CN111351430B - Semiconductor laser motion error measuring system and method based on automatic beam stabilization - Google Patents
Semiconductor laser motion error measuring system and method based on automatic beam stabilization Download PDFInfo
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- G01B11/00—Measuring arrangements characterised by the use of optical techniques
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
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Abstract
The invention belongs to the technical field of motion precision measurement of linear guide rails, and particularly discloses a semiconductor laser motion error measurement system and method based on automatic light beam stabilization, wherein the system comprises the following steps: the device comprises a long-distance four-degree-of-freedom error measuring module and a light beam stabilizing module. In the long-distance four-degree-of-freedom error measuring module, the straightness error and the angle error are carried out based on a laser collimation principle and a laser auto-collimation principle. In the light beam stabilizing module, after the near-end parallel drift feedback source and the far-end angle drift feedback source receive light beam drift signals, the signals are fed back to the two right-angle reflecting mirrors with the angles controllable by the PZT through the control circuit, and the light beam stabilizing module is used for compensating and inhibiting the light beam stability in a measuring range. The measuring system adopts the semiconductor laser, has the advantages of low cost, small volume and simple structure of designed optical path, is easy to integrate on a linear platform, and realizes online error measurement. The light beam stabilizing module can reduce light beam drift and effectively improve the measurement precision and stability.
Description
Technical Field
The invention belongs to the technical field of positioning precision measurement of a motion platform, and particularly relates to a long-distance semiconductor laser four-degree-of-freedom motion error measurement system and method with a light beam stabilizing function.
Background
The numerical control machine tool has an extremely important position in the fields of national defense, military industry, aerospace, civil production and the like, and the precision of the motion platform directly influences the processing precision of the numerical control motion platform.
Because the processing technology and the assembly mode have inevitable deviation, the motion platform always has a geometric motion error with six degrees of freedom: the position error along the axial direction, two straightness errors (horizontal straightness error and vertical straightness error) perpendicular to the axial direction, and three angular errors (pitch angle error, yaw angle error and roll angle error) rotating around the shaft.
There are many systems that are capable of simultaneously measuring multiple degrees of freedom geometric motion errors. Interferometric-based measurement systems, such as grating diffraction interferometry and laser synthetic wavelength interferometry, have achieved linear displacement resolution superior to sub-nanometer and angular displacement resolution of about sub-radian. However, the measurement system based on the interference principle is complicated in apparatus and the optical path adjustment process. In contrast, a measurement system based on the non-interference principle has many advantages over a measurement system based on the interference principle, such as a simple structure, easy adjustment, a large measurement range, and the like. Therefore, it is widely used to measure the motion error of precision machines such as numerical control machines and coordinate measuring machines.
In the above-mentioned measuring system based on the non-interference principle, the laser source of the system usually adopts a helium-neon laser with better beam quality. However, the helium-neon laser has a large volume, so that the measurement system also has a large volume, and cannot be integrated on a moving platform for online error measurement. In addition, the cost is high. The semiconductor laser has small volume and low cost, and is easy to realize online error measurement. However, semiconductor lasers always have the physical phenomenon of laser beam deviation, which affects the stability and measurement accuracy of the system. Therefore, compensating and suppressing the laser beam offset in real time is a necessary condition for improving the stability and measurement accuracy of the measurement system based on the non-interference principle.
Disclosure of Invention
In view of the above problems in the prior art, the present invention provides a semiconductor laser motion error measurement system based on automatic beam stabilization, in which a straightness error and an angle error are performed based on a laser collimation principle and a laser auto-collimation principle in a four-degree-of-freedom error measurement module. In the light beam stabilizing module, after the near-end parallel drift feedback source and the far-end angle drift feedback source receive light beam drift signals, the signals are fed back to the two right-angle reflecting mirrors with the angles controllable by the PZT through the control circuit, and the light beam stabilizing module is used for compensating and inhibiting the light beam stability in a measuring range.
