CN110928037A

CN110928037A - Display substrate, manufacturing method thereof and display device

Info

Publication number: CN110928037A
Application number: CN201911378072.9A
Authority: CN
Inventors: 张致远; 桂坤; 白婷婷; 王建栋
Original assignee: Shanghai Tianma Microelectronics Co Ltd
Current assignee: Shanghai Tianma Microelectronics Co Ltd
Priority date: 2019-12-27
Filing date: 2019-12-27
Publication date: 2020-03-27
Anticipated expiration: 2039-12-27
Also published as: CN110928037B

Abstract

The application provides a display substrate, a manufacturing method thereof and a display device, which relate to the technical field of display and comprise a color film substrate, wherein the color film substrate comprises a substrate, a light shielding layer, a color resistance layer and a microstructure layer; the light shielding layer comprises a light shielding part and an opening, and the opening penetrates through the light shielding layer along the direction vertical to the substrate; the color resistance layer comprises a plurality of color resistances, and the color resistances are positioned in the openings; the microstructure layer is positioned between the substrate and the shading layer and comprises microstructures which are arranged in an array mode, and a first concave-convex structure is formed on one side, close to the shading layer, of each microstructure; the refractive index of the microstructure layer is n1, the refractive index of the substrate base plate is n2, and the difference between n1 and n2 is less than or equal to a predetermined value. This application sets up the micro-structure layer similar with the refracting index of substrate base plate between substrate base plate and light shield layer, avoids the great problem that causes light reflectivity of the refracting index difference between substrate base plate and the light shield layer, is favorable to reducing the total reflectivity of display substrates, improves display effect, promotes the user and watches experience.

Description

Display substrate, manufacturing method thereof and display device

Technical Field

The present disclosure relates to the field of display technologies, and in particular, to a display substrate, a manufacturing method thereof, and a display device.

Background

In recent years, Liquid Crystal Display (LCD) products have been developed rapidly, and more high-quality LCD displays are gradually on the market, and the application fields thereof are also expanding.

The liquid crystal display device generally includes an array substrate, a color film substrate, and a conductive layer, a polarizer and the like disposed on a side of the color film substrate close to the light exit surface. In addition, various membrane base plate includes substrate base plate, light shield layer and look hinders the layer, because there is stronger reflection in light shield layer and look hinder the layer for display substrates's total reflectivity increases, and when display substrates' total reflectivity is higher, will seriously influence the effect of watching of display screen, can cause the problem of seeing clearly display screen completely even, influences the user and watches experience.

Disclosure of Invention

In view of this, the present application provides a display substrate, a manufacturing method thereof and a display device, in which a microstructure layer having a refractive index close to that of the substrate is disposed between the substrate and the light-shielding layer, so as to avoid the problem of a large light reflectivity caused by a large difference in refractive index between the substrate and the light-shielding layer, thereby facilitating to reduce the total reflectivity of the display substrate, improving the display effect and improving the viewing experience of a user.

In order to solve the technical problem, the following technical scheme is adopted:

in a first aspect, the present application provides a display substrate, comprising: the color film substrate comprises:

a substrate base plate;

a light-shielding layer including a plurality of light-shielding portions and a plurality of openings penetrating the light-shielding layer in a direction perpendicular to the substrate;

the color resistance layer comprises a plurality of color resistances, and the color resistances are positioned in the openings;

the microstructure layer is positioned between the substrate and the shading layer; the microstructure layer comprises a plurality of microstructures which are arranged in an array mode, a plane is formed on one side, close to the substrate, of each microstructure, and a first concave-convex structure is formed on one side, close to the light shielding layer, of each microstructure; the refractive index of the microstructure layer is N1, the refractive index of the substrate base plate is N2, and the difference between N1 and N2 is smaller than or equal to a preset value N.

In a second aspect, the present application provides a method for manufacturing a display substrate, including:

providing a substrate base plate, wherein the refractive index of the substrate base plate is n 2;

forming a microstructure layer on one side of the substrate base plate, wherein the refractive index of the microstructure layer is N1, and the difference between N1 and N2 is less than or equal to a preset value N; an imprinting mold is adopted to imprint one side of the microstructure layer, which is far away from the substrate base plate, and solidification treatment is carried out to form a plurality of microstructures which are arranged in an array manner, one side of each microstructure, which is close to the substrate base plate, forms a plane, and one side of each microstructure, which is far away from the substrate base plate, forms a first concave-convex structure;

a light shielding layer is arranged on one side, far away from the substrate, of the microstructure layer, and comprises a plurality of light shielding parts and a plurality of openings, and the openings penetrate through the light shielding layer along a direction vertical to the substrate;

and forming a color resistance layer comprising a plurality of color resistances, wherein the color resistances are positioned in the openings.

