CN111146123B - Liquid collection device, developing/etching machine and developing/etching method - Google Patents

Liquid collection device, developing/etching machine and developing/etching method Download PDF

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Publication number
CN111146123B
CN111146123B CN201911371431.8A CN201911371431A CN111146123B CN 111146123 B CN111146123 B CN 111146123B CN 201911371431 A CN201911371431 A CN 201911371431A CN 111146123 B CN111146123 B CN 111146123B
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annular
annular baffle
liquid
baffle
outer edge
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CN111146123A (en
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简永幸
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Xiamen Tongfu Microelectronics Co ltd
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Xiamen Tongfu Microelectronics Co ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67063Apparatus for fluid treatment for etching
    • H01L21/67075Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/3092Recovery of material; Waste processing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • ing And Chemical Polishing (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

The application discloses liquid collection device, development/sculpture board and development/sculpture method, this liquid collection device includes: collecting tank; an annular shield disposed in the collection tank to divide the collection tank into separate inner and outer chambers; the inner chamber is used for accommodating a bearing platform, and the bearing platform is used for bearing a treatment object; the annular shielding piece comprises an annular body and an extension part connected with the annular body, the extension part is arranged on the annular body in a retractable mode and contracts or expands according to the treatment objects with different sizes loaded on the loading platform, and therefore the distance between the annular shielding piece and the outer edge of the treatment objects is adjusted, and the liquid medicine flowing out of the outer edge of the treatment objects can be collected into the outer chamber. Through the mode, the universality and the adaptation degree of the liquid collecting device for treating treatment objects with different sizes can be improved.

Description

Liquid collection device, developing/etching machine table and developing/etching method
Technical Field
The application relates to the technical field of semiconductor processing, in particular to a liquid collecting device, a developing/etching machine table and a developing/etching method.
Background
When developing/etching the processed object, the liquid collecting device sprays the liquid medicine on the surface of the processed object for developing/etching. Wherein, the liquid collecting device is used for recycling the liquid medicine for further cyclic utilization.
When the processing objects with different sizes are developed/etched, the liquid collecting device with corresponding size is generally required to be equipped, so that the existing liquid collecting device is poor in universality and adaptability.
Disclosure of Invention
The technical problem that this application mainly solved provides a liquid collection device and development/sculpture method, can improve commonality and adaptation degree when liquid collection device handles the processing object of different sizes.
In order to solve the technical problem, the application adopts a technical scheme that: providing a liquid collection device comprising: collecting tank; an annular shield disposed in the collection tank to divide the collection tank into separate inner and outer chambers; the inner cavity is used for accommodating a bearing platform, and the bearing platform is used for bearing a treatment object; the annular shielding piece comprises an annular body and an extension part connected with the annular body, the extension part is arranged on the annular body in a retractable manner and contracts or expands according to the treatment objects with different sizes loaded on the loading platform, so that the distance between the annular shielding piece and the outer edge of the treatment objects is adjusted, and the liquid medicine flowing out of the outer edge of the treatment objects can be collected into the outer chamber.
Wherein the annular body comprises: the first annular baffle is fixedly arranged in the collecting tank; the second annular baffle is sleeved on the outer wall or the inner wall of the first annular baffle and can move up and down relative to the first annular baffle; the third annular baffle is fixedly connected with the second annular baffle, and the third annular baffle is gradually close to the center line of the inner chamber in the direction far away from the second annular baffle; when the second annular baffle plate rises along the first annular baffle plate and one end of the annular shielding piece is higher than the object to be treated, the cleaning liquid flowing out of the outer edge of the object to be treated is collected into the inner chamber under the action of the annular shielding piece.
The extension part is retractably arranged on the third annular baffle plate, the extension part comprises a plurality of plates which are independently arranged, and the plates are movably connected with the third annular baffle plate; when the plates are accommodated on the third annular baffle plate, and one end of the third annular baffle plate is close to the outer edge of the treatment object with the first size, the liquid medicine flowing out of the outer edge of the treatment object is collected into the outer chamber; when the plates are unfolded to the side, far away from the second annular baffle, of the third annular baffle and the plates are connected pairwise to form a fourth annular baffle, one end of the fourth annular baffle is completely attached to/overlapped with one end of the adjacent third annular baffle, the other end of the fourth annular baffle is close to the outer edge of a treatment object with a second size, and liquid medicine flowing out of the outer edge of the treatment object is collected into the outer chamber.
