CN111155056A - Method for measuring and controlling film thickness and evaporation rate in vacuum coating process - Google Patents
Method for measuring and controlling film thickness and evaporation rate in vacuum coating process Download PDFInfo
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- CN111155056A CN111155056A CN202010056528.6A CN202010056528A CN111155056A CN 111155056 A CN111155056 A CN 111155056A CN 202010056528 A CN202010056528 A CN 202010056528A CN 111155056 A CN111155056 A CN 111155056A
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- 230000008020 evaporation Effects 0.000 title claims abstract description 68
- 238000001704 evaporation Methods 0.000 title claims abstract description 68
- 238000000034 method Methods 0.000 title claims abstract description 44
- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 28
- 238000005259 measurement Methods 0.000 claims abstract description 16
- 239000013078 crystal Substances 0.000 claims abstract description 14
- 238000013528 artificial neural network Methods 0.000 claims abstract description 13
- 239000007888 film coating Substances 0.000 claims abstract description 13
- 238000009501 film coating Methods 0.000 claims abstract description 13
- 238000012544 monitoring process Methods 0.000 claims abstract description 12
- 239000000523 sample Substances 0.000 claims abstract description 10
- 238000012937 correction Methods 0.000 claims abstract description 6
- 230000010355 oscillation Effects 0.000 claims abstract description 4
- 239000010453 quartz Substances 0.000 claims abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000010408 film Substances 0.000 claims description 38
- 238000011161 development Methods 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 8
- 238000000576 coating method Methods 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000004891 communication Methods 0.000 claims description 3
- 238000011478 gradient descent method Methods 0.000 claims description 3
- 210000002569 neuron Anatomy 0.000 claims description 3
- 239000010409 thin film Substances 0.000 claims description 3
- 238000012549 training Methods 0.000 claims description 3
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B11/00—Automatic controllers
- G05B11/01—Automatic controllers electric
- G05B11/36—Automatic controllers electric with provision for obtaining particular characteristics, e.g. proportional, integral, differential
- G05B11/42—Automatic controllers electric with provision for obtaining particular characteristics, e.g. proportional, integral, differential for obtaining a characteristic which is both proportional and time-dependent, e.g. P. I., P. I. D.
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- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a method for measuring and controlling the thickness and the evaporation rate of a film in a vacuum coating process, which is used for building a monitoring system and carrying out online monitoring, wherein the online monitoring comprises the following specific steps: (1) starting a measurement and control system, inputting RBF network and PID parameter initial data, (2) starting vacuum coating equipment, (3) measuring the resonance frequency of quartz crystal oscillation of an additional mass load by using a crystal probe sensor, determining the quality of a deposited film through the change of the resonance frequency, and then calculating the evaporation rate v and the real-time film thickness value h; (4) when the evaporation rate deviates, the control power is timely adjusted through a RBF neural network self-correction PID control algorithm to maintain the stability of the evaporation rate. The invention can monitor the thickness and the evaporation rate of the film in real time and control the stability of the rate, and workers can know the working condition in real time by observing the numerical value display and the change condition of the parameters in the film coating process so as to ensure the film coating quality and the safety in the film coating process.
Description
Technical Field
The invention relates to a method for measuring and controlling the thickness and the evaporation rate of a film in a vacuum coating process, in particular to a method for measuring and controlling the thickness and the evaporation rate of a film in a resistance heating type vacuum coating process, and belongs to the technical field of vacuum coating.
Background
The resistance heating type vacuum coating has simple structure, convenient use and easy operation, and is the most widely applied coating mode; wherein the thickness of the thin film is one of the key parameters affecting the film properties and its use; the macroscopic performance of the film and the microstructure thereof are related to the evaporation rate of an evaporation source in the film coating process in addition to the deposition material and the thickness; therefore, in order to prepare a film with the characteristics meeting the process requirements, it is important to measure and control the thickness and the evaporation rate of the film.
Disclosure of Invention
In order to solve the problems, the invention provides a film thickness and evaporation rate measurement and control method in a vacuum coating process.