In a third aspect, the present application further provides a display device, including a display substrate, where the display substrate is the display substrate provided in the present application.

Compared with the prior art, the display substrate, the manufacturing method thereof and the display device provided by the invention at least realize the following beneficial effects:

(1) according to the display substrate, the manufacturing method of the display substrate and the display device, the microstructure layer close to the refractive index of the substrate is arranged between the substrate and the shading layer, the problem that the refractive index difference between the substrate and the shading layer is large to cause large light reflectivity is avoided, the total reflectivity of the display substrate is favorably reduced, the display effect is improved, and the watching experience of a user is improved.

(2) According to the display substrate, the manufacturing method thereof and the display device, the microstructure layer comprising the plurality of microstructures is arranged between the substrate and the light shielding layer, so that the refractive indexes of the microstructure layer are different, namely, the microstructure is equivalent to a material with gradually changed refractive index, the reflection phenomenon caused by the sharp change of the refractive index is reduced through the gradually changed refractive index, the interface reflectivity between the substrate and the light shielding layer or the color resistance layer is eliminated, the reflectivity of the display substrate is effectively reduced, and the display effect is further improved.

Drawings

The accompanying drawings, which are included to provide a further understanding of the application and are incorporated in and constitute a part of this application, illustrate embodiment(s) of the application and together with the description serve to explain the application and not to limit the application. In the drawings:

fig. 1 is a top view of a display module according to an embodiment of the present disclosure;

FIG. 2 is a cross-sectional view of the substrate shown in FIG. 1 at AA';

FIG. 3 is an exploded view of the display substrate shown in FIG. 2;

FIG. 4 is a schematic diagram of the gradual refractive index change of the microstructure layer;

fig. 5 is a schematic structural diagram of a microstructure provided in an embodiment of the present application;

FIG. 6 is another cross-sectional view AA' of the display substrate of FIG. 1;

fig. 7 is a schematic structural diagram of a conductive layer provided in the present embodiment;

FIG. 8 is a cross-sectional view of another AA' of the display substrate of FIG. 1;

fig. 9 is a flowchart illustrating a method for manufacturing a display substrate according to an embodiment of the present disclosure;

fig. 10 is a schematic diagram of a process for fabricating a micro-structured layer according to an embodiment of the present application;

fig. 11 is a schematic structural diagram illustrating a method for fabricating a light-shielding layer according to an embodiment of the present disclosure;

fig. 12 is a schematic structural diagram illustrating a color resist layer according to an embodiment of the present disclosure;

fig. 13 is another flowchart illustrating a method for manufacturing a display substrate according to an embodiment of the disclosure;

fig. 14 is a schematic structural diagram illustrating a method for fabricating a passivation layer according to an embodiment of the present disclosure;

fig. 15 is a schematic structural diagram of a display device according to an embodiment of the present disclosure.

Detailed Description

As used in the specification and in the claims, certain terms are used to refer to particular components. As one skilled in the art will appreciate, manufacturers may refer to a component by different names. This specification and claims do not intend to distinguish between components that differ in name but not function. In the following description and in the claims, the terms "include" and "comprise" are used in an open-ended fashion, and thus should be interpreted to mean "include, but not limited to. "substantially" means within an acceptable error range, within which a person skilled in the art can solve the technical problem to substantially achieve the technical result. Furthermore, the term "coupled" is intended to encompass any direct or indirect electrical coupling. Thus, if a first device couples to a second device, that connection may be through a direct electrical coupling or through an indirect electrical coupling via other devices and couplings. The description which follows is a preferred embodiment of the present application, but is made for the purpose of illustrating the general principles of the application and not for the purpose of limiting the scope of the application. The protection scope of the present application shall be subject to the definitions of the appended claims. The same parts between the embodiments are not described in detail.

The display device generally includes an array substrate, a color filter substrate, and a conductive layer, a polarizer and the like disposed on a side of the color filter substrate close to the light exit surface. In addition, various membrane base plate includes substrate base plate, light shield layer and look hinders the layer, because there is stronger light reflection in light shield layer and look hinder the layer for display substrates's total reflectivity increases, and when display substrates' total reflectivity is higher, will seriously influence the effect of watching of display screen, can cause the problem of seeing clearly display screen completely even, influences the user and watches experience.

The following detailed description is to be read in connection with the drawings and the detailed description.

