CN111238426A - Standard device for calibrating measurement error of micro-nano coordinate measurement system - Google Patents
Standard device for calibrating measurement error of micro-nano coordinate measurement system Download PDFInfo
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- CN111238426A CN111238426A CN202010113943.0A CN202010113943A CN111238426A CN 111238426 A CN111238426 A CN 111238426A CN 202010113943 A CN202010113943 A CN 202010113943A CN 111238426 A CN111238426 A CN 111238426A
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- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
- G01B21/02—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
- G01B21/04—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness by measuring coordinates of points
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Abstract
The invention discloses a standard device for calibrating measurement errors of a micro-nano coordinate measurement system, which comprises a base, wherein standard units are distributed on the base, and the standard units are selectively and symmetrically arranged on nodes of a semi-symmetrical topological structure or a full-symmetrical topological structure; the full-symmetry topological structure consists of a semi-symmetry topological structure and a mirror image semi-symmetry topological structure. The semi-symmetrical topological structure comprises central nodes positioned on the same middle axis straight line, and the topological length between every two adjacent central nodes is l; each central node derives a multistage derivative node in turn along an oblique straight line which forms an included angle theta with the straight line of the middle axis; the distance between adjacent sibling derivative nodes is equal to the topological length l between adjacent central nodes; each derivative node has a symmetric node that is linearly symmetric about the central axis. The technical problem that a standard device in the prior art cannot well adapt to the characteristics of large measurement range span and high precision of a micro-nano coordinate measurement system is solved.
Description
Technical Field
The invention relates to the technical field of standard instruments, in particular to a standard device for calibrating measurement errors of a micro-nano coordinate measurement system.
Background
The precision of the micro-nano coordinate measuring system is about 0.1 micron, the micro-nano coordinate measuring system is a novel precision measuring instrument with high automation degree and high precision, and a laser sensor, an image sensor and a contact probe are generally integrated. The measurement range of the micro-nano coordinate measurement system is 0.001 mm-1000 mm, and the micro-nano coordinate measurement system has the characteristics of large measurement range span and high precision, so that the device and the method for evaluating the micro-nano coordinate measurement system are different from the traditional method.
The micro-nano coordinate measuring system is not limited by the material of the object to be measured, so the micro-nano coordinate measuring system is widely used in advanced manufacturing fields of aerospace, high-speed rail, ships and the like, and plays an important detection role in a plurality of important fields of medical treatment, medicine production, life science, environmental protection, agricultural product production and the like.
In the field of advanced manufacturing, the micro-nano coordinate measurement system not only detects the quality of traditional complex parts, such as gears, splines, cams, blades, key parts of an engine and irregular complex parts, but also judges the quality and service life of the parts by acquiring and analyzing the surface topography of the complex parts; the method plays an important role in detecting miniaturized complex parts, and the detection comprises the high-precision detection of the geometric dimensions of ultra-precise and tiny parts such as miniature gears, tiny modulus gears or splines, miniature steps, nozzles and the like.
In the field of medical treatment, a micro-nano coordinate measurement system is used for observing the change of the pathological pattern and appearance and is used as an important reference to assist a doctor in treatment, so that the curative effect of a patient is improved; in the aspect of medicine development, a micro-nano coordinate measurement system is used for observing the efficacy and mechanism change rule of a new medicine; in the field of air purification, a micro-nano coordinate measurement system is used for observing the shape distribution and the particle size of particles contained in air.
Therefore, it is very critical to ensure the accuracy of the measurement value of the micro-nano coordinate measurement system, and the subsequent product quality is directly influenced. The calibration device of the micro-nano coordinate measurement system and the complete set of detection method for research have great significance.
Disclosure of Invention
Aiming at the defects of the technology, the invention provides a standard device for calibrating the measurement error of a dimension nanometer coordinate measurement system, and solves the technical problems that a standard device in the prior art cannot well adapt to the characteristics of large measurement range span and high precision of the micro-nanometer coordinate measurement system.