The specific technical scheme is as follows:
the system comprises a four-degree-of-freedom error measuring module and a light beam stabilizing module, wherein:
the four-degree-of-freedom error measurement module comprises a semiconductor laser, a first right-angle reflector, a second right-angle reflector, a first beam splitter prism, a first four-quadrant photoelectric detector, a third right-angle reflector, a first focusing lens and a second four-quadrant photoelectric detector. Light beams generated by the semiconductor laser are reflected by the first right-angle reflecting mirror and the second right-angle reflecting mirror and then parallelly emitted into the second light splitting prism and the third light splitting prism, transmitted light of the second light splitting prism is emitted into the first light splitting prism, the transmitted light of the first light splitting prism is received by the first four-quadrant photoelectric detector, and light spot displacement detected by the first four-quadrant photoelectric detector is used as a two-dimensional linearity error of the motion platform; and the reflected light of the first light splitting prism is reflected into a second four-quadrant photoelectric detector after passing through a third right-angle reflecting mirror and the first focusing lens, and the displacement of a light spot detected by the second four-quadrant photoelectric detector is used as a pitch angle error and a yaw angle error of the motion platform.
The light beam stabilizing module comprises a first right-angle reflecting mirror, a second light splitting prism, a third four-quadrant photoelectric detector, a third light splitting prism, a fourth right-angle reflecting mirror, a second focusing lens and a fourth four-quadrant photoelectric detector. Reflected light of the second beam splitter prism enters a third four-quadrant photoelectric detector as a near-end light beam drift feedback source of the light beam stabilizing module; reflected light of the fourth right-angle reflecting mirror is emitted into a fourth quadrant photoelectric detector through the second focusing lens and serves as a far-end light beam drifting feedback source of the light beam stabilizing module; the first right-angle reflecting mirror and the second right-angle reflecting mirror are both arranged on a high-precision two-dimensional angle adjusting frame which can be controlled by PZT (piezoelectric ceramics), when the third four-quadrant photoelectric detector and the fourth four-quadrant photoelectric detector detect that the laser beam drifts, namely the readings are not zero, output signals of the third four-quadrant photoelectric detector and the fourth four-quadrant photoelectric detector are converted into voltage signals to be output to the PZT after PID control in a computer, the PZT changes the length of the PZT according to the output voltage and further changes the angles of the first right-angle reflecting mirror and the second right-angle reflecting mirror so as to change the emergent angle of the light beam, the readings of the third four-quadrant photoelectric detector and the fourth four-quadrant photoelectric detector are close to zero as much as possible, and the light beam drifts of the laser in a measuring interval are compensated and restrained.
The invention has the following advantages and prominent effects: the four-degree-of-freedom error measurement module adopts a semiconductor laser with low cost and small volume to replace a helium-neon laser in a traditional laser motion error measurement system, and the semiconductor laser carries out long-distance motion error measurement based on a non-interference principle, so that the cost is low; the designed optical path has simple structure and easy integration, and can realize online error measurement. The beam stabilizing module adopts two right-angle reflectors with the angles controlled by PZT to compensate and inhibit the stability of the semiconductor laser beam in the measuring range, stabilizes the laser based on the PID feedback control principle, reduces the beam drift, and effectively improves the measuring precision and stability.
Drawings
FIG. 1 is a light path diagram of a long-distance semiconductor laser four-degree-of-freedom motion error measurement system with a light beam stabilizing function;
FIG. 2 is a schematic diagram of a system for automatically stabilizing the beam drift of a semiconductor laser;
in the figure: 1, a semiconductor laser; 2 a first right angle mirror; 3 a second corner cube mirror; 4 a second beam splitter prism; 5 a third fourth quadrant photodetector; 6 a third beam splitter prism; 7 a fourth corner cube mirror; 8 a first beam splitter prism; 9 a first four quadrant photodetector; 10 a third corner mirror; 11 a first focusing lens; 12 a second four quadrant photodetector; 13 a second focusing lens; 14 fourth quadrant photodetector.
