CN111106520A - 355nm laser - Google Patents
355nm laser Download PDFInfo
- Publication number
- CN111106520A CN111106520A CN201911190877.0A CN201911190877A CN111106520A CN 111106520 A CN111106520 A CN 111106520A CN 201911190877 A CN201911190877 A CN 201911190877A CN 111106520 A CN111106520 A CN 111106520A
- Authority
- CN
- China
- Prior art keywords
- laser
- light
- crystal
- frequency
- dichroic mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
- H01S3/109—Frequency multiplication, e.g. harmonic generation
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Abstract
The invention belongs to the technical field of laser, and particularly relates to a 355nm laser, which is characterized in that firstly, frequency doubling crystals are used for carrying out frequency doubling on 1064nm basic frequency light to generate 532nm second harmonic, then, the 1064nm basic frequency light is separated and amplified, and then, the generated second harmonic 532nm laser and the amplified basic frequency light 1064nm laser are subjected to sum frequency in a sum frequency crystal to obtain 355nm laser. The method can effectively improve the 355nm conversion efficiency, so that the 355nm ultraviolet light can be efficiently converted and output under the condition of shorter crystal length; meanwhile, the influence of absorption and walk-off effects on 355nm laser pulses can be reduced, the damage risk of a frequency doubling crystal is reduced, ultraviolet picosecond 355nm laser can be realized under the condition of low-power fundamental frequency light incidence, the output power is improved by more than 40% compared with that of the traditional scheme, and the beam quality can be improved.
Description
Technical Field
The invention belongs to the technical field of laser, and particularly relates to a 355nm laser.
Background
The ultraviolet band picosecond laser has the advantages of short wavelength, high single photon energy, concentrated energy, short action time and the like, so the ultraviolet band picosecond laser is widely applied to the high-precision mechanical part processing, material detection and biomedical technology and has great market prospect and development potential, and the development of the ultraviolet picosecond laser light source with high stability and high efficiency is an important direction for the current researchers to pay attention to.
At present, no corresponding laser gain crystal exists in the ultraviolet band laser. Therefore, the output method of laser for obtaining 355nm ultraviolet band mainly utilizes nonlinear frequency conversion. In 1980, R.S. Craxton proposed the high-efficiency third harmonic generation theory of Nd-glass laser; in 2001, N.Hodgson et al realized 355nm ultraviolet laser output with output power exceeding 12W by using diode end-pumped Nd: YVO4 laser; in 2006, c.x.wang et al completed the development of ultraviolet 355nm fundamental mode solid state lasers with output powers exceeding 30W; the rapid development of efficient and stable ultraviolet laser light sources is not further than the research on nonlinear crystals, and in recent years, nonlinear crystals with higher nonlinear coefficient, higher damage threshold and less absorption are continuously generated, such as CLBO crystals, LCB crystals, NLBO crystals and the like. As an important influence factor in the nonlinear frequency conversion process, the selection of the nonlinear crystal is important for improving the conversion efficiency in addition to the selection of the type.
At present, in the process of generating ultraviolet picosecond 355nm laser, 1064nm fundamental frequency light is generally generated by using Nd: YVO4 or Nd: YAG crystal, and then 355nm ultraviolet light is generated by frequency tripling thereof. The method specifically comprises the following steps: the power of 1064nm seed light is improved through the multi-stage amplification of the fundamental frequency light, then frequency multiplication is carried out to generate 532nm second harmonic and the conversion efficiency is controlled to be about 50%, the photon ratio of the 1064nm fundamental frequency light to the 532nm frequency multiplied light is close to 2:1, the light is incident into a sum frequency crystal, and finally the sum frequency generates 355nm ultraviolet output. The photon matching at 1064nm and 532nm is crucial for 355nm generation during sum frequency. The 532nm output determines the final 355nm output, while the 1064nm output determines the 532nm to 355nm conversion rate, i.e. the optimum crystal length for maximum conversion efficiency.
As shown in fig. 1, in the conventional scheme, a main laser 1, a frequency doubling crystal 2, and a sum frequency crystal 3 are included; because the output powers of 1064nm and 532nm are mutually restricted and the requirements on the crystal length and the beam quality are met, the conversion efficiency of 532nm has to be limited, so that the ratio of the number of 1064nm fundamental frequency light to 532nm frequency doubling light photons is close to 2:1, the length of the sum frequency crystal is shortened, and the influence of absorption and walk-off is reduced. However, since the conversion efficiency of 532nm is limited, the maximum output power of 355nm is also limited. Thus, in the conventional scheme, the power contradiction between 1064nm and 532nm directly affects the efficiency of 355nm generation and crystal selection.
