CN110967929A - System and method for adjusting light spot dislocation scanning time sequence of photoetching machine - Google Patents
System and method for adjusting light spot dislocation scanning time sequence of photoetching machine Download PDFInfo
- Publication number
- CN110967929A CN110967929A CN201811156719.9A CN201811156719A CN110967929A CN 110967929 A CN110967929 A CN 110967929A CN 201811156719 A CN201811156719 A CN 201811156719A CN 110967929 A CN110967929 A CN 110967929A
- Authority
- CN
- China
- Prior art keywords
- programmable delay
- light spot
- delay line
- delay lines
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
Abstract
The invention provides a system and a method for adjusting the light spot dislocation scanning time sequence of a photoetching machine, wherein an MCU (microprogrammed control Unit) can acquire the delay requirement of each programmable delay line according to the circuit position of each programmable delay line and the corresponding light spot signal passing through; and a corresponding control instruction is sent to each programmable delay line, and each programmable delay line can change delay parameters timely according to the control instruction of the MCU, so that the logic time sequence requirement of photoetching can be met.
Description
Technical Field
The invention relates to the field of light spot dislocation scanning time sequence adjustment, in particular to a system and a method for adjusting light spot dislocation scanning time sequence of a photoetching machine.
Background
Among the drum-type laser CTP platemaking machine: the roller completes the line scanning of the image through rotation, the laser head is driven by a stepping linear motor to move along the axis at the side line of the eye roller, and the field scanning of the image is completed; the laser head is responsible for emitting laser beams to carry out photoetching on the image PS plate to form images in the scanning process. The light spot is very small because of high image resolution, and the light beam is very thin; in order to improve the drawing speed, a method of scanning and photoetching a plurality of pixel points (16, 32 or 64) side by side simultaneously is adopted; the rows of laser beams are arranged by optical fibers leading from the corresponding lasers. However, the diameter of the laser beam is smaller than that of the optical fiber, the optical fibers are simply arranged together, so that light spots cannot be close to each other, white leakage between the light spots is caused, and the resolution of an image is reduced. Therefore, the line scanning of each optical fiber is asynchronous, which leads to the problem of 'spot dislocation scanning', because the spot data from the signal source is synchronously output by the parallel bus, if not processed, the laser light source is directly driven to synchronously emit light, the recorded image is distorted in a line direction in a slanting and distorted way, and therefore, measures must be taken to adjust each spot in time, so that the deficiency of the optical fiber in spatial arrangement is made up by the time sequence relation.
The solution adopted in the prior art is to adopt a large-scale sequential logic circuit using an FPGA (field programmable gate array device) to realize the light spot dislocation sequential adjustment, but the above method has the following disadvantages:
FPGA chips are expensive and uneconomical.
2. Because a local function of the product is needed, a plurality of engineers in the FPGA major are added, the waste of human resources is great, the communication and coordination among different major consume time, and the development cycle is prolonged.
Disclosure of Invention
In order to solve the problems, the invention provides a system for adjusting the light spot dislocation scanning time sequence of a photoetching machine, which uses a programmable delay line to replace an FPGA (field programmable gate array), solves the practical problems by using a simpler technology and can greatly save the cost.
In order to achieve one of the above objects, the present invention provides a system for adjusting a light spot dislocation scanning timing sequence of a lithography machine, which includes an optical fiber array formed by arranging a plurality of optical fibers side by side, lasers corresponding to the number of the optical fibers, programmable delay lines corresponding to the number of the lasers, a buffer data transmitting unit for transmitting a light spot data source to the programmable delay lines, and an MCU for issuing a control command to the programmable delay lines; the output ends of the buffer data sending units are respectively connected with the input ends of the plurality of programmable delay lines, and the output ends of the plurality of programmable delay lines are respectively correspondingly connected with the input ends of the plurality of lasers; the output end of the MCU is respectively connected with the control port of each programmable delay line, the output ends of the programmable delay lines are correspondingly connected with the input ends of a plurality of lasers, and the output ends of the lasers are correspondingly connected with the input ends of a plurality of optical fibers of the optical fiber array.
Further, the output end of the MCU is respectively connected with the control port of each programmable delay line through an I2C control bus.
