Disclosure of Invention
In view of the defects of the prior art, the invention aims to provide a polyamic acid solution, a polyimide film and application thereof. The polyamic acid solution has the advantages of high solid content and low viscosity, and the polyimide film prepared from the polyamic acid solution has excellent heat resistance, dimensional stability and good mechanical property.
In order to achieve the purpose, the invention adopts the following technical scheme:
the invention provides a polyamic acid solution, which comprises the following raw materials: aromatic tetracarboxylic dianhydride monomer, aromatic diamine monomer, compound containing tetracarboxyl structure and solvent;
the structural formula of the compound containing the tetracarboxyl structure is shown as a formula C:
wherein R is1The group is aryl, n is a natural number from 0 to 4 (n can be 0, 1, 2,3, 4).
The compound containing the tetracarboxyl structure is added into the polyamic acid solution, the compound is an aromatic or aromatic heterocyclic compound containing a dicarboxylic acid or tetracarboxylic acid structure, the compound containing more than two carboxyl structures is introduced into the polyamic acid solution, and in the stage of curing and film-forming of the polyamic acid solution, carboxyl groups in the compound and amino groups at the tail ends of molecular chains undergo amidation or imidization reaction, so that the polyamic acid solution undergoes chain growth reaction in the process of film-forming and curing, free molecular chains undergo crosslinking, the intermolecular crosslinking reaction limits the movement of the molecular chains, molecular weight is increased, molecular structure stability is improved, heat resistance of resin materials is improved, thermal expansion coefficient of films is reduced, viscosity of the resin solution can be obviously reduced under the condition of ensuring that solid content is unchanged, and casting film-forming process performance of the resin is improved. The heat resistance, the dimensional stability and the mechanical property of the flexible substrate material are ensured, and the problems that the viscosity and the solid content of polyimide precursor polyamic acid slurry and the heat resistance stability, the thermal expansion property and the mechanical property of a polyimide film can not meet the conditions of a display process are solved.
Preferably, the molar mass ratio of the aromatic tetracarboxylic dianhydride monomer, the aromatic diamine monomer, and the compound having a tetracarboxylic structure is 1 (1.001-1.5) (0.001-0.5), and may be, for example, 1:1.001:0.001, 1:1.002:0.002, 1:1.004:0.004, 1:1.006:0.006, 1:1.008:0.008, 1:1.01:0.01, 1:1.02:0.02, 1:1.04:0.04, 1:1.06:0.06, 1:1.08:0.08, 1:1.1:0.1, 1:1.2:0.2, 1:1.3:0.3, 1:1.4:0.4, 1:1.5: 0.5.
Preferably, the aromatic tetracarboxylic dianhydride monomer is a rigid structure aromatic tetracarboxylic dianhydride monomer and/or a semi-rigid structure aromatic tetracarboxylic dianhydride monomer.
The molar percentage of the aromatic tetracarboxylic dianhydride monomer of the rigid structure is preferably 70 mol% or more, for example, 70 mol%, 75 mol%, 80 mol%, 85 mol%, 90 mol%, 95 mol%, 100 mol%, based on 100 mol% of the total molar mass of the aromatic tetracarboxylic dianhydride monomer.
Preferably, the aromatic tetracarboxylic dianhydride monomer of the rigid structure includes any one or a mixture of at least two of 3,3',4,4' -biphenyltetracarboxylic dianhydride, 2',3,3' -biphenyltetracarboxylic dianhydride, pyromellitic dianhydride, 1,4,5, 8-naphthalene tetracarboxylic dianhydride, or 2,3,6, 7-naphthalene tetracarboxylic dianhydride.
Preferably, the 3,3',4,4' -biphenyltetracarboxylic dianhydride is contained in a molar percentage of 40 mol% or more, for example, 40 mol%, 45 mol%, 50 mol%, 55 mol%, 60 mol%, 65 mol%, 70 mol%, 75 mol%, 80 mol%, 85 mol%, 90 mol%, 95 mol%, 100 mol% based on 100 mol% of the total molar mass of the aromatic tetracarboxylic dianhydride monomers having a rigid structure.
Preferably, the semi-rigid structure aromatic tetracarboxylic dianhydride monomer comprises any one or a mixture of at least two of diphenyl ether tetracarboxylic dianhydride, benzophenone tetracarboxylic dianhydride, or hexafluoro dianhydride.