Disclosure of Invention
In view of the above problems, the present invention aims to provide an ultraviolet picosecond 355nm laser with improved output efficiency.
In order to solve the technical problems, the invention adopts a technical scheme that: providing a 355nm laser, which comprises a frequency doubling light path, a first dichroic mirror, a 1064nm light path, a 532nm light path, a third dichroic mirror and a sum frequency crystal, wherein the frequency doubling light path, the first dichroic mirror, the 1064nm light path and the 532nm light path are sequentially arranged along a laser light path; the frequency doubling light path comprises a main laser and a frequency doubling crystal which are sequentially arranged along the laser light path; the 1064nm optical path comprises an auxiliary pump laser, a second dichroic mirror and a laser crystal which are sequentially arranged; the 532nm optical path comprises a reflecting mirror; the frequency doubling crystal is used for doubling the frequency of 1064nm fundamental frequency light into 532nm frequency doubled light.
In one embodiment, the master laser is a 1064nm picosecond laser.
In one embodiment, the dichroic mirror is a polarizing beamsplitter.
In one embodiment, the first dichroic mirror reflects 1064nm light and transmits 532nm light.
In one embodiment, the third dichroic mirror reflects 532nm light and transmits 1064nm light.
In one embodiment, the auxiliary pump laser includes, but is not limited to, one of a 808nm pump laser, a 878nm pump laser, and an 885nm pump laser.
In one embodiment, the second dichroic mirror reflects 1064nm light and transmits 808nm, 878nm, and 885nm equal wavelength light.
In one embodiment, the laser crystal includes, but is not limited to, one of Nd: YVO4 or Nd: YAG crystal.
In one embodiment, the frequency doubling crystal is a nonlinear crystal which doubles 1064nm to 532 nm; including but not limited to one of LBO crystals or BBO crystals.
In one embodiment, the sum frequency crystal is a nonlinear crystal capable of generating light with wavelength of 355 nm; including but not limited to one of LBO crystals or BBO crystals.
The invention aims to overcome the limitation of the traditional scheme and provide an ultraviolet picosecond 355nm laser for improving the output efficiency, the method can effectively improve the 355nm conversion efficiency, can reduce the requirement of sum frequency crystal length, can reduce the influence of absorption and walk-off effect on 355nm laser pulse, and improves the beam quality; the ultraviolet picosecond 355nm laser provided by the invention has the advantages of simple structure, scientificity, effectiveness and strong practicability.
Drawings
FIG. 1 is a schematic block diagram of a logic structure of a conventional 355nm laser;
FIG. 2 is a block diagram of a UV picosecond 355nm laser according to the present invention.
Detailed Description
The 355nm laser provided by the invention is specifically described below with reference to fig. 2.
In the process of generating ultraviolet 355nm picosecond laser pulses, the matching ratio of different power densities of 1064nm fundamental frequency light and 532nm frequency doubling light has great influence on the generation of 355 nm. The output power of 532nm determines the final output power of 355nm, and the power of 1064nm determines the conversion rate of 532nm to 355nm, i.e. the optimum crystal length for the highest conversion efficiency. Because 532nm frequency doubling light is generated by frequency doubling of 1064nm fundamental frequency light, the power of 1064nm fundamental frequency light and 532nm frequency doubling light cannot be considered simultaneously in the traditional scheme.
As shown in fig. 2, the present invention provides a 355nm laser, which includes a frequency doubling optical path, a first dichroic mirror 3, a 1064nm optical path, a 532nm optical path, a third dichroic mirror 7, and a sum frequency crystal 8, which are sequentially arranged along a laser optical path; the frequency doubling light path comprises a main laser 1 and a frequency doubling crystal 2 which are sequentially arranged along the laser light path; the 1064nm optical path comprises an auxiliary pump laser 6, a second dichroic mirror 4 and a laser crystal 5 which are sequentially arranged; the 532nm optical path comprises a mirror 9.
