CN111299731A - A processing method and control system for forming a microstructure on the surface of a workpiece - Google Patents
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Abstract
Description
技术领域technical field
本发明涉及一种在工件表面形成微结构的加工方法及控制系统。The invention relates to a processing method and a control system for forming a microstructure on the surface of a workpiece.
背景技术Background technique
表面微织构技术是指利用微细加工方法在材料表面构建系列具有一定形态、大小和排列方式的微结构阵列,从而改善/调控材料表面特性。近年来,随着微细加工技术的发展,表面微织构技术已在仿生学、摩擦学(减小摩擦、刀具减磨减低粘附)、微流体力学(微流道减阻)和生物医学(改善植入体生物相容性)等多个领域中得到了成功的应用,并取得了良好的效果。Surface microtexturing technology refers to the use of microfabrication methods to construct a series of microstructure arrays with certain shapes, sizes and arrangements on the surface of materials, thereby improving/regulating the surface properties of materials. In recent years, with the development of microfabrication technology, surface microtexture technology has been widely used in bionics, tribology (reducing friction, reducing tool wear and reducing adhesion), microfluidics (reducing drag in microfluidic channels) and biomedicine ( It has been successfully applied in many fields such as improving the biocompatibility of implants, and achieved good results.
目前,表面微结构阵列(微织构)加工技术主要包括,微细铣削、激光加工、磨料气射流,电火花加工及掩膜电解加工等。但以上方法均存在一定的缺陷,例如:微细铣削存在加工应力和表面残余应力,且很难实现对难加工材料表面的织构化处理;激光加工和电火花加工表面均存在热影响区,表面粗糙度较差;磨料气射流仅适用于对脆性材料的加工等。At present, surface microstructure array (microtexture) processing technologies mainly include micro-milling, laser processing, abrasive gas jet, electrical discharge machining and mask electrolytic machining. However, the above methods all have certain defects, such as: micro-milling has machining stress and surface residual stress, and it is difficult to achieve texture treatment on the surface of difficult-to-machine materials; both laser machining and EDM surfaces have heat-affected zones, and the surface Poor roughness; abrasive air jets are only suitable for machining brittle materials, etc.
掩模电解加工(TMECM)是一种将阳极表面经光刻处理后进行电解加工的特种加工工艺,该技术结合了光刻技术的高分辨率和电解加工的高效率,成为金属材料表面微结构阵列制备的常用方法之一。在TMECM工艺过程中,掩模板的制作是十分关键的步骤,目前,掩模的制作方法主要有照相精缩法、电子束直写法和聚焦离子束直写法等,但是这些方法均存在价格昂贵、制作周期长和掩模板面积小等缺点。而且,当所需阵列结构的特征参数需要改变时,如果采用传统的TMECM工艺,掩模板则必须重新制作,这不仅造成了材料的浪费,而且将大大延长工艺周期。另外,现有的掩模电解加工技术通常用于平面或大口径的回转表面微结构阵列的制备,很难实现小口径回转、准回转薄壁曲面(例如:心血管支架内/外回转表面、微齿轮、凸轮等准回转轮廓面等)微结构阵列的加工。Masked Electrochemical Machining (TMECM) is a special machining process in which the anode surface is subjected to photolithography and then electrolytic machining. One of the common methods for array preparation. In the TMECM process, the fabrication of the mask is a very critical step. At present, the fabrication methods of the mask mainly include the photographic shrinkage method, the electron beam direct writing method and the focused ion beam direct writing method, etc., but these methods are expensive, Disadvantages such as long production cycle and small mask area. Moreover, when the characteristic parameters of the required array structure need to be changed, if the traditional TMECM process is used, the mask must be re-fabricated, which not only causes waste of materials, but also greatly prolongs the process cycle. In addition, the existing mask ECM technology is usually used for the preparation of flat or large-diameter surface microstructure arrays, and it is difficult to achieve small-diameter rotation and quasi-rotation thin-walled surfaces (for example, the inner/outer surface of rotation of cardiovascular stents, Micro-gear, cam and other quasi-revolution contour surface, etc.) microstructure array processing.