Fig. 1 is a top view of a display module according to an embodiment of the present disclosure, fig. 2 is an AA' cross-sectional view of the display substrate 100 in fig. 1, fig. 3 is an exploded view of the display substrate 100 in fig. 2, fig. 4 is a schematic diagram illustrating a gradual change of a refractive index of the microstructure layer 14, please refer to fig. 1 to fig. 4, the present disclosure provides a display substrate 100 including a color filter substrate 10, where the color filter substrate 10 includes:

a substrate base plate 11;

a light-shielding layer 12, the light-shielding layer 12 including a plurality of light-shielding portions 121 and a plurality of openings 122, the openings 122 penetrating the light-shielding layer 12 in a direction perpendicular to the base substrate 11;

the color resistance layer 13, the color resistance layer 13 includes a plurality of color resistances 131, the color resistance 131 is located in the opening 122;

the microstructure layer 14, the microstructure layer 14 locates between substrate 11 and light shield layer 12; the microstructure layer 14 includes a plurality of microstructures 141 arranged in an array, a plane is formed on one side of each microstructure 141 close to the substrate 11, and a first concave-convex structure 142 is formed on one side of each microstructure 141 close to the light shielding layer 12; the refractive index of the microstructure layer 14 is N1, the refractive index of the substrate base plate 11 is N2, and the difference between N1 and N2 is less than or equal to a predetermined value N.

Specifically, referring to fig. 2 and fig. 3, the display substrate 100 includes a color filter substrate 10, the color filter substrate 10 includes a substrate 11, a light-shielding layer 12, a color-resist layer 13 and a microstructure layer 14, the light-shielding layer 12 includes a plurality of light-shielding portions 121 and a plurality of openings 122, the color-resist layer 13 includes a plurality of color-resists 131, the openings 122 penetrate through the light-shielding layer 12 along a direction perpendicular to the substrate 11, one color-resist 131 is disposed in one opening 122, the color-resist 131 may include, for example, a blue color-resist 132, a red color-resist 133 and a green color-resist 134, and blocks light of other wavelengths from passing through, since the color-resist 131 is disposed in the opening 122, and the adjacent openings 122 are separated by the light-shielding portions 121, that is, the light-shielding portions 121 are disposed between the adjacent two color-resists 131, where the light-shielding portions 121 may be, for example, black matrices, and the black matrices may. The microstructure layer 14 is disposed between the substrate 11 and the light-shielding layer 12, the microstructure layer 14 includes a plurality of microstructures 141 arranged in an array, one side of each microstructure 141 close to the substrate 11 is located on the same plane, and one side close to the light-shielding layer 12 is a first concave-convex structure 142, under the view angle shown in fig. 2, the surface of the microstructure layer 14 is a plane, and the bottom surface is a plurality of protrusions and recesses which are spaced from each other. The difference between the refractive index of the microstructure layer 14 and the refractive index of the substrate 11 is smaller than or equal to a predetermined value, so that the refractive index of the microstructure layer 14 is approximately equal to the refractive index of the substrate 11, the difference between the refractive index of the microstructure layer and the refractive index of the substrate 11 is reduced, the problem of large light reflectivity caused by large difference between the refractive index of the substrate 11 and the refractive index of the light shielding layer 12 is avoided, the total reflectivity of the display substrate 100 is favorably reduced, the display effect is improved, and the viewing experience of a user is improved.

Referring to fig. 2-4, in the present embodiment, the surface of the microstructure 141 of the microstructure layer 14 may have a nano-scale protrusion structure, the protrusion distance is smaller than the light wavelength, and the protrusion structure cannot be recognized when the light wave is incident on the surface of the protrusion structure, so that the refractive index of the material surface is continuously changed along the depth direction, as shown in fig. 4, assuming that the refractive index of the light shielding layer 12 is M0, the refractive indexes of the microstructure layer 14 and the substrate 11 are both M1, the width of the bottom surface of the microstructure 141 is z0, and the cross-sectional width of the microstructure 141 at the Δ h height is z1, the total width of the region where the microstructure 141 material is not disposed is z2+ z3, where z2+ z3 is z0-z1, the microstructure layer 14 has an equivalent refractive index M at a height Δ h,

when Δ h is 0, z1 is 0,

when Δ h ═ h, z1 ═ z0,

it can be seen that the refractive indexes of the microstructure layer 14 are different, and the effect is equivalent to a material with gradually changed refractive index, and the gradually changed refractive index can reduce the reflection phenomenon caused by the abrupt change of the refractive index, thereby eliminating the interface reflectivity between the substrate 11 and the light shielding layer 12 and/or the color resistance layer 13, effectively reducing the reflectivity of the display substrate 100, and being beneficial to further improving the display effect.