Detailed Description
In order to facilitate the understanding and implementation of the present invention for those of ordinary skill in the art, the present invention is further described in detail below with reference to the accompanying drawings and examples.
Referring to the attached figure 1, the technical scheme adopted by the invention is as follows: a semiconductor laser motion error measuring system based on light beam automatic stabilization comprises a semiconductor laser 1, a first right-angle reflector 2, a second right-angle reflector 3, a second beam splitter prism 4, a third four-quadrant photodetector 5, a third beam splitter prism 6, a fourth right-angle reflector 7, a first beam splitter prism 8, a first four-quadrant photodetector 9, a third right-angle reflector 10, a first focusing lens 11, a second four-quadrant photodetector 12, a second focusing lens 13 and a fourth four-quadrant photodetector 14; the semiconductor laser 1, the first right-angle reflecting mirror 2 with PZT drive, the second right-angle reflecting mirror 3 with PZT drive, the second beam splitter prism 4, the third four-quadrant photoelectric detector 5, the third beam splitter prism 6 and the fourth right-angle reflecting mirror 7 are arranged at the fixed end; a first beam splitter prism 8, a first four-quadrant photodetector 9, a third right-angle reflector 10, a first focusing lens 11 and a second four-quadrant photodetector 12 are arranged at the measuring end; a second focusing lens 13 and a fourth quadrant photodetector 14 are mounted at the feedback end. The fixed end and the feedback end are fixedly arranged on the plane of the motion platform, and the measuring end moves on the motion platform to be measured.
In the long-distance four-degree-of-freedom error measurement module, a two-dimensional straightness error, a pitch angle error and a yaw angle error are measured based on a laser collimation principle:
laser generated by a semiconductor laser 1 is reflected by a first right-angle reflecting mirror 2 and a second right-angle reflecting mirror 3 to enter a second light splitting prism 4 and a third light splitting prism 6, transmitted light of the third light splitting prism is split into two beams of light through a first light splitting prism 8 as measuring light, the transmitted light is emitted into a first four-quadrant photoelectric detector 9 as measuring light of a two-dimensional straightness error, when a measured platform has a horizontal straightness error and a vertical straightness error, the central position of a light spot in the first four-quadrant photoelectric detector 9 can generate displacement, and therefore voltages (V) of four quadrants of the first four-quadrant photoelectric detector 9 are enabled to be achieved (V is9_1,V9_2,V9_3,V9_4) The actual horizontal straightness error and vertical straightness error can be expressed as:
wherein k isxAnd kyIs the sensitivity of the first four quadrant photodetector 9.
Reflected light enters the second four-quadrant photodetector 12 through the third right-angle reflector 10 and the first focusing lens 11 to serve as measurement light of a pitch angle error and a yaw angle error, when a measured platform has the pitch angle error and the yaw angle error, the central position of a light spot in the second four-quadrant photodetector 12 generates displacement, and therefore voltages (V) of four quadrants of the second four-quadrant photodetector 12 are enabled to be achieved12_1,V12_2,V12_3,V12_4) The actual pitch angle error and yaw angle error can be expressed as:
wherein k is1xAnd k1yThe sensitivity of the second four quadrant photodetector 12. f. ofLThe focal length of the plano-convex lens 11 is indicated.
Referring to fig. 2, in the beam stabilization module, the reflected light of the second beam splitter prism 4 enters a third four-quadrant photodetector 5 as a near-end parallel drift feedback source; the reflected light of the third beam splitter prism 6 is reflected by a fourth right-angle reflector and then enters a second focusing lens 16, and finally is received by a fourth quadrant photodetector 14 to serve as a far-end angle drift feedback source; the signals of the first four-quadrant photodetector 9, the second four-quadrant photodetector 12, the third four-quadrant photodetector 5 and the fourth four-quadrant photodetector 14 are connected with a computer through a signal processing circuit and a data acquisition card.
