 2, the oxygen atom being in its keto or unsubstituted enol form
-
- C—CHEMISTRY; METALLURGY
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Abstract
The invention relates to the field of medicine synthesis, in particular to a preparation method of hexahydrofurofuranol derivatives, an intermediate thereof and a preparation method thereof. The preparation method takes a compound of a formula A1 or a compound of a formula 0 as a starting material,wherein R is1,R2The same or different is an alkyl group. This is different from the starting materials reported in the prior patent documents, and the specific preparation method is also different from the prior patent documents, but the preparation method can industrially produce the darunavir key intermediate (3R,3aS,6aR) -hexahydrofuro [2,3-b ]]-3-alcohols.
Description
Technical Field
The invention relates to the field of medicine synthesis, in particular to a preparation method of hexahydrofurofuranol derivatives, an intermediate thereof and a preparation method thereof.
Background
The compound having the structure of formula Z is (3R,3aS,6aR) -hexahydrofuro [2,3-b ] -3-ol:
belongs to one of hexahydrofurofuranol derivatives, and is an intermediate of anti-AIDS drug darunavir.
A process for the preparation of the above (3R,3aS,6aR) -hexahydrofuro [2,3-b ] -3-ol is provided in Chinese patent application No. 200580010400.X of Taibo Tec pharmaceuticals, Inc., wherein the starting material is a compound of the following formula (3),
the above-mentioned (3R,3aS,6aR) -hexahydrofuro [2,3-b ] -3-ol is prepared by the method of preparing (3R,3aS,6aR) -hexahydrofuro [2,3-b ] -3-ol aS described in the above-mentioned Japanese Sumitomo chemical Co., Ltd., China patent application No. 200380109926.4, wherein the starting material is a compound of the following formula VIII,
considering that (3R,3aS,6aR) -hexahydrofuro [2,3-b ] -3-alcohol is a key intermediate for preparing darunavir medicaments, more preparation methods of the key intermediate are needed. This requires development from different starting materials.
Disclosure of Invention
The method for preparing (3R,3aS,6aR) -hexahydrofuro [2,3-b ] -3-alcohol starts from the selection of the starting materials, and researches and develops a preparation method for preparing the key intermediate of darunavir from the starting materials in the prior patent application. The preparation method of the invention provides another route suitable for industrialization for the preparation of the darunavir key intermediate.
In order to realize the technical purpose of the invention, the invention provides the following technical scheme:
in a first aspect the present invention provides a compound of formula 1,
wave lineCan be represented asS configuration, can also beAnd R configuration. Wherein R isLIs hydrogen or a hydroxyl protecting group. The hydroxyl protecting group is alkyl, silyl, substituted phenyl or aryl.
The silyl is trimethylsilyl, triethylsilyl, tri-n-butylsilyl or tert-butyldimethylsilyl. The alkyl group is preferably a C1-C8 alkyl group. The aryl is phenyl, furyl, thienyl or indolyl. The substituted phenyl is alkyl substituted phenyl, alkoxy alkyl substituted phenyl and nitro alkyl substituted phenyl. The alkyl substituted phenyl is benzyl, benzhydryl or trityl; the alkoxy alkyl substituted phenyl is p-methoxybenzyl; the nitroalkyl substituted phenyl is p-nitrobenzyl. The alkyl-substituted phenyl is preferably benzyl.
Specifically, provided are compounds of formula 1-1 or compounds of formula 1-2,
RLas defined above. Preferably, the compounds are selected from the group consisting of,
in a second aspect the present invention provides a compound of formula 2,
wave lineCan be represented asS configuration, can also beAnd R configuration. RLIn the same manner as defined above, the above-mentioned,
R3is an alkyl group. RL1Is hydrogen or p-chlorobenzoyl.
Specifically, provided are compounds of formula 2-1 or compounds of formula 2-2,
wherein R is3Is an alkyl group.
