CN111146367A - Preparation method of light extraction film with micro-nano composite structure - Google Patents

Preparation method of light extraction film with micro-nano composite structure Download PDF

Info

Publication number
CN111146367A
CN111146367A CN202010062209.6A CN202010062209A CN111146367A CN 111146367 A CN111146367 A CN 111146367A CN 202010062209 A CN202010062209 A CN 202010062209A CN 111146367 A CN111146367 A CN 111146367A
Authority
CN
China
Prior art keywords
micro
nano composite
pattern
light extraction
composite structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN202010062209.6A
Other languages
Chinese (zh)
Other versions
CN111146367B (en
Inventor
周雄图
赖晓聪
郭太良
张永爱
吴朝兴
林志贤
严群
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuzhou University
Original Assignee
Fuzhou University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuzhou University filed Critical Fuzhou University
Priority to CN202010062209.6A priority Critical patent/CN111146367B/en
Publication of CN111146367A publication Critical patent/CN111146367A/en
Application granted granted Critical
Publication of CN111146367B publication Critical patent/CN111146367B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/85Arrangements for extracting light from the devices

Abstract

The invention relates to a preparation method of a light extraction film with a micro-nano composite structure, which comprises the following steps: step S1: preparing a PDMS template with an ordered micron structure by adopting a soft printing method; step S2: stretching the PDMS template with the ordered microstructure, carrying out plasma treatment, obtaining nano patterns with different shapes and sizes on the PDMS template with the microstructure, and forming PDMS micro-nano composite patterns with the opposite micro-nano composite structure to the required micro-nano composite structure; step S3: and transferring the PDMS micro-nano composite pattern to a required polymer to obtain the light extraction film. The invention has high manufacturing efficiency and low cost, and the prepared light extraction film is nested in the disordered nano structure in the ordered micro structure pattern, can avoid the light loss of the device substrate and the air interface, and has stronger light extraction effect while not changing the visual angle characteristic of the OLED device.

