CN111366751A - Cantilever beam acceleration detection meter and system based on silicon waveguide coupling characteristics - Google Patents
Cantilever beam acceleration detection meter and system based on silicon waveguide coupling characteristics Download PDFInfo
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- CN111366751A CN111366751A CN202010211125.4A CN202010211125A CN111366751A CN 111366751 A CN111366751 A CN 111366751A CN 202010211125 A CN202010211125 A CN 202010211125A CN 111366751 A CN111366751 A CN 111366751A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/03—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses by using non-electrical means
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Abstract
The invention relates to a cantilever beam acceleration detector and a cantilever beam acceleration detection system based on silicon waveguide coupling characteristics, and mainly relates to the field of acceleration measurement. The waveguide of the present application is a "U" shaped waveguide in which light is coupled into a resonant cavity in the form of a surface wave in the bottom side, and light whose bottom side satisfies a resonance condition resonates in the resonant cavity. When the system is under the action of external force, the first cantilever beam and the second cantilever beam are deformed under the action of inertial force under the action of acceleration, so that the resonant cavity in the bottom edge of the U-shaped waveguide is slightly deformed, the effective refractive index of the U-shaped waveguide is changed, the resonant peak of the U-shaped waveguide is deviated, the corresponding acceleration value can be calibrated by measuring the deviation amount generated by a resonant point, and the resonant cavity is very sensitive to the weak deformation of the first cantilever beam and the second cantilever beam, so that the system can be used for manufacturing the accelerometer with high sensitivity and high resolution.
Description
Technical Field
The invention relates to the field of acceleration measurement, in particular to a cantilever beam acceleration detector and a system based on silicon waveguide coupling characteristics.
Background
In recent years, accelerometers have been widely used in various fields such as automobile industry, robots, wearable devices, engineering vibration measurement, geological exploration, navigation systems, aerospace, and the like, and accelerometers are used for products requiring sensing of small changes caused by falling, tilting, moving, positioning, impacting or vibration.
In the prior art, most of sensing units arranged on a cantilever beam of an accelerometer cantilever beam type accelerometer are integrated capacitors, piezoresistors and the like, and the displacement of a mass block is measured by detecting the voltage or current change of the sensing units.
However, the performance parameters such as resolution, sensitivity and the like of the cantilever beam type accelerometer based on the sensing elements are not easy to improve.
Disclosure of Invention
The present invention is directed to overcome the above-mentioned shortcomings of the prior art, and an object of the present invention is to provide an cantilever type accelerometer that solves the problem of the prior art that performance parameters such as resolution and sensitivity are not easily improved.
In order to achieve the above purpose, the embodiment of the present invention adopts the following technical solutions:
in a first aspect, the present application provides a cantilever accelerometer based on silicon waveguide coupling characteristics, the cantilever accelerometer comprising: the device comprises a first substrate, a second substrate, a first cantilever beam, a second cantilever beam, a waveguide and a noble metal layer; the first substrate and the second substrate are arranged oppositely, the first cantilever beam and the second cantilever beam are arranged between the first substrate and the second substrate oppositely, a space exists between the first cantilever beam and the second cantilever beam, the waveguide is a U-shaped waveguide, two opposite edges of the U-shaped waveguide are arranged in the first waveguide and the second waveguide respectively, the bottom edge of the U-shaped waveguide is arranged on one side, close to the second cantilever beam, of the first cantilever beam, the bottom edge of the U-shaped waveguide, the second cantilever beam, the first substrate and the second substrate form a closed space, and the precious metal layer is arranged in the closed space and is arranged close to the second cantilever beam.
Optionally, the noble metal layer has a thickness greater than one wavelength of light transmitted within the waveguide.
Optionally, the noble metal layer is spaced from the bottom edge of the "U" shaped waveguide by less than half the wavelength of light transmitted within the waveguide.
Optionally, the width of the first cantilever beam is smaller than the width of the second cantilever beam.
Optionally, the cantilever accelerometer further comprises a transparent elastic layer, and the transparent elastic layer is arranged on one side of the noble metal layer close to the waveguide.
Optionally, the cantilever accelerometer further comprises a low-refractive insulating layer disposed between the first cantilever and the waveguide.
Optionally, the material of the low-refractive-index insulating layer is magnesium fluoride.
Optionally, the waveguide is a silicon waveguide or an optical fiber.
Optionally, the first substrate, the second substrate, the first cantilever beam, and the second cantilever beam are all made of silicon material.