Further, the buffered data sending unit includes a receiving chip and buffers corresponding to the number of the programmable delay lines, wherein output terminals of the receiving chip are respectively connected to input terminals of the plurality of buffers, and output terminals of the plurality of buffers are correspondingly connected to input terminals of the plurality of programmable delay lines.
Further, the output end of the receiving chip is respectively connected with the input ends of the plurality of buffers through parallel buses.
Further, the buffer is a dual-port buffer.
In order to achieve the second object, the present invention provides an adjusting method of a system for adjusting a spot-dislocation scanning timing of a lithography machine, comprising the following steps:
step S1: the MCU sends a corresponding control command to a control port of each programmable delay line according to the actual time sequence requirement of the photoetching machine;
step S2: each programmable delay line receives a corresponding control command and adjusts delay parameters according to the control command;
step S3: the buffer data sending unit respectively outputs a plurality of paths of light spot data sources to a plurality of programming delay lines;
step S4: each programmable delay line receives the light spot data source sent by the buffer data sending unit and sends a driving instruction to the driving laser after the time set by the delay parameter is reached;
step S5: the laser receiving the driving instruction generates light spot laser, and the light spot laser is output to the photoetching plate through the optical fiber array.
The invention has the beneficial effects that: in the invention, the programmable delay lines are adopted to replace the FPGA, and the MCU can acquire the delay requirement of each programmable delay line according to the circuit position of each programmable delay line and the corresponding light spot signal passing through; and a corresponding control instruction is sent to each programmable delay line, and each programmable delay line can change delay parameters timely according to the control instruction of the MCU, so that the logic time sequence requirement of photoetching can be met.
Drawings
Fig. 1 is a block diagram of the present invention.
The reference numbers illustrate: 1. a buffer; 2. a programmable delay line; 3. a laser; 4. an optical fiber; 5, MCU; I2C control bus; 7. a parallel bus; 8. a chip is received.
Detailed Description
The invention is described in detail below with reference to specific embodiments and the attached drawings.
Referring to fig. 1, the present invention relates to a system for adjusting a light spot dislocation scanning timing sequence of a lithography machine, which includes an optical fiber array formed by arranging a plurality of optical fibers 4 side by side, lasers 3 corresponding to the number of the optical fibers 4, programmable delay lines 2 corresponding to the number of the lasers 3, a buffer data sending unit for sending a plurality of paths of light spot data sources to the plurality of programmable delay lines 2, and an MCU5 for issuing a control command to the programmable delay lines 2;
where the programmable delay line 2 is an element or device that delays the electrical signal for a period of time, referred to as a delay parameter, to be transmitted. A control unit for adjusting a delay parameter (time for delaying and transmitting a signal) is arranged in the programmable delay line 2, wherein the delay parameter (time for delaying and transmitting a signal) is specifically controlled by the MCU 5; the MCU5 is a central processing unit of the lithography machine, and the MCU5 can obtain the delay requirement of each programmable delay line 2 according to the circuit position where the programmable delay line is located and the corresponding light spot signal passing through.
The output end of the buffer data sending unit is respectively connected with the input ends of the programmable delay lines 2, and the output ends of the programmable delay lines 2 are respectively correspondingly connected with the input ends of the lasers 3; the output end of the MCU5 is respectively connected with the control port of each programmable delay line 2, the output ends of the programmable delay lines 2 are correspondingly connected with the input ends of the lasers 3, and the output ends of the lasers 3 are correspondingly connected with the input ends of the optical fibers 4 of the optical fiber array.
In the invention, the programmable delay lines 2 are adopted to replace an FPGA, and the MCU5 can acquire the delay requirement of each programmable delay line 2 according to the circuit position of each programmable delay line 2 and the corresponding light spot signal passing through; and a corresponding control instruction is sent to each programmable delay line 2, each programmable delay line 2 can change delay parameters timely according to the control instruction of the MCU5, the logic time sequence requirement of photoetching can be met, and compared with the prior art which adopts FPGA light spot dislocation time sequence adjustment, the invention has the advantages of simple structure, simple operation and lower cost.
Further, the output end of the MCU5 is connected to the control port of each programmable delay line 2 through an I2C control bus 6.
Further, the buffered data sending unit includes a receiving chip 8 and buffers 1 corresponding to the number of the optical fibers 4, wherein the input ends of the buffers 1 are connected to the output end of the chip, and the output ends of the buffers 1 are connected to the input ends of the programmable delay lines 2 in a one-to-one correspondence.
