CN111009615B - Method for preparing high-quality perovskite layer by methyl amine chloride doping evaporation method - Google Patents

Method for preparing high-quality perovskite layer by methyl amine chloride doping evaporation method Download PDF

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CN111009615B
CN111009615B CN201911346966.XA CN201911346966A CN111009615B CN 111009615 B CN111009615 B CN 111009615B CN 201911346966 A CN201911346966 A CN 201911346966A CN 111009615 B CN111009615 B CN 111009615B
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CN111009615A (en
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夏锐
陈达明
陈奕峰
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Trina Solar Co Ltd
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    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
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    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/15—Deposition of organic active material using liquid deposition, e.g. spin coating characterised by the solvent used
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Abstract

The invention provides a method for preparing a high-quality perovskite layer by a methyl amine chloride doping evaporation method, and belongs to the technical field of solar cells. It comprises the following steps: A. cleaning to obtain a clean substrate, B, co-evaporating lead iodide and methyl ammonium chloride powder onto the substrate by using a thermal evaporator to obtain a sample, C, soaking the sample obtained in the step B into an isopropanol solvent, D, taking out the sample, placing the sample on a heating table, heating and evaporating to dryness, and E, evaporating methyl ammonium iodide onto the sample by using the thermal evaporator to obtain a perovskite layer; or dropwise adding the methyl amine iodide solution onto the sample, spin-coating and heating to obtain the perovskite layer. The invention has the advantages of easy control, low cost and high film quality.

Description

Method for preparing high-quality perovskite layer by methyl amine chloride doping evaporation method
Technical Field
The invention belongs to the technical field of solar cells, and relates to a method for preparing a high-quality perovskite layer by a methyl amine chloride doping evaporation method.
Background
Titanium ore solar cells are an emerging class of photovoltaic technologies that have received worldwide attention due to the advantages of high conversion efficiency and low cost. The perovskite solar cell consists of a substrate, a charge transport layer, a perovskite layer and electrodes, and the energy conversion efficiency of the perovskite layer is directly influenced by the quality of the perovskite layer. The evaporation method is one of the commonly used preparation methods of the perovskite layer, and has the characteristics of smooth membrane preparation, compact structure, high repeatability, suitability for large-area preparation and the like. Perovskite material methylamine lead iodide tris (MAPbI) 3 ) For example, researchers have been able to utilize a dual source evaporation method, i.e., using lead iodide (PbI) 2 ) And Methyl Amine Iodide (MAI), the method needs to strictly regulate and control the evaporation rates of the two sources to achieve the purposes of reducing defects and fully reacting, so that the method has the defects of high cost and difficult control. The single-source evaporation method is adopted, namely the method for evaporating lead iodide firstly and then depositing the methyl ammonium iodide to generate the subsequent reaction to generate the perovskite, and the lead iodide prepared by the evaporation method is too compact, so that the methyl ammonium iodide is not easy to enter the lead iodide to generate the reaction, and excessive lead iodide residue is causedThe perovskite thin film prepared has poor quality.
Disclosure of Invention
The invention aims to solve the problems and provides a method for preparing a high-quality perovskite layer by a methyl amine chloride doping evaporation method.
In order to achieve the purpose, the invention adopts the following technical scheme:
a method for preparing a high-quality perovskite layer by a methyl amine chloride doping evaporation method comprises the following steps:
A. the substrate is cleaned to obtain a clean substrate,
B. co-evaporating lead iodide and methyl ammonium chloride powder onto a substrate by using a thermal evaporator to obtain a sample,
C. b, putting the sample obtained in the step B into an isopropanol solvent for soaking,
D. taking out the sample, placing the sample on a heating table, heating and evaporating to dryness,
E. evaporating methyl amine iodide onto the sample by using a thermal evaporator to obtain a perovskite layer; or dropwise adding the methyl amine iodide solution onto the sample, spin-coating and heating to obtain the perovskite layer.
Further, in step a, the substrate is sequentially cleaned using deionized water, acetone, ethanol, deionized water, and isopropyl alcohol.
Further, in the step a, the substrate is ultrasonically cleaned with deionized water, acetone, ethanol, deionized water and isopropanol in sequence for 5-15 minutes each time.
Further, in step B, the molar ratio of lead iodide and methyl amine chloride powder is 1:1, degree of vacuum of 1 × 10 -3 -1*10 -4 Pa, and the heating temperature of the substrate is 70-120 ℃.