In order to solve the technical problems, the technical scheme of the invention is as follows: a standard device for calibrating measurement errors of a micro-nano coordinate measurement system comprises a base, wherein standard units are distributed on the base, and are selectively and symmetrically arranged on nodes of a semi-symmetrical topological structure; the semi-symmetrical topological structure comprises central nodes positioned on the same middle axis straight line, and the topological length between every two adjacent central nodes is l; each central node derives a multistage derivative node in turn along an oblique straight line which forms an included angle theta with the straight line of the middle axis; the derivative nodes with the same derivative order are the same-level derivative nodes, and the same-level derivative nodes are positioned on the same parallel line of the straight line of the central axis, so that the distance between the adjacent same-level derivative nodes is equal to the topological length l between the adjacent central nodes; each derivative node has a symmetric node that is linearly symmetric about the central axis.
Further, the topological length l between adjacent central nodes is larger than 4.25 times of the resolution ratio of the minimum field of view of the sensor in the micro-nano coordinate measurement system and smaller than 1/3 of the range of the maximum field of view of the sensor.
Further, the standard unit is a standard ball, a standard cylinder, a standard round hole or a standard conical hole, or a combination thereof.
Furthermore, the standard unit is a standard ball made of a magnetic conductive material; the base comprises a shell, the top surface of the shell is provided with a substrate, and the substrate is provided with a standard ball mounting hole; the shell is internally provided with a magnetic positioning device for attracting and fixing the detection ball on the base.
Further, the central node derives a primary derived node according to the topological length l/2. cos theta; and each level of derivative nodes derive the next level of derivative nodes according to the topological length l/2. cos theta.
The invention also provides another standard device for calibrating the measurement error of the micro-nano coordinate measurement system, which comprises a base, wherein standard units are distributed on the base, and the standard units are selectively and symmetrically arranged on nodes of a full-symmetrical topological structure; the full-symmetry topological structure consists of a semi-symmetry topological structure and a mirror image semi-symmetry topological structure; the semi-symmetrical topological structure comprises central nodes positioned on the same middle axis straight line, and the topological length between every two adjacent central nodes is l; each central node derives a multistage derivative node in turn along an oblique straight line which forms an included angle theta with the straight line of the middle axis; the derivative nodes with the same derivative order are the same-level derivative nodes, and the same-level derivative nodes are positioned on the same parallel line of the straight line of the central axis, so that the distance between the adjacent same-level derivative nodes is equal to the topological length l between the adjacent central nodes; each derivative node has a symmetric node that is linearly symmetric about the medial axis; the semi-symmetrical topology is mirror symmetrical about a perpendicular to the medial axis line to form the mirror-image semi-symmetrical topology.
Compared with the prior art, the invention has the advantages that:
1. the semi-symmetrical topological structure can easily improve the design scale of the standard device by deriving the nodes from the central node outwards, and increase the coverage area of the standard device so as to adapt to the characteristic of large measurement range span of the micro-nano coordinate measurement system; meanwhile, the orthogonal resolution of the standard device in the X/Y direction can be improved by changing the topological length l between adjacent central nodes, so that the characteristic of high precision of the micro-nano coordinate measuring system is adapted.
2. The selective symmetry of the standard cells is arranged on the nodes of the semi-symmetrical topological structure: the standard units can be correspondingly arranged on each node of the semi-symmetrical topological structure one by one, or can be partially arranged on the nodes of the semi-symmetrical topological structure, as long as a symmetrical graph which is linearly symmetrical about the middle axis is formed.
3. Symmetrical nodes exist in all levels of derivative nodes, which is the key for ensuring high repeatability and high stability of the standard device in the long-term use process, and meanwhile, the coverage range of the standard device is expanded.
4. The full-symmetry topological structure not only enables the size coverage range of the standard device to be easily enlarged, but also enables a plurality of sensors of a coordinate measuring system integrating different sensors to be synchronously calibrated, and combined measuring errors are convenient to express and correct.
5. The topological length l between the adjacent central nodes is influenced by the field resolution of the sensor configured by the instrument, the field range and the instrument measurement coverage range, is not suitable to be set too small or too large, and in order to meet the balance between normal sampling and precision, therefore, the topological length l between the adjacent central nodes is 4.25 times greater than the minimum field resolution of the sensor in the micro-nano coordinate measurement system and is less than 1/3 of the maximum field range of the sensor.
6. The topological length of the derived node when deriving and the topological length l between adjacent central nodes have the following relationship: l/2. cos theta, so that the derived nodes of each stage and the nodes of the previous stage always keep equal geometric relationship, and the structure of the standard device is stable and the linear topology is extended conveniently.