Further, the output end of the receiving chip 8 is connected to the input ends of the plurality of buffers 1 through the parallel bus 7.
Further, the buffer 1 is a dual-port buffer. The double-port buffer is used for buffering data sent by a PC (personal computer) and then synchronously and coordinately outputting the data to an imaging unit (a laser 3, a roller and a laser head assembly) of the CTP plate-making machine according to the speed required by the CTP plate-making machine for printing images
In the present embodiment, the receiving chip 8 outputs 8 paths of light point data sources to 8 buffers 1 through the parallel bus 7, and each buffer 1 sends the corresponding light point data source to each programming delay line; the programmable delay line 2 receives the light spot data source sent by the buffer data sending unit, processes the light spot data source, and sends a driving instruction to the laser 3 after a delay parameter (the time for delaying the driving instruction to be sent to the laser 3); the delay parameters are specifically controlled by an MCU5, wherein the MCU5 sends a control command to a control port of each programmable delay line 2 according to the actual time sequence requirement of the photoetching machine; the programmable delay line 2 then changes the delay parameter (delays the time of sending the drive command to the laser 3) according to the MCU5 command; when each programmable delay line 2 reaches the time set by the delay parameter, a driving instruction is sent to the corresponding laser 3, the corresponding laser 3 is driven and spot laser is generated, and the spot laser is output to the photoetched plate through the optical fiber array.
The whole system can be divided into a light spot data source channel and a delay control channel; namely, the light spot data source channels are: 8 paths of light point data sources output in parallel by the light point data sources pass through the buffer 1 and reach the programmable delay line 2, then the laser 3 is driven to emit light, and light point laser is output to a plate to be photoetched through the optical fiber array; and the delay control channel is: using the MCU5 as a logic time sequence control platform, under the actual time sequence requirement of the photoetching machine, sending a control command to a control port of each programmable delay line 2 through the MCU5, wherein the programmable delay lines 2 can change delay parameters timely according to the MCU5 command, and then the programmable delay lines 2 change the delay parameters (delay the time for sending a driving command to the laser 3) according to the MCU5 command; when each programmable delay line 2 passes through the time set by the delay parameter, a driving instruction is issued to the corresponding laser 3, the corresponding laser 3 is driven, spot laser is generated, the spot laser is output to the plate to be photoetched through the optical fiber array, and the photoetching time sequence requirement is further met. At the same time, the MCU5 can query the current delay parameter of each programmable delay line 2 to provide a reference for the next parameter adjustment.
The technical scheme adopted by the invention is to provide an adjusting method of a system for adjusting the light spot dislocation scanning time sequence of a photoetching machine, which specifically comprises the following steps:
step S1: after the circuit is powered on, the MCU5 resets and then carries out initialization setting on parameters of peripheral elements (circuits of other parts, such as a USB drive unit, a world wide web drive unit, each port of a CPU, an in-chip peripheral device of the CPU and a cache unit);
step S2: at this time, the MCU5 issues a corresponding control instruction to each programmable delay line 2 in each path of the light point data source channel according to the circuit position where the programmable delay line 2 is located and the delay requirement of the corresponding light point signal passing through, so that the delay parameter in each programmable delay line 2 meets the scan timing requirement of the inclined arrangement of the optical fiber line array;
step S3: each programmable delay line 2 receives a corresponding control command and adjusts delay parameters according to the control command;
step S4: the buffer data sending unit respectively outputs a plurality of paths of light spot data sources to a plurality of programming delay lines 2;
step S5: each programmable delay line 2 receives the light spot data source sent by the buffer data sending unit and sends a driving instruction to the laser 3 after the time set by the delay parameter is reached;
step S6: the laser 3 receiving the driving command generates a spot laser, and the spot laser is output to the plate to be photoetched through the optical fiber array.
Meanwhile, during the operation of the equipment, if the time sequence requirements are different at different times, the MCU5 can issue different control instructions to the programmable delay line 2 in time, so that the programmable delay line 2 adjusts delay parameters and meets the time sequence logic requirements. Without having to alter the circuit design. When different batches of materials, different size specifications and different image requirements are used, software can be flexibly and automatically set according to requirements without changing hardware, and the method is very quick and flexible and has strong adaptability.