Description

Preparation method of light extraction film with micro-nano composite structure
Technical Field
The invention relates to the technical field of photoelectric display, in particular to a preparation method of a light extraction film with a micro-nano composite structure.
Background
Organic Light Emitting Diodes (OLEDs) are widely used in displays of mobile phones and televisions, however, external quantum efficiency of the OLEDs is about 20% due to losses generated by a surface plasmon resonance mode at a metal-organic interface, a waveguide mode in an Indium Tin Oxide (ITO)/organic layer, a substrate mode in a glass substrate, and the like.
Since the refractive index between the ITO/glass interface and the glass/air interface is small, the optical loss in the substrate mode is larger than that in the waveguide mode, and thus, adding a light extraction layer at the glass/air interface can greatly increase the light emitting efficiency of the OLED.
Conventional single periodic microstructure light extraction films tend to alter the spectral characteristics and angular distribution of the device.
Disclosure of Invention
In view of the above, the present invention provides a method for preparing a light extraction film with a micro-nano composite structure, which can avoid light loss at an interface between a device substrate and air, and has a strong light extraction effect without changing a viewing angle characteristic of an OLED device.
The invention is realized by adopting the following scheme: a preparation method of a light extraction film with a micro-nano composite structure comprises a substrate, a periodic microstructure applied on the substrate, and a nano structure applied on the microstructure; the preparation of the light extraction film comprises the following steps:
step S1: preparing a PDMS template with an ordered micron structure by adopting a soft printing method;
step S2: stretching the PDMS template with the ordered microstructure in a single direction or multiple directions simultaneously, carrying out plasma treatment, and obtaining nano patterns with different shapes and sizes on the PDMS template with the microstructure to form PDMS micro-nano composite patterns; the nano-structure pattern is controlled by regulating and controlling the stretching direction, so that the extraction efficiency of light in different directions is controlled;
step S3: transferring the PDMS micro-nano composite pattern to a required polymer to form a micro-nano composite pattern with a structure opposite to that of the required micro-nano composite structure;
step S4: and (4) taking the micro-nano composite pattern which is obtained in the step (S3) and is opposite to the required micro-nano composite structure as a template, and copying the light extraction film with the required micro-nano composite structure once or for multiple times so as to improve the preparation efficiency.
Further, step S1 specifically includes the following steps:
step S11: preparing a micron pattern on a clean substrate, annealing the micron pattern, improving the bonding force between the pattern and the substrate, and forming a micron pattern master mask;
step S12: performing surface modification on the micron pattern master mask by adopting trimethylchlorosilane;
step S13: uniformly mixing polydimethylsiloxane monomers and a cross-linking agent according to a preset proportion by adopting a soft printing method, vacuumizing to remove bubbles, uniformly spin-coating on a micro-pattern mother plate, standing, heating for curing, and stripping to obtain a polydimethylsiloxane micro-structure opposite to the micro-pattern mother plate, namely the PDMS template with the ordered micro-structure.
Further, step S3 specifically includes the following steps:
step S31: placing the PDMS template with the PDMS micro-nano composite pattern obtained in the step S3 in vacuum to remove gas in the polydimethylsiloxane, and forming negative pressure;
step S32: uniformly coating ultraviolet curing glue on the substrate, placing the PDMS template with the negative pressure treated in the step S31 on the ultraviolet curing glue on the side with the pattern, standing for a period of time under the action of the negative pressure and gravity, and stripping the PDMS template after ultraviolet exposure to obtain the UV glue micro-nano composite pattern with the opposite micro-nano composite structure to the required micro-nano composite structure.
Further, in step S4, the replicating the required micro-nano composite structure light extraction film specifically includes the following steps:
step S41: uniformly mixing PDMS monomers and a cross-linking agent according to a preset proportion, and vacuumizing to remove bubbles;
