CN110958754A - Intensity-adaptive plasma jet device and method - Google Patents
Intensity-adaptive plasma jet device and method Download PDFInfo
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- CN110958754A CN110958754A CN201911101730.XA CN201911101730A CN110958754A CN 110958754 A CN110958754 A CN 110958754A CN 201911101730 A CN201911101730 A CN 201911101730A CN 110958754 A CN110958754 A CN 110958754A
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- 230000003044 adaptive effect Effects 0.000 claims description 11
- 238000005507 spraying Methods 0.000 abstract description 6
- 239000002245 particle Substances 0.000 description 3
- 238000001514 detection method Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000007750 plasma spraying Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
- H05H1/0081—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature by electric means
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
Abstract
The invention relates to a strength self-adaptive plasma jet device and a method, which comprises a plasma generating assembly, a plasma jet ejection channel, a current collecting assembly arranged on the plasma jet ejection channel and a control chip connected with the current collecting assembly, wherein the control chip is connected with the plasma generating assembly and controls the power of a power supply in the plasma generating assembly according to the current measured by the current collecting assembly; when the device works, the plasma generating assembly generates plasma jet, the plasma jet is sprayed out through the plasma jet spraying channel, the current collecting assembly measures the current passing through the plasma jet spraying channel and inputs the current into the control chip, and the control chip adjusts the power of the power supply in the plasma generating assembly according to the input current and the set current range.
Description
Technical Field
The invention relates to the field of plasma jet, in particular to a plasma jet device and method with self-adaptive strength.
Background
The plasma jet device is a device for obtaining plasma by a manual method. The plasma generated by the atmospheric pressure plasma jet technology has low temperature and high active matter concentration, so the method has wide application in the aspects of material modification, sterilization, environmental protection and the like. The gas molecules are partially or completely ionized after energy extraction to reach the plasma state. The gas in the plasma state is quasi-electroneutral, i.e. has equal amount of charges with different signs under the condition of macroscopic space-time scale. In industrial application, plasma jet with different ionization degrees needs to be adjusted and obtained according to different requirements so as to realize different functions, but the conventional atmospheric pressure plasma jet generating device has a complex structure and high cost, and a method for adjusting the size of the plasma jet is complex.
The plasma jet flow contains charged particles, when the gas flow is constant, the higher the ionization degree of the gas is, the larger the current generated by the charged particles is, and the lower the ionization degree is, the smaller the current generated by the charged particles is, meanwhile, the jet flow size generated by the plasma jet flow device is positively correlated with the power size of the device power supply, and the larger the power supply power is, the larger the jet flow size is, the smaller the power supply power is.
Disclosure of Invention
The present invention is directed to overcoming the above-mentioned drawbacks of the prior art and providing a plasma jet apparatus and method with high adaptability and stable jet generation strength.
The purpose of the invention can be realized by the following technical scheme:
a plasma jet device with self-adaptive strength comprises a plasma generating assembly, a plasma jet spraying channel, a current collecting assembly arranged on the plasma jet spraying channel and a control chip connected with the current collecting assembly, wherein the control chip is connected with the plasma generating assembly and controls the power of a power supply in the plasma generating assembly according to the current measured by the current collecting assembly;
when the device works, the plasma generating assembly generates plasma jet, the plasma jet is sprayed out through the plasma jet spraying channel, the current collecting assembly measures the current passing through the plasma jet spraying channel and inputs the current into the control chip, and the control chip adjusts the power of the power supply in the plasma generating assembly according to the input current and the set current range.
Furthermore, the plasma spraying channel is a quartz tube with a large opening at one end and a small opening at the other end, the quartz tube has good electrical insulation performance and can effectively prevent electron loss, the end with the small opening is a plasma jet outlet, and the plasma jet flows through the plasma spraying channel and then is sprayed out from the outlet.
Furthermore, the quartz tube is composed of a hollow cylinder with two open ends and a hollow round table with two open ends, the end with the larger radius in the hollow round table is connected with the hollow cylinder, the end with the smaller radius is used as an outlet of the plasma jet, and the plasma jet flows to the hollow round table from the hollow cylinder and is ejected from the outlet.
Furthermore, the current acquisition assembly comprises a current probe and an A/D converter which are mutually connected, the current probe is arranged at the plasma jet outlet on the periphery of the quartz tube in a surrounding manner and is used for measuring the current of the plasma jet flowing through the quartz tube, and the A/D converter is used for converting the current analog signal measured by the current probe into a digital signal and inputting the digital signal into the control chip.