In a second aspect, the present application provides a cantilever acceleration detection system based on silicon waveguide coupling characteristics, the cantilever acceleration detection system includes: a light source, a spectrometer and the cantilever accelerometer of any of the first aspect, the light source and the spectrometer being arranged at respective ends of a waveguide of the cantilever accelerometer.
The invention has the beneficial effects that:
the cantilever beam acceleration detection meter based on the silicon waveguide coupling characteristic comprises: the waveguide comprises a first substrate, a second substrate, a first cantilever beam, a second cantilever beam, a waveguide and a noble metal layer, wherein the waveguide is a U-shaped waveguide, light is coupled into a resonant cavity in a surface wave mode in the bottom edge of the U-shaped waveguide, and the light with the bottom edge meeting the resonance condition of the U-shaped waveguide resonates in the resonant cavity. When the system is under the action of external force, the first cantilever beam and the second cantilever beam are deformed under the action of inertial force under the action of acceleration, so that the resonant cavity in the bottom edge of the U-shaped waveguide is slightly deformed, the effective refractive index of the U-shaped waveguide is changed, the resonant peak of the U-shaped waveguide is deviated, the corresponding acceleration value can be calibrated by measuring the deviation amount generated by a resonant point, and the resonant cavity is very sensitive to the weak deformation of the first cantilever beam and the second cantilever beam, so that the system can be used for manufacturing the accelerometer with high sensitivity and high resolution.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.
Fig. 1 is a schematic structural diagram of a cantilever acceleration detector based on a silicon waveguide coupling characteristic according to an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of another cantilever accelerometer based on coupling characteristics of a silicon waveguide according to an embodiment of the present invention;
fig. 3 is a schematic structural diagram of another cantilever accelerometer based on coupling characteristics of a silicon waveguide according to an embodiment of the present invention.
Icon: 10-a first substrate; 20-a second substrate; 30-a first cantilever beam; 40-a second cantilever beam; 50-a waveguide; 60-a noble metal layer; 70-a transparent elastic layer; 80-Low refractive insulating layer.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiment is a metal plate embodiment of the present invention, and not all embodiments. The components of embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the present invention, presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings or the orientations or positional relationships that the products of the present invention are conventionally placed in use, and are only used for convenience in describing the present invention and simplifying the description, but do not indicate or imply that the devices or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," "third," and the like are used solely to distinguish one from another and are not to be construed as indicating or implying relative importance.
Furthermore, the terms "horizontal", "vertical" and the like do not imply that the components are required to be absolutely horizontal or pendant, but rather may be slightly inclined. For example, "horizontal" merely means that the direction is more horizontal than "vertical" and does not mean that the structure must be perfectly horizontal, but may be slightly inclined.
In the description of the present invention, it should also be noted that, unless otherwise explicitly specified or limited, the terms "disposed," "mounted," "connected," and "connected" are to be construed broadly and may, for example, be fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
In order to make the implementation of the present invention clearer, the following detailed description is made with reference to the accompanying drawings.
Fig. 1 is a schematic structural diagram of a cantilever acceleration detector based on a silicon waveguide coupling characteristic according to an embodiment of the present invention, and as shown in fig. 1, the present application provides a cantilever acceleration detector based on a silicon waveguide coupling characteristic, where a cantilever accelerometer includes: the first substrate 10, the second substrate 20, the first cantilever beam 30, the second cantilever beam 40, the waveguide 50 and the noble metal layer 60; the first substrate 10 and the second substrate 20 are oppositely arranged, the first cantilever beam 30 and the second cantilever beam 40 are oppositely arranged between the first substrate 10 and the second substrate 20, a space exists between the first cantilever beam 30 and the second cantilever beam 40, the waveguide 50 is a 'U' -shaped waveguide 50, two opposite edges of the 'U' -shaped waveguide 50 are respectively arranged in the first waveguide 50 and the second waveguide 50, the bottom edge of the 'U' -shaped waveguide 50 is arranged on one side of the first cantilever beam 30 close to the second cantilever beam 40, the bottom edge of the 'U' -shaped waveguide 50, the second cantilever beam 40, the first substrate 10 and the second substrate 20 form a closed space, and the noble metal layer 60 is arranged in the closed space and is closely attached to the second cantilever beam 40.
