CN111167639B

CN111167639B - Substrate processing equipment and feeding machine platform

Info

Publication number: CN111167639B
Application number: CN201910197779.3A
Authority: CN
Inventors: 陈安顺
Original assignee: Group Up Industrial Co ltd
Current assignee: Group Up Industrial Co ltd
Priority date: 2018-11-12
Filing date: 2019-03-15
Publication date: 2021-07-06
Anticipated expiration: 2039-03-15
Also published as: TWI688433B; CN111167639A; TW202017659A; CN209953103U

Abstract

The invention discloses a substrate processing device and a feeding table. The substrate processing equipment comprises a plurality of processing machines, a loading machine and a transfer device. The feeding machine comprises a feeding device and a transferring device. The feeding device comprises at least one clamping jaw assembly and a switch unit. The user can set the substrate on the loading device, and then the transfer device is controlled to transfer the substrate set on the loading device to the processing machine. Therefore, a user can insert the substrate with special specification in front of any processing machine according to the requirement, so that the substrate with special specification can directly start to execute the relevant processing operation by the specific processing machine.

Description

Substrate processing equipment and feeding machine platform

Technical Field

The present invention relates to a feeding machine and a substrate processing apparatus, and more particularly, to a feeding machine capable of being operated by a user to clamp a circuit board and a substrate processing apparatus including the same.

Background

Most of the existing circuit board processing equipment is continuous large-scale equipment, and after the circuit board enters the processing equipment, the circuit board sequentially passes through each processing procedure in the processing equipment. For example, a common circuit board processing apparatus includes a painting process and a baking process, any circuit board entering the processing apparatus must pass through the painting process and the baking process in sequence, and any circuit board may leave the processing apparatus after the baking process is completed, or any circuit board may pass through the painting process before being baked.

In practical applications, if a related developer wants to make one of the circuit boards perform only the painting process or only the baking process, the entire process equipment should be stopped, and then the process equipment is set according to the requirements, and then the single circuit board enters the process equipment, so that the single circuit board may perform only the painting process or only the baking process. However, this approach is time consuming and costly.

Although some manufacturers may develop small-sized manufacturing equipment for developers, the small-sized manufacturing equipment may not be identical to the large-sized manufacturing equipment used in actual production, and therefore, the difference between the test results of the small-sized manufacturing equipment and the test results of the large-sized manufacturing equipment used in actual production may be large.

Disclosure of Invention

The invention discloses a substrate processing device and a feeding machine table, which are used for solving the problems that the existing large-scale processing equipment for producing circuit boards is inconvenient, and particularly, research personnel are difficult to insert a single circuit board with special specification into the large-scale processing equipment in production.

The invention discloses a substrate processing apparatus, comprising: a processing device, a plurality of processing machines and at least one loading machine. The processing machines are respectively connected with the processing device, and each processing machine is used for carrying out a preset processing operation on the substrate; the predetermined process for the substrate by one of the plurality of processing machines is a spraying process for spraying the coating on the substrate, or the predetermined process for the substrate by one of the plurality of processing machines is a baking process for keeping the substrate at a predetermined temperature for a predetermined time. The material loading platform is adjacent to the base plate entering position setting of any processing procedure board, and the material loading platform contains: a loading device and a transfer device. Processing apparatus is connected to loading attachment, and loading attachment contains: at least one clamping jaw component and a switch unit. The gripper assembly can be controlled to grip a substrate, the gripper assembly comprising two gripper arms, at least one of which can be controlled by the processing apparatus to move relative to the other gripper arm. The switch unit is connected with the clamping jaw assembly, and the switch unit can be operated to control the two clamping arms to move relative to each other, so that the clamping jaw assembly clamps the substrate or loosens the substrate clamped by the clamping jaw assembly. The moving device is arranged adjacent to the substrate entering position of any processing machine, the moving device is connected with the processing device, and the moving device can be controlled by the processing device to move the substrate clamped by the feeding device into the processing machine from the substrate entering position of the processing machine adjacent to the feeding device.

Preferably, the feeding device comprises two clamping jaw assemblies, and the feeding device further comprises a longitudinal limiting mechanism, the longitudinal limiting mechanism is located between the two clamping jaw assemblies, and the longitudinal limiting mechanism is used for providing the substrate to abut against, so as to limit a movable range of the substrate in a longitudinal direction relative to the clamping jaw assemblies.