When the third and fourth photodetectors 5 and 14 detect the occurrence of a drift (Δ x, Δ y, Δ θ) in the laser beamx,Δθy) Its output signal is converted into voltage signal after PID control in computerThe PZT is provided, and the PZT changes the length of the PZT according to the output voltage to further change the angle (alpha) of the first right angle reflector 2 and the second right angle reflector 3 on the high-precision two-dimensional angle adjusting frame controlled by the PZTx,αy,βx,βy) Therefore, the emergent angle of the light beam is changed, the readings of the third four-quadrant photodetector 5 and the fourth four-quadrant photodetector 14 are close to zero as much as possible, so as to ensure the stability of the light beam, and the theoretical relationship between the light beam drift amount and the angle of the reflector can be expressed as follows:
Δx＝z1tanαx+z2tanβx (5)
Δy＝z1tanαy+z2tanβy (6)
Δθx＝2(βx-αx) (7)
Δθy＝2(βy-αy) (8)
wherein z is1Is the optical path length, z, between the first cube corner mirror 2 and the second cube corner mirror 32Is the optical path from the second cube-corner mirror 3 to the third four quadrant photodetector 5.
Before the measurement starts, the measurement light is adjusted to be coaxial with the motion platform to be measured, and the readings of a third four-quadrant photoelectric detector 5 and a fourth four-quadrant photoelectric detector 14 are adjusted to be zero; starting PID feedback control to stabilize the measuring light beam; at the starting position of the platform to be detected, the readings of the first and second four-quadrant photodetectors 9 and 12 are adjusted to zero. During measurement, the measuring end moves on the moving platform, and the central position of a light spot in the first four-quadrant photoelectric detector 9 and the central position of a light spot in the second four-quadrant photoelectric detector 12 generate different changes along with different movement errors; when the measured platform has a vertical straightness error and a horizontal straightness error, the central position of the light spot in the first four-quadrant photoelectric detector 9 can be changed, and the central position of the light spot in the second four-quadrant photoelectric detector 12 can not be changed; when the measured platform has a pitch angle error and a yaw angle error, the central position of a light spot in the first four-quadrant photoelectric detector 9 cannot be changed, and the central position of a light spot in the second four-quadrant photoelectric detector 12 can be changed; the four-degree-of-freedom motion errors of the horizontal straightness error, the vertical straightness error, the pitch angle error and the yaw angle error of the platform can be measured by reading the readings of the first four-quadrant photoelectric detector 9 and the second four-quadrant photoelectric detector 12.
Claims (2)
1. The method of the semiconductor laser motion error measuring system based on the automatic stabilization of the light beam is used for measuring the motion error of a long-stroke linear platform, and is characterized in that the system comprises a four-degree-of-freedom error measuring module and a light beam stabilizing module, wherein:
the four-degree-of-freedom error measurement module comprises a semiconductor laser (1), a first right-angle reflecting mirror (2), a second right-angle reflecting mirror (3), a first beam splitter prism (8), a first four-quadrant photoelectric detector (9), a third right-angle reflecting mirror (10), a first focusing lens (11) and a second four-quadrant photoelectric detector (12); light beams generated by the semiconductor laser are reflected by the first right-angle reflecting mirror (2) and the second right-angle reflecting mirror (3) and then parallelly emitted into the second light splitting prism (4) and the third light splitting prism (6), transmitted light of the second light splitting prism is emitted into the first light splitting prism (8), the transmitted light of the first light splitting prism (8) is received by the first four-quadrant photoelectric detector (9), and light spot displacement detected by the first four-quadrant photoelectric detector (9) is used as a two-dimensional straightness error of the linear platform; reflected light of the first beam splitter prism (8) is incident into a second four-quadrant photoelectric detector (12) after passing through a third right-angle reflecting mirror (10) and a first focusing lens (11), and light spot displacement detected by the second four-quadrant photoelectric detector (12) is used as a pitch angle error and a yaw angle error of the linear platform;