Preferably, the molar percentage content of the diphenyl ether tetracarboxylic dianhydride is 30 to 90 mol%, for example, 30 mol%, 35 mol%, 40 mol%, 45 mol%, 50 mol%, 55 mol%, 60 mol%, 65 mol%, 70 mol%, 75 mol%, 80 mol%, 85 mol%, 90 mol% based on 100 mol% of the total molar mass of the semi-rigid structure aromatic tetracarboxylic dianhydride monomer.
Preferably, the aromatic diamine monomer is an aromatic diamine of a rigid structure and/or an aromatic diamine of a semi-rigid structure.
The molar percentage of the aromatic diamine having a rigid structure is preferably 60 mol% or more, and may be, for example, 60 mol%, 65 mol%, 70 mol%, 75 mol%, 80 mol%, 85 mol%, 90 mol%, 95 mol%, 100 mol%, based on 100 mol% of the total molar mass of the aromatic diamine monomers.
In the aromatic diamine monomer of the present invention, if the content of the aromatic diamine monomer having a rigid structure is less than 60 mol%, the heat resistance of the polyimide resin material formed is reduced, and the thermal expansion coefficient is increased; if the aromatic diamine monomer with a semi-rigid structure is not added, the prepared polyimide film becomes brittle, and the mechanical property of the resin material is influenced.
Preferably, the aromatic diamine with a rigid structure comprises any one or a mixture of at least two of p-phenylenediamine, m-phenylenediamine, o-phenylenediamine or p-terphenylenediamine;
the molar percentage of the p-phenylenediamine is preferably 30 mol% or more, and may be, for example, 30 mol%, 35 mol%, 40 mol%, 45 mol%, 50 mol%, 55 mol%, 60 mol%, 65 mol%, 70 mol%, 75 mol%, 80 mol%, 85 mol%, 90 mol%, 95 mol%, 100 mol%, based on 100 mol% of the total molar mass of the aromatic diamines having a rigid structure.
Preferably, the semi-rigid structure aromatic diamine comprises any one of 4,4 '-diaminodiphenyl ether, 3,4' -diaminodiphenyl ether, 4 '-diaminodiphenyl sulfone, 2' -bis-trifluoromethyl-4, 4 '-diaminobiphenyl, 9-bis- (4-aminophenyl) fluorene or 4,4' -diaminobenzophenone or a mixture of at least two thereof.
Preferably, said R is
1The radicals being selected from
Wherein the dotted line is the attachment position of the group.
Preferably, said R is
1The radicals being selected from
Wherein the dotted line is the attachment position of the group.
Preferably, the compound containing the tetracarboxyl structure is selected from any one of the following compounds C1-C6:
preferably, the solvent is a polar aprotic solvent.
Preferably, the solvent comprises any one of N-methylpyrrolidone, N-dimethylformamide, dimethylsulfoxide or N, N-dimethylacetamide, or a mixture of at least two thereof.
Preferably, the raw materials for preparing the polyamic acid solution further include an inorganic nanoparticle filler. The addition of the inorganic nano-filler can significantly reduce the thermal expansion coefficient of the material.
Preferably, the inorganic nanoparticle filler is added in an amount of 0.01 to 20% by mass based on the total mass of the polyamic acid solid content, and may be, for example, 0.01%, 0.1%, 0.2%, 0.4%, 0.6%, 0.8%, 1%, 2%, 3%, 4%, 5%, 6%, 7%, 8%, 9%, 10%, 11%, 12%, 13%, 14%, 15%, 16%, 17%, 18%, 19%, 20%.
Preferably, the inorganic nanoparticle filler comprises any one or a mixture of at least two of silica, alumina or titania;
preferably, the inorganic nanoparticulate filler has a particle size of 10 to 100nm, and may be, for example, 10nm, 20nm, 30nm, 40nm, 50nm, 60nm, 70nm, 80nm, 90nm, 100 nm.
Preferably, the polyamic acid solution has a solid content of 10 to 20% by weight, and may be, for example, 10%, 11%, 12%, 13%, 14%, 15%, 16%, 17%, 18%, 19%, 20% by weight
Preferably, the viscosity of the polyamic acid solution is 2000-10000cP, and may be, for example, 2000cP, 3000cP, 4000cP, 5000cP, 6000cP, 7000cP, 8000cP, 9000cP, 10000 cP.
If the solid content of the polyamic acid solution is too low, a polyimide film with uniform thickness is difficult to obtain due to too fast volatilization of the solvent in the process of curing and film forming of the polyamic acid slurry; too high a solid content results in a high viscosity, making it difficult to adjust the film thickness during the coating process.