The waveguide 50 is a "U" shaped waveguide 50, since the first substrate 10 and the second substrate 20 are parallel to each other, the first cantilever beam 30 and the second cantilever beam 40 are parallel to each other, and there is a space between the first cantilever beam 30 and the second cantilever beam, the first substrate 10, the second substrate 20, the first cantilever beam 30 and the second cantilever beam 40 form an i-shaped structure with a gap in between, generally, the length of the space between the first cantilever beam 30 and the second cantilever beam 40 is the same as the length of the first cantilever beam 30 and the second cantilever beam 40, the width of the space (i.e. the distance between the first cantilever beam 30 and the second cantilever beam 40) is set according to the actual situation, and is not particularly limited herein, generally, the width of the space is not more than one wavelength of the light transmitted in the waveguide 50, the kind of the light transmitted in the waveguide 50 is selected according to the actual situation, the transmitted light in the waveguide 50 may be light with any wavelength, two opposite edges of the "U" -shaped waveguide 50 are respectively disposed in the first substrate 10 and the second substrate 20, in general, one end of the first substrate 10 and the second substrate 20 near the second cantilever beam 40 may be provided with a groove for accommodating two opposite edges of the "U" -shaped waveguide 50, two opposite edges of the "U" -shaped waveguide 50 are disposed in the grooves of the first cantilever beam 30 and the second cantilever beam 40, a bottom edge of the "U" -shaped waveguide 50 is closely attached to one side of the first cantilever beam 30 near the second cantilever beam 40, so that the "U" -shaped waveguide 50 accommodates the second cantilever beam 40 in the space in the "U" -shaped waveguide 50, the noble metal layer 60 is disposed closely attached to the second cantilever beam 40 and is disposed on one side of the second cantilever beam 40 near the first cantilever beam 40, the volume and the material of the noble metal layer 60 are disposed according to actual requirements, the material of the noble metal layer 60 can be any one or more of gold, silver, ruthenium, rhodium, palladium, osmium, iridium, and platinum, and if the material of the noble metal layer 60 is a mixed metal of a combination of a plurality of noble metals, the mixing ratio of the mixed metals is determined according to actual needs, when acceleration is to be measured, one end of the waveguide 50 of the cantilever accelerometer is fed with input light, the light enters the bottom edge of the "U" shaped waveguide 50 after passing through one side edge of the waveguide 50, and since the bottom edge of the "U" shaped waveguide 50 has two singular points, so that the bottom edge of the "U" shaped waveguide 50 forms a resonant cavity, the reflection of light can propagate in the bottom edge of the "U" shaped waveguide 50, and the light is coupled into the resonant cavity in the form of surface waves, the light whose bottom side of the "U" -shaped waveguide 50 satisfies the resonance condition resonates in the resonance chamber. When the system is acted by external force, under the action of acceleration, the first cantilever beam 30 and the second cantilever beam 40 are deformed by the action of inertia force, so that the resonant cavity in the bottom edge of the U-shaped waveguide 50 is slightly deformed, further, the effective refractive index of the U-shaped waveguide 50 is changed, the resonance peak of the U-shaped waveguide 50 is shifted, and the corresponding acceleration value can be calibrated by measuring the offset generated by the resonance point, it should be noted that the corresponding relation between the offset generated by the resonance point and the acceleration value is obtained according to experimental measurement and is not particularly limited, and because the bottom edge of the U-shaped waveguide 50 is tightly attached to the first cantilever beam 30, namely, the resonant cavity in the U-shaped waveguide 50 is very sensitive to the weak deformation of the first cantilever beam 30 and the second cantilever beam 40, the system can be used for manufacturing high-sensitivity high-resolution accelerometers, therefore, the invention has the advantage of high sensitivity.
Generally, other structures can be arranged on the bottom side of the U-shaped waveguide 50, so that a plurality of singular points are formed in the bottom side of the U-shaped waveguide 50, a plurality of resonant cavities are formed on the bottom side of the U-shaped waveguide 50, the deviation of resonant peaks of the plurality of resonant cavities is detected by detecting the change of effective refractive indexes of the plurality of resonant cavities, and the corresponding acceleration value can be calibrated more accurately by measuring the deviation amount generated by the plurality of resonant points, so that the monitoring of the acceleration is more accurate.
Optionally, the noble metal layer 60 has a thickness greater than one wavelength of light transmitted within the waveguide 50.
Since the noble metal layer 60 is directly disposed on the side of the second cantilever 40 close to the first cantilever 30, the thickness of the noble metal can be set to be greater than one wavelength of the light transmitted in the waveguide 50, and the light transmitted in the waveguide 50 can be any light, and the thickness of the noble metal layer 60 can be set to be greater than the wavelength of the longest light.