Preferably, the feeding device comprises two clamping jaw assemblies and two transverse limiting mechanisms, and the two clamping jaw assemblies are arranged at intervals; the two transverse limiting mechanisms are arranged on one side of the two clamping jaw assemblies, and the two clamping jaw assemblies are positioned between the two transverse limiting mechanisms; each transverse limiting mechanism comprises a sliding rail structure and a sliding block, the sliding block is slidably arranged on the sliding rail structure, and the sliding block can be operated to slide on the sliding rail structure; each slide rail structure comprises a scale marking structure, and the scale marking structure is used for providing a user to identify the position of the slide block relative to the slide rail structure; when the clamping jaw assembly clamps the substrate, the two sliding blocks can be operated to respectively abut against two opposite side edges of the substrate.

Preferably, the feeding device comprises two clamping jaw assemblies, and further comprises a longitudinal limiting mechanism, the longitudinal limiting mechanism is located between the two clamping jaw assemblies, and the longitudinal limiting mechanism is used for providing the substrate to abut against so as to limit the movable range of the substrate in a longitudinal direction relative to the clamping jaw assemblies; the feeding device comprises two clamping jaw assemblies and two transverse limiting mechanisms, wherein the two clamping jaw assemblies are arranged at intervals; the two transverse limiting mechanisms are arranged on one side of the two clamping jaw assemblies, and the two clamping jaw assemblies are positioned between the two transverse limiting mechanisms; each transverse limiting mechanism comprises a sliding rail structure and a sliding block, the sliding block is slidably arranged on the sliding rail structure, and the sliding block can be operated to slide on the sliding rail structure; each slide rail structure comprises a scale marking structure, and the scale marking structure is used for providing a user to identify the position of the slide block relative to the slide rail structure; when the clamping jaw assembly clamps the substrate, the two sliding blocks can be operated to respectively abut against two opposite side edges of the substrate; the longitudinal limiting mechanism comprises a first limiting surface, each sliding rail structure comprises a second limiting surface, and the first limiting surface and the second limiting surface are positioned on the same plane; when the clamping jaw assembly clamps the substrate, the first limiting surface and the two limiting surfaces are correspondingly abutted against one wide side surface of the substrate, and the first limiting surface and the two second limiting surfaces can limit the moving range of the substrate relative to the clamping jaw assembly in a front-back direction.

Preferably, each transverse limiting mechanism further comprises an operating part, and the operating part comprises a first locking structure; one side of each sliding rail structure is concavely provided with a sliding chute, each sliding rail structure also comprises a through hole corresponding to the sliding chute, the through holes penetrate through the sliding rail structures, the through holes are communicated with at least one part of the sliding chutes, the sliding blocks are arranged in the sliding chutes, and each sliding block comprises a second locking structure; the first locking structure of the operating part can be locked with the second locking structure of the sliding block in the sliding groove through the through hole so as to limit the moving range of the sliding block relative to the sliding rail structure.

The present invention also discloses a feeding machine table for being disposed adjacent to a substrate entry position of one of the processing machines of a substrate processing apparatus, the processing machines being configured to perform a spraying operation or a baking operation on the substrate, the feeding machine table comprising: a loading device and a transfer device. The loading attachment contains: at least one clamping jaw component and a switch unit. The gripper assembly can be controlled to grip a substrate, the gripper assembly including two gripper arms, at least one of the gripper arms being controllable to move relative to the other gripper arm. The switch unit is connected with the clamping jaw assembly and can be operated to control the two clamping arms to move relative to each other so as to enable the clamping jaw assembly to clamp the substrate or enable the clamping jaw assembly to loosen the substrate clamped by the clamping jaw assembly. The moving device can be controlled to move the substrate clamped by the loading device into the processing machine from the substrate entering position of the processing machine adjacent to the loading device.

In summary, the substrate processing apparatus and the loading machine of the present invention can allow a user to clamp a specific substrate on the loading device according to a requirement, and then move the specific substrate into the processing machine in cooperation with the moving device, so that the specific substrate can directly enter the processing required by the user. The substrate processing equipment and the feeding machine platform can improve the prior circuit board processing equipment, and can not insert the circuit board with special specification into the prior manufacturing process according to the requirement of a user.

For a better understanding of the nature and technical content of the present invention, reference should be made to the following detailed description of the invention and the accompanying drawings, which are provided for illustration purposes only and are not intended to limit the scope of the invention in any way.

Drawings

Fig. 1 is a schematic view of a substrate processing apparatus of the present invention.

FIG. 2 is a block diagram of a substrate processing apparatus according to the present invention.

Fig. 3 is a side view of the loading device of the present invention.

Fig. 4 is a front view of the loading device of the present invention.

Fig. 5 is a partial perspective view of the feeding device of the present invention.

Fig. 6 is a partially exploded view of the loading device of the present invention.

Detailed Description

In the following description, reference is made to or shown in the accompanying drawings for the purpose of illustrating the general principles of the invention, and not for the purpose of limiting the same.

