CN110879670A - Touch display device and preparation method - Google Patents
Touch display device and preparation method Download PDFInfo
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- CN110879670A CN110879670A CN201911002138.4A CN201911002138A CN110879670A CN 110879670 A CN110879670 A CN 110879670A CN 201911002138 A CN201911002138 A CN 201911002138A CN 110879670 A CN110879670 A CN 110879670A
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
Abstract
A touch display device and a manufacturing method thereof comprise a display area and a binding area located on one side of the display area, wherein the binding area comprises a welding area, and the part of the touch display device located in the binding area comprises a flexible display panel, a first metal grid layer, an ITO conductive thin film layer, a first protective layer, a second metal grid layer and a second protective layer; the ITO conductive thin film layer is located on the welding area, the lower surface of the ITO conductive thin film layer is in contact with the first metal grid layer, the upper surface of the ITO conductive thin film layer is in contact with the second metal grid layer, and the first metal grid layer is separated from the second metal grid layer through the ITO conductive thin film layer.
Description
Technical Field
The invention relates to the technical field of touch control, in particular to a touch control display device and a preparation method thereof.
Background
In contrast to the conventional method in which a touch panel is separately provided on a display screen (liquid crystal panel), research for integrating the touch panel function with the liquid crystal panel is becoming popular. The integration of the touch screen and the liquid crystal panel comprises an 'On-cell' technology. The "On-cell" technology is a technology for embedding the touch display module panel function between a color film substrate and a polarizing plate. The On-cell technology is more and more favored by people due to its advantages of high penetration rate, low impedance, high sensitivity, etc. At present, in the existing touch display device applied to the On-cell technology, partial double-layer metal layers at the binding end of a display panel are overlapped, the coverage between the double-layer metal layers is poor due to the smooth characteristic of the metal surface, and when the touch display device is bound, the partial double-layer metal layers are peeled off due to insufficient tension value, so that the yield loss of the touch display device is further caused.
In summary, in the conventional touch display device and the manufacturing method thereof, due to the overlapping of the two metal layers at the binding end of the display panel, the coverage between the two metal layers is poor due to the smooth surface of the metal, and further, when the touch display device is bound, the two metal layers are partially peeled off due to insufficient tensile force, thereby further causing yield loss of the touch display device.
Disclosure of Invention
The invention provides a touch display device and a preparation method thereof, which can enable part of double-layer metal layers at the binding end of a display panel to be completely covered by an ITO conductive film, and solve the technical problems that the existing touch display device and the preparation method have poor coverage property due to the characteristic of smooth metal surface between the double-layer metal layers because the part of the double-layer metal layers at the binding end of the display panel are overlapped, further the part of the double-layer metal layers are peeled off due to insufficient tension value when the touch display device is bound, and further the yield loss of the touch display device is caused.
In order to solve the above problems, the technical scheme provided by the invention is as follows:
the invention provides a touch display device, which comprises a display area and a binding area positioned on one side of the display area, wherein the binding area comprises a welding area, and the part of the touch display device positioned in the binding area comprises a flexible display panel, a first metal grid layer, an ITO (indium tin oxide) conductive film layer, a first protective layer, a second metal grid layer and a second protective layer;
the ITO conductive thin film layer is located on the welding area, the lower surface of the ITO conductive thin film layer is in contact with the first metal grid layer, the upper surface of the ITO conductive thin film layer is in contact with the second metal grid layer, and the first metal grid layer is separated from the second metal grid layer through the ITO conductive thin film layer.
According to a preferred embodiment of the present invention, the second protective layer completely covers the second metal mesh layer and is in contact with a portion of the ITO conductive thin film layer.
According to a preferred embodiment of the present invention, the first metal mesh layer is prepared on the flexible display panel by a yellow light process, and the second metal mesh layer is prepared on the first protective layer by a yellow light process.
According to a preferred embodiment of the present invention, the material of the first metal mesh layer and the second metal mesh layer is one of copper, silver and aluminum.
According to a preferred embodiment of the present invention, the first metal mesh layer and the second metal mesh layer have the same thickness.
According to a preferred embodiment of the present invention, the first protective layer and the second protective layer are made of photosensitive insulating glue.