The plates are respectively pivoted with the third annular baffle, and rotate around the third annular baffle to form the fourth annular baffle.
The third annular baffle is provided with a guide rail at a position corresponding to each plate, and the plates travel to preset positions along the guide rails to form the fourth annular baffle.
The outer side wall of the collecting tank is fixedly connected with a fifth annular baffle, and the fifth annular baffle is gradually close to the central line of the inner chamber in the direction away from the outer side wall.
The bottom of the inner chamber and the bottom of the outer chamber are respectively provided with a first outlet and a second outlet, the liquid collecting device is further provided with a first pipeline and a second pipeline which are respectively connected with the first outlet and the second outlet, the first pipeline and the second pipeline are respectively provided with a first valve and a second valve, the other end of the first pipeline is used for being communicated with a cleaning liquid collecting tank, and the other end of the second pipeline is used for being communicated with a liquid medicine supply device.
In order to solve the technical problem, the other technical scheme adopted by the application is as follows: providing a developing/etching machine, comprising: the liquid collecting device, the bearing platform and the liquid medicine supplying device in the technical scheme are adopted; the bearing platform is positioned in the inner chamber and used for bearing the treatment object; the liquid medicine supply device comprises a liquid medicine nozzle which is arranged above the bearing platform and used for spraying liquid medicine to the surface of the processed object borne on the bearing platform.
In order to solve the above technical problem, the present application adopts another technical solution: provided is a developing/etching method including: contracting or expanding an extension part of an annular shielding piece according to the size of the treatment object carried on a carrying platform in an inner chamber of a collecting tank, so as to adjust the distance between the annular shielding piece and the outer edge of the treatment object, and thus liquid medicine flowing out of the outer edge of the treatment object can be collected in the outer chamber; the annular shielding piece is arranged in the collecting tank so as to divide the collecting tank into the inner chamber and the outer chamber which are independent; a chemical liquid nozzle in the chemical liquid supply device sprays a chemical liquid onto the surface of the treatment object.
Wherein the method further comprises: moving a second annular baffle in the annular shield upwardly so that an end of the annular shield extends beyond the treatment; and a cleaning liquid nozzle in the cleaning liquid supply device sprays cleaning liquid to the surface of the treated object, and the cleaning liquid flowing out of the surface of the treated object is collected into the inner cavity under the action of the annular shielding piece.
The beneficial effect of this application is: the extension of annular shielding piece among the liquid collection device that this application provided can contract or expand, and then adjusts the distance between the outer fringe of annular shielding piece and processing object to the not unidimensional processing object on the adaptation load-bearing platform has improved liquid collection device to the commonality and the adaptation degree of the processing object of multiple size.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts. Wherein:
FIG. 1 is a schematic cross-sectional view of an embodiment of a fluid collection apparatus of the present application;
FIG. 2 is a schematic cross-sectional view of one embodiment of a fluid collection apparatus of the present application for processing a first size of a treatment substance;
FIG. 3 is a schematic cross-sectional view of one embodiment of a fluid collection device of the present application for processing a second size treatment;
FIG. 4 is a schematic diagram of the construction of one embodiment of FIG. 1 after the second annular baffle has risen;
FIG. 5 is a schematic top view of one embodiment of the extended portion of FIG. 1 retracted or extended into a third annular baffle;
FIG. 6 is a schematic cross-sectional view of an embodiment of a developing/etching tool of the present disclosure;
fig. 7 is a schematic flow chart diagram of an embodiment of the developing/etching method of the present application.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
Referring to FIG. 1, FIG. 1 is a schematic cross-sectional view of an embodiment of a liquid collection apparatus of the present application, including a collection tank 12 and an annular shield 14.
Therein, an annular shield 14 is provided in the collection tank 12 to divide the collection tank 12 into separate inner and outer chambers 120, 122. The inner chamber 120 is configured to receive the carrier platform 16, and the carrier platform 16 is configured to carry the treatment substance 20. The annular shield 14 includes an annular body 140 and an extension 142 connected to the annular body 140, wherein the extension 142 is retractably disposed on the annular body 140, and retracts or expands the extension 142 according to the sizes of the objects 20 carried on the carrying platform 16, so as to adjust the distance between the annular shield 14 and the outer edge of the objects 20, and thus the liquid medicine flowing out from the outer edge of the objects 20 can be collected in the outer chamber 122.