发明内容SUMMARY OF THE INVENTION
本发明的目的在于提供一种在工件表面形成微结构的加工方法,以实现工件表面微结构阵列的柔性、可控制备,特别是实现小口径回转表面、准回转表面、以及回转内表面跨尺度微结构阵列的高质量柔性加工。The purpose of the present invention is to provide a processing method for forming a microstructure on the surface of a workpiece, so as to realize the flexible and controllable preparation of the microstructure array on the surface of the workpiece, especially to realize the cross-scale of the small-diameter rotary surface, the quasi-rotational surface, and the rotary inner surface High-quality flexible processing of microstructured arrays.
为达到上述目的,本发明提供如下技术方案:一种在工件表面形成微结构的加工方法,所述方法包括:In order to achieve the above object, the present invention provides the following technical solutions: a processing method for forming a microstructure on the surface of a workpiece, the method comprising:
S1、提供表面具有较小电化学阻抗值的微细棒,高温以使所述微细棒表面形成具有较大电化学阻抗值的第一微结构,得到线电极;S1, providing a micro-rod with a small electrochemical impedance value on the surface, and at a high temperature so that the surface of the micro-rod forms a first microstructure with a large electrochemical impedance value to obtain a wire electrode;
S2、提供插入至电解液中的工件作为阳极,驱动所述线电极自转并驱动所述线电极围绕所述工件旋转,给所述工件和所述线电极供电以依据所述线电极上的第一微结构在所述工件的表面形成所需要的微结构。S2. Provide the workpiece inserted into the electrolyte as an anode, drive the wire electrode to rotate and drive the wire electrode to rotate around the workpiece, and supply power to the workpiece and the wire electrode according to the No. A microstructure forms the desired microstructure on the surface of the workpiece.
进一步地,所述第一微结构通过激光加工、电子束加工、化学和激光加工中的一种得到。Further, the first microstructure is obtained by one of laser processing, electron beam processing, chemical and laser processing.
进一步地,在所述S2中,采用超短脉冲电源供电。Further, in the S2, an ultra-short pulse power supply is used for power supply.
进一步地,所述超短脉冲持续时间可为50~500ns,脉冲周期为0.1~1MHz。Further, the duration of the ultra-short pulse may be 50-500 ns, and the pulse period may be 0.1-1 MHz.
进一步地,所述微细棒为金属棒。Further, the micro rods are metal rods.
进一步地,所述金属棒的直径为0.1~3.0mm。Further, the diameter of the metal rod is 0.1-3.0 mm.
进一步地,所述第一微结构为沟槽型、准沟槽型、以及点阵型中的一个。Further, the first microstructure is one of a trench type, a quasi trench type, and a lattice type.
进一步地,所述工件的表面为回转内面、回转外面、准回转内转面、准回转外转面、平面、准平面中的一个。Further, the surface of the workpiece is one of a rotary inner surface, a rotary outer surface, a quasi-rotational inner surface, a quasi-rotational outer surface, a plane, and a quasi-plane.
进一步地,在将所述微细棒高温处理前,所述方法还包括将所述微细棒进行清洗并烘干。Further, before the high temperature treatment of the micro rods, the method further includes cleaning and drying the micro rods.
本发明还提供一种实现在工件表面形成微结构的控制系统,采用在工件表面形成微结构的加工方法,用以对设置在电解液中作为阳极的工件进行加工,所述控制系统包括用以设置在电解液中的线电极、分别与所述线电极和所述工件电连接的供电装置,所述供电装置与所述线电极、所述工件构成回路,其中,所述线电极为阴极,所述工件为阳极。The invention also provides a control system for realizing the formation of microstructures on the surface of the workpiece. The processing method for forming the microstructures on the surface of the workpiece is used to process the workpiece set in the electrolyte as an anode. A wire electrode disposed in the electrolyte, a power supply device electrically connected to the wire electrode and the workpiece respectively, the power supply device forms a loop with the wire electrode and the workpiece, wherein the wire electrode is a cathode, The workpiece is an anode.