Further, in step E, the molar ratio of methyl amine iodide to lead iodide is 0.9.
Further, in the step B, the heating current is 10-50A, the evaporation rate is 5-30 g/cm.s, and the film thickness on the substrate after the evaporation is finished is 200-600nm.
Further, in the step C, the temperature of the isopropanol solvent is 25-26 ℃, and the soaking time is 1-20 minutes.
Further, in the step D, the heating temperature is 70-120 ℃, and the heating time is 5-60 minutes.
Further, in step E, the thickness of the perovskite film is 250-800nm.
Further, in step E, while the amine methyliodide is evaporated on the sample using a thermal evaporator to obtain a perovskite layer, the degree of vacuum of the evaporation process is maintained at 1 × 10 -3 -1*10 -4 Pa, heating current of 5-30A, evaporation rate of 1-20 g/square centimeter per second, and substrate heating temperature of 70-120 deg.C;
when the methyl amine iodide solution is dripped on a sample to be spin-coated and heated to obtain a perovskite layer, the methyl amine iodide solution is an isopropanol solution of the methyl amine iodide with the concentration of 5-20mg/mL, the spin-coating speed is 1000-6000rpm, a heating table is placed after the spin-coating, the heating temperature is 70-120 ℃, and the heating time is 5-60 minutes.
Compared with the prior art, the invention has the advantages that:
1. the film prepared by the invention has high quality. The lead iodide and the methyl ammonium chloride do not react, and after a film is obtained by using an evaporation method for co-deposition, a large amount of the methyl ammonium chloride in the film is removed by using the principle of selective dissolution of isopropanol to form a porous lead iodide structure, so that the methyl ammonium iodide is easy to enter the film to perform a full reaction. The methyl amine chloride dissolved in time plays a role in increasing crystal grains and reducing defects in the subsequent heating growth process of the perovskite.
2. All the components are separately prepared in the preparation process, and real-time monitoring is not needed, so that the method has the advantages of easiness in control, relatively low cost and good repeatability.
3. The invention is suitable for large-area preparation of the film and has wide commercial application prospect.
Additional advantages, objects, and features of the invention will be set forth in part in the description which follows and in part will become apparent to those having ordinary skill in the art upon examination of the following or may be learned from practice of the invention.
Drawings
FIG. 1 is a flow chart of the preparation process of the present invention.
Detailed Description
The invention is further described below with reference to the accompanying drawings.
Example 1
And (3) taking FTO conductive glass as a substrate, and sequentially ultrasonically cleaning the substrate material by using deionized water, acetone, ethanol, deionized water and isopropanol for 5-10 minutes each time. After being dried by nitrogen, the mixture is placed in an ozone cleaning machine for treatment for 15 minutes.
Putting the substrate into an evaporator, weighing 46.10mg of lead iodide and 6.75mg of methyl ammonium chloride crystal, putting the weighed materials into an evaporation boat as an evaporation source, and adjusting the background vacuum degree to 1 × 10 -3 Pa, heating current 10A, evaporation rate 5 g/cm · s. The substrate heating temperature is 70 ℃, the heating time is 60 minutes, the film thickness is 200nm after the evaporation, and the film is yellow.
100mL of isopropanol is put into a beaker, the temperature of the solvent is heated and adjusted to be 25 ℃, the sample is put into the beaker, and the sample is taken out after 20 min.
The sample was placed on a metal heating table at 70 ℃ and heated for 60 minutes to dry the sample.
Putting the sample into an evaporator, weighing 14.31mg of methyl amine iodide crystal, putting the methyl amine iodide crystal into an evaporation boat as an evaporation source, and adjusting the background vacuum degree to 5 x 10 -4 Pa, heating current 5A, evaporation rate 1 g/cm · s. The substrate heating temperature was 70 ℃ and the film thickness was about 250nm after the evaporation.
Example 2
And (3) taking FTO conductive glass as a substrate, and respectively ultrasonically cleaning the substrate material by using deionized water, acetone, ethanol, deionized water and isopropanol for 8 minutes each time. After being dried by nitrogen, the mixture is placed in an ozone cleaning machine for treatment for 15 minutes.
