CN111244493B - Surface modification method of thin titanium bipolar plate of proton exchange membrane fuel cell - Google Patents

Surface modification method of thin titanium bipolar plate of proton exchange membrane fuel cell Download PDF

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CN111244493B
CN111244493B CN201811447724.5A CN201811447724A CN111244493B CN 111244493 B CN111244493 B CN 111244493B CN 201811447724 A CN201811447724 A CN 201811447724A CN 111244493 B CN111244493 B CN 111244493B
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titanium
coating
bipolar plate
exchange membrane
proton exchange
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CN111244493A (en
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邵志刚
高正远
曾亚超
姚德伟
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Dalian Institute of Chemical Physics of CAS
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M8/00Fuel cells; Manufacture thereof
    • H01M8/02Details
    • H01M8/0202Collectors; Separators, e.g. bipolar separators; Interconnectors
    • H01M8/0204Non-porous and characterised by the material
    • H01M8/0206Metals or alloys
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/021Cleaning or etching treatments
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/16Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M8/00Fuel cells; Manufacture thereof
    • H01M8/02Details
    • H01M8/0202Collectors; Separators, e.g. bipolar separators; Interconnectors
    • H01M8/0204Non-porous and characterised by the material
    • H01M8/0223Composites
    • H01M8/0228Composites in the form of layered or coated products
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M8/00Fuel cells; Manufacture thereof
    • H01M8/10Fuel cells with solid electrolytes
    • H01M2008/1095Fuel cells with polymeric electrolytes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/50Fuel cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Abstract

The invention relates to a non-noble metal coating bipolar plate in the field of proton exchange membrane fuel cells, wherein a substrate adopts a thin titanium plate, and a coating adopts a metal material with excellent corrosion resistance, such as one or more of Nb, Zr and the like, so that the corrosion resistance is improved to a certain extent, and the contact resistance between the coating and a diffusion layer is greatly improved. The good mechanical property and the extremely small thickness of the metal enable the metal to be subjected to punch forming, the internal resistance of the metal can be greatly reduced, and the mass and volume specific power of the galvanic pile can be improved. Compared with the prior art, the method has simple process and is easy to realize batch production. The coating and the substrate are both metal, so that the coating and the substrate have stronger binding force.

