CN110894606A

CN110894606A - Crawler-type double-gravure synchronous etching system and etching method

Info

Publication number: CN110894606A
Application number: CN201910997966.XA
Authority: CN
Inventors: 吴达红
Original assignee: Changsha Li Anneng Electronic Technology Co Ltd
Priority date: 2019-10-21
Filing date: 2019-10-21
Publication date: 2020-03-20

Abstract

The invention discloses a crawler-type double-gravure synchronous etching system, which comprises two crawler belts, wherein the two crawler belts are attached to a plane of a substrate to be processed, the crawler belts are provided with gravure exposing the processing position of the substrate, the crawler belts are connected through a sealant, and the side surfaces of the substrate are completely coated by the sealant and the crawler belts; an etching tank, wherein the etching tank is loaded with etching solution for etching; and the driving roller drives the caterpillar band and the base material to pass through the etching solution so as to realize etching processing. Complex processes such as film coating, developing, exposure and the like do not need to be carried out on the surface of the base material in advance, and the process flow is simple. Meanwhile, the shape of the etching can be customized according to the requirement, the application range is wide, the method can be used for etching processing production of various shapes, and the production efficiency is improved.

Description

Crawler-type double-gravure synchronous etching system and etching method

Technical Field

The invention relates to the field of metal etching processing, in particular to a crawler-type double-gravure synchronous etching device and an etching method.

Background

At present, the etching process is widely applied to the fields of pattern processing of metal surfaces, semiconductor lead frames and the like. The basic principle is that after the surface to be processed of a metal substrate is subjected to film coating, exposure plate making and development, the protective film of a region to be etched is removed, the exposed metal part of the protective film is removed, and is contacted with chemical solution during etching to achieve the effect of dissolution, corrosion and removal, and then the coating film on the surface of the substrate is cleaned and removed to manufacture the pre-designed concave-convex or hollow-out formed product pattern effect; the problem of this etching method is that the metal substrate must be first coated with a film before etching, then developed and exposed, and then the etching process can be performed, and then the previous coating film is removed to produce the finished product, which has many processes, is complicated, and has relatively high production cost.

Disclosure of Invention

The present invention is directed to solving at least one of the problems of the prior art. Therefore, the crawler-type double-gravure synchronous etching system provided by the invention can simplify the production process and improve the production efficiency.

The invention also provides an etching method suitable for the crawler-type double-gravure synchronous etching system.

The crawler-type double-gravure synchronous etching system comprises two crawler belts, wherein the two crawler belts are attached to a plane of a substrate to be processed, gravure pore channels exposed out of the processing position of the substrate are arranged on the crawler belts, the crawler belts are connected through a sealant, and the side faces of the substrate are completely covered by the sealant and the crawler belts; the etching tank is filled with etching solution for etching; and the driving roller drives the caterpillar band and the base material to pass through the etching solution so as to realize etching processing.

The crawler-type double-gravure synchronous etching system provided by the embodiment of the invention at least has the following beneficial effects: the method does not need to carry out repeated and complicated processes such as film coating, developing, exposure and the like on the surface of the base material in advance, and has simpler process flow. Meanwhile, the shape of the etching can be customized according to the requirement, the application range is wide, the method can be used for etching processing production of various shapes, and the production efficiency is improved.

According to some embodiments of the invention, the tracks are provided with locating holes for keeping the two tracks moving synchronously.

According to some embodiments of the invention, a plurality of groups of spray heads for spraying etching solution to the track intaglio are arranged in the etching tank.

According to some embodiments of the invention, the drive roller is provided in plurality, and the track passes through the drive roller in a curved shape.

According to some embodiments of the invention, the spray heads correspond to the driving rollers one by one, and the spray heads are opposite to the side, attached to the crawler belt, of the driving rollers

According to the crawler-type etching method of the second aspect embodiment of the invention, the crawler-type double-gravure synchronous etching system is suitable for the crawler-type double-gravure synchronous etching system of the first aspect embodiment, and comprises the following steps: the base material is attached to the crawler belt; the driving roller synchronously sends the caterpillar band and the base material into an etching tank for etching; and the driving roller sends out the etched caterpillar band and the base material.

