CN111155124A - Copper alloy surface cleaning method - Google Patents
Copper alloy surface cleaning method Download PDFInfo
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- CN111155124A CN111155124A CN202010008969.9A CN202010008969A CN111155124A CN 111155124 A CN111155124 A CN 111155124A CN 202010008969 A CN202010008969 A CN 202010008969A CN 111155124 A CN111155124 A CN 111155124A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
- C23G1/20—Other heavy metals
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
- C23F3/04—Heavy metals
- C23F3/06—Heavy metals with acidic solutions
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/10—Other heavy metals
- C23G1/103—Other heavy metals copper or alloys of copper
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G3/00—Apparatus for cleaning or pickling metallic material
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F1/00—Electrolytic cleaning, degreasing, pickling or descaling
- C25F1/02—Pickling; Descaling
- C25F1/04—Pickling; Descaling in solution
Abstract
The invention discloses a copper alloy surface cleaning method, which comprises the following steps of a, cleaning a copper alloy by water to obtain a product A; b. washing product A with 60-90 deg.C alkali solution to obtain product B; c. washing product B with water to obtain product C; d. pickling product C to obtain product D; e. washing product D with water to obtain product E; f. performing electrolytic degreasing on the product E to obtain a product F; g. cleaning product F to obtain product G; h. g, fading to obtain an H product; i. performing gloss treatment on the product H to obtain a product I; j. washing the product I with water to obtain product J; k. cleaning product J with acetone to obtain product K; l, cleaning the product K with alcohol to obtain a product L; and m, drying the L product to obtain the cleaned copper alloy. The cleaning agent for the copper alloy welding piece has the advantage of good cleaning effect, and can ensure the reliable welding performance of a finished product.
Description
Technical Field
The invention belongs to the field of surface treatment of vacuum diffusion welding copper alloys, and particularly relates to a copper alloy surface cleaning method for vacuum diffusion welding.
Background
The vacuum diffusion welding is a welding method that two welding parts made of different materials are pressed together tightly and are placed in a vacuum or protective atmosphere furnace for heating, micro plastic deformation is generated on micro bulges on the contact surfaces of the two welding parts, so that the two welding parts are in close contact, and the two welding parts are subjected to mutual diffusion to form metallurgical connection in the subsequent heating and heat preservation. The surface cleanliness of the welded part is critical to the effect of atomic diffusion, and the strength of the welded joint is influenced, and the strength and the service life of a finished product are finally influenced. In order to reduce risks and improve welding quality, the welding surface of a welding part needs to be cleaned, and the cleanliness of the welding surface of the welding part is guaranteed.
In modern vacuum diffusion welding application, a welding part is generally cleaned by acid washing, gasoline is used for removing oil firstly, and then HNO is respectively added3Washing is carried out in solution and HCl solution. When the welding part is made of copper alloy, the surface of the cleaned copper alloy has no metallic luster and is dark, and because the cleaning method of the existing welding part has no strict standard, the process is unstable, the acid pickling residues on the surface of the copper alloy welding part are difficult to remove, the cleaning effect is poor, the over-corrosion phenomenon is easy to occur, the welding is carried out with another welding part, the atomic diffusion is blocked, the interatomic bonding force is poor, the welding performance of the obtained finished product is unreliable, the connection strength is low, the welding surface peeling phenomenon can occur in the subsequent heat treatment processing, the two welding parts are separated again, and the welding performance of the finished product is unreliable.
Therefore, the existing cleaning method for cleaning the copper alloy welding piece has the defect of poor cleaning effect, and the welding performance of the finished product is unreliable.
Disclosure of Invention
The invention aims to provide a method for cleaning the surface of a copper alloy. The cleaning agent for the copper alloy welding piece has the advantage of good cleaning effect, and can ensure the reliable welding performance of a finished product.
The technical scheme of the invention is as follows: a method for cleaning the surface of copper alloy includes such steps as cleaning the surface of copper alloy,
a. washing the copper alloy with water to obtain a product A;
b. washing product A with 60-90 deg.C alkali solution; the alkali liquor component comprises 40-60g/L of Na according to concentration3PO4·12H20. 8-12g/L NaOH and 3-10g/L Na2SiO3Starting the process; obtaining a product B;
c. washing product B with water to obtain product C;
d. pickling product C to obtain product D;
e. washing product D with water to obtain product E;
f. performing electrolytic degreasing on the product E to obtain a product F;
g. cleaning product F to obtain product G;
h. g, fading to obtain an H product;
i. performing gloss treatment on the product H to obtain a product I;
j. washing the product I with water to obtain product J;
k. cleaning product J with acetone to obtain product K;
l, cleaning the product K with alcohol to obtain a product L;
and m, drying the L product to obtain the cleaned copper alloy.