Drawings
FIG. 1 is a schematic diagram of a semi-symmetric topology;
fig. 2 is a schematic diagram of a fully symmetric topology.
FIG. 3 is a schematic structural diagram of a magnetic control device.
Detailed Description
Referring to fig. 1, the standard apparatus for calibrating measurement errors of a micro-nano coordinate measurement system includes a base, on which standard units are distributed, the standard units being selectively and symmetrically arranged on nodes of a semi-symmetric topology structure; the semi-symmetrical topological structure comprises central nodes positioned on the same middle axis straight line (such as an X axis in fig. 1), and the topological lengths between the adjacent central nodes are all l; each central node derives a multistage derivative node in turn along an oblique straight line which forms an included angle theta with the straight line of the middle axis; the derivative nodes with the same derivative order are the same-level derivative nodes, and the same-level derivative nodes are positioned on the same parallel line of the straight line of the central axis, so that the distance between the adjacent same-level derivative nodes is equal to the topological length l between the adjacent central nodes; each derivative node has a symmetric node that is linearly symmetric about the central axis.
In FIG. 1, A0、A1、A2、A3、A4The central nodes are all central nodes, and the central nodes can be correspondingly increased or decreased according to the measuring range measured by the micro-nano coordinate measuring system. Each central node derives a three-level derivative nodePoint: respectively, class B, C and D, e.g. central node A1With three derived node Bs2,1、C2,1、D2,1Three derived node B2,1、C2,1、D2,1The symmetric nodes are respectively B2,2、C2,2、D2,2. The distance between adjacent sibling derived nodes is equal to the topological length l between adjacent central nodes, e.g. B1,1、B2,1、B3,1、B4,1Being a peer-derived node, B1,1And B2,1Is equal to A0And A1I.e. the topological length l.
The topological length l between the adjacent central nodes is influenced by the field resolution of the sensor configured by the instrument, the field range and the instrument measurement coverage range, is not suitable to be set too small or too large, and in order to meet the balance between normal sampling and precision, therefore, the topological length l between the adjacent central nodes is 4.25 times greater than the minimum field resolution of the sensor in the micro-nano coordinate measurement system and is less than 1/3 of the maximum field range of the sensor.
The central node derives a primary derivative node according to the topological length l/2. cos theta; and each level of derivative nodes derive the next level of derivative nodes according to the topological length l/2. cos theta. The value range of theta is 15-60, and preferably, theta is 45 degrees, so that the whole topological structure keeps axial symmetry, and meanwhile, derivative nodes related to the node are symmetrical to each other compared with the node.
The selective symmetry of the standard cells is arranged on the nodes of the semi-symmetrical topological structure: the standard units can be correspondingly arranged on each node of the semi-symmetrical topological structure one by one, or can be partially arranged on the nodes of the semi-symmetrical topological structure, as long as a symmetrical graph which is linearly symmetrical about the middle axis is formed.
The modes of selective symmetrical setting of standard cells include:
mode a: forming a diamond-shaped distribution comprising a central node on a semi-symmetrical topology, central node a being shown with reference to fig. 11、A2、A3、A4Derivative node B2,1、B3,1、B4,1、C2,1、C3,1、D2,1And symmetric node-bs of derived nodes2,2、B3,2、B4,2、C2,2、C3,2、D2,2A rhombic distribution area is formed, and the standard cells are correspondingly arranged on the nodes in the ridge line distribution area.
Mode b: forming an arrowhead-shaped distribution containing a central node on a semi-symmetrical topology, for example: comprising a central node A0Derivative node B1,1、C1,1、D1,1And symmetric node-bs of derived nodes1,2、C1,2、D1,2An arrow-shaped region is formed, and standard cells are correspondingly arranged on nodes in the arrow-shaped region.
And a mode c: forming a zigzag distribution comprising a central node on the semi-symmetrical topology, for example: comprising a central node A0And a derived node B1,1、C1,1、D1,1、D2,1、D3,1、D4,1And symmetric node B of derived node1,2、C1,2、D1,2、D2,2、D3,2、D4,2And forming a zigzag area, wherein the standard units are correspondingly arranged on the nodes in the zigzag area.