Referring to fig. 1 and 2 together, fig. 1 is a schematic top view of a substrate processing apparatus according to the present invention; FIG. 2 is a block diagram of a substrate processing apparatus according to the present invention. The substrate processing apparatus D includes: a processing device D1, two processing machines D21, D22, two

loading devices

1A, 1B and two transfer devices D31, D32. The processing device D1 is, for example, various computer devices or servers, and is not limited thereto. The two processing stations D21, D22 and the two loading stations are all connected to the processing device D1, and the processing device D1 can be operated to control any one of the processing stations D21, D22, any one of the

loading devices

1A, 1B and any one of the transfer devices D31, D32. In practical applications, the number of the processing tools D21 and D22 included in the substrate processing apparatus D is not limited to two, but may be three or more according to requirements; the number of the

loading devices

1A and 1B may also be varied according to the requirement (e.g., the number of the processing machines D21 and D22), for example, it may be a single device or more than three devices; the number of the transfer devices D31 and D32 is basically the same as the number of the

loading devices

1A and 1B, but not limited thereto.

Each of the processing tools D21 and D22 is used for performing a predetermined processing operation on the substrate P. For example, the predetermined processing operation performed by one of the processing tools D21 on the substrate P in the embodiment is a spraying operation, which is to spray paint on the substrate; the predetermined processing operation performed on the substrate by the other processing tool D22 is a baking operation that maintains the substrate at a predetermined temperature for a predetermined time. That is, the substrate processing apparatus D of the present embodiment sequentially performs the spraying operation and the baking operation by sequentially passing the substrate P through the two processing stations D21 and D22, so as to coat the predetermined paint on one side or both sides of the substrate P.

The two

loading devices

1A and 1B and the two transfer devices D31 and D32 are respectively disposed at the substrate entry positions of the two processing machines D21 and D22. The transferring devices D31 and D32 may be various robots or various mechanical devices capable of transferring substrates according to the requirement, and are not limited herein; the two transfer devices D31 and D32 of the substrate processing apparatus D may be different depending on the installation position, but not limited thereto, and in different embodiments, the two transfer devices D31 and D32 of the substrate processing apparatus D may be the same.

In the present embodiment, the processing tool D21 is used for performing a spraying operation on the substrate P. One of the loading devices 1A and the transferring device D31 is disposed at the substrate entering position of one of the processing machines D21, and the transferring device D31 is correspondingly disposed between the substrate entering positions of the loading device 1A and the processing machine D21.

In practical applications, the transferring device D31 may be disposed adjacent to a feeding device D4. The feeding device D4 is connected to the processing device D1, and the feeding device D4 is used for automatically and continuously transferring the substrates P to a predetermined position. The transfer device D31 may be controlled by the processing device D1 to sequentially transfer the substrates P disposed on the loading device D4 into the processing machine D21. Specifically, the processing apparatus D21 may include a substrate clamping mechanism (not shown), and the processing apparatus D1 may control the transferring apparatus D31, the transferring apparatus D32 and the substrate clamping mechanism, so that the transferring apparatus D31 transfers the substrate P disposed in the feeding apparatus D4 to the substrate clamping mechanism of the processing apparatus D21, and then the substrate P is subjected to the predetermined processing operation in the processing apparatus D21 by the substrate clamping mechanism.

The transfer device D31 can be controlled by the processing device D1 to transfer the substrate P set in the loading device 1A into the processing machine D21. In practical applications, the substrate processing apparatus D may further include a plurality of sensors (not shown, such as optical sensors, etc.), the plurality of sensors may be configured to sense whether the loading device 1A is provided with the substrate P, the plurality of sensors are connected to the processing device D1, and the processing device D1 may control the transferring device D31 to suspend transferring the substrate P of the loading device D4 into the processing machine D21 when the sensor determines that the loading device 1A is provided with the substrate P, instead, the substrate P provided in the loading device 1A is transferred into the processing machine D21, and then the original operation flow is resumed (i.e., the substrate P of the loading device D4 is transferred into the processing machine D21).

The sensor may be an automatic sensor, but not limited thereto; in different applications, after the user manually sets the substrate P on the loading device 1A, the user may operate another switch or mechanism to send a signal to the processing device D1, and the processing device D1 may control the movement of the transferring device D31 to transfer the substrate P set on the loading device 1A into the adjacent processing machine D21.

As described above, for example, assuming that the transfer device D31 is to transfer 100 substrates P from the feeding device D4 to the process tool D21 in a predetermined flow, if the transfer device D31 receives a control signal related to the processing device D1 after the 56 th substrate P is moved into the process tool D21 (or during the movement of the 56 th substrate P into the process tool D21), the transfer device D31 may suspend the transfer of the 57 th substrate P set in the feeding device D4, and move the 57 th substrate P set in the feeding device D4 into the process tool D21 after the substrate P set in the feeding device 1A is moved into the process tool D21. That is, the substrate processing apparatus D of the present invention enables a user to insert a substrate P with a specific specification into any one of the processing tools D21 in real time according to the requirement.