In the method for cleaning the surface of the copper alloy, the step a is to wash the copper alloy with hot water at 50-70 ℃ to obtain a product A; in the step b, the product A is placed in alkali liquor for cleaning for 6-8 min.
In the method for cleaning the surface of the copper alloy, in the step C, the product B is washed for multiple times by hot water at 50-70 ℃ to obtain a product B1, and then the product B1 is washed for multiple times by cold water to obtain a product C.
In the foregoing method for cleaning the surface of the copper alloy, step d is performed by using HNO at a temperature of 15-30 ℃3Pickling of product C, HNO in solution3The concentration of the solution is 300-500g/L, and the acid washing time is 1-2min, thus obtaining the D product.
In the method for cleaning the surface of the copper alloy, in the step E, cold water is used for washing the product D for multiple times to obtain a product E1, and then hot water at 50-70 ℃ is used for washing the product E1 for multiple times to obtain a product E;
washing the product B with hot water at 50-70 deg.C for several times to obtain product B1, and washing the product B1 with cold water for several times to obtain product G;
and J, washing the product I for multiple times by using cold water to obtain a product I1, and then washing the product I1 for multiple times by using hot water at the temperature of 50-70 ℃ to obtain a product J.
In the method for cleaning the surface of the copper alloy, in the step f, the article E is subjected to electrolytic degreasing on a cathode for 8-12min, the temperature of electrolyte used for electrolytic degreasing is 60-80 ℃, and the components of the electrolyte comprise 30-50g/L of Na3PO4·12H20. 5-15g/L NaOH, 3-10g/L Na2SiO3And 20-25 g/L of Na2CO3。
In the method for cleaning the surface of the copper alloy, in the step h, the G product is cleaned for 1-2min by using a photochemical solution so as to fade the G product; the temperature of the photochemical solution is 15-30 ℃, and the components of the photochemical solution comprise 100-300g/L CrO3And 3-3.5g/L of H2SO4(ii) a And obtaining a product H.
In the foregoing method for cleaning the surface of the copper alloy, in the step i, the H product is placed in an HCl solution for gloss treatment for 3-5s, and the concentration of the HCl solution is 100-; to obtain product I.
In the method for cleaning the surface of the copper alloy, in the step K, the J product is cleaned by using acetone solution through ultrasonic waves for 1-2 times, and the cleaning time is 5-8min each time, so that the K product is obtained.
In the copper alloy surface cleaning method, the K product is cleaned by alcohol ultrasonic wave for 1-2 times, and the cleaning time is 5-8min each time, so that an L product is obtained.
In the above method for cleaning a surface of a copper alloy, the cold water is normal temperature water.
Compared with the prior art, the method has strict normalization and operability and stable process, when the method is used for cleaning the copper alloy welding piece, the cleaned copper alloy welding piece has metallic luster and bright surface, the finished product obtained after the method is used for diffusion welding has reliable welding performance, and the quality of the welding seam is still good after heat treatment. Therefore, the cleaning agent for the copper alloy welding piece has the advantage of good cleaning effect, and can ensure the reliable welding performance of the finished product.
Detailed Description
The present invention is further illustrated by the following examples, which are not to be construed as limiting the invention.
Example 1. A method for cleaning the surface of copper alloy is characterized by comprising the following steps: comprises the following steps of (a) carrying out,
a. washing the copper alloy with 60 deg.C hot water for 4min to obtain product A;
b. washing product A with 75 deg.C alkali solution for 7 min; the alkali liquor component comprises 50g/L of Na according to concentration3PO4·12H20. 10g/L NaOH and 6.5g/L Na2SiO3Starting the process; obtaining a product B; it should be noted that the alkali liquor is a prepared solution, the total alkalinity of the alkali liquor is controlled to be 1.6-2.5% (the mass fraction of NaOH in the solution), and NaOH is generated by chemical reaction in the process of preparing the solution, so the NaOH value of the total alkalinity is inconsistent with the concentration of NaOH in the components.
