CN111326385B - Vacuum chamber - Google Patents
Vacuum chamber Download PDFInfo
- Publication number
- CN111326385B CN111326385B CN201811523752.0A CN201811523752A CN111326385B CN 111326385 B CN111326385 B CN 111326385B CN 201811523752 A CN201811523752 A CN 201811523752A CN 111326385 B CN111326385 B CN 111326385B
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- Prior art keywords
- push rod
- opening
- baffle
- lining
- valve
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Details Of Valves (AREA)
- Sliding Valves (AREA)
Abstract
The invention discloses a vacuum chamber, comprising: a chamber body (1), a lining (2) and a special-shaped door valve (3), wherein one surface (12) of the chamber body (1) is provided with a first opening (11), the lining (2) is arranged in the chamber body (1), a second opening (21) is arranged at a position corresponding to the first opening (11), the special-shaped gate valve (3) comprises a baffle (4), a horizontal push rod (5), a vertical push rod (6) and a valve seat (7), the horizontal and vertical movements of the baffle (4) are respectively controlled by the horizontal push rod (5) and the vertical push rod (6), the baffle (4) and the horizontal push rod (5) as well as the horizontal push rod (5) and the vertical push rod (6) are connected by adopting vacuum bellows, the special-shaped gate valve (3) is arranged below the first opening (11) of the surface (12) through the valve seat (7), the first opening (11) and the second opening (21) are exposed or closed by opening or closing the shutter (4).
Description
Technical Field
The invention relates to the technical field of semiconductors, in particular to a vacuum chamber.
Background
In semiconductor manufacturing, plasma etching is used to etch conductive and dielectric materials. One of the problems with plasma etching is that over time, as multiple wafers are processed in a pocket, a film builds up on the walls of the process chamber. This film build-up can cause two problems. First, the film may flake off the chamber walls, creating particles. As the feature sizes of integrated circuit devices continue to decrease, the degree of particle tolerance during processing is rapidly decreasing. Therefore, it is becoming more and more important to avoid the generation of particles and their refinement during processing. Second, the film may alter the rf ground path, thereby affecting the results obtained on the wafer. Both of these situations are undesirable, and the current devices mostly employ wet cleaning operations for the process chamber to physically scrub the inner walls of the reaction chamber to remove the build-up. In commercial semiconductor manufacturing, wet cleaning of the process chamber requires the process module to be taken offline, resulting in reduced productivity. On the other hand, the plasma etches the substrate and also etches the cavity, which is irreversible, and can cause the damage of the cavity, resulting in high production cost. To avoid wet cleaning and chamber scrapping, some process chambers have been lined to protect the chamber walls. The use of an inner liner is advantageous because the liner can be easily replaced with minimal downtime. In the semiconductor production and processing flow, because different processing environments are involved, a wafer needs to be carried into a reaction chamber through a mechanical arm for process treatment, after the technical process is finished, the processed wafer is carried out of the chamber through the mechanical arm, after the mechanical arm exits from the chamber, in order to prevent the opening of the lining from influencing the uniformity of internal plasma, the inner wall of the chamber is protected, the leakage of reaction process gas into the environment is reduced, therefore, a baffle is needed to block the opening of the lining, and meanwhile, a gate valve is needed to be used for opening and closing the opening communicated with the vacuum chamber.
The existing lining baffle is vertically pushed from the upper part of the cavity body by two push rods driven by an air cylinder on the upper part of the cavity cover to move up and down, and the design occupies the space on the upper part of the cavity cover. For the etching apparatus, the space in the upper part of the chamber cover is generally required to arrange the coil, the gas inlet part, etc., so that the vacuum chamber has to be enlarged to accommodate the lining baffle mechanism, and in addition, the coil generates radiation, thereby affecting the function of the lining baffle.
Disclosure of Invention
In order to solve the above problems, the present invention discloses a vacuum chamber including a chamber body, a liner provided in the chamber body, one face of the chamber body being provided with a first opening, and a profile gate valve, a second opening is arranged at the position corresponding to the first opening, the special-shaped door valve comprises a baffle plate, a horizontal push rod, a vertical push rod and a valve seat, wherein the horizontal push rod is connected with the valve seat through the vertical push rod, the baffle is arranged on the horizontal push rod, the horizontal and vertical movements of the baffle are controlled by the horizontal push rod and the vertical push rod respectively, the baffle plate and the horizontal push rod, and the horizontal push rod and the vertical push rod are connected by vacuum bellows, the profiled gate valve is mounted below the first opening of the face by a valve seat, and the first and second openings are exposed or closed by opening or closing the shutter.