The invention also provides a preparation method of the touch display device, which comprises the following steps:
s10, providing a flexible display panel, wherein the flexible display panel comprises a display area and a binding area located on one side of the display area, the binding area comprises a welding area, and a first metal grid layer is formed on the flexible display panel;
s20, coating a first protective layer on the first metal grid layer, wherein the first protective layer does not cover the part of the first metal grid layer located on the welding area;
s30, forming a second metal grid layer on the first protection layer;
s40, depositing an ITO conductive thin film layer on the first metal grid layer at the welding area, wherein the ITO conductive thin film layer is electrically connected with the second metal grid layer at the welding area;
s50, coating a second protective layer on the second metal grid layer, wherein the second protective layer completely covers the second metal grid layer.
According to a preferred embodiment of the present invention, the S10 further includes:
s101, providing a flexible display panel, wherein the flexible display panel comprises a display area and a binding area positioned on one side of the display area, the binding area comprises a welding area, and a metal layer is sputtered on the flexible display panel in a vacuum mode;
s102, coating photoresist on the metal layer, and covering the part to be etched of the metal layer;
s103, exposing the photoresist, and photoetching a grid electrode pattern on the photoresist;
s104, developing and hardening the photoresist, etching the metal layer covered by the photoresist, and forming a first metal grid layer.
According to a preferred embodiment of the present invention, the material of the first metal mesh layer and the second metal mesh layer is one of copper, silver and aluminum.
According to a preferred embodiment of the present invention, the first protective layer and the second protective layer are made of photosensitive insulating glue.
The invention has the beneficial effects that: according to the touch display device and the preparation method provided by the invention, the ITO conductive thin film layer is arranged in the welding area of the binding area, so that the contact between the partial double-layer metal layers in the welding area is avoided, the partial double-layer metal layers in the welding area are effectively prevented from being peeled off, the yield of an On-cell process is improved, and the reliability of the touch display device is further improved.
Drawings
In order to illustrate the embodiments or the technical solutions in the prior art more clearly, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the invention, and it is obvious for a person skilled in the art that other drawings can be obtained according to these drawings without creative efforts.
Fig. 1 is a schematic structural diagram of the area division of the touch display device according to the present invention.
Fig. 2 is a schematic cross-sectional view of a portion of a touch display device in a display area according to the present invention.
Fig. 3 is a schematic cross-sectional view of a portion of a touch display device in a bonding area according to the present invention.
Fig. 4 is a top view of the touch display device in the binding region according to the present invention.
Fig. 5 is a top view of a process of manufacturing a touch display device according to the present invention.
Detailed Description
The following description of the various embodiments refers to the accompanying drawings that illustrate specific embodiments in which the invention may be practiced. The directional terms mentioned in the present invention, such as [ upper ], [ lower ], [ front ], [ rear ], [ left ], [ right ], [ inner ], [ outer ], [ side ], are only referring to the directions of the attached drawings. Accordingly, the directional terms used are used for explanation and understanding of the present invention, and are not used for limiting the present invention. In the drawings, elements having similar structures are denoted by the same reference numerals.
The invention aims at the technical problems that the overlapping performance between two metal layers is poor due to the characteristic of smooth metal surfaces because the two metal layers at the binding end of the display panel are overlapped, and further the partial two metal layers are peeled off due to insufficient tension values when the touch display device is bound, and further the yield loss of the touch display device is caused in the conventional touch display device and the preparation method thereof.
As shown in fig. 1, a schematic structural diagram of the area division of the touch display device provided by the present invention is shown. The touch display device comprises a flexible display panel 10, wherein the flexible display panel 10 comprises a display area 11 and a non-display area 12 located around the display area 11, and a binding area 13 of the non-display area 12 comprises a welding area (Pad area) 14. The area for binding the driver chip in the non-display area 12 is a binding area 13, and the area where the driver chip is connected to the flexible display substrate in the binding area 13 is a bonding area (Pad area) 14.
