CN110849082B - Drying device - Google Patents

Drying device Download PDF

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Publication number
CN110849082B
CN110849082B CN201910984956.2A CN201910984956A CN110849082B CN 110849082 B CN110849082 B CN 110849082B CN 201910984956 A CN201910984956 A CN 201910984956A CN 110849082 B CN110849082 B CN 110849082B
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Prior art keywords
chassis
cold plate
drying apparatus
drying
substrate
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CN201910984956.2A
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CN110849082A (en
Inventor
宋媛媛
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TCL Huaxing Photoelectric Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B9/00Machines or apparatus for drying solid materials or objects at rest or with only local agitation; Domestic airing cupboards
    • F26B9/06Machines or apparatus for drying solid materials or objects at rest or with only local agitation; Domestic airing cupboards in stationary drums or chambers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B25/00Details of general application not covered by group F26B21/00 or F26B23/00

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Drying Of Solid Materials (AREA)

Abstract

The present disclosure provides a drying device. The drying device comprises an accommodating cavity, and a chassis, a cold plate and an air suction valve which are positioned in the accommodating cavity. The cold plate is arranged above the chassis and opposite to the chassis. According to the disclosure, an oleophilic material and an oleophobic material are coated on the cold plate, the oleophobic material surrounds the oleophilic material, and a projection area of the chassis on the cold plate corresponds to the oleophilic material, so that condensed gas is prevented from condensing and then dripping to pollute a substrate; and the defect of quick evaporation at the complementary edge ensures the uniform evaporation of the solvent.