It should be noted that the shape, number and size of the microstructures 141 in fig. 2-4 are only schematic illustrations and do not represent the shape, number and size of the actual microstructures 141, and the number, size and the like of the openings 122 in the light shielding layer 12 are also schematic illustrations and are not intended to limit the present application. In addition, the above-mentioned M0 and M1 are constants defined for easy distinction in explaining the gradual refractive index change of the microstructure layer 14, and do not represent actual refractive indexes of the respective film layers, so that they do not contradict the already-defined refractive indexes n1 and n2 of the microstructure layer 14 and the substrate 11.

Optionally, please continue to refer to fig. 2 and fig. 3, the predetermined value N is greater than or equal to 0 and less than or equal to 0.1. Specifically, in this embodiment, the difference between the refractive index of the microstructure layer 14 and the refractive index of the substrate 11 is set to be greater than or equal to 0 and less than or equal to 0.1, that is, the value of N may be any value from 0 to 0.1, such as 0.1, 0.09, 0.03, or 0.05, and can play a role in reducing the reflectivity to a certain extent. Certainly, the closer the refractive index of the microstructure layer 14 is to the refractive index of the substrate 11, the better the effect of reducing the reflectivity is, for example, when the refractive index of the substrate 11 is 1.5, the total emissivity of the substrate 100 can be reduced to the minimum by using the microstructure layer 14 with the refractive index of 1.5, which is more beneficial to improving the display effect and improving the user viewing experience.

Optionally, with continuing reference to fig. 2 and fig. 3, a second concave-convex structure 123 is formed on a side of the light shielding layer 12 close to the microstructure layer 14, and the second concave-convex structure 123 is matched with the first concave-convex structure 142. Specifically, referring to fig. 2 and fig. 3, a plurality of protrusions and recesses are formed at a side of each microstructure 141 close to the light shielding layer 12, in this embodiment, a plurality of protrusions and recesses are also formed at a side of the light shielding layer 12 close to the microstructure layer 14, so as to form the second concave-convex structure 123, and the second concave-convex structure 123 is matched with the first concave-convex structure 142, so that the first concave-convex structure 142 and the second concave-convex structure 123 can be embedded with each other, thereby achieving seamless intersection between the light shielding layer 12 and the microstructure layer 14, avoiding a problem that a gap exists between the light shielding layer 12 and the microstructure layer 14 to increase the thickness of the display substrate 100, and avoiding a problem that a gap exists between the light shielding layer 12 and the microstructure layer 14 to be unfavorable for reducing the reflectivity of the display substrate 100, thereby being favorable for improving the display effect.

Alternatively, fig. 5 is a schematic structural diagram of a microstructure 141 provided in an embodiment of the present application, please refer to fig. 5, in which the microstructure 141 is a cone, a height h1 of the cone along a direction perpendicular to a plane of the substrate 11 is 90nm to 780nm, and a distance between center points of bottom surfaces of adjacent cones is 90nm to 780 nm. Specifically, referring to fig. 5, the protrusion structures have different influences on the reflectivity according to the sizes and the distances of the protrusions, and when the sizes of the protrusion structures are much larger than the wavelength of light, the incident light is reflected and scattered; when the pitch and height of the protruding structures are the same as the wavelength dimension of light waves, light can be internally reflected for many times between adjacent microstructures 141, so that the maximum absorption of incident light is realized, and the reflection of light can be reduced; when the dimensions of the protruding structures are much smaller than the wavelength of light, the light is insensitive to the microstructures 141 and gradually bends, corresponding to passing through a medium with a graded index of refraction. Given that the visible light wavelength range is 380-780nm, the microstructures 141 have the ability of equivalent graded index when the pitch and size are smaller than the visible light wavelength, and have the ability of absorbing visible light and reducing reflection when the pitch and size are equal to the visible light wavelength range, based on this, in this embodiment, the microstructures 141 are arranged as cones, the height of each cone is h1, the distance between the center points of the bottom surfaces of the adjacent cones is h2, wherein h1 is greater than or equal to 90nm and less than or equal to 780nm, and h2 is greater than or equal to 90nm and less than or equal to 780nm, so that the microstructure layer 14 can significantly reduce the reflectivity, thereby improving the display.