Optionally, the noble metal layer 60 is spaced from the bottom edge of the "U" shaped waveguide 50 by less than half the wavelength of light propagating within the waveguide 50.
Compared with other methods for detecting acceleration, the method has the following advantages that the effective refractive index of the electromagnetic wave propagating on two adjacent structures is seriously influenced by the distance between the first cantilever beam 30 and the second cantilever beam 40, namely the refractive index of the electromagnetic wave propagating on the waveguide 50 between the first cantilever beam 30 and the second cantilever beam 40 is seriously influenced by the distance between the waveguide 50 and the second cantilever beam 40, so the distance between the noble metal layer 60 and the bottom edge of the U-shaped waveguide 50 is smaller than half the wavelength of the light transmitted in the waveguide 50, and the measurement of the acceleration is more accurate.
Optionally, the width of the first cantilevered beam 30 is less than the width of the second cantilevered beam 40.
The first cantilever beam 30 and the second cantilever beam 40 have different widths, in order to ensure that the first cantilever beam and the second cantilever beam 40 have different deformation when deforming, because the first cantilever beam 30 and the second cantilever beam 40 have different thicknesses, the deformation of the first cantilever beam 30 and the second cantilever beam 40 is different, and further the effective refractive index of the U-shaped waveguide 50 is more accurately changed, thereby leading the resonance peak of the U-shaped waveguide 50 to be accurately deflected, and more accurate acceleration value can be calibrated by measuring the deflection generated by a resonance point.
Fig. 2 is a schematic structural diagram of another cantilever accelerometer based on coupling characteristics of a silicon waveguide according to an embodiment of the present invention, as shown in fig. 2, optionally, the cantilever accelerometer further includes a transparent elastic layer 70, and the transparent elastic layer 70 is disposed on a side of the noble metal layer 60 close to the waveguide 50.
The transparent elastic layer 70 is disposed on the surface of the noble metal layer 60, and when the acceleration is relatively large, the first cantilever beam 30 deforms, so that the waveguide 50 deforms, and further the transparent elastic layer 70 is compressed, and the thickness of the transparent elastic layer 70 is changed, instead of the waveguide 50 directly contacting the noble metal layer 60; if the noble metal layer 60 is directly contacted, the acceleration measurement reaches the upper limit of the measurement, the thickness of the transparent elastic layer 70 is less than half a wavelength, so that when the transparent elastic layer 70 is not compressed, the noble metal layer 60 and the waveguide 50 can generate strong coupling, generally, the material of the transparent elastic layer 70 is polymethyl methacrylate (PMMA), also called Acrylic, Acrylic or plexiglass, Lucite (trade name), and is called pressure application in taiwan, and is called as applied force glue in hong kong, so that the transparent elastic layer has the advantages of high transparency, low price, easy machining and the like, and is a glass substitute material which is often used in common.
Fig. 3 is a schematic structural diagram of another cantilever accelerometer based on coupling characteristics of a silicon waveguide according to an embodiment of the present invention, as shown in fig. 3, optionally, the cantilever accelerometer further includes a low-refraction insulating layer 80, and the low-refraction insulating layer 80 is disposed between the first cantilever 30 and the waveguide 50.
The low-refraction insulating layer 80 is arranged between the first cantilever beam 30 and the waveguide 50, and the thickness of the low-refraction insulating layer 80 can reach the edge of the first cantilever beam 30, so that on one hand, the effective mode area of the waveguide 50 is limited, more energy is concentrated in the waveguide 50, a stronger electric field is formed on one side of the waveguide 50 relative to a noble metal film, and the stronger electric field is better coupled with the noble metal film; on the other hand, the mass of the first cantilever beam 30 is increased, and larger bending can be generated under the same acceleration, so that the detection sensitivity is improved.
Optionally, the material of the low-refractive insulating layer 80 is magnesium fluoride.
Optionally, the waveguide 50 is a silicon waveguide 50 or an optical fiber.
The waveguide 50 may be a silicon waveguide 50, or may be an optical fiber, which is not specifically limited herein.
Optionally, the first substrate 10, the second substrate 20, the first cantilever beam 30, and the second cantilever beam 40 are made of silicon material.
The materials of the first substrate 10, the second substrate 20, the first cantilever beam 30 and the second cantilever beam 40 may all be the same, that is, the first substrate 10, the second substrate 20, the first cantilever beam 30 and the second cantilever beam 40 may be made of silicon material.