Putting the substrate into an evaporator, weighing 46.10mg of lead iodide and 6.75mg of methyl ammonium chloride crystal, putting the weighed materials into an evaporation boat as an evaporation source, and adjusting the background vacuum degree to 1 × 10 -4 Pa, heating current 50A, evaporation rate 30 g/cm · s. The heating temperature of the substrate is 120 ℃, the substrate is heated for 25 minutes, the film thickness is 600nm after the evaporation is finished,the film was yellow.
100mL of isopropanol is taken and put into a beaker, the temperature of the solvent is heated and adjusted to 60 ℃, the sample is put into the beaker, and the sample is taken out after 1 min.
And (3) placing the sample on a metal heating table at 120 ℃, and heating for 5min to dry the sample.
Putting the sample into an evaporator, weighing 16.70mg of methyl amine iodide crystals, putting the methyl amine iodide crystals into an evaporation boat as an evaporation source, and adjusting the background vacuum degree to 1 x 10 -4 Pa, heating current 30A, evaporation rate 20 g/cm · s. The substrate heating temperature is 120 ℃, the substrate is heated for 5-60 minutes, and the film thickness is 800nm after the evaporation is finished.
Example 3
And (3) taking FTO conductive glass as a substrate, and respectively ultrasonically cleaning the substrate material by using deionized water, acetone, ethanol, deionized water and isopropanol for 10 minutes each time. After being dried by nitrogen, the mixture is placed in an ozone cleaning machine for treatment for 15 minutes.
Putting the substrate into an evaporator, weighing 46.1mg of lead iodide and 6.75mg of methyl ammonium chloride crystals, putting the weighed materials into an evaporation boat to serve as evaporation sources, and adjusting the background vacuum degree to be 5 x 10 -4 Pa, heating current 20A, evaporation rate maintained at 10 g/cm sec. The substrate heating temperature is 80 ℃, the film thickness is 500nm after evaporation, and the film is yellow.
100mL of isopropanol is taken and put into a beaker, the temperature of the solvent is heated and adjusted to 50 ℃, the sample is put into the beaker, and the sample is taken out after 2 min.
And (3) placing the sample on a metal heating table at 100 ℃, and heating for 5min to dry the sample.
Putting the sample into an evaporator, weighing 15.90mg of methyl amine iodide crystal, putting the methyl amine iodide crystal into an evaporation boat as an evaporation source, and adjusting the background vacuum degree to 5 × 10 -4 Pa, heating current 15A, evaporation rate maintained at 8 g/cm · s. The substrate heating temperature was 100 ℃ and the film thickness after evaporation was 600nm.
Example 4
And (3) taking FTO conductive glass as a substrate, and sequentially ultrasonically cleaning the substrate material by using deionized water, acetone, ethanol, deionized water and isopropanol for 12 minutes each time. After being dried by nitrogen, the mixture is placed in an ozone cleaning machine for treatment for 15 minutes.
Putting the substrate into an evaporator, weighing 46.10mg of lead iodide and 6.75mg of methyl ammonium chloride crystals, putting the weighed materials into an evaporation boat to serve as evaporation sources, and adjusting the background vacuum degree to 1 x 10 -3 Pa, heating current 10A, evaporation rate 5 g/cm · s. The substrate heating temperature is 70 ℃, the substrate is heated for 60 minutes, the film thickness is 200nm after the evaporation is finished, and the film is yellow.
100mL of isopropanol is taken and put into a beaker, the temperature of the solvent is heated and adjusted to 25 ℃, the sample is put into the beaker, and the sample is taken out after 20 min.
And (3) placing the sample on a metal heating table at 70 ℃, and heating for 60min to dry the sample.
Dissolving methyl amine iodide in isopropanol to prepare 5mg/mL methyl amine iodide solution, putting a sample on a spin coater in a glove box, dropwise adding 240 mu L of the solution onto the sample, immediately performing spin coating at 1000rpm for reaction, placing on a heating table at 70 ℃ after the completion of the spin coating, and keeping for 60min for taking out. The film thickness after the reaction was about 250nm.
Example 5
And (2) taking FTO conductive glass as a substrate, and respectively ultrasonically cleaning the substrate material by using deionized water, acetone, ethanol, deionized water and isopropanol in sequence for 10-15 minutes each time. After being dried by nitrogen, the mixture is placed in an ozone cleaning machine for treatment for 15 minutes.