the light beam stabilizing module comprises a first right-angle reflecting mirror (2), a second right-angle reflecting mirror (3), a second light splitting prism (4), a third four-quadrant photoelectric detector (5), a third light splitting prism (6), a fourth right-angle reflecting mirror (7), a second focusing lens (13) and a fourth four-quadrant photoelectric detector (14); reflected light of the second beam splitter prism (4) enters a third four-quadrant photodetector (5) and is used as a near-end light beam drift feedback source of the light beam stabilizing module; reflected light of the fourth right-angle reflecting mirror (7) is incident into a fourth quadrant photodetector (14) through a second focusing lens (13) and is used as a far-end light beam drift feedback source of the light beam stabilizing module; when a third four-quadrant photoelectric detector (5) and a fourth four-quadrant photoelectric detector (14) detect that laser beams drift, namely, the readings are not zero, output signals of the first right-angle reflecting mirror (2) and the second right-angle reflecting mirror (3) are converted into voltage signals to be output to the PZT after being controlled by PID in a computer, the PZT changes the length of the PZT according to the output voltages and further changes the angles of the first right-angle reflecting mirror (2) and the second right-angle reflecting mirror (3) so as to change the emergent angles of the beams, so that the readings of the third four-quadrant photoelectric detector (5) and the fourth four-quadrant photoelectric detector (14) are close to zero, and the beam drift of the laser in a measuring interval is compensated and inhibited;
the semiconductor laser (1), the first right-angle reflecting mirror (2) with PZT drive, the second right-angle reflecting mirror (3) with PZT drive, the second beam splitter prism (4), the third four-quadrant photoelectric detector (5), the third beam splitter prism (6) and the fourth right-angle reflecting mirror (7) are arranged at the fixed end; a first beam splitter prism (8), a first four-quadrant photodetector (9), a third right-angle reflector (10), a first focusing lens (11) and a second four-quadrant photodetector (12) are arranged at the measuring end; the second focusing lens (13) and the fourth quadrant photodetector (14) are arranged at the feedback end; the fixed end and the feedback end are fixedly arranged on the plane of the linear platform, and the measuring end moves on the measured linear platform;
the method comprises the following steps:
before measurement starts, the measuring light is adjusted to be coaxial with the linear platform to be measured, and the readings of a third four-quadrant photoelectric detector (5) and a fourth four-quadrant photoelectric detector (14) are adjusted to be zero; starting PID feedback control to stabilize the measuring light beam; adjusting the readings of a first four-quadrant photoelectric detector (9) and a second four-quadrant photoelectric detector (12) to be zero at the initial position of the platform to be detected;
during measurement, the measuring end moves on the linear platform, and the central position of a light spot in the first four-quadrant photoelectric detector (9) and the central position of a light spot in the second four-quadrant photoelectric detector (12) generate different changes along with different movement errors; when the measured platform has vertical linearity error and horizontal linearity errorWhen the difference is small, the central position of the light spot in the first four quadrant photoelectric detectors (9) can be changed, and the central position of the light spot in the second four quadrant photoelectric detectors (12) can not be changed; when the measured platform has a pitch angle error and a yaw angle error, the central position of a light spot in the first four-quadrant photoelectric detector (9) cannot be changed, and the central position of a light spot in the second four-quadrant photoelectric detector (12) can be changed; the four-degree-of-freedom motion errors of the horizontal straightness error, the vertical straightness error, the pitch angle error and the yaw angle error of the platform can be measured by reading the readings of the first four-quadrant photoelectric detector (9) and the second four-quadrant photoelectric detector (12); when the third four quadrant photoelectric detector (5) and the fourth four quadrant photoelectric detector (14) detect the laser beam drift (delta x, delta y, delta theta)x,Δθy) During the operation, the output signal is converted into a voltage signal after being subjected to PID control in a computer and then is output to the PZT, the PZT changes the length of the PZT according to the output voltage so as to change the angle (alpha) of a first right-angle reflector (2) and a second right-angle reflector (3) on a high-precision two-dimensional angle adjusting frame controlled by the PZTx,αy,βx,βy) Therefore, the emergent angle of the light beam is changed, the readings of the third four-quadrant photoelectric detector (5) and the fourth four-quadrant photoelectric detector (14) are close to zero, so that the stability of the light beam is ensured, and the relationship between the light beam drift amount and the angle of the reflector is expressed as follows:
Δx＝z1tanαx+z2tanβx (5)
Δy＝z1tanαy+z2tanβy (6)
Δθx＝2(βx-αx) (7)
Δθy＝2(βy-αy) (8)
wherein z is1Is the optical path between the first corner reflector (2) and the second corner reflector (3), z2The optical path from the second right-angle reflector (3) to the third four-quadrant photodetector (5).