Description

Drying device
Technical Field
The disclosure relates to the technical field of display manufacturing, in particular to a drying device.
Background
At present, there are two main ways to manufacture the OLED panel, one is evaporation technology, and the other is inkjet printing. Finally, after the solvent is removed through a drying process, the printing of the OLED material can be completed.
In order to ensure the uniformity of the film layer of the material, a multi-step drying process of pre-drying and post-drying is required. In consideration of the spreading uniformity of the film layer, a vacuum type condensation drying mode is often employed. However, in this mode, there is a problem of solvent evaporation, condensation and accumulation above the condenser. The ink drops can drop on the surface of the substrate after being accumulated, the device performance of the material is influenced, and meanwhile, the phenomenon that the drying speed of the edge is high and the drying speed of the inner part is low can also occur, and the uniformity of the film layer of the material is influenced. Therefore, it is necessary to improve this defect.
Disclosure of Invention
The embodiment of the disclosure provides a drying device, which is used for solving the technical problems that in the drying device in the prior art, a solvent is volatilized and then is converged above a condenser to form liquid drops, the liquid drops are dripped onto the surface of a substrate after being accumulated, the substrate is polluted, the performance of a device is influenced, the drying rate of the drying device in the prior art is different, the edge drying is fast, the internal drying is slow, and the uniformity of a film layer of a material is influenced.
The embodiment of the disclosure provides a drying device, which comprises an accommodating cavity, and a chassis, a cold plate and an air suction valve which are positioned in the accommodating cavity. The base plate is used for containing a substrate. The cold plate is arranged above the chassis and opposite to the chassis, and the area of the cold plate is larger than that of the chassis. The air exhaust valve is arranged around the chassis and used for exhausting the air in the accommodating cavity. Wherein, the cold plate is coated with an oleophilic material and an oleophobic material, the oleophobic material surrounds the oleophilic material, and the projection area of the chassis on the cold plate corresponds to the oleophilic material.
Further, the cold plate is arc-shaped, and relative to the base plate, the center of the arc is high, and the edge of the arc is low.
Further, the radian range of the arc is 0.01 radian to 0.2 radian.
Further, the lipophilic material is a high molecular material containing ester group, ether group and amide group, or polysiloxane.
Further, the oil repellent material is a polymer material containing a carboxyl group, a sulfonic group, and a phosphoric group.
Further, at least three support pins are arranged on the base plate and used for supporting the substrate.
Further, the supporting pins are distributed at equal intervals.
Furthermore, the chassis is quadrilateral, and the number of the air suction valves is at least 4, and the air suction valves are respectively arranged corresponding to the four sides of the chassis.
Furthermore, the air exhaust valves are distributed at equal intervals.
Further, the diameter range of the valve hole of the air suction valve is 10 mm to 100 mm.
The drying device has the beneficial effects that the lipophilic material and the oleophobic material are coated on the cold plate, and the oleophobic material surrounds the lipophilic material, so that condensed gas is prevented from being condensed in the middle area of the cold plate and then dripping to pollute the substrate; on the other hand, the gas is distributed at the edge, the saturated vapor pressure is increased, the defect of fast evaporation at the complementary edge is overcome, and the uniform evaporation of the solvent is ensured; by arranging the air extraction valve around the base plate, the solvent flows away from the edge by adopting the peripheral air extraction mode, so that the substrate can be prevented from being polluted.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present disclosure, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is apparent that the drawings in the following description are only some embodiments of the present disclosure, and it is obvious for those skilled in the art that other drawings can be obtained based on these drawings without inventive effort.
Fig. 1 is a schematic side view of a drying apparatus according to an embodiment of the disclosure.
FIG. 2 is a schematic view of the lower surface of a cold plate according to an embodiment of the disclosure.
Fig. 3 is a schematic top view of a lower chamber of a drying apparatus according to an embodiment of the disclosure.
Detailed Description
The technical solutions in the embodiments of the present disclosure will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present disclosure, and it is to be understood that the described embodiments are only a part of the embodiments of the present disclosure, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments disclosed herein without making any inventive step, are intended to be within the scope of the present disclosure.
Referring to fig. 1, a schematic side view of a drying apparatus according to an embodiment of the present disclosure is provided, in which components of the present disclosure and relative positions of the components can be visually seen, the drying apparatus includes a receiving chamber 101, and a chassis 102, a cold plate 104 and a suction valve 105 located in the receiving chamber 101. The base plate 102 is used for holding a substrate 103. The cold plate 104 is disposed above the chassis 102 and opposite the chassis 102, and the area of the cold plate 104 is larger than the area of the chassis 102. The gas exhaust valve 105 is disposed around the base plate 102 for exhausting the gas inside the accommodating chamber 101. The cold plate 104 is coated with an oleophilic material 106 and an oleophobic material 107, the oleophobic material 107 surrounds the oleophilic material 106, and a projection area of the chassis 102 on the cold plate 104 corresponds to the oleophilic material 106.
It should be noted that the lower surface of the cold plate 104 is coated with the oleophilic material 106 and the oleophobic material 107 and is distributed according to regions, and since the evaporated solvent has certain oleophilicity, the central position of the cold plate 104 is coated with the oleophilic material 106, so that the solvent is uniformly distributed on the surface thereof and is not easy to converge into droplets; the edge position of the cold plate 104 is coated with the oleophobic material 107, so that liquid drops are easy to condense, and the condensed gas is prevented from condensing in the middle area of the cold plate and then dropping to pollute the substrate; on the other hand, condensed droplets at the edge of the cold plate 104 distribute solvent vapor at the edge of the cold plate 104, so that the vapor pressure is close to saturated vapor pressure, and under the same other conditions, the smaller the vapor pressure is, the larger the vapor pressure is, the smaller the vapor pressure is, and the inverse relationship is formed, and after the vapor pressure at the edge is increased, the inter-molecular forces in the solvent liquid at the edge of the substrate 103 are increased, so that the evaporation speed is reduced, the evaporation amount is also reduced, namely, the defect of fast evaporation of the solvent at the edge of the substrate 103 can be complemented, and the uniform evaporation of the solvent on the. According to the distribution characteristics of the surface coating, the substrate can be prevented from being polluted by arranging the air suction valves 105 around the base plate 102, namely, the solvent is flowed away from the edge by adopting a peripheral air suction mode.
Specifically, the coating area of the lipophilic material 106 is greater than or equal to the area of the base plate 102, or the coating area of the lipophilic material 106 is greater than or equal to the area of the substrate 103 placed on the base plate 102, the lipophilic material 106 can ensure that the solvent is uniformly distributed on the surface thereof and is not easy to converge into droplets, and when the coating area of the lipophilic material 106 is greater than or equal to the area of the substrate 103, the condensed gas can be prevented from dripping to pollute the substrate 103 after being condensed in the middle area of the cold plate.