Putting the substrate into an evaporator, weighing 46.10mg of lead iodide and 6.75mg of methyl ammonium chloride crystals, putting the weighed materials into an evaporation boat to serve as evaporation sources, and adjusting the background vacuum degree to 1 x 10 -4 Pa, heating current 50A, evaporation rate 30 g/cm · s. The substrate heating temperature is 120 ℃, the heating time is 25 minutes, the film thickness is 600nm after the evaporation is finished, and the film is yellow.
100mL of isopropanol is taken and put into a beaker, the temperature of the solvent is heated and adjusted to 60 ℃, the sample is put into the beaker, and the sample is taken out after 1 min.
And (3) placing the sample on a metal heating table at 120 ℃, and heating for 5min to dry the sample.
Dissolving methyl amine iodide in isopropanol to prepare 20mg/mL methyl amine iodide solution, placing a sample on a spin coater in a glove box, dropwise adding 240 mu L of the solution onto the sample, immediately carrying out spin coating at 1000rpm for reaction, placing on a heating table at 120 ℃ after the spin coating is finished, and keeping for 50min to take out. The film thickness after the reaction was about 800nm.
Example 6
And (3) taking FTO conductive glass as a substrate, and respectively ultrasonically cleaning the substrate material by using deionized water, acetone, ethanol, deionized water and isopropanol for 10 minutes each time. After being dried by nitrogen, the mixture is placed in an ozone cleaning machine for treatment for 15 minutes.
Putting the substrate into an evaporator, weighing 46.1mg of lead iodide and 6.75mg of methyl ammonium chloride crystal, putting the weighed materials into an evaporation boat as an evaporation source, and adjusting the background vacuum degree to 5 x 10 -4 Pa, heating current 20A, evaporation rate maintained at 10 g/cm sec. The substrate heating temperature is 80 ℃, the film thickness is 500nm after evaporation, and the film is yellow.
100mL of isopropanol is taken and put into a beaker, the temperature of the solvent is heated and adjusted to 50 ℃, the sample is put into the beaker, and the sample is taken out after 2 min.
And (3) placing the sample on a metal heating table at 100 ℃, and heating for 5min to dry the sample.
Dissolving methyl amine iodide in isopropanol to prepare a 10mg/mL methyl amine iodide solution, putting a sample on a spin coater in a glove box, dropwise adding 60 mu L of the solution onto the sample, immediately carrying out spin coating at 2000rpm for reaction, placing on a heating table at 100 ℃ after the spin coating is finished, and keeping for 30min to take out. The film thickness after the reaction was complete was about 450nm.
Comparative example 1
And (3) taking FTO conductive glass as a substrate, and sequentially ultrasonically cleaning the substrate material by using deionized water, acetone, ethanol, deionized water and isopropanol for 5-10 minutes each time. After being dried by nitrogen, the mixture is placed in an ozone cleaning machine for treatment for 15 minutes.
Putting the substrate into an evaporator, weighing 46.10mg of lead iodide and 14.31mg of amine methyl iodide crystal, putting the weighed materials into an evaporation boat as an evaporation source, and adjusting the background vacuum degree to 1 × 10 -3 Pa, heating current 10A, evaporation rate 5 g/cm · s. Heating the substrate at 70 deg.C for 60min, and steamingThe film thickness after completion of the hair growth was 260nm.
Comparative example 2
And (3) taking FTO conductive glass as a substrate, and respectively ultrasonically cleaning the substrate material by using deionized water, acetone, ethanol, deionized water and isopropanol for 8 minutes each time. After being dried by nitrogen, the mixture is placed in an ozone cleaning machine for treatment for 15 minutes.
Putting the substrate into an evaporator, weighing 46.10mg of lead iodide and 16.70mg of methyl amine iodide crystals, putting the weighed materials into an evaporation boat to serve as evaporation sources, and adjusting the background vacuum degree to 1 × 10 -4 Pa, heating current 50A, evaporation rate 30 g/cm · s. The substrate heating temperature was 120 ℃ and the film thickness was 700nm after evaporation for 25 minutes.
Comparative example 3
And (3) taking FTO conductive glass as a substrate, and respectively ultrasonically cleaning the substrate material by using deionized water, acetone, ethanol, deionized water and isopropanol for 10 minutes each time. After being dried by nitrogen, the mixture is placed in an ozone cleaning machine for treatment for 15 minutes.
