CN111218670A - 一种改进型ald镀膜机 - Google Patents
一种改进型ald镀膜机 Download PDFInfo
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
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Abstract
本发明属于原子层镀膜领域,具体是一种改进型ALD镀膜机,包括在内部上设置有半月板的内反应腔,和内反应腔盖;在所述内反应腔盖上贯穿有电机轴,而电机轴一端固定在步进电机上,另一端与半月板连接;内反应腔盖上开设有多片呈环形阵列分布的通孔片区,而通孔片区是由多个呈阵列分布的连接孔组成;所述半月板上放置有多个呈环形分布的晶圆;导入的氮气通过内反应腔盖上的通孔片区中的多个呈阵列分布的连接孔流向晶圆表面,发生化学反应,而多片呈环形阵列分布的通孔片区配合半月板相对内反应腔盖转动,实现氮气均匀流向晶圆表面,氮气气流稳定,镀膜的均匀性高;半月板上一次性放置有多个呈环形分布的晶圆进行镀膜,极大的提高了工作效率。
Description
技术领域
本发明涉及原子层镀膜领域,具体是一种改进型ALD镀膜机。
背景技术
已有的空间ALD(atomic layer deposition,单原子层沉积)机台普遍体积较大,且结构复杂,前驱体气路和吹扫气路作为不同的腔体,是完全分开的;而另外多片工艺的ALD机台设计如:Picosun (芬兰ALD设备供应商)都是利用金属cassette(晶圆装载盒)的方法,这种方法会导致运送晶圆十分复杂,而且不稳定,手动取片比较多,如果使用自动化的方法,经常出现掉片的现象;ASM(美国ALD设备供应商)及TEL(日本ALD设备供应商)的多片式ALD炉子方法所使用气体及前驱体使用效率低,会造成巨大的浪费。
因此,针对上述问题,本发明提供一种改进型ALD镀膜机。
发明内容
本发明的目的在于提供一种改进型ALD镀膜机,以解决上述背景技术中提出的问题。
为实现上述目的,本发明提供如下技术方案:
一种改进型ALD镀膜机,包括在内部上设置有半月板的内反应腔,所述该镀膜机还包括内反应腔盖,所述内反应腔盖安装在所述内反应腔顶部;
在所述内反应腔盖上转动贯穿有电机轴,而电机轴一端固定在步进电机的输出轴上,另一端与半月板连接;其中,在靠近半月板一侧的内反应腔盖上开设有多片呈环形阵列分布的通孔片区,而通孔片区是由多个呈阵列分布的连接孔组成;
所述内反应腔盖外接有前驱体源管道和氮气管道;
在靠近所述内反应腔盖一侧的半月板上放置有多个呈环形分布的晶圆;
启动步进电机,步进电机通过电机轴带动半月板转动,完成半月板相对内反应腔盖转动,氮气管道中导入的氮气通过内反应腔盖上的通孔片区中的多个呈阵列分布的连接孔流向晶圆表面,发生化学反应,而多片呈环形阵列分布的通孔片区配合半月板相对内反应腔盖转动,实现氮气均匀流向晶圆表面,氮气气流稳定,镀膜的均匀性高;同时半月板上一次性放置有多个呈环形分布的晶圆进行镀膜,极大的提高了工作效率。
本发明进一步的方案:在所述内反应腔盖中心位置处配合电机轴开设有穿插孔。
本发明再进一步的方案:所述通孔片区在内反应腔盖上开设有十二个,且呈环形阵列分布。
本发明再进一步的方案:所述晶圆在半月板上放置有三个,且半月板上开始有用于限位晶圆的卡槽。
本发明再进一步的方案:所述内反应腔外侧安装有隔热屏,隔热屏顶部可分离式限位在内反应腔盖上,在隔热屏内部设置有多个电加热丝。
本发明再进一步的方案:在所述内反应腔底部连接有粉末收集器,粉末收集器另一端连接在真空泵上,而真空泵上连接有酸性排气腔。