The crawler-type etching method provided by the embodiment of the invention has at least the following beneficial effects: the process flow of etching processing is simplified, consumables such as photoresist or developer do not need to be repeatedly coated, the manufacturing cost of products is greatly reduced, the production efficiency and consistency of etching processing are improved, the production process is flexible, the crawler-type intaglio can be manufactured according to the shape of a substrate or an etching product to be etched, and then different crawler-type intaglio can be replaced.

Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.

Drawings

The above and additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:

FIG. 1 is a schematic structural diagram of an embodiment of the present invention;

FIG. 2 is a schematic view of a substrate and track attachment configuration according to an embodiment of the present invention;

FIG. 3 is a front view of a track and substrate conformable structure according to an embodiment of the present invention;

fig. 4 is an enlarged view at a in fig. 3.

Fig. 5 is a graph showing the effect of fig. 4 after etching.

Track-100 intaglio-110 sealant-120 positioning holes-130

Etch bath-200 cycle detection and control system-210

Driving roller-300

Spray header-400

Detailed Description

Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the accompanying drawings are illustrative only for the purpose of explaining the present invention, and are not to be construed as limiting the present invention.

Referring to fig. 1, an embodiment of the invention is a caterpillar 100 type double-gravure synchronous etching system and an etching method, comprising a caterpillar 100, a shower head 400 and an etching bath 200. The material that needs to be processed is the substrate, and track 100 covers on the substrate tow sides, is provided with the intaglio 110 that corresponds the etching shape needs on track 100 according to the processing needs, and the part that needs the etching processing on the substrate can be exposed to intaglio 110, and track 100 can shelter from the part that does not process on the substrate, and track 100 and substrate get into in the etching groove 200, and etching solution can contact and take place the reaction through intaglio 110 and substrate surface, realizes the substrate etching.

As shown in fig. 3 and 4, the two caterpillar tracks 100 clamp the substrate, and since the substrate has a certain thickness, a certain gap is left on the left and right sides, and in order to prevent the etching solution from penetrating into the etching substrate from the gap, the two caterpillar tracks 100 are connected and sealed by the sealant 120. So that only the exposed portion of the substrate exposed out of the intaglio plate 110 contacts the etching solution and the etching solution is prevented from entering the non-etching area outside the intaglio plate 110. In this embodiment, the intaglio 110 in fig. 4 has numerous intaglio patterns, which means that the substrate is etched to form the desired shape of micropores, such as a microporous copper foil or aluminum foil current collector for a battery or a capacitor;

preferably, the edge of the crawler 100 is provided with a positioning hole 130, and the positioning hole 130 is used for synchronously driving the two crawlers 100, so that the processing precision is not influenced by dislocation of the crawlers 100 in the moving processing process, and further the double-sided synchronous etching of the base material can be realized. Due to the adoption of double-sided synchronous etching, the processing speed can be greatly improved under the condition of etching through holes on the base material.

Generally, a plurality of driving rollers 300 are disposed in the etching bath 200, and the track 100 passes through the etching bath 200 while being wound between the driving rollers 300 in a curved manner, so that the moving distance of the track 100 in the etching bath 200 can be increased, and the etching reaction can be more sufficiently performed. In this embodiment, the driving rollers 300 are arranged in two rows, and the upper and lower curved portions of the track 100 are wound between the driving rollers 300 to increase the length of the substrate in the etching bath 200, in other embodiments, the driving rollers 300 may have other arrangements.

Specifically, the driving roller can adopt various types such as a through-hole-shaped linear roller, an adhesive tape type flattening roller, an arc-shaped flattening roller and a threaded flattening roller according to the actual processing requirement, and is used for ensuring that the track 100 and the base material are completely and smoothly attached in the etching groove.

In other embodiments, the shape of the intaglio plate 110 on the caterpillar 100 is circular, so that the caterpillar 100 can be circularly moved end to be attached to the substrate before entering the etching tank 200, the caterpillar 100 is separated from the substrate after etching is completed, and the caterpillar 100 returns to the position before entering the etching tank 200 to be continuously attached to the next segment of the substrate, thereby facilitating the processing of a large number of substrates with circular shapes.

In order to accelerate the etching progress and help remove the residual waste materials in the substrate, a plurality of groups of spray heads 400 are arranged in the etching tank 200, and the spray heads 400 can spray etching liquid into the intaglio 110 on the crawler 100, so that the etching efficiency is accelerated. In this embodiment, the shower head 400 faces the side of the drive roller 300 where the track 100 passes.