本发明的有益效果在于:本发明所提供的在工件表面形成微结构的加工方法,使用表面具有较大电化学阻抗值的第一微结构的线电极作为工具电极,通过协同控制线电极的自转和围绕工件旋转,利用线电极表面双电层充电的暂态效应,结合线电极局部微区域内电化学阻抗的差异,实现工件表面的选择性电化学腐蚀,以可实现工件表面微结构阵列的柔性、可控制备,特别是实现小口径回转表面、准回转表面微结构阵列的加工,此外,线电极可重复使用,且该加工方法适用于任意由直线扫描得到的曲面。The beneficial effect of the present invention is that: in the processing method for forming a microstructure on the surface of a workpiece provided by the present invention, a wire electrode with a first microstructure with a large electrochemical impedance value on the surface is used as a tool electrode, and the rotation of the wire electrode is controlled cooperatively. And rotating around the workpiece, using the transient effect of electric double layer charging on the surface of the wire electrode, combined with the difference in electrochemical impedance in the local micro-region of the wire electrode, to achieve selective electrochemical corrosion on the surface of the workpiece, so that the microstructure array on the surface of the workpiece can be realized. Flexible and controllable preparation, especially to realize the processing of small-diameter revolving surface and quasi-revolving surface microstructure array, in addition, the wire electrode can be reused, and the processing method is suitable for any curved surface obtained by linear scanning.
上述说明仅是本发明技术方案的概述,为了能够更清楚了解本发明的技术手段,并可依照说明书的内容予以实施,以下以本发明的较佳实施例并配合附图详细说明如后。The above description is only an overview of the technical solution of the present invention. In order to understand the technical means of the present invention more clearly, and implement it according to the content of the description, the preferred embodiments of the present invention are described in detail below with the accompanying drawings.
附图说明Description of drawings
图1为本发明第一实施例所示的工件表面形成微结构的加工方法的加工的流程图;1 is a flow chart of the processing of the processing method for forming a microstructure on the surface of a workpiece shown in the first embodiment of the present invention;
图2为图1中区域A的放大图,其中,a和b为两种线电极的第一图案和第二图案的结构示意图;FIG. 2 is an enlarged view of area A in FIG. 1 , wherein a and b are schematic structural diagrams of the first pattern and the second pattern of two types of wire electrodes;
图3为图1中区域B的放大图,其中,其中,c和d为两种具有微结构的工件的结构示意图,并且c基于a得到、d基于b得到;3 is an enlarged view of area B in FIG. 1 , wherein, c and d are schematic structural diagrams of two workpieces with microstructures, and c is obtained based on a, and d is obtained based on b;
图4为图1中线电极绕着工件旋转并自转的结构示意图;FIG. 4 is a schematic structural diagram of the wire electrode rotating around the workpiece and self-rotating in FIG. 1;
图5为图1中基于线电极在工件表面形成微结构的结构示意图,其中,t1和t2为两个不同时刻的工件的加工区域;FIG. 5 is a schematic structural diagram of the microstructure formed on the surface of the workpiece based on the wire electrode in FIG. 1 , wherein t1 and t2 are the processing areas of the workpiece at two different times;
图6为图1中的电位波形曲线,其中,13为脉冲电压波形;12为第一图案所对应区域的电位波形;11为第一图案所对应区域的电位波形;U为设定的脉冲电压大小;为稳态电位;为阳极工件材料的电化学分解电位;ton为脉冲持续时间;toff为脉冲关断时间;6 is the potential waveform curve in FIG. 1, wherein 13 is the pulse voltage waveform; 12 is the potential waveform of the region corresponding to the first pattern; 11 is the potential waveform of the region corresponding to the first pattern; U is the set pulse voltage size; is the steady-state potential; is the electrochemical decomposition potential of the anode workpiece material; t on is the pulse duration; t off is the pulse off time;
图7为图1中线电极和工件的结构示意图,其中,工件为典型的以母线为直线扫描得到的曲面,e和f为两种不同的视图。FIG. 7 is a schematic structural diagram of the wire electrode and the workpiece in FIG. 1 , wherein the workpiece is a typical curved surface obtained by scanning a bus bar as a straight line, and e and f are two different views.
具体实施方式Detailed ways
下面将结合附图对本发明的技术方案进行清楚、完整地描述,显然,所描述的实施例是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.
此外,下面所描述的本发明不同实施方式中所涉及的技术特征只要彼此之间未构成冲突就可以相互结合。In addition, the technical features involved in the different embodiments of the present invention described below can be combined with each other as long as they do not conflict with each other.