It should be noted that, the microstructure 141 in this embodiment is a cone merely for illustrative purposes, and is not limited to the present application, for example, in other embodiments, the microstructure 141 may be a triangular cone, a parabolic shape, a truncated cone, a rectangular pyramid, etc., of course, the approximate cone, the truncated cone, etc. formed in the process may also have the function of gradually changing the refractive index to reduce the reflectivity, and when the microstructure 141 is a triangular cone, a parabolic shape, a truncated cone, a rectangular pyramid, etc., the range of the height h1 of the upper surface to the cone and the distance h2 between the bottom center points of the adjacent cones is also applicable to the microstructures 141 in other shapes.

Alternatively, fig. 6 is another AA' cross-sectional view of the display substrate 100 shown in fig. 1, referring to fig. 6, the display substrate 100 further includes a conductive layer 15, a pressure sensitive adhesive layer 16 and a polarizer 17, the conductive layer 15 is located on a side of the substrate 11 away from the microstructure layer 14, the pressure sensitive adhesive layer 16 is located on a side of the conductive layer 15 away from the substrate 11, the polarizer 17 is located on a side of the pressure sensitive adhesive layer 16 away from the conductive layer 15, where the conductive layer 15 can guide out external static electricity accumulated on the display panel to prevent the static charge from generating an electric field to affect the display, and the conductive layer is generally electrically connected to a ground terminal; the refractive index of the conductive layer 15 is n3, the refractive index of the pressure-sensitive adhesive layer 16 is n4, the refractive index of the polarizer 17 is n5, and the refractive index of air is n 6; reflectivity of the microstructured layer 14

Reflectance of substrate base plate 11

Reflectivity of the conductive layer 15

Reflectivity of the pressure sensitive adhesive layer 16

Reflectivity of the polarizer 17

The reflectivities of the light-shielding part 121 and the color resistor 131 are both

The total reflectance of the light-shielding layer 12 and the color-resist layer 13 is R' ═ a × R + b × R, where I denotes the incident light intensity, a denotes the proportion of the openings 122 in the light-shielding layer 12, and b denotes the proportion of the light-shielding portion 121 in the light-shielding layer 12. Preferably, the polarizer 17 is an antireflective polarizer.

Specifically, referring to fig. 6, the display substrate 100 further includes a conductive layer 15, a pressure sensitive adhesive layer 16 and a polarizer 17, in the viewing angle shown in fig. 6, the conductive layer 15, the pressure sensitive adhesive layer 16 and the polarizer 17 are stacked above the substrate 11, and the microstructure layer 14 having a refractive index approximately equal to that of the substrate 11 is disposed between the light shielding layer 12 and the substrate 11, so as to avoid a problem of a large light reflectivity caused by a large difference in refractive index between the substrate 11 and the light shielding layer 12, which is beneficial to reducing the total reflectivity of the display substrate 100 and improving the display effect. In addition, because the anti-reflection polaroid has the anti-reflection function, the reflection polaroid in this application can adopt the anti-reflection polaroid, utilizes its anti-reflection function to reduce the reflectivity on polaroid 17 surface to can reduce the total reflectivity of further low display substrate 100, be favorable to promoting display effect. In general, the refractive index n6 of air is approximately equal to 1.0, the refractive index n5 of the reflective polarizer is approximately equal to 1.5, the refractive index n4 of the pressure sensitive adhesive layer 16 is approximately equal to 1.5, the refractive index of the conductive layer 15 is approximately equal to 1.8, the refractive index of the substrate 11 is approximately equal to 1.5, the refractive index of the light shielding portion 121 is approximately equal to 1.7, and the refractive index of the color resist 131 is approximately equal to 1.6, and the above-mentioned reflectance calculation formula is substituted to obtain: when the microstructure layer 14 is provided, the reflectance R1 of the microstructure layer 14 is 0, the reflectance R2 of the substrate 11 is 0.008, the reflectance R3 of the conductive layer 15 is 0.008, the reflectance R4 of the pressure sensitive adhesive layer 16 is 0, and the reflectance R5 of the polarizer 17 is 0.003, so that the reflectance of the light shielding layer 121 and the color resist 131 is 1.88%, and when the proportion of the openings 122 in the light shielding layer 12 is 60% and the proportion of the light shielding layer 121 in the light shielding layer 12 is 40%, the total reflectance of the light shielding layer 12 and the color resist layer 13 is also 1.88%; when the microstructure layer 14 is not arranged, the total reflectivity of the light shielding layer 12 and the color resistance layer 13 is 2.11%, and after the microstructure layer 14 is arranged, the total reflectivity of the light shielding layer 12 and the color resistance layer 13 is reduced by 0.23%, so that the display effect can be improved, and the watching experience of a user is improved.