It should be noted that in the figure of the present embodiment, the transfer device D31 is used as a device for transferring the substrate P from the feeding device D4 to the processing machine D21, and also used as a device for transferring the substrate P from the feeding device 1A to the processing machine D21, and the substrate entering position of the processing machine D21 is only provided with a single transfer device D31, but the number of the transfer devices D31 is not limited thereto.

In different applications, the substrate entering position of the processing machine D21 may be provided with two transferring devices, one of which is dedicated for transferring the substrate P from the feeding device D4 into the processing machine D21, the other is dedicated for transferring the substrate P from the loading device 1A into the processing machine D21, and the transferring device D31 is dedicated for transferring the substrate P from the loading device 1A into the processing machine D21, and the loading device 1A may be defined as a loading machine S1. That is, in a specific application, the loading stations S1 and S2 may be independent machines, particularly machines independent of the processing stations D21 and D22, the feeding device D4 and the transfer devices D31 and D32 therebetween.

The other transfer device D32 of the substrate processing apparatus D1 may be disposed adjacent to a substrate sending position of the processing tool D22 (a tool for performing a coating operation on the substrate P) and a substrate entering position of the other processing tool D22. The transfer device D32 is used to transfer the substrate P that has been processed by the spraying operation (i.e., the substrate P that passed through the processing tool D21) to another processing tool D22 for performing the baking operation.

The transfer device D32 operates similarly to the transfer device D31, and the transfer device D32 is controlled by the processing device D1 to transfer the substrate P disposed in the adjacent loading device 1B to the processing machine D22 for baking the substrate P. Similarly, when the transfer device D32 receives the control signal from the processing device D1 during the process of transferring the substrate P from one processing tool D21 to another processing tool D22, the transfer device D32 may suspend the subsequent process of holding the substrate P, and first transfer the substrate P disposed in the loading device 1B to the processing tool D22 for baking the substrate P. The baking referred to herein is: the substrate P is left at a predetermined temperature for a predetermined time, and the baking manner, the predetermined temperature, the predetermined time, etc. are not limited and can be determined according to actual requirements.

Therefore, if the developer of the paint wants to directly enter the substrate P coated with the special paint into the processing machine D22 for baking the substrate P, the developer of the paint can place the substrate P coated with the special paint on the loading device 1B, and then the processing device D1 controls the adjacent transfer device D32 to suspend the current activity thereof, and preferentially transfers the substrate P placed on the loading device 1B into the processing machine D22 for baking the substrate P.

In this embodiment, a single transfer device D32 is disposed between the two processing machines D21 and D22, but the number of the transfer devices is not limited to a single one, and in different applications, two transfer devices may be disposed between the two processing machines D21 and D22, wherein one transfer device is dedicated for transferring the substrate P subjected to the spraying operation from the corresponding processing machine D21 to the other processing machine D22, and the other transfer device is dedicated for transferring the substrate P carried by the loading device 1B to the processing machine D22 for baking the substrate P.

As shown in fig. 1, the substrate processing apparatus D may further include a discharging device D5, the discharging device D5 is disposed at a substrate sending position of the processing machine D22, another transferring device D6 may be disposed between the discharging device D5 and the processing machine D22, the transferring device D6 is used to transfer the substrate P passing through the processing machine D22 to the discharging device D5, and the discharging device D5 may be used to transport the substrate P to a predetermined processing machine or a related storage position according to the requirement.

It should be noted that, when the processing device D1 receives a signal related to the substrate P set in any one of the

loading devices

1A and 1B, the processing device D1 may control the movement of the transfer devices D31 and D32 around the

loading devices

1A and 1B in real time to transfer the substrate P carried by the

loading devices

1A and 1B into the corresponding process machines D21 and D22 in real time, or the processing device D1 may wait for the transfer devices D31 and D32 to complete the predetermined transfer operation first and then transfer the substrate P carried by the

loading devices

1A and 1B into the process machines D21 and D22, which is not limited herein.

Referring to fig. 3 to 6 together, fig. 3 is a side view of the

loading device

1A, 1B of the present invention; fig. 4 shows a front view of the

charging device

1A, 1B; fig. 5 shows a perspective view of the

charging device

1A, 1B; fig. 6 is a partially exploded view of the

charging devices

1A and 1B.