c. Washing product B with 60 deg.C flowing hot water for 1.5min to obtain product B1, and washing product B1 with flowing cold water for 1.5min to obtain product C;
d. with HNO at 23 deg.C3Pickling of product C, HNO in solution3The concentration of the solution is 400g/L, and the pickling time is 1.5min, thus obtaining a product D;
e. washing D product with flowing cold water for 1.5min each time to obtain E1 product, and washing E1 product with 60 deg.C hot water for 1.5min each time to obtain E product;
f. performing electrolytic degreasing on the product E at the cathode for 10min, wherein the temperature of electrolyte used for electrolytic degreasing is 70 ℃, and the electrolyte components comprise 40g/L Na3PO4·12H20. 10g/L NaOH, 6.5g/L Na2SiO3And 22.5g/L of Na2CO3To obtain product F;
g. washing product B with 60 deg.C hot water for 1.5min to obtain product B1, and washing product B1 with flowing cold water for 1.5min to obtain product G;
h. cleaning the product G with actinic solution for 1.5min to fade the product G; the temperature of the photochemical solution is 27 ℃, and the components of the photochemical solution comprise 200g/L CrO3And 3.3g/L of H2SO4(ii) a Obtaining an H product;
i. putting the H product into an HCl solution for gloss treatment for 4s, wherein the concentration of the HCl solution is 150 g/L; obtaining a product I;
j. washing product I with cold water for 1.5min to obtain product I1, washing product I1 with 60 deg.C hot water for 1.5min to obtain product J;
k. ultrasonically cleaning J product for 1 time by using acetone solution for 6.5min to obtain K product;
l, ultrasonically cleaning the K product for 2 times by using alcohol, wherein the cleaning time is 6.5min each time to obtain an L product;
and m, drying the L product to obtain the cleaned copper alloy.
Example 2. A method for cleaning the surface of copper alloy is characterized by comprising the following steps: comprises the following steps of (a) carrying out,
a. washing the copper alloy with 70 deg.C hot water for 3min to obtain product A;
b. washing product A with 90 deg.C alkali solution for 6 min; the alkali liquor component comprises 60g/L of Na according to concentration3PO4·12H20. 8g/L NaOH and 10g/L Na2SiO3Starting the process; obtaining a product B;
c. washing product B with 50 deg.C flowing hot water for 2min to obtain product B1, and washing product B1 with flowing cold water for 1min to obtain product C;
d. with HNO at 30 ℃3Pickling of product C, HNO in solution3The concentration of the solution is 300g/L, and the pickling time is 2min, thus obtaining a product D;
e. washing D product with flowing cold water for 1min each time to obtain E1 product, and washing E1 product with 70 deg.C hot water for 1min each time to obtain E product;
f. performing electrolytic degreasing on the product E at cathode for 12min, wherein the temperature of electrolyte used for electrolytic degreasing is 60 deg.C, and the electrolyte components comprise 50g/L Na3PO4·12H20. 5g/L NaOH, 10g/L Na2SiO3And 20g/L of Na2CO3To obtain product F;
g. washing product B with 70 deg.C hot water for 1min each time to obtain product B1, and washing product B1 with flowing cold water for 2min each time to obtain product G;
h. cleaning the product G with actinic solution for 1min to fade the product G; the temperature of the photochemical solution is 30 ℃, and the components of the photochemical solution comprise 100g/L CrO3And 3.5g/L of H2SO4(ii) a Obtaining an H product;
i. putting the product H into an HCl solution for gloss treatment for 3s, wherein the concentration of the HCl solution is 200 g/L; obtaining a product I;
j. washing product I with flowing cold water for 2min each time to obtain product I1, and washing product I1 with 70 deg.C hot water for 1min each time to obtain product J;
k. ultrasonically cleaning the J product for 2 times by using an acetone solution, wherein the cleaning time is 5min each time, and obtaining a K product;
l, ultrasonically cleaning the K product for 1 time by using alcohol, wherein the cleaning time is 8min each time, and obtaining an L product;
and m, drying the L product to obtain the cleaned copper alloy.
Example 3. A method for cleaning the surface of copper alloy is characterized by comprising the following steps: comprises the following steps of (a) carrying out,
a. washing the copper alloy with 50 deg.C hot water for 5min to obtain product A;
b. washing product A with 60-deg.C alkali solution for 8 min; the alkali liquor component comprises 40g/L of Na according to concentration3PO4·12H20. 12g/L NaOH and 3g/L Na2SiO3Starting the process; obtaining a product B;
c. washing product B with 70 deg.C flowing hot water for 1min each time to obtain product B1, and washing product B1 with flowing cold water for 1-2min each time to obtain product C;
d. with HNO at 15 ℃3Pickling of product C, HNO in solution3The concentration of the solution is 500g/L, and the pickling time is 1min, thus obtaining a product D;
e. washing D product with flowing cold water for 2min each time to obtain E1 product, and washing E1 product with 50 deg.C hot water for 2min each time to obtain E product;
f. performing electrolytic degreasing on the product E at the cathode for 8min, wherein the temperature of electrolyte used for electrolytic degreasing is 80 ℃, and the electrolyte components comprise 30g/L of Na3PO4·12H20. 15g/L NaOH, 3g/L Na2SiO3And 25g/L of Na2CO3To obtain product F;
g. washing product B with 50 deg.C hot water for 2min each time to obtain product B1, and washing product B1 with flowing cold water for 1min each time to obtain product G;
h. cleaning the product G with actinic solution for 2min to fade the product G; the temperature of the photochemical solution is 15 ℃, and the components of the photochemical solution comprise 300g/L CrO3And 3g/L of H2SO4(ii) a Obtaining an H product;
i. putting the product H into an HCl solution for gloss treatment for 5s, wherein the concentration of the HCl solution is 100 g/L; obtaining a product I;
j. washing product I with flowing cold water for 1min each time to obtain product I1, and washing product I1 with 50 deg.C hot water for 2min each time to obtain product J;
k. ultrasonically cleaning the J product for 1 time by using an acetone solution, wherein the cleaning time is 8min each time, and obtaining a K product;
l, ultrasonically cleaning the K product for 1 time by using alcohol, wherein the cleaning time is 5min each time to obtain an L product;
and m, drying the L product to obtain the cleaned copper alloy.