Specifically, referring to fig. 2, fig. 2 is a schematic cross-sectional view of a liquid collecting apparatus according to an embodiment of the present application for processing a first-size processed object. When the size of the first size processed object 20a is larger, the length of the first size processed object 20a exposed out of the carrying platform 16 is relatively longer, the distance between the outer edge of the first size processed object 20a and the annular body 140 is smaller, that is, the outer edge of the first size processed object 20a and one end of the annular body 140 away from the bottom of the collecting tank 12 are disposed close to each other, at this time, the extending portion 142 may be in a relatively contracted state, and after the liquid medicine is sprinkled from above the first size processed object 20a, the liquid medicine passes through the surface of the first size processed object 20a, reaches the outer edge of the first size processed object 20a, and enters the outer chamber 122 along the directions of arrows a and B in the drawing, so as to achieve the collection of the liquid medicine.
Further, referring to fig. 3, fig. 3 is a schematic cross-sectional view of an embodiment of the liquid collecting device of the present application when processing a processing object of a second size. When the size of the second size processed object 20b is smaller, the length of the second size processed object 20b exposed out of the carrying platform 16 is relatively shorter, the distance between the outer edge of the second size processed object 20b and the annular body 140 is larger, and the extension portion 142 can be in a relatively unfolded state, so that one end of the extension portion 142 away from the annular body 140 is arranged close to the outer edge of the second size processed object 20 b; after the chemical liquid is sprinkled from the second size processed object 20b, the chemical liquid passes through the surface of the second size processed object 20b, reaches the outer edge of the second size processed object 20b, and enters the outer chamber 122 along the directions of arrows C and D in the figure, so as to collect the chemical liquid.
In this embodiment, the manner of contracting or expanding the extension portion 142 may be: the annular body 140 of the annular shielding member 14 is provided with a sliding rail and a plurality of positioning points, and the extending portion 142 can slide on the sliding rail and be positioned on the positioning points.
Furthermore, the extension or expansion of the extension 142 can be adjusted manually, or the computer can set the procedure of the extension or expansion flow with the size of the object 20 as the determination condition to perform program control.
The supporting platform 16 can be further configured as a rotatable platform, so as to adjust the distance between the outer edge of the non-circular treatment substance 20 placed on the supporting platform 16 and the extending portion 142, and for the circular treatment substance 20, while spraying the liquid medicine, the supporting platform 16 is continuously rotated, so that the liquid medicine can be more uniform.
In one embodiment, the treatment object 20 is a wafer. For a 12 "wafer, the extension 142 is retracted on the ring body 140 relative to the ring body 140 in the manner described with reference to fig. 2. For an 8 "wafer, the extension 142 is opposite the ring body 140 in the manner shown in fig. 3, and the extension 142 is spread over the ring body 140.
In the liquid collecting apparatus provided by the present embodiment, the extending portion 142 of the annular shielding member 14 can be retracted or extended, so as to adjust the distance between the annular shielding member 14 and the outer edge of the processing object 20, so as to adapt to the processing objects 20 with different sizes on the carrying platform 16, thereby improving the versatility and adaptability of the liquid collecting apparatus to the processing objects 20 with various sizes.
Further, referring to fig. 4, fig. 4 is a schematic cross-sectional view of the second annular baffle of fig. 1 in a raised embodiment, and the annular body 140 includes a first annular baffle 1400, a second annular baffle 1402 and a third annular baffle 1404.
Wherein, the first ring baffle 1400 is fixedly arranged in the collecting tank 12. The second annular baffle 1402 is disposed on an outer wall or an inner wall of the first annular baffle 1400 and can move up and down relative to the first annular baffle 1400. And the third annular baffle 1404 is fixedly connected with the second annular baffle 1402, and the third annular baffle 1404 is gradually close to the center line (not shown) of the inner chamber 120 in the direction away from the second annular baffle 1402. The extension 142 is retractably disposed on the third annular flap 1404, and the extension 142 can be retracted or extended on the third annular flap 1404. Preferably, the annular body 140 may be axially symmetrically disposed with respect to a center line of the inner chamber 120.