The cantilever beam acceleration detection meter based on the silicon waveguide coupling characteristic comprises: the waveguide comprises a first substrate 10, a second substrate 20, a first cantilever beam 30, a second cantilever beam 40, a waveguide 50 and a noble metal layer 60, wherein the waveguide 50 is a U-shaped waveguide 50, light is coupled into a resonant cavity in the form of surface waves in the bottom edge of the U-shaped waveguide 50, and the light with the bottom edge of the U-shaped waveguide 50 meeting a resonance condition resonates in the resonant cavity. When the system is under the action of external force, under the action of acceleration, the first cantilever beam 30 and the second cantilever beam 40 are deformed under the action of inertia force, so that the resonant cavity in the bottom edge of the U-shaped waveguide 50 is slightly deformed, the effective refractive index of the U-shaped waveguide 50 is changed, the resonant peak of the U-shaped waveguide 50 is deviated, the corresponding acceleration value can be calibrated by measuring the deviation amount generated by the resonant point, and the resonant cavity is very sensitive to the weak deformation of the first cantilever beam 30 and the second cantilever beam 40, so that the system can be used for manufacturing accelerometers with high sensitivity and high resolution.
The application provides still a cantilever beam acceleration detecting system based on silicon waveguide coupling characteristic, cantilever beam acceleration detecting system includes: a light source, a spectrometer and any of the above mentioned cantilever accelerometers, the light source and spectrometer being arranged at respective ends of a waveguide 50 of the cantilever accelerometer.
The above is only a preferred embodiment of the present invention, and is not intended to limit the present invention, and various modifications and changes will occur to those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. A cantilever accelerometer based on silicon waveguide coupling characteristics, comprising: the device comprises a first substrate, a second substrate, a first cantilever beam, a second cantilever beam, a waveguide and a noble metal layer; the first substrate and the second substrate are arranged oppositely, the first cantilever beam and the second cantilever beam are arranged oppositely between the first substrate and the second substrate, a space is formed between the first cantilever beam and the second cantilever beam, the waveguide is a U-shaped waveguide, two opposite edges of the U-shaped waveguide are respectively arranged in the first waveguide and the second waveguide, the bottom edge of the U-shaped waveguide is arranged on one side of the first cantilever beam close to the second cantilever beam, the bottom edge of the U-shaped waveguide, the second cantilever beam, the first substrate and the second substrate form a closed space, and the precious metal layer is arranged in the closed space and is tightly attached to the second cantilever beam.
2. The silicon waveguide coupling characteristic based cantilever accelerometer of claim 1, wherein the thickness of the noble metal layer is greater than one wavelength of light transmitted within the waveguide.
3. The silicon waveguide coupling characteristic based cantilever accelerometer of claim 2, wherein the noble metal layer is located less than half a wavelength of light transmitted within the waveguide from the bottom edge of the "U" shaped waveguide.
4. The cantilever accelerometer of claim 1, wherein the first cantilever beam has a width less than a width of the second cantilever beam.
5. The cantilever accelerometer of claim 1, wherein the cantilever accelerometer further comprises a transparent elastic layer disposed on a side of the noble metal layer proximate the waveguide.
6. The cantilever accelerometer of claim 1, further comprising a low-refraction insulating layer disposed between the first cantilever and the waveguide.
7. The cantilever accelerometer of claim 6, wherein the material of the low-refraction insulating layer is magnesium fluoride.
8. The cantilever accelerometer based on coupling characteristics of silicon waveguide of claim 6, wherein the waveguide is a silicon waveguide or an optical fiber.
9. The cantilever accelerometer according to claim 6, wherein the first substrate, the second substrate, the first cantilever beam and the second cantilever beam are all made of silicon material.
10. A cantilever acceleration detection system based on silicon waveguide coupling characteristics, characterized in that the cantilever acceleration detection system comprises: a light source, a spectrometer and the cantilever accelerometer of any one of claims 1-9, the light source and the spectrometer being disposed at respective ends of a waveguide of the cantilever accelerometer.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010211125.4A CN111366751A (en) | 2020-03-24 | 2020-03-24 | Cantilever beam acceleration detection meter and system based on silicon waveguide coupling characteristics |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202010211125.4A CN111366751A (en) | 2020-03-24 | 2020-03-24 | Cantilever beam acceleration detection meter and system based on silicon waveguide coupling characteristics |
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Application publication date: 20200703 |