step S42: and (4) uniformly spin-coating the mixture of the PDMS monomer and the cross-linking agent on the micrometer pattern which is obtained in the step S3 and is opposite to the required micro-nano composite structure, standing for a period of time, blowing off surface bubbles with gas, heating and curing, and stripping to obtain the PDMS micro-nano composite structure light extraction film.
Further, in step S11, the micro pattern is prepared by a method including, but not limited to, photoresist melting, laser etching, screen printing, inkjet printing, or a combination thereof, and the micro pattern is periodically one-dimensional or two-dimensional.
Further, in step S13, the ratio of the polydimethylsiloxane monomer to the cross-linking agent is 100:1 to 1: 1.
Further, in step S2, the stretching degree is 0% to 500%.
Further, in step S2, the reactive ion etching power of the plasma treatment is 50-250W, the reactive ion etching time is 40-240S, the reactive ion etching flow rate is 10-60 sccm, the reactive ion etching pressure is 1-10 pa, and the reactive ion etching gas includes, but is not limited to, oxygen, argon or a mixed gas.
Compared with the prior art, the invention has the following beneficial effects:
1. the light extraction film prepared by the method is embedded with the disordered nano structure in the ordered micro structure pattern, can avoid the light loss of the device substrate and the air interface, and has stronger light extraction effect while the visual angle characteristic of the OLED device is not changed.
2. The invention controls the nanostructure pattern by regulating the stretching direction, thereby controlling the extraction efficiency of light in different directions.
3. The invention takes the obtained micro-nano composite pattern with the opposite structure to the required micro-nano composite structure as a template, and can obtain the required light extraction film by adopting a simple copying method subsequently, thereby having high manufacturing efficiency and low cost.
Drawings
FIG. 1 shows a process for forming a photoresist master in accordance with an embodiment of the present invention. Wherein (a) is a photoresist spin coating process, (b) is a photoresist patterning process, and (c) is a photoresist micron-scale patterning process.
Fig. 2 is a process of preparing a PDMS soft mold with a master in an embodiment of the present invention. The method comprises the following steps of (a) a process for filling a photoresist master plate by PDMS spin coating, (b) a process for curing and demolding the PDMS, (c) a process for etching reactive ions after PDMS is prestretched, and (d) a schematic diagram for forming a micro-nano composite structure by the PDMS.
Fig. 3 is a process flow of imprinting and preparing a micro-nano composite structure according to an embodiment of the invention. The method comprises the following steps of (a) carrying out ultraviolet curing glue spin coating, (b) carrying out a process of impressing ultraviolet curing glue to form a micro-nano composite structure, and (c) carrying out ultraviolet curing glue demoulding.
Fig. 4 is a scanning electron microscope image of the micro-nano composite structure in the embodiment of the invention.
In the figure, 1 is a substrate, 2 is photoresist, 3 is PDMS, 4 is reactive ion etching gas, 5 is ultraviolet curing glue, and 6 is a ultraviolet curing lamp.
Detailed Description
The invention is further explained below with reference to the drawings and the embodiments.
It should be noted that the following detailed description is exemplary and is intended to provide further explanation of the disclosure. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs.
It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of example embodiments according to the present application. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, and it should be understood that when the terms "comprises" and/or "comprising" are used in this specification, they specify the presence of stated features, steps, operations, devices, components, and/or combinations thereof, unless the context clearly indicates otherwise.
As shown in fig. 1 to fig. 3, the present embodiment provides a method for preparing a light extraction film with a micro-nano composite structure, where the light extraction film includes a substrate, a periodic microstructure applied on the substrate, and a nanostructure applied on the microstructure; the preparation of the light extraction film comprises the following steps:
step S1: preparing a PDMS template with an ordered micron structure by adopting a soft printing method;
step S11: as shown in fig. 1, the surface of a substrate is ultrasonically cleaned by acetone, ethanol and deionized water, nitrogen is used for blow-drying, a micron pattern is prepared on a clean substrate, 90-degree annealing is carried out on the micron pattern, the bonding force between the pattern and the substrate is improved, and a micron pattern mother plate is formed;
step S12: as shown in (a) and (b) in fig. 2, performing surface modification on the micro pattern master plate by using trimethylchlorosilane;
step S13: and (2) coating PDMS on the mother plate in a spin mode by adopting a soft printing method, uniformly mixing polydimethylsiloxane monomers and a cross-linking agent in a ratio of 10:1, vacuumizing to remove bubbles, uniformly coating the PDMS on the micro-pattern mother plate in a spin mode at 500rpm for 60s, standing for 5min, heating and curing for 2h at 80 ℃, and stripping to obtain a polydimethylsiloxane micro-structure opposite to the micro-pattern mother plate, namely the PDMS template with the ordered micro-structure.
Step S2: as shown in (c) and (d) of fig. 2, the PDMS template with the ordered microstructure is stretched in a single direction or in multiple directions simultaneously, and plasma treatment is performed to obtain nano patterns with different shapes and sizes on the PDMS template with the microstructure, so as to form a PDMS micro-nano composite pattern with a structure opposite to the required micro-nano composite structure; the nano-structure pattern is controlled by regulating and controlling the stretching direction, so that the extraction efficiency of light in different directions is controlled;
step S3: transferring the PDMS micro-nano composite pattern to a required polymer to form a micro-nano composite pattern with a structure opposite to that of the required micro-nano composite structure;
step S4: and (4) taking the micro-nano composite pattern which is obtained in the step (S3) and is opposite to the required micro-nano composite structure as a template, and copying the light extraction film with the required micro-nano composite structure once or for multiple times so as to improve the preparation efficiency.
In this embodiment, step S3 specifically includes the following steps:
step S31: placing the PDMS template with the PDMS micro-nano composite pattern obtained in the step S3 in vacuum to remove gas in the polydimethylsiloxane, and forming negative pressure;
step S32: as shown in fig. 3, spin-coating an ultraviolet curing adhesive on a glass substrate at a rotating speed of 3000rpm for 40s, placing the patterned surface on the ultraviolet curing adhesive, standing for 5-10min under the action of polydimethylsiloxane negative pressure and gravity, exposing under an ultraviolet lamp for 20min, and stripping the polydimethylsiloxane to obtain the UV adhesive micro-nano composite pattern with the opposite micro-nano composite structure.
In step S4, the method for replicating the required micro-nano composite structure light extraction film specifically includes the following steps:
step S41: uniformly mixing PDMS monomers and a cross-linking agent according to a preset proportion, and vacuumizing to remove bubbles;
step S42: and (4) uniformly spin-coating the mixture of the PDMS monomer and the cross-linking agent on the micrometer pattern which is obtained in the step S3 and is opposite to the required micro-nano composite structure, standing for a period of time, blowing off surface bubbles with gas, heating and curing, and stripping to obtain the PDMS micro-nano composite structure light extraction film.
In this embodiment, in step S11, the micro pattern is prepared by a method including, but not limited to, photoresist melting, laser etching, screen printing, inkjet printing, or a combination thereof, and the micro pattern is periodically one-dimensional or two-dimensional.
In this embodiment, in step S13, the ratio of the polydimethylsiloxane monomer to the cross-linking agent is 100:1 to 1: 1.
In the present embodiment, in step S2, the stretching degree is 0% to 500%.
In this embodiment, in step S2, the reactive ion etching power of the plasma processing is 50-250W, the reactive ion etching time is 40-240S, the reactive ion etching flow rate is 10-60 sccm, the reactive ion etching pressure is 1-10 pa, and the reactive ion etching gas includes, but is not limited to, oxygen, argon, or a mixed gas.
Preferably, the light extraction film prepared in this embodiment may be disposed inside the light emitting device or disposed outside the light emitting device by using the refractive index matching fluid. Fig. 4 is a scanning electron microscope image of the micro-nano composite structure light extraction film prepared by the method of the embodiment.
The foregoing is directed to preferred embodiments of the present invention, other and further embodiments of the invention may be devised without departing from the basic scope thereof, and the scope thereof is determined by the claims that follow. However, any simple modification, equivalent change and modification of the above embodiments according to the technical essence of the present invention are within the protection scope of the technical solution of the present invention.

Claims (8)

1. A preparation method of a light extraction film with a micro-nano composite structure is characterized in that the light extraction film comprises a substrate, a periodic microstructure applied on the substrate and a nano structure applied on the microstructure; the preparation of the light extraction film comprises the following steps:
step S1: preparing a PDMS template with an ordered micron structure by adopting a soft printing method;
step S2: the method comprises the following steps of simultaneously stretching a PDMS template with an ordered microstructure in a single direction or multiple directions, carrying out plasma treatment, obtaining nano patterns with different shapes and sizes on the PDMS template with the microstructure to form PDMS micro-nano composite patterns, and controlling the nano-structure patterns by regulating and controlling the stretching direction so as to control the extraction efficiency of light in different directions;
step S3: transferring the PDMS micro-nano composite pattern to a required polymer to form a micro-nano composite pattern with a structure opposite to that of the required micro-nano composite structure;
step S4: and (4) taking the micro-nano composite pattern which is obtained in the step (S3) and is opposite to the required micro-nano composite structure as a template, and copying the light extraction film with the required micro-nano composite structure once or for multiple times so as to improve the preparation efficiency.
2. The preparation method of the light extraction film with the micro-nano composite structure according to claim 1, wherein the step S1 specifically comprises the following steps:
step S11: preparing a micron pattern on a clean substrate, annealing the micron pattern, improving the bonding force between the pattern and the substrate, and forming a micron pattern master mask;
step S12: performing surface modification on the micron pattern master mask by adopting trimethylchlorosilane;
step S13: uniformly mixing polydimethylsiloxane monomers and a cross-linking agent according to a preset proportion by adopting a soft printing method, vacuumizing to remove bubbles, uniformly spin-coating on a micro-pattern mother plate, standing, heating for curing, and stripping to obtain a polydimethylsiloxane micro-structure opposite to the micro-pattern mother plate, namely the PDMS template with the ordered micro-structure.
3. The preparation method of the light extraction film with the micro-nano composite structure according to claim 1, wherein the step S3 specifically comprises the following steps:
step S31: placing the PDMS template with the PDMS micro-nano composite pattern obtained in the step S3 in vacuum to remove gas in the polydimethylsiloxane, and forming negative pressure;
step S32: uniformly coating ultraviolet curing glue on the substrate, placing the PDMS template with the negative pressure treated in the step S31 on the ultraviolet curing glue on the side with the pattern, standing for a period of time under the action of the negative pressure and gravity, and stripping the PDMS template after ultraviolet exposure to obtain the UV glue micro-nano composite pattern with the opposite micro-nano composite structure to the required micro-nano composite structure.
4. The method for preparing a light extraction film with a micro-nano composite structure according to claim 1, wherein in step S4, the replication of the light extraction film with the required micro-nano composite structure specifically comprises the following steps:
step S41: uniformly mixing PDMS monomers and a cross-linking agent according to a preset proportion, and vacuumizing to remove bubbles;
step S42: and (4) uniformly spin-coating the mixture of the PDMS monomer and the cross-linking agent on the micrometer pattern which is obtained in the step S3 and is opposite to the required micro-nano composite structure, standing for a period of time, blowing off surface bubbles with gas, heating and curing, and stripping to obtain the PDMS micro-nano composite structure light extraction film.
5. The method for preparing a light extraction film with a micro-nano composite structure according to claim 2, wherein in step S11, the micro pattern is prepared by a method including but not limited to photoresist melting, laser etching, screen printing, inkjet printing, or a combination thereof, and the micro pattern periodicity is one-dimensional or two-dimensional.
6. The preparation method of the light extraction film with the micro-nano composite structure according to claim 2, wherein in step S13, the ratio of the polydimethylsiloxane monomer to the cross-linking agent is 100: 1-1: 1.
7. The method for preparing a light extraction film with a micro-nano composite structure according to claim 1, wherein in the step S2, the stretching degree is 0% -500%.
8. The method for preparing a light extraction film with a micro-nano composite structure according to claim 1, wherein in step S2, the reactive ion etching power of the plasma treatment is 50-250W, the reactive ion etching time is 40-240S, the reactive ion etching flow rate is 10-60 sccm, the reactive ion etching pressure is 1-10 pa, and the reactive ion etching gas includes but is not limited to oxygen, argon or mixed gas.
CN202010062209.6A 2020-01-20 2020-01-20 Preparation method of light extraction film with micro-nano composite structure Active CN111146367B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010062209.6A CN111146367B (en) 2020-01-20 2020-01-20 Preparation method of light extraction film with micro-nano composite structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010062209.6A CN111146367B (en) 2020-01-20 2020-01-20 Preparation method of light extraction film with micro-nano composite structure

Publications (2)

Publication Number Publication Date
CN111146367A true CN111146367A (en) 2020-05-12
CN111146367B CN111146367B (en) 2021-03-30

Family

ID=70526225

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010062209.6A Active CN111146367B (en) 2020-01-20 2020-01-20 Preparation method of light extraction film with micro-nano composite structure

Country Status (1)

Country Link
CN (1) CN111146367B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112768621A (en) * 2021-01-27 2021-05-07 福州大学 Integrated cycle micro-concave mirror composite light extraction structure

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1862379A (en) * 2006-04-18 2006-11-15 清华大学 Method for making polymer self-supporting nano-micron-line
JP4147247B2 (en) * 2005-01-21 2008-09-10 旭化成株式会社 Method for reducing pitch of fine concavo-convex lattice and fine concavo-convex lattice member obtained thereby
US20170217082A1 (en) * 2016-02-02 2017-08-03 Sourabh Kumar Saha Method to suppress period doubling during manufacture of micro and nano scale wrinkled structures
CN107275439A (en) * 2017-06-01 2017-10-20 西南交通大学 A kind of manufacture method of " I " type structure PDMS matrixes based on reverse

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4147247B2 (en) * 2005-01-21 2008-09-10 旭化成株式会社 Method for reducing pitch of fine concavo-convex lattice and fine concavo-convex lattice member obtained thereby
CN1862379A (en) * 2006-04-18 2006-11-15 清华大学 Method for making polymer self-supporting nano-micron-line
US20170217082A1 (en) * 2016-02-02 2017-08-03 Sourabh Kumar Saha Method to suppress period doubling during manufacture of micro and nano scale wrinkled structures
CN107275439A (en) * 2017-06-01 2017-10-20 西南交通大学 A kind of manufacture method of " I " type structure PDMS matrixes based on reverse

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
孟彦成: ""PDMS薄膜基柔性微纳结构的制备及其应用研究"", 《中国博士学位论文全文数据库 工程科技Ⅰ辑》 *
田闯: ""基于PDMS皱纹模板的贴花转印术的表面图案化"", 《中国优秀硕士学位论文全文数据库 工程科技Ⅰ辑》 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112768621A (en) * 2021-01-27 2021-05-07 福州大学 Integrated cycle micro-concave mirror composite light extraction structure
CN112768621B (en) * 2021-01-27 2022-03-08 福州大学 Integrated cycle micro-concave mirror composite light extraction structure

Also Published As

Publication number Publication date
CN111146367B (en) 2021-03-30

Similar Documents

Publication Publication Date Title
JP6367226B2 (en) Patterned structured transfer tape
US20160059473A1 (en) Method for Producing Patterned Materials
Byeon et al. Recent progress in direct patterning technologies based on nano-imprint lithography
CN101918896B (en) Composition for mold sheet and method for preparing mold sheet using same
KR100843552B1 (en) Nano electrode line manufacturing method using nano imprint lithography
JP2005515617A (en) Replicated patterned structure using non-stick mold
CN105706242A (en) Nanostructures for OLED devices
JP2015530284A (en) Structured laminated transfer film and method
CN102791452A (en) Resin mold
KR101145867B1 (en) Method of forming nanostructures on a substrate by direct transfer of nanostructure with Spin-on glass
Han et al. Fabrication of 3D nano-structures using reverse imprint lithography
JP2007245702A (en) Method for manufacturing template and processed base material having transfer fine pattern
KR101176885B1 (en) Organic Light Emission Device Comprising the Nanostructure Planarizated and Method for Preparing the Same
Lan Soft UV nanoimprint lithography and its applications
CN101823690A (en) Manufacturing method of SU-8 nano fluid system
US20160168712A1 (en) Chemical compound being used for forming a random wrinkle structure, composition containing the compound, film having the structure, method of forming the film, and oled comprising the film
CN111146367B (en) Preparation method of light extraction film with micro-nano composite structure
KR101064900B1 (en) Method of forming pattern
KR20100074434A (en) Pattern transfer method of nanoimprint lithography using shadow evaportation and nanotransfer printing
KR101291727B1 (en) Method for manufacturing implint resin and implinting method
Takei Ultraviolet nano imprint lithography using fluorinated silicon-based resist materials
KR20190142327A (en) Nanoimprint Lithography Process and Patterned Substrate Obtainable from the
Okabe et al. Polyimide moth-eye nanostructures formed by oxygen ion beam etching for anti-reflection layers
KR20120020012A (en) Organic-inorganic hybrid material and stamp for nanoimprint manufactured from the same
CN111153379A (en) Method for manufacturing size-controllable nanochannel through angle deposition film

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant