CN111293028A - Method for determining H-mode discharge air pressure interval based on random power and control device - Google Patents
Method for determining H-mode discharge air pressure interval based on random power and control device Download PDFInfo
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- CN111293028A CN111293028A CN201911383983.0A CN201911383983A CN111293028A CN 111293028 A CN111293028 A CN 111293028A CN 201911383983 A CN201911383983 A CN 201911383983A CN 111293028 A CN111293028 A CN 111293028A
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- 238000000034 method Methods 0.000 title claims abstract description 12
- 238000001514 detection method Methods 0.000 claims abstract description 19
- 238000001228 spectrum Methods 0.000 claims description 21
- 239000000523 sample Substances 0.000 claims description 5
- 230000003247 decreasing effect Effects 0.000 claims description 2
- 210000002381 plasma Anatomy 0.000 description 58
- 230000009191 jumping Effects 0.000 description 8
- 238000000295 emission spectrum Methods 0.000 description 4
- 238000001748 luminescence spectrum Methods 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32266—Means for controlling power transmitted to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
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Abstract
The invention discloses a method and a control device for determining an H-mode discharge air pressure interval based on random power, which are characterized in that the random power W0 for realizing H-mode discharge in a target working power range of a plasma processing chamber is determined, and the minimum air pressure Pmin and the maximum air pressure Pmax for realizing H-mode discharge under the power are measured; when detecting the air pressure interval of other work power H-mode discharge modes of the plasma processing chamber, the air pressure range to be detected excludes part of the air pressure range, so that the detection range is reduced, the detection efficiency is improved, and the detection complexity is reduced.
Description
Technical Field
The present invention relates to a plasma processing apparatus, and more particularly, to a method and apparatus for controlling a plasma discharge mode.
Background
There are two discharge modes in ICP: one is a capacitively coupled discharge mode, i.e., E-mode; the other is an inductively coupled discharge mode, i.e., H-mode. When the applied power or radio frequency current is low, the density of plasmas in the space is low, the spectrum intensity is weak, and the discharge is mainly maintained by a capacitive heating electric field, namely an E mode; with the increase of the discharge power, when a certain value is reached, the plasma density is rapidly increased, the luminous spectrum intensity is sharply increased, and at the moment, the discharge mode is driven by the inductively coupled annular electric field, namely an H mode.
With the change of external experimental conditions, the discharge mode of the ICP jumps between the E mode and the H mode, and simultaneously the discharge mode of the ICP is accompanied by the sharp change of plasma parameters. The discharge mode conversion of ICP and the abrupt change of plasma parameters can have great influence on the processes of plasma film preparation, plasma etching, plasma photoresist removal and the like. Compared with E-mode discharge, in an H-mode discharge state, the plasma density is higher, the electron temperature is higher, and the spatial distribution is more uniform; however, the conventional plasma processing apparatus is insufficient in terms of how to quickly determine the conditions for the H-mode discharge.
Disclosure of Invention
The invention mainly provides a method and a control device for quickly determining an H-mode discharge air pressure interval under specific power.
Because the plasma H-mode discharge has excellent performance, the plasma is required to be in an H-mode discharge state in practical application, but at present, no effective technology for quickly determining the H-mode discharge pressure exists, only the gradual measurement is needed, the determination time is long, and the operation is complex. The invention reduces the detection range by detecting in the specific range of the air pressure, and can adjust the detection times according to the actual precision requirement and quickly determine the H-mode discharge air pressure interval under the specific power.