Description

Surface modification method of thin titanium bipolar plate of proton exchange membrane fuel cell
Technical Field
The invention relates to a metal coating bipolar plate in the field of proton exchange membrane fuel cells.
Background
A Proton Exchange Membrane Fuel Cell (PEMFC) is a device that directly converts chemical energy in hydrogen fuel and oxidant into electrical energy through electrode reaction, wherein the product is only water, and has the advantages of high energy conversion efficiency, no pollution, rapid start, long service life, high power density, and the like, and has received wide attention from the world.
The bipolar plate is used as one of key components of the proton exchange membrane fuel cell, accounts for 40-50% of the total cost of the whole stack, accounts for 70-80% of the total mass, and plays a role in collecting and conducting current, separating oxidant and fuel gas, conducting transport gas, conducting heat and supporting the whole stack framework. Accordingly, there is a need for a bipolar plate having good electrical and thermal conductivity, low gas permeability, high mechanical strength, and a harsh acidic working environment that makes it necessary to have good corrosion resistance.
Commonly used bipolar plates are graphite bipolar plates, metal bipolar plates and composite bipolar plates. The graphite bipolar plate has good electric conductivity and corrosion resistance as a traditional bipolar plate, and is also used in many fields at present. But the graphite has larger porosity, so that the graphite cannot well block reaction gas and is easy to cause water permeation; the mechanical property is poor, the brittleness is high, great difficulty is brought to the processing, the vibration of the automobile in the driving process can not be borne when the automobile is used in the automobile, the size and the mass need to be increased when the problem is overcome, the manufacturing cost is improved, and inconvenience is brought to each link. The brittleness of pure graphite is therefore reduced by incorporating binders such as PTFE into the graphite, which leads to increased complexity and cost of the manufacturing process. In contrast, metallic bipolar plates have good mechanical properties, which reduces much of the tooling costs, and their good toughness allows them to be machined very thin, which can greatly increase mass and volumetric specific power. Good gas impermeability in turn makes it possible to better separate the reaction gases. Commonly used metallic bipolar plates are ferrous based alloy (stainless steel) bipolar plates and light metal and its alloys (mainly titanium and aluminum) bipolar plates. The iron-based metal and aluminum bipolar plate is easy to corrode under the conditions of acid environment and high potential, and the titanium-based metal bipolar plate has better corrosion resistance but poorer electrical conductivity, so that the metal bipolar plate cannot meet the service requirement of the PEMFC and must be modified.
Currently, a wide variety of surface coatings are available, including precious metal coatings, metal nitride coatings, carbon-based coatings, and polymer coatings. The noble metal coating is mainly gold, platinum and silver, and the coating has excellent conductivity and corrosion resistance and can be compared with graphite. According to the method, a silver coating is prepared on the surface of 316L stainless steel by an ion implantation method, the surface contact resistance value is reduced by 81.25% when the implantation dosage is 0.5 multiplied by 107cm < -2 > compared with that before implantation, a new passivation layer which effectively hinders corrosion is formed on the surface after the silver is implanted into the stainless steel in a bipolar plate simulation environment, and when the silver implantation dosage is 2 multiplied by 107cm < -2 >, the stable corrosion current density of the stainless steel in the environment simulating the cathode and the anode of the bipolar plate is respectively reduced by 98.56% and 98.32% compared with that before implantation. The Wangshan collar and the like prepare the silver-plated and gold-plated composite coating on the surface of stainless steel by electroplating and sputtering, the contact resistance of the coating and carbon paper is 2.7-5 m omega cm2, and the coating is placed in a simulated fuel cell corrosion solution of 0.05mol/L H2SO4+5 multiplied by 10 < -6 > mol/L HF. Compared with untreated stainless steel, the corrosion potential of the silver-plated-gold-plated composite coating and the corrosion potential of the silver-plated-gold-sputtered composite stainless steel are respectively improved by 0.45V and 0.49V. The corrosion current density is reduced by 1 to 2 orders of magnitude and is maintained at 10 < -7 > to 10 < -7 >.5 mA/cm 2. Nevertheless, the high price is one of the biggest limitations, and mass production is impossible. The metal nitride, which is mainly conductive nitride such as CrN, has better conductivity and corrosion resistance and meets the working environment, and is a mature coating at present. Wubo et al utilizes the multi-arc ion plating method to deposit Cr1-xNx modified film on the surface of stainless steel, so that the conductivity and corrosion resistance are obviously improved, the conductivity is improved by more than 2 orders of magnitude, the corrosion resistance is improved by nearly 3 orders of magnitude, and the single-phase performance is the best along with the change of the value of x. But the surface of the metal tube is also provided with micropores which can provide channels for corrosive liquid to corrode the deep layer. Therefore, there is a multilayer coating that prevents penetration of the corrosive liquid by increasing the number of layers of the coating. Carbon coating is an emerging coating type and is a current research trend, the cost of the carbon coating is low, and the carbon coating can inherit some excellent properties of graphite such as conductivity and corrosion resistance. The Von Kai and the like utilize magnetron sputtering to prepare a C/CrN multilayer coating on the surface of 316L stainless steel, the surface of the coating is compact, the thickness of the coating is about 800nm, the contact resistance of the coating and carbon paper is reduced to 2.6-2.9m omega cm2 under the pressing force of 1.5MPa, and the corrosion resistance is also greatly improved. However, the preparation of carbon coatings by PVD has low film forming efficiency, high material loss, and poor stability of carbon coatings at high potential, and requires more measures to make them function better.
Disclosure of Invention
The invention aims to improve the conductivity and the corrosion resistance of the titanium bipolar plate and the specific power of the galvanic pile by preparing the conductive and corrosion-resistant coating on the surface of the substrate thin titanium plate, so that the titanium bipolar plate can be applied to the actual galvanic pile.