According to the method for measuring and controlling the thickness and the evaporation rate of the film in the vacuum coating process, the values of the evaporation rate and the real-time film thickness are calculated by utilizing the resonance frequency information received by the sensor acquisition card; when the deviation of the evaporation rate is detected, the control power is timely adjusted through an RBF neural network self-correction PID control algorithm to maintain the stability of the evaporation rate; and finally, designing a vacuum coating monitoring interface by using Qt software under a Linux system, wherein the interface can dynamically display the numerical values and the change conditions of the evaporation rate, the real-time film thickness and the control power and the sensor information in the evaporation process in real time.
The invention aims to solve the technical problem of providing a method for measuring and controlling the thickness and the evaporation rate of a film in a vacuum coating process, which comprises the following steps:
firstly, building a measurement and control system, wherein the measurement and control system comprises an OKMX6UL-C development board; the system comprises a touch screen, a 0-10V output DA module, an 8-path relay output/8-path switching value input interface and a sensor acquisition card, wherein the touch screen is communicated with an OKMX6UL-C development board, the 0-10V output DA module is communicated with the OKMX6UL-C development board through an RS232 serial port, and the sensor acquisition card is communicated with the OKMX6UL-C development board through an SPI interface; the sensor acquisition card is in communication connection with the crystal probe sensor; the 0-10V output DA module and the 8-path relay output/8-path switching value input interface are connected to a vacuum coating control system;
the measurement and control system also comprises an operation interface which is constructed by Qt software under a Linux system and is used for dynamically displaying the numerical values and the change conditions of the evaporation rate, the film thickness and the control power and the sensor information in the evaporation process in real time;
and secondly, carrying out online monitoring, wherein the online monitoring specifically comprises the following steps:
(1) starting the measurement and control system, inputting system initial data, and setting an initial value w of RBF network parametersj(0)、bj(0)、cji(0) The method also comprises the number m of neurons in the hidden layer, the learning rate η and the momentum term factor α, and sets the initial value of PID parameters and the training parameters thereof, namely Kp(0)、Ki(0)、Kd(0) Learning rate ηcAnd momentum term factor αc；
(2) Opening a vacuum coating device, adjusting control power to heat and dissolve the film material in the crucible until the film material is evaporated, opening an evaporation source baffle when the evaporation rate reaches a set value, starting a crystal probe sensor, and formally starting coating;
(3) measuring the resonant frequency of quartz crystal oscillation with additional mass load by using a crystal probe sensor, determining the mass of a deposited film through the change of the resonant frequency, and then calculating the evaporation rate v and the numerical value h of the real-time film thickness;
(4) when the evaporation rate deviates, the control power is timely adjusted through a RBF neural network self-correction PID control algorithm to maintain the stability of the evaporation rate.
(5) When the film thickness reaches a set value, the evaporation source baffle is closed, the power is controlled to idle, and the next film coating or the film coating is finished is waited.
Further, the self-correcting PID control algorithm of the RBF neural network is specifically as follows:
(1) according to the set evaporation rate vr(k) Calculating the deviation e (k) between the set value and the actual value of the evaporation rate, and calculating the numerical value u (k) of the control power by using an incremental PID control algorithm;
(2) calculating the output v of the RBF neural networkm(k) Calculating the adjusting value delta K of the PID control parameter by adopting a gradient descent methodp(k)、ΔKi(k)、ΔKd(k) Updating the control parameter K of the PID controllerp(k)、Ki(k)、Kd(k)；
(3) Calculating and returning network parameters wj(k)、bj(k)、cji(k)；
(4) Returning to Step1(k → k +1), the cycle continues until the deviation between the set value and the actual value of the evaporation rate is 0.
Compared with the prior art, the film thickness and evaporation rate measurement and control method in the vacuum coating process can monitor the evaporation rate and the numerical change of the film thickness in real time; when the deviation of the evaporation rate is detected, the control power can be timely adjusted through a self-correcting control algorithm to maintain the stability of the evaporation rate and ensure the safety of the coating quality in the coating process; the monitoring interface can dynamically display the numerical values and the change conditions of the evaporation rate, the film thickness and the control power in the evaporation process and the sensor information in real time, so that the smooth operation of vacuum coating is ensured.
