CN111158075B - Watermark anti-counterfeiting super-surface device and design method thereof - Google Patents
Watermark anti-counterfeiting super-surface device and design method thereof Download PDFInfo
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Abstract
The invention provides a watermark anti-counterfeiting super-surface device and a design method thereof. The super-surface is composed of a nano-brick unit structure capable of simultaneously responding to red light and green light. The nano-brick unit structure is equivalent to a polarizer for incident red and green line polarized light, and can effectively adjust the proportion of red and green components in the incident line polarized light so as to form a colorful pattern (with the color between red and green) in a near field; in addition, by skillfully utilizing the Malus law and the variation thereof, when the incident light is monochromatic light, the bright or dark watermark can be superposed on the original monochromatic image by rotating the polarizer in the light path. The invention can be applied to high-resolution image display, optical anti-counterfeiting and information multiplexing, has small volume, low cost, light weight and simple design idea, and is very suitable for being applied to a micro photoelectric system.
Description
Technical Field
The invention belongs to the fields of micro-nano optics and polarization optics, and particularly relates to a watermark anti-counterfeiting super-surface device and a design method thereof.
Background
Image forgery prevention is one direction of great importance in the optical field. The watermark anti-counterfeiting by utilizing the super-surface image is mostly realized by converting different images, but the watermark is not a real watermark, because the original image usually disappears in the conversion process, and a watermark pattern is not superposed on the original image; in addition, the traditional image has lower display resolution, larger image area and more obvious image area, and has lower safety when being applied to anti-counterfeiting because of no corresponding encoding and decoding process.
Disclosure of Invention
Aiming at the defect of traditional image anti-counterfeiting, the invention provides a super-surface device capable of efficiently realizing watermark anti-counterfeiting by combining a polarization theory and designing a silver nano brick array and a design method thereof.
One of the purposes of the invention is to provide a super-surface device for realizing watermark anti-counterfeiting, wherein the super-surface utilizes Malus law I ═ I0cos2And (theta) and related variables and corners thereof are optimized, and the near-field monochromatic watermark pattern, the display of the waterless watermark pattern and the colorful watermark pattern are realized through the nano brick unit structure array with the single geometric dimension for the first time. The invention has simple structure and easy processing. The invention has good application potential in the aspects of optical anti-counterfeiting, image hiding, high-resolution monochrome and color image display, information multiplexing and the like;
the invention also aims to provide a design method of a super-surface device for realizing watermark anti-counterfeiting, which can generate the characteristic of the same light intensity and the difference of the light intensity under different incidence conditions by utilizing different rotation angles of the Malus law, thereby skillfully realizing the superposition of near-field monochromatic watermark patterns and the display of color watermark patterns with watermark;
in order to achieve the purpose, the scheme of the invention is as follows:
in a first aspect, the present invention provides a super-surface device for implementing watermark anti-counterfeiting, which is characterized in that:
the super surface is formed into a nano brick unit array by nano bricks capable of simultaneously responding to red light and green light, the interval between different nano brick unit structures is a period CS, and nano brick units at different positions correspond to different corners;
the nano brick unit structure acts as a polarizer for linearly polarized light; when incident red and green line polarized light is polarized along the long axis of the nano brick, the red light is reflected, and the green light is transmitted; when incident red and green line polarized light is polarized along the minor axis of the nano brick, green light is reflected, and red light is transmitted;
when an incident light source is green light, a single-color continuous gray pattern is observed on the surface of a sample wafer when the incident light source sequentially passes through a polarizer with the polarization direction of 0 degree, the watermark anti-counterfeiting super surface and an analyzer with the polarization direction of 90 degrees; the polarization direction of the analyzer is changed to 135 degrees, so that a monochromatic gray pattern is seen to be unchanged, but a layer of anti-counterfeiting watermark is superposed on the surface of the analyzer;
when an incident light source is red and green double-color light, a polarizer with the polarization direction of 0 degree, the watermark anti-counterfeiting super surface and an analyzer with the polarization direction of 0 degree are sequentially arranged, and a colorful pattern with the anti-counterfeiting watermark superposed is observed on the surface of a sample;
the polarization direction is relative to the x-axis;
in a second aspect, the present invention provides a method for designing a super-surface device for implementing watermark anti-counterfeiting, which is characterized in that: comprises the following steps:
(1) according to the two selected incident light wavelengths, when the incident ray polarization light vertically irradiates the nano brick unit through electromagnetic simulation software, the red light polarized along the long axis has high reflection efficiency and the green light has high transmission efficiency; the red light polarized along the short axis has high transmission efficiency, the green light reflection efficiency is high as a target, and the cycle CS of the nano brick unit structure, the width W, the length L and the height H of the nano brick unit structure are optimized;
(2) considering the incident condition of monochromatic green light, defining the corner theta of the nano brick as the included angle between the long axis of the nano brick and the x axis, and when the polarization direction of the polarizer is 0 DEG, the direction of the analyzer is 90 DEG; the intensity of the reflected green light is I1＝I0sin2(2 theta), reflected green light intensity I1Is a function of theta, and the period is pi/2, which means that the gray scale of each pixel point can have four different rotation angles as candidate rotation angles according to the single-color target pattern under the incident condition between 0 and pi; rotating the analyzer to 135 deg., the reflected green light is of light intensity
Observation light intensity I1And I2Will find 0<θ<At pi/8, I1≈I2；3π/8<θ<At pi/2, I1<I2；7π/8<θ<When is pi, I1>I2. For the light intensity I1In other words, the interval 0<θ<π/8，3π/8<θ<π/2，7π/8<θ<The intensities of the pi correspondences are exactly equal, so when the incident is changed to the second one, we choose the corner range 7 pi/8 in the area where the dark watermark is desired to be superimposed<θ<Pi; in the area where the bright watermark is expected to be superimposed, the rotation angle range of 3 pi/8 is selected<θ<Pi/2; in the region where no watermark is desired to be superimposed, the rotation angle range 0 is selected<θ<Pi/8; therefore, under the condition of monochromatic light incidence, when the analyzer rotates from 90 degrees to 135 degrees, two watermarks of bright and dark can be superposed on the basis of unchanged original images; meanwhile, the designed nano-bricks can simultaneously respond to red and green lights, and when the incident light is the red and green lights and the polarization analyzer is 0 degree, a color pattern with the color between the red and the green can be observed on the surface of the sample wafer;
(3) preparing a watermark anti-counterfeiting super surface by adopting a photoetching process according to the silver nano brick array structure determined in the step (2);
(4) when the incident light is green light, the polarization direction of the polarizer is 0 degrees, and the direction of the analyzer is 90 degrees, a monochromatic pattern is observed in a near field; rotating the analyzer to 135 deg. to see the superposition of bright and dark watermarks on the monochromatic pattern; switching incident light into red light and green light, rotating the analyzer to 0 degree, and seeing a picture with different watermark and background color;
the invention has the advantages and beneficial effects that:
the watermark anti-counterfeiting super surface can realize real watermark through the conversion of the polarization angle of the analyzer, namely, the original pattern is unchanged, and the patterns are superposed on the original pattern; in addition, under the irradiation of double-color incident light, the invention can also realize color watermark patterns, and the resolution can reach 74000dpi, which exceeds the resolution of the traditional image display and the color patterns on the common super surface. The method specifically comprises the following steps:
(1) the provided watermark anti-counterfeiting super surface can realize the disappearance and the reappearance of the watermark on the target pattern by rotating the polarization analyzer under the condition of monochromatic light incidence, and has an anti-counterfeiting function;
(2) the provided watermark anti-counterfeiting super surface can realize a color watermark pattern under the condition of red and green light incidence;
(3) compared with the traditional image display, the pattern resolution provided by the invention is greatly improved, a decoding process is required, different patterns exist under different incidence conditions, and certain confidentiality is achieved;
(4) compared with the traditional image display device, the near-far field multiplexing super surface has the advantages of small volume, low cost, small weight and capability of realizing dynamic modulation;
(5) the structure has an ultramicro structure and can be widely applied to the field of photonic integration;
(6) the metal nano brick array structure can be processed by a standard photoetching process, and the process is simple;
(7) provides a new idea for the design and preparation of image display and encryption, and has great reference value and application prospect.
Drawings
FIG. 1 is a schematic view of a structural unit of the watermark anti-counterfeiting super-surface in example 1, wherein a rotation angle θ is defined as an included angle between a long axis of a nano brick and an x axis;
FIG. 2 is a schematic diagram of a three-dimensional structure of a part of the silver nanobead array structure in example 1;
fig. 3 is a graph showing simulation results of the silver nanoblock array of example 1 on incident light, wherein the x-axis is wavelength and the y-axis is reflection efficiency, including long axis reflection efficiency and short axis reflection efficiency.
FIG. 4 is a schematic view of an optical path for decoding a near field pattern in embodiment 1;
FIG. 5 is a nanoprint at monochromatic light incidence; FIG. (a) is a monochrome plot at 90 ℃ of the analyzer; figure (b) shows the pattern of the superimposed watermark at 135 ° of the analyzer;
FIG. 6 is a color band watermark pattern at two color light incidence;
in the figure: 1. nano bricks; 2. a substrate; l, the long axis size of the nano brick; w, the minor axis size of the nano brick; H. the height of the nano-brick is high,
CS and the distance between the nano bricks.