Preferably, the compounds are selected from the group consisting of,
in a third aspect the present invention provides a compound of formula B,
in particular, the compounds of formula B-1,
wherein R is1,R2Is hydrogen, the same or different is a carboxyl protecting group, such as alkyl, substituted phenyl such as alkyl-substituted phenyl, alkoxyalkyl-substituted phenyl, nitroalkyl-substituted phenyl or silyl; rLAs defined above.
The alkyl group is C1-C8Alkyl groups of (a), such as methyl, ethyl, n-propyl, isopropyl, n-butyl, tert-butyl; the alkyl substituted phenyl is benzyl, benzhydryl or trityl; the alkoxy alkyl substituted phenyl is p-methoxybenzyl; the nitroalkyl substituted phenyl is p-nitrobenzyl and the like, preferably methyl, isopropyl, tert-butyl and benzyl; the silyl is trimethylsilyl, triethylsilyl, tri-n-butylsilyl or tert-butyldimethylsilyl; the aryl is phenyl, furyl, thienyl or indolyl.
In a fourth aspect, the present invention provides a process for the preparation of compounds of formula B and formula B-1, wherein a compound of formula B-1 is prepared by reacting a compound of formula A1 with a compound of formula A2, the compound of formula B is identical thereto, the compound of formula A1 is adapted as a racemate,
wherein R is1,R2,RLAs defined above, X is a leaving group.
X may be a halogen atom, preferably an iodine atom, a bromine atom; methylsulfonyloxy, trifluoromethanesulfonyloxy, p-toluenesulfonyloxy, phenylsulfonyloxy.
In particular, preparation of the protecting group RLA compound of formula B-1 which is a tert-butyl group,
wherein R is1,R2And X is as defined above.
In particular, preparation of the protecting group RLA compound of formula B-1 which is a trimethylsilyl group,
wherein R is1,R2And X is as defined above.
In particular, preparation of the protecting group RLA compound of formula B-1 which is a benzyl group,
wherein R is1,R2And X is as defined above.
In particular, preparation of the protecting group RLA compound of formula B-1 which is a benzhydryl group,
wherein R is1,R2And X is as defined above.
Wherein, the compound of formula B-1 with the protecting group of hydrogen can be prepared by deprotection of the protecting group of alkyl, benzyl or alkyl silicon. Such as acid hydrolysis of alkyl groups to hydroxyl groups, deprotection of benzyl, benzhydryl groups to hydroxyl groups over palladium on carbon, and deprotection of alkylsilyl groups to hydroxyl groups over acids such as trifluoroacetic acid.
The reaction for preparing the compound of formula B-1 is carried out in the presence of a base. The alkali is alkyl lithium or a compound with the following structure,
wherein, L1,L2Is alkyl, cycloalkyl or alkylsilyl, and M is a metal atom such as lithium, potassium, sodium, etc.
Specifically, the base is lithium diisopropylamide, lithium cyclohexylamide, lithium hexamethyldisilazide, sodium hexamethyldisilazide, potassium hexamethyldisilazide, or n-butyllithium.
Preferably, the base is lithium diisopropylamide.
The amount of the base used is usually 2.0 to 3.5mol, preferably 2.2 to 3.0mol, based on 1mol of the compound of the formula A1.
The reaction solvent is ether solvent such as diethyl ether, isopropyl ether, methyl tert-butyl ether, tetrahydrofuran, methyl tetrahydrofuran, etc.
The reaction temperature is-78-70 ℃, and is preferably-78-0 ℃.
Wherein the compound of formula B-1 prepared by the reaction of the compound of formula A1 with the compound of formula A2 exists mostly as a compound of the following configuration,
at least partly in the form of their diastereoisomers,
the person skilled in the art can purify the compound of formula B-1 by column chromatography or the like,
more preferably, however, the compound of formula 1-2 is used in the following reaction without purification.
That is, the fifth aspect of the present invention provides a method for preparing a compound of formula 1-2, which is prepared from a compound of formula B-1 by reduction and cyclization.