The conductive layer 15 may be made of Indium Tin Oxide (ITO), Indium Zinc Oxide (IZO), Indium Gallium Zinc Oxide (IGZO), or the like, and is not particularly limited herein.

Optionally, fig. 7 is a schematic structural diagram of the conductive layer 15 according to an embodiment of the present disclosure, and fig. 8 is a cross-sectional view of another AA' of the display substrate 100 in fig. 1, please refer to fig. 7-8, in which the conductive layer 15 includes a plurality of metal mesh units 151, and each of the metal mesh units 151 includes a hollow portion 152 and an edge 153 surrounding the hollow portion 152; the orthographic projection of the hollow part 152 on the plane of the substrate base plate 11 covers the orthographic projection of the opening 122 on the plane of the substrate base plate 11; the orthographic projection of the edge 153 on the plane of the substrate 11 is within the range defined by the orthographic projection of the light shielding portion 121 on the plane of the substrate 11. Specifically, referring to fig. 7 and 8, in the present embodiment, the conductive layer 15 is configured as a plurality of metal grid units 151, the metal grid units 151 are hollow, and the hollow parts of the metal grid units 151 are filled with the pressure sensitive adhesive layer 16, so that the contact area between the conductive layer 15 and the substrate 11 is reduced, and a part of the pressure sensitive adhesive layer 16 is in contact with the substrate 11, because the refractive index of the pressure sensitive adhesive layer 16 is approximately equal to the refractive index of the substrate 11, that is, the refractive index difference between the pressure sensitive adhesive layer 16 and the substrate 11 is smaller than the refractive index difference between the conductive layer 15 and the substrate 11, therefore, the conductive layer 15 is configured as a grid unit with a part of the hollow part, which is beneficial to reducing the reflectivity thereof, and accordingly, the total reflectivity of the display substrate 100 is reduced. In addition, in this embodiment, the hollow portion 152 is further disposed to correspond to the opening 122 in the light-shielding layer 12, and the edge 153 surrounding the hollow portion 152 corresponds to the light-shielding portion 121, so that the problem that the edge 153 of the metal mesh unit 151 is visible can be avoided, which is beneficial to further improving the display effect and improving the viewing experience of the user.

Optionally, with continued reference to fig. 6, the material of the microstructure layer 14 is resin. Specifically, in this embodiment, the microstructure layer 14 is made of a resin material having a refractive index of approximately 1.5, so that the refractive index of the microstructure layer is close to that of the substrate 11, thereby reducing the difference between the refractive indexes of the microstructure layer 14 and the substrate 11, and avoiding the problem of reflectivity increase caused by a large difference between the refractive indexes of the added microstructure layer 14 and the substrate 11. Preferably, with continuing reference to fig. 6, the display substrate 100 further includes a protective layer 18, the protective layer 18 is located on a side of the color resist layer 13 away from the substrate 11, and the protective layer 18 is made of resin, specifically, since the light shielding layer 12 is covered by the color resist layer 13, and the color resist 131 is located in the opening 122 of the light shielding layer 12, and there is a height difference between the light shielding portion 121 not covered by the color resist 131 and the color resist 131, in this embodiment, the protective layer 18 is disposed on the side of the color resist layer 13 away from the substrate 11, and the height difference between the light shielding portion 121 and the color resist 131 is filled by the protective layer 18, so that the color filter substrate 10 forms a flat plane to avoid uneven display. In addition, the protective layer 18 is made of the same resin material as the microstructure layer 14, and the microstructure layer 14 and the protective layer 18 can be cured in the same manner, so that the process difficulty can be reduced.

Based on the same inventive concept, an embodiment of the present application provides a method for manufacturing a display substrate 100, fig. 9 is a flowchart illustrating the method for manufacturing the display substrate 100 according to the embodiment of the present application, please refer to fig. 9, where the method for manufacturing the display substrate 100 according to the embodiment of the present application includes:

step 210: providing a substrate 11, wherein the refractive index of the substrate 11 is n 2;

step 220: referring to fig. 10, fig. 10 is a schematic diagram illustrating a process for manufacturing the microstructure layer 14 according to an embodiment of the present disclosure, in which the refractive index of the microstructure layer 14 is N1, and a difference between N1 and N2 is less than or equal to a predetermined value N; the imprinting mold 50 is used for imprinting the side, away from the substrate base plate 11, of the microstructure layer 14, and performing curing treatment to form a plurality of microstructures 141 arranged in an array, wherein a plane is formed on one side, close to the substrate base plate 11, of each microstructure 141, and a first concave-convex structure 142 is formed on one side, away from the substrate base plate 11, of each microstructure 141;