A surface modifying method for Ti-base bipolar plate used for proton exchange membrane fuel cell includes such steps as cleaning and activating the upper and lower surfaces of Ti substrate, preparing coating layer by arc ion plating, and coating one or more of Nb, Cr, Zr and Mo.
As a preferable technical scheme, the titanium substrate is industrial pure titanium, and the thickness of the titanium substrate is 0.05 mm-0.5 mm.
As a preferable technical scheme, the cleaning refers to deoiling treatment, and the deoiling is ultrasonic treatment for 30-60 minutes by using acetone or ethanol.
According to the preferable technical scheme, the activation is carried out by adopting oxalic acid solution with the mass fraction of 10-20% at the temperature of 70-100 ℃ to remove the surface passivation layer, and the activation time is 1-5 h.
As a preferred technical scheme, the arc ion plating method firstly carries out sputtering cleaning on a titanium substrate, the bias voltage used in the sputtering cleaning process is-1000 to-500V, the target arc current is 10 to 30A, and the time is 10 to 30 min.
As a preferred technical scheme, the bias voltage of the coating prepared by the arc ion plating deposition method is controlled to be-500-0V, the arc current of the target material is 50-100A, and the time is 20-60 min.
In the preferred embodiment, in the arc ion plating process, the flow rate of argon gas is maintained at 100sccm to 500sccm, and the gas pressure is maintained at 0.5 Pa to 1 Pa.
Preferably, the thickness of the coating is 200 nm-10 μm.
Effects of the invention
The invention adopts 0.05-0.5 mm of industrial pure titanium, is convenient to process, greatly reduces the weight of the galvanic pile and improves the specific power of the galvanic pile. The substrate adopts a thin titanium plate, and the coating adopts metal materials with excellent corrosion resistance, such as one or more of Nb, Zr and the like, so that the corrosion resistance is improved to a certain extent, and the contact resistance between the coating and a diffusion layer is greatly improved. The metal coating prepared by the invention has good conductivity and corrosion resistance, and can run in the PEMFC working environment for a long time. The corrosion current density under constant potential of 4h is 4.067 mu A/cm2Reduced to 1.992 muA/cm2. The contact resistance under the pressing force of 15MPa is from 95.55m omega cm2Reduced to 13.52m omega cm2After 4h of constant potential cathodic polarization, the polarization is only slightly improved. The method of arc ion plating has good film binding force, uniform film formation and high stability, and can realize batch production. The existence of obvious micropores is difficult to observe under a scanning electron microscope. The good mechanical property and the extremely small thickness of the metal enable the metal to be subjected to punch forming, the internal resistance of the metal can be greatly reduced, and the mass and volume specific power of the galvanic pile can be improved. Compared with the prior art, the method is simple in process and easy to realize batch production. The coating and the substrate are both metal, so that the coating and the substrate have stronger binding force.
Drawings
FIG. 1 is a graph of the contact resistance between commercially pure titanium TA1 and the modified sample and carbon paper as a function of the pressing force of example 1.
FIG. 2 is the constant potential polarization curve of the 4h cathode of TA1 commercial pure titanium and modified sample cathode of example 1.
Detailed Description
The preparation method comprises the following steps:
(1) the thickness of the industrial pure titanium substrate is 0.05-0.5 mm;
(2) washing off massive greasy dirt and dust on the surface of the titanium plate by using a detergent, ultrasonically treating the titanium plate in acetone for 15-30 min after washing by using deionized water to remove residual greasy dirt, and then placing the titanium plate in an oxalic acid solution at 70-100 ℃ for 1-2 h to activate the surface, remove a passivation layer and improve the binding force with a coating;
(3) the whole coating process is carried out in a high-vacuum environment, firstly, the vacuum degree is roughly pumped to 1-3 Pa, then, a rough pumping system is closed, fine pumping is started, and the vacuum degree is pumped to 2x10-3~2x10-2Pa, introducing argon to keep the flow of 100-500 sccm to start coating;
(4) starting a target power supply, keeping the current at 10-30A, controlling the bias voltage at-1000 to-500V, cleaning and sputtering for 10-30 min to remove residual passivation layers on the surface, activating the surface and improving the bonding force with the coating;
(5) adjusting the current to 50-100A and the bias voltage to-500-0V, and starting to deposit the coating for 20-60 min.
The following tests of examples 1-3 were conducted to test contact resistance and corrosion resistance using the following methods:
the contact resistance was tested in a universal testing machine, and the change in contact resistance was tested by applying a pressing force varying from 0.2MPa to 2.0 MPa. The corrosion resistance is 0.5mol/L H2SO4+5×10-6Constant potential polarization test of 4h is maintained under the environment of mol/L KF and the potential of 0.6V (vs. SCE).
Example 1
Using TA1 industrial pure titanium as substrate with size of 20x60x0.1mm, ultrasonic treating with acetone for half an hour and oxalic acid at 80 deg.C for one hour, placing in vacuum chamber, and vacuumizing to 3x10-3Pa, the deposition was started with the argon flow kept at 300 sccm. Starting a bias voltage to-600V, starting the Nb metal target, adjusting the current to 30A, and carrying out cleaning sputtering for 10 min; and adjusting the bias voltage to-300V for coating deposition, adjusting the current to 70A, and keeping for 30min to obtain the modified titanium bipolar plate with the Nb coating.
Example 2
Using TA1 industrial pure titanium as substrate, size 20x60x 0.2mm, ultrasonic treating with acetone for half an hour and oxalic acid at 80 deg.C for one hour, placing in vacuum chamber, and vacuumizing to 3x10-3Pa, the deposition was started with the argon flow kept at 300 sccm. Starting a bias voltage to-700V, starting a Cr metal target, adjusting the current to 40A, and carrying out cleaning sputtering for 20 min; and adjusting the bias voltage to-300V for coating deposition, adjusting the current to 85A, and keeping for 45min to obtain the modified titanium bipolar plate with the Cr coating.
Example 3
Using TA1 industrial pure titanium as substrate, size 20x60x 0.5mm, ultrasonic treating with acetone for half an hour and oxalic acid at 80 deg.C for one hour, placing in vacuum chamber, and vacuumizing to 3x10-3Pa, the deposition was started with the argon flow kept at 300 sccm. Starting bias voltage to-800V, starting the Zr metal target, adjusting the current to 50A, and carrying out cleaning sputtering for 30 min; and adjusting the bias voltage to-300V for coating deposition, adjusting the current to 100A, and keeping for 60min to obtain the modified titanium bipolar plate with the Zr coating.

