CN111041417A - TiAISiN composite coating for machining special material cutter and preparation method thereof - Google Patents
TiAISiN composite coating for machining special material cutter and preparation method thereof Download PDFInfo
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- CN111041417A CN111041417A CN201911258012.3A CN201911258012A CN111041417A CN 111041417 A CN111041417 A CN 111041417A CN 201911258012 A CN201911258012 A CN 201911258012A CN 111041417 A CN111041417 A CN 111041417A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
- C23C14/0652—Silicon nitride
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
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- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a TiAISiN composite coating for processing a special material cutter and a preparation method thereof, wherein the TiAISiN composite coating comprises a multilayer gradual change coating which is combined on a nitride layer on the surface of the special material cutter and has the thickness of 2-5 mu m, and the multilayer gradual change coating comprises an AITiN layer, a TiSiN layer and Si3N4A layer, and the surface Vickers hardness of the multilayer graded coating is higher than HV 4000. When the TiAISiN composite coating prepared by the method is applied to a cutter for processing special materials, the physical property between the substrate and the coating can be well improved, and the hardness and the heat-resistant temperature of the cutter for processing special materials are greatly improved, so that the service life of the cutter for processing special materials is prolonged, the production cost is reduced, and the productivity is improved.
Description
Technical Field
The invention belongs to the technical field of coating materials, and particularly relates to a TiAISiN composite coating for processing a special material cutter and a preparation method thereof.
Background
With the development of aerospace industry, nuclear industry, weapon industry, chemical industry, electronic industry and modern mechanical industry, various high-level requirements are made on the performance of product part materials, new materials are emerging continuously, but almost all new materials are special materials difficult to process. The method mainly comprises the following steps: stainless steel, high temperature alloy, superhigh temperature alloy, titanium alloy, hardened steel with HRC hardness of 40-65, high manganese steel, etc.
The reason why the above materials are difficult to process is generally the following: high hardness, high strength, high plasticity and toughness, low plasticity and brittleness, low thermal conductivity, microscopic hard particles or hard inclusions, and active chemical properties. The characteristics of the new engineering material generally can increase the cutting force in the cutting process, increase the cutting temperature and reduce the durability of the cutter; sometimes, the quality of the processed surface is deteriorated, and the cutting is difficult to control; eventually, the processing efficiency and the processing quality are deteriorated.
At present, the common TIAISiN composite coating is mainly used for processing cutters made of special materials, the processing temperature of the coating is 1000-1200 ℃, the binding force between a cutter substrate and the coating is weakened in a high-temperature section, and the coating on the surface of the cutter can be rapidly abraded and shed after long-term work.
Therefore, the invention provides the TiAISiN composite coating for processing the special material cutter and the preparation method thereof, and the composite coating has the advantages of high hardness, high temperature resistance and high bonding force. The TIAISiN composite coating prepared by the method is widely applied to coatings on milling, drilling and turning tools, is particularly suitable for cutting and processing stainless steel, titanium alloy, high-temperature alloy and hardened steel with the hardness of more than HRC50, and can prolong the service life of the tools by 6 times.
Disclosure of Invention
In order to overcome the technical defects, the problems of limited improvement degree of the cutter performance and the like of the conventional metal-doped simple coating process are solved, the hardness and the processing temperature of the special material processing cutter are further improved, and the service life of the special material processing cutter is further prolonged. The invention provides a TiAISiN composite coating for processing a special material cutter and a preparation method thereof. The composite coating has the capabilities of high hardness, high temperature resistance and strong bonding force.
The invention provides a TiAISiN composite coating for processing a special material cutter and a preparation method thereof, wherein the TiAISiN composite coating comprises a multilayer gradient layer which is combined on a nitride layer on the surface of a substrate and has the thickness of 2-5 mu m, the multilayer gradient layer comprises an AITiN layer, a TiSiN layer and a Si3N4 layer, the Vickers hardness of the surface of the multilayer gradient layer is higher than HV4000, the film-substrate binding force of the TiAISiN composite coating is more than 60N, and the appearance of the TiAISiN composite coating is bronze.