As shown in the figure, the

charging devices

1A, 1B include: a main body 11 and a switch unit 12. The body 11 is provided with two jaw assemblies 13. Two jaw assemblies 13 are connected to the switch unit 12. The clamping jaw assembly 13 includes two clamping jaws 131 and a driving module 132, the driving module 132 connects the two clamping jaws 131, and the driving module 132 can control the two clamping jaws 131 to move relative to each other, so as to clamp the substrate P or release the substrate P clamped by the clamping jaws. In practical applications, the driving module 132 may control the two clamping jaws 131 to move toward each other or move in opposite directions to clamp or release the substrate P. In another embodiment, the driving module 132 may control only one of the clamping jaws 131 to move, and the other clamping jaw 131 is fixed. The form of the driving module 132, the shape of the clamping jaw 131, and the way of driving the clamping jaw 131 by the driving module 132 can be selected according to the requirement (such as the thickness and weight of the substrate P), and are not limited herein.

In the embodiment, the

feeding devices

1A and 1B are exemplified to include two clamping jaw assemblies 13, but the number of the clamping jaw assemblies 13 included in the

feeding devices

1A and 1B is not limited to two, and in different applications, the

feeding devices

1A and 1B may have only a single clamping jaw assembly 13, or the

feeding devices

1A and 1B may include more than three clamping jaw assemblies 13. It should be noted that the processing device D1 may be connected to two driving modules 132, and the processing device D1 can control the driving modules 132 to actuate the clamping jaws 131 of the clamping jaw assemblies 13.

As shown in fig. 3 and 4, the switch unit 12 is connected to the two jaw assemblies 13, and the switch unit 12 can be operated to separate or approach the two jaws 131 of each jaw assembly 13 to clamp or release the substrate P clamped by the two jaw assemblies. Specifically, the switch unit 12 may be installed on the ground for the user to use by foot. When a user wants to fix the substrate P to the

feeding device

1A, 1B, the user may first step on the switch unit 12 to separate the two clamping jaws 131 of each clamping jaw assembly 13 from each other, and then, after the user adjusts the substrate P to a predetermined position, the user may release the switch unit 12 to enable the two clamping jaws 131 of each clamping jaw assembly 13 to approach each other to clamp the substrate P.

As shown in fig. 4, in practical applications, in order to facilitate the transfer of the substrates P from the

loading devices

1A and 1B by the transfer devices D31 and D32, the main body 11 may be provided with a vertical position-limiting structure 14 and two horizontal position-limiting mechanisms 15.

The longitudinal position-limiting structure 14 is located between the two clamping jaw assemblies 13, and the longitudinal position-limiting structure 14 is used for providing the substrate P to abut against so as to limit the moving range of the substrate P relative to the clamping jaw assemblies 13 in a longitudinal direction (i.e. the Y-axis direction of the coordinates shown in fig. 4). The shape of the vertical stopper structure 14 may be designed according to the shape of the substrate P, which is shown as an exemplary aspect. In a specific application, the longitudinal position-limiting structure 14 may be disposed at a substantially central position of the body 11, and when the substrate P is clamped by the two clamping jaw assemblies 13, the longitudinal position-limiting structure 14 may be correspondingly located at the central position of the substrate P.

Each lateral stop mechanism 15 is disposed on one side of each jaw assembly 13, and two jaw assemblies 13 are located between two lateral stop mechanisms 15. Each lateral limiting mechanism 15 includes a slide rail structure 151, a slide block 152, and an operating member 153.

A sliding groove 1511 is formed in a concave side of each of the sliding rail structures 151, the sliding rail structure 151 further includes a through hole 1512 for the sliding groove 1511, the through hole 1512 is disposed through the sliding rail structure 151, and the through hole 1512 and the sliding groove 1511 are communicated with each other. The sliding block 152 is disposed in the sliding groove 1511, and the sliding block 152 can slide in the sliding groove 1511 under the action of an external force. The operation member 153 includes a first locking structure 1531, and a portion of the operation member 153 having the first locking structure 1531 can pass through the through hole 1512 to be locked with a second locking structure 1521 of the slider 152 disposed on the chute 1511. Specifically, the first locking structure 1531 is, for example, a screw structure, and the second locking structure 1521 is, for example, a screw structure.

A portion of the operating member 153 is located on a side of the slide rail structure 151 opposite to the side where the slide groove 1511 is formed. The operation member 153 has an end with a first locking structure 1531 capable of passing through the through hole 1512 and being exposed in the sliding groove 1511, and the operation member 153 can be rotated, and the first locking structure 1531 can be locked with the second locking structure 1521 of the slider 152 located in the sliding groove 1511.

When the operation element 153 is rotated and the first locking structure 1531 and the second locking structure 1521 are locked with each other, the slider 152 and the operation element 153 are fixed with the rail structure 151, and the slider 152 and the operation element 153 cannot move relative to the rail structure 151, that is, the movable range of the slider 152 relative to the rail structure 151 can be limited by the first locking structure 1531 and the second locking structure 1521.