As shown in fig. 2, a schematic view of a portion of the touch display device provided by the present invention, which is located in the display area 11, is shown. Wherein, the portion of the touch display device located in the display area 11 includes the flexible display panel 10, a first metal mesh layer (M1)21, a first protective layer 22, a second metal mesh layer (M2)23, and a second protective layer 24.
Specifically, the flexible display panel 10 includes a TFT array substrate 15, a color filter substrate 17 disposed opposite to the TFT array substrate 15, and a liquid crystal layer 16 sandwiched between the TFT array substrate 15 and the color filter substrate 17. The first metal mesh layer (M1)21 is disposed on the color filter substrate 17, and the first protective layer 22 is disposed on the color filter substrate 17 and covers the first metal mesh layer (M1) 21. The second metal mesh layer (M2)23 is disposed on the first protective layer 22, and the second protective layer 24 is disposed on the first protective layer 22 and covers the second metal mesh layer (M2) 23.
Preferably, the first metal mesh layer (M1)21 is prepared on the flexible display panel 10 through a yellow light process, and the second metal mesh layer (M2)23 is prepared on the first protection layer 22 through a yellow light process.
Preferably, the material of the first metal mesh layer (M1)21 and the second metal mesh layer (M2)23 is one of copper, silver and aluminum.
Preferably, the first metallic mesh layer (M1)21 and the second metallic mesh layer (M2)23 are the same thickness.
Preferably, the material of the first protective layer 22 and the second protective layer 24 is photosensitive insulating glue.
As shown in fig. 3, a schematic cross-sectional view of a portion of the touch display device of the present invention located in the binding region 13 is shown. Wherein the portion of the touch display device located in the binding region 13 includes the flexible display panel 10, the first metal mesh layer (M1)21, an ITO conductive film layer 25, the first protective layer 22, the second metal mesh layer (M2)23, and the second protective layer 24; the flexible display panel 10 includes a TFT array substrate 15, a color film substrate 17 disposed opposite to the TFT array substrate 15, and a liquid crystal layer 16 sandwiched between the TFT array substrate 15 and the color film substrate 17.
Specifically, the second protective layer 24 completely covers the second metal mesh layer (M2)23 and is in contact with a portion of the ITO (indium tin oxide) conductive thin film layer 25. The second protective layer 24 may prevent the second metal mesh layer (M2)23 from corroding.
Fig. 4 is a top view of the touch display device in the binding area according to the present invention. Wherein the ITO conductive thin film layer 25 is located at the bonding pad 14, the lower surface of the ITO conductive thin film layer 25 is in contact with the first metal mesh layer (M1)21, the upper surface of the ITO conductive thin film layer 25 is in contact with the second metal mesh layer (M2)23, and the ITO conductive thin film layer 25 separates the first metal mesh layer (M1)21 from the second metal mesh layer (M2) 23.
According to the touch display device provided by the invention, the ITO conductive film layer is arranged in the welding area of the binding area. Because ITO corrosion resistance is strong and the power of covering with the metal layer is good, can effectively solve because the poor problem that leads easily peel off of intermetallic coverage nature. The design can separate the two metal grid layers positioned on the welding area by the ITO conductive film layer, thereby effectively protecting and improving the abnormity of scratch, corrosion and the like caused by the post-processing.
As shown in fig. 5, the present invention further provides a method for manufacturing a touch display device, the method comprising:
s10, providing a flexible display panel, wherein the flexible display panel comprises a display area and a binding area located on one side of the display area, the binding area comprises a welding area, and a first metal grid layer is formed on the flexible display panel.
Specifically, the S10 further includes:
firstly, providing a TFT array substrate and a color film substrate arranged opposite to the TFT array substrate, aligning and assembling the TFT array substrate and the color film substrate, filling liquid crystal in the TFT array substrate and the color film substrate, and packaging in a box to obtain the flexible display panel. Wherein the flexible display panel includes a display area and a non-display area located around the display area, a binding area of the non-display area including a Pad area. The area for binding the driving chip in the non-display area is a binding area 13, and the area where the driving chip is connected with the flexible display substrate wire in the binding area is a welding area 14. And then, sputtering a metal layer on the flexible display panel in vacuum, wherein the metal layer is made of one of copper, silver and aluminum. Then, a photoresist is coated on the metal layer to cover a portion of the metal layer to be etched. Then, exposing the photoresist, and photoetching a grid electrode pattern on the photoresist; and finally, developing and hardening the photoresist, etching the metal layer covered by the photoresist, and forming a first metal grid layer.