step 230: referring to fig. 11, fig. 11 is a schematic structural diagram illustrating a method for manufacturing a light-shielding layer 12 according to an embodiment of the present disclosure, in which the light-shielding layer 12 is disposed on a side of the microstructure layer 14 away from the substrate 11, the light-shielding layer 12 includes a plurality of light-shielding portions 121 and a plurality of openings 122, and the openings 122 penetrate through the light-shielding layer 12 along a direction perpendicular to the substrate 11;

step 240: referring to fig. 12, fig. 12 is a schematic structural diagram of the color resist layer 13 according to the embodiment of the present disclosure, in which the color resist layer 13 includes a plurality of color resists 131, and the color resists 131 are located in the openings 122.

Specifically, referring to fig. 9 and 10, in the manufacturing method of the display substrate 100 provided in the embodiment of the present application, a substrate 11 with a refractive index of n2 is provided, a layer of the microstructure layer 14 with a refractive index of n1 is coated on one side of the substrate 11 through step 220, and an imprinting mold 50 is used to imprint and cure one side of the microstructure layer 14 away from the substrate 11, so as to form a plurality of microstructures 141 arranged in an array manner, wherein a difference between the refractive index of the microstructure layer 14 and the refractive index of the substrate 11 is smaller than or equal to a predetermined value, for example, when the refractive index of the substrate 11 is 1.5, the microstructure layer 14 may be made of a material with a refractive index of greater than or equal to 1.5 and smaller than or equal to 1.6, so as to reduce the refractive index difference between the microstructure layer 14 and the substrate 11 as much as possible, and avoid the problem of large light reflectivity caused by a large refractive index difference between the substrate 11 and, the total reflectivity of the display substrate 100 is reduced, the display effect is improved, and the user viewing experience is improved.

With continued reference to fig. 11-12, after forming the microstructure layer 14, a light-shielding layer 12 is disposed on a side of the microstructure layer 14 away from the substrate 11 in step 230, and a plurality of openings 122 penetrating through the light-shielding layer 12 in a direction perpendicular to the substrate 11 are disposed on the light-shielding layer 12, where the openings 122 are formed, a light-shielding portion 121 is formed at a position where the opening 122 is not disposed by a photolithography process through exposure and development processes, and adjacent openings 122 are separated by the light-shielding portion 121, where the light-shielding portion 121 may be, for example, a black matrix, and the black matrix may increase contrast of a display screen to prevent color mixing. After the opening 122 is formed, a color resist layer 13 is disposed through step 240, where the color resist layer 13 includes a plurality of color resists 131, and the color resists 131 are located in the opening 122, and the color resists 131 may include, for example, a blue color resist 132, a red color resist 133, and a green color resist 134, and block light of other wavelengths from passing through, thereby implementing color display of a picture.

Optionally, fig. 13 is another flowchart illustrating a manufacturing method of the display substrate 100 according to the embodiment of the present application, and fig. 14 is a schematic structural diagram illustrating the manufacturing method of the protective layer 18 according to the embodiment of the present application, please refer to fig. 13 and fig. 14, where the manufacturing method further includes step 250: a protective layer 18 is applied to the side of the color resist layer 13 remote from the base substrate 11. Specifically, referring to fig. 13 and 14, after the color resist layer 13 is manufactured, a protective layer 18 is further coated on a side of the color resist layer 13 away from the substrate 11, the protective layer 18 is made of resin, since the light shielding layer 12 is covered by the color resist layer 13, and the color resist 131 is located in the opening 122 of the light shielding layer 12, and there is a height difference between the light shielding portion 121 not covered by the color resist 131 and the color resist 131, in this embodiment, the protective layer 18 is disposed on a side of the color resist layer 13 away from the substrate 11, and the height difference formed by the light shielding portion 121 and the color resist 131 is filled by the protective layer 18, so that the color filter substrate 10 forms a flat plane, and uneven display is avoided. In addition, the protective layer 18 is made of the same resin material as the microstructure layer 14, and the microstructure layer 14 and the protective layer 18 can be cured in the same manner, so that the process difficulty can be reduced.