As shown in fig. 4, each of the slide rail structures 151 may further include a scale marking structure 17, and the scale marking structure 17 is used for providing a user to identify the position of the slider 152 relative to the slide rail structure 151. When the two jaw assemblies 13 clamp the substrate P, a user may first completely lock the first locking structure 1531 of each operating element 153 with the corresponding second locking structure 1521, so that the portions of the two operating elements 153 exposed at one side of the through hole 1512 are correspondingly abutted against two opposite sides of the substrate P; then, the user can rotate the operation member 153 to lock the operation member 153 and the corresponding slide block 152 together, so that the operation member 153 is fixed to the slide rail structure 151. At this time, the user can determine the positions of the two operation members 153 by looking at the two scale indicating structures 17, so that the user can determine whether the substrate P is clamped at the correct position.

Specifically, when the substrate P is clamped at the correct position, the scales of the two operation members 153 corresponding to the scale marking structure 17 should be completely the same, and if the user finds that the scales of the two operation members 153 are not the same, it indicates that the substrate P is not located at the correct position, at this time, the user can operate the switch unit 12 again to release the substrate P from the two clamping jaw assemblies 13, so as to readjust the position of the substrate P relative to the two clamping jaw assemblies 13.

It should be noted that, in a specific application, the longitudinal position-limiting structure 14 may further include a first position-limiting surface 14A, each of the slide rail structures 151 includes a second position-limiting surface 15A, and the first position-limiting surface 14A and the second position-limiting surface 15A are located on the same plane. When the clamping jaw assembly 13 clamps the substrate P, the first limiting surface 14A and the two second limiting surfaces 15A can correspondingly abut against a wide side surface of the substrate P, and the first limiting surface 14A and the two second limiting surfaces 15A can limit a moving range of the substrate P in a front-back direction (i.e., a Z-axis direction of a coordinate shown in fig. 5). Through the design of the first limiting surface 14A and the second limiting surface 15A, it can be ensured that the clamping jaw assembly 13 is not in a skew state when being clamped by the two clamping jaw assemblies.

In addition, the longitudinal position-limiting structure 14 may further include a third position-limiting surface 14B, and the third position-limiting surface 14B may be perpendicular to the first position-limiting surface 14A; each slide rail structure 151 includes a fourth limiting surface 15B, and the fourth limiting surface 15B may be perpendicular to the second limiting surface 15A; the third limiting surface 14B and the fourth limiting surface 15B are located on the same plane. When the clamping jaw assembly 13 clamps the substrate P, the third limiting surface 14B and the two fourth limiting surfaces 15B can correspondingly abut against a narrow side surface of the substrate P, and the third limiting surface 14B and the two fourth limiting surfaces 15B can jointly limit the moving range of the substrate P in the longitudinal direction (i.e., the Y-axis direction of the coordinate shown in fig. 5). Through the design of the third limiting surface 14B and the fourth limiting surface 15B, it can be ensured that the clamping jaw assemblies 13 are not in a skew state when clamped.

As described above, the user can correctly clamp the substrate P on the

loading devices

1A and 1B by the cooperation of the

loading devices

1A and 1B and the switch unit 12, and then the transfer devices D31 and D32 are controlled to remove the substrate P from the

loading devices

1A and 1B, which is not prone to error. Specifically, the transfer devices D31 and D32 basically operate according to a predetermined operation path when clamping the substrates P on the

corresponding loading devices

1A and 1B, and if the substrates P are not clamped at the correct positions of the

loading devices

1A and 1B, there is a possibility that the transfer devices D31 and D32 may fail to clamp the substrates P correctly when the transfer devices D31 and D32 operate along the predetermined operation path, and the substrates P may fall off.

It should be noted that, in practical applications, the processing device D1 is electrically connected to the transferring devices D31 and D32 and the

loading devices

1A and 1B, and the flow of the processing device D1 controlling the transferring devices D31 and D32 to transfer the substrates P of the

loading devices

1A and 1B to the corresponding process machines D21 and D22 may be: the processing apparatus D1 first controls the transfer devices D31 and D32 to move to the periphery of the

loading units

1A and 1B; then, the processing apparatus D1 controls the transfer devices D31 and D32 to clamp the substrates P set in the

loading devices

1A and 1B; next, the processing apparatus D1 controls the two clamping jaw assemblies 13 of the

loading apparatuses

1A and 1B to no longer clamp the substrate P; finally, the processing apparatus D1 controls the transfer apparatus D31 and D32 to transfer the substrate P to the processing machines D21 and D22.