In addition to the semi-symmetrical topological structure, the invention also provides another standard device with a full-symmetrical topological structure for calibrating the measurement error of the micro-nano coordinate measurement system, and the full-symmetrical topological structure is composed of the semi-symmetrical topological structure and a mirror image semi-symmetrical topological structure, which is shown in a reference figure 2; the semi-symmetrical topology is mirror symmetric about a perpendicular (Y-axis) to the straight line (X-axis) of the central axis of the plate-symmetrical topology to form the mirror-image semi-symmetrical topology. The right side of the Y axis adopts the plate symmetrical topological structure in the embodiment, and the left side of the Y axis is a mirror image semi-symmetrical topological structure. The distribution of standard cells on the semi-symmetrical topology is mirror-symmetrically distributed on the mirror-image semi-symmetrical topology. Therefore, the standard cells are selectively and symmetrically arranged on the nodes of the full-symmetric topology, and the modes of selective and symmetrical arrangement of the standard cells include:
a mode a': forming rhombic distribution containing a central node on the semi-symmetrical topological structure, and forming a mirror image of the rhombic distribution on the mirror image semi-symmetrical topological structure;
a mode b': forming arrow-shaped distribution containing a central node on the semi-symmetrical topological structure, and forming a mirror image of the arrow distribution on the mirror image semi-symmetrical topological structure;
in a mode c': and forming a zigzag distribution comprising a central node on the semi-symmetrical topological structure, and forming a zigzag-distributed mirror image on the mirror image semi-symmetrical topological structure.
The person skilled in the art can select different nodes to form various symmetric graph regions on the semi-symmetric topology according to the teachings of the present invention, and therefore, any symmetric graph region and its mirror-symmetric graph region formed on the semi-symmetric topology should be within the scope of the present invention.
The standard unit is a standard ball, a standard cylinder, a standard round hole or a standard taper hole, or a combination thereof: for example, in the combination of the standard ball and the standard round hole, the derivative node and the symmetrical node thereof are preferably standard units of the same type and the same size.
The standard cell can be fixed and connected on the base, and the standard cell can also be dismantled on the base through the magnetic control mode and connect: referring to fig. 3, the standard cell is a standard ball made of a magnetic conductive material; the same-level derivative nodes and the symmetrical nodes thereof adopt standard balls with the same size, and different-level derivative nodes adopt standard balls with different sizes; the base comprises a shell 1, the top surface of the shell 1 is provided with a substrate, and the substrate is provided with a standard ball mounting hole; the shell 1 is internally provided with a magnetic positioning device for attracting and fixing the detection ball on the base.
Claims (10)
1. A standard device for calibrating micro-nano coordinate measurement system measurement error, including the base, it has standard cell, its characterized in that to distribute on the base: the standard units are selectively and symmetrically arranged on the nodes of the semi-symmetrical topological structure; the semi-symmetrical topological structure comprises central nodes positioned on the same middle axis straight line, and the topological length between every two adjacent central nodes is l; each central node derives a multistage derivative node in turn along an oblique straight line which forms an included angle theta with the straight line of the middle axis; the derivative nodes with the same derivative order are the same-level derivative nodes, and the same-level derivative nodes are positioned on the same parallel line of the straight line of the central axis, so that the distance between the adjacent same-level derivative nodes is equal to the topological length l between the adjacent central nodes; each derivative node has a symmetric node that is linearly symmetric about the central axis.
2. The standard device for calibrating the measurement error of the micro-nano coordinate measurement system according to claim 1, wherein: the topological length l between adjacent central nodes is 4.25 times larger than the resolution of the minimum field of view of the sensor in the micro-nano coordinate measurement system and is smaller than 1/3 of the range of the maximum field of view of the sensor.
3. The standard device for calibrating the measurement error of the micro-nano coordinate measurement system according to claim 1, wherein: the central node derives a primary derivative node according to the topological length l/2. cos theta; and each level of derivative nodes derive the next level of derivative nodes according to the topological length l/2. cos theta.
4. The standard device for calibrating the measurement error of the micro-nano coordinate measurement system according to claim 1, wherein: the value range of theta is 15-60 degrees.
5. The standard device for calibrating the measurement error of the micro-nano coordinate measurement system according to claim 1, wherein: θ is 45 °.
6. The standard device for calibrating the measurement error of the micro-nano coordinate measurement system according to claim 1, wherein: the standard cell is a standard ball, a standard cylinder, a standard round hole or a standard conical hole, or a combination thereof.