In one embodiment, the inside of the accommodating chamber 101 is in a vacuum state, and the size of the accommodating chamber 101 may be, but is not limited to: a length ranging from 1 to 2 meters, a width ranging from 1 to 2 meters, and a height ranging from 0.2 to 0.5 meters. The vacuum conditions referred to in this disclosure all represent partial vacuum rather than absolute vacuum.
In one embodiment, the material of the receiving chamber 101 is a thick-plated hot-dip galvanized sheet, the main purpose of the galvanization is to protect the base metal from corrosion, and the lifetime of the device is directly related to the galvanization thickness.
In an embodiment, the material of the base plate 102 may be, but is not limited to, stainless steel, ceramic material, etc., and the temperature of the base plate 102 is controlled within a range from 25 degrees celsius to 80 degrees celsius.
In one embodiment, the base plate 102 is provided with at least three support pins 108 for supporting the substrate 103.
In one embodiment, the support pins 108 are equally spaced.
In an embodiment, the material of the cold plate 104 may be, but is not limited to, stainless steel, ceramic material, polymer composite material, etc., and the temperature of the cold plate 104 is controlled in a range from-10 ℃ to-60 ℃.
In one embodiment, the cooling medium of the cold plate 104 may be cooling water, cooling liquid, cooling gas, or the like, and may be one or a combination of several of them.
In one embodiment, the distance between the cold plate 104 and the chassis 102 is adjustable, ranging from 3 mm to 200 mm.
In one embodiment, the perimeter of the cold plate 104 is between 2 centimeters and 15 centimeters longer than the perimeter of the chassis 102.
In one embodiment, the cold plate 104 is arcuate with a high center and a low edge relative to the base pan 102. When the panel is arranged in drying device's the intracavity that holds carries out the drying, because the cold plate has certain radian, the solvent of evaporation condenses the back, can flow to the edge by central authorities because of gravity's the reason, can not drip to the panel surface, can not influence the device performance of panel.
In one embodiment, the arc ranges from 0.01 to 0.2 radians.
As shown in fig. 2, a schematic view of a lower surface of a cold plate provided in an embodiment of the present disclosure can be seen from the figure, where components of the present disclosure and relative positions of the components are visually observed, an oleophilic material 202 and an oleophobic material 203 are coated on the cold plate 201, and the oleophilic material 202 is surrounded by the oleophobic material 203.
Wherein the area of the oleophilic material 202 corresponds to the position of the bottom plate of the drying device, and the coating area of the oleophilic material 202 is larger than or equal to the area of the bottom plate.
It should be noted that, since the evaporated solvent has a certain lipophilicity, in the region of the lipophilic material 202, the solvent is uniformly distributed on the surface thereof and is not easily converged into droplets; in the region of the oleophobic material 203, the solvent is more prone to condensation.
In one embodiment, the lipophilic material 202 is a polymer material containing ester groups, ether groups, amide groups, or is a polysiloxane.
In one embodiment, the oil-repellent material 203 is a polymer material containing a carboxyl group, a sulfonic group, and a phosphoric group.
As shown in fig. 3, a schematic top view of a lower chamber of a drying apparatus according to an embodiment of the present disclosure is provided, in which components of the present disclosure and relative positions of the components can be seen visually, a bottom plate 302 is disposed on the lower chamber 301, at least three support pins (not shown) are disposed on the bottom plate 302, the support pins are used for supporting the substrate 303, a suction valve 304 is disposed around the bottom plate, and the suction valve 304 is used for exhausting gas inside a receiving chamber.
In one embodiment, the base 302 is a quadrilateral, and the number of the suction valves 304 is at least 4, which are respectively disposed corresponding to four sides of the base 302.
It should be noted that the shape of the chassis 302 may be not only a quadrangle, but also a triangle, a circle, a sector, a pentagon, etc.; the number of the air suction valves can be, but is not limited to, 6 to 8.
In one embodiment, the extraction valves 304 are equally spaced.
In one embodiment, the valve bore diameter of the purge valve 304 is in the range of 10 mm to 100 mm, and more preferably, 10 mm to 50 mm.
The vacuum drying device is in a vacuum state, provides a heat source, supplies enough heat to the solvent in the material through heat transfer modes such as heat conduction, heat radiation and the like, enables evaporation and boiling to be carried out simultaneously, and accelerates the vaporization speed. Meanwhile, the vaporized steam is quickly pumped out by vacuumizing, a negative pressure state is formed around the material, and a large humidity gradient is formed between the inner layer and the outer layer of the material and between the surface of the material and the surrounding medium, so that the vaporization speed is increased, and the aim of quickly drying is fulfilled.
The present disclosure provides a method for drying a substrate, using the drying apparatus, comprising:
the first step is as follows: before the glass substrate is placed into the chamber, adjusting the distance between the chassis and the cold plate, and respectively adjusting the chassis and the cold plate to specified temperatures, wherein the air suction valve is in a closed state;
the second step is that: opening the cavity door, placing the substrate into the cavity door, adjusting the distance between the chassis and the cold plate, opening the air extraction valve to maintain the low-temperature vacuum state in the cavity, and performing a drying process;
the third step: and controlling an air suction pipeline to be opened, and pumping the edge solvent to avoid converging and dripping the edge solvent onto the surface of the substrate.
It should be noted that, in the first step, adjusting the distance between the chassis and the cold plate specifically means increasing the distance between the chassis and the cold plate so that the substrate can be better placed in the first step; adjusting the chassis and the cold plate to specified temperatures respectively specifically means: and adjusting the temperature of the chassis to any value between 25 ℃ and 80 ℃, and adjusting the temperature of the cold plate to any value between-10 ℃ and-60 ℃.
It should be noted that, in the second step, adjusting the distance between the chassis and the cold plate specifically means to decrease the distance between the chassis and the cold plate, so that the condensed gas is more easily contacted with the cold plate, and the drying rate is increased; in the drying process, the solvent in the panel is gasified and then spread in the oleophilic material area and gathered in the oleophobic material area.
In the third step, the solvent is flowed away from the edge by using a peripheral air exhaust mode, so that the substrate can be prevented from being polluted.
In summary, in the drying device provided by the embodiment of the disclosure, the lipophilic material and the oleophobic material are coated on the cold plate, and the oleophobic material surrounds the lipophilic material, so that on one hand, condensed gas is prevented from being condensed in the middle area of the cold plate and then dripping to pollute the substrate; on the other hand, the gas is distributed at the edge, the saturated vapor pressure is increased, the defect of fast evaporation at the complementary edge is overcome, and the uniform evaporation of the solvent is ensured; through set up the bleeder valve around the chassis, adopt the mode of bleeding all around to make the solvent flow away from the edge promptly, can avoid polluting the base plate, the drying device of prior art has been solved, because can assemble the formation liquid drop in the condenser top after the solvent volatilizees, can drip to the base plate surface after the liquid drop accumulation, lead to the base plate to be contaminated, influence the device performance, and prior art's drying device's drying rate is different, the edge is dry fast, inside is dry slowly, influence the technical problem of the rete homogeneity of material.
A drying apparatus provided in an embodiment of the present disclosure is described in detail above. It should be understood that the exemplary embodiments described herein should be considered merely illustrative for facilitating an understanding of the methods of the present disclosure and their core concepts, and not restrictive of the present disclosure.