Wherein, since the compound of the above formula B-1 exists mostly in the following configuration,
then, after the reaction, most of the compound of formula 1-2 is generated,
a minor portion exists in a configuration such that,
the reducing agent may be a reducing agent known in the art to reduce carbonyl groups to hydroxyl groups. Such as boron-based reducing agents or aluminum-based reducing agents. The cyclizing reagent can be an acid. The acid is an inorganic acid or an organic acid. The inorganic acid is hydrochloric acid or sulfuric acid, and the organic acid is trifluoroacetic acid.
In a sixth aspect, the present invention provides a process for preparing a compound of formula 1-1. Prepared by reacting a compound of formula 0 with a compound of formula a 2.
In particularPreparation of RLA compound of formula 1-1 which is tert-butyldimethylsilyl,
the reaction for preparing the compound of formula 1-1 is carried out in the presence of a base. The alkali is alkyl lithium or a compound with the following structure,
wherein, L1,L2Is alkyl, cycloalkyl or alkylsilyl, and M is a metal atom such as lithium, potassium, sodium, etc.
Specifically, the base is lithium diisopropylamide, lithium cyclohexylamide, lithium hexamethyldisilazide, sodium hexamethyldisilazide, potassium hexamethyldisilazide, lithium hexamethyldisilazide, or n-butyllithium.
Preferably, the base is lithium hexamethyldisilazide or lithium diisopropylamide.
The amount of the base used is usually 2.0 to 3.5mol, preferably 2.2 to 3.0mol, based on 1mol of the compound of formula 0.
The reaction solvent is ether solvent such as diethyl ether, isopropyl ether, methyl tert-butyl ether, tetrahydrofuran, methyl tetrahydrofuran, etc.
The reaction temperature is-78-70 ℃, and is preferably-78-0 ℃.
In a seventh aspect, the invention provides a compound of formula 2, in particular RL1A process for the preparation of a compound of formula 2-1 or formula 2-2 which is hydrogen. Prepared by substituting and reducing a compound of formula 1 or a compound of formula 1-2. The reaction formula is as follows:
the reducing agent may be any reducing agent known in the art for reducing a carbonyl group to a hydroxyl group. Such as boron-based reducing agents, aluminum-based reducing agents, and the like. The boron reducing agent can be boron trifluoride, sodium borohydride or boron trifluoride ethyl ether; the aluminum reducing agent can be lithium aluminum hydride, red aluminum, lithium diisobutyl aluminum hydride, and the like.
The reaction solvent is alcohol solvent such as methanol and ethanol.
The substitution in the above reduction reaction may be with p-chlorobenzoyl chloride, wherein RL1Is p-chlorobenzoyl.
In an eighth aspect, the invention provides a method for preparing (3R,3aS,6aR) -hexahydrofuro [2,3-b ] -3-ol and (3R,3aS,6aS) -hexahydrofuro [2,3-b ] -3-ol which are key intermediates of darunavir. Prepared from the compound of formula 2 by hydrolysis. The reaction formula is as follows:
specifically, the compound of the formula 2-1 is prepared by hydrolysis reaction,
specifically, the compound of the formula 2-2 is prepared by hydrolysis reaction,
the hydrolysis reagent for the hydrolysis reaction may be an acid or a base well known in the art. The acid may be an inorganic acid or an organic acid. The inorganic acid is hydrochloric acid or sulfuric acid; the organic acid is trifluoroacetic acid.
(3R,3aS,6aS) -hexahydrofuro [2,3-b ] -3-ol the darunavir key intermediate (3R,3aS,6aR) -hexahydrofuro [2,3-b ] -3-ol) can be prepared by methods known in the literature, for example in journal literature Bioorganic & Medicinal Chemistry L ets (1996),6(23),2847 and 2852.
Wherein R is4Is phenyl, p-nitrophenyl, methyl, or-NH- (R) -1- (1-naphthalene) ethyl.