In the vacuum chamber of the present invention, preferably, the surface of the chamber body provided with the first opening has an arc shape.
In the vacuum chamber of the present invention, preferably, the first opening and the second opening are arc-shaped long grooves.
In the vacuum chamber of the present invention, preferably, the valve seat of the profile gate valve has an arc shape and has the same arc as the surface so as to be fitted to the surface.
In the vacuum chamber of the present invention, preferably, the shutter of the profile gate valve is curved and has the same curvature as the surface to fit the first opening and the second opening.
In the vacuum chamber of the present invention, preferably, the baffle includes a lining baffle, a valve plate, and a sealing ring, the lining baffle is connected to an inner wall of the valve plate, the sealing ring is disposed on an outer periphery of the inner wall of the valve plate, the lining baffle is fitted to the second opening of the lining, and a length and a height of the valve plate are greater than a length and a height of the first opening.
In the vacuum chamber of the present invention, preferably, the horizontal push rod and the vertical push rod are driven by an air cylinder.
In the vacuum chamber, preferably, after receiving a closing signal, the vertical push rod drives the horizontal push rod and the baffle plate to move upward from an initial state to a preset position, then the horizontal push rod pushes the baffle plate to move horizontally to a final position, and at this position, the valve plate is tightly sealed with the chamber main body through the sealing ring while the lining baffle plate blocks the second opening of the lining.
In the vacuum chamber of the present invention, preferably, after receiving the opening signal, the horizontal push rod drives the baffle to horizontally move to a preset position, and then the vertical push rod drives the horizontal push rod and the baffle to move downward to return to the initial state.
The special-shaped door valve in the vacuum chamber has the function of realizing two functions by one operation, can finish the opening and closing functions of the existing door valve on the vacuum chamber, and can replace the whole lining baffle mechanism to finish the function of blocking the opening of the lining. In addition, the lining baffle mechanism is omitted, so that the cost is saved, and the production efficiency is improved.
Drawings
FIG. 1 is a perspective view of a vacuum chamber of the present invention.
FIG. 2 is a perspective view of a profiled gate valve.
Fig. 3 is a cross-sectional view of the baffle.
Fig. 4 is a top view of the baffle.
FIG. 5 is a schematic view of a profiled gate valve in an open state.
FIG. 6 is a schematic illustration of the profiled gate valve ascending to a preset position.
FIG. 7 is a schematic view of a profiled gate valve in a closed state.
In the figure:
1-a chamber body; 11-a first opening; 12-side; 2, lining; 21-a second opening; 3-special-shaped gate valve; 4, a baffle plate; 41-lining baffle plate; 42-valve plate; 43-sealing ring 5-horizontal push rod; 6-vertical push rod; 7 to the valve seat.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it should be understood that the specific embodiments described herein are only for explaining the present invention and are not intended to limit the present invention. The described embodiments are only some embodiments of the invention, not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it should be noted that the terms "upper", "lower", "vertical", "horizontal", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience in describing the present invention and simplifying the description, but do not indicate or imply that the referred device or element must have a specific orientation, be constructed in a specific orientation, and be operated, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
Furthermore, numerous specific details of the invention, such as structure, materials, dimensions, processing techniques and techniques of the devices are described below in order to provide a more thorough understanding of the invention. However, as will be understood by those skilled in the art, the present invention may be practiced without these specific details. Unless otherwise specified below, each part in the device may be formed of a material known to those skilled in the art, or a material having a similar function developed in the future may be used.