Specifically, the first annular baffle 1400 is provided with a plurality of positioning points, and the second annular baffle 1402 sleeved on the first annular baffle 1400 can slide on the first annular baffle 1400 and be positioned on the positioning points to adjust the position of the third annular baffle 1404 and the outer edge of the extension portion 142 relative to the processing object 20. It should be understood that the adjustment of the positions of the first annular baffle 1400 and the second annular baffle 1402 may be manual adjustment, or may be programmed by a computer by setting the ascending or descending process according to the height threshold of the annular shielding member 14.
When the second annular baffle 1402 rises along the first annular baffle 1400 and the end of the annular shield 14 is higher than the object 20 to be treated, the cleaning solution flowing from the outer edge of the object 20 is collected into the inner chamber 120 in the directions of arrows E and F in the figure by the annular shield 14. The annular shield 14 is of a relatively higher elevation than the treatment substance 20 and the third annular baffle 1404 is progressively closer to the centre line of the inner chamber 120 in a direction away from the second annular baffle 1402 so that the third annular baffle 1404 is effective to direct the flow of cleaning solution into the inner chamber 120. To enhance the effect of directing the cleaning liquid, the extension 142 may be further suitably deployed on the third annular baffle 1404 depending on the flow rate of the cleaning liquid.
The second annular baffle 1402 is adjustable in height along the first annular baffle 1400, so that when the liquid medicine is required to perform developing/etching on the processed object 20, the second annular baffle 1402 is lowered to make the annular body 140 lower than the processed object 20, and then the extending portion 142 is adjusted to be below the outer edge of the processed object 20, the liquid medicine can enter the outer chamber 122 under the action of the annular shielding member 14; when it is desired to rinse the treatment substance 20 with a cleaning fluid, which may enter the inner chamber 120 under the influence of the annular shield 14, the second annular baffle 1402 is raised so that the annular body 140 is above the treatment substance 20. The design mode enables the liquid collecting device to have two purposes, and improves the flexibility of the liquid collecting device.
Further, referring to fig. 5, fig. 5 is a schematic top view of an embodiment of the extension portion of fig. 1 retracted or expanded from the third annular baffle 1404, the extension portion 142 is retractably disposed on the third annular baffle 1404, and the extension portion 142 includes a plurality of plates independently disposed, and the plurality of plates are movably connected to the third annular baffle 1404.
In a specific application scenario, the plurality of slabs includes a first slab 1420, a second slab 1422, a third slab 1424, and a fourth slab 1426. In fig. 5, the area covered by the vertical line is the third annular baffle 1404, the areas covered by the oblique lines are the first plate 1420, the second plate 1422, the third plate 1424, and the fourth plate 1426, and the intermediate blank area 148 is used for disposing the supporting platform 16 and the processing object 20 placed on the supporting platform 16.
When the first size processed object 20a shown in fig. 2 and the second size processed object 20b shown in fig. 3 are processed, when the first plate 1420, the second plate 1422, the third plate 1424, and the fourth plate 1426 are accommodated in the third annular baffle 1404 and one end of the third annular baffle 1404 is close to the outer edge of the first size processed object 20a, the chemical liquid flowing out of the outer edge of the first size processed object 20a is collected in the outer chamber 122.
When the first plate 1420, the second plate 1422, the third plate 1424, and the fourth plate 1426 are unfolded until the third annular barrier 1404 is away from the second annular barrier 1402, and the first plate 1420, the second plate 1422, the third plate 1424, and the fourth plate 1426 are connected in pairs to form the fourth annular barrier 1406, the fourth annular barrier 1406 is parallel to the third annular barrier 1404, one end of the fourth annular barrier 1406 is completely attached to/overlapped with one end of the adjacent third annular barrier 1404 without a gap, the other end of the fourth annular barrier 1406 is close to the outer edge of the second-sized processed object 20b, and the chemical solution flowing out of the outer edge of the second-sized processed object 20b is collected in the outer chamber 122.