In a second aspect, the present invention provides a preparation method of the polyamic acid solution, the preparation method comprising: mixing an aromatic diamine monomer and a solvent, stirring for the first time, adding an aromatic tetracarboxylic dianhydride monomer, stirring for the second time, finally adding a compound containing a tetracarboxyl structure, stirring for the third time, and reacting to obtain the polyamic acid solution.
Preferably, the temperature of the primary stirring is-20 to 50 ℃, for example, -20 ℃, -15 ℃, -10 ℃, -50 ℃,5 ℃, 10 ℃, 15 ℃, 20 ℃, 25 ℃, 30 ℃, 35 ℃, 40 ℃, 45 ℃ and 50 ℃.
Preferably, the aromatic tetracarboxylic dianhydride monomer is added in 3 to 5 portions, for example, 3,4, 5 portions.
Preferably, the temperature of the reaction system during the addition of the aromatic tetracarboxylic dianhydride monomer is 5 to 15 ℃, for example, 5 ℃,6 ℃,7 ℃,8 ℃, 9 ℃, 10 ℃, 11 ℃, 12 ℃, 13 ℃, 14 ℃ and 15 ℃.
Preferably, the temperature of the secondary stirring is-20 to 50 ℃, for example, -20 ℃, -15 ℃, -10 ℃, -50 ℃,5 ℃, 10 ℃, 15 ℃, 20 ℃, 25 ℃, 30 ℃, 35 ℃, 40 ℃, 45 ℃ and 50 ℃; the secondary stirring time is 5-7h, for example, 5h, 5.5h, 6h, 6.5h, 7h
Preferably, the temperature of the third stirring is-20 to 50 ℃, for example, -20 ℃, -15 ℃, -10 ℃, -50 ℃,5 ℃, 10 ℃, 15 ℃, 20 ℃, 25 ℃, 30 ℃, 35 ℃, 40 ℃, 45 ℃, 50 ℃; the secondary stirring time is 16-30h, for example, 16h, 18h, 20h, 22h, 24h, 26h, 28h, 30 h.
In a third aspect, the present invention provides a polyimide film, wherein a raw material of the polyimide film comprises the polyamic acid solution according to the first aspect.
The thickness of the polyimide film is preferably 5 to 20 μm, and may be, for example, 5 μm, 6 μm, 7 μm, 8 μm, 9 μm, 10 μm, 11 μm, 12 μm, 13 μm, 14 μm, 15 μm, 16 μm, 17 μm, 18 μm, 19 μm, or 20 μm.
In a fourth aspect, the present invention provides a method for preparing a polyimide film, including the following steps:
(1) degassing a polyamic acid solution, spin-coating the polyamic acid solution on the surface of a substrate, and pre-drying to obtain the substrate containing a wet film;
(2) and (2) thermally curing the substrate containing the wet film obtained in the step (1), and peeling to obtain the polyimide film.
Preferably, the degassing in step (1) is degassing under vacuum for 20-40min, such as 20min, 25min, 30min, 35min, 40 min.
Preferably, the substrate in step (1) is a glass substrate.
Preferably, the spin coating in the step (1) is performed by a spin coater.
Preferably, the pre-baking in the step (1) is specifically: the pre-drying is carried out for 20-40min (for example, 20min, 25min, 30min, 35min, 40min) on a hot plate at 75-85 deg.C (for example, 75 deg.C, 80 deg.C, 85 deg.C), and for 20-40min (for example, 20min, 25min, 30min, 35min, 40min) on a hot plate at 115-125 deg.C (for example, 115 deg.C, 120 deg.C, 125 deg.C).
Preferably, the thickness of the wet film in step (1) is 16 to 18 μm, and may be 16 μm, 16.5 μm, 17 μm, 17.5 μm, 18 μm, for example.