S20, coating a first protective layer on the first metal grid layer, wherein the first protective layer does not cover the part of the first metal grid layer located on the welding area.
Specifically, the S20 further includes:
coating a first protective layer on the first metal grid layer, wherein the first protective layer does not cover the part of the first metal grid layer positioned on the welding area. The first protective layer is made of photosensitive insulating glue. The first protective layer is used in the yellow light process, and is used for manufacturing an insulating layer and recording an ITO pattern.
And S30, forming a second metal grid layer on the first protective layer.
Specifically, the S30 further includes:
firstly, a metal layer is sputtered on the first protective layer in vacuum, and the metal layer is made of one of copper, silver and aluminum. Then, a photoresist is coated on the metal layer to cover a portion of the metal layer to be etched. Then, exposing the photoresist, and photoetching a grid electrode pattern on the photoresist; and finally, developing and hardening the photoresist, etching the metal layer covered by the photoresist, and forming a second metal grid layer. Preferably, the second metallic mesh layer is the same thickness as the first metallic mesh layer.
S40, depositing an ITO conductive film layer on the first metal grid layer at the welding area, wherein the ITO conductive film layer is electrically connected with the second metal grid layer at the welding area.
Specifically, the S40 further includes:
firstly, depositing an ITO conductive thin film layer on a part of the first metal grid layer positioned on the welding area, wherein the ITO conductive thin film layer is electrically connected with a part of the second metal grid layer positioned on the welding area.
Specifically, the second protective layer completely covers the second metal mesh layer (M2) and is in contact with a portion of the ITO conductive thin film layer. The second protective layer may prevent corrosion of the second metal mesh layer. The ITO conductive thin film layer is located on the welding area, and the ITO conductive thin film layer completely covers the first metal grid layer located on the welding area and the second metal grid layer located on the welding area. The ITO conductive film layer is adopted because the ITO has strong corrosion resistance and good covering force with the metal layer, and the problem that the lead is easy to peel off due to poor covering property between metals can be effectively solved.
S50, coating a second protective layer on the second metal grid layer, wherein the second protective layer completely covers the second metal grid layer.
Specifically, the S50 further includes:
and coating a second protective layer on the second metal grid layer. The second protective layer is made of photosensitive insulating glue. The second protective layer is used in a yellow light manufacturing process, is used for manufacturing an insulating layer and is used for recording an ITO pattern, and finally the touch display device is manufactured.
According to the preparation method of the touch display device, the ITO conductive film layer is arranged in the welding area of the binding area of the touch display device. Because ITO corrosion resistance is strong and the power of covering with the metal layer is good, can effectively solve because the poor problem that leads easily peel off of intermetallic coverage nature. The design can separate the two metal grid layers positioned on the welding area by the ITO conductive film layer, thereby effectively protecting and improving the abnormity of scratch, corrosion and the like caused by the post-processing.
The invention has the beneficial effects that: according to the touch display device and the preparation method provided by the invention, the ITO conductive thin film layer is arranged in the welding area of the binding area, so that the contact between the partial double-layer metal layers in the welding area is avoided, the partial double-layer metal layers in the welding area are effectively prevented from being peeled off, the yield of an On-cell process is improved, and the reliability of the touch display device is further improved.
In summary, although the present invention has been described with reference to the preferred embodiments, the above-described preferred embodiments are not intended to limit the present invention, and those skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention, therefore, the scope of the present invention shall be determined by the appended claims.
Claims (10)
1. A touch display device comprises a display area and a binding area positioned on one side of the display area, wherein the binding area comprises a welding area, and the touch display device is characterized in that the part of the touch display device positioned on the binding area comprises a flexible display panel, a first metal grid layer, an ITO (indium tin oxide) conductive thin film layer, a first protective layer, a second metal grid layer and a second protective layer;
the ITO conductive thin film layer is located on the welding area, the lower surface of the ITO conductive thin film layer is in contact with the first metal grid layer, the upper surface of the ITO conductive thin film layer is in contact with the second metal grid layer, and the first metal grid layer is separated from the second metal grid layer through the ITO conductive thin film layer.