本发明再进一步的方案:所述半月板上放置有三个呈环形分布的晶圆。
本发明再进一步的方案:在所述内反应腔盖上固定有电缸Ⅰ和电缸Ⅱ,而电缸Ⅰ和电缸Ⅱ安装在电缸支架上。
进而,启动电缸Ⅰ和电缸Ⅱ,并在电缸支架的支撑下,实现提升抬离内反应腔盖。
与现有技术相比,本发明的有益效果是:
启动步进电机,步进电机通过电机轴带动半月板转动,完成半月板相对内反应腔盖转动,氮气管道中导入的氮气通过内反应腔盖上的通孔片区中的多个呈阵列分布的连接孔流向晶圆表面,发生化学反应,而多片呈环形阵列分布的通孔片区配合半月板相对内反应腔盖转动,实现氮气均匀流向晶圆表面,氮气气流稳定,镀膜的均匀性高;同时半月板上一次性放置有多个呈环形分布的晶圆进行镀膜,极大的提高了工作效率。
附图说明
图1为本发明改进型ALD镀膜机的结构示意图。
图2为图1中内反应腔盖的仰视结构示意图。
图3为图1中半月板的俯视结构示意图。
图中:1-电缸Ⅰ;2-步进电机;3-电机轴;4-电缸Ⅱ;5-内反应腔盖;6-隔热屏;7-电加热丝;8-内反应腔;9-半月板;10-电缸支架;11-粉末收集器;12-真空泵;13-酸性排气腔;51-通孔片区;91-晶圆。
具体实施方式
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述。
实施例1
已有的空间ALD机台普遍体积较大,且结构复杂,前驱体气路和吹扫气路作为不同的腔体,是完全分开的;而另外多片工艺的ALD机台设计如:Picosun 都是利用金属cassette的方法,这种方法会导致运送晶圆十分复杂,而且不稳定,手动取片比较多,如果使用自动化的方法,经常出现掉片的现象;ASM及TEL的多片式ALD炉子方法所使用气体及前驱体使用效率低,会造成巨大的浪费。
因此,针对上述问题,本发明提供一种改进型ALD镀膜机。
具体如图1~3所示,一种改进型ALD镀膜机,包括在内部上设置有半月板9的内反应腔8,所述该镀膜机还包括内反应腔盖5,所述内反应腔盖5安装在所述内反应腔8顶部;
在所述内反应腔盖5上转动贯穿有电机轴3,而电机轴3一端固定在步进电机2的输出轴上,另一端与半月板9连接;其中,在靠近半月板9一侧的内反应腔盖5上开设有多片呈环形阵列分布的通孔片区51,而通孔片区51是由多个呈阵列分布的连接孔组成;
所述内反应腔盖5外接有前驱体源管道和氮气管道;
在靠近所述内反应腔盖5一侧的半月板9上放置有多个呈环形分布的晶圆91;
启动步进电机2,步进电机2通过电机轴3带动半月板9转动,完成半月板9相对内反应腔盖5转动,氮气管道中导入的氮气通过内反应腔盖5上的通孔片区51中的多个呈阵列分布的连接孔流向晶圆91表面,发生化学反应,而多片呈环形阵列分布的通孔片区51配合半月板9相对内反应腔盖5转动,实现氮气均匀流向晶圆91表面,氮气气流稳定,镀膜的均匀性高;同时半月板9上一次性放置有多个呈环形分布的晶圆91进行镀膜,极大的提高了工作效率。
为了进行进一步的说明,具体的:
在所述内反应腔盖5中心位置处配合电机轴3开设有穿插孔。
所述通孔片区51在内反应腔盖5上开设有十二个,且呈环形阵列分布。
所述晶圆91在半月板9上放置有三个,且半月板9上开始有用于限位晶圆91的卡槽。
所述内反应腔8外侧安装有隔热屏6,隔热屏6顶部可分离式限位在内反应腔盖5上,在隔热屏6内部设置有多个电加热丝7。
在所述内反应腔8底部连接有粉末收集器11,粉末收集器11另一端连接在真空泵12上,而真空泵12上连接有酸性排气腔13。
所述半月板9上放置有三个呈环形分布的晶圆91。
实施例2
本发明实施例是在实施例1的基础上进行的进一步的限定。