Putting the substrate into an evaporator, weighing 46.1mg of lead iodide and 15.90mg of methyl amine iodide crystal, putting the weighed materials into an evaporation boat as an evaporation source, and adjusting the background vacuum degree to 5 × 10 -4 Pa, heating current 20A, evaporation rate maintained at 10 g/cm sec. The substrate heating temperature was 80 ℃ and the film thickness after evaporation was 500nm.
Comparative example 4
And (3) taking FTO conductive glass as a substrate, and respectively ultrasonically cleaning the substrate material by using deionized water, acetone, ethanol, deionized water and isopropanol in sequence for 12 minutes each time. After being dried by nitrogen, the mixture is placed in an ozone cleaning machine for treatment for 15 minutes.
Putting the substrate into an evaporator, weighing 46.10mg of lead iodide, putting the lead iodide into an evaporation boat as an evaporation source, and adjusting the background vacuum degree to 1 × 10 -3 Pa, heating current 10A, evaporation rate 5 g/cm sec. Heating the substrate at 70 ℃ for 60 minutes, putting 100mL of isopropanol into a beaker, heating to adjust the temperature of the solvent to 25 ℃, putting the sample into the beaker, and taking out the sample after 20 min.
And (3) placing the sample on a metal heating table at 70 ℃, and heating for 60min to dry the sample.
Dissolving methyl amine iodide in isopropanol to prepare 5mg/mL methyl amine iodide solution, placing a sample on a spin coater in a glove box, dropwise adding 240 mu L of the solution onto the sample, immediately carrying out spin coating at 1000rpm for reaction, placing on a heating table at 70 ℃ after the spin coating is finished, and keeping for 60min for taking out. The film thickness after the reaction was about 250nm.
Comparative example 5
And (2) taking FTO conductive glass as a substrate, and respectively ultrasonically cleaning the substrate material by using deionized water, acetone, ethanol, deionized water and isopropanol in sequence for 10-15 minutes each time. After being dried by nitrogen, the mixture is placed in an ozone cleaning machine for treatment for 15 minutes.
Putting the substrate into an evaporator, weighing 46.10mg of lead iodide and putting the lead iodide into an evaporation boat as an evaporation source, and adjusting the background vacuum degree to 1 × 10 -4 Pa, heating current 50A, evaporation rate 30 g/cm · s. The substrate heating temperature is 120 ℃, the heating time is 25 minutes, the film thickness is 600nm after the evaporation is finished, and the film is yellow.
100mL of isopropanol is taken and put into a beaker, the temperature of the solvent is heated and adjusted to 60 ℃, the sample is put into the beaker, and the sample is taken out after 1 min.
And (3) placing the sample on a metal heating table at 120 ℃, and heating for 5min to dry the sample.
Dissolving methyl amine iodide in isopropanol to prepare 20mg/mL methyl amine iodide solution, placing a sample on a spin coater in a glove box, dropwise adding 240 mu L of the solution onto the sample, immediately carrying out spin coating at 1000rpm for reaction, placing on a heating table at 120 ℃ after the spin coating is finished, and keeping for 50min to take out. The film thickness after the reaction was about 800nm.
Comparative example 6
And (3) taking FTO conductive glass as a substrate, and respectively ultrasonically cleaning the substrate material by using deionized water, acetone, ethanol, deionized water and isopropanol for 10 minutes each time. After being dried by nitrogen, the mixture is placed in an ozone cleaning machine for treatment for 15 minutes.
Putting the substrate into an evaporator, weighing 46.1mg of lead iodide, putting the lead iodide into an evaporation boat as an evaporation source, and adjusting the background vacuum degreeIs 5 x 10 -4 Pa, heating current 20A, evaporation rate maintained at 10 g/cm sec. The substrate heating temperature is 80 ℃, the film thickness is 500nm after evaporation is finished, and the film is yellow.
100mL of isopropanol is taken and put into a beaker, the temperature of the solvent is heated and adjusted to 50 ℃, the sample is put into the beaker, and the sample is taken out after 2 min.
And (3) placing the sample on a metal heating table at 100 ℃, and heating for 5min to dry the sample.
Dissolving methyl amine iodide in isopropanol to prepare a 10mg/mL methyl amine iodide solution, putting a sample on a spin coater in a glove box, dropwise adding 60 mu L of the solution onto the sample, immediately performing spin coating at 2000rpm for reaction, placing on a heating table at 100 ℃ after the completion of the spin coating, and keeping for 30min for taking out. The film thickness after the reaction was about 450nm.