Further, the preparation of (3R,3aS,6aR) -hexahydrofuro [2,3-b ] -3-ol and (3R,3aS,6aS) -hexahydrofuro [2,3-b ] -3-ol can be prepared by the compound of formula 1 via one-pot method. I.e., reduction, hydrolysis is carried out in one pot without isolation of the compound of formula 2.
One preferred embodiment of the present invention is:
another preferred embodiment of the present invention is:
wherein R isLPreferably tert-butyl or benzyl, RL1Preferably p-chlorobenzoyl.
In a ninth aspect the invention provides a compound of formula C,
including compounds of formula C1 and compounds of formula C2,
in a tenth aspect, the invention provides a process for the preparation of a compound of formula C, from a compound of formula B.
Since the compounds of formula B-1 above are present for the most part in the following configuration,
after the reaction, the resulting compound of formula C is also present in the following configuration,
a minor portion exists in a configuration such that,
wherein when R is2When hydrogen is used, the reaction can be completed by three processes of deprotection, cyclization and hydrolysis, or by three processes of hydrolysis, deprotection and cyclization, or by the processes of deprotection, hydrolysis and cyclization. I.e. the three processes in any order.
The deprotection reagent is acid or palladium carbon, and the cyclization reagent can be acid, wherein the acid is inorganic acid or organic acid; the hydrolysis reagent is inorganic base.
The inorganic acid is hydrochloric acid or sulfuric acid; the organic acid is trifluoroacetic acid, and the inorganic base is sodium hydroxide, sodium carbonate and the like.
The compound of formula C can also be prepared by reacting a compound of formula A1 with a compound of formula A2, deprotecting, cyclizing and hydrolyzing in any order in one pot,
the invention discloses a method for preparing darunavir key intermediate (3R,3aS,6aR) -hexahydrofuro [2,3-b ] -3-alcohol, which takes a compound of a formula A1 or a compound of a formula 0 aS a starting material,
wherein R is1,R2As defined above. This is in contrast to the starting materials reported in the prior patent literatureIn contrast, the specific preparation method is different from the prior patent literature, but the preparation method can be used for industrially producing the darunavir as the key intermediate.
Detailed Description
For further understanding of the present invention, the following examples are given to illustrate the preparation of hexahydrofurofuranol derivatives, intermediates thereof and the preparation thereof. It is to be understood that these examples are described merely to illustrate the features of the present invention in further detail, and not as limitations of the invention or of the scope of the claims appended hereto.
Example 1: preparation of (3R) -diisopropyl-2- (2- (tert-butoxy) -ethyl) -3-hydroxy
Adding 63ml of L DA (2.1eq) and 30ml of THF (tetrahydrofuran) into a 250ml four-mouth bottle provided with a magnetic stirrer and a thermometer under the protection of nitrogen, cooling to-60 to-70 ℃, dropwise adding isopropyl malate (13.1g and 60mmol), controlling the temperature not to exceed-60 ℃, keeping the internal temperature and stirring for 30min, slowly heating to-20 ℃, taking the mixture for half an hour, then cooling to-60 to-70 ℃, dropwise adding 2-iodoethyl tert-butyl ether (27.4g and 2.0eq), keeping the temperature and stirring for half an hour after dropwise adding, heating to-20 ℃, stirring overnight, adding 90ml of water and 40ml of ethyl acetate into a reaction system, stirring for 5min, standing for layering, extracting an aqueous phase with (40ml of × 3) ethyl acetate, combining organic layers, drying with magnesium sulfate, filtering, concentrating to obtain 28.54g of a product, separating part of the product through a column to obtain an oily substance, determining the target compound, wherein the yield is 80%. the product spectrogram data is as follows:
1H NMR(400.2MHz,CDCl3)5.10(1H,m),5.01(1H,m),4.31(1H,m),3.54(1H,d,J=7.2Hz),3.46(2H,m),3.06(1H,m),2.13(1H,m),1.86(1H,m),1.29(6H,d,J=2.8Hz),1.27(6H,d,J=2.8Hz),1.18(9H,s);
13C NMR(100.6MHz,CDCl3)172.8(d,J=8.8Hz),171.45(d,J=36.8Hz),72.83(d,J=5.9Hz),71.18(d,J=37.3Hz),69.48(t,J=8.2Hz),68.1(d,J=8.2Hz),58.88(s),45.67ppm(s), 28.59(s),27.34ppm(s), 21.58 ppm(s); mass Spectrometry (ESI method) C16H30O6(M)+Calculated value 318.20 measured value 319.2
Example 2: preparation of (3R) -diethyl-2- (2- (tert-butoxy) -ethyl) -3-hydroxy
Adding 42ml of L DA (2.1eq) and 20ml of THF (tetrahydrofuran) into a 250ml four-mouth bottle provided with a magnetic stirrer and a thermometer under the protection of nitrogen, cooling to-60 to-70 ℃, dropwise adding ethyl malate (7.5g and 40mmol), controlling the temperature not to exceed-60 ℃, after dropwise adding, maintaining the internal temperature and stirring for 30min, slowly heating to-20 ℃, taking for half an hour, then cooling to-60 to-70 ℃, dropwise adding 2-iodoethyl tert-butyl ether (9.58g and 2.0eq), after stirring for half an hour after dropwise adding, heating to-20 ℃, stirring overnight, adding 90ml of water and 40ml of ethyl acetate into a reaction system, stirring for 5min, standing for demixing, extracting an aqueous phase with (40ml of × 3) ethyl acetate, combining organic layers, drying with magnesium sulfate, filtering, concentrating to obtain 7.49g of a product, taking a part of the product to pass through a column for oily separation, determining the target compound to have the yield of 60%, wherein the product spectrogram data are as follows:
1H NMR(400.2MHz,CDCl3)4.30(1H,m),4.20(2H,m),4.11(2H,m),3.52(1H,m),3.49(2H,m),3.10(1H,m),2.12(1H,m),1.88(1H,m),1.31(6H,d,J=2.8Hz),1.27(6H,d,J=2.8Hz),1.15(9H,s)。
example 3: preparation of (3R) -diisopropylmethyl-2- (2- (trimethylsiloxy) -ethyl) -3-hydroxy
Compounds of formula B-1 wherein the protecting group is trimethylsilyl can be prepared as in example 1 or 2.
Example 4:
compounds of formula B-1 wherein the protecting group is benzyl can be prepared as in example 1 or 2.
Example 5:
the compound of formula B-1, wherein the protecting group is hydrogen, can be prepared by deprotection, and the product spectrogram data is as follows:
1H NMR(400.2MHz,CDCl3)5.14(1H,m),5.04(1H,m),4.53(2H,m),4.28(1H,s),3.22(1H,m),3.02(1H,m),2.60(1H,m),2.35(1H,m),1.29(6H,m),1.25(6H,m);
mass Spectrometry (ESI method) C12H22O6(M)+Calculated 262.29, measured 263.2.
Example 6: preparation of Compounds of formula C
300mg of (3R) -diisopropyl-2- (2- (tert-butoxy) -ethyl) -3-hydroxy and 1ml of trifluoroacetic acid were added to a 50ml two-necked flask, and the mixture was cooled to-10 to-5 ℃ and stirred overnight, the trifluoroacetic acid was distilled off at low temperature, an aqueous sodium hydroxide solution and tetrahydrofuran were added thereto and stirred at room temperature for 6 hours, then diluted hydrochloric acid was used to adjust pH to 2, ethyl acetate was extracted, the solvent was evaporated, toluene was added thereto and evaporated to dryness at normal pressure, and this operation was repeated 2 times to obtain 127mg of a white solid with a yield of 80%, and the target compound was identified by nuclear magnetic resonance. The product spectrum data is as follows:
1H NMR(400.2MHz,DMSO-d6)4.25(3H,m),3.13(1H,m),2.33(1H,m),2.13(1H,m)。
mass Spectrometry (ESI method) C6H8O5(M)-Calculated 160.1 measured 159.1.