请参阅图1,在所述内反应腔盖5上固定有电缸Ⅰ1和电缸Ⅱ4,而电缸Ⅰ1和电缸Ⅱ4安装在电缸支架10上。
进而,启动电缸Ⅰ1和电缸Ⅱ4,并在电缸支架10的支撑下,实现提升抬离内反应腔盖5。
本发明的工作原理是:本发明改进型ALD镀膜机,启动步进电机2,步进电机2通过电机轴3带动半月板9转动,完成半月板9相对内反应腔盖5转动,氮气管道中导入的氮气通过内反应腔盖5上的通孔片区51中的多个呈阵列分布的连接孔流向晶圆91表面,发生化学反应,而多片呈环形阵列分布的通孔片区51配合半月板9相对内反应腔盖5转动,实现氮气均匀流向晶圆91表面,氮气气流稳定,镀膜的均匀性高;同时半月板9上一次性放置有多个呈环形分布的晶圆91进行镀膜,极大的提高了工作效率。
在本发明的描述中,除非另有说明,“多个”的含义是两个或两个以上。
在本发明的描述中,需要说明的是,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是机械连接,也可以是电连接;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通。对于本领域的普通技术人员而言,可以通过具体情况理解上述术语在本发明中的具体含义。
此外,应当理解,虽然本说明书按照实施方式加以描述,但并非每个实施方式仅包含一个独立的技术方案,说明书的这种叙述方式仅仅是为清楚起见,本领域技术人员应当将说明书作为一个整体,各实施例中的技术方案也可以经适当组合,形成本领域技术人员可以理解的其他实施方式。
Claims (8)
1.一种改进型ALD镀膜机,包括在内部上设置有半月板(9)的内反应腔(8),其特征在于,该镀膜机还包括内反应腔盖(5),所述内反应腔盖(5)安装在所述内反应腔(8)顶部;
在所述内反应腔盖(5)上转动贯穿有电机轴(3),而电机轴(3)一端固定在步进电机(2)的输出轴上,另一端与半月板(9)连接;其中,在靠近半月板(9)一侧的内反应腔盖(5)上开设有多片呈环形阵列分布的通孔片区(51),而通孔片区(51)是由多个呈阵列分布的连接孔组成;
所述内反应腔盖(5)外接有前驱体源管道和氮气管道;
在靠近所述内反应腔盖(5)一侧的半月板(9)上放置有多个呈环形分布的晶圆(91)。
2.根据权利要求1所述的一种改进型ALD镀膜机,其特征在于,在所述内反应腔盖(5)中心位置处配合电机轴(3)开设有穿插孔。
3.根据权利要求1所述的一种改进型ALD镀膜机,其特征在于,所述通孔片区(51)在内反应腔盖(5)上开设有十二个,且呈环形阵列分布。
4.根据权利要求1所述的一种改进型ALD镀膜机,其特征在于,所述晶圆(91)在半月板(9)上放置有三个,且半月板(9)上开始有用于限位晶圆(91)的卡槽。
5.根据权利要求1所述的一种改进型ALD镀膜机,其特征在于,所述内反应腔(8)外侧安装有隔热屏(6),隔热屏(6)顶部可分离式限位在内反应腔盖(5)上,在隔热屏(6)内部设置有多个电加热丝(7)。
6.根据权利要求1或5所述的一种改进型ALD镀膜机,其特征在于,在所述内反应腔(8)底部连接有粉末收集器(11),粉末收集器(11)另一端连接在真空泵(12)上,而真空泵(12)上连接有酸性排气腔(13)。
7.根据权利要求1所述的一种改进型ALD镀膜机,其特征在于,所述半月板(9)上放置有三个呈环形分布的晶圆(91)。
8.根据权利要求1或5所述的一种改进型ALD镀膜机,其特征在于,在所述内反应腔盖(5)上固定有电缸Ⅰ(1)和电缸Ⅱ(4),而电缸Ⅰ(1)和电缸Ⅱ(4)安装在电缸支架(10)上。
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