CN111278207A - Plasma generation system and electronic equipment - Google Patents
Plasma generation system and electronic equipment Download PDFInfo
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- CN111278207A CN111278207A CN202010203963.7A CN202010203963A CN111278207A CN 111278207 A CN111278207 A CN 111278207A CN 202010203963 A CN202010203963 A CN 202010203963A CN 111278207 A CN111278207 A CN 111278207A
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- plasma generator
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
Abstract
The invention discloses a plasma generation system and electronic equipment. The invention comprises the following steps: a plasma generator including an electrode pair for generating plasma; the current detection device is connected with the plasma generator and is used for acquiring the working current of the plasma generator; and the duty ratio adjusting device is connected with the current detecting device and used for determining whether to adjust the on-off duty ratio of the plasma generator according to the working current. The invention solves the technical problem that the plasma generator in the related art works at a fixed duty ratio, so that the function of the plasma generator is difficult to play.
Description
Technical Field
The present invention relates to the field of plasma, and more particularly, to a plasma generation system and an electronic device.
Background
In the related art, the plasma generator is a device that generates positive and negative ions by generating a large voltage difference between two electrodes to ionize air near the electrodes.
The electrode trigger power supply of the plasma has two types of alternating current and direct current, and the alternating current plasma trigger has certain disadvantage in safety due to high power supply, so that the alternating current plasma trigger is difficult to popularize in household electrical products; the direct current plasma trigger is supplied by low-voltage direct current, the safe voltage has certain advantages in application and popularization, but after the low-voltage direct current power supply is boosted to high voltage, the two electrodes have certain probability of arc discharge and ignition, and certain danger exists.
However, in the related art, there is a phenomenon that, in the operation process of the dc plasma generator, when there is contamination between the two high voltage electrodes, the insulation level between the two electrodes is reduced, so that arcing occurs, and if the arcing cannot be cancelled in time, system failure or ignition due to excessive temperature is easily caused.
A plasma generation system generally used in the related art uses a pulse control method, and the plasma generation system turns on a plasma generator according to a certain duty ratio, although the problems of arcing and the like of the system are avoided to a certain extent.
However, in this method, the plasma concentration is greatly attenuated to meet the system concentration requirement, and in this control method, the plasma operates at a constant duty ratio in any state, and it is difficult to perform the function of the plasma generator.
In view of the above problems in the related art, no effective solution has been proposed.
Disclosure of Invention
The invention mainly aims to provide a plasma generating system and an electronic device, which are used for solving the technical problem that in the related art, a plasma generator works at a fixed duty ratio, so that the function of the plasma generator is difficult to play.
To achieve the above object, according to one aspect of the present invention, a plasma generation system is provided. The system comprises: a plasma generator including an electrode pair for generating plasma; the current detection device is connected with the plasma generator and is used for acquiring the working current of the plasma generator; and the duty ratio adjusting device is connected with the current detecting device and used for determining whether to adjust the on-off duty ratio of the plasma generator according to the working current.
Further, the plasma generator includes: and the switch module is used for controlling the plasma generator to work.
Further, the plasma generator further includes: and the boosting module is connected between the switch module and the electrode pair and used for providing a high-voltage electric field for the electrode pair.
Further, the duty ratio adjusting means includes: and the main control chip is used for comparing the working current with the threshold current and determining the pulse duty ratio of the plasma generator according to the comparison result.
Further, the main control chip further comprises: the first control unit is used for reducing the on-off duty ratio of the plasma generator when the current generated by the plasma generator exceeds a threshold current; and the second control unit is used for maintaining the on-off duty ratio of the plasma generator unchanged when the current generated by the plasma generator does not exceed the threshold current.
Further, the system further comprises: and the control panel is connected with the duty ratio adjusting device and comprises at least one first key, and the first key is used for adjusting the on-off duty ratio of the plasma generator.
Further, the control panel further includes: and the second key is used for adjusting the working mode of the plasma generator, wherein the working mode of the plasma generator comprises a first mode and a second mode, the working mode that one pair of electrodes are in a working state is the first mode, and the working mode that the plurality of pairs of electrodes are in the working state is the second mode.
Furthermore, the plasma generators are multiple, each plasma generator comprises a pair of electrode pairs, the current detection devices are multiple, and the plasma generators correspond to the current detection devices one by one.
Further, the switch module includes any one of: triode, MOSFET tube.
In order to achieve the above object, according to another aspect of the present invention, an electronic apparatus is provided. The electronic device includes: the plasma generation system described above.