2. The method for measuring the semiconductor laser motion error based on the automatic beam stabilization as claimed in claim 1, wherein the straightness error and the angle error are calculated as follows:
wherein (V)9_1,V9_2,V9_3,V9_4) And (V)12_1,V12_2,V12_3,V12_4) Is the voltage, k, of the four quadrants of a first four-quadrant photodetector (9) and a second four-quadrant photodetector (12)xAnd kyIs the sensitivity, k, of the first four-quadrant photodetector (9)1xAnd k1yThe sensitivity of the second four-quadrant photodetector (12), fLIndicates the focal length of the plano-convex lens (11).
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| CN113483726B (en) * | 2021-07-06 | 2022-06-07 | 大连理工大学 | Method and system for measuring three-dimensional angle motion error in miniaturized and high-precision manner |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102288104A (en) * | 2011-07-22 | 2011-12-21 | 中国科学院上海光学精密机械研究所 | Six-axis four-splitting interferometer |
| US20160069665A1 (en) * | 1999-04-05 | 2016-03-10 | Faro Technologies, Inc. | Laser-based coordinate measuring device and laser-based method for measuring coordinates |
| CN106461372A (en) * | 2014-09-03 | 2017-02-22 | 北京交通大学 | System for simultaneously measuring six-degree-of-freedom errors in way that double-frequency lasers are coupled by single optical fiber |
| CN106595480A (en) * | 2016-12-09 | 2017-04-26 | 北京交通大学 | Laser measurement system used for measuring rotating-shaft six-degree-of-freedom geometric error and method thereof |
| CN207180607U (en) * | 2017-07-07 | 2018-04-03 | 浙江理工大学 | A kind of angle compensation formula laser heterodyne interference displacement measuring device |
| US20180120156A1 (en) * | 2016-10-27 | 2018-05-03 | Hamamatsu Photonics K.K. | Position detection method and optical module |
-
2020
- 2020-03-13 CN CN202010175977.2A patent/CN111351430B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20160069665A1 (en) * | 1999-04-05 | 2016-03-10 | Faro Technologies, Inc. | Laser-based coordinate measuring device and laser-based method for measuring coordinates |
| CN102288104A (en) * | 2011-07-22 | 2011-12-21 | 中国科学院上海光学精密机械研究所 | Six-axis four-splitting interferometer |
| CN106461372A (en) * | 2014-09-03 | 2017-02-22 | 北京交通大学 | System for simultaneously measuring six-degree-of-freedom errors in way that double-frequency lasers are coupled by single optical fiber |
| US20180120156A1 (en) * | 2016-10-27 | 2018-05-03 | Hamamatsu Photonics K.K. | Position detection method and optical module |
| CN106595480A (en) * | 2016-12-09 | 2017-04-26 | 北京交通大学 | Laser measurement system used for measuring rotating-shaft six-degree-of-freedom geometric error and method thereof |
| CN207180607U (en) * | 2017-07-07 | 2018-04-03 | 浙江理工大学 | A kind of angle compensation formula laser heterodyne interference displacement measuring device |
Non-Patent Citations (1)
| Title |
|---|
| Error Analysis and Compensation of a Laser Measurement System for Simultaneously Measuring Five-Degree-of-Freedom Error Motions of Linear Stages;Yindi Cai et al.;《sensors》;20190905;说明书第3-6页，附图1-4 * |
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| CN111351430A (en) | 2020-06-30 |
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