The preparation method of the TiAISiN composite coating comprises the following steps:
s1: placing a substrate and three metal targets in a coating device with a vacuum chamber;
s2: forming a nitride layer on the surface of the substrate by adopting an ion nitriding method;
s3: carrying out plasma cleaning on the surface of the substrate;
s4: preparing a plurality of graded layers on the nitride layer to form the TiAISiN composite coating;
in step S1, the substrate is first subjected to polishing, acetone, pre-cleaning with absolute ethanol ultrasonic waves, etc. to remove defects, dirt, etc. on the surface of the substrate, and then dehydrated and dried to ensure the brightness and cleanness of the surface of the substrate, and then the cleaned substrate is placed on a work rest disposed in the vacuum chamber, and the work rest can simultaneously perform revolution and rotation, and the revolution and rotation speeds of the work rest are 4-9 r/min. The metal target and the workpiece frame are arranged in a plane-to-plane mode.
Further, in the step S2, the vacuum chamber is vacuumized to 1.5Pa, ammonia gas is introduced into the vacuum chamber, the pressure of the vacuum chamber is kept at 256Pa, then the working temperature of the vacuum chamber is heated to 500-530 ℃, the bias voltage of the substrate is-800V, the nitriding time is 9 hours, the surface nitriding depth of the substrate is 350-450 μm, and the nitride layer with the thickness of 4-8 μm is formed.
In step S3, the pressure in the vacuum chamber is pumped to 3 × 10-3Pa, and plasma argon for cleaning the substrate surface is introduced into the vacuum chamber, and the flow rate of the argon is slowly adjusted to 80sccm, then a negative bias is applied to the workpiece holder, and the bias is slowly increased from-400V to-600V, and the flow rate of the argon is synchronously controlled and slowly decreased to 50sccm during the bias changing process, and finally the pressure in the vacuum chamber is maintained at 0.3 Pa.
The step S4 is completed in three time periods, after the step S3 is completed, the pressure of the vacuum chamber is kept at 0.3Pa, the flow of argon is controlled to be 40sccm and the flow of nitrogen is controlled to be 100sccm in the first time period, a first metal target of the three metal targets is started, the current of the first metal target is adjusted to be 80A, the negative bias of the substrate is-250V, and the deposition time is 25min, so that a first layer of coating is formed; in a second time period, controlling the flow rate of argon to be kept at 15sccm, adjusting the pressure of the vacuum chamber to be 0.45Pa, adjusting the bias voltage of the substrate to be-150V, keeping the current of a second metal target of the three metal targets at 175A, and depositing for 25min to form a second coating; and in a third time period, adjusting the bias voltage of the substrate to-180V, keeping the current of a third metal target in the three metal targets at 185A, and depositing for 15min to form a third layer of coating.
After the technical scheme is adopted, compared with the prior art, the method has the following beneficial effects: when the TiAISiN composite coating prepared by the method is applied to a special material processing cutter, the physical property between the substrate and the coating can be well improved, and the hardness and the heat-resistant temperature of the special material processing cutter are greatly improved, so that the service life of the special material processing cutter is prolonged, the production cost is reduced, and the productivity is improved.
Drawings
FIG. 1 is a schematic structural view of an ion nitriding and cathodic arc ion composite coating apparatus according to the present invention.
1-vacuum Chamber
2-workpiece holder
3-high purity gas supply system
4-vacuum pumping system
5-first Metal target (i.e., AITi target)
6-second Metal target (i.e., TiSi target)
7-third Metal target (i.e. Si target)
8-pulse power supply
9-Hall ion power supply
10-coating equipment 10.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention more apparent, embodiments of the present invention will be described in detail below with reference to the accompanying drawings. However, it will be appreciated by those of ordinary skill in the art that numerous technical details are set forth in order to provide a better understanding of the present invention in its various embodiments. However, the technical solution claimed in the present invention can be implemented without these technical details and various changes and modifications based on the following embodiments.