7. The standard device for calibrating the measurement error of the micro-nano coordinate measurement system according to claim 1, wherein: the standard unit is a standard ball made of a magnetic conductive material; the base comprises a shell, the top surface of the shell is provided with a substrate, and the substrate is provided with a standard ball mounting hole; the shell is internally provided with a magnetic positioning device for attracting and fixing the detection ball on the base.
8. The standard device for calibrating the measurement error of the micro-nano coordinate measurement system according to claim 1, wherein: the modes of selective symmetrical setting of standard cells include:
mode a: forming diamond distribution containing central nodes on the semi-symmetrical topological structure;
mode b: forming an arrow-shaped distribution comprising a central node on the semi-symmetrical topological structure;
and a mode c: forming a zigzag distribution comprising a central node on the semi-symmetrical topology.
9. The utility model provides a standard device for calibrating micro-nano coordinate measurement system measurement error, includes the base, and it has standard cell, its characterized in that to distribute on the base: the standard units are selectively and symmetrically arranged on the nodes of the full-symmetric topological structure; the full-symmetry topological structure consists of a semi-symmetry topological structure and a mirror image semi-symmetry topological structure; the semi-symmetrical topological structure comprises central nodes positioned on the same middle axis straight line, and the topological length between every two adjacent central nodes is l; each central node derives a multistage derivative node in turn along an oblique straight line which forms an included angle theta with the straight line of the middle axis; the derivative nodes with the same derivative order are the same-level derivative nodes, and the same-level derivative nodes are positioned on the same parallel line of the straight line of the central axis, so that the distance between the adjacent same-level derivative nodes is equal to the topological length l between the adjacent central nodes; each derivative node has a symmetric node that is linearly symmetric about the medial axis; the semi-symmetrical topology is mirror symmetrical about a perpendicular to the medial axis line to form the mirror-image semi-symmetrical topology.
10. The standard apparatus for calibrating measurement error of micro-nano coordinate measurement system according to claim 9, wherein: the modes of selective symmetrical setting of standard cells include:
a mode a': forming rhombic distribution containing a central node on the semi-symmetrical topological structure, and forming a mirror image of the rhombic distribution on the mirror image semi-symmetrical topological structure;
a mode b': forming arrow-shaped distribution containing a central node on the semi-symmetrical topological structure, and forming a mirror image of the arrow distribution on the mirror image semi-symmetrical topological structure;
in a mode c': and forming a zigzag distribution comprising a central node on the semi-symmetrical topological structure, and forming a zigzag-distributed mirror image on the mirror image semi-symmetrical topological structure.
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101793499A (en) * | 2010-03-30 | 2010-08-04 | 上海市计量测试技术研究院 | Multi-measuring-head measuring method and device for micro/nano coordinate measurement |
| US7865637B2 (en) * | 2003-06-18 | 2011-01-04 | Nethra Imaging, Inc. | System of hardware objects |
| KR101404099B1 (en) * | 2012-09-10 | 2014-06-05 | (주)에스엠티코리아 | Parts mounting information verification apparatus and method |
| CN106871949A (en) * | 2017-04-17 | 2017-06-20 | 重庆市计量质量检测研究院 | For many ball plate standards and joint error detection method of multi-sensor measurement system |
| CN208847148U (en) * | 2018-11-27 | 2019-05-10 | 重庆市计量质量检测研究院 | It is a kind of for detecting the standard of joint error |
-
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7865637B2 (en) * | 2003-06-18 | 2011-01-04 | Nethra Imaging, Inc. | System of hardware objects |
| CN101793499A (en) * | 2010-03-30 | 2010-08-04 | 上海市计量测试技术研究院 | Multi-measuring-head measuring method and device for micro/nano coordinate measurement |
| KR101404099B1 (en) * | 2012-09-10 | 2014-06-05 | (주)에스엠티코리아 | Parts mounting information verification apparatus and method |
| CN106871949A (en) * | 2017-04-17 | 2017-06-20 | 重庆市计量质量检测研究院 | For many ball plate standards and joint error detection method of multi-sensor measurement system |
| CN208847148U (en) * | 2018-11-27 | 2019-05-10 | 重庆市计量质量检测研究院 | It is a kind of for detecting the standard of joint error |
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