Example 7:
Sodium borohydride and THF are put into a reaction bottle, stirred after being cooled to-10-15 ℃ under the protection of nitrogen, and R is dripped under the protection of nitrogenLA compound of formula B/THF solution which is tert-butyl,controlling the temperature to be minus 10 ℃ to minus 5 ℃, keeping the temperature, beginning to drip acetic acid, controlling the temperature to be minus 10 ℃ to minus 5 ℃, heating to 20 ℃ to 25 ℃, keeping the temperature, cooling to be minus 10 ℃ to minus 5 ℃, dripping water, controlling the temperature to be minus 10 ℃ to minus 5 ℃, stirring after the dripping is finished until the T L C raw material reacts, heating to be 0 ℃ to 5 ℃, adding dichloromethane for extraction, layering, and decompressing and concentrating the organic layer at 50 ℃ to 55 ℃ to obtain 16.5g of oily substance, putting the oily substance into a reaction bottle, adding THF (tetrahydrofuran) and p-toluenesulfonic acid, stirring, heating to be 75 ℃ to 80 ℃, refluxing for 16 h to 18h, and cooling T L C until the raw material reacts, decompressing and concentrating at 55 ℃ to 60 ℃ until no distillate drips, cooling the reaction liquid to be 0 ℃ to 5 ℃, adding water and DCM (DCM) for stirring, layering, collecting the organic layer, decompressing and concentrating until no distillate drips at 50 ℃ to 55 ℃, and obtaining the oily substance with the yield of 11.7 g.
Example 8:
Adding the oily substance in example 7, DCM and p-chlorobenzoyl chloride into a reaction bottle, stirring, dropwise adding triethylamine, controlling the temperature to be 20-25 ℃, and controlling T L C until the raw materials react, cooling, adding 100ml of water, standing, layering to obtain an organic layer, concentrating under reduced pressure at 55-60 ℃ to remove the solvent, crystallizing with EA and hexane to obtain 20g of a product with the yield of 90%, adding the crystallized product into the reaction bottle, stirring and cooling to-65-70 ℃ under the protection of THF nitrogen, dropwise adding diisobutyl aluminum lithium hydride and T L C until the raw materials react, cooling, adding 100ml of methanol and boron ethyl ether 10g, stirring at 20-25 ℃ for 16-18h, concentrating under reduced pressure at 50-55 ℃ until no distillation liquid is obtained, obtaining 28g of the product, and directly preparing (3R,3aS,6aR) -hexahydrofuro [2,3-b ] -3-alcohol without separation.
Example 9:
RL1is p-chlorobenzoyl, RLFeeding the compound of formula 2-2 (R) as a tert-butyl group into a reaction flaskL1Is p-chlorobenzoyl, RLIs tert-butyl), THF, hydrochloric acid and water are stirred and reacted at 0-5 ℃ until the raw materialsAfter the solution disappears, cooling, adding dichloromethane, extracting, layering, collecting organic layer, concentrating under reduced pressure at 50-55 deg.C until no distillate is dropped to obtain product (3R,3aS,6aR) -hexahydrofuro [2,3-b ]]7.8g of (E) -3-ol. The total yield was 87%.
Example 10:
a four-necked flask was charged with 15g of compound of formula 0, DMPU18.8g, THF10 ml. N is a radical of2Protecting, cooling to-78-80 ℃, dripping HMDS L i 407ml, controlling the temperature to-70-65 ℃, keeping the temperature for 1h after dripping, dripping 15.4g of 2-iodoethyl tert-butyl dimethyl silicon ether of the compound of the formula A, controlling the temperature to-65-60 ℃, keeping the temperature for 4h after dripping, finishing the reaction of the T L C raw material, quenching by using NaCl30ml saturated aqueous solution, extracting a water layer by layering 20ml of ethyl acetate, combining organic layers, concentrating until the target product is dried, obtaining the yield of 75 percent and the purity of 98 percent.