A specific example is listed below:
for example, the plate specifications for current platemaking are: length 920.00mm, width 760.00mm, thickness 0.300 um. The plate specifications to be platemade are as follows: length 1030.00mm, width 770.00mm, thickness 0.150 um.
When a new plate is rolled in and fixed on a roller by a loading system of a photoetching machine, plate specification data obtained by the automatic measurement of the loading system is transmitted to an MCU (central control unit) 5, the MCU5 obtains delay parameters required by each light spot when the new plate is recorded by combining condition parameters of all aspects of the photoetching system through calculation, the MCU5 immediately sends a control instruction to a programmable delay line 2 through a control bus, so that the corresponding programmable delay line 2 automatically adjusts the corresponding delay parameters, when each programmable delay line 2 reaches the time set by the delay parameters, a driving instruction is sent to the corresponding laser 3, the corresponding laser 3 is driven and generates light spot laser, and the light spot laser is output to the plate to be photoetched through an optical fiber array, so that the time sequence requirement of photoetching is met.
The above embodiments are merely illustrative of the preferred embodiments of the present invention, and not restrictive, and various changes and modifications to the technical solutions of the present invention may be made by those skilled in the art without departing from the spirit of the present invention, and the technical solutions of the present invention are intended to fall within the scope of the present invention defined by the appended claims.
Claims (6)
1. A system for adjusting the light spot dislocation scanning time sequence of a photoetching machine is characterized in that: the system comprises an optical fiber array formed by arranging a plurality of optical fibers side by side, lasers corresponding to the number of the optical fibers, programmable delay lines corresponding to the number of the lasers, a buffer data sending unit for sending a light point data source to the programmable delay lines, and an MCU for issuing a control instruction to the programmable delay lines; the output ends of the buffer data sending units are respectively connected with the input ends of the plurality of programmable delay lines, and the output ends of the plurality of programmable delay lines are respectively correspondingly connected with the input ends of the plurality of lasers; the output end of the MCU is respectively connected with the control port of each programmable delay line, the output ends of the programmable delay lines are correspondingly connected with the input ends of a plurality of lasers, and the output ends of the lasers are correspondingly connected with the input ends of a plurality of optical fibers of the optical fiber array.
2. The system of claim 1, wherein the system further comprises: and the output end of the MCU is respectively connected with the control port of each programmable delay line through an I2C control bus.
3. The system of claim 1, wherein the system further comprises: the buffer data sending unit comprises a receiving chip and buffers corresponding to the number of the programmable delay lines, wherein the output end of the receiving chip is respectively connected with the input ends of the plurality of buffers, and the output ends of the plurality of buffers are correspondingly connected with the input ends of the plurality of programmable delay lines.
4. The system of claim 3, wherein the system further comprises: and the output end of the receiving chip is respectively connected with the input ends of the plurality of buffers through parallel buses.