请参见图1至图3,本发明提供一种实现在工件5表面形成微结构的控制系统,采用在工件5表面形成微结构的加工方法,用以对设置在电解液中作为阳极的工件5进行加工,控制系统包括用以设置在电解液中的线电极2、分别与线电极2和工件5电连接的供电装置6,供电装置6与线电极2、工件5构成回路,在回路中,供电装置6为超短脉冲电源6,超短脉冲持续时间可为50~500ns,脉冲周期为0.1~1MHz,具体持续时间和脉冲周期根据实际进行选择,在此不做具体限制。其中,线电极2为阴极,工件5为阳极。线电极2为采用微细棒1经过高温处理得到,其中,微细棒1为金属棒1,金属棒1的直径为0.1~3.0mm,具体的,使用何种金属,金属棒1的具体直径在此不做具体限制,可根据实际情况而定。微细棒1的表面的电化学阻抗值很小,此时的电化学阻抗值为微细棒1的金属表面固有的电化学阻抗值,高温处理后得到具有较大电化学阻抗值的第一微结构4,第一微结构4的区域在超短脉冲作用下,可等效为绝缘体,即线电极2表面分为两个部分,第一图案3和第二图案4,第一图案3为微细棒1未经过高温处理的原始表面,具有很小的电化学阻抗值,第二图案4为微细棒1经过高温处理的第一微结构4,第一微结构4可以通过激光加工、电子束加工得到,诚然,第一微结构4还可以通过其他方式得到,在此不做具体限制。Referring to FIGS. 1 to 3, the present invention provides a control system for forming a microstructure on the surface of a
上述控制系统用以实现在工件5表面形成微结构的加工方法,该方法包括:The above-mentioned control system is used to realize the processing method of forming a microstructure on the surface of the
S1、提供表面具有较小电化学阻抗值的微细棒1,高温以使微细棒1表面形成具有较大电化学阻抗值的第一微结构4,得到线电极2;S1, providing a
S2、提供插入至电解液中的工件5作为阳极,驱动线电极2自转并驱动线电极2围绕工件5旋转,给工件5和线电极2供电以依据线电极2上的第一微结构4在工件5的表面形成所需要的微结构。S2, providing the
本发明中,线电极2的第一微结构4为沟槽型、准沟槽型、以及点阵型中的一个,诚然,第一微结构4也可以其他类型,在此不做具体限制。表面具有第一微结构4的线电极2可以多次重复使用,以此减少了材料的浪费,而且将大大缩短加工工艺周期。In the present invention, the
诚然,在将微细棒1高温处理前,加工方法还包括将微细棒1进行清洗并烘干,具体的,微细棒1分别依次用丙酮、酒精和去离子水进行超声去污,并在真空干燥箱中烘干。得到的表面具有第一微结构4的线电极2还进行超声清洗,待后续电解加工使用。It is true that before the high temperature treatment of the
请参见图4,在工件5表面制备微结构中,即电解加工过程中,线电极2不仅绕自身轴线旋转,同时沿着与阳极工件5横截面形状相同的平动路径9,从而在工件5整个表面加工出所需的微结构。通过协同控制线电极2的自转角速度ωr和沿工件5表面的平动速度vp,可实现不同尺寸微结构的柔性制备。Referring to FIG. 4 , in the preparation of the microstructure on the surface of the
请结合图5和图6,在超短脉冲作用下,线电极2表面将产生双电层充放电暂态效应,第二图案4所对应的区域由于具有很大的电化学阻抗,其表面形成的双电层时间常数也很大,导致在脉冲持续时间内,双电层充电电位无法达到工件5的电化学分解电位因此,在线电极2旋转过程中,阳极工件5表面与第二图案4所对应微区域内的材料不会发生电化学溶解(称为不溶解区8);而第一图案3部分所对应的区域由于电化学阻抗很小,所形成的双电层充/放电时间常数很小,在脉冲持续时间(ton)内,双电层的电位能够超过阳极工件5的电化学分解电位因此,在线电极2旋转过程中,阳极工件5表面与第一图案3所对应微区域内的材料将发生电化学溶解去除(称为溶解区7),以此得到具有微结构的工件5。Please refer to Fig. 5 and Fig. 6. Under the action of ultra-short pulses, the surface of the
请参见图7,本发明所示的加工方法适用于形状为由母线为直线扫描得到的任意曲面,工件5的表面为回转内面、回转外面、准回转内转面、准回转外转面、平面、准平面中的一个,诚然还可以为其他面,在此不做具体限制。Please refer to FIG. 7 , the processing method shown in the present invention is suitable for any curved surface whose shape is obtained by linear scanning of the generatrix. , one of the quasi-planes, it can also be other planes, no specific limitation is made here.