Furthermore, the current probe is a transformer with the number of turns of 1, and the current probe has high sensitivity and more accurate measurement result.
Furthermore, the control chip is a programmable chip, and in different application scenarios, the maximum threshold and the minimum threshold of the current can be automatically programmed and set according to the required jet flow size, so that the adaptability is high.
A method of operating an intensity adaptive plasma-jet apparatus as described, comprising the steps of:
1) the plasma generating assembly generates plasma jet which flows through the plasma jet ejecting channel to be ejected;
2) the current collection assembly measures the current flowing through the plasma jet flow ejection channel and inputs the current into the control chip;
3) adjusting power supply power in the plasma generating assembly according to the input current and the set current maximum threshold and current minimum threshold;
4) and repeatedly executing the steps 1) to 3).
Further, the step 3) specifically includes:
31) judging whether the input current is larger than a set current maximum threshold value, if so, reducing the power supply power in the plasma generation assembly, and executing the step 4), and if not, executing the step 32);
32) judging whether the input current is smaller than a set current minimum threshold, if so, increasing the power supply power in the plasma generation assembly, and executing the step 4), otherwise, executing the step 33);
33) the power supply power in the plasma generation assembly is kept constant and step 4) is performed.
Further, in step 31), the reducing the power of the power supply in the plasma generating assembly specifically includes: and calculating the difference between the input current and the set current maximum threshold, if the difference is greater than 200mA, reducing the power supply by 2w, and if the difference is less than 200mA, reducing the power supply by 1 w.
Further, in step 32), the increasing the power of the power supply in the plasma generating assembly specifically includes: and calculating the difference between the set current minimum threshold and the input current, if the difference is greater than 200mA, increasing the power supply by 2w, and if the difference is less than 200mA, increasing the power supply by 1 w.
Compared with the prior art, the invention has the following advantages:
1) according to the invention, the ionization degree of the plasma is judged by measuring the current according to the relationship among the current, the ionization degree of the plasma jet and the power supply power, and the plasma jet is changed by changing the power supply power, only a current probe is arranged on the plasma jet ejection channel and connected to the control chip, so that the required plasma jet is conveniently obtained by adjustment, the structure is simple, and the cost is low;
2) the power supply power is adjusted in real time according to the detection result through the detection of the current probe on the current and the action of the A/D converter and the control chip, and the plasma jet flow with stable size can be generated automatically through self-adaptive adjustment of the plasma jet flow;
3) the control chip in the invention adopts a programmable chip, can carry out autonomous programming according to the jet flow size required in practice, sets different current maximum threshold values and current minimum threshold values, can set different adjusting schemes at the same time, is suitable for various application scenes, and has high adaptability and practicability.
Drawings
FIG. 1 is a schematic view of a plasma jet ejection channel and current probe;
FIG. 2 is a schematic diagram of an adaptive throttling process in an embodiment;
FIG. 3 is a schematic view of the overall structure of the present invention.
The device comprises a quartz tube 1, a plasma jet 2, a plasma jet 3, a current probe 4 and a plasma jet outlet.
Detailed Description
The invention is described in detail below with reference to the figures and specific embodiments. It is to be understood that the embodiments described are only a few embodiments of the present invention, and not all embodiments. All other embodiments, which can be obtained by a person skilled in the art without any inventive step based on the embodiments of the present invention, shall fall within the scope of protection of the present invention.
Examples
As shown in fig. 1, the present invention provides a plasma jet device with adaptive intensity, which includes a plasma generating assembly, a plasma jet discharging channel, a current collecting assembly disposed on the plasma jet discharging channel, and a control chip connected to the current collecting assembly. The plasma generating assembly generates a plasma jet 2, the plasma jet 2 is ejected through the plasma jet ejecting channel, a current collecting assembly is added at a plasma jet outlet 4 to measure the current in the jet, the current collecting assembly measures the current passing through the plasma jet ejecting channel and inputs the current into the control chip, and the control chip adjusts the power of a power supply in the plasma generating assembly according to the input current and the set current range so as to control the stability of the size of the jet.