The cleaning agent for the copper alloy welding piece has the advantage of good cleaning effect, and can ensure the reliable welding performance of a finished product.
Claims (10)
1. A method for cleaning the surface of copper alloy is characterized by comprising the following steps: comprises the following steps of (a) carrying out,
a. washing the copper alloy with water to obtain a product A;
b. washing product A with 60-90 deg.C alkali solution; the alkali liquor component comprises 40-60g/L of Na according to concentration3PO4·12H20. 8-12g/L NaOH and 3-10g/L Na2SiO3Starting the process; obtaining a product B;
c. washing product B with water to obtain product C;
d. pickling product C to obtain product D;
e. washing product D with water to obtain product E;
f. performing electrolytic degreasing on the product E to obtain a product F;
g. cleaning product F to obtain product G;
h. g, fading to obtain an H product;
i. performing gloss treatment on the product H to obtain a product I;
j. washing the product I with water to obtain product J;
k. cleaning product J with acetone to obtain product K;
l, cleaning the product K with alcohol to obtain a product L;
and m, drying the L product to obtain the cleaned copper alloy.
2. The method for cleaning a copper alloy surface according to claim 1, wherein: step a, washing the copper alloy with hot water at 50-70 ℃ to obtain a product A; in the step b, the product A is placed in alkali liquor for cleaning for 6-8 min.
3. The method for cleaning a copper alloy surface according to claim 1, wherein: and C, washing the product B for multiple times by using hot water at the temperature of 50-70 ℃ to obtain a product B1, and then washing the product B1 for multiple times by using cold water to obtain a product C.
4. The method for cleaning a copper alloy surface according to claim 1, wherein: the step d adopts HNO with the temperature of 15-30 DEG C3Pickling of product C, HNO in solution3The concentration of the solution is 300-500g/L, and the acid washing time is 1-2min, thus obtaining the D product.
5. The method for cleaning a copper alloy surface according to claim 1, wherein: e, washing the product D for multiple times by using cold water to obtain a product E1, and then washing the product E1 for multiple times by using hot water at the temperature of 50-70 ℃ to obtain a product E;
washing the product B with hot water at 50-70 deg.C for several times to obtain product B1, and washing the product B1 with cold water for several times to obtain product G;
and J, washing the product I for multiple times by using cold water to obtain a product I1, and then washing the product I1 for multiple times by using hot water at the temperature of 50-70 ℃ to obtain a product J.
6. The method of claim 1The method for cleaning the surface of the copper alloy is characterized by comprising the following steps: in the step f, the article E is subjected to electrolytic degreasing on the cathode for 8-12min, the temperature of electrolyte for electrolytic degreasing is 60-80 ℃, and the components of the electrolyte comprise 30-50g/L of Na3PO4·12H20. 5-15g/L NaOH, 3-10g/L Na2SiO3And 20-25 g/L of Na2CO3。
7. The method for cleaning a copper alloy surface according to claim 1, wherein: step h, washing the product G for 1-2min by using a photochemical solution to enable the product G to fade; the temperature of the photochemical solution is 15-30 ℃, and the components of the photochemical solution comprise 100-300g/L CrO3And 3-3.5g/L of H2SO4。
8. The method for cleaning a copper alloy surface according to claim 1, wherein: step i, putting the H product in an HCl solution for gloss treatment for 3-5s, wherein the concentration of the HCl solution is 100-; to obtain product I.
9. The method for cleaning a copper alloy surface according to claim 1, wherein: and step K, ultrasonically cleaning the J product for 1-2 times by using an acetone solution, wherein the cleaning time is 5-8min each time, and thus obtaining the K product.
10. The method for cleaning a copper alloy surface according to claim 1, wherein: and step L, ultrasonically cleaning the K product for 1-2 times by using alcohol, wherein the cleaning time is 5-8min each time, and obtaining an L product.
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