本发明中,电解加工主要包括以下几个步骤:首先,将所制备的表面具有第一微结构4的线电极2安装在微细电解加工平台中的线电极2夹具上,并精确调整其轴线与阳极工件5表面平行,以保证沿线电极2轴线方向各处线电极2与工件5之间的距离,即加工间隙10相同;然后,按照所需加工的微结构的特征尺寸及工件5表面形状,设置电解加工参数,其中包括电压、脉冲频率、脉冲持续时间、线电极2的自转角速度ωr、线电极2的平动路径9及平动速度vp等参数,开始进行电解加工,待加工结束后,线电极2表面的第一微结构4将按一定的比例转印到阳极工件5表面上;最后,电解加工结束后,将工件5进行超声清洗,除去表面残留的电解液等杂质,整个加工工艺过程结束。In the present invention, the electrolytic machining mainly includes the following steps: firstly, the
关于在工件5表面形成微结构的加工方法,下面结合图1并以具体实施例进行说明:Regarding the processing method for forming the microstructure on the surface of the
实施例一Example 1
步骤一、采用直径为1.0mm的钨棒1,将其分别依次在丙酮、酒精和去离子水中超声清洗5分钟,以除去其表面的油污和其他粉尘杂质。然后,置于100℃的真空干燥箱中烘烤10min,确保其表面相对干燥。Step 1: Using a
步骤二、采用激光扫描加工方法对上述钨棒1进行加工,使其表面形成第一微结构4,得到线电极2,请参见图2,其中第二图案4所对应的区域为激光加工的区域,第一图案3为钨棒的原始表面,即非激光加工区域。激光加工区域会形成大量的氧化物,电化学阻抗很大,在超短脉冲作用下,可等效为绝缘体,具体第一微结构4的形状和在钨棒1上的布局根据实际需要而定,在此不做具体限制。
步骤三、将步骤中二所制备的表面具有第一微结构4的线电极2分别依次在丙酮、酒精和去离子水中超声清洗5分钟,然后用自然风吹干,线电极2制备完毕。Step 3: The
步骤四、将所制备的线电极2安装在微细电解加工平台中的线电极夹具上,待加工阳极工件5为外径5.0mm、壁厚0.5mm的316L不锈钢管,将其固定在阳极夹具上。精确调整线电极2的轴线与阳极工件5表面平行,以保证在加工过程中沿线电极2轴线方向各处的加工间隙10相同,采用电流表进行干法对刀,设定加工间隙10为0.003mm,诚然,加工间隙10的数值也可以为其他,加工间隙10的范围为0.001mm-0.005mm,故,可根据实际确定加工间隙10的数值,在此不做限定。
步骤五、将超短脉冲电源6的频率设置为1MHz,超短脉冲持续时间ton为200ns,线电极2的自转角速度ωr为0.1rad/s,平动路径9设置为与316L不锈钢管同心的圆,圆的半径为线电极2的直径、工件5直径以及加工间隙的总和,即2.5mm+0.003mm+0.5mm,平动速度vp为0.01mm/s,电解加工完毕后,阳极工件5表面形成有所需要的微结构,具体可参见图3。其中,线电极2的自转角速度ωr和平动速度vp的具体值根据实际需要进行设置,在此不做具体限制。
步骤六、将具有微结构的阳极工件5分别在丙酮、酒精和去离子水中超声清洗5分钟,加工结束。Step 6: ultrasonically clean the
实施例二
步骤一、采用钨棒1的直径为0.5mm,对其清洗和干燥处理方法与实施例一相同,在此不在赘述。Step 1: The diameter of the
步骤二、将钨棒1浸泡在一定浓度的氟硅烷溶液中进行表面氟化处理,温度为60℃,时间为0.5小时;取出钨棒1,置于120℃的真空干燥箱中烘烤1.0小时,然后在空气环境中自然冷却,经过上述工艺后,钨棒1表面形成一层厚度为数百纳米的分子膜,该分子膜具有较大的电化学阻抗,在超短脉冲作用下,可等效为绝缘体。采用激光扫描加工方法对上述钨棒1进行加工,使其表面形成第一微结构4,得到线电极2,请参见图2,其中第一微结构4,即第二图案4所对应的区域为为分子膜保留区域,即非激光加工的区域,电化学阻抗很大,第一图案3为钨棒1的原始表面,即激光加工区域,分子膜被去除,钨棒1的原始表面露出,该区域电化学阻抗很小。具体第一微结构4的形状和在钨棒1上的布局根据实际需要而定,在此不做具体限制。Step 2: Immerse the
步骤三、将线电极2进行清洗,对其清洗的方法与实施例一相同,在此不在赘述。Step 3: Clean the
步骤四、本实施例的该步骤与实施例一中的步骤基本相同,不同点为:工件5为外径3.0mm、壁厚0.2mm的钛合金管,加工间隙10为0.002mm。
步骤五、本实施例的该步骤与实施例一中的步骤基本相同,不同点为:脉冲电源6脉冲持续时间ton设置为100ns,线电极2的自转角速度ωr设置为0.2rad/s,平动路径9设置为与钛合金管同心的圆,圆的半径为1.5mm+0.002mm+0.25mm,平动速度vp为0.005mm/s。
步骤六、将阳极工件5分别在丙酮、酒精和去离子水中超声清洗5分钟,整个加工工艺过程结束。In