The plasma jet channel is a quartz tube 1 with a large opening at one end and a small opening at the other end, a plasma jet outlet 4 is arranged at the small opening end, and a plasma jet 2 flows through the plasma jet channel and then is ejected from the outlet, in the embodiment, the quartz tube 1 is integrally formed by a hollow cylinder with two openings at two ends and a hollow round table with two openings at two ends, the end with the larger radius in the hollow round table is connected with the hollow cylinder, the end with the smaller radius is used as the plasma jet outlet 4, the plasma jet flows to the hollow round table from the hollow cylinder and is ejected from the outlet, the current collecting component comprises a current probe 3 and an A/D converter which are mutually connected, the current probe 3 is arranged at the plasma jet outlet 4 at the periphery of the quartz tube 1 in a surrounding way, and the current probe 3 is a magnetic ring which is designed according to the Faraday principle and is, essentially a transformer with 1 turn. The current probe 3 can be used to measure the magnitude of the current flowing through the wire. In this embodiment, the AC/DC current probe 3 is used to measure the magnitude of the DC and AC currents, and the a/D converter converts the current analog signal measured by the current probe 3 into a digital signal and inputs the digital signal to the control chip. The control chip is a programmable chip, in different application scenes, the maximum threshold value and the minimum threshold value of the current can be automatically programmed and set according to the size of the jet flow required, whether the current is too large or too small is judged through the programmable chip, and if the current is not in the required range, the power of the power supply is adjusted.
A method of intensity adaptive plasma jet comprising the steps of:
1) the plasma generating component generates plasma jet 2 which flows through the plasma jet ejecting channel to be ejected;
2) the current collection assembly measures the current flowing through the plasma jet flow ejection channel and inputs the current into the control chip;
3) adjusting power of a power supply in the plasma generating assembly according to the relation between the input current and the set current maximum threshold and current minimum threshold;
4) and repeatedly executing the steps 1) to 3).
The plasma jet with stable size can be automatically regulated and generated by detecting the current in the plasma jet.
In this embodiment, step 3) specifically includes:
31) judging whether the input current is larger than a set current maximum threshold value, if so, reducing the power supply power in the plasma generation assembly, and executing the step 4), and if not, executing the step 32);
32) judging whether the input current is smaller than a set current minimum threshold, if so, increasing the power supply power in the plasma generation assembly, and executing the step 4), otherwise, executing the step 33);
33) the power supply power in the plasma generation assembly is kept constant and step 4) is performed.
Wherein, in step 31), reducing the power supply power in the plasma generating assembly specifically comprises: and calculating the difference between the input current and the set current maximum threshold, if the difference is greater than 200mA, reducing the power supply by 2w, and if the difference is less than 200mA, reducing the power supply by 1 w.
Wherein, in the step 32), increasing the power of the power supply in the plasma generating assembly specifically comprises: and calculating the difference between the set current minimum threshold and the input current, if the difference is greater than 200mA, increasing the power supply by 2w, and if the difference is less than 200mA, increasing the power supply by 1 w.
In this embodiment, taking the current that needs to be controlled between 700 milliamperes and 800 milliamperes as an example, the adaptive process is as follows:
(1) the magnitude of the input current;
(2) judging whether the current is in a required range;
(3) if the current is more than 1000 milliamperes, the power of the power supply is reduced by 2 w; if the current is larger than 800 milliamperes, reducing the power supply power by 1 w; if the current is less than 500 milliamperes, the power of the power supply is increased by 2 w; if the current is less than 700 milliamperes, the power of the power supply is increased by 1 w; otherwise the power supply power is unchanged.
According to the characteristics of the plasma jet device, a current probe 3 is added at the outlet of a quartz tube 1 of the plasma to detect the size of the plasma jet 2. And after the detected size of the plasma jet 2 is converted into a digital signal, judging whether the size meets the requirement on the chip, and operating the power supply. The strength-adaptive plasma jet device provided by the invention can enable the plasma jet 2 to be more stable.
While the invention has been described with reference to specific embodiments, the invention is not limited thereto, and those skilled in the art can easily conceive of various equivalent modifications or substitutions within the technical scope of the invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.