The advantages of the invention are further illustrated in the following description of specific embodiments in conjunction with the accompanying drawings.
The embodiment provides a TiAISiN composite coating for processing a special material cutter and a preparation method thereof, wherein the TiAISiN composite coating comprises a multi-layer gradient layer which is combined on a nitride layer on the surface of a base body and has the thickness of 2-5 mu m, and the multi-layer gradient layer comprises an AITiN layer, a TiSiN layer and a Si3N4 layer. The surface Vickers hardness of the TiAISiN composite coating is higher than HV4000, the film-substrate binding force is more than 60N, and the appearance of the TiAISiN composite coating is bronze.
In order to prepare the TiAISiN composite coating, the invention provides a coating device 10 with a vacuum chamber 1, wherein a workpiece frame 2 for placing a substrate is arranged in the vacuum chamber 1, at least three metal targets are arranged on the inner wall of the vacuum chamber 1, and are respectively a first metal target 5 (namely an AITi target), a second metal target 6 (namely an SiTi target) and a third metal target 7 (namely an Si target) in sequence, the three metal targets are 500mm multiplied by 50mm multiplied by 10mm in size, and are arranged on the inner wall of the vacuum chamber 1 in the coating device 10 at intervals of a certain angle;
the coating equipment 10 is provided with a high purity gas supply system 3 for introducing a high purity gas into the vacuum chamber 1, and a vacuum pumping system 4 for pumping vacuum in the vacuum chamber 1. The coating equipment 10 is also provided with a pulse power supply 8 and a Hall ion power supply 9 which are used for controlling the generation of the pulse power supply and the Hall ion power supply.
The preparation method of the TiAISiN composite coating comprises the following steps:
step S1: in a coating apparatus 10 having a vacuum chamber 1, a substrate (i.e., a cemented carbide tool (YG6) or a YG6 cemented carbide test block sample) which was pretreated and dried was placed on a work holder 2 in the vacuum chamber 1, and three metal targets were placed. The pretreatment comprises the following steps: the defects of burrs and the like on the surface of the cutter are removed through polishing, the smoothness of the surface of the cutter is improved, then the cutter is immersed in ultrasonic waves for pre-cleaning, dirt on the surface of the cutter is removed through the action of acetone and absolute ethyl alcohol ultrasonic waves, and the surface of the cutter is guaranteed to be bright and clean after the cutter is cleaned, dehydrated and dried. At least three metal targets, namely a first metal target 5 (namely an AITi target), a second metal target 6 (namely an SiTi target) and a third metal target 7 (namely an Si target) are sequentially and respectively arranged on the inner wall of the vacuum chamber 1, the three metal targets have the size of 500mm multiplied by 50mm multiplied by 10mm, and are spaced at a certain angle;
step S2: forming a nitride layer on the surface of the matrix by adopting an ion nitriding method, after the matrix is arranged in a vacuum chamber 1, vacuumizing the vacuum chamber 1 to 1.5Pa by using a vacuumizing system 4, adopting high-purity ammonia gas as a reaction gas for ion nitriding and introducing the high-purity ammonia gas into the vacuum chamber 1 from a high-purity gas supply system 3, keeping the pressure of the vacuum chamber 1 at 256Pa, then heating the working temperature of the vacuum chamber 1 to 500-530 ℃, enabling the surface of the matrix to be biased at-800V and nitriding time to last for 9 hours, and enabling the surface of the matrix to be nitrided to be 350-450 microns in depth to form a nitride layer with the thickness of 4-8 microns;
step S3: plasma cleaning the surface of the substrate, and pumping the pressure of the vacuum chamber 1 to 3 × 10-3Pa, introducing argon into the vacuum chamber 1 from the high-purity gas supply system 3, slowly adjusting the flow rate of the argon to 80sccm, then adding negative bias on the substrate, slowly increasing the bias from-400V to-600V, synchronously controlling the flow rate of the argon to slowly reduce to 50sccm in the process of changing the bias, finally maintaining the pressure at 0.3Pa, and removing small particles on the surface of the substrate through the high-purity argon to realize a plasma cleaning process;