Detailed Description
The invention is described in further detail below with reference to the figures and specific examples.
The embodiment of the invention provides a super surface for realizing watermark anti-counterfeiting, which is composed of a transparent substrate and a nano unit array etched on the surface of the substrate, wherein the nano unit array comprises a plurality of nano unit structures (in the embodiment, the nano unit structures are silver nano bricks), and the disappearance and reproduction of monochrome image watermarks and the display of color watermarked images are realized through design.
(1) The silver nano brick array structure shown in fig. 1-2 comprises two layers of silver nano bricks 1 and a substrate 2 from top to bottom in sequence. The silver nano brick array 1 is formed by periodically arranging silver nano brick unit structures, the silver nano bricks are cuboids, and the length, the width and the height of the silver nano bricks are sub-wavelength sizes. The structure of a single silver nanobead unit is shown in fig. 1. In this embodiment, the substrate 2 is a silicon dioxide substrate.
As an embodiment, 510nm and 620nm are selected as working wavelengths, and the structure of the silver nano brick unit is optimized under the working wavelengths by adopting the existing CSTUDIO SUITE electromagnetic simulation tool, so that the red light reflection efficiency is highest when incident linear polarization light is polarized along the long axis of the nano brick; when incident linear polarization light is polarized along the minor axis of the nano brick, the green light reflection efficiency is highest; by rotating the nano brick array structure, the change of reflected light from red light to green light can be realized. In this embodiment, the optimized silver nanoblock has a length L of 140nm, a width W of 85nm, a thickness H of 70nm, and a unit structure CS of 340 nm; the polarization efficiency graph obtained by simulation is shown in fig. 3, the reflection efficiency of the red light polarized along the major axis reaches 90%, and the reflection efficiency of the green light polarized along the minor axis reaches 70%;
(2) considering the condition of monochromatic green light incidence, defining the rotation angle theta of the nano brick as the long axis and the x axis of the nano brickWhen the polarization direction of the polarizer is 0 degree, the direction of the analyzer is 90 degrees; the intensity of the reflected green light is I1＝I0sin2(2 theta), reflected green light intensity I1Is a function of theta, and the period is pi/2, which means that the gray scale of each pixel point can have four different rotation angles as candidate rotation angles according to the single-color target pattern under the incident condition between 0 and pi; rotating the analyzer to 135 deg., the reflected green light is of light intensity
Observation light intensity I1And I2Will find 0<θ<At pi/8, I1≈I2；3π/8<θ<At pi/2, I1<I2；7π/8<θ<When is pi, I1>I2. For the light intensity I1In other words, the interval 0<θ<π/8，3π/8<θ<π/2，7π/8<θ<The intensities of the pi correspondences are exactly equal, so when the incident is changed to the second one, we choose the corner range 7 pi/8 in the area where the dark watermark is desired to be superimposed<θ<Pi; in the area where the bright watermark is expected to be superimposed, the rotation angle range of 3 pi/8 is selected<θ<Pi/2; in the region where no watermark is desired to be superimposed, the rotation angle range 0 is selected<θ<Pi/8; therefore, under the condition of monochromatic light incidence, when the analyzer rotates from 90 degrees to 135 degrees, two watermarks of bright and dark can be superposed on the basis of unchanged original images; meanwhile, the designed nano-bricks can simultaneously respond to red and green lights, and when the incident light is the red and green lights and the polarization analyzer is 0 degree, a color pattern with the color between the red and the green can be observed on the surface of the sample wafer;
(3) preparing a watermark anti-counterfeiting super surface by adopting a photoetching process according to the silver nano brick array structure determined in the step (2);
(4) the light path diagram is shown in FIG. 4; when the incident light is green light, the polarization direction of the polarizer is 0 degrees, and the direction of the analyzer is 90 degrees, a monochromatic pattern is observed in a near field; rotating the analyzer to 135 deg. will see both the light and dark watermarks superimposed on the monochrome pattern, as shown in figure 5; switching the incident light into red and green light, rotating the analyzer to 0 °, and viewing a picture with different watermark and background color as shown in fig. 6;
the above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any modification, equivalent replacement, and improvement made by those skilled in the art within the technical scope of the present invention should be included in the scope of the present invention.