With the change of external experimental conditions, the discharge mode of the ICP jumps between the E mode and the H mode, and simultaneously the discharge mode of the ICP is accompanied by the sharp change of plasma parameters. When the plasma discharges, the E-mode discharge, the H-mode discharge and the E-mode discharge are sequentially carried out on the plasma discharge from low pressure to high pressure. The gas pressure is increased, the collision probability of electrons and neutral particles is increased, the ionization degree is correspondingly increased, but the mean free path of the electrons is reduced, the energy of the electrons is reduced, and the gas is not favorably ionized. Therefore, when the gas pressure is lower, the density of the plasma is lower, the impedance of the discharge gas is larger, and when the power is constant, the output power is lower, and the plasma is in E-mode discharge; with the increase of the gas pressure, the plasma density is increased, the conductivity of the gas is increased, the impedance of the discharge gas is reduced, the output power is increased, when the impedance is reduced to a certain value, the impedance is matched with the impedance network of the power supply, the discharge mode conversion is generated, and the plasma is in H-mode discharge; when the gas pressure continues to increase, because the gas molecules are too many, the plasma locally and frequently collides, the ionization degree is reduced along with the continuous increase of the gas pressure, the plasma density and the temperature are both reduced, the space gas impedance is increased, the output power is reduced, and the plasma discharge mode is changed from the H mode to the E mode.
The inventor finds that the mode E and the mode H jump, and a specific rule exists under different powers: when the power is continuously increased, the air pressure jumping from the E mode to the H mode is continuously reduced, the air pressure jumping from the H mode to the E mode is continuously increased, and the air pressure discharging range of the H mode is continuously increased when the power is continuously increased.
Plasma luminescence spectrum intensity is commonly used to characterize plasma density in a chamber, with the stronger the luminescence spectrum intensity, the greater the plasma density.
Fig. 1-3 show that the luminous spectrum intensity of 326W, 357W and 386W plasma varies with the air pressure, and under the conditions of 326W, 357W and 386W, the air pressure jumping from E mode to H mode decreases continuously, the air pressure jumping from H mode to E mode increases continuously, and the air pressure range of H mode discharge increases continuously.
FIG. 4 shows a comparison graph of the intensities of the light emission spectra of 326W, 357W and 386W plasmas in the same coordinate system along with the change of the gas pressure.
When quickly determining the H-mode discharge pressure interval at a specific power: first, the random power W0 for achieving the H-mode discharge, the minimum air pressure Pmin at which the H-mode discharge is achieved, and the maximum air pressure Pmax are determined in the target operating power range. When the power is continuously increased, the air pressure range of H-mode discharge is continuously increased, and when the power is continuously increased, the air pressure jumping from the E mode to the H mode is continuously reduced, and the air pressure jumping from the H mode to the E mode is continuously increased; the range of the air pressure of H mode discharge is continuously reduced when the power is continuously reduced, and the air pressure jumping from E mode to H mode is continuously increased and the air pressure jumping from H mode to E mode is continuously reduced when the power is continuously reduced.
Since the power W0 is a random power in the target operating power range, when other target operating powers are adopted, the pressure range of H-mode discharge under the target operating power can be determined by comparing the target power with the random power W0. When the target working power is larger than the random power W0, the air pressure range of H-mode discharge is larger than Pmin to Pmax; when the target working power is smaller than the random power W0, the air pressure range of H-mode discharge is smaller than Pmin to Pmax.
When the H-mode discharge air pressure interval under specific power is rapidly determined for detection, the air pressure range is partially excluded, so that the detection range is reduced, the detection efficiency is improved, and the detection complexity is reduced.
Drawings
FIG. 1 is a graph of the spectral intensity of 326W plasma emission as a function of gas pressure.
FIG. 2 shows 357W plasma luminescence spectrum intensity as a function of gas pressure.
FIG. 3 is a graph of the luminous spectral intensity of 386W plasma as a function of gas pressure.
FIG. 4 is a comparison graph of the intensities of the light emission spectra of 326W, 357W and 386W plasmas in the same coordinate system along with the change of the gas pressure.
Fig. 5 shows a plasma processing apparatus.
Detailed Description
Fig. 5 shows a plasma processing apparatus including a deceleration grid 1, an acceleration grid 2, a control grid 3, a quartz screen 4, an induction coil 5, an RF source and matching circuit 6, a flow meter 7, a probe 8, a vacuum pump 9, a conductive column 10, an evaporation boat 11, a substrate 12, a viewing window 13, and a control device (not shown). The RF source and matching circuit 6 powers an induction coil which generates an electromagnetic field to cause the gas in the chamber to generate a plasma, and the probe 8 is used to assist in diagnosing plasma parameters.