When the first plate 1420, the second plate 1422, the third plate 1424, and the fourth plate 1426 are retracted or switched, the diameter of the intermediate blank area 148 is changed. Alternatively, a plurality of sub-plates may be correspondingly disposed on the first plate 1420, the second plate 1422, the third plate 1424, and the fourth plate 1426 to correspondingly reduce the diameter of the intermediate blank area 148 to accommodate the treatment object 20 having a very small size, and by the above, the liquid collecting apparatus may be applied to treatment objects 20 having various sizes, especially to treatment objects 20 having a small size.
Specifically, the first plate 1420, the second plate 1422, the third plate 1424, and the fourth plate 1426 are pivotally connected to the third annular baffle 1404, respectively, and the first plate 1420, the second plate 1422, the third plate 1424, and the fourth plate 1426 rotate around the side of the third annular baffle 1404 close to the center line of the inner chamber 120 to form the fourth annular baffle 1406.
The first 1420, second 1422, third 1424 and fourth 1426 plates may be manually adjusted or the transmission of the first 1420, second 1422, third 1424 and fourth 1426 plates may comprise a lead screw that is driven by a motor, which in turn controls the automatic adjustment of the position of the first 1420, second 1422, third 1424 and fourth 1426 plates by a computer.
Alternatively, the third ring-shaped baffle 1404 is provided with a guide rail corresponding to a position of each plate, and the first plate 1420, the second plate 1422, the third plate 1424, and the fourth plate 1426 respectively travel along the guide rail to a preset position to form the fourth ring-shaped baffle 1406.
By the above two schemes, the diameter of the intermediate blank area 148 can be changed by selecting any switching mode to adapt to the processing objects 20 with different sizes.
Further, referring to fig. 1 again, the outer sidewall 124 of the collecting tank 12 is fixedly connected with a fifth annular baffle 1200, and in a direction away from the outer sidewall 124, the fifth annular baffle 1200 is gradually close to the center line of the inner chamber 120. The total height of the outer side wall 124 of the collecting gutter 12 and the fifth annular baffle 1200 is higher than the maximum height of the annular shield 14, so that even if the annular shield 14 rises to a limit height, the fifth annular baffle 1200 does not come into contact with the annular shield 14. Therefore, even if the chemical solution splashes from the processing object 20 when the processing object 20 with different sizes is developed and etched, the fifth annular baffle 1200 can guide the splashed chemical solution into the outer chamber 122, thereby improving the recovery rate of the chemical solution by the liquid collecting device.
Further, with reference to fig. 1, the bottom of the inner chamber 120 and the bottom of the outer chamber 122 are respectively provided with a first outlet 126 and a second outlet 128, the liquid collecting device is further provided with a first pipeline 127 and a second pipeline 129 connected to the first outlet 126 and the second outlet 128, respectively, the first pipeline 127 and the second pipeline 129 are respectively provided with a first valve 1270 and a second valve 1290, the other end of the first pipeline 127 is used for communicating with the cleaning liquid collecting tank 15, and the other end of the second pipeline 129 is used for communicating with the liquid medicine supplying device 17.
Specifically, after the used cleaning solution reaches the inner chamber 120, the used cleaning solution flows into the first pipeline 127 through the first outlet 126 and enters the cleaning solution collection tank 15, and if the water level in the cleaning solution collection tank 15 reaches the threshold value, the first valve 1270 can be manually or automatically closed, so as to dispose of the used cleaning solution in the cleaning solution collection tank 15 in time. Alternatively, the first valve 1270 and the cleaning solution collection tank 15 may not be provided and the used cleaning solution is directly drained from the first line 127. Through the scheme, the treated objects 20 can be continuously washed to reach the standard, and the working continuity of the liquid collecting device is improved.
Further, the second pipe 129 may be provided with a drug solution concentration tester 18. After the chemical reaches the outer chamber 122, the chemical flows into the second pipe 129 through the second outlet 128, the qualified chemical detected by the chemical concentration tester 18 enters the chemical supply device 17, and the unqualified chemical enters the waste liquid collecting tank 21 through the waste liquid pipe 180, and the waste liquid pipe 180 is correspondingly provided with a third valve 1800.