Preferably, a circulation detection and control system 210 for detecting the properties of the etching solution and promoting the circulation of the etching solution is further disposed in the etching bath 200, and the circulation detection and control system 210 includes a conductivity control system, a temperature control system, a solution concentration control system, a circulation pump, and the like, and can detect various properties of the etching solution, thereby ensuring the efficiency and quality of the etching process. Meanwhile, the flow circulation of the etching solution can be promoted, and the components of the etching solution in the etching tank 200 are ensured to be uniform.

Preferably, in the embodiment, the track 100 is made of titanium foil, the thickness is in the range of 0.001-1 mm, the width of the track 100 can be customized according to the requirement of the width of a product, the range is generally 1-3000 mm, the length of the track 100 can be customized according to the requirements of the size, the length, the continuous production efficiency and the like of the breadth to be etched and processed, and the length range is larger than 10 mm; in other embodiments, the track 100 may be made of other types of corrosion resistant materials and the track 100 may be customized as desired.

The working principle of the embodiment is as follows: the front and back surfaces of the base material to be processed are attached to the crawler belts 100 through the sealant 120, and the two crawler belts 100 are connected and fixed through the positioning holes 130 to realize synchronous movement. The caterpillar track 100 and the base material are driven by the driving roller 300 to be in a curve shape and pass through the etching groove 200 for etching processing, and etching liquid is sprayed out from the spray header 400 to wash the base material exposed in the intaglio plate 110, so that high-efficiency etching is realized. After etching is completed, the track 100 is separated to obtain the etched substrate.

The etching method of the etching system comprises the following steps: the substrate is attached to the track 100; the driving roller 300 synchronously sends the caterpillar track 100 and the base material into the etching tank 200 for etching; the driving roller 300 sends out the track 100 and the base material after etching.

The embodiments of the present invention have been described in detail with reference to the accompanying drawings, but the present invention is not limited to the above embodiments, and various changes can be made within the knowledge of those skilled in the art without departing from the gist of the present invention.

Claims

1. A track-type double-gravure synchronous etching system is characterized by comprising:

the crawler belt (100) comprises two tracks which are attached to two planes of a base material to be processed, an intaglio (110) exposing the processing position of the base material is arranged on the crawler belt (100), and the crawler belts (100) are connected through a sealant (120) and completely cover the two side surfaces of the base material;

an etching tank (200), wherein the etching tank (200) is filled with etching solution for etching;

and the driving roller (300) is used for completely attaching and flattening the crawler belt (100) and the base material and driving the crawler belt (100) and the base material to pass through the etching solution so as to realize etching processing.

2. The tracked, double-gravure, synchronous etching system of claim 1, wherein: the crawler belts (100) are provided with positioning holes (130) for keeping the two crawler belts (100) to move synchronously.

3. The tracked, double-gravure, synchronous etching system of claim 1, wherein: a plurality of groups of spray heads (400) for spraying etching solution to the caterpillar track (100) are arranged in the etching tank (200).

4. The tracked, double-gravure, synchronous etching system of claim 1, wherein: the plurality of driving rollers (300) are arranged, and the track (100) passes through the driving rollers (300) in a curve shape.

5. The tracked, double-gravure, synchronous etching system according to claim 3, wherein: the spray headers (400) are arranged on two surfaces of the two crawler belts (100) which are arranged oppositely.

6. The tracked, double-gravure, synchronous etching system of claim 1, wherein: a circular detection and control system (210) for detecting the solution properties and ensuring the solution consistency is arranged in the etching tank (200).

7. The tracked, double-gravure, synchronous etching system of claim 1, wherein: the crawler belt (100) is made of an anti-corrosion material, including but not limited to titanium-containing metal foil, and the thickness of the crawler belt ranges from 0.001 mm to 1 mm.

8. A caterpillar type simultaneous etching method for double intaglio plates, which is applied to the etching system of any one of claims 1 to 7, the method comprising the steps of: the base material is attached to the crawler belt (100); the driving roller (300) synchronously sends the caterpillar track (100) and the base material into the etching tank (200) for etching; the driving roller (300) sends out the etched caterpillar band (100) and the base material.