The main laser 1 generates 1064nm pulse laser, 532nm frequency doubling light and residual 1064nm fundamental frequency light are generated after frequency doubling by the frequency doubling crystal 2, and the 532nm frequency doubling light and the residual 1064nm fundamental frequency light are transmitted by the first dichroic mirror 3 and the 532nm frequency doubling light and enter a 532nm light path; the rest of the 1064nm fundamental frequency light is reflected and enters a 1064nm optical path. The 1064nm laser is a 1064nm picosecond laser and can also be in a nanosecond level; as a preferred embodiment of the present invention, a 1064nm picosecond laser is used as the primary laser 1. As a preferred embodiment of the present invention, the frequency doubling crystal 2 is a nonlinear crystal capable of frequency doubling 1064nm to 532 nm; preferably LBO crystals or BBO crystals. As a preferred embodiment of the present invention, the dichroic mirror may also be a polarizing beam splitter.
In the 1064nm optical path, the rest of the 1064nm fundamental frequency light is reflected by the first dichroic mirror 3 and then enters the second dichroic mirror 4, and the rest of the 1064nm fundamental frequency light is reflected by the second dichroic mirror 4 and then enters the laser crystal 5, wherein the laser crystal 5 includes but is not limited to one of Nd: YVO4 or Nd: YAG crystal.
As a preferred embodiment of the present invention, the laser crystal 5 is preferably a Nd: YVO4 crystal. And an auxiliary pump laser 6 is further included in the 1064nm optical path, and the pump light output by the auxiliary pump laser 6 passes through the second dichroic mirror 4 and enters the Nd: YVO4 crystal together with the rest of the 1064nm fundamental frequency light. The pump light output by the auxiliary pump laser 6 passes through the second double-color mirror 4 and then pumps the laser crystal 5, and the power of the rest 1064nm fundamental frequency light amplified by the Nd: YVO4 crystal is more than half of the power of 532nm double-frequency light. The rest 1064nm fundamental frequency light is amplified by Nd: YVO4 crystal and then enters the third dichroic mirror 7, and is transmitted and then enters the sum frequency crystal 8. Thus, the optimal photon number ratio of the 1064nm fundamental frequency light to the 532nm frequency doubling light is obtained.
In the 532nm light path and the following light path, 532nm frequency doubling light reaches the third dichroic mirror 7 after being reflected by the reflecting mirror 9, is reflected to the sum frequency crystal 8, and then is subjected to the combined action with 1064nm fundamental frequency light after power amplification to sum frequency to generate 355nm ultraviolet light.
Because the power of 1064nm fundamental frequency light is no longer limited by 532nm frequency doubling light power, the conversion rate from 532nm to 355nm is improved, and the maximum output power of 355nm wavelength light is ensured.
As a preferred embodiment, the auxiliary pump laser 6 is one of a 808nm pump laser, a 878nm pump laser and an 885nm pump laser. As a preferred embodiment, sum frequency crystal 8 is a nonlinear crystal that can produce 355nm light; including but not limited to LBO crystals or BBO crystals.
In one embodiment, the second dichroic mirror 4 reflects 1064nm light and transmits 808nm, 878nm, and 885nm wavelength light.
The invention aims to overcome the limitation of the traditional scheme and provide an ultraviolet picosecond 355nm laser for improving the output efficiency, wherein a frequency doubling crystal is used for carrying out frequency doubling on 1064nm basic frequency light to generate 532nm second harmonic, then the 1064nm basic frequency light is separated and amplified, and the generated second harmonic 532nm laser and the amplified 1064nm laser of the basic frequency light are subjected to sum frequency in a sum frequency crystal to obtain 355nm laser. The method can break through the contradiction between fundamental frequency light and frequency doubling light in the traditional method, can effectively improve the 355nm conversion efficiency, and can reduce the requirement on the length of a frequency neutralization crystal in the process of sum frequency; meanwhile, the influence of absorption and walk-off effects on 355nm laser pulses can be reduced, the damage risk of a frequency doubling crystal is reduced, the output power of the ultraviolet picosecond 355nm laser can be improved by more than 40% compared with that of the traditional scheme under the condition of low-power fundamental frequency light incidence, and the beam quality can be improved; the ultraviolet picosecond 355nm laser provided by the invention has the advantages of simple structure, scientificity, effectiveness and strong practicability.
The above description is only an embodiment of the present invention, and not intended to limit the scope of the present invention, and all modifications of equivalent structures and equivalent processes performed by the present specification and drawings, or directly or indirectly applied to other related technical fields, are included in the scope of the present invention.