By the invention, the following parts are adopted: a plasma generator including an electrode pair for generating plasma; the current detection device is connected with the plasma generator and is used for acquiring the working current of the plasma generator; the duty ratio adjusting device is connected with the current detecting device and used for determining whether to adjust the on-off duty ratio of the plasma generator according to the working current, so that the technical problem that the plasma generator in the related technology works at a fixed duty ratio to cause difficulty in exerting the effect of the plasma generator is solved, and the effect of improving the reliability of the plasma generating system is further achieved.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate an embodiment of the invention and, together with the description, serve to explain the invention and not to limit the invention. In the drawings:
FIG. 1 is a schematic diagram of a plasma generation system provided in accordance with an implementation of the present invention;
FIG. 2 is a pulse diagram of one-half on-off duty cycle; and
fig. 3 is a pulse diagram of a three-quarter on-off duty cycle.
Wherein the following reference numerals are included:
10, a plasma generator; 20, a current detection device; 30, duty cycle adjusting means; 101, a switch module;
102, a boost module; 301, a main control chip; and 40, a control panel.
Detailed Description
It should be noted that the embodiments and features of the embodiments may be combined with each other without conflict. The present invention will be described in detail below with reference to the embodiments with reference to the attached drawings.
In order to make the technical solutions of the present invention better understood, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
It should be noted that the terms "first," "second," and the like in the description and claims of the present invention and in the drawings described above are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used may be interchanged under appropriate circumstances in order to facilitate the description of the embodiments of the invention herein. Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.
According to an embodiment of the present invention, a plasma generation system is provided.
Fig. 1 is a schematic diagram of a plasma generation system provided in accordance with an implementation of the present invention. As shown in fig. 1, the system includes the following parts: plasma generator 10, current detection device 20, duty cycle adjusting device 30.
Specifically, the plasma generator 10 includes an electrode pair for generating plasma.
Specifically, the current detection device 20 is connected to the plasma generator 10, and is configured to obtain an operating current of the plasma generator 10.
Specifically, the duty ratio adjusting device 30 is connected to the current detecting device 20, and is used for determining whether to adjust the on-off duty ratio of the plasma generator 10 according to the working current.
As mentioned above, the plasma generator 10 provided by the present application may include a pair of electrodes or a plurality of pairs of electrodes, each pair of electrodes includes a positive electrode and a negative electrode for generating ionization and thus generating plasma. The current detection device 20 is connected to the plasma generator 10 and configured to obtain a working current of the plasma generator 10, where it is noted that the working current is directly proportional to a concentration of plasma generated by the plasma generator 10, and when the working current is large, the concentration of the plasma is high, and when the current is small, the concentration of the plasma is low, the current detection device 20 feeds back the obtained working current to the duty ratio adjustment device 30, and the duty ratio adjustment device 30 compares the fed-back working current with a threshold current, and if the working current exceeds the threshold current, it indicates that the plasma generator 10 has an arc discharge risk, and it is necessary to adjust an on-off duty ratio of the plasma generator 10 to avoid an arc discharge phenomenon.
It should be noted that the operation of the plasma generator 10 is generally controlled by pulses, and therefore, the embodiments provided herein adjust the on-off duty ratio, including the pulse duty ratio, for controlling the operation of the plasma generator 10.
According to the plasma generating system provided by the embodiment of the invention, the plasma generator 10 comprises an electrode pair, wherein the electrode pair is used for generating plasma; the current detection device 20 is connected with the plasma generator 10 and is used for acquiring the working current of the plasma generator 10; the duty ratio adjusting device 30 is connected to the current detecting device 20, and is configured to determine whether to adjust the on-off duty ratio of the plasma generator 10 according to the working current, so as to solve the technical problem that the plasma generator 10 is difficult to perform the function of the plasma generator 10 when the plasma generator 10 works at a fixed duty ratio in the related art, and further achieve the effect of improving the reliability of the plasma generating system.
Alternatively, the plasma generator 10 includes: and the switching module 101 is used for controlling the operation of the plasma generator 10.
Specifically, as shown in fig. 1, each plasma generator 10 includes a switching module 101, and the switching module 101 controls the plasma generator 10 to operate based on pulse duty ratios, where the pulse duty ratios are divided into a plurality of types and specifically set according to actual situations, fig. 2 and 3 are schematic diagrams of two pulse duty ratios, fig. 2 is a schematic diagram of pulses with one-half on-off duty ratio, and fig. 3 is a schematic diagram of pulses with three-quarter on-off duty ratio.