Specifically, when the concentration tester 18 detects that the concentration of the liquid medicine in the second pipeline 129 does not reach the standard, the third valve 1800 is opened, the second valve 1290 is closed, and the unqualified liquid medicine only flows into the waste liquid collecting tank 21; when the chemical concentration tester 18 detects that the chemical concentration in the second conduit 129 reaches the standard, the third valve 1800 is closed, the second valve 1290 is opened, and the qualified chemical is returned to the chemical supply device 17. In this embodiment, the chemical liquid collected in the chemical liquid supply device 17 can be recycled, thereby saving the production cost.
Referring to fig. 6, fig. 6 is a schematic cross-sectional structure diagram of an embodiment of a developing/etching machine 30 of the present application, which includes a liquid collecting device, a supporting platform 16 and a chemical liquid supplying device 17 in the above embodiment. A carrier platform 16 is located in the inner chamber 120 for carrying the treatment substance. The chemical liquid supply device 17 includes a chemical liquid nozzle 170, and the chemical liquid nozzle 170 is disposed above the supporting platform 16 for spraying the chemical liquid onto the surface of the object 20 supported on the supporting platform 16.
Further, a third conduit 172 may be included between the chemical solution supply device 17 and the chemical solution nozzle 170. The chemical solution sprayed on the surface of the object 20 flows into the second pipeline 129 through the second outlet 128 at the bottom of the outer chamber 122 to flow into the chemical solution supply device 17, and then is sprayed out from the chemical solution supply device 17 through the third pipeline 172 from the chemical solution nozzle 170, so that the recycling of the chemical solution is realized. In addition, a cleaning liquid supply device 19 may be further provided, the cleaning liquid supply device including a cleaning liquid nozzle 190, and a fourth pipe 192 may be provided between the cleaning liquid supply device 19 and the cleaning liquid nozzle 190. Alternatively, a pressurizing device (not shown) may be included in the chemical liquid supply device 17 and the cleaning liquid supply device 19, and the chemical liquid nozzle 170 and the cleaning liquid nozzle 190 may be movable in any direction and rotatable in any axial direction. The cleaning liquid is sprayed from the cleaning liquid supply device 19 to the surface of the processed object 20 through the fourth pipe 192 from the cleaning liquid nozzle 190, and the used cleaning liquid flows into the cleaning liquid collection tank 15 through the first outlet 126 at the bottom of the inner chamber 120 and the first pipe 127.
The liquid medicine supply pipeline and the cleaning liquid supply pipeline are mutually independent, and can be manually adjusted when the liquid medicine is needed to be used or the cleaning liquid is needed to be used, or can be automatically switched according to the developing/etching flow through a program.
The developing/etching machine 30 provided by the embodiment can perform developing/etching on the processing objects 20 with different sizes, and can recycle the liquid medicine, thereby improving the universality of the developing/etching machine 30, saving the use of the liquid medicine and further saving the production cost.
Referring to fig. 7, fig. 7 is a schematic flowchart illustrating a developing/etching method according to an embodiment of the present disclosure, the developing/etching method including:
s101: the extension of the annular screen is contracted or expanded according to the size of the treatment load carried on the carrying platform located in the inner chamber of the collecting tank.
Specifically, in S101, the extending portion of the annular shield is contracted for a large-sized object to be processed, and the extending portion of the annular shield is appropriately expanded for a small-sized object to be processed, so that the distance between the annular shield and the outer edge of the object to be processed is adjusted. The outer edge of the annular shielding piece is flush with or slightly lower than the outer edge of the processed object in the vertical direction, and the outer edge of the annular shielding piece is positioned outside the outer edge of the processed object and has a certain interval.
The annular shielding piece arranged in the collecting tank can divide the collecting tank into an inner chamber and an outer chamber which are independent. The outer chamber is used for collecting liquid medicine, and the inner chamber is used for storing used cleaning liquid.
S102: a chemical liquid nozzle in a chemical liquid supply device sprays a chemical liquid onto a surface of a treatment object.
Specifically, in S102, the chemical solution flowing out from the outer edge of the processing object can be collected in the outer chamber by the annular shield.
Through the above steps S101 and S102, the chemical liquid can be sprayed to the surfaces of the processing objects with different sizes, so as to complete the first step of developing/etching.
S103: moving a second annular shield in the annular shield upwardly so that an end of the annular shield extends beyond the treatment object.