In summary, the substrate processing apparatus and the

loading stations

1A and 1B of the present invention allow the relevant personnel to insert the specific substrate into the specific processing stations D21 and D22 in the existing production process, so that the specific substrate can be directly processed by the specific processing stations D21 and D22. Therefore, the reliability of the result of the substrate P after completing the related test is relatively higher than that of the result obtained by the test using the small-sized equipment independent of the production line.

The above description is only a preferred embodiment of the present invention, and not intended to limit the scope of the present invention, so that all equivalent technical changes made by using the contents of the specification and drawings of the present invention are included in the scope of the present invention.

Claims

1. A substrate processing apparatus, comprising:

a processing device;

a plurality of processing machines respectively connected with the processing device, wherein each processing machine is used for carrying out a preset processing operation on the substrate; the predetermined process operation performed on the substrate by one of the plurality of process tools is a spraying operation, wherein the spraying operation is a spraying operation of spraying a coating material on the substrate, or the predetermined process operation performed on the substrate by one of the plurality of process tools is a baking operation, wherein the baking operation is a retention of the substrate at a predetermined temperature for a predetermined time;

at least one loading platform disposed adjacent to a substrate entry location of any of the processing platforms, the loading platform comprising:

a loading device connected to the processing device, the loading device comprising:

at least one gripper assembly controllable to grip a substrate, said gripper assembly comprising two gripper arms, at least one of said gripper arms being controllable by said processing apparatus to move relative to the other of said gripper arms;

the switch unit is connected with the clamping jaw assembly and can be operated to control the two clamping arms to move relative to each other so that the clamping jaw assembly clamps the substrate or the clamping jaw assembly releases the clamped substrate;

and the shifting device is arranged adjacent to the substrate entering position of any one of the processing machines, is connected with the processing device, and can be controlled by the processing device to shift the substrate clamped by the feeding device into the processing machine from the substrate entering position of the processing machine adjacent to the feeding device.

2. The substrate processing apparatus of claim 1, wherein the loading device comprises two of the clamping jaw assemblies, the loading device further comprising a longitudinal stop mechanism disposed between the two clamping jaw assemblies, the longitudinal stop mechanism configured to provide substrate abutment to limit a range of motion of the substrate relative to the clamping jaw assemblies in a longitudinal direction.

3. The substrate processing apparatus of claim 1, wherein the loading device comprises two of the clamping jaw assemblies and two lateral limiting mechanisms, the two clamping jaw assemblies being spaced apart from each other; the two transverse limiting mechanisms are arranged on one side of the two clamping jaw assemblies, and the two clamping jaw assemblies are positioned between the two transverse limiting mechanisms; each transverse limiting mechanism comprises a slide rail structure and a slide block, the slide block is slidably arranged on the slide rail structure, and the slide block can be operated to slide on the slide rail structure; each slide rail structure comprises a scale marking structure, and the scale marking structure is used for providing a user to identify the position of the slide block relative to the slide rail structure; when the clamping jaw assembly clamps the substrate, the two sliding blocks can be operated to respectively abut against two opposite side edges of the substrate.

4. The substrate processing apparatus of claim 1, wherein the loading device comprises two of the clamping jaw assemblies, the loading device further comprising a longitudinal position limiting mechanism, the longitudinal position limiting mechanism is located between the two clamping jaw assemblies, and the longitudinal position limiting mechanism is used for providing the substrate to abut against so as to limit a movable range of the substrate relative to the clamping jaw assemblies in a longitudinal direction; the feeding device comprises two clamping jaw assemblies and two transverse limiting mechanisms, and the two clamping jaw assemblies are arranged at intervals; the two transverse limiting mechanisms are arranged on one side of the two clamping jaw assemblies, and the two clamping jaw assemblies are positioned between the two transverse limiting mechanisms; each transverse limiting mechanism comprises a slide rail structure and a slide block, the slide block is slidably arranged on the slide rail structure, and the slide block can be operated to slide on the slide rail structure; each slide rail structure comprises a scale marking structure, and the scale marking structure is used for providing a user to identify the position of the slide block relative to the slide rail structure; when the clamping jaw assembly clamps the substrate, the two sliding blocks can be operated to respectively abut against two opposite side edges of the substrate; the longitudinal limiting mechanism comprises a first limiting surface, each slide rail structure comprises a second limiting surface, and the first limiting surface and the second limiting surface are positioned on the same plane; when the clamping jaw assembly clamps the substrate, the first limiting surface and the two limiting surfaces are correspondingly abutted against a wide side face of the substrate, and the first limiting surface and the two second limiting surfaces can limit the moving range of the substrate relative to the clamping jaw assembly in a front-back direction.