Claims (10)

1. A drying device is characterized by comprising an accommodating cavity and a drying device, wherein the drying device is positioned in the accommodating cavity:
a chassis for holding a substrate;
the cold plate is arranged above the chassis and opposite to the chassis, and the area of the cold plate is larger than that of the chassis;
the air suction valve is arranged around the chassis and used for discharging gas in the accommodating cavity;
the bottom surface of the cold plate is coated with an oleophilic material and an oleophobic material, the oleophobic material surrounds the oleophilic material, and the projection area of the chassis on the cold plate corresponds to the oleophilic material.
2. The drying apparatus of claim 1, wherein the cold plate is arcuate, the arcuate being high at a center and low at an edge relative to the base pan.
3. Drying apparatus according to claim 2 in which the arc is in the range 0.01 to 0.2 radians.
4. Drying apparatus according to claim 1 in which the lipophilic material is a polymeric material containing ester, ether, amide groups or is a polysiloxane.
5. The drying apparatus according to claim 1, wherein the oil-repellent material is a polymer material containing a carboxyl group, a sulfonic acid group, and a phosphoric acid group.
6. Drying apparatus according to claim 1 in which the chassis is provided with at least three support pins for supporting the substrate.
7. Drying apparatus according to claim 6 in which the support pins are equally spaced.
8. Drying apparatus according to claim 1, in which the chassis is quadrilateral, and the number of said suction valves is at least 4, each being arranged to correspond to four sides of the chassis.
9. Drying apparatus according to claim 8 in which the extraction valves are equally spaced.
10. Drying apparatus according to claim 8 in which the valve bore of the bleed valve has a diameter in the range 10 mm to 100 mm.
CN201910984956.2A 2019-10-16 2019-10-16 Drying device Active CN110849082B (en)

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CN110849082B true CN110849082B (en) 2020-10-27

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999060319A1 (en) * 1998-05-18 1999-11-25 3M Innovative Properties Company Gap drying with insulation layer between substrate and heated platen
CN207232919U (en) * 2017-08-09 2018-04-13 安徽奕辉电子科技有限公司 A kind of antifog touch-screen
CN108503408A (en) * 2018-05-22 2018-09-07 机科发展科技股份有限公司 A kind of condensation collection system in tunnel type fermentation warehouse
CN209131241U (en) * 2018-11-27 2019-07-19 广东聚华印刷显示技术有限公司 Cold plate and decompression dry device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999060319A1 (en) * 1998-05-18 1999-11-25 3M Innovative Properties Company Gap drying with insulation layer between substrate and heated platen
CN207232919U (en) * 2017-08-09 2018-04-13 安徽奕辉电子科技有限公司 A kind of antifog touch-screen
CN108503408A (en) * 2018-05-22 2018-09-07 机科发展科技股份有限公司 A kind of condensation collection system in tunnel type fermentation warehouse
CN209131241U (en) * 2018-11-27 2019-07-19 广东聚华印刷显示技术有限公司 Cold plate and decompression dry device

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Address after: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province

Patentee after: TCL Huaxing Photoelectric Technology Co.,Ltd.

Address before: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province

Patentee before: Shenzhen China Star Optoelectronics Technology Co.,Ltd.

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