CN111254399A - Ta-TaN-TaWN superhard coating cutter and preparation method thereof - Google Patents
Ta-TaN-TaWN superhard coating cutter and preparation method thereof Download PDFInfo
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- CN111254399A CN111254399A CN201910965629.2A CN201910965629A CN111254399A CN 111254399 A CN111254399 A CN 111254399A CN 201910965629 A CN201910965629 A CN 201910965629A CN 111254399 A CN111254399 A CN 111254399A
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- cutter
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention belongs to the technical field of cutter coating materials, and relates to a Ta-TaN-TaWN superhard coating cutter and a preparation method thereof. The cutter substrate material can be high-speed steel, hard alloy, ceramic and other materials, and the coating comprises a Ta transition layer, a TaN hard coating and a TaWN super hard coating from inside to outside in sequence. The coating of the coated cutter is prepared by adopting a method combining magnetron sputtering and multi-arc ion plating. The transition layer material of the coated cutter is compact and is firmly combined with the interface of the cutter base material. The hardness of TaN layer, TaWN layer all is higher, and hardness increases in proper order, and the cutter surface possesses super high hardness and high wearability. The cutter can be widely applied to cutting processing of metal materials, and can prolong the service life of the cutter and improve the production efficiency of cutting processing.
Description
Technical Field
The invention relates to a Ta-TaN-TaWN superhard coating cutter and a preparation method thereof, belonging to the technical field of cutter coating materials.
Background
The mechanical manufacturing industry provides technical equipment for the whole national economy, is a material foundation for national economy and social development and national defense construction, and the development level of the mechanical manufacturing industry is an important mark of national comprehensive strength. The cutting technology is the most widely applied basic technology in the machine manufacturing industry, and the progress of the cutting tool technology is the key for the rapid development of the cutting technology. In recent years, in order to meet new requirements for cutting tools such as dry cutting and high-speed cutting, the metal cutting tool industry is continuously trying to develop new wear-resistant tool materials, tool coatings and develop optimized designs of tool geometric structures, and the methods all solve the bottleneck problem of limiting the development of cutting technology to a certain extent. Among these methods, the coating is most widely applicable, but the bonding problem between the coating and the base material becomes a large factor that restricts the performance, and particularly the bonding performance of the coating to the transition layer of the bonding portion of the tool base is important. In addition, the hardness and the wear resistance of the coating are further improved, and the method has important significance for breaking through the efficient processing of difficult-to-process materials. For this reason, the development of new high-bond strength, high-hardness coatings will have a significant impact on facilitating the expansion of the range of applications of coated tools and the advancement of cutting machining techniques.
Chinese patent "application number: 201710532821.3 reports an AlNbCN multi-component gradient composite coating cutter and a preparation method thereof, the invention adopts a composite method of medium-frequency magnetron sputtering and multi-arc plating to sequentially deposit a Ti transition layer, an AlNbC transition layer and an AlNbCN coating with gradually changed nitrogen content gradient on the surface of a cutter substrate, and the cutter has higher hardness and strength and can be applied to finish machining and semi-finish machining of various metal materials. Chinese patent "application number: 201710532824.7 reports a SiZrCN gradient composite coating cutter and a preparation method thereof, the invention adopts a composite coating method of unbalanced magnetron sputtering and arc plating to deposit a SiZrCN gradient hard coating with gradually changed nitrogen content gradient on the surface of a cutter substrate, wherein Ti is used as a transition layer, and the coating has good hardness and thermal stability.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides a Ta-TaN-TaWN superhard coating cutter and a preparation method thereof, so that the interface bonding strength of a coating and a substrate is further improved, the surface hardness of the coating is improved, the application range of the coating cutter is expanded, and the cutting processing efficiency is improved.
According to the Ta-TaN-TaWN superhard coating cutter, the cutter base material can be conventional cutter materials such as high-speed steel, hard alloy, ceramic and the like, and the coating is sequentially provided with a Ta transition layer, a TaN hard coating and a TaWN superhard coating from inside to outside along the outer surface of the base. The superhard coating cutter is characterized in that a Ta transition layer, a TaN hard coating and a TaWN superhard coating are respectively and sequentially deposited on the surface of a cutter substrate by adopting a method combining magnetron sputtering and multi-arc ion plating, a required elementary substance material is respectively selected for preparing each coating as a radio frequency target material, mixed gas of nitrogen and argon is introduced, the mass fraction ratio of the nitrogen to the argon is 1: 4, the deposition pressure is 0.5-1.0Pa, the deposition temperature is controlled to be 350-450 ℃, the thickness of the Ta transition layer is controlled to be 0.5-0.8 mu m, the thickness of the TaN hard coating is 1.0-1.2 mu m, and the thickness of the TaWN superhard coating is 0.8-1.5 mu m.