FIG. 1 is a perspective view of a vacuum chamber of the present invention. As shown in fig. 1, the vacuum chamber of the present invention includes: the chamber comprises a chamber body 1, a liner 2 and a special-shaped gate valve 3, wherein a first opening 11 is formed on one surface 12 of the side wall of the chamber body 1, the liner 2 is arranged in the chamber body 1, and a second opening 21 is formed in the liner 2 corresponding to the first opening 11. FIG. 2 is a perspective view of a profiled gate valve. As shown in fig. 2, the special-shaped gate valve 3 comprises a baffle 4, a horizontal push rod 5, a vertical push rod 6 and a valve seat 7, wherein the horizontal push rod 5 is connected with the valve seat 7 through the vertical push rod 6, the baffle 4 is installed on the horizontal push rod 5, the horizontal and vertical movements of the baffle 4 are respectively controlled by the horizontal push rod 5 and the vertical push rod 6, and the baffle 4 and the horizontal push rod 5, the horizontal push rod 5 and the vertical push rod 6 are connected through vacuum bellows to ensure vacuum cleanliness. The shaped gate valve 3 is mounted below the first opening 11 of the face 12 by a valve seat 7, and the first opening 11 and the second opening 21 are exposed or closed by opening or closing the shutter 4. Because the special-shaped gate valve 3 can not only finish the opening and closing functions of the existing gate valve on the vacuum chamber, but also replace the whole lining baffle mechanism to finish the function of blocking the opening of the lining, the lining baffle mechanism can be saved, the installation space is effectively reduced, the production cost is saved,
the face 12 of the chamber body 1 provided with the first opening 11 is curved, which design further reduces the volume of the vacuum chamber. The first opening 11 and the second opening 21 are arc-shaped elongated slots. In order to cooperate with the chamber body 1, the valve seat 7 of the profiled gate valve 3 is curved and has the same curvature as the face 12, so as to cooperate with said face 12. The shutter 4 of the profiled gate valve 3 is curved and has the same curvature as the face 12 to cooperate with the first opening 11 and the second opening 21. Fig. 3 is a cross-sectional view of the baffle. Fig. 4 is a top view of the baffle. As shown in fig. 2 to 4, the baffle 4 includes a lining baffle 41, a valve plate 42, and a packing 43, the lining baffle 41 is connected to an inner wall of the valve plate 42, and the packing 3 is provided on an outer periphery of the inner wall of the valve plate 42. The lining baffles 41 can be removed and replaced more quickly, reducing down time. The lining baffle 41 is matched with the second opening 21 of the lining 2, and the length and the height of the valve plate 42 are larger than those of the first opening 11, so that the sealing ring 43 can play a good sealing role while the lining baffle 41 blocks the opening 21 of the lining 2 when the special-shaped gate valve 3 works.
Three operating states of the profiled gate valve are shown in fig. 5 to 7. The profiled gate valve is in an initial state of opening in fig. 5. FIG. 6 is a schematic illustration of the profiled gate valve ascending to a preset position. The profiled gate valve is in the closed final position in fig. 7. The horizontal push rod 5 and the vertical push rod 6 of the special-shaped gate valve 3 are driven by a cylinder. After receiving the closing signal, the vertical push rod 6 drives the horizontal push rod 5 and the baffle 4 to move upward from the initial state (as shown in fig. 5) to the preset position (as shown in fig. 6), and then the horizontal push rod 5 pushes the baffle 4 to move horizontally to the final position (as shown in fig. 7), in which the liner baffle 41 blocks the second opening 21 of the liner 2, and the valve plate 42 is tightly sealed with the chamber body 1 through the sealing ring 43. When the opening signal is received, the horizontal push rod 5 drives the baffle 4 to horizontally move to the preset position (as shown in fig. 6), and then the vertical push rod 6 drives the horizontal push rod 5 and the baffle 4 to move downwards to return to the initial state (as shown in fig. 5). No friction motion exists in the motion process, and the process can be effectively prevented from being influenced by particles.
The special-shaped gate valve in the vacuum chamber of the invention plays a role of realizing two functions by one operation, can not only finish the opening and closing functions of the existing gate valve on the vacuum chamber, but also can replace the whole lining baffle mechanism to finish the function of blocking the opening of the lining. In addition, because the lining baffle mechanism is omitted, the cost is effectively saved, and the production efficiency is improved.
The above description is only for the specific embodiment of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention are included in the scope of the present invention.