Optionally, with continued reference to fig. 9 and fig. 10, a curing process is performed, specifically: the microstructure layer 14 is cured by thermal curing or photo-curing. Specifically, in the present embodiment, when the microstructure layer 14 is cured, a thermal curing or photo-curing method is adopted to cure the material of the microstructure layer 14 after being irradiated or heated. The thermosetting has wide technological adaptability, can adapt to heating curing of a drying tunnel or a drying oven, and the cured material has good water resistance, oil resistance, high temperature resistance, aging resistance and other properties, is not easy to deteriorate, thereby being beneficial to prolonging the service life. The photocuring has the advantages of environmental protection, high curing speed, wide applicability, low energy consumption and the like, and is beneficial to saving energy and improving curing efficiency, so that the manufacturing efficiency of the display substrate 100 is improved.

Based on the same inventive concept, the present application further provides a display device 200, fig. 15 is a schematic structural diagram of the display device 200 provided in the embodiments of the present application, please refer to fig. 15, the display device 200 includes a display substrate 100, and the display substrate 100 is any display substrate 100 provided in the embodiments of the present application. It should be noted that, for the embodiments of the display device 200 provided in the present application, reference may be made to the embodiments of the display substrate 100, and the same parts are not described again. The display device 200 provided by the present application may be: the display device can be a liquid crystal display device or an OLED display device, and the like.

According to the embodiments, the application has the following beneficial effects:

The foregoing description shows and describes several preferred embodiments of the present application, but as aforementioned, it is to be understood that the application is not limited to the forms disclosed herein, but is not to be construed as excluding other embodiments and is capable of use in various other combinations, modifications, and environments and is capable of changes within the scope of the inventive concept as expressed herein, commensurate with the above teachings, or the skill or knowledge of the relevant art. And that modifications and variations may be effected by those skilled in the art without departing from the spirit and scope of the application, which is to be protected by the claims appended hereto.

Claims

1. A display substrate, comprising: the color film substrate comprises:

a substrate base plate;

2. The display substrate of claim 1,

the value range of the preset value N is more than or equal to 0 and less than or equal to 0.1.

3. The display substrate according to claim 1, wherein a second concave-convex structure is formed on a side of the light-shielding layer close to the microstructure layer, and the second concave-convex structure is matched with the first concave-convex structure.

4. The display substrate of claim 1,

the microstructure is a cone, the height of the cone in the direction perpendicular to the plane of the substrate base plate is 90nm-780nm, and the distance between the centers of the bottom surfaces of the adjacent cones is 90nm-780 nm.

5. The display substrate according to claim 1, further comprising a conductive layer, a pressure sensitive adhesive layer and a polarizer, wherein the conductive layer is located on the side of the substrate away from the microstructure layer, the pressure sensitive adhesive layer is located on the side of the conductive layer away from the substrate, and the polarizer is located on the side of the pressure sensitive adhesive layer away from the conductive layer;

the refractive index of the conductive layer is n3, the refractive index of the pressure-sensitive adhesive layer is n4, the refractive index of the polarizer is n5, and the refractive index of air is n 6;

reflectivity of microstructure layer

Reflectivity of substrate base plate

Reflectivity of the conductive layer

Reflectivity of pressure sensitive adhesive layer

Reflectivity of polarizer

6. The display substrate of claim 5, wherein the light-shielding portion and the color resistor have reflectivities of both

The total reflectivity of the light shielding layer and the color resistance layer is R' ═ a R + b R, wherein I represents the incident light intensity, a represents the proportion of the opening in the light shielding layer, and b represents the proportion of the light shielding layer in the light shielding layer.

7. The display substrate of claim 5, wherein the polarizer is an anti-reflective polarizer.

8. The display substrate of claim 5, wherein the conductive layer comprises a plurality of metal mesh cells, the metal mesh cells comprising a hollowed-out portion and an edge surrounding the hollowed-out portion; the orthographic projection of the hollow part on the plane of the substrate base plate covers the orthographic projection of the opening on the plane of the substrate base plate; the orthographic projection of the edge on the plane of the substrate base plate is located in the range limited by the orthographic projection of the light shielding part on the plane of the substrate base plate.

9. The display substrate of claim 1, wherein the material of the micro-structural layer is a resin.

10. The display substrate of claim 1, further comprising a protective layer on a side of the color-resist layer away from the substrate.

11. The display substrate according to claim 10, wherein a material of the protective layer is a resin.

12. A method for manufacturing a display substrate is characterized by comprising the following steps:

13. The method for manufacturing a display substrate according to claim 12, further comprising: and coating a protective layer on one side of the color resistance layer, which is far away from the substrate base plate.

14. The method for manufacturing a display substrate according to claim 12, wherein the curing process is specifically: and curing the microstructure layer by adopting a thermal curing or light curing mode.

15. A display device comprising the display substrate according to any one of claims 1 to 11.