DMPU is 1, 3-dimethyl-3, 4,5, 6-tetrahydro-2-pyrimidone, HMDS L i lithium hexamethyldisilazide
Example 11:
a reaction flask was charged with the compound of formula 1-1 (R)LTert-butyldimethylsilyl), THF, nitrogen protection, cooling to-65- -70 deg.C, dropwise adding diisobutyl lithium aluminum hydride, T L C until the reaction of the raw materials is completed, adding 100ml methanol and 10g boron trifluoride diethyl etherate, stirring at 20-25 deg.C for 16-18h, concentrating under reduced pressure at 50-55 deg.C to remove the solvent, and extracting with DCM to obtain 21.4g of the product with 85% yield.
DCM: methylene dichloride
Example 12:
a250 ml four-necked flask was charged with the 2-1 compound (R)LTert-butyldimethylsilyl), THF, cooling to 0-5 deg.C, adding 30% hydrochloric acid 10g, reacting at 0-5 deg.C until the raw material disappears, adding carbonic acidNeutralizing with sodium hydrogen to pH 7-8, filtering to remove solid, extracting with DCM and removing solvent to obtain (3R,3aS,6aS) -hexahydrofuro [2,3-b ]]7.99g of the (E) -3-ol was obtained in a yield of 85%.
Claims (16)
1. A compound having the following general formula B:
wherein R is1,R2Is hydrogen, the same or different is a carboxyl protecting group which is an alkyl, silyl or substituted phenyl group; rLIs hydrogen or a hydroxy protecting group; the hydroxyl protecting group is alkyl, silyl, substituted phenyl or aryl.
4. A compound as claimed in claim 1, 2 or 3 wherein R1,R2Identical or different from hydrogen, benzyl, methyl, ethyl, n-propyl, isopropyl or tert-butylA group; the silyl is trimethylsilyl, triethylsilyl, tri-n-butylsilyl or tert-butyldimethylsilyl; the aryl is phenyl, furyl, thienyl or indolyl; the substituted phenyl is alkyl substituted phenyl, alkoxy alkyl substituted phenyl and nitro alkyl substituted phenyl.
6. A preparation method of a compound shown in a formula 2 is characterized in that the compound shown in the formula B-1 is prepared by substitution and reduction after being prepared by reduction and cyclization,
wherein R isLAs defined in claim 1; r3Is an alkyl group; rL1Is hydrogen or p-chlorobenzoyl.
12. the preparation method of the compound shown in the formula B is characterized in that the compound is prepared by reacting the compound shown in the formula A1 with the compound shown in the formula A2,
wherein R is1,R2,RLThe same as defined in claim 1, wherein X is a leaving group, and the leaving group is a halogen atom, a methanesulfonyloxy group, a trifluoromethanesulfonyloxy group, a p-toluenesulfonyloxy group, or a benzenesulfonyloxy group.
13. The method according to claim 12, wherein X is an iodine atom and R is an iodine atom1,R2Identical or different methyl, ethyl, isopropyl, tert-butyl, benzyl; the R isLIs tert-butyl, trimethylsilyl, benzyl or benzhydryl.
15. The preparation method of the compound of the formula C is characterized in that the compound of the formula C is prepared by reacting a compound of a formula A1 with a compound of a formula A2, and then carrying out deprotection, cyclization and hydrolysis in any order in one-pot reaction,
wherein R is1,R2,RLAs defined in claim 1.
16. The method of claim 12, wherein the reaction of the A1 compound with the A2 compound is carried out in the presence of a base, wherein the base is an alkyl lithium or a compound of the structure,
wherein, L1,L2Is alkyl, cycloalkyl, silicon-substituted alkyl, M is a metal atom, wherein the metal atom is lithium, potassium or sodium.
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