step S4: preparing a plurality of graded layers on the nitride layer prepared in the step S2 to form the tiassin composite coating. The process is divided into three stages:
in the first stage, the pressure of the vacuum chamber 1 is adjusted to 0.3Pa by the vacuum pumping system 4, the flow rate of argon is controlled to be 40sccm and the flow rate of nitrogen is controlled to be 100sccm by the high-purity gas supply system 3, the first metal target 5 (namely the AITi target) is started, the current of the first metal target 5 is adjusted to be 80A, the substrate negative bias is-250V, the deposition time is 25min, an AITiN layer is formed, and the second metal target 6 (namely the SiTi target) and the third metal target 7 (namely the Si target) are in a closed state;
in the second stage, the flow rate of argon is controlled by a high-purity gas supply system 3 to be kept at 15sccm, the pressure in the vacuum chamber 1 is adjusted to be 0.45Pa, the bias voltage of the substrate is adjusted to be-150V, the target current of the second metal target 6 is kept at 175A, the deposition time is 25min, a SiTiN layer is formed, and in the second stage, the first metal target 5 and the third metal target 7 are in a closed state;
in the third stage, the substrate bias is adjusted to-180V, the target current of the third metal target 7 is kept at 185A, and the deposition time is 15min to form Si3N4The layers, at this stage, the first metal target 5 (i.e., the AITi target), the second metal target 6 (i.e., the SiTi target) are in the off state.
In the three stages of forming the TiAISiN composite coating, the workpiece frame 2 simultaneously performs revolution and rotation, so as to ensure that the surface of the coating film required by the substrate obtains uniform ion deposition, and the process of forming the TiAISiN composite coating relates to the following key chemical reactions:
through the inventionThe TiAISiN composite coating prepared by the process has the advantages of bronze appearance, smooth surface, Vickers hardness of 4000HV, and film-substrate bonding force>60N, the coating thickness is 1 μm according to different application places, and the friction pair is AI2O3The friction coefficient of the ball is 0.15-0.2.
It should be noted that the embodiments of the present invention have been described in terms of preferred embodiments, and not by way of limitation, and that those skilled in the art can make modifications and variations of the embodiments described above without departing from the spirit of the invention.
Claims (8)
1. The TiAISiN composite coating for processing the special material cutter is characterized by comprising a multilayer gradient layer which is combined on a nitride layer on the surface of a base body and has the thickness of 2-5 mu m, wherein the multilayer gradient layer comprises an AITiN layer, a TiSiN layer and a Si layer3N4A layer, and the surface Vickers hardness of the multi-layer graded layer is higher than HV 4000.
2. The TiAISiN composite coating for machining cutting tools of special materials according to claim 1, wherein the TiAISiN composite coating has a film-based bonding force > 60N.
3. The TiAISiN composite coating for machining tools of special materials according to claim 1, wherein the TiAISiN composite coating has a bronze appearance.
4. A preparation method of the TiAISiN composite coating for processing the special material cutter is characterized by comprising the following steps:
s1: placing a substrate and three metal targets in a coating device with a vacuum chamber;
s2: forming a nitride layer on the surface of the substrate by adopting an ion nitriding method;
s3: carrying out plasma cleaning on the surface of the substrate;
s4: preparing a plurality of graded layers on the nitride layer to form the TiAISiN composite coating;
the substrate is placed on a workpiece frame arranged in the vacuum chamber, and the metal target and the workpiece frame are placed in an opposite plane.
5. The method for preparing the TiAISiN composite coating for machining the special material cutter as claimed in claim 4, wherein the method comprises the following steps: in the step S2, the vacuum chamber is vacuumized to 1.5Pa, ammonia gas is introduced into the vacuum chamber, the pressure of the vacuum chamber is kept at 256Pa, then the working temperature of the vacuum chamber is heated to 500-530 ℃, the bias voltage of the substrate is-800V, the nitriding time is 9 hours, the surface nitriding depth of the substrate is 350-450 μm, and the nitride layer with the thickness of 4-8 μm is formed.