The invention discloses a novel Ta-TaN-TaWN superhard coating cutter and a preparation method thereof by depositing a multi-element hard coating through combining magnetron sputtering with multi-arc ion plating. Compared with the conventional titanium nitride coating, the Ta element selected by the invention has higher density than the Ti element, so that the high compactness and high bonding strength of the transition layer of the coating are ensured; compared with the traditional hard coating cutter, the TaN layer and the TaWN layer are gradually transited, and the TaWN layer has ultrahigh hardness; the cutter has the excellent advantages of super-hard surface and high substrate bonding strength. The Ta-TaN-TaWN superhard coating cutter can be widely applied to cutting processing of metal materials, particularly metal materials which are difficult to process, and the service life of the cutter and the cutting processing production efficiency can be effectively improved.
Detailed Description
The present invention is further illustrated by the following specific examples, which are intended to be illustrative, not limiting and are not intended to limit the scope of the invention.
A Ta-TaN-TaWN superhard coating cutter is characterized in that a cutter base body is made of YG6 hard alloy, and a Ta transition layer, a TaN hard coating and a TaWN superhard coating are sequentially arranged on the coating along the outer surface of the base body from inside to outside.
The preparation method of the Ta-TaN-TaWN superhard coating cutter comprises the following steps:
(1) pretreatment: and putting the YG6 hard alloy blade into acetone for ultrasonic cleaning for 10min, removing oil stains, and vacuum drying.
(2) Selecting simple substance Ta as a radio frequency target material, introducing argon for protection, depositing a Ta coating on the surface of the hard alloy substrate by adopting a process method combining magnetron sputtering and multi-arc ion plating, wherein the deposition pressure is 0.8Pa, the deposition temperature is 400 ℃, and the thickness of the deposited Ta coating is 0.8 mu m.
(3) Selecting simple substance Ta as a radio frequency target material, introducing nitrogen and argon combined gas with the mass fraction ratio of 1: 4, depositing a TaN coating on the surface of the transition layer by adopting a process method combining magnetron sputtering and multi-arc ion plating, wherein the deposition pressure is 1.0Pa, the deposition temperature is 400 ℃, and the thickness of the deposited TaN coating is 1.0 mu m.
(4) Selecting simple substances Ta and W as radio frequency targets, introducing nitrogen and argon combined gas with the mass fraction ratio of 1: 4, depositing a TaWN coating on the surface of the transition layer by adopting a process method combining magnetron sputtering and multi-arc ion plating at the deposition temperature of 450 ℃ and the thickness of the deposited TaWN coating is 1.0 mu m, and finishing the preparation of the coating cutter.
Claims (4)
1. A Ta-TaN-TaWN superhard coating cutter is characterized in that: the cutter substrate material can be conventional cutter materials such as high-speed steel, hard alloy, ceramic and the like, and the coating is sequentially provided with a Ta transition layer, a TaN hard coating and a TaWN super hard coating from inside to outside along the outer surface of the substrate.
2. A Ta-TaN-TaWN superhard coated tool according to claim 1, in particular, the Ta transition layer is 0.5 to 0.8 μm thick, the TaN hard coating is 1.0 to 1.2 μm thick, and the TaWN superhard coating is 0.8 to 1.5 μm thick.
3. A Ta-TaN-TaWN superhard coated cutting tool according to claim 1, characterised in that it is prepared by a process comprising: and respectively and sequentially depositing a Ta transition layer, a TaN hard coating and a TaWN super-hard coating on the surface of the cutter substrate by adopting a method combining magnetron sputtering with multi-arc ion plating.
4. The method of making a Ta-TaN-TaWN superhard coated tool according to claim 3, wherein: the preparation of the Ta transition layer, the TaN hard coating and the TaWN super-hard coating respectively selects a required elementary substance material as a radio frequency target material, mixed gas of nitrogen and argon is introduced, the mass fraction ratio of the nitrogen to the argon is 1: 4, the deposition pressure is 0.5-1.0Pa, and the deposition temperature is controlled at 350-450 ℃.
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CN201910965629.2A CN111254399A (en) | 2019-10-10 | 2019-10-10 | Ta-TaN-TaWN superhard coating cutter and preparation method thereof |
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CN201910965629.2A CN111254399A (en) | 2019-10-10 | 2019-10-10 | Ta-TaN-TaWN superhard coating cutter and preparation method thereof |
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Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103071819A (en) * | 2012-12-31 | 2013-05-01 | 四川大学 | Ti/TiN/MaN composite coating on surface of cutter and preparation method of Ti/TiN/MaN composite coating |
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2019
- 2019-10-10 CN CN201910965629.2A patent/CN111254399A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103071819A (en) * | 2012-12-31 | 2013-05-01 | 四川大学 | Ti/TiN/MaN composite coating on surface of cutter and preparation method of Ti/TiN/MaN composite coating |
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Application publication date: 20200609 |
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