The grating spectrometer is arranged outside the observation window 13 and is used for measuring the luminous spectrum intensity of the plasma in the cavity. The plasma luminous spectrum intensity is used for representing the plasma density in the cavity, and the plasma density is larger when the plasma luminous spectrum intensity is stronger.
The emission spectrum of Ar gas is measured by adopting a WDS8A type combined multifunctional grating spectrometer, and the observation window of the discharge chamber is connected with the grating spectrometer through an optical fiber so as to measure the intensity of the plasma emission spectrum in the chamber. An example of a plasma-generating gas within the chamber is Ar.
The evaporation boat 11 is a molybdenum boat, and the conductive column 10 is a copper column.
The vacuum pump 9 is a mechanical pump and a molecular pump connected in series.
The method for rapidly determining the H-mode discharge interval mainly comprises the following steps:
firstly, working gas is introduced into the plasma processing chamber, random power W0 for realizing H-mode discharge in a target working power range of the plasma processing chamber is determined, and minimum air pressure Pmin and maximum air pressure Pmax for realizing H-mode discharge under the power are measured.
Secondly, determining the working power as W, wherein the minimum air pressure to be determined to realize H-mode discharge under the power is P0; dividing the air pressure 0 to Pmin in the chamber into n parts;
when working power W>Random power W0, the detection pressure is sequentially decreased, and whether the jump of the plasma luminous spectrum intensity occurs under the detection pressure, i.e. the jump is detected
A is a natural number larger than 1, n is a natural number larger than 1 and A is not larger than n, namely when A is a certain value A0, the luminous spectrum intensity of the plasma jumps, the plasma exits H-mode discharge, and the minimum air pressure of H-mode discharge when the power is W is equal to
When working power W<Random power W0, the detection pressure is sequentially increased to detect whether the jump of plasma luminous spectrum intensity occurs under the pressure, i.e. the jump
A is a natural number larger than 1, n is a natural number larger than 1, namely when A takes a certain value A1,the luminous spectrum intensity of the plasma jumps, and when the plasma enters an H mode to discharge, the air pressure
The minimum pressure of H-mode discharge when the working power is W; if the plasma luminous spectrum intensity jump cannot be realized even if P is larger than or equal to Pmax, H-mode discharge cannot be realized under the power;
step three, when the working power W>At random power W0, the maximum jump pressure to be determined for realizing H-mode discharge is
Wherein, B takes the natural number more than 1 in turn, n is the natural number more than 1, namely, when B takes a certain value B0, the luminous spectrum intensity of the plasma jumps, at this moment, the plasma exits the H-mode discharge, then the air pressure
The maximum pressure of H-mode discharge at power W;
when working power W<At random power W0, the maximum jump pressure to be determined for realizing H-mode discharge is
Wherein, B takes the natural number more than 1 in turn, n is the natural number more than 1, namely, when B takes a certain value B1, the luminous spectrum intensity of the plasma jumps, at this moment, the plasma enters the H mode to discharge, then the air pressure
The maximum pressure of H-mode discharge at power W;
fourthly, when the working power is W, the gas pressure interval of the plasma maintaining H-mode discharge is as follows: p0 to Pm.
The value of n can be reasonably adjusted according to the actual measurement precision; when the requirement on detection precision is high, the value of n is large; and when the detection precision requirement is low, the value of n is small. Such as n-5, 10, 50, etc.
The control device can control the power of the plasma processing device and control a vacuum pump 9 to automatically adjust the air pressure in the cavity of the plasma processing device according to the value of n, and finally obtain the H-mode discharge air pressure interval of the plasma under the specific power.