Drawings
FIG. 1 is a schematic view of the connection of a device for measuring and controlling the thickness of a film and the evaporation rate in a vacuum coating process.
FIG. 2 is a schematic view of a vacuum coating operation.
FIG. 3 is a schematic diagram of a PID self-correction control algorithm of an RBF neural network.
FIG. 4 is a schematic view of a data flow in a vacuum coating process.
Fig. 5 is a schematic diagram of a main interface of the measurement and control system.
Detailed Description
Example 1:
as shown in fig. 1 to 5, the method for measuring and controlling the thickness and the evaporation rate of a thin film in a vacuum coating process of the present invention specifically comprises the following steps:
firstly, building a measurement and control system, wherein the measurement and control system comprises an OKMX6UL-C development board; the system comprises a touch screen, a 0-10V output DA module, an 8-path relay output/8-path switching value input interface and a sensor acquisition card, wherein the touch screen is communicated with an OKMX6UL-C development board, the 0-10V output DA module is communicated with the OKMX6UL-C development board through an RS232 serial port, and the sensor acquisition card is communicated with the OKMX6UL-C development board through an SPI interface; the sensor acquisition card is in communication connection with the crystal probe sensor; the 0-10V output DA module and the 8-path relay output/8-path switching value input interface are connected to a vacuum coating control system;
the measurement and control system also comprises an operation interface which is constructed by Qt software under a Linux system and is used for dynamically displaying the numerical values and the change conditions of the evaporation rate, the film thickness and the control power and the sensor information in the evaporation process in real time;
and secondly, carrying out online monitoring, wherein the online monitoring specifically comprises the following steps:
(1) starting the measurement and control system, inputting system initial data, and setting an initial value w of RBF network parametersj(0)、bj(0)、cji(0) The method also comprises the number m of neurons in the hidden layer, the learning rate η and the momentum term factor α, and sets the initial value of PID parameters and the training parameters thereof, namely Kp(0)、Ki(0)、Kd(0) Learning rate ηcAnd momentum term factor αc；
(2) Opening a vacuum coating device, adjusting control power to heat and dissolve the film material in the crucible until the film material is evaporated, opening an evaporation source baffle when the evaporation rate reaches a set value, starting a crystal probe sensor, and formally starting coating;
(3) measuring the resonant frequency of quartz crystal oscillation with additional mass load by using a crystal probe sensor, determining the mass of a deposited film through the change of the resonant frequency, and then calculating the evaporation rate v and the numerical value h of the real-time film thickness;
(4) when the evaporation rate deviates, the control power is timely adjusted through a RBF neural network self-correction PID control algorithm to maintain the stability of the evaporation rate.
(5) When the film thickness reaches a set value, the evaporation source baffle is closed, the power is controlled to idle, and the next film coating or the film coating is finished is waited.
Further, the self-correcting PID control algorithm of the RBF neural network is specifically as follows:
(1) according to the set evaporation rate vr(k) Calculating the deviation e (k) between the set value and the actual value of the evaporation rate, and calculating the numerical value u (k) of the control power by using an incremental PID control algorithm;
(2) calculating the output v of the RBF neural networkm(k) Calculating the adjusting value delta K of the PID control parameter by adopting a gradient descent methodp(k)、ΔKi(k)、ΔKd(k) Updating the control parameter K of the PID controllerp(k)、Ki(k)、Kd(k)；
(3) Calculating and returning network parameters wj(k)、bj(k)、cji(k)；
(4) Returning to Step1(k → k +1), the cycle continues until the deviation between the set value and the actual value of the evaporation rate is 0.
The method for measuring and controlling the thickness and the evaporation rate of the film in the vacuum coating process can realize the following three functions through a simple measuring and controlling system: (1) in the vacuum coating process, measuring the evaporation rate of the deposition material in real time, and detecting the thickness of the film; (2) when the evaporation rate deviates, adjusting the control power in time through an RBF neural network self-correcting PID control algorithm to maintain the stability of the evaporation rate; (3) the evaporation rate, the real-time film thickness and the control power can be dynamically displayed on a monitoring interface in a line graph mode; the working condition can be known in real time by observing the numerical value display and the change condition of the parameters in the film coating process by a worker so as to ensure the film coating quality and the safety in the film coating process.