Optionally, the plasma generator 10 further includes: and the voltage boosting module 102 is connected between the switch module 101 and the electrode pair and is used for providing a high-voltage electric field for the electrode pair.
Specifically, the plasma generator 10 is connected to a switch module 101, and a voltage boost module 102 is provided for providing a high voltage electric field to the electrode pair when the plasma generator 10 is in operation.
Optionally, the duty ratio adjusting device 30 includes: and the main control chip 301 is configured to compare the working current with a threshold current, and determine a pulse duty ratio of the plasma generator 10 according to a comparison result.
Specifically, if 1 shows, the duty ratio adjusting device 30 includes a main control chip 301, and compares the working current of the plasma generator 10 fed back by the current detecting device 20 with a threshold current, and when the working current is greater than the threshold current, reduces the on-off duty ratio for controlling the operation of the plasma generator 10, for example, reduces three-fourths of the on-off duty ratio to one-half of the duty ratio.
It should be noted that the threshold current is obtained in advance through experiments, and when the operating current of the plasma generator 10 is larger than the threshold current, the concentration of the plasma generated by the plasma generator 10 may cause arcing.
Optionally, the main control chip 301 further includes: a first control unit for reducing an on-off duty ratio of the plasma generator 10 when a current generated by the plasma generator 10 exceeds a threshold current; and a second control unit for maintaining the on-off duty ratio of the plasma generator 10 unchanged when the current generated by the plasma generator 10 does not exceed the threshold current.
Specifically, the main control chip 301 further includes a first control unit and a second control unit, the first control unit is a main adjusting component of the duty ratio adjusting device 30, and when the working current is detected to be greater than the threshold current, the on-off duty ratio for controlling the operation of the plasma generator 10 is adjusted to a lower duty ratio, so that the concentration of the plasma generated by the plasma generator 10 is reduced, and the risk of arc discharge is avoided. Conversely, the second control unit is also used to monitor the operating current and maintain the on-off duty cycle of plasma generator 10 constant if the operating current does not exceed the threshold current.
That is, when the plasma concentration is a fixed concentration, if the current exceeds a predetermined limit value, and there is an arc discharge risk, the current opening duty ratio is reduced, so that the electrode current is reduced, and the reliable operation of the system is ensured.
Therefore, under the condition of automatic concentration, the system reasonably adjusts the duty ratio of plasma opening according to the condition of detected current, improves the performance of the system and ensures the reliable operation of the system.
By the method, the on-off duty ratio of the plasma generator 10 is changed according to the detection condition of the working current, the plasma concentration is adjusted, and the problem of plasma arc discharge caused by overlarge current is avoided.
Alternatively, there are a plurality of plasma generators 10, each plasma generator 10 includes a pair of electrode pairs, there are a plurality of current detection devices 20, and plasma generators 10 correspond to current detection devices 20 one by one.
Specifically, in an alternative embodiment, the plasma generation system includes a plurality of plasma generators 10, each plasma generator 10 includes a pair of electrodes, the current detection device 20 also includes a plurality of plasma generators 10, one plasma generator 10 is correspondingly connected to one plasma generator 10, and the plurality of plasma generators 10 share one MCU, that is, share one main control chip 301.
The present application also provides another alternative embodiment, in which a plasma generator 10 is included in the plasma generating system, one or more pairs of electrodes are disposed in the plasma generator 10 according to a certain rule, and the plasma generator 10 can control one or more pairs of electrodes in the plasma generator 10 to operate to generate plasma.
Optionally, the system further comprises: and the control panel 40 is connected with the duty ratio adjusting device 30 and comprises at least one first key, and the first key is used for adjusting the on-off duty ratio of the plasma generator 10.
In the above, in an alternative embodiment provided in this application, as shown in fig. 1, the plasma generation system further includes a control panel 40 connected to the duty ratio adjusting device 30, the control panel 40 includes a plurality of keys, the keys are classified into different types, one of the keys is a key for adjusting the on-off duty ratio of the operation of the plasma generator 10, and includes a key for adjusting the duty ratio, the on-off duty ratio of the plasma generator 10 can be adjusted by pressing the key for different times, for example, one time, the on-off duty ratio of the plasma generator 10 is determined as a half duty ratio, and two times, and the on-off duty ratio is determined as three quarters.