Preferably, the heat curing in step (2) is specifically: the substrate containing the wet film obtained in the step (1) is placed in a high temperature oven for thermal curing, and the temperature is raised by a programmed temperature raising method, wherein the temperature is raised at a rate of 5 ℃/min from room temperature, the temperature is raised to 155 ℃ for example, 145 ℃, 150 ℃, 155 ℃ and kept for 25-35min (for example, 25min, 27min, 30min, 32min, 35min), the temperature is raised to 175 ℃ for 185 ℃ (for example, 175 ℃, 180 ℃, 185 ℃ and 25-35min (for example, 25min, 27min, 30min, 32min, 35min), the temperature is raised to 235 ℃ for 245 ℃ (for example, 235 ℃, 240 ℃, 245 ℃ and kept for 25-35min (for example, 25min, 27min, 30min, 32min, 35min), and the temperature is raised to 295 ℃ for 305 ℃ for example, 295 ℃, 300 ℃, 305 ℃ and kept for 25-35min (for example, 25min, 30min, 35min, 2, 35min, and the like), 27min, 30min, 32min, 35min), heating to 345 ℃ and 355 ℃ for 25-35min (for example, 345 ℃, 350 ℃, 355 ℃) and keeping for 25-35min (for example, 25min, 27min, 30min, 32min, 35min), heating to 445 ℃ and 450 ℃ (for example, 445 ℃, 450 ℃, 455 ℃) and keeping for 25-35min (for example, 25min, 27min, 30min, 32min, 35 min).
Preferably, the stripping in the step (2) is specifically: and (3) boiling the substrate containing the wet film after the thermal curing in boiling water for 20-40min (for example, 20min, 25min, 30min, 35min and 40min), and peeling the film from the substrate to obtain the polyimide film.
Preferably, the thickness of the polyimide film is 9 to 11 μm, and may be, for example, 9 μm, 9.2 μm, 9.4 μm, 9.6 μm, 9.8 μm, 10 μm, 10.2 μm, 10.4 μm, 10.6 μm, 10.8 μm, 11 μm.
In a fifth aspect, the present invention provides a use of the polyimide film according to the third aspect in preparing a flexible substrate for a display panel.
Compared with the prior art, the invention has the following beneficial effects:
(1) the polyamic acid solution has the advantages of high solid content and low viscosity, and the polyimide film prepared from the polyamic acid solution has excellent heat resistance, dimensional stability and good mechanical property.
(2) The polyimide film prepared from the polyamic acid solution has the thermal decomposition temperature of over 550 ℃, the thermal expansion coefficient of less than 11ppm/K and the tensile strength of over 280 MPa.
Example 9
Respectively adding 15.51 g (51mmol) of diamine compound B and 195g N-methyl pyrrolidone into a reaction bottle, starting mechanical stirring, replacing air in the flask by nitrogen gas, adding 1.1g of SiO2 inorganic nanoparticles (the particle size is 20nm) after all monomers are dissolved, stirring for 30min, putting the system into an ice-water bath, adding A-214.7g (50.00mmol) into the mixed solution in batches, controlling the reaction temperature to be not more than 15 ℃, naturally returning the system to room temperature after the addition is finished, stirring for 6h, then adding 30.41 g (1mmol) of compound C, and continuously stirring for 18h at room temperature to obtain a polyamic acid solution (PAA-9) with the mass concentration of 10%. The polyamic acid solution was tested to have a viscosity of 3750cP at 25 ℃.
Comparative example 1
The diamine compound B15.51g (51.00mmol) and 118g N-methyl pyrrolidone were added to a reaction flask, mechanical stirring was turned on, the air in the flask was replaced with nitrogen, after the monomers were completely dissolved, the system was placed in an ice-water bath, and A214.7g (50mmol) were added to the above mixed solution in portions, with the reaction temperature being controlled not to exceed 15 ℃. After the addition was completed, the whole reaction was stirred at room temperature for 24 hours to obtain a polyamic acid solution having a solid content of 15 wt%. The polyamic acid solution was tested for viscosity of 5200cP at 25 ℃.
Comparative example 2
The diamine compounds B14.41g (40.80mmol), B22.04g (10.20mmol) and 122g N-methyl pyrrolidone were added to the reaction flask, the mechanical stirring was turned on, the air in the flask was replaced with nitrogen, and after the monomers were completely dissolved, 1.2g of SiO was added2Inorganic nanoparticles (particle diameter of 20nm), stirring for 30min, placing the system in an ice-water bath, adding A25.88g (40mmol) and A48.04g (10mmol) to the mixed solution in batches, and controlling the reaction temperature to be not more than 15 ℃. After the addition was completed, the whole reaction was stirred at room temperature for 24 hours to obtain a polyamic acid solution having a solid content of 15 wt%. The polyamic acid solution was tested to have a viscosity of 4950cP at 25 ℃.