2. The OLED display device of claim 1, wherein the second protective layer completely covers the second metal mesh layer and contacts a portion of the ITO conductive thin film layer.
3. The OLED display device according to claim 1, wherein the first metal mesh layer is prepared on the flexible display panel by a yellow light process, and the second metal mesh layer is prepared on the first protective layer by a yellow light process.
4. The OLED display device of claim 1, wherein the first metal mesh layer and the second metal mesh layer are made of one of copper, silver and aluminum.
5. The OLED display device of claim 1, wherein the first metallic mesh layer and the second metallic mesh layer are the same thickness.
6. The OLED display device according to claim 1, wherein the material of the first protective layer and the second protective layer is photosensitive insulating glue.
7. A preparation method of a touch display device is characterized by comprising the following steps:
s10, providing a flexible display panel, wherein the flexible display panel comprises a display area and a binding area located on one side of the display area, the binding area comprises a welding area, and a first metal grid layer is formed on the flexible display panel;
s20, coating a first protective layer on the first metal grid layer, wherein the first protective layer does not cover the part of the first metal grid layer located on the welding area;
s30, forming a second metal grid layer on the first protection layer;
s40, depositing an ITO conductive thin film layer on the first metal grid layer at the welding area, wherein the ITO conductive thin film layer is electrically connected with the second metal grid layer at the welding area;
s50, coating a second protective layer on the second metal grid layer, wherein the second protective layer completely covers the second metal grid layer.
8. The method for manufacturing a touch display device according to claim 7, wherein the step S10 further includes:
s101, providing a flexible display panel, wherein the flexible display panel comprises a display area and a binding area positioned on one side of the display area, the binding area comprises a welding area, and a metal layer is sputtered on the flexible display panel in a vacuum mode;
s102, coating photoresist on the metal layer, and covering the part to be etched of the metal layer;
s103, exposing the photoresist, and photoetching a grid electrode pattern on the photoresist;
s104, developing and hardening the photoresist, etching the metal layer covered by the photoresist, and forming a first metal grid layer.
9. The method of claim 7, wherein the first metal mesh layer and the second metal mesh layer are made of one of copper, silver and aluminum.
10. The method of claim 7, wherein the first protective layer and the second protective layer are made of photosensitive insulating glue.
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| CN201911002138.4A CN110879670A (en) | 2019-10-21 | 2019-10-21 | Touch display device and preparation method |
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| CN201911002138.4A CN110879670A (en) | 2019-10-21 | 2019-10-21 | Touch display device and preparation method |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN112181199A (en) * | 2020-09-25 | 2021-01-05 | 安徽精卓光显技术有限责任公司 | Touch control assembly, manufacturing method thereof, touch screen and electronic equipment |
| CN113391476A (en) * | 2021-04-19 | 2021-09-14 | 深圳市华星光电半导体显示技术有限公司 | Display panel, display panel preparation method and display device |
| CN114049987A (en) * | 2021-10-27 | 2022-02-15 | 浙江鑫柔科技有限公司 | Metal grid conductive film and preparation method thereof |
| CN114546147A (en) * | 2020-11-27 | 2022-05-27 | 合肥鑫晟光电科技有限公司 | Display substrate, preparation method thereof and display device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN112181199A (en) * | 2020-09-25 | 2021-01-05 | 安徽精卓光显技术有限责任公司 | Touch control assembly, manufacturing method thereof, touch screen and electronic equipment |
| CN114546147A (en) * | 2020-11-27 | 2022-05-27 | 合肥鑫晟光电科技有限公司 | Display substrate, preparation method thereof and display device |
| CN114546147B (en) * | 2020-11-27 | 2023-09-22 | 合肥鑫晟光电科技有限公司 | Display substrate, preparation method thereof and display device |
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| CN114049987A (en) * | 2021-10-27 | 2022-02-15 | 浙江鑫柔科技有限公司 | Metal grid conductive film and preparation method thereof |
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