综上,本发明所提供的在工件表面形成微结构的加工方法,使用表面具有较大电化学阻抗值的第一微结构的线电极作为工具电极,通过协同控制线电极的自转和围绕工件旋转,利用线电极表面双电层充电的暂态效应,结合线电极局部微区域内电化学阻抗的差异,实现工件表面的选择性电化学腐蚀,以可实现工件表面微结构阵列的柔性、可控制备,特别是实现小口径回转表面、准回转表面微结构阵列的加工,此外,线电极可重复使用,且该加工方法适用于任意由直线扫描得到的曲面。To sum up, the processing method for forming a microstructure on the surface of a workpiece provided by the present invention uses the wire electrode of the first microstructure with a large electrochemical impedance value on the surface as the tool electrode, and controls the rotation of the wire electrode and the rotation around the workpiece cooperatively. , using the transient effect of electric double layer charging on the surface of the wire electrode, combined with the difference in electrochemical impedance in the local micro-region of the wire electrode, to achieve selective electrochemical corrosion on the surface of the workpiece, so as to realize the flexibility and control of the microstructure array on the surface of the workpiece In particular, the processing of small-diameter revolving surfaces and quasi-revolving surface microstructure arrays can be realized. In addition, the wire electrode can be reused, and the processing method is suitable for any curved surface obtained by linear scanning.
以上实施例的各技术特征可以进行任意的组合,为使描述简洁,未对上述实施例中的各个技术特征所有可能的组合都进行描述,然而,只要这些技术特征的组合不存在矛盾,都应当认为是本说明书记载的范围。The technical features of the above embodiments can be combined arbitrarily. In order to make the description simple, all possible combinations of the technical features in the above embodiments are not described. However, as long as there is no contradiction in the combination of these technical features It is considered to be the range described in this specification.
以上实施例仅表达了本发明的几种实施方式,其描述较为具体和详细,但并不能因此而理解为对发明专利范围的限制。应当指出的是,对于本领域的普通技术人员来说,在不脱离本发明构思的前提下,还可以做出若干变形和改进,这些都属于本发明的保护范围。因此,本发明专利的保护范围应以所附权利要求为准。The above examples only represent several embodiments of the present invention, and the descriptions thereof are specific and detailed, but should not be construed as a limitation on the scope of the invention patent. It should be pointed out that for those of ordinary skill in the art, without departing from the concept of the present invention, several modifications and improvements can also be made, which all belong to the protection scope of the present invention. Therefore, the protection scope of the patent of the present invention should be subject to the appended claims.
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