Specifically, in step S103, after the second annular baffle moves upward, the height of the annular baffle is higher than that of the processed object, so that the cleaning liquid in the subsequent step S104 is not splashed into the outer chamber.
S104: a cleaning liquid nozzle in the cleaning liquid supply device sprays cleaning liquid to the surface of the object to be treated.
Specifically, in S104, the cleaning liquid flowing out from the surface of the processed object is collected into the internal chamber by the annular shield.
Through the above steps S103 and S104, the cleaning solution can be sprayed to the surfaces of the processing objects with different sizes, so as to complete the second step of developing/etching.
Specifically, to ensure the developing/etching effect, S101-S104 may be repeated multiple times to complete the whole developing/etching process, and the whole process may be automatically controlled by a computer program according to the requirements of developing/etching.
The developing/etching method provided by the embodiment can complete developing/etching of the processing objects with different sizes in the same developing/etching machine, and improves the production efficiency.
The above description is only for the purpose of illustrating embodiments of the present application and is not intended to limit the scope of the present application, and all modifications of equivalent structures and equivalent processes, which are made by the contents of the specification and the drawings of the present application or are directly or indirectly applied to other related technical fields, are also included in the scope of the present application.

Claims (8)

1. A liquid collection device, comprising:
collecting tank;
an annular shield disposed in the collection tank to divide the collection tank into separate inner and outer chambers; the inner chamber is used for accommodating a bearing platform, and the bearing platform is used for bearing a treatment object; the annular shielding piece comprises an annular body and an extension part connected with the annular body, the extension part is arranged on the annular body in a retractable manner and contracts or expands according to the treatment objects with different sizes loaded on the loading platform, so that the distance between the annular shielding piece and the outer edge of the treatment objects is adjusted, and the liquid medicine flowing out of the outer edge of the treatment objects can be collected into the outer chamber;
wherein the annular body comprises:
the first annular baffle is fixedly arranged in the collecting tank;
the second annular baffle is sleeved on the outer wall or the inner wall of the first annular baffle and can move up and down relative to the first annular baffle;
the third annular baffle is fixedly connected with the second annular baffle, and the third annular baffle is gradually close to the center line of the inner chamber in the direction far away from the second annular baffle;
when the second annular baffle plate rises along the first annular baffle plate and one end of the annular shielding piece is higher than the processed object, the cleaning liquid flowing out of the outer edge of the processed object is collected into the inner chamber under the action of the annular shielding piece.
2. The fluid collection device of claim 1,
the extension part is retractably arranged on the third annular baffle plate, the extension part comprises a plurality of plates which are independently arranged, and the plates are movably connected with the third annular baffle plate;
when the plates are accommodated on the third annular baffle plate, and one end of the third annular baffle plate is close to the outer edge of the treatment object with the first size, the liquid medicine flowing out of the outer edge of the treatment object is collected into the outer chamber; when the plates are unfolded to the side, far away from the second annular baffle, of the third annular baffle, and the plates are connected pairwise to form a fourth annular baffle, one end of the fourth annular baffle is completely attached to/coincided with one end of the adjacent third annular baffle, the other end of the fourth annular baffle is close to the outer edge of a treatment object with a second size, and liquid medicine flowing out of the outer edge of the treatment object is collected into the outer chamber.
3. A liquid collection apparatus according to claim 2,
the plurality of plates are respectively pivoted with the third annular baffle, and the plurality of plates rotate around the third annular baffle to form the fourth annular baffle.
4. The fluid collection device of claim 2,
and a guide rail is arranged at the position of the third annular baffle corresponding to each plate, and the plates advance to preset positions along the guide rail to form the fourth annular baffle.
5. The fluid collection device of claim 1,
the outer side wall of the collecting tank is fixedly connected with a fifth annular baffle, and the fifth annular baffle is gradually close to the central line of the inner chamber in the direction away from the outer side wall.
6. The fluid collection device of claim 1,
the inner chamber with the bottom of outer chamber is provided with first export and second export respectively, liquid collection device still be provided with respectively with first export with second exit linkage's first pipeline and second pipeline, just first pipeline with be provided with first valve and second valve on the second pipeline respectively, the other end of first pipeline is used for collecting the jar intercommunication with the washing liquid, the other end of second pipeline is used for communicating with liquid medicine feeding device.