Claims (4)
1. A vacuum chamber, characterized in that,
the method comprises the following steps: the device comprises a chamber body (1), a lining (2) and a special-shaped door valve (3), wherein a first opening (11) is formed in one surface (12) of the chamber body (1), the lining (2) is arranged in the chamber body (1), a second opening (21) is formed in the position corresponding to the first opening (11),
the special-shaped door valve (3) comprises a baffle (4), a horizontal push rod (5), a vertical push rod (6) and a valve seat (7), wherein the horizontal push rod (5) is connected with the valve seat (7) through the vertical push rod (6), the baffle (4) is installed on the horizontal push rod (5), the horizontal movement and the vertical movement of the baffle (4) are respectively controlled by the horizontal push rod (5) and the vertical push rod (6), the baffle (4) is connected with the horizontal push rod (5) and the vertical push rod (6) through vacuum bellows,
the profiled gate valve (3) is mounted below the first opening (11) of the face (12) by means of a valve seat (7), the first opening (11) and the second opening (21) being exposed or closed by opening or closing the flap (4)
The face (12) of the chamber body (1) provided with the first opening (11) is arc-shaped, the baffle (4) of the profiled door valve (3) is arc-shaped and has the same arc as the face (12) so as to cooperate with the first opening (11) and the second opening (21),
the baffle (4) comprises a lining baffle (41), a valve plate (42) and a sealing ring (43), the lining baffle (41) is connected with the inner wall of the valve plate (42), the sealing ring (43) is arranged on the periphery of the inner wall of the valve plate (42), the lining baffle (41) is matched with the second opening (21) of the lining (2), the length and the height of the valve plate (42) are greater than those of the first opening (11),
after receiving a closing signal, the vertical push rod (6) drives the horizontal push rod (5) and the baffle (4) to move upwards from an initial state to a preset position, then the horizontal push rod (5) pushes the baffle (4) to move horizontally to a final position, at this position, the lining baffle (41) blocks the second opening (21) of the lining (2), and the valve plate (42) is tightly sealed with the chamber main body (1) through the sealing ring (43),
after receiving the opening signal, the horizontal push rod (5) drives the baffle (4) to horizontally move to reach a preset position, and then the vertical push rod (6) drives the horizontal push rod (5) and the baffle (4) to move downwards to return to an initial state.
2. The vacuum chamber of claim 1,
the first opening (11) and the second opening (21) are arc-shaped long grooves.
3. The vacuum chamber of claim 1,
the valve seat (7) of the special-shaped door valve (3) is arc-shaped and has the same radian with the surface (12) so as to be matched with the surface (12) for installation.
4. The vacuum chamber of claim 1,
the horizontal push rod (5) and the vertical push rod (6) are driven by a cylinder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811523752.0A CN111326385B (en) | 2018-12-13 | 2018-12-13 | Vacuum chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811523752.0A CN111326385B (en) | 2018-12-13 | 2018-12-13 | Vacuum chamber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111326385A CN111326385A (en) | 2020-06-23 |
| CN111326385B true CN111326385B (en) | 2022-06-24 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811523752.0A Active CN111326385B (en) | 2018-12-13 | 2018-12-13 | Vacuum chamber |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111326385B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115621110A (en) * | 2021-07-16 | 2023-01-17 | 长鑫存储技术有限公司 | Door valve device, cleaning method and mechanical equipment |
| US11933416B2 (en) | 2021-07-16 | 2024-03-19 | Changxin Memory Technologies, Inc. | Gate valve device, cleaning method and mechanical apparatus |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101170626B1 (en) * | 2010-12-30 | 2012-08-03 | 엘아이지에이디피 주식회사 | Apparatus for processing a substrate using plasma |
| CN203627863U (en) * | 2013-08-29 | 2014-06-04 | 昆山工研院新型平板显示技术中心有限公司 | Valve plate of gate valve |
| CN107611054B (en) * | 2016-07-12 | 2020-02-14 | 北京北方华创微电子装备有限公司 | Reaction chamber |
| CN206301757U (en) * | 2016-11-17 | 2017-07-04 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Cavity seal and semiconductor processing equipment |
| JP6899697B2 (en) * | 2017-05-11 | 2021-07-07 | 東京エレクトロン株式会社 | Gate valve device and board processing system |
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2018
- 2018-12-13 CN CN201811523752.0A patent/CN111326385B/en active Active
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| Publication number | Publication date |
|---|---|
| CN111326385A (en) | 2020-06-23 |
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Address after: 221300 No.8, Liaohe West Road, Pizhou Economic Development Zone, Xuzhou City, Jiangsu Province Patentee after: Jiangsu Luwen Instrument Co.,Ltd. Address before: 221300 No. 8, Liaohe West Road, Pizhou Economic Development Zone, Pizhou City, Xuzhou City, Jiangsu Province Patentee before: JIANGSU LEUVEN INSTRUMMENTS Co.,Ltd. |
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