6. The method for preparing the TiAISiN composite coating for machining the special material cutter as claimed in claim 4, wherein the method comprises the following steps: in step S3, the pressure in the vacuum chamber is pumped to 3 × 10-3Pa, and plasma argon for cleaning the substrate surface is introduced into the vacuum chamber, and the flow rate of the argon is slowly adjusted to 80sccm, then a negative bias is applied to the workpiece holder, and the bias is slowly increased from-400V to-600V, and the flow rate of the argon is synchronously controlled and slowly decreased to 50sccm during the bias changing process, and finally the pressure in the vacuum chamber is maintained at 0.3 Pa.
7. The method for preparing the TiAISiN composite coating for machining the special material cutter as claimed in claim 4, wherein the method comprises the following steps: the step S4 is completed in three time periods, after the step S3 is completed, the pressure of the vacuum chamber is kept at 0.3Pa, the flow of argon is controlled to be 40sccm and the flow of nitrogen is controlled to be 100sccm in the first time period, a first metal target of the three metal targets is started, the current of the first metal target is adjusted to be 80A, the negative bias of the substrate is-250V, and the deposition time is 25min, so that a first layer of coating is formed; in a second time period, controlling the flow rate of argon to be kept at 15sccm, adjusting the pressure of the vacuum chamber to be 0.45Pa, adjusting the bias voltage of the substrate to be-150V, keeping the current of a second metal target of the three metal targets at 175A, and depositing for 25min to form a second coating; and in a third time period, adjusting the bias voltage of the substrate to-180V, keeping the current of a third metal target in the three metal targets at 185A, and depositing for 15min to form a third layer of coating.
8. The method for preparing the TiAISiN composite coating for machining the special material cutter as claimed in claim 4, wherein the method comprises the following steps: the workpiece frame can simultaneously perform revolution and rotation, and the revolution and rotation rotating speed of the workpiece frame is 4-9 r/min.
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| CN201911258012.3A CN111041417A (en) | 2019-12-10 | 2019-12-10 | TiAISiN composite coating for machining special material cutter and preparation method thereof |
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| CN201911258012.3A CN111041417A (en) | 2019-12-10 | 2019-12-10 | TiAISiN composite coating for machining special material cutter and preparation method thereof |
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| CN101157289A (en) * | 2007-11-13 | 2008-04-09 | 江苏科技大学 | AIN/Si*N* nanometer multi-layer horniness coatings as well as its preparing method |
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2019
- 2019-12-10 CN CN201911258012.3A patent/CN111041417A/en active Pending
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|---|---|---|---|---|
| CN101157289A (en) * | 2007-11-13 | 2008-04-09 | 江苏科技大学 | AIN/Si*N* nanometer multi-layer horniness coatings as well as its preparing method |
| CN104789933A (en) * | 2015-04-28 | 2015-07-22 | 重庆文理学院 | Nano composite coating and deposition method thereof |
| CN105112858A (en) * | 2015-08-31 | 2015-12-02 | 科汇纳米技术（深圳）有限公司 | Nano composite cutting tool coating of multilayer structure |
| CN106756833A (en) * | 2016-12-28 | 2017-05-31 | 上海理工大学 | A kind of high rigidity TiCrN/TiSiN nano-multilayered structures coatings and preparation method thereof |
| CN108977775A (en) * | 2018-07-18 | 2018-12-11 | 南京理工大学 | A kind of TiAlSiN coated cutting tool preparation process |
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| Title |
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| HALIL CALISKAN ET AL.: "Effect of Multilayer Nanocomposite TiAlSiN/TiSiN/TiAlN Coating on Wear Behavior of Carbide Tools in the Milling of Hardened AISI D2 Steel", 《JOURNAL OF NANO RESEARCH》 * |
| 王世清: "《孔加工技术》", 31 October 1993, 石油工业出版社 * |
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