Claims (4)
1. A method for rapidly determining an H-mode discharge interval under specific power is characterized in that: the method comprises the following steps:
firstly, introducing working gas into a plasma processing chamber, determining random power W0 for realizing H-mode discharge in a target working power range of the plasma processing chamber, and measuring minimum air pressure Pmin and maximum air pressure Pmax for realizing H-mode discharge under the power;
secondly, determining the working power as W, wherein the minimum air pressure to be determined to realize H-mode discharge under the power is P0; dividing the air pressure 0 to Pmin in the chamber into n parts;
when working power W>Random power W0, the detection pressure is sequentially decreased, and whether the jump of the plasma luminous spectrum intensity occurs under the detection pressure, i.e. the jump is detected
A is a natural number larger than 1, n is a natural number larger than 1 and A is not larger than n, namely when A is a certain value A0, the luminous spectrum intensity of the plasma jumps, the plasma exits H-mode discharge, and the minimum air pressure of H-mode discharge when the power is W is equal to
When working power W<Random power W0, the detection pressure is sequentially increased to detect whether the jump of plasma luminous spectrum intensity occurs under the pressure, i.e. the jump
A is a natural number larger than 1, n is a natural number larger than 1, namely when A is a certain value A1, the luminous spectrum intensity of the plasma jumps, and the plasma enters H-mode discharge, so that the air pressure
The minimum pressure of H-mode discharge when the working power is W; if the plasma luminous spectrum intensity jump cannot be realized even if P is larger than or equal to Pmax, H-mode discharge cannot be realized under the power;
thirdly, keeping the working power W; when working power W>At random power W0, the maximum jump pressure to be determined for realizing H-mode discharge is
Wherein, B takes the natural number more than 1 in turn, n is the natural number more than 1, namely, when B takes a certain value B0, the luminous spectrum intensity of the plasma jumps, at this moment, the plasma exits the H-mode discharge, then the air pressure
The maximum pressure of H-mode discharge at power W;
when working power W<At random power W0, the maximum jump pressure to be determined for realizing H-mode discharge is
Wherein, B takes the natural number more than 1 in turn, n is the natural number more than 1, namely, when B takes a certain value B1, the luminous spectrum intensity of the plasma jumps, at this moment, the plasma enters the H mode to discharge, then the air pressure
The maximum pressure of H-mode discharge at power W;
fourthly, when the working power is W, the gas pressure interval of the plasma maintaining H-mode discharge is as follows: p0 to Pm.
2. The method of claim 1, wherein the method further comprises: when the detection precision requirement is high, the value of n is more than 10; and when the detection precision requirement is low, the value of n is less than 5.
3. A control apparatus for rapidly determining an H-mode discharge pressure interval at a specific power, which employs the method for rapidly determining an H-mode discharge interval of claim 1 or 2, wherein:
the control device can control the power of the plasma processing device, control the vacuum pump 9 to automatically adjust the air pressure in the cavity of the plasma processing device according to the value of n, judge the plasma discharge mode by detecting the luminous spectrum intensity of the plasma, and finally obtain the H-mode discharge air pressure interval of the plasma under specific power.
4. The control apparatus for rapidly determining an H-mode discharge pressure interval at a specific power as claimed in claim 3, wherein: probes are employed to aid in diagnosing plasma parameters.
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103776818A (en) * | 2013-12-26 | 2014-05-07 | 四川大学 | Glow discharge-based plasma generator and spectrum detection system formed by same |
| CN110337170A (en) * | 2019-07-11 | 2019-10-15 | 哈尔滨工业大学 | A kind of high-density plasma jet flow generating apparatus based on current driving techniques reversed-field configuration structure |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103776818A (en) * | 2013-12-26 | 2014-05-07 | 四川大学 | Glow discharge-based plasma generator and spectrum detection system formed by same |
| CN110337170A (en) * | 2019-07-11 | 2019-10-15 | 哈尔滨工业大学 | A kind of high-density plasma jet flow generating apparatus based on current driving techniques reversed-field configuration structure |
Non-Patent Citations (2)
| Title |
|---|
| 王波;王权;王荷军;张天一;: "射频感应耦合等离子体模式转变的发射光谱", 北京工业大学学报, no. 03, 20 December 2017 (2017-12-20) * |
| 祖新慧;孙景超;张俊;李俊龙;: "ICP中放电模式转化过程中悬浮电位变化的多样性", 沈阳航空工业学院学报, no. 01, 15 February 2008 (2008-02-15) * |
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