Evaluation of Effect
Color of sample film
Examples 1 to 6 Deep red color
Comparative examples 1 to 6 Yellow brown color
The perovskite doped with the methyl ammonium chloride has more complete reaction of all components, and the perovskite film has better quality.
The specific embodiments described herein are merely illustrative of the spirit of the invention. Various modifications or additions may be made to the described embodiments or alternatives may be employed by those skilled in the art without departing from the spirit or ambit of the invention as defined in the appended claims.

Claims (10)

1. A method for preparing a high-quality perovskite layer by a methyl amine chloride doping evaporation method is characterized by comprising the following steps:
A. the substrate is cleaned to obtain a clean substrate,
B. co-evaporating lead iodide and methyl amine chloride powder onto a substrate by using a thermal evaporator to obtain a sample,
C. b, putting the sample obtained in the step B into an isopropanol solvent for soaking,
D. taking out the sample, placing the sample on a heating table, heating and evaporating to dryness,
E. evaporating methyl ammonium iodide onto the sample by using a thermal evaporator to obtain a perovskite layer; or dropwise adding the methyl amine iodide solution onto the sample, spin-coating and heating to obtain the perovskite layer.
2. The method for preparing a high-quality perovskite layer according to the methyl amine chloride doping evaporation method of claim 1, wherein in the step A, the substrate is sequentially washed with deionized water, acetone, ethanol, deionized water and isopropanol.
3. The method for preparing a high-quality perovskite layer by the methyl amine chloride-doped evaporation method according to claim 2, wherein in the step A, the substrate is sequentially ultrasonically cleaned by deionized water, acetone, ethanol, deionized water and isopropanol for 5-15 minutes each time.
4. The method for preparing a high-quality perovskite layer by the methylamine doping evaporation method according to claim 1, wherein in the step B, the molar ratio of the lead iodide to the methylamine chloride powder is 1:1, vacuum degree of 1 x 10 -3 -1*10 -4 Pa, the heating temperature of the substrate is 70-120 ℃.
5. The method for preparing a high-quality perovskite layer by the methyl amine chloride-doped evaporation method according to claim 1, wherein in the step E, the molar ratio of the methyl amine iodide to the lead iodide is 0.9-1.05:1, the concentration of the methyl amine iodide solution is 5-20mg/mL.
6. The method of claim 1, wherein in step B, the heating current is 10-50A, the evaporation rate is 5-30 g/cm/sec, and the film thickness on the substrate after evaporation is 200-600nm.
7. The method for preparing a high-quality perovskite layer by the methylammonium chloride-doped evaporation method according to claim 1, wherein in the step C, the temperature of the isopropanol solvent is 25-60 ℃ and the soaking time is 1-20 minutes.
8. The method for preparing a high-quality perovskite layer by the methylammonium chloride-doped evaporation method according to claim 1, wherein in the step D, the heating temperature is 70-120 ℃ and the heating time is 5-60 minutes.
9. The method for preparing a high-quality perovskite layer by the methyl amine chloride-doped evaporation method according to claim 1, wherein in the step E, the thickness of the perovskite film is 250-800nm.
10. The method for preparing a high-quality perovskite layer by the methyl amine chloride-doped evaporation method according to claim 1, wherein in the step E, when the methyl amine iodide is evaporated on the sample by using a thermal evaporator to obtain the perovskite layer, the vacuum degree of the evaporation process is kept at 1 x 10 -3 -1*10 -4 Pa, heating current of 5-30A, evaporation rate of 1-20 g/sq cm s, and substrate heating temperature of 70-120 deg.C;
when the methyl amine iodide solution is dripped on a sample to be spin-coated and heated to obtain a perovskite layer, the methyl amine iodide solution is an isopropanol solution of the methyl amine iodide with the concentration of 5-20mg/mL, the spin-coating speed is 1000-6000rpm, a heating table is placed after the spin-coating, the heating temperature is 70-120 ℃, and the heating time is 5-60 minutes.
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CN106299136A (en) * 2016-11-16 2017-01-04 合肥工业大学 A kind of method that adulterated with Ca and Ti ore hull cell prepared by room-temperature dissolution lead iodide
CN109216547A (en) * 2018-09-20 2019-01-15 西安交通大学 A kind of preparation method of perovskite thin film and its preparation method of solar battery

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