Claims (10)
1. A355 nm laser is characterized by comprising a frequency doubling light path, a first dichroic mirror, a 1064nm light path, a 532nm light path, a third dichroic mirror and a sum frequency crystal which are sequentially arranged along a laser light path; the frequency doubling light path comprises a main laser and a frequency doubling crystal which are sequentially arranged along the laser light path; the 1064nm optical path comprises an auxiliary pump laser, a second dichroic mirror and a laser crystal which are sequentially arranged; the 532nm optical path comprises a reflecting mirror; the frequency doubling crystal is used for doubling the frequency of 1064nm fundamental frequency light into 532nm frequency doubled light.
2. The 355nm laser of claim 1, wherein the master laser is a 1064nm picosecond laser or a nanosecond laser.
3. The 355nm laser of claim 1, wherein the dichroic mirror is a polarizing beamsplitter.
4. The 355nm laser of claim 1, wherein the first dichroic mirror reflects 1064nm light and transmits 532nm light.
5. The 355nm laser of claim 1, wherein the third dichroic mirror reflects 532nm light and transmits 1064nm light.
6. The 355nm laser as claimed in claim 1, wherein the auxiliary pump laser is any one of a 808nm pump laser, a 878nm pump laser and an 885nm pump laser.
7. The 355nm laser of claim 1, wherein the second dichroic mirror reflects 1064nm light and transmits 808nm, 878nm, or 885nm wavelength light.
8. The 355nm laser as claimed in claim 1, wherein the laser crystal is Nd: YVO4Or Nd is YAG crystal.
9. The 355nm laser of claim 1, wherein the frequency doubling crystal is a nonlinear crystal that doubles 1064nm light to 532nm light; LBO crystal or BBO crystal.
10. The 355nm laser of claim 1, wherein the sum frequency crystal is a nonlinear crystal that can produce 355nm light; including LBO crystals or BBO crystals.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201911190877.0A CN111106520A (en) | 2019-11-28 | 2019-11-28 | 355nm laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201911190877.0A CN111106520A (en) | 2019-11-28 | 2019-11-28 | 355nm laser |
Publications (1)
Publication Number | Publication Date |
---|---|
CN111106520A true CN111106520A (en) | 2020-05-05 |
Family
ID=70420965
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201911190877.0A Pending CN111106520A (en) | 2019-11-28 | 2019-11-28 | 355nm laser |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN111106520A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112134125A (en) * | 2020-09-22 | 2020-12-25 | 天津大学 | Device and method for sum-frequency generation of ultraviolet light based on fundamental frequency amplification |
CN113036581A (en) * | 2021-03-24 | 2021-06-25 | 镭泽精密制造(苏州)有限公司 | Laser with adjustable light source precision |
CN113708195A (en) * | 2020-10-21 | 2021-11-26 | 北京科益虹源光电技术有限公司 | Laser sum frequency generation system and sum frequency method |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006308908A (en) * | 2005-04-28 | 2006-11-09 | Nikon Corp | Duv light source device and laser machining apparatus |
CN101436753A (en) * | 2008-12-26 | 2009-05-20 | 北京工业大学 | Laser cavity external frequency multiplication system |
CN102088158A (en) * | 2010-12-22 | 2011-06-08 | 北京中科思远光电科技有限公司 | Method and device for obtaining high-power ultraviolet laser light |
US8373924B2 (en) * | 2011-05-25 | 2013-02-12 | Coherent, Inc. | Frequency-tripled fiber MOPA |
CN106410583A (en) * | 2016-06-17 | 2017-02-15 | 北京国科世纪激光技术有限公司 | Intracavity frequency doubling enhanced laser |
CN108054628A (en) * | 2017-12-05 | 2018-05-18 | 深圳市创鑫激光股份有限公司 | Control system, laser, the equipment with laser of laser |
CN110137785A (en) * | 2019-05-28 | 2019-08-16 | 北京科益虹源光电技术有限公司 | A kind of narrow linewidth excimer laser system and linewidth compression and the method for shaping |
-
2019
- 2019-11-28 CN CN201911190877.0A patent/CN111106520A/en active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006308908A (en) * | 2005-04-28 | 2006-11-09 | Nikon Corp | Duv light source device and laser machining apparatus |
CN101436753A (en) * | 2008-12-26 | 2009-05-20 | 北京工业大学 | Laser cavity external frequency multiplication system |