Optionally, the control panel 40 further comprises at least one second key for adjusting the operation mode of the plasma generator 10, wherein the operation mode of the plasma generator 10 includes a first mode and a second mode, the operation mode in which one pair of electrodes are in operation is the first mode, and the operation mode in which a plurality of pairs of electrodes are in operation is the second mode.
Specifically, the present application also provides an embodiment of controlling the operation of multiple pairs of electrodes in the plasma generator 10 through the keys on the control panel 40, and the second key can be used for setting the user to the enhanced mode or the normal mode, and the enhanced mode is different from the normal mode in that whether multiple pairs of electrodes are operated according to the above scheme, wherein the enhanced mode electrode pairs are integer multiples of the normal mode electrodes, and the enhanced mode plasma concentration is also integer multiples of the normal mode plasma concentration, as the above control scheme of one pair of electrodes can be understood as the normal mode.
Optionally, the switch module 101 includes any one of: triode, MOSFET tube.
In order to achieve the above object, according to another aspect of the present invention, an electronic apparatus is provided. The electronic device includes: the plasma generation system described above.
Specifically, the electronic device may be an air purifier and an air conditioner.
It should also be noted that the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in the process, method, article, or apparatus that comprises the element.
As will be appreciated by one skilled in the art, embodiments of the present invention may be provided as a method, system, or computer program product. Accordingly, the present invention may take the form of an entirely hardware embodiment, an entirely software embodiment or an embodiment combining software and hardware aspects. Furthermore, the present invention may take the form of a computer program product embodied on one or more computer-usable storage media (including, but not limited to, disk storage, CD-ROM, optical storage, and the like) having computer-usable program code embodied therein.
The above are merely examples of the present invention, and are not intended to limit the present invention. Various modifications and alterations to this invention will become apparent to those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention should be included in the scope of the claims of the present invention.
Claims (10)
1. A plasma generation system, comprising:
a plasma generator including an electrode pair for generating plasma;
the current detection device is connected with the plasma generator and is used for acquiring the working current of the plasma generator;
and the duty ratio adjusting device is connected with the current detecting device and used for determining whether to adjust the on-off duty ratio of the plasma generator or not according to the working current.
2. The system of claim 1, wherein the plasma generator comprises:
and the switch module is used for controlling the plasma generator to work.
3. The system of claim 2, wherein the plasma generator further comprises:
and the boosting module is connected between the switch module and the electrode pair and used for providing a high-voltage electric field for the electrode pair.
4. The system of claim 2, wherein the duty cycle adjusting means comprises:
and the main control chip is used for comparing the working current with a threshold current and determining the pulse duty ratio of the plasma generator according to the comparison result.
5. The system of claim 4, wherein the master control chip further comprises:
a first control unit for reducing the on-off duty cycle of the plasma generator when the current generated by the plasma generator exceeds the threshold current;
a second control unit for maintaining the on-off duty cycle of the plasma generator unchanged when the current generated by the plasma generator does not exceed the threshold current.
6. The system of claim 1, further comprising:
and the control panel is connected with the duty ratio adjusting device and comprises at least one first key, and the first key is used for adjusting the on-off duty ratio of the plasma generator.
7. The system of claim 6, wherein the control panel further comprises at least one second button for adjusting an operation mode of the plasma generator, wherein the operation mode of the plasma generator comprises a first mode and a second mode, the first mode being an operation mode in which one pair of the electrodes is in an operation state, and the second mode being an operation mode in which a plurality of pairs of the electrodes are in an operation state.
8. The system of claim 1, wherein there are a plurality of said plasma generators, each of said plasma generators includes a pair of said electrode pairs, there are a plurality of said current detection means, and said plasma generators are in one-to-one correspondence with said current detection means.
9. The system of claim 3, wherein the switch module comprises any one of: triode, MOSFET tube.
10. An electronic device comprising a plasma generation system, characterized in that the plasma generation system is the plasma generation system of any one of claims 1 to 8.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010203963.7A CN111278207A (en) | 2020-03-21 | 2020-03-21 | Plasma generation system and electronic equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010203963.7A CN111278207A (en) | 2020-03-21 | 2020-03-21 | Plasma generation system and electronic equipment |
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| Publication Number | Publication Date |
|---|---|
| CN111278207A true CN111278207A (en) | 2020-06-12 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010203963.7A Pending CN111278207A (en) | 2020-03-21 | 2020-03-21 | Plasma generation system and electronic equipment |
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| CN (1) | CN111278207A (en) |
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- 2020-03-21 CN CN202010203963.7A patent/CN111278207A/en active Pending
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