The above-described embodiments are merely preferred embodiments of the present invention, and all equivalent changes or modifications of the structures, features and principles described in the claims of the present invention are included in the scope of the present invention.
Claims (2)
1. A method for measuring and controlling the thickness and the evaporation rate of a film in a vacuum coating process is characterized by comprising the following steps: the method specifically comprises the following steps:
firstly, building a measurement and control system, wherein the measurement and control system comprises an OKMX6UL-C development board; the system comprises a touch screen, a 0-10V output DA module, an 8-path relay output/8-path switching value input interface and a sensor acquisition card, wherein the touch screen is communicated with an OKMX6UL-C development board, the 0-10V output DA module is communicated with the OKMX6UL-C development board through an RS232 serial port, and the sensor acquisition card is communicated with the OKMX6UL-C development board through an SPI interface; the sensor acquisition card is in communication connection with the crystal probe sensor; the 0-10V output DA module and the 8-path relay output/8-path switching value input interface are connected to a vacuum coating control system;
the measurement and control system also comprises an operation interface which is constructed by Qt software under a Linux system and is used for dynamically displaying the numerical values and the change conditions of the evaporation rate, the film thickness and the control power and the sensor information in the evaporation process in real time;
and secondly, carrying out online monitoring, wherein the online monitoring specifically comprises the following steps:
(1) starting the measurement and control system, inputting system initial data, and setting an initial value w of RBF network parametersj(0)、bj(0)、cji(0) The method also comprises the number m of neurons in the hidden layer, the learning rate η and the momentum term factor α, and sets the initial value of PID parameters and the training parameters thereof, namely Kp(0)、Ki(0)、Kd(0) Learning rate ηcAnd momentum term factor αc；
(2) Opening a vacuum coating device, adjusting control power to heat and dissolve the film material in the crucible until the film material is evaporated, opening an evaporation source baffle when the evaporation rate reaches a set value, starting a crystal probe sensor, and formally starting coating;
(3) measuring the resonant frequency of quartz crystal oscillation with additional mass load by using a crystal probe sensor, determining the mass of a deposited film through the change of the resonant frequency, and then calculating the evaporation rate v and the numerical value h of the real-time film thickness;
(4) when the evaporation rate deviates, the control power is timely adjusted through a RBF neural network self-correction PID control algorithm to maintain the stability of the evaporation rate.
(5) When the film thickness reaches a set value, the evaporation source baffle is closed, the power is controlled to idle, and the next film coating or the film coating is finished is waited.
2. The method for measuring and controlling the thickness and the evaporation rate of a thin film in the vacuum coating process according to claim 1, wherein: the RBF neural network self-correcting PID control algorithm is specifically as follows:
(1) according to the set evaporation rate vr(k) Calculating the deviation e (k) between the set value and the actual value of the evaporation rate, and calculating the numerical value u (k) of the control power by using an incremental PID control algorithm;
(2) calculating the output v of the RBF neural networkm(k) Calculating the adjusting value delta K of the PID control parameter by adopting a gradient descent methodp(k)、ΔKi(k)、ΔKd(k) Updating the control parameter K of the PID controllerp(k)、Ki(k)、Kd(k)；
(3) Calculating and returning network parameters wj(k)、bj(k)、cji(k)；
(4) Returning to Step1(k → k +1), the cycle continues until the deviation between the set value and the actual value of the evaporation rate is 0.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114921758A (en) * | 2022-06-30 | 2022-08-19 | 华能新能源股份有限公司 | Evaporation coating method and evaporation coating equipment |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN114921758A (en) * | 2022-06-30 | 2022-08-19 | 华能新能源股份有限公司 | Evaporation coating method and evaporation coating equipment |
| CN114921758B (en) * | 2022-06-30 | 2023-07-28 | 华能新能源股份有限公司 | Evaporation coating method and evaporation coating equipment |
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