Comparative example 3
The diamine compound B15.56g (51.50mmol) and 120g N-methyl pyrrolidone were added to a reaction flask, mechanical stirring was started, the air in the flask was replaced with nitrogen, and after the monomers were completely dissolved, 1.1g of SiO was added2Inorganic nanoparticles (the particle diameter is 20nm), stirring for 30min, placing the system in an ice-water bath, adding A211.76g (40.00mmol) and A43.22g (10.00mmol) to the mixed solution in batches, and controlling the reaction temperature to be not more than 15 ℃. After the addition was completed, the whole reaction was stirred at room temperature for 24 hours to obtain a polyamic acid solution having a solid content of 15 wt%. The polyamic acid solution was tested to have a viscosity of 4250 mPa-s at 25 ℃.
Performance testing of polyimide films
1. Preparing a polyimide film:
(1) the polyamic acid solutions prepared in examples 1 to 9 and comparative examples 1 to 3 were filtered through 0.45 μm biofilms, respectively, and then degassed under vacuum for 30min, spin-coated on the surface of a glass substrate using a spin coater, followed by pre-baking on hot plates at 80 ℃ and 120 ℃ for 30min, respectively, to obtain a glass substrate containing a wet film having a thickness of 17 μm.
(2) And (2) placing the glass substrate containing the wet film obtained in the step (1) into a high-temperature oven for thermosetting, heating up at room temperature at a speed of 5 ℃/min, respectively heating up to 150 ℃, keeping 30min at 180 ℃, 30min at 240 ℃, 30min at 300 ℃, 30min at 350 ℃ and 30min at 450 ℃, placing the substrate into boiling water for boiling for 30min, and peeling the polyimide film from the glass substrate to obtain the polyimide film, wherein the thickness of the polyimide film is 10 mu m.
2. Performance test method of polyimide film
(1) Test method of Heat resistance: the polyimide film obtained above was tested for thermal decomposition temperature using METER TGA1, each test sample polyimide film was cut into small pieces, 10mg was weighed in a dry pan, and N was measured at 30 ℃ at a rate of 10 ℃/min2Heating to 800 ℃ under the atmosphere, recording a thermal weight loss curve within the range of 50-800 ℃, and calculating the thermal decomposition temperature Td (1%) of 1% of the material;
the thermal expansion performance of the polyimide film obtained above was measured by using TMAQ400 type dynamic thermo-mechanical analyzer, the polyimide film obtained above was cut into a block sample having a length of 4cm and a width of 5mm, and the static holding force was set to 0.02N in a film stretching mode2Heating and cooling at the speed of 10 ℃/min under the atmosphere, heating for the first time to eliminate the internal stress of the film, recording the length data of the polyimide film in the range of 50-400 ℃ in the second heating process, and calculating the thermal expansion coefficient of the polyimide film according to the formula of CTE (△ L/(L △ T), wherein L is the initial length of the polyimide film before heating, △ L is the change value of the length of the polyimide film before and after heating, and △ T is the temperature change value.
(2) The mechanical property testing method comprises the following steps: the mechanical properties of the polyimide film obtained above were measured using an electronic tensile tester, the polyimide film obtained above was cut into a block sample having a length of 10cm and a width of 5mm, a tensile test was carried out at a speed of 50mm/min according to the method of ASTM-D882, and the tensile strength of the polyimide film was determined in parallel 5 times, and the average value was taken as the tensile strength.
The specific test results are shown in table 2:
TABLE 2
As can be seen from the above test results, the polyimide films prepared from the polyamic acid solutions provided in examples 1 to 9 have a thermal decomposition temperature of 557-573 ℃, a thermal expansion coefficient of 5-11ppm/K, and a tensile strength of 285-340 MPa. The polyamic acid solution has the advantages of high solid content and low viscosity, and the polyimide film prepared from the polyamic acid solution has excellent heat resistance, dimensional stability and good mechanical property. The addition of the compound containing the tetracarboxyl structure in the polyamic acid solution can cause the polyamic acid to generate chain growth reaction in the film forming and curing process, thereby improving the heat resistance of the polyimide film, reducing the thermal expansion coefficient of the polyimide film, obviously reducing the viscosity of the resin solution under the condition of ensuring the solid content to be unchanged, and improving the performance of the tape casting film forming process. In addition, the addition of inorganic nanofillers can significantly reduce the coefficient of thermal expansion of the material.
The applicant states that the present invention is illustrated by the above examples of the polyamic acid solution, the polyimide film and the application thereof, but the present invention is not limited to the above examples, that is, the present invention is not meant to be implemented by relying on the above examples. It should be understood by those skilled in the art that any modification of the present invention, equivalent substitutions of the raw materials of the product of the present invention, addition of auxiliary components, selection of specific modes, etc., are within the scope and disclosure of the present invention.