5. The system of claim 3, wherein the system further comprises: the buffer is a dual-port buffer.
6. A method for adjusting a system for adjusting the light spot dislocation scanning time sequence of a photoetching machine is characterized in that: the method comprises the following steps:
step S1: the MCU sends a corresponding control command to a control port of each programmable delay line according to the actual time sequence requirement of the photoetching machine;
step S2: each programmable delay line receives a corresponding control command and adjusts delay parameters according to the control command;
step S3: the buffer data sending unit respectively outputs a plurality of paths of light spot data sources to a plurality of programming delay lines;
step S4: each programmable delay line receives the light spot data source sent by the buffer data sending unit and sends a driving instruction to the laser after the time set by the delay parameter is reached;
step S5: the laser receiving the driving instruction generates light spot laser, and the light spot laser is output to the photoetching plate through the optical fiber array.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811156719.9A CN110967929A (en) | 2018-09-30 | 2018-09-30 | System and method for adjusting light spot dislocation scanning time sequence of photoetching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811156719.9A CN110967929A (en) | 2018-09-30 | 2018-09-30 | System and method for adjusting light spot dislocation scanning time sequence of photoetching machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110967929A true CN110967929A (en) | 2020-04-07 |
Family
ID=70029023
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811156719.9A Pending CN110967929A (en) | 2018-09-30 | 2018-09-30 | System and method for adjusting light spot dislocation scanning time sequence of photoetching machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110967929A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6289468B1 (en) * | 1998-11-06 | 2001-09-11 | Advanced Micro Devices, Inc. | Technique for controlling system bus timing with on-chip programmable delay lines |
| US20070005834A1 (en) * | 2005-06-30 | 2007-01-04 | Intel Corporation | Memory chips with buffer circuitry |
| CN101224654A (en) * | 2007-01-19 | 2008-07-23 | 深圳市大族激光科技股份有限公司 | Adjusting method of close-packed optical fiber array imaging and laser imaging device thereof |
| CN203012129U (en) * | 2012-12-28 | 2013-06-19 | 武汉大学 | Bidirectional communication device between radar main unit and receiver |
| CN103678210A (en) * | 2012-09-26 | 2014-03-26 | 爱思开海力士有限公司 | High-speed interface control device capable of improving efficiency and data transmission method |
| CN103905185A (en) * | 2014-04-14 | 2014-07-02 | 山西大学 | Pulse generator applied to distributing continuous variable quantum secret keys |
-
2018
- 2018-09-30 CN CN201811156719.9A patent/CN110967929A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6289468B1 (en) * | 1998-11-06 | 2001-09-11 | Advanced Micro Devices, Inc. | Technique for controlling system bus timing with on-chip programmable delay lines |
| US20070005834A1 (en) * | 2005-06-30 | 2007-01-04 | Intel Corporation | Memory chips with buffer circuitry |
| CN101224654A (en) * | 2007-01-19 | 2008-07-23 | 深圳市大族激光科技股份有限公司 | Adjusting method of close-packed optical fiber array imaging and laser imaging device thereof |
| CN103678210A (en) * | 2012-09-26 | 2014-03-26 | 爱思开海力士有限公司 | High-speed interface control device capable of improving efficiency and data transmission method |
| CN203012129U (en) * | 2012-12-28 | 2013-06-19 | 武汉大学 | Bidirectional communication device between radar main unit and receiver |
| CN103905185A (en) * | 2014-04-14 | 2014-07-02 | 山西大学 | Pulse generator applied to distributing continuous variable quantum secret keys |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20080047445A1 (en) | Exposure device for the production of screen print stencils | |
| KR20200080295A (en) | Automatic optical detection system based on PU+GPU+FPGA architecture | |
| EP3564753A1 (en) | Direct-write screen platemaking apparatus and use method therefor | |
| CN105468310B (en) | A kind of the FPGA control system and its control method of ink jet numbering machine | |
| JP2008087462A (en) | Method and system of pixel data processing in printer | |
| CN105657403B (en) | The synchronization system of structured light projection and Image Acquisition based on FPGA | |
| US5570206A (en) | Image reading apparatus | |
| CN104345579A (en) | Maskless exposure equipment and signal feedback control method thereof | |
| JP2008030472A (en) | Pixel data processing system and method in printer | |
| CN103542805A (en) | Vision inspection system based on high-speed image sensor and parallel processing | |
| CN110967929A (en) | System and method for adjusting light spot dislocation scanning time sequence of photoetching machine | |
| CN106301119B (en) | Method for controlling stepping motor for flat bed scanner and automatic paper feed scanner | |
| CN102445861A (en) | Photoetching machine system with position triggered scanning mode and method thereof | |
| US7800792B2 (en) | Image reading method and image reading apparatus | |
| CN112596354A (en) | High-speed scanning control system and method for laser printer | |
| US6658315B2 (en) | Non-synchronous control of pulsed light | |
| CN202472238U (en) | Light energy monitoring system for lithography system | |
| WO2020199143A1 (en) | Ai training network and method | |
| CN107493437B (en) | A kind of camera parameter control method and relevant device | |
| KR100340012B1 (en) | Method of checking products and computer vision system using rotating mirror | |
| CN105590603A (en) | Source electrode driver and display system | |
| CN112397023B (en) | Driving circuit, display device and display driving method thereof | |
| CN210007776U (en) | General type image acquisition system | |
| KR20090067616A (en) | Dimensional metrology system using laser slit-beams | |
| CN108628110B (en) | Direct-writing silk screen edge sealing plate making machine and edge sealing method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20200407 |