CN102088158A (en) * | 2010-12-22 | 2011-06-08 | 北京中科思远光电科技有限公司 | Method and device for obtaining high-power ultraviolet laser light |
US8373924B2 (en) * | 2011-05-25 | 2013-02-12 | Coherent, Inc. | Frequency-tripled fiber MOPA |
CN106410583A (en) * | 2016-06-17 | 2017-02-15 | 北京国科世纪激光技术有限公司 | Intracavity frequency doubling enhanced laser |
CN108054628A (en) * | 2017-12-05 | 2018-05-18 | 深圳市创鑫激光股份有限公司 | Control system, laser, the equipment with laser of laser |
CN110137785A (en) * | 2019-05-28 | 2019-08-16 | 北京科益虹源光电技术有限公司 | A kind of narrow linewidth excimer laser system and linewidth compression and the method for shaping |
Non-Patent Citations (1)
Title |
---|
张旭东等: "基于基频放大的紫外皮秒355nm输出效率提升系统", 《物理学报》 * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112134125A (en) * | 2020-09-22 | 2020-12-25 | 天津大学 | Device and method for sum-frequency generation of ultraviolet light based on fundamental frequency amplification |
CN112134125B (en) * | 2020-09-22 | 2024-08-20 | 天津大学 | Sum frequency ultraviolet light generating device and method based on fundamental frequency amplification |
CN113708195A (en) * | 2020-10-21 | 2021-11-26 | 北京科益虹源光电技术有限公司 | Laser sum frequency generation system and sum frequency method |
CN113036581A (en) * | 2021-03-24 | 2021-06-25 | 镭泽精密制造(苏州)有限公司 | Laser with adjustable light source precision |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN111106520A (en) | 355nm laser | |
CN102368588B (en) | Method for improving contrast of ultrashort pulse | |
CN118920255A (en) | High power laser converter based on patterned SRB4BO7 or PBB4O7 crystals | |
CN111048982A (en) | 355nm ultraviolet light output method and system | |
CN107863682A (en) | Realize 1064nm to the nonlinear optics converter plant of multi-wavelength feux rouges | |
CN112134125B (en) | Sum frequency ultraviolet light generating device and method based on fundamental frequency amplification | |
CN101202405A (en) | Method of Obtaining 192nm Ultraviolet Laser by Using 7-fold Frequency Doubling of 1342nm Laser | |
CN111916987A (en) | High efficiency solid state UV laser | |
EP4018259B1 (en) | Optical parametric chirped-pulse amplifier | |
Creeden et al. | Pulsed Tm-doped fiber lasers for mid-IR frequency conversion | |
Igarashi et al. | Generation of 10W, 1ns Deep Ultraviolet Pulse at 193nm | |
Suzuki et al. | Hundred mJ, sub-picoseconds, high temporal contrast OPCPA/Yb: YAG ceramic thin disk hybrid laser system | |
Creeden et al. | Multi-watt mid-IR fiber-pumped OPO | |
CN1241305C (en) | Method for producing optical parametric chirped pulse amplification synchronous pumping light | |
Bai et al. | High stability industrial-grade Nd: YVO4 picosecond laser amplifier with high average output power | |
Finch et al. | All-solid-state, tenable, high power UV generation by sum-frequency-mixing in CLBO | |
Kaneda et al. | All-solid-state sub-200-nm pulsed deep ultraviolet source | |
Saby et al. | High average and peak power pulsed fiber lasers at 1030 nm, 515 nm, and 343 nm | |
Xu et al. | 52 mJ CEP-stable sub-2-cycle 1.7 μm laser based on DC-OPA | |
Novák | High power wavelength conversion of picosecond pulses at 1030 nm from deep-UV to mid-IR | |
Golubyatnikov et al. | Generation of single-mode blue radiation by two steps sum frequency mixing in LBO crystal | |
Hemmer et al. | Current status of the HERACLES, a millijoule level, multi kHz, few-cycle, and CEP stabilized OPCPA system | |
Tóth et al. | Cascaded extraction OPCPA–a highly efficient power amplifier design | |
Agnesi et al. | High energy amplification of a continuous wave mode-locked picosecond Nd: YVO 4 laser by a pulsed grazing-incidence slab amplifier | |
Couvin et al. | Singly resonant OPO pumped by a pulsewidth-tunable hybrid MOPA source |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
CB03 | Change of inventor or designer information |
Inventor after: Wang Jiazan Inventor after: Jiang Rui Inventor after: Zhang Xudong Inventor after: Chu Yuxi Inventor after: Chen Binbin Inventor before: Wang Jiazan Inventor before: Zhang Xudong Inventor before: Chu Yuxi Inventor before: Chen Binbin |
|
CB03 | Change of inventor or designer information | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20200505 |
|
RJ01 | Rejection of invention patent application after publication |