Claims (10)
1. A plasma jet device with self-adaptive intensity is characterized by comprising a plasma generating assembly, a plasma jet ejection channel, a current collecting assembly arranged on the plasma jet ejection channel and a control chip connected with the current collecting assembly, wherein the control chip is connected with the plasma generating assembly and controls the power of a power supply in the plasma generating assembly according to the current measured by the current collecting assembly;
when the device works, the plasma generating assembly generates a plasma jet flow (2), the plasma jet flow (2) is ejected out through the plasma jet flow ejecting channel, the current collecting assembly measures the current passing through the plasma jet flow ejecting channel and inputs the current into the control chip, and the control chip adjusts the power of a power supply in the plasma generating assembly according to the input current and the set current range.
2. A strength adaptive plasma jet device according to claim 1, characterized in that the plasma jet channel is a quartz tube (1) with a large opening at one end and a small opening at the other end, the small opening end is an outlet of the plasma jet (2), and the plasma jet (2) flows through the plasma jet channel and then is jetted from the outlet.
3. The strength adaptive plasma jet device according to claim 2, wherein the quartz tube (1) is composed of a hollow cylinder with two open ends and a hollow circular truncated cone with two open ends, the end with the larger radius of the hollow circular truncated cone is connected with the hollow cylinder, the end with the smaller radius of the hollow circular truncated cone is used as an outlet of the plasma jet (2), and the plasma jet (2) flows from the hollow cylinder to the hollow circular truncated cone and is ejected from the outlet.
4. An intensity adaptive plasma jet device according to claim 2 or 3, characterized in that the current collecting assembly comprises a current probe (3) and an A/D converter which are connected with each other, the current probe (3) is arranged around the periphery of the quartz tube (1) at the plasma jet outlet (4) to measure the current flowing through the plasma jet (2) in the quartz tube (1), and the A/D converter converts the current analog signal measured by the current probe (3) into a digital signal and inputs the digital signal into the control chip.
5. A strength adaptive plasma jet device according to claim 4, characterized in that the current probe (3) is a transformer with 1 turn.
6. The adaptive-intensity plasma-jet apparatus of claim 1, wherein the control chip is a programmable chip.
7. A method of operating an adaptive intensity plasma-jet device as claimed in claims 1-6, comprising the steps of:
1) the plasma generating assembly generates a plasma jet (2) which flows through the plasma jet ejecting channel to be ejected;
2) the current collection assembly measures the current flowing through the plasma jet flow ejection channel and inputs the current into the control chip;
3) adjusting power supply power in the plasma generating assembly according to the input current and the set current maximum threshold and current minimum threshold;
4) and repeatedly executing the steps 1) to 3).
8. The intensity-adaptive plasma jet method according to claim 7, wherein the step 3) specifically comprises:
31) judging whether the input current is larger than a set current maximum threshold value, if so, reducing the power supply power in the plasma generation assembly, and executing the step 4), and if not, executing the step 32);
32) judging whether the input current is smaller than a set current minimum threshold, if so, increasing the power supply power in the plasma generation assembly, and executing the step 4), otherwise, executing the step 33);
33) the power supply power in the plasma generation assembly is kept constant and step 4) is performed.
9. The adaptive-intensity plasma-jet method according to claim 8, wherein the step 31) of reducing the power supply power in the plasma generating assembly specifically comprises: and calculating the difference between the input current and the set current maximum threshold, if the difference is greater than 200mA, reducing the power supply by 2w, and if the difference is less than 200mA, reducing the power supply by 1 w.
10. The adaptive intensity plasma-jet method according to claim 8, wherein the step 32) of increasing the power supply power in the plasma generating assembly specifically comprises: and calculating the difference between the set current minimum threshold and the input current, if the difference is greater than 200mA, increasing the power supply by 2w, and if the difference is less than 200mA, increasing the power supply by 1 w.
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| CN201911101730.XA CN110958754A (en) | 2019-11-12 | 2019-11-12 | Intensity-adaptive plasma jet device and method |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN114501764A (en) * | 2022-01-26 | 2022-05-13 | 江苏神州半导体科技有限公司 | Gas dissociation circuit control device and system based on multi-coil coupling |
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| CN203574924U (en) * | 2013-12-06 | 2014-04-30 | 安徽理工大学 | Launching device for single electrode producing low-temperature plasma flow under atmospheric pressure condition |
| CN105105845A (en) * | 2015-09-11 | 2015-12-02 | 西安交通大学 | Plasma device used for ablating atherosclerotic plaques and generation method |
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2019
- 2019-11-12 CN CN201911101730.XA patent/CN110958754A/en active Pending
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