5. The substrate processing apparatus of claim 3 or 4, wherein each lateral position limiting mechanism further comprises an operating member, the operating member comprising a first locking structure; a sliding groove is formed in one side of each sliding rail structure in a concave mode, the sliding rail structure further comprises a through hole corresponding to the sliding groove, the through hole penetrates through the sliding rail structure, the through hole is communicated with at least one part of the sliding groove, the sliding block is arranged on the sliding groove, and the sliding block comprises a second locking structure; the first locking structure of the operating part can be locked with the second locking structure of the sliding block in the sliding groove through the through hole so as to limit the moving range of the sliding block relative to the sliding rail structure.

6. A loader table for positioning adjacent to a substrate entry location of one of a plurality of process tables of a substrate processing apparatus, the process tables for performing a painting operation or a baking operation on a substrate, the loader table comprising:

a loading device, comprising:

at least one jaw assembly controllable to clamp a substrate, said jaw assembly comprising two clamp arms, at least one of said clamp arms being controllable to move relative to the other of said clamp arms;

the switch unit is connected with the clamping jaw assembly and can be operated to control the two clamping arms to move relative to each other so that the clamping jaw assembly clamps the substrate or the clamping jaw assembly releases the substrate clamped by the clamping jaw assembly;

and the moving and carrying device can be controlled to move the substrate clamped by the feeding device into the processing machine from the substrate entering position of the processing machine adjacent to the feeding device.

7. The loading machine station as claimed in claim 6, wherein the loading device comprises two clamping jaw assemblies, and the loading device further comprises a longitudinal limiting mechanism, the longitudinal limiting mechanism is located between the two clamping jaw assemblies, and the longitudinal limiting mechanism is used for providing the substrate to abut against, so as to limit a moving range of the substrate relative to the clamping jaw assemblies in a longitudinal direction.

8. A feeding machine table according to claim 6, wherein the feeding device comprises two clamping jaw assemblies and two transverse limiting mechanisms, and the two clamping jaw assemblies are arranged at intervals; the two transverse limiting mechanisms are arranged on one side of the two clamping jaw assemblies, and the two clamping jaw assemblies are positioned between the two transverse limiting mechanisms; each transverse limiting mechanism comprises a slide rail structure and a slide block, the slide block is slidably arranged on the slide rail structure, and the slide block can be operated to slide on the slide rail structure; each slide rail structure comprises a scale marking structure, and the scale marking structure is used for providing a user to identify the position of the slide block relative to the slide rail structure; when the clamping jaw assembly clamps the substrate, the two sliding blocks can be operated to respectively abut against two opposite side edges of the substrate.

9. The loading machine station as claimed in claim 6, wherein the loading device comprises two clamping jaw assemblies, and further comprises a longitudinal limiting mechanism, the longitudinal limiting mechanism is located between the two clamping jaw assemblies, and the longitudinal limiting mechanism is used for providing the substrate to abut against, so as to limit a moving range of the substrate relative to the clamping jaw assemblies in a longitudinal direction; the feeding device comprises two clamping jaw assemblies and two transverse limiting mechanisms, and the two clamping jaw assemblies are arranged at intervals; the two transverse limiting mechanisms are arranged on one side of the two clamping jaw assemblies, and the two clamping jaw assemblies are positioned between the two transverse limiting mechanisms; each transverse limiting mechanism comprises a slide rail structure and a slide block, the slide block is slidably arranged on the slide rail structure, and the slide block can be operated to slide on the slide rail structure; each slide rail structure comprises a scale marking structure, and the scale marking structure is used for providing a user to identify the position of the slide block relative to the slide rail structure; when the clamping jaw assembly clamps the substrate, the two sliding blocks can be operated to respectively abut against two opposite side edges of the substrate; the longitudinal limiting mechanism comprises a first limiting surface, each slide rail structure comprises a second limiting surface, and the first limiting surface and the second limiting surface are positioned on the same plane; when the clamping jaw assembly clamps the substrate, the first limiting surface and the two limiting surfaces are correspondingly abutted against a wide side face of the substrate, and the first limiting surface and the two second limiting surfaces can limit the moving range of the substrate relative to the clamping jaw assembly in a front-back direction.

10. The feeding machine table according to claim 8 or 9, wherein each of the lateral limiting mechanisms further comprises an operating member, and the operating member comprises a first locking structure; a sliding groove is formed in one side of each sliding rail structure in a concave mode, the sliding rail structure further comprises a through hole corresponding to the sliding groove, the through hole penetrates through the sliding rail structure, the through hole is communicated with at least one part of the sliding groove, the sliding block is arranged on the sliding groove, and the sliding block comprises a second locking structure; the first locking structure of the operating part can be locked with the second locking structure of the sliding block in the sliding groove through the through hole so as to limit the moving range of the sliding block relative to the sliding rail structure.