Claims (8)

1. A surface modification method of a titanium-based bipolar plate for a proton exchange membrane fuel cell is characterized in that: preparing coatings on the upper and lower surfaces of the cleaned and activated titanium substrate by adopting an arc ion plating method, wherein the coating material is one or more of Nb, Cr, Zr and Mo.
2. The surface modification method of a titanium-based bipolar plate for a proton exchange membrane fuel cell according to claim 1, characterized in that: the titanium substrate is industrial pure titanium, and the thickness of the titanium substrate is 0.05 mm-0.5 mm.
3. The surface modification method of a titanium-based bipolar plate for a proton exchange membrane fuel cell according to claim 1, characterized in that: the cleaning refers to oil removal treatment, and the oil removal is carried out by using acetone or ethanol for 30-60 minutes in an ultrasonic mode.
4. The surface modification method of a titanium-based bipolar plate for a proton exchange membrane fuel cell according to claim 1, characterized in that: the activation is carried out by adopting oxalic acid solution with the mass fraction of 10-20% at the temperature of 70-100 ℃ to remove the surface passivation layer, and the activation time is 1-5 h.
5. The surface modification method of a titanium-based bipolar plate for a proton exchange membrane fuel cell according to claim 1, characterized in that: the arc ion plating method comprises the steps of firstly carrying out sputtering cleaning on a titanium substrate, wherein the bias voltage used in the sputtering cleaning process is-1000 to-500V, the target arc current is 10 to 30A, and the time is 10 to 30 min.
6. The surface modification method of a titanium-based bipolar plate for a proton exchange membrane fuel cell according to claim 1, characterized in that: the bias voltage of the coating prepared by the arc ion plating method is controlled to be-500-0V, the arc current of the target material is 50-100A, and the time is 20-60 min.
7. The surface modification method of a titanium-based bipolar plate for a proton exchange membrane fuel cell according to claim 1, characterized in that: in the arc ion plating process, the flow of argon gas is kept between 100sccm and 500sccm, and the gas pressure is kept between 0.5 Pa and 1 Pa.
8. The surface modification method of a titanium-based bipolar plate for a proton exchange membrane fuel cell according to claim 1, characterized in that: the thickness of the coating is 200 nm-10 mu m.
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CN113106512A (en) * 2021-04-26 2021-07-13 上海电气集团股份有限公司 Surface modification method of titanium substrate for fuel cell
CN113265614A (en) * 2021-05-14 2021-08-17 安徽智模新材料科技有限公司 Manufacturing method of long-life hot forging steel piston die
CN113675417A (en) * 2021-07-15 2021-11-19 国家电投集团氢能科技发展有限公司 Fuel cell, fuel cell bipolar plate and preparation method thereof
CN113675419A (en) * 2021-08-20 2021-11-19 四川大学 Surface modified titanium bipolar plate, preparation method thereof and application thereof in proton exchange membrane fuel cell

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CN102201582A (en) * 2010-03-22 2011-09-28 现代Hysco株式会社 Metal separator for fuel cell and method of manufacturing the same

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CN102201582A (en) * 2010-03-22 2011-09-28 现代Hysco株式会社 Metal separator for fuel cell and method of manufacturing the same

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