Claims (3)
1. A watermark anti-counterfeiting super-surface device is characterized in that:
the super surface is composed of an array of nano-brick units formed by nano-bricks capable of simultaneously responding to red light and green light, the interval between different nano-brick unit structures is a period CS, and the nano-brick units at different positions correspond to different corners theta; the corner theta is an included angle between the long axis of the nano brick and the x axis;
the nano brick unit structure acts as a polarizer for linearly polarized light; when incident red and green line polarized light is polarized along the long axis of the nano brick, the red light is reflected, and the green light is transmitted; when incident red and green line polarized light is polarized along the minor axis of the nano brick, green light is reflected, and red light is transmitted;
the polarization direction refers to the x-axis, which is an edge of the upper surface of the substrate, with respect to the x-axis:
when an incident light source is green light, sequentially passing through a polarizer with a polarization direction of 0 degree, a watermark anti-counterfeiting super surface and an analyzer with a polarization direction of 90 degrees, and observing a monochromatic continuous gray pattern on the upper surface of the watermark anti-counterfeiting super surface; the polarization direction of the analyzer is changed to 135 degrees, so that a monochromatic gray pattern is seen to be unchanged, but a layer of anti-counterfeiting watermark is superposed on the surface of the analyzer;
secondly, when the incident light source is red and green double-color light, a polarizer with the polarization direction of 0 degree, the watermark anti-counterfeiting super surface and an analyzer with the polarization direction of 0 degree are sequentially arranged, and a colorful pattern with the anti-counterfeiting watermark superposed is observed on the upper surface of the watermark anti-counterfeiting super surface.
2. The watermark anti-counterfeiting super-surface device according to claim 1, wherein:
when the double-color light enters, the color printing image of the near field realizes continuous color adjustment between red light and green light;
when monochromatic light is incident, the near-field gray pattern realizes continuous adjustment of gray;
using Malus law I ═ I0cos2And (theta) and related variables, the superposition and hiding of the watermark can be realized under the condition of monochromatic light irradiation.
3. A method for designing a watermark anti-counterfeiting super-surface device according to claim 1 or 2, wherein the method comprises the following steps: comprises the following steps:
(1) according to the two selected incident light wavelengths, when the incident ray polarization light vertically irradiates the nano brick unit through electromagnetic simulation software, the red light polarized along the long axis has high reflection efficiency and the green light has high transmission efficiency; the red light polarized along the short axis has high transmission efficiency, the green light reflection efficiency is high as a target, and the cycle CS of the nano brick unit structure, the width W, the length L and the height H of the nano brick unit structure are optimized;
(2) considering the incident condition of monochromatic green light, defining the corner theta of the nano brick as the included angle between the long axis of the nano brick and the x axis, and when the polarization direction of the polarizer is 0 DEG, the direction of the analyzer is 90 DEG; the intensity of the reflected green light is I1＝I0sin2(2 theta), reflected green light intensity I1Is a function of theta, the period is pi/2, namely between 0 and pi, and according to the monochromatic target pattern under the incident condition, the gray level of each pixel point has four different rotation angles as candidate rotation angles;
rotating the analyzer to 135 deg., the reflected green light is of light intensity
Observation light intensity I1And I2Function image of (2) when 0<θ<At pi/8, I1≈I2；3π/8<θ<At pi/2, I1<I2；7π/8<θ<At the time of pi, the crystal is,I1>I2(ii) a For the light intensity I1In other words, the interval 0<θ<π/8，3π/8<θ<π/2，7π/8<θ<The intensities of the pi correspondences are equal, so that when the incident light source is changed into red-green bicolor light, when the area to be added with the dark watermark, the rotation angle range of 7 pi/8 is selected<θ<Pi; when the area needing to be superposed with the bright watermark is selected, the rotation angle range is 3 pi/8<θ<Pi/2; when the area without the watermark is needed to be superposed, the rotation angle range 0 is selected<θ<π/8；
Therefore, under the condition of monochromatic light incidence, when the analyzer rotates from 90 degrees to 135 degrees, two watermarks of bright and dark can be superposed on the basis of unchanged original images; because the designed nano-brick can simultaneously respond to red and green lights, when the incident light is the red and green lights and the polarization analyzer is 0 degree, a color pattern with the color between the red and the green can be observed on the upper surface of the watermark anti-counterfeiting super-surface;
(3) preparing a watermark anti-counterfeiting super surface by adopting a photoetching process according to the silver nano brick array structure determined in the step (2);
(4) when the incident light is green light, the polarization direction of the polarizer is 0 degrees, and the direction of the analyzer is 90 degrees, a monochromatic pattern is observed in a near field; rotating the analyzer to 135 deg. to see the superposition of bright and dark watermarks on the monochromatic pattern; the incident light is switched to red and green light, the analyzer rotates to 0 degree, and a picture with different watermark and background color is seen.
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