7. A developing/etching machine is characterized by comprising:
a liquid collection device according to any one of claims 1 to 6;
the bearing platform is positioned in the inner chamber and used for bearing the treatment object;
the liquid medicine supply device comprises a liquid medicine nozzle which is arranged above the bearing platform and used for spraying liquid medicine to the surface of the processed object borne on the bearing platform.
8. A developing/etching method, comprising:
contracting or expanding the extension part of the annular shielding piece according to the size of the treatment object carried on the carrying platform in the inner chamber of the collecting tank, so as to adjust the distance between the annular shielding piece and the outer edge of the treatment object, and thus the liquid medicine flowing out of the outer edge of the treatment object can be collected in the outer chamber; the annular shielding piece is arranged in the collecting tank so as to divide the collecting tank into the inner chamber and the outer chamber which are independent; the annular shielding piece comprises an annular body and an extension part connected with the annular body, and the extension part is arranged on the annular body in a retractable manner; the annular body includes: the first annular baffle is fixedly arranged in the collecting tank; the second annular baffle is sleeved on the outer wall or the inner wall of the first annular baffle and can move up and down relative to the first annular baffle; the third annular baffle is fixedly connected with the second annular baffle and gradually approaches to the central line of the inner chamber in the direction far away from the second annular baffle;
a chemical solution nozzle in the chemical solution supply device sprays a chemical solution on the surface of the treatment object;
moving a second annular baffle in the annular shield upwardly so that an end of the annular shield extends beyond the treatment;
and a cleaning liquid nozzle in the cleaning liquid supply device sprays cleaning liquid to the surface of the treated object, and the cleaning liquid flowing out of the surface of the treated object is collected into the inner cavity under the action of the annular shielding piece.
CN201911371431.8A 2019-12-26 2019-12-26 Liquid collection device, developing/etching machine and developing/etching method Active CN111146123B (en)

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01289249A (en) * 1988-05-17 1989-11-21 Tokyo Electron Ltd Semiconductor manufacturing apparatus
CN1326546A (en) * 1998-11-12 2001-12-12 Memc电子材料有限公司 Ion extraction process and apparatus for single side wafers
CN101000862A (en) * 2006-01-13 2007-07-18 细美事有限公司 Apparatus for treating substrate
TW200919570A (en) * 2007-08-29 2009-05-01 Tokyo Electron Ltd Substrate treatment apparatus, substrate treatment method, and storage medium
KR20090131207A (en) * 2008-06-17 2009-12-28 주식회사 케이씨텍 Spin chuck and apparatus and method for cleaning substrate having the same
TW201308481A (en) * 2011-05-13 2013-02-16 Lam Res Ag Device and process for liquid treatment of wafer shaped articles
TWM559503U (en) * 2018-01-10 2018-05-01 弘塑科技股份有限公司 Substrate processing apparatus and rotating stage thereof

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006190737A (en) * 2005-01-05 2006-07-20 Matsushita Electric Ind Co Ltd Device and method for manufacturing semiconductor device
JP5242632B2 (en) * 2010-06-03 2013-07-24 東京エレクトロン株式会社 Substrate liquid processing equipment

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01289249A (en) * 1988-05-17 1989-11-21 Tokyo Electron Ltd Semiconductor manufacturing apparatus
CN1326546A (en) * 1998-11-12 2001-12-12 Memc电子材料有限公司 Ion extraction process and apparatus for single side wafers
CN101000862A (en) * 2006-01-13 2007-07-18 细美事有限公司 Apparatus for treating substrate
TW200919570A (en) * 2007-08-29 2009-05-01 Tokyo Electron Ltd Substrate treatment apparatus, substrate treatment method, and storage medium
KR20090131207A (en) * 2008-06-17 2009-12-28 주식회사 케이씨텍 Spin chuck and apparatus and method for cleaning substrate having the same
TW201308481A (en) * 2011-05-13 2013-02-16 Lam Res Ag Device and process for liquid treatment of wafer shaped articles
TWM559503U (en) * 2018-01-10 2018-05-01 弘塑科技股份有限公